CN106062619A

CN106062619A - LCD device

Info

Publication number: CN106062619A
Application number: CN201480076354.2A
Authority: CN
Inventors: 木村幸弘; 福吉健蔵
Original assignee: Toppan Printing Co Ltd
Current assignee: Toppan Inc
Priority date: 2014-02-28
Filing date: 2014-05-26
Publication date: 2016-10-26
Anticipated expiration: 2034-05-26
Also published as: TWI511018B; US20160363797A1; KR20160125483A; US10126585B2; JP6183493B2; JPWO2015129057A1; TW201533637A; WO2015129057A1; CN106062619B; KR101877660B1; JP2016167083A; JP6020571B2

Abstract

In this LCD device (100), a plurality of first photoabsorbent resin layer patterns (1), a plurality of metal layer patterns (2), a plurality of second photoabsorbent resin layer patterns (3), a transparent resin layer (5), and a plurality of transparent electrode patterns (6) are laminated in that order to a first transparent substrate (10) on a surface thereof facing a liquid crystal layer (24). The plurality of first photoabsorbent resin layer patterns (1), the plurality of metal layer patterns (2), and the plurality of second photoabsorbent resin layer patterns (3) have openings and are formed to identical shape viewed in the lamination direction. The plurality of metal layer patterns (2) are arranged to line up in a first direction in a mutually insulated state, and the plurality of transparent electrode patterns (6) are arranged to line up in a second direction orthogonal to the first direction in a mutually insulated state. The metal layer patterns (2) have a copper layer and/or an alloy layer of which copper is the principal material, and the frequency of the touch driving voltage and the frequency of the liquid crystal driving voltage differ.

Description

Liquid crystal indicator

Technical field

The present invention relates to a kind of liquid crystal indicator, touch sense function is built in liquid crystal panel, and aperture opening ratio is relatively Height, visual confirmation are excellent.Additionally, the present invention can provide a kind of liquid crystal indicator possessing touch sensing electrode, this touches Touching sensing electrode is, uses and is suitable for low-resistance metal layer pattern of the electrode that touch sensing is used, and transmission light Light-proofness is excellent, and the reflected colour of metal layer pattern is almost black.In other words, the present invention relates to one direct capacitance mode touched What sensing function was built in liquid crystal cells is referred to as embedded liquid crystal indicator.

The application in the Patent 2014-038822 of Japanese publication and advocates its priority based on February 28th, 2014, will Its content is applied at the application.

Background technology

In recent years, for liquid crystal indicator, organic EL display, for bright display, power reducing, and requirement Higher aperture opening ratio.In these display devices, improving to pixel be divided the contrast making display, generally, using The black matrix that formed in photoresist will be distributed to as the carbon etc. of black color material.

(light-proofness of black matrix)

The black matrix arranged to surround the form of pixel for the purpose of the contrast guaranteeing display is, higher in order to obtain Light-proofness, generally, utilize by making black resin that carbon isochrome material is distributed in resin on the transparency carriers such as glass Form the thicker thickness of more than 1 μm (micron).Particularly, for being in, multiple pixels are configured to rectangular display surface week The black matrix in the frame portion on 4 limits enclosed, i.e. frame shape, requires more than 5 or more than 6 relatively in the optical concentration under transmission measurement High light-proofness.The light of backlight unit easily spills from frame portion, requires than the black square being formed at display surface for frame portion The higher optical concentration of battle array.

(graph thinning of black matrix)

In the display device of the small portable device such as mobile phone, along with 200ppi (pixel per inch) with Upper, the high-precision refinement of even more than 300ppi, also requires the graph thinning of black matrix while requiring higher light-proofness.Pass through Making the high-precision refinement of black matrix, thus pixel wide is narrowed below 30 μm, the color filter therefore caused by the thickness of black matrix The deterioration of flatness presents.The black matrix of the display device of the fine of more than 300ppi, the width of fine rule needs to be 4 μm Below.

Additionally, such as, owing to the light-proofness of black matrix is higher, therefore, it is difficult to stably manufacture 4 μ by the method for photoetching The pattern of the black matrix of the fine rule of below m.Black matrix is, in the case of light-proofness is higher, to the thickness of black matrix during exposure Direction does not enter enough light, and therefore in the operations such as development, black matrix becomes to be easily peeled off.

Additionally, so that light-proofness rises to purpose and by the 2 of photoetching operations, the width that i.e. forms fine rule with bilayer It is the black matrix of below 4 μm, is extremely difficult from the viewpoint of alignment.When forming black matrix by 2 operations, due to The error of alignment and be easily caused the generation that the change of line width, display are uneven.

In the general procedure of color filter etc., owing to forming multiple picture on large-scale transparency carrier, therefore typically require ± 2 μm such alignment scope.Accordingly, it is difficult to form black matrix by the 2 of photoetching operations.

(touch sense function in display device)

But, have as the means that liquid crystal indicator, organic EL display are directly inputted: show at these The means of the touch panel of direct capacitance mode are pasted on device；The position such as connected with liquid crystal layer of display device arrange with The means of the element that touch sensing is corresponding；Etc..The means arranging the element corresponding with touch sensing are referred to as embedded side Formula.In this inline mode, there is direct capacitance mode, the mode etc. of use optical sensor.

At the touch sensing that can itself be carried out the inline mode inputted by the indicator such as finger, pen in display device In technology, the situation of application direct capacitance mode is more.In this direct capacitance mode, need disclosed in multiple patent documentation 1 to 5 For 2 groups of electrode groups that direct capacitance is sensed.

Prior art literature

Patent documentation

Patent documentation 1: No. 2653014 publications of Japanese Patent No.

Patent documentation 2: Japanese Unexamined Patent Application Publication 2009-540375 publication

Patent documentation 3: No. 4816668 publications of Japanese Patent No.

Patent documentation 4: International Publication the 2013/089019th

Patent documentation 5: International Publication the 2013/018736th

Summary of the invention

The problem that invention is to be solved

Here, patent documentation 1 to 5 has such problem shown below.

In patent documentation 1, as disclosed in paragraph (0018), (0019), disclose and can utilize based on Al The direct capacitance of the metal such as (aluminum), Cr (chromium) couples the 2 groups of electrode groups inputting space coordinates.

But, the technology of patent documentation 1 has more shortcoming.Such as, in paragraph (0019), recorded the shading of 2 groups Property electrode play as the function of black matrix.Describe the metals such as Al, Cr as the electric conductor with light-proofness, but these are golden Accessory has a reflectance of higher light, therefore in bright indoor, the outdoor reflection light with sunlight more apparent, make display product Matter is greatly lowered.Further, in patent documentation 1, not open employ in order to obtain the contrast of display device and In display device between pattern and color filter and described 2 groups of electrodes of the black layer of the black color material of application in most display devices Thickness direction on position relationship, enough records are not had yet for the colored display including Transflective.

Further, Al (aluminum) does not have alkali resistance, for example it is difficult to form red pixel, green pixel and blue pixel The photo-mask process operation of alkaline-based developer (use) obtain integration.

More specifically, using coloring phototonus resin that the colored pattern of red pixel etc. carries out the logical of alkaline development In normal color filter operation, Al is dissolved in alkaline-based developer, therefore, it is difficult to apply to color filter operation.About Cr, in order to scheme In the case of case is formed and uses Wet-type etching operation, worry the environmental pollution that Cr ion causes.Using dry-etching operation In the case of, there is the danger etc. of used halogen gas.

In patent documentation 2, such as claim 1～claim 3, claim 35, the claim of patent documentation 2 45, as claim 60 etc. are described, propose to have configure on the face opposed with the 2nd substrate of the 1st substrate i.e. TFT plate to A few composition touching key element.In the claim 4 of patent documentation 2, record the back side of black matrix configuration multiple The composition of metal touch detecting electrode.

The technology emphasis of patent documentation 2 has been recorded to a certain degree in the claims 1 to 3 of patent documentation 1, but just expresses The touch key element relevant with touch sensing specifically constitute this point, the technology of patent documentation 2 is important technology.Additionally, specially Beyond the paragraph (0015) of profit document 1, also state that the electrode member of based on charge detection input mode has both AMLCD The effect of the element of (Active Matrix Liquid Crystal Display: AMLCD).

But, the technology of patent documentation 2 does not considers the optimization of liquid crystal indicator, does not particularly consider absorbance.This Outward, the most almost do not mention the consideration of the technology relevant to noise reduction during touch sensing, observe liquid crystal display dress from observer The improvement of the visual confirmation in the case of putting.

Additionally, about the multiple metal touch sensing electrode, the not pattern to black matrix that configure at the back side of black matrix Record in detail with the pattern of multiple metal touch sensing electrode.Figure 57, Figure 72 according to patent documentation 2, it is possible to judge black Between matrix and the pattern of the metal etc. represented by symbol M 1, size is different.Patent documentation 2 is undisclosed with identical live width Degree forms the technology of the pattern of black matrix and metal etc..Such as, high-precision refinement to the pixel of more than 300ppi is not carried out Concrete detailed record.

Additionally, almost without open in patent documentation 2: the pattern of these metals etc. represented by symbol M 1 passes with touching The ITO used in sense₂Deng opposite electrode between the method that is kept of direct capacitance；And the noise fall when touch sensing Low, the some concrete countermeasures of raising S/N ratio.Further, such as, do not take into account in patent documentation 2: in the composition shown in Figure 36, come Luminous reflectance from ITO, metal BM can be to the situation of the eye incidence of observer；And the reflectance of the black matrix shown in reduction Figure 57 And the technology that the visual confirmation realizing antiradar reflectivity improves.Also do not account in the liquid crystal of the symbol M 1 of Figure 57 the anti-of reflection Penetrate light (reflecting again in liquid crystal cells).

When the absorbance for working as liquid crystal indicator, the visual confirmation of observer, touch sensing From the viewpoint of noise reduction, S/N ratio, the technology of patent documentation 2 does not constitute enough technology.

Patent Document 3 discloses following technology: by sharing of being configured near the liquid crystal layer to liquid crystal indicator The display driving voltage that electrode applies, uses and drives signal into touch sensor.Fig. 4, Fig. 5, Fig. 7 such as patent documentation 3 And Fig. 8 also disclosed like that, compared with detecting electrode, common electrode is arranged in from the farther position of the indicators such as finger, altogether It is applied in driving signal (drive electrode) with electrode.

Patent documentation 3 is undisclosed following to be constituted: the electrode of position that will be arranged in closer to indicators such as fingers, uses and is Drive electrode preferred with touch sensing.Further, following technology is also not disclosed: stack gradually light from close to the position of observer Absorbent resin layer and copper alloy constitute and touch relevant drive electrode.From for working as liquid crystal indicator Noise when absorbance, the visual confirmation of observer, touch sensing reduces, from the viewpoint of S/N ratio, the skill of patent documentation 3 Art not optimization.

In patent documentation 4, as shown in the claim 1 of patent documentation 4, disclose and be adjacent to based on same level The 1st cell electrode arranged and the 2nd cell electrode, the touch panel substrate of direct capacitance mode.Such as, at patent documentation 4 In Fig. 3 (a), (b), disclose the composition of stacking conductive layer 7 on insulating properties light shield layer 6.

Further, also disclose and include respectively hiding as the A-A ' sectional view of Fig. 3 (a) does not forms insulating properties the most as shown in Figure 1 The part of photosphere 6 and the B-B ' sectional view such as Fig. 3 (a) are formed with conduction the most as shown in Figure 2 on insulating properties light shield layer 6 The part of layer 7.

In Fig. 2 of patent documentation 4, owing to the width of insulating properties light shield layer 6 is relatively big, therefore there is the peristome making pixel Aperture opening ratio reduce problem.On the contrary, in FIG, carry out visual confirmation conductive layer 7 via transparent insulation substrate, therefore exist and lead The reflection light of electric layer 7 enters the eye of observer, the problem that visual confirmation can be greatly lowered.Additionally, such as the section of patent documentation 4 Fall (0071) described as, conductive layer 7 has and electrically connects with the position detecting electrode 9 making visible transmission via contact hole Effect, conductive layer 7 does not have the effect carrying out detection based on direct capacitance.

Undisclosed following composition in patent documentation 4: on the face connected with liquid crystal of transparent insulating substrate, via example Such as insulating barriers such as transparent resin layers, make position detecting electrode 9 i.e. sensitive electrode and actuator electrode stacking orthogonally.Additionally, not It is disclosed directly below technology: when making insulating properties light shield layer 6 and conductive layer 7 to overlook, same shape and same size are formed.

Technology disclosed in patent documentation 4, in being formed at including contact hole, all has and constitutes extremely complex problem.From From the viewpoint of aperture opening ratio, can not say in patent documentation 4, propose the touch panel substrate that visual confirmation is good.

Patent Document 5 discloses a kind of display device, during possessing by 1 frame constituted during the 1st and during the 2nd, During the 1st, the oxide skin(coating) containing the element selected from In, Ga, Zn is used as the semiconductor layer of active component, View data is write, during the 2nd, carries out detecting the sensing of the detection of object position.

At position detection part, multiple 1st electrodes are arranged in crossing manner with multiple 2nd electrodes.Figure such as patent documentation 5 Shown in 4 or Figure 24, when overlooking, multiple 1st electrodes and multiple 2nd electrode are the most adjacent, and such as the power of patent documentation 5 Profit requires position adjacent as described in 3, is coupled by electric capacity.

Represent in fig. 2 the TFT substrate relevant with the technology of patent documentation 5 when vertical view in the horizontal direction and Vertical Square To the pixel arrangement of arrangement, disclose in Fig. 4 and Figure 24 about 45 degree of square diamond shape upwardly through slit segmentation 1st electrode, the 2nd electrode.

In the technology of patent documentation 5, pixel electrode shape is overlooked with the 1st electrode of above-mentioned diamond shape, the 2nd electrode Time position integrate state fail to understand.Further, open by the 1st electrodes split upwardly through slit about 45 degree sides, the 2nd Optimal liquid crystal when electrode uses as common electrode Com.When assuming vertical orientated liquid crystal, it is judged that be about 45 degree of directions Slit can give such as liquid crystal aligning or liquid crystal absorbance bring harmful effect.As patent documentation 5 paragraph (0143), (0144) and shown in Figure 13, conductive layer 27 is formed by identical metal level with bridge electrode 7.But, undisclosed make the 1st electrode or The technology that one side of person the 2nd electrode is made up of the bilayer of metal level and black matrix.Such as, undisclosed have same shape and phase Drive electrode with the touch sensing that the light absorption resin bed pattern of size is laminated with metal layer pattern.

In view of above such situation, it is desirable to the liquid crystal indicator with touch sense function such as has shown below Performance.That is, in order to reduce the noise during touch sensing of the indicator such as finger, pen, it is desirable to above-mentioned 2 groups of direct capacitance mode Multiple electrode groups have relatively low resistance value.Particularly, it is desirable to multiple electrode groups are in the position closer to indicators such as fingers, And in order to prevent the deformation of the waveform of driving voltage, it is desirable to the resistance value of the drive electrode (scan electrode) relevant with touch sensing Relatively low.Further, it is desirable to the resistance value of the detecting electrode orthogonal with drive electrode is relatively low.

And, need for relatively low for being applied to the reflectance on the surface of above-mentioned multiple electrode groups of display device.Too The outer light that sunlight etc. become clear is when the display surface incidence of display device, if the higher (reflection of the luminous reflectance of above-mentioned multiple electrode group When rate is the lowest), then can cause display quality is greatly lowered.Such as, by aluminum, the monolayer of chromium or these metals and oxygen When the double-deck composition of change chromium forms the electrode group of 1 group, the reflectance of outer light is relatively big, can damage the visual confirmation of display.For That reduces the backlight unit that the back side from the array base palte of liquid crystal indicator possessed reflects light, the most multiple electricity again The reflectance on the surface of pole group is relatively low.

In the composition of embodiments of the present invention shown below, by drive electrode higher for aperture opening ratio, it is able to ensure that The detecting electrode (transparency electrode) of absorbance and by the vertical orientated liquid crystal layer of vertical electric field driven, throughout its thickness side To integrally apply flexibly, thus improve the absorbance of liquid crystal display.

The present invention is carried out in view of the above problems, and the 1st purpose of the present invention is to provide a kind of liquid crystal display dress Put, be built-in with touch sense function, make aperture opening ratio improve, and to have outward appearance be black and low-resistance drive electrode, vision Confirmatory is good, and absorbance (aperture opening ratio) is higher.

Additionally, the 2nd purpose of the present invention is, to be simply formed and to provide with degree of precision the position of the indicators such as finger The higher liquid crystal indicator of performance of detection.

For solving the means of problem

In order to solve above-mentioned problem, the present invention proposes following means.

The liquid crystal indicator of one mode of the present invention possesses: display part, by display base plate, liquid crystal layer and array base Plate stacks gradually and forms；And control portion, above-mentioned display part and touch sense function are controlled, above-mentioned display base plate exists It is sequentially laminated with on the face opposed with above-mentioned liquid crystal layer of the 1st transparency carrier: be formed with multiple 1st light absorption trees of peristome Lipid layer pattern, it is formed with multiple metal layer patterns of peristome, is formed with multiple 2nd light absorption resin bed figures of peristome Case, transparent resin layer and the most independent multiple transparent electrode patterns, along above-mentioned display base plate, above-mentioned liquid crystal layer with And the stacked direction of above-mentioned array base palte stacking is when observing, multiple above-mentioned 1st light absorption resin bed patterns, multiple above-mentioned metal Layer pattern and multiple above-mentioned 2nd light absorption resin bed pattern are formed as same shape and overlap, multiple above-mentioned metal level figures Case is arranged along 1st direction orthogonal with above-mentioned stacked direction with the state of mutually insulated, multiple above-mentioned transparency electrode figures Case is arranged along 2nd direction the most orthogonal with above-mentioned stacked direction and above-mentioned 1st direction with the state of mutually insulated, Each above-mentioned metal layer pattern has with at least one party in alloy-layer that copper is main material and layers of copper, and above-mentioned array base palte is On the face opposed with above-mentioned liquid crystal layer of 2 transparency carriers, there is the exhausted of pixel electrode, thin film transistor (TFT), metal line and multilamellar Edge layer, above-mentioned touch sense function at least includes following function: be set to determine current potential by multiple above-mentioned transparent electrode patterns, to multiple Apply between above-mentioned transparent electrode pattern and multiple above-mentioned metal layer pattern to touch driving voltage, to above-mentioned metal layer pattern with upper State the function that the change of the direct capacitance between transparent electrode pattern carries out detecting, in the driving of above-mentioned liquid crystal layer, on multiple State transparent electrode pattern to be set to determine current potential, to applying liquid crystal drive between multiple above-mentioned transparent electrode patterns and pixel electrodes Voltage and above-mentioned liquid crystal layer is driven, and, the frequency of above-mentioned touch driving voltage and the frequency of above-mentioned liquid crystal drive voltage Rate is different.

Being preferably in the liquid crystal indicator of a mode of the present invention, above-mentioned array base palte possesses: above-mentioned pixel electricity Pole；And auxiliary capacitance electrode, via the above-mentioned insulating barrier connected with pixel electrodes, it is arranged in contrary with above-mentioned liquid crystal layer Side, above-mentioned auxiliary capacitance electrode forms the overlapping portion between pixel electrodes and above-mentioned auxiliary capacitor electricity when overlooking The extension that pole is stretched out from pixel electrodes, above-mentioned overlapping portion and above-mentioned extension are relative to by above-mentioned peristome two decile Central Line and line configures symmetrically, above-mentioned auxiliary capacitance electrode is applied in the voltage different from above-mentioned liquid crystal drive voltage.

In the liquid crystal indicator of a mode of the present invention be preferably, above-mentioned thin film transistor (TFT) possess containing gallium, indium, The channel layer of the metal-oxide of more than two kinds in zinc, stannum, germanium.

Being preferably in the liquid crystal indicator of a mode of the present invention, each above-mentioned metal layer pattern is by multilamellar structure Becoming, at least one of multiple above-mentioned layers is above-mentioned alloy-layer.

Being preferably in the liquid crystal indicator of a mode of the present invention, each above-mentioned metal layer pattern has above-mentioned conjunction Layer gold, the alloying element contained by above-mentioned alloy-layer be from magnesium, calcium, titanium, molybdenum, indium, stannum, zinc, aluminum, beryllium, nickel select a kind with On element.

Being preferably in the liquid crystal indicator of a mode of the present invention, each above-mentioned metal layer pattern is by multilamellar structure Becoming, in multiple above-mentioned layers, the layer closest to above-mentioned 2nd transparency carrier is copper and indium alloy layer.

The liquid crystal indicator of a mode of the present invention is preferably, multiple above-mentioned transparent electrode patterns possess The auxiliary conductor that the resistivity of the above-mentioned transparent electrode pattern of resistivity ratio is little.

The liquid crystal indicator of a mode of the present invention is preferably, at above-mentioned 1st light absorption resin bed pattern Above-mentioned peristome, the above-mentioned peristome of above-mentioned metal layer pattern and above-mentioned the opening of above-mentioned 2nd light absorption resin bed pattern Oral area, the green pixel possess the red pixel formed by red color layer, being formed by green layer and the blueness formed by cyan coloring layer Any one in pixel, these red pixels, green pixel and blue pixel are inserted on multiple along above-mentioned stacked direction State between metal layer pattern and above-mentioned transparent resin layer, and be adjacent to respectively when observing along above-mentioned stacked direction arrange.

The liquid crystal indicator of a mode of the present invention is preferably, the liquid crystal molecule tool that above-mentioned liquid crystal layer is had There is negative dielectric constant anisotropy, and initial orientation direction is vertical direction.

Hereinafter, for the electrode relevant with touch sensing, detecting electrode and drive electrode are referred to as touch electrode.

As explained in detail below, drive electrode has the 1st light absorption resin bed, metal level and the suction of the 2nd light 3 layers of composition of the property received resin bed.In following record, sometimes above-mentioned 3 layers of drive electrode constituted are referred to as black electrodes, and The pattern of black electrodes is referred to as black pattern.

The effect of invention

One mode of the present invention, using the teaching of the invention it is possible to provide a kind of liquid crystal indicator, by making aperture opening ratio improve, the most such as, makes Absorbance improves and makes visual confirmation improve.Additionally, according to a mode of the present invention, using the teaching of the invention it is possible to provide a kind of liquid crystal display Device, such as, possess the position to indicators such as fingers detection performance higher, resistance value is less and the black of antiradar reflectivity electricity Pole.

Additionally, the present invention mode is, metal layer pattern possesses the 2nd light absorption resin bed pattern, therefore Reflecting again of the light being prevented from liquid crystal cells.Such as, the multiple metal lines in the 2nd transparency carrier of array base palte In the case of (including source electrode line, gate line etc.) is the metal line of copper, aluminum etc., it is possible to prevent arranging on the 1st transparency carrier The reflecting again of light between metal layer pattern, diffuse-reflectance.In the case of thin film transistor (TFT) has sensitivity to light, it is possible to relax The light reflected again is incident to this thin film transistor (TFT).

Additionally, the present invention mode proposes even by touching that the Pixel Dimensions of high-precision refinement can be tackled neatly Touch electrode, different from exterior touch panel, additionally it is possible to reply pen input.

Accompanying drawing explanation

Fig. 1 is the block diagram of the liquid crystal indicator of the 1st embodiment of the present invention.

Fig. 2 is the sectional view of the side of the display part of the liquid crystal indicator of the 1st embodiment of the present invention.

Fig. 3 is the plane graph of the black electrodes of the liquid crystal indicator of the 1st embodiment of the present invention.

Fig. 4 is the black electrodes of the liquid crystal indicator of the 1st embodiment of the present invention and putting down of transparent electrode pattern Face figure.

Fig. 5 is a pixel enlarged representation of the array base palte of the liquid crystal indicator by the 1st embodiment of the present invention Plane graph.

Fig. 6 is the sectional view schematically shown together with electric lines of force by the display part of conventional liquid crystal indicator.

Fig. 7 is the sectional view schematically shown together with equipotential line by the display part of conventional liquid crystal indicator.

Fig. 8 is that the variation of the display part by conventional liquid crystal indicator schematically shows together with equipotential line Sectional view.

Fig. 9 is the plane of the position relationship of the major part of the liquid crystal indicator of the 1st embodiment representing the present invention Figure.

Figure 10 is the plane of the position relationship of the major part of the liquid crystal indicator of the 1st embodiment representing the present invention Figure.

Figure 11 is the manufacture of the base plate for liquid crystal display device of the liquid crystal indicator of the 1st embodiment representing the present invention The flow chart of method.

Figure 12 is cutting of illustrating of the effect of the touch electrode of the liquid crystal indicator of the 1st embodiment to the present invention Face figure.

Figure 13 is cutting of illustrating of the effect of the touch electrode of the liquid crystal indicator of the 1st embodiment to the present invention Face figure.

Figure 14 is the sectional view of the side of the display part of the 2nd embodiment of the present invention.

Figure 15 is the plane graph of the display part of the 2nd embodiment of the present invention.

Figure 16 is the sectional view of the transversal A1-A1 in Figure 15.

Figure 17 is the sectional view of the transversal A2-A2 in Figure 15.

Figure 18 is the sectional view of the side of the display part of the 4th embodiment of the present invention.

Figure 19 is the sectional view that the effect of the display part of the 4th embodiment to the present invention illustrates.

Detailed description of the invention

Hereinafter, referring to the drawings embodiments of the present invention are illustrated.Additionally, in the following description, for identical Or the most identical effectively upper function and element, give identical symbol, omit the description or the most in case of need Illustrate.

In each embodiment, distinctive part is illustrated, such as, for the composition with common display device The part etc. of key element zero difference omits the description.Additionally, each embodiment, liquid crystal indicator is said as prime example Bright, but as partly record in each embodiment, for other displays as organic EL display Device also is able to similarly apply.

(the 1st embodiment)

Hereinafter, referring to figs. 1 through Figure 13, the 1st embodiment of the liquid crystal indicator of the present invention is illustrated.Additionally, In following whole accompanying drawings, in order to make accompanying drawing easily observe, and make the thickness of each element, size ratio the most not With.

As shown in Figure 1, the liquid crystal indicator 100 of present embodiment possesses display part 110 and for display The control portion 120 that portion 110 and touch sense function are controlled.

As shown in Figure 2, display part 110 has a following structure: base plate for liquid crystal display device (display base plate) 22, liquid Crystal layer 24 and array base palte 23 according to base plate for liquid crystal display device 22, liquid crystal layer 24, the order stacking of array base palte 23, and And this display part 110 shows with normally black mode.That is, the 1st transparency carrier described later of base plate for liquid crystal display device 22 is made 10 are constituted display part with the 2nd transparency carrier 20 described later of array base palte 23 fitting in the way of liquid crystal layer 24 is facing 110。

It addition, " facing " is meant that, the respective metal layer pattern 2 described later etc. that is formed of transparency carrier 10,20 touches The face touching electrode and the face being formed with the function element etc. such as pixel electrode 25 described later, thin film transistor (TFT) 45 are facing.Will The direction of base plate for liquid crystal display device 22, liquid crystal layer 24 and 23 stackings of array base palte is set to stacked direction Z (Vertical Square To).

(schematic configuration of base plate for liquid crystal display device)

Base plate for liquid crystal display device 22 is configured to, at the interarea opposed with liquid crystal layer 24 (face) of the 1st transparency carrier 10 On 10a, multiple 1st light absorption resin bed patterns 1, multiple metal layer pattern 2, multiple 2nd light absorption resin bed pattern 3, Transparent resin layer 5 and multiple transparent electrode pattern 6, according to multiple 1st light absorption resin bed patterns 1, multiple metal level figure Case 2, multiple 2nd light absorption resin bed pattern 3, transparent resin layer 5 and the order stacking of multiple transparent electrode pattern 6.As Upper described, by light absorption resin bed pattern 1,3 and by the metal layer pattern clamped by light absorption resin bed pattern 1,3 2 constitute black electrodes 4.

Glass substrate is such as used as the 1st transparency carrier 10.

As shown in Figure 3, multiple 1st light absorption resin bed patterns 1, multiple metal layer pattern 2 and multiple 2nd light Absorbent resin layer pattern 3, is formed as same shape when observing (vertical view) abreast with stacked direction Z, staggers ground without part Completely overlapped.

That is, multiple 1st light absorption resin bed pattern 1, multiple metal layer pattern 2 and multiple 2nd light absorption resin Layer pattern 3 has same size.

Multiple 1st light absorption resin bed patterns 1, multiple metal layer pattern 2, multiple 2nd light absorption resin bed pattern 3 and by multiple 1st light absorption resin bed patterns 1, multiple metal layer pattern 2 and multiple 2nd light absorption resin bed figure The shape of multiple black electrodes 4 of case 3 overlap is mutually equal, therefore following being shaped as with multiple metal layer pattern 2 Representative illustrates.

(metal layer pattern)

In a metal layer pattern 2,6 pixel openings portion (openings on the 1st direction X orthogonal with stacked direction Z Portion) 2a arranges formation, on the 2nd direction Y the most orthogonal with stacked direction Z and the 1st direction X, such as 480 pixel openings Portion 2a arranges formation.These the 1st direction X, the 2nd direction Y are the directions of the interarea 10a along the 1st transparency carrier 10.Multiple metals Layer pattern 2 is arranged along the 1st direction X with the state of electrically insulated from one another.Each metal layer pattern 2 prolongs along the 2nd direction Y Stretch.

Pixel openings portion 2a such as can be set to parallel polygon-shaped at least 2 limits.

As parallel polygon-shaped in 2 limits, it is possible to exemplify rectangle, hexagon, V-shape (doglegged Shape) etc..As the frame shape that the surrounding of these polygon pixels is surrounded, it is possible to be set to the shape electrically closed Shape.It is the pattern electrically closed an or part is open (arranges not phase in appearance when overlooking according to these pattern forms Part even) pattern, and the pickup mode of the electrical noise of liquid crystal indicator periphery changes.Or, according to metal layer pattern 2 Pattern form, area, and the pickup mode of the electrical noise of liquid crystal indicator periphery changes.

Each metal layer pattern 2 has with at least one party in alloy-layer that copper is main material and layers of copper.Said here with Copper is the alloy-layer of main material, is meant that in alloy-layer the alloy-layer containing copper than more than 50% with weight rate.Additionally, copper Layer is meant that the layer formed by fine copper.

In the case of forming metal layer pattern 2 by the thin film of alloy-layer, if making thickness (thickness, stacked direction Z Length) be more than 100nm (nanometer) or more than 150nm, then metal layer pattern 2 makes visible ray transmission hardly.Therefore, this reality The thickness of the metal layer pattern 2 executing mode then can obtain enough light-proofness if such as 100nm to 200nm degree.This Outward, as described later, it is possible to a part of the stacked direction Z of metal layer pattern 2 is formed as the metal level containing aerobic.

Each metal layer pattern 2 can also be made up of multiple layers.In this case, at least one of multiple layers is alloy Layer.Additionally, metal layer pattern 2 can also be made up of single layer.

In the case of each metal layer pattern 2 has alloy-layer, the alloy apart from copper comprised in alloy-layer Element, is preferably the element of more than a kind selected from magnesium, calcium, titanium, molybdenum, indium, stannum, zinc, aluminum, beryllium, nickel.By so constituting, Metal layer pattern 2 and the close property between glass substrate, resin (such as, light absorption resin bed) can be improved.Copper is alkaline-resisting The excellence conductor that property is excellent, resistance is less, but be insufficient to relative to the close property of glass, resin.By copper is carried out alloying And it is set to the alloy-layer that copper is main material, it is possible to improve the close property between metal layer pattern 2 and glass substrate, resin.

To the amount of copper addition element if below 3at% in alloy-layer, then the resistance value of alloy-layer will not be big Amplitude rises, the most more preferably.To the amount of copper addition element if more than 0.2at%, then the thin film of alloy-layer and glass The close property of glass substrate etc. improves.Including present embodiment, the gold forming metal layer pattern 2 of following embodiment Belong to, in the case of illustrating in following record, be set to the alloy-layer (for copper beyond magnesium) of magnesium 1at%.Magnesium The resistance value of the alloy-layer of 1at% will not be the most different from the resistance value of copper monomer.

Alloy-layer such as can be formed by employing the vacuum film formation of sputtering method.Can also be, with at alloy-layer The mode of Concentraton gradient is produced to copper addition element on stacked direction Z.The middle body of the stacked direction Z of alloy-layer also may be used With more than 99.8at% as copper.Can also be to produce on the stacked direction Z of metal layer pattern 2 and make and the 1st light absorption resin The amount of alloying element in the face of layer pattern 1 contact or the opposite sides in face contacted with the 1st light absorption resin bed pattern 1 The amount of the alloying element in (face contacted with the 2nd light absorption resin 3) middle body than the stacked direction Z of metal layer pattern 2 The high Concentraton gradient of the amount of alloying element.

Additionally, in the film formation process of alloy-layer, it is possible to connecing with the 1st light absorption resin bed pattern 1 with alloy-layer The face touched is in the contact layer that starting point, the most in the stacking direction Z are the scope of 2nm to 20nm, imports oxygen when film forming, and is set to Layer containing aerobic.Relative to the import volume of the base gas of argon etc., such as the import volume of oxygen when can make film forming is 10%.This contact Layer such as contains the oxygen of more than 5at%, it is possible to improve the close property of the metal layer pattern 2 with contact layer.

Even if the amount making the oxygen in base gas is set to 15at%, value more than 15at%, close property also will not improve.Bag Include the contact layer total thickness at interior metal layer pattern 2 of this alloy-layer, such as, can be set to 102nm to 320nm.By Form the contact layer containing aerobic on the surface of metal layer pattern 2, thus enable that the reflectance of metal layer pattern 2 itself also drops Low, and the low reflecting effect that black electrodes 4 brings can be made to increase.

Additionally, nickel can be set to the copper-nickel alloy of the nickel containing more than 4at% and be applied to embodiments of the present invention. Such as, first, with the thickness of 5nm to 20nm, formed containing more than 4at% in the way of containing more than 5at% oxygen consciously The copper-nickel alloy of nickel.And then, carry out stacking copper-nickel by the thickness of 100nm to the 300nm degree to be substantially free of aerobic Alloy, it is possible to be formed the electrode of the touch sensing that reflectance is less than 30%.

By the oxygen making copper-nickel alloy contain more than 5at%, thus the reflection light on the surface of copper-nickel alloy becomes black. By light absorption resin bed pattern 1 being inserted into the 1st transparency carrier 10 and the copper-nickel alloy i.e. interface of metal layer pattern 2, by The reflectance of black electrodes 4 can be set to less than 2% by this.

In base plate for liquid crystal display device 22, if from display surface side, the i.e. the 1st transparency carrier 10 observe, black electrodes 4 Play the effect of the black matrix of low reflection.

Additionally, in the composition of embodiments of the present invention, metal layer pattern 2 is formed as respectively by the week of pixel with fine rule Enclose frame shape or the matrix shape of encirclement, therefore, it is possible to increase the electrostatic accompanying the edge of metal layer pattern 2 and produce Hold (edge capacitance, with reference to Figure 12).Now, it is possible to by the transparency electrode of the big wide stripes shape orthogonal with metal layer pattern 2 Pattern 6 is set to determine current potential.What is called determines current potential, including current potential when 0 (zero) volt, ground connection or to either one biasing positive and negative Certain current potential.Apply under square wave or alternating voltage between the transparent electrode pattern 6 of current potential and metal layer pattern 2 determining Detection driving voltage, detects the edge capacitance (change of edge capacitance) of each metal layer pattern 2.Due to indicators P such as fingers Touch and the edge capacitance (accompany marginal portion and produce direct capacitance) that produces, big as shown in the schematic diagram of Figure 13 Amplitude reduces.That is, carry out subtraction (detection change) by the direct capacitance before and after the touch to finger etc., it is possible to obtain The difference (change of direct capacitance) of bigger edge capacitance, it is possible to increase substantially the S/N ratio in touch sensing.In the present invention, Changing greatly of the edge capacitance carrying out detecting, the most such as, be set to relatively low driving voltage, with the feelings of higher driving voltage Condition is compared, it is possible to reduce the impact of the electric capacity that swims.

Additionally, in the case of alternating voltage, voltage based on square wave are applied biasing (imparting bias voltage), it is possible to will Determine the voltage that current potential is set to the median of alternating voltage etc..Therefore, determine current potential and be not limited to 0 (zero) volt.Relatively low by being set to Driving voltage, it is possible to reduce power consumption.

For instance, it is possible to the computing of direct capacitance when using two kinds of metal layer patterns 2 (black electrodes 4) to carry out touch sensing (subtraction), carries out noise compensation.Such as, two kinds of metal layer patterns 2 are to make two kinds of respective edges of metal layer pattern 2 Length changes, and makes the area equation of metal layer pattern 2.Carried out by the difference of the edge capacitance to both metal layer patterns 2 Subtraction, it is possible to eliminate the noise accompanying metal layer pattern 2.The area of each metal layer pattern 2 such as can lead to The shape crossing the outer perimeter section outside display part (frame portion) etc. is adjusted.The shape of metal layer pattern 2 can reduce from The impact of the outside interference noise (hereinafter referred to as external noise) entering liquid crystal indicator, therefore, it is possible to the size of pattern, Shape is adjusted.Can also be to make a part for metal layer pattern 2 be set to open systems and (arrange not as the pattern overlooked The part being connected).Preferably the driving frequency of touch sensing is set to the frequency different from the average frequency of main external noise.

Such as, electric in the 2 groups of touches the most adjacent, that be disposed on same level shown in Figure 11 of above-mentioned patent documentation 4 In the structure of pole, it is difficult to before and after obtaining difference or the touch sensing of bigger edge capacitance as embodiments of the present invention The change of direct capacitance, and it is difficult to the pen input reply of fine pixel.

As shown in Figure 3, each metal layer pattern 2 such as along the 1st direction X in units of 6 pixel openings portion 2a It is divided.Each metal layer pattern 2 in the way of becoming the state of electrically insulated from one another, i.e. in the way of mutually the most independent along 1st direction X is arranged, and is carried out pattern formation.Between metal layer pattern 2 adjacent on the 1st direction X, between being formed Gap i.e. separated part 15.

Metal layer pattern 2 is such as arranged with 320 along the 1st direction X, thus the pixel of base plate for liquid crystal display device 22 Number becomes 1920 × 480.The pixel unit carrying out dividing can be adjusted according to the precision of touch sensing, application target.

Metal layer pattern 2 can be as the detection electricity detecting the change of the direct capacitance produced by touch sensing Pole or the drive electrode (scan electrode) as touch sensing use.In the following, mainly to being used as driving electricity The situation of pole illustrates.

At multiple 1st light absorption resin bed patterns 1, multiple 2nd light absorption resin bed pattern 3 and multiple black On electrode 4, also identical with metal layer pattern 2 as, be respectively formed with pixel openings portion (peristome) 1a, pixel openings portion (peristome) 3a, pixel openings portion 4a.The 1st light absorption resin bed pattern the 1, the 2nd light absorption adjacent on the 1st direction X Between resin bed pattern 3 and black electrodes 4, it is respectively formed with separated part 15.The 1st light adjacent on the 1st direction X absorbs Property resin bed pattern the 1, the 2nd light absorption resin bed pattern 3, black electrodes 4 respectively electric insulation.

At pixel openings portion 4a, overlap with pixel openings portion 1a, pixel openings portion 2a and pixel along stacked direction Z and open Oral area 3a.

Multiple black electrodes 4 are arranged in the interface of the 1st transparency carrier 10 and transparent resin layer 5 as shown in Figure 2.

(light absorption resin bed pattern)

1st light absorption resin bed pattern the 1 and the 2nd light absorption resin bed pattern 3 for example, electrical insulator.As light The main black color material of the light absorption that absorbent resin layer pattern 1,3 is had, it is possible to use carbon, CNT (below, Referred to as " CNT "), metal particle etc..Carbon, CNT can also be changed on the film thickness direction of the 1st light absorption resin bed pattern 1 Concentration.1st light absorption resin bed pattern 1 can also be set to carbon be main light absorb material light-absorbing resin layer and Constituted with the double-deck of light absorption resin bed that CNT is main light absorption material.Black color material can also add be used for into The various organic pigments that row color adjusts.Carbon is used as " main light absorbs material ", is meant that the face according to black color material The weight rate of material, carbon is more than 51%.1st light absorption resin bed pattern 1 prevents light from reflecting to observer.Observer's In Yan, the 1st light absorption resin bed pattern 1 is " black " color by visual confirmation.

Optical concentration under the transmission measurement of the 1st light absorption resin bed pattern 1, such as can be less than 2.Such as, the 1st light The optical concentration of based on transmission measurement every 1 μ m thick of absorbent resin layer pattern 1 is preferably less than more than 0.4 1.8, and The thickness of the 1st light absorption resin bed pattern 1 is preferably below more than 0.1 μm 0.8 μm.As required, optical concentration, thickness energy Enough it is set as outside above-mentioned numerical range, but preferably adjusts the carbon amounts of every 1 μ m thick of the 1st light absorption resin bed pattern 1 so that Luminous reflectance on the interface of the 1st transparency carrier the 10 and the 1st light absorption resin bed pattern 1 is less than 2%.

If the luminous reflectance on interface is more than 2%, the black of the display picture of the most normally-black liquid crystal indicator and frame The color (usually black) of (outer ring) produces aberration under visualization.From the viewpoint of appearance design, preferably to black Color or the carbon amounts of color color material are adjusted so that on the interface of the 1st transparency carrier the 10 and the 1st light absorption resin bed pattern 1 Luminous reflectance less than 2%.In addition it is also possible to the concentration of the film thickness direction change black color material along light absorption resin bed, Light absorption resin bed can also be made to be formed by the multilamellar that the concentration of black color material is different.In addition it is also possible to make light absorption tree Lipid layer is formed by the multilamellar of the mutually different resin of refractive index.The refractive index of the resin that light absorption resin bed is used is preferred Relatively low.

Optical concentration or the tone of the 1st light absorption resin bed pattern 1 according to black color materials such as carbon or can add to carbon The amount adding multiple organic pigment is adjusted.In the range of not increasing from the reflection light of metal layer pattern 2, reduce the 1st The carbon amounts that light absorption resin bed pattern 1 is comprised, it is possible to reduce by the 1st transparency carrier the 10 and the 1st light absorption resin bed The reflection light at the interface of pattern 1, it is possible to increase visual confirmation.

For instance, it is possible to be coated to photosensitive black coating liquid to be formed the 1st transparency carrier 10 of metal level and expose, Development is desired pattern, and carries out dura mater by heat treatment etc., and obtains the 2nd light absorption resin bed pattern 3.In advance Thinning in view of film in dry-etching operation described later, by the thickness shape during coating of the 2nd light absorption resin bed pattern 3 Become that to be used for the thickness of target thicker.

Such as, make carbon etc. be dispersed in by organic solvent, can the acrylic resin of photo-crosslinking, initiator and/or base In the firming agent being heating and curing carries out the mixing material mixed, make photosensitive black coating liquid.

Initiator based on light can not contained and only add based on the firming agent being heating and curing, make heat cure class The black coating liquid of type.Embodiments of the present invention are main black color material with carbon, refer to carbon in whole pigment ratios The black coating liquid being added with the ratio more than 51 weight %.

2nd light absorption resin bed pattern 3 is also as the 1st light absorption resin bed pattern 1, it is possible to along film thickness direction Change concentration or change layer composition.

2nd light absorption resin bed pattern 3 is preferably, such as, at a part i.e. region C of the portion of terminal 61 shown in Fig. 4 In, only the part of portion of terminal 61 is removed.It may be that the removing of the 2nd light absorption resin bed pattern 3 of portion of terminal 61, and thoroughly Ming tree lipid layer 5 is removed by dry-etching together, and then, laminating transparent electrode pattern 6 (conducting film such as ITO), stacking end Son cover.

The thickness of black electrodes 4, the i.e. the 1st light absorption resin bed pattern 1, metal layer pattern the 2 and the 2nd light absorption tree This total thickness of 3 layers of lipid layer pattern 3, the most relatively thin.In the case of the thickness of black electrodes 4 is relatively thin, it is possible to make surface Concavo-convex, projection is less, such as, the orientation of liquid crystal can be suppressed bad etc..For instance, it is possible to make the 1st light absorption resin bed pattern 1 Thickness be 700nm, the thickness making metal layer pattern 2 is 180nm, and the thickness making the 2nd light absorption resin bed pattern 3 is 400nm.The overall thickness of black electrodes 4 now becomes 1280nm (1.28 μm).If the thinner thickness of black electrodes 4, the most right The color filter that the dyed layers such as red color layer described later, green layer and cyan coloring layer carry out stacking is the most smooth.

The black electrodes 4 of the present invention uses the metal layer pattern 2 that light-proofness is higher in it is constituted, therefore, it is possible to make light inhale The thickness of the property received resin bed is relatively thin or makes optical concentration relatively low.Relatively thin thickness light absorption resin bed situation or In the case of the light absorption resin bed of the optical concentration that person is relatively low, the resolution in photoetching improves, the most such as can be with 1 μm ～4 the such fine rule of μm formed.

(effect that black electrodes, transparency electrode can play)

Above-mentioned black electrodes such as can be as drive electrode (the scanning electricity during touch sensing of liquid crystal indicator 100 Pole).If using black electrodes as the drive electrode in touch sensing and using transparent electrode pattern 6 as detecting electrode, then can The drive condition making touch sensing is different from the drive condition of liquid crystal (frequency, voltage etc.).By making the driving frequency of touch sensing Rate is different from the driving frequency of liquid crystal, it is possible to reduces touch sensing and drives and the influencing each other of liquid crystal drive.For instance, it is possible to make The driving frequency of touch sensing is number KHz～tens of KHz, and the frequency making liquid crystal drive is 60Hz～240Hz.And, additionally it is possible to Carry out touch sensing driving and liquid crystal drive to timesharing.

In the case of black electrodes is used for drive electrode (scan electrode), it is possible to required touch input speed Match and at random adjust the rate of scanning of direct capacitance detection.Further, in order to obtain response faster, it is possible to not to multiple The whole of black electrodes are scanned, and to from whole black electrodes select black electrodes (selected black electrodes Quantity is all or less than the quantity of black electrodes) it is scanned (interval scan).

Or, black electrodes can be as the drive electrode (scan electrode) for applying the voltage under certain frequency.This Outward, the voltage (AC signal) applied scan electrode can also be the inversion driving mode making positive and negative voltage reversal.

Or, as touching driving voltage, reduce the voltage width (width of the height of voltage of the AC signal applied Degree, peak value is to peak value), it is possible to reduce the impact on liquid crystal display.The work of scan electrode and detecting electrode can also be exchanged With.

The resistance value of the black electrodes clamping metal layer pattern is relatively low, and transparent electrode pattern 6 also such as is able to lead to Cross and possess auxiliary conductor etc. and make resistance value reduce.By these, it is possible to higher precision to generation in touch sensing The change of direct capacitance detects.Can be such with such as 1～4 μm by the black electrodes being made up of good conductor i.e. tin-copper alloy film Thinner line width arranges as rectangular.

By being disposed in the edge effect of the pattern of the black electrodes of on transparent electrode pattern 6, thinner line width, make Obtain the direct capacitance (edge capacitance) near pattern edge to increase, it is possible to make direct capacitance become big.In other words, it is possible to make with or without finger etc. The difference of the direct capacitance during touch of indicator becomes big, it is possible to increase the S/N relevant with the touch sensing of liquid crystal indicator 100 Ratio, it is possible to increase accuracy of detection.

If additionally, observe from the display surface of display part 110, then black electrodes such as plays the work of black matrix of low reflection With, it is possible to increase visual confirmation.By the concentration of black color material contained by the 1st light absorption resin bed pattern 1, light are inhaled The refractive index of the resin that the property the received thickness of resin bed, light absorption resin bed are comprised is adjusted, it is possible to reduce transparent the 1st The reflectance of the light that the interface of substrate the 10 and the 1st light absorption resin bed pattern 1 produces.Additionally, for the metal of black electrodes Even if layer pattern 2 is thin film, it is also possible to block visible ray completely, it is possible to eliminate the light leak from backlight.

Further, the black electrodes of embodiments of the present invention has the feature that metal level or the 2nd light absorption tree Light absorption resin bed pattern 1,3, as master mold (mask), is processed, therefore light absorption tree by lipid layer by dry-etching The setting-out width of lipid layer pattern 1,3, shape and the setting-out width of metal layer pattern 2, shape are almost identical.

The setting-out width of light absorption resin bed pattern 1,3 is almost identical with the setting-out width of metal layer pattern 2, therefore as The aperture opening ratio of element will not step-down.Light absorption resin bed pattern 1,3 and metal layer pattern 2 can carry out shape by dry-etching Become, therefore these patterns can be formed with thinner line width compared with other forming methods.For instance, it is possible to be used for The fine rule of the metal line same degree of TFT (thin film transistor (TFT)) is formed.

Transparent resin layer 5 can be formed by the acrylic resin etc. with Thermocurable.In this example embodiment, transparent resin layer The thickness of 5 is set to 1.5 μm.The thickness of transparent resin layer 5 can be electrically insulated at metal layer pattern 2 and transparent electrode pattern 6 In the range of at random set.Above-mentioned 1st light absorption resin bed pattern 1, transparent resin layer 5 can also be such as by refractive index etc. The mutually different multiple layers of optical characteristics carry out the composition of stacking.

Such as Fig. 2 and as shown in Figure 4, multiple transparent electrode patterns 6 are on transparent resin layer 5, such as to become the 2nd On the Y of direction, the state of mutually insulated, i.e. mutually the most independent mode are arranged.Transparent electrode pattern 6 is at transparent resin The shape of stripes that the 1st direction X orthogonal with metal layer pattern 2 extends it is formed along on layer 5.

Additionally, such as, it is preferably in the liquid crystal indicator of the fine of more than 300ppi, along the stacking shown in Fig. 4 When direction Z observes, each transparent electrode pattern 6 pixel openings portion 2a with more than 3 of metal layer pattern 2 on the 2nd direction Y Overlapping.The quantity of the pixel openings portion 2a that transparent electrode pattern 6 is overlapping on the 2nd direction Y, in addition to 3, it is also possible to be 6 Individual or 9 etc..

By so constituting, the pixel openings portion 2a of more than 3 is scanned by the 2nd direction Y (scanning simultaneously) in the lump, Therefore, it is possible to shorten, display part 110 entirety is scanned the required time.

Transparent electrode pattern 6 is formed by the conductive metal oxide being referred to as ITO, in this example embodiment, and transparency electrode figure The thickness of case 6 is 140nm, but is not limited to this thickness.Transparent electrode pattern 6 is the opposing party paired with metal layer pattern 2 Touch electrode.

Additionally, as described later, in order to reduce resistance value, transparent electrode pattern 6 can possess the length along pattern The fine rule of the metal film that edge direction (length direction of striped, the 1st direction X) extends, as auxiliary conductor.

Transparent electrode pattern 6 can act as detecting electrode during touch sensing.

In embodiments of the present invention, the black electrodes 4 relevant with touch sensing, transparent electrode pattern 6 any one, It is all located on the face (interarea 10a) connected with liquid crystal layer 24 of the 1st transparency carrier 10.Any one of above-mentioned electrode is being formed at In the case of the surface (face of the opposition side of interarea 10a) of the 1st transparency carrier 10, the thickness of the 1st transparency carrier 10 produces impact, Can be formed to the edge capacitance between black electrodes 4 and transparent electrode pattern 6 and be negatively affected.If the edge capacitance formed Less, then S/N during touch-sensing can be made than reducing.

As shown in Figure 3 and 4, it is possible at multiple metal layer patterns 2 and multiple transparent electrode pattern 6, electricity is set Taking-up portion, pole i.e. portion of terminal 61.These portion of terminal 61 are preferably configured in and are positioned at the Integral rectangular specified by multiple pixel openings portion 4a Viewing area outside, the region D of portion of terminal 61.

Multiple metal layer patterns 2 need not be completely used as the drive electrode into touch sensing, such as can be at the 1st direction X On use 1 metal layer pattern 2 (can be rejected by 2 metal layer patterns 2 in 3 and (remove every 3 metal layer patterns 2 Go), and 1 metal layer pattern 2 is scanned) etc., metal layer pattern 2 is carried out interval and drives (scanning).

The unused metal layer pattern 2 as drive electrode can be to become electrically floating form (floating pattern).

Transparent electrode pattern 6 can be set to determine the common current potential of current potential when liquid crystal drive.Or, it is possible to make all transparent Electrode pattern 6 carries out ground connection across high resistance body.

Increased by the rejecting quantity making metal layer pattern 2 and make scan line quantity reduce, it is possible to reduce driving frequency Rate, it is possible to make power consumption reduce.On the contrary, by utilizing the scanning of higher density, carry out high-precision while guaranteeing higher precision Refinement, the most such as, can apply flexibly in finger print identifying etc..The scan line quantity of touch sensing, it is also possible to carried out by its control portion Adjust.Determine current potential and be not necessarily " 0 (zero) " volt, it is also possible to be the intermediate value of the height of driving voltage.Can also be set to partially The driving voltage put.Transparent electrode pattern 6 for determine current potential, therefore can also by with the pixel electrode that liquid crystal is driven The different frequency of driving frequency, touch electrode (black electrodes) is driven.

Can also make liquid crystal drive and for touch sensing driving timesharing carry out, but owing to transparent electrode pattern 6 is Determine current potential, be driven with therefore can not also making liquid crystal drive and the driving timesharing for touch sensing, and by the most not Same frequency is driven.But, as described later, it is IGZO (registered trade mark) making the channel layer 46 of thin film transistor (TFT) 45 During oxide semiconductor, it is possible to easily carry out timesharing driving.

Such as Fig. 2 and as shown in Figure 5, array base palte 23 is, the master opposed with liquid crystal layer 24 of the 2nd transparency carrier 20 On face (face) 20a, there is multiple pixel electrode 25, multiple thin film transistor (TFT) 45, metal line 40 and insulating barrier 28.More specifically Ground is said, on the interarea 20a of the 2nd transparency carrier 20, multiple insulating barriers 28 is provided with multiple pixel electrode 25 and multiple Thin film transistor (TFT) 45.Additionally, the most not shown thin film transistor (TFT) 45, the most not shown insulating barrier 28.

Metal line 40 has multiple holding wire (source electrode line) 41, multiple scan line (gate line) 42 and multiple auxiliary electricity Hold line 43.Holding wire 41, scan line 42 and auxiliary capacitance line 43 are respectively provided with the double-deck composition of titanium and copper.Additionally, described later Figure 18 of 4th embodiment represents holding wire 41 and light-shielding pattern 73.

Each pixel electrode 25 has known composition, configures in the way of opposed with the pixel openings portion 4a of black electrodes 4 On the face opposed with liquid crystal layer 24 of insulating barrier 28.

Metal line 40 can also be made up of the multilamellar with multiple layers and formed.In this case, at least the one of multiple layers Individual can be layers of copper or copper alloy layer, and other layers can be the layer of the refractory metal such as titanium or molybdenum.In addition it is also possible to take in level To CNT on the metal of the high conductivity such as stacking copper and constitute metal line 40.

The channel layer 46 of each thin film transistor (TFT) 45 can be formed by the silicon based semiconductors such as polysilicon or oxide semiconductor. Thin film transistor (TFT) 45 is preferably, and what channel layer 46 was IGZO (registered trade mark) etc. containing in gallium, indium, zinc, stannum and germanium is of more than two kinds The oxide semiconductor of metal-oxide.The storage of such thin film transistor (TFT) 45 is higher (leakage current is less), the most easily Pixel capacitance after keeping liquid crystal drive voltage to apply.Therefore, it is possible to be set to eliminate the composition of auxiliary capacitance line 43.

Oxide semiconductor is used as the thin film transistor (TFT) of channel layer, such as, there is bottom gate architectures.Thin film transistor (TFT) Top gate type or the transistor configurations of double grid type can also be used.Can also be using optical sensor or other active components as tool The thin film transistor (TFT) of the channel layer of standby oxide semiconductor.

The thin film transistor (TFT) 45 that the oxide semiconductors such as IGZO are used for channel layer 46 is that electron mobility is higher, such as Within 2msec (millisecond) short time below, the driving voltage of needs can be put on pixel electrode 25.Such as, speed drives 1 frame of (situation that display scene number is 120 frames of 1 second) is about 8.3msec, such as, can distribute to 6msec touch biography Sense.Owing to the drive electrode as transparent electrode pattern 6 is for determine current potential, liquid crystal drive and touch electrode therefore can also be made to drive Do not carry out timesharing driving.The driving frequency of the driving frequency of pixel electrode and the touch electrode that liquid crystal is driven can be made not With.

Additionally, oxide semiconductor is used for the thin film transistor (TFT) 45 of channel layer 46, leakage current is less as described above, because of This can keep the driving voltage applying pixel electrode 25 for a long time.By less than the routing resistance that aluminum connects up by routing resistance Thin copper film form the holding wire of active component, scan line, auxiliary capacitance line etc., and use as active component can be The IGZO that short time is driven, thus the time range in the scanning of touch sensing expands, it is possible to produced with high precision test The change of raw direct capacitance.By the oxide semiconductors such as IGZO are applied to active component, it is possible to shorten liquid crystal etc. Driving time, in the signal of video signal that display picture is overall processes, it is possible to make the time being applied to touch sensing the most abundant.

Drain electrode 36 extends to pixel central authorities from thin film transistor (TFT) 45, and via contact hole 44 and the pixel as transparency electrode Electrode 25 electrically connects.Source electrode 35 extends from thin film transistor (TFT) 45 and electrically connects with holding wire 41.

The liquid crystal molecule (omitting alignment films, the diagram of liquid crystal molecule) that liquid crystal layer 24 is had is used for initial orientation direction For vertical orientated, i.e. stacked direction Z, the institute vertical with base plate for liquid crystal display device 22 and respective of array base palte 23 The liquid of the VA mode (Vertically Alignment mode: employ the vertical Electric Field Mode of vertical orientated liquid crystal molecule) of meaning In brilliant type of drive.

In embodiments described below, all on the thickness direction i.e. stacked direction Z of liquid crystal layer 24, to transparency electrode Liquid crystal drive voltage is applied between pattern 6 and pixel electrode 25.

In the ordinary course of things, the form of driving voltage will be applied on the thickness direction of liquid crystal layer, be referred to as vertical Electric Field Mode. The liquid crystal layer of vertical Electric Field Mode and lateral electric field type (being referred to as IPS:In Plane Switching), FFS (Fringe Field Switching) make liquid crystal to horizontal alignment, horizontal direction rotate mode) compare, front absorbance height about 20% journey Degree.This front absorbance, is meant that the normal direction (layer of present embodiment from the display surface relative to liquid crystal indicator Folded direction Z) brightness time liquid crystal indicator is observed.

Here, use Fig. 6 to Fig. 8 that the reason that the absorbance of the display part of the liquid crystal indicator of FFS mode is relatively low is entered Row simple declaration.

Fig. 6 is the existing display part 200 of the transverse electric field type of drive schematically showing and being referred to as IPS or FFS Sectional view.The initial orientation of liquid crystal layer 206 is the horizontal alignment parallel with the face of transparency carrier 207.By to being in liquid crystal layer Apply between pixel electrode 208 and the common electrode 210 being in pixel electrode 208 bottom via insulating barrier 209 of 206 bottoms Liquid crystal drive voltage, is driven liquid crystal layer 206.As a result, between pixel electrode 208 and common electrode 210, electric power is formed Line L1.

Additionally, on the top of liquid crystal layer 206, transparent resin layer 213, color filter 214 and transparency carrier 215 are suitable according to this Sequence configures.

A part for the thickness direction of liquid crystal layer 206 i.e. effective thickness R1, produces main shadow to the absorbance of liquid crystal layer 206 Ring.In the type of drive of the vertical electric field described in embodiments of the present invention, liquid crystal layer 24 (for example, referring to Fig. 2) the most whole The thickness of body produces impact, on the other hand, in the FFS liquid crystal display mode of transverse electric field type of drive, only one to absorbance The effective thickness R1 divided produces impact to the absorbance of liquid crystal layer 206.Therefore, in the type of drive of transverse electric field, with vertical electric field Type of drive compare front face brightness (absorbance) step-down.

Fig. 7 is the schematic diagram representing equipotential line L2 when display part 200 is applied with liquid crystal drive voltage.At transparent base In the case of there is not transparency electrode, conducting film in plate 215 side, equipotential line L2 run through transparent resin layer 213, color filter 214 with And transparency carrier 215 and to top extend.In the case of equipotential line L2 extends on the thickness direction of liquid crystal layer 206, Ensure that the effective thickness of liquid crystal layer 206 to a certain extent, therefore, it is possible to guarantee the basis of the display part 200 of transverse electric field type of drive The absorbance come.

Existing display part 200A as shown in Figure 8 is such, it is considered on the basis of above-mentioned display part 200 each is constituted The situation of opposite electrode 221 is possessed between liquid crystal layer 206 and transparent resin layer 213.In this case, equipotential line L3 not through Opposite electrode 221, therefore the shape of the equipotential line L3 shape relative to above-mentioned equipotential line L2 is deformed.

Now, the effective thickness of liquid crystal layer 206 is more thinning than the effective thickness of the liquid crystal layer 206 of display part 200, display part The brightness (absorbance) of 200A is greatly lowered.

Therefore, owing to there is asking of absorbance in the touch screen described in Claims 1 to 5 of aforesaid patent documentation 2 Topic, it is dfficult to apply to the display part of transverse electric field type of drive.Therefore, the Claims 1 to 5 institute of patent documentation 2 it is estimated as The display part of the main object of the touch screen related to is the liquid crystal indicator of vertical electric field driven mode.But, patent documentation 2 is not The liquid crystal layer of vertical electric field driven is described in detail, patent documentation 2 is not inquired into touch screen and constitutes the brightness to display part The impact of (absorbance).

Again carry out the explanation of liquid crystal indicator 100.

The not shown liquid crystal molecule of liquid crystal layer 24 has negative dielectric constant anisotropy.Liquid crystal indicator 100 has Standby not shown polarization plates.This polarization plates is crossed Nicol, for normally-black.The gap of liquid crystal cells is 3.6 μm, but is not limited to This.

Liquid crystal molecule is, by between transparent electrode pattern 6 and pixel electrode 25 in the stacking direction Z apply voltage, by This originally when initial orientation in the stacking direction liquid crystal molecule of Z orientation topple over to the direction intersected with stacked direction Z, and carry out Open display (display in vain).

Additionally, liquid crystal molecule can also have positive dielectric constant anisotropy and show with normally black mode, but Horizontal alignment is needed to process in this case.Use the liquid crystal of negative dielectric constant anisotropy, it is possible to be set to orientation process relatively The most vertical orientated.

The orientation process of alignment films can make to use up orientation.

(auxiliary conductor)

On multiple transparent electrode patterns 6, auxiliary conductor can be formed in order to make the resistance of electrode reduce.Auxiliary conductor Can be formed by the material identical with metal layer pattern 2 or can also be formed by the thin film of aluminium alloy.Aluminium alloy can be Aluminum with the addition of the alloy of alloying element in the range of 0.2at%～3at%.Alloying element can from magnesium, calcium, titanium, indium, stannum, Zinc, neodymium, nickel, copper etc. select more than a kind.The resistivity of auxiliary conductor is preferably little than the resistivity of transparent electrode pattern 6.

In the top view shown in Fig. 9, it may be that auxiliary conductor 16 is extended and from pixel openings portion by along the 1st direction X Wire (striated) pattern that the central part of the 2nd direction Y of 4a passes through is formed.In this case, such as, it is preferably, along stacking When direction Z observes, auxiliary conductor 16 is formed at the position overlapping with the auxiliary capacitance line 43 of array base palte 23.By such structure Become, it is possible to suppression aperture opening ratio reduces.

In the top view shown in Figure 10, it may be that auxiliary conductor 16 is formed at by light absorption resin bed pattern 1,3 The pattern position of the touch electrode formed with metal layer pattern 2, in other words as the position of black matrix.(black in the bottom of black matrix Ratio the 1st transparency carrier 10 of matrix is closer to the position of the 2nd transparency carrier 20), it is commonly configured with the holding wire of array base palte 23 (source electrode line) 41, scan line (gate line) 42 and auxiliary capacitance line 43 i.e. metal line 40.Therefore, by being configured with metal The position of wiring 40 forms auxiliary conductor 16, and when Z observes the most in the stacking direction, auxiliary conductor 16 is overlapping with metal line 40, The reduction of aperture opening ratio can be suppressed.

In the present embodiment, transparent electrode pattern 6 for example, when touch sensing, is used as the detection of touch sensing Electrode, when liquid crystal drive, is used as the electricity applying to be driven liquid crystal between pixel electrode 25 and transparent electrode pattern 6 The common electrode of pressure.Touch sensing can be carried out in different timing timesharing with liquid crystal drive, it is also possible to carries out with different frequency Drive.

As shown in Figure 1, control portion 120 has known composition, possesses signal of video signal timing control part 121 (the 1st control Portion processed), touch sensing scanning signal control part 122 (the 2nd control portion) and systems control division 123 (the 3rd control portion).

Multiple transparent electrode patterns 6 are set to determine current potential by signal of video signal timing control part 121, and to array base palte 23 Holding wire 41 and scan line 42 send signal.By Z pair in the stacking direction between transparent electrode pattern 6 and pixel electrode 25 Pixel electrode 25 applies the liquid crystal drive voltage of display, thus carries out the liquid crystal being driven the liquid crystal molecule of liquid crystal layer 24 Drive.Thus, array base palte 23 shows image.

Multiple transparent electrode patterns 6 are set to determine current potential, to multiple metal levels by touch sensing scanning signal control part 122 Pattern 2 (black electrodes 4) applies detection driving voltage, to the direct capacitance (limit between metal layer pattern 2 and transparent electrode pattern 6 Edge electric capacity) change detect, carry out touch sensing.

Signal of video signal timing control part 121 and touch sensing are scanned signal control part 122 and enter by systems control division 123 Row controls, it is possible to alternately i.e. carry out to timesharing the detection of the change of liquid crystal drive and direct capacitance.

(example of the manufacture method of base plate for liquid crystal display device)

It follows that the manufacture method of the base plate for liquid crystal display device 22 of the display part 110 constituted as described above is entered Row explanation.Figure 11 is the flow chart of the manufacture method representing base plate for liquid crystal display device 22.

Coating at light absorption resin bed is formed in (step S11), employs the above-mentioned heat cured black that has and is coated with Apply liquid.This light absorption resin bed is the resin bed before the shape of above-mentioned 1st light absorption resin bed pattern 1 is patterned. Thickness after the heat treatment of 250 DEG C of the 1st light absorption resin bed is 0.7 μm.Black color material employs carbon particulate.

1st light absorption resin bed can also be formed with the thickness beyond 0.7 μm.By to the 1st light absorption resin bed Thickness and the carbon i.e. concentration of black color material be adjusted, it is possible to at the 1st transparency carrier the 10 and the 1st light absorption resin bed figure The luminous reflectance that the interface of case 1 produces is adjusted.In other words, by the thickness of the 1st light absorption resin bed pattern 1 and black The concentration of color material is adjusted, it is possible to the luminous reflectance produced at its interface is set to less than 1.8%.

The 1st light absorption resin bed for coated formation carries out the heat treatment of 250 DEG C, makes the 1st light absorption resin Layer becomes dura mater.

After light absorption resin bed becomes dura mater, by sputter equipment, the metal level of magnesium 1at% is carried out film forming (step Rapid S12).This metal level is the layer before the shape of above-mentioned metal layer pattern 2 is patterned.Additionally, in the film forming work of metal level Sequence initial, is importing under the gas condition adding oxygen 10vol% based on gas by argon, to the 1st metal containing aerobic Layer carries out 0.01 μm film forming, then, only imports based on gas by argon, the 2nd metal level of 0.17 μm is carried out film forming, makes conjunction Meter thickness is the metal level of 0.18 μm.

The photoresist of alkaline development can be carried out and carbon i.e. black color material divides together with organic solvent it follows that use The black coating liquid dissipated, coating forms the 2nd light absorption resin bed (step S13).After being dried with 80 DEG C, expose Photodevelopment is the pattern form of black electrodes, and then, carry out heat treatment with 250 DEG C, make the black pattern of 1.1 μm thickness. As described later, this black pattern eventually becomes the 2nd light absorption resin bed figure via dry-etching described later (step S16) Case 3.

By Wet-type etching, black pattern is processed, thus form the 2nd light absorption resin bed pattern 3 (step S14)。

By Wet-type etching, metal level is made to become the metal layer pattern 2 (step S15) being formed with pixel openings portion 2a.

It follows that using oxygen and freon system gas as importing gas, by dry-etching device, carry out anisotropic Dry-etching (step S16).Dry-etching is, to the 1st light absorption resin bed, along its film thickness direction, to become when overlooking Line width, the mode of shape identical with metal layer pattern 2 are generally perpendicularly processed, until the table of the 1st transparency carrier 10 Show out.By this operation, form the 1st light absorption resin bed pattern 1 from the 1st light absorption resin bed.

Now, by dry-etching, the lower thickness of the 2nd light absorption resin bed pattern 3 on metal layer pattern 2.Make 2nd light absorption resin bed pattern 3 becomes the relatively thin thickness of 0.4 μm and remains.

After carrying out washing and being dried and define metal layer pattern 2, applying alkalescence on this metal layer pattern 2 can Molten photosensitive acrylics, is consequently formed the transparent resin layer 5 (step S17) of 1.6 μm thickness.Transparent resin layer 5 is formed For, it being made only in viewing area, the periphery of viewing area is removed, portion of terminal 61 based on metal layer pattern 2 by development Region expose.

After transparent resin layer 5 is formed, use sputter equipment to the electrically conducting transparent being referred to as ITO on transparent resin layer 5 Film carries out film forming (step S18).Nesa coating is formed, as transparent electrode pattern 6 (step by known photoetching method S19).Transparent electrode pattern 6 and metal layer pattern 2 are the arrangements of the most independent multiple patterns, via transparent resin Layer 5 arranges on mutually orthogonal direction.Additionally, it is (transparent to be also laminated with ITO i.e. nesa coating in the region of portion of terminal 61 The film of electrode).

The refractive index of the resin used in the 1st light absorption resin bed is the most relatively low.By to the refractive index of resin, carbon It is adjusted Deng the amount of black color material and the thickness of the 1st light absorption resin bed pattern 1, it is possible to saturating from the 1st The reflectance of the light reflected from the interface of the 1st transparency carrier 10 with the 1st light absorption resin bed pattern 1 when bright substrate 10 is observed sets It is less than 1.8%.

But, there is limit in the refractive index of resin, the lower limit of the reflectance of the light therefore reflected from above-mentioned interface is 0.2%.When solid-state amount for example, 14 mass % of the resins such as the acrylic resin contained by black coating liquid, if black is coated with The carbon amounts applied in liquid is set in the range of about 6 mass % to 25 mass %, then can be by the 1st light absorption resin bed pattern 1 The optical concentration of every 1 μ m thick is set to 0.4 to 1.8.

When the thickness of light absorption resin bed pattern 1 is 0.3 μm, effective optical concentration becomes 0.12 to 0.54.? When the thickness of light absorption resin bed pattern 1 is 0.7 μm, effective optical concentration becomes in the range of 0.28 to 1.26.

The base plate for liquid crystal display device 22 of display part 110 is configured to, on the interarea 10a of the 1st transparency carrier 10, multiple 1st light absorption resin bed pattern 1, multiple metal layer pattern 2, multiple 2nd light absorption resin bed pattern 3, transparent resin layer 5 And multiple transparent electrode pattern 6 inhales according to multiple light absorption resin bed patterns 1, multiple metal layer pattern 2, multiple 2nd light The property received resin bed pattern 3, transparent resin layer 5 and the order stacking of multiple transparent electrode pattern 6.

In the display part 110 so constituted, such as, in making liquid crystal cells by the 2nd light absorption resin bed pattern 3 The reflecting again of light, diffuse-reflectance reduce.For instance, it is possible to prevent from not shown backlight outgoing and from the 2nd transparency carrier 20 incidence Light reflect again on the surface of metal layer pattern 2, it is possible to reduce to the incidence of the active components such as TFT.Furthermore it is possible to avoid The reflected colour with redness of copper alloy produces harmful effect to liquid crystal display.

By above step, produce base plate for liquid crystal display device 22.

(effect of touch electrode)

It follows that the effect to the particularly touch electrode of the display part 110 constituted as described above illustrates.

According to this display part 110, it is possible to transparent electrode pattern 6 to be used as detecting electrode during touch sensing, black electricity Pole 4 can act as the scan electrode into applying the voltage under certain frequency.

Specifically describe, as shown in Figure 12, for the direct capacitance of touch sensing, be maintained at black electrodes 4 with saturating Between prescribed electrode pattern 6.In the normal state, it is applied with under certain frequency between black electrodes 4 and transparent electrode pattern 6 Detection driving voltage, has been formed about fringe field at black electrodes 4.

As shown in Figure 13, such as, if indicators P such as finger are close or the display picture of contact black electrodes 4, then The maldistribution of electric lines of force L6, and direct capacitance is to the flowing of indicator P, the electrostatic between black electrodes 4 and transparent electrode pattern 6 Hold and reduce.According to the change of such direct capacitance, the touch with or without indicator P is detected.In the ordinary course of things, adjacent The interval of black electrodes 4 is less, thereby indicate that device P direct action is in multiple touch electrodes.

The black electrodes 4 of present embodiment, including by the alloy-layer that the copper relatively low with resistance value is main material and layers of copper At least one party formed metal layer pattern 2, it is possible to as scan electrode during touch sensing.The transparency electrode of present embodiment Pattern 6, it may be that in order to make the resistance of electrode reduce so that it is pattern width becomes big, additionally, on transparent electrode pattern 6, for The resistance making electrode reduces and possesses above-mentioned auxiliary conductor 16.Therefore, 2 groups of the direct capacitance mode of present embodiment is multiple Electrode group, it is possible to make the time constant accompanying these electrode groups be greatly lowered, it is possible to make accuracy of detection during touch sensing Increase substantially.

As described above, according to the liquid crystal indicator 100 of present embodiment, multiple 1st light absorption resins Layer pattern 1, multiple metal layer pattern 2 and multiple 2nd light absorption resin bed pattern 3 are formed when Z in the stacking direction observes For same shape overlap.Therefore, it is possible to make in pixel openings portion 1a, pixel openings portion 2a and pixel openings portion 3a along stacking The area of the part that direction Z runs through increases, it is possible to make aperture opening ratio improve.

Being provided around the 1st light absorption resin bed pattern 1 in each pixel, therefore the surrounding of pixel is identified as black Color, it is possible to make the contrast of display improve and improve visual confirmation.

Between the adjacent black electrodes 4 of base plate for liquid crystal display device 22, it is not provided with pixel electrode 25, therefore can Enough improve the direct capacitance of touch electrode and improve the precision of the position detection of indicator P.

Transparent electrode pattern 6 is shared by black electrodes 4 and pixel electrode 25, therefore, it is possible to make display part 110 be possessed The quantity of electrode reduces and makes the composition of display part 110 simple.

Can not depend on liquid crystal driving frequency and periodically to the driving frequency of the black electrodes as touch electrode, Or drive and the timing of signal detection is set.

When liquid crystal display is " black " cut out, it not supply black in whole frames of the electrode drive of each touch sensing The driving voltage of electrode, and be by rejecting, multiple frames apply the driving voltage of a black electrodes and carry out touch location inspection Survey, thus enable that the power consumption of liquid crystal indicator 100 reduces.

For instance, it is possible to make the driving frequency of touch electrode become driving frequency more higher than the frequency of liquid crystal drive.

In the present embodiment, black electrodes 4 i.e. metal layer pattern 2 extends along the 2nd direction Y, and transparent electrode pattern 6 Extend along the 1st direction X.But it is also possible to be configured to, black electrodes 4 extends along the 1st direction X, and transparent electrode pattern 6 edge 2nd direction Y extends.

In the liquid crystal indicator of present embodiment, such as possess by emitting red light, green emitting, the 3 of blue-light-emitting The backlight unit that color LED is constituted, and use the method making the luminous field sequence Tong Bu with liquid crystal display of 3 colors respectively, thus can Enough colours that carries out show.

In the case of the White LED using the 3 kinds of wavelength components containing emitting red light, green emitting, blue-light-emitting, example As, the base plate for liquid crystal display device of the color filter of the embodiment after being had by use, it is possible to carry out colored display.

(the 2nd embodiment)

It follows that the 2nd embodiment of the present invention is illustrated with reference to Figure 14 to Figure 17, but for above-mentioned embodiment party The position that formula is identical gives identical symbol and the description thereof will be omitted, only illustrates difference.

As shown in Figure 14, in the display part 111 of present embodiment, replace the liquid of the display part 110 of the 1st embodiment Crystal device substrate 22 and possess base plate for liquid crystal display device 22A.Base plate for liquid crystal display device 22A is configured to, Each pixel openings portion 4a of the black electrodes 4 of base plate for liquid crystal display device 22, possess formed by red color layer red pixel R, Any one of the green pixel G formed by green layer and blue pixel B formed by cyan coloring layer.These red pixels R, green Pixel G and blue pixel B Z in the stacking direction is inserted between metal layer pattern 2 and transparent resin layer 5, and along stacking side Observe phase to Z to be adjacent to mutually arrange.Liquid crystal layer 24 is set to vertical orientated liquid crystal in a same manner as in the first embodiment.

In other words, display part 111 possesses the white containing red, green and blue light emitting elements in backlight LED element, and it is provided simultaneously with redness, green and blue color filter, thus carry out colored display.

Figure 15 is the plane graph observing display part 111 from the 1st transparency carrier 10.At pixel openings portion 4a, seamlessly join It is provided with any one of red pixel R, green pixel G and blue pixel B.

As shown in Figure 16, on the 1st transparency carrier 10 and on black electrodes 4, as color filter seamlessly It is equipped with any one of red pixel R, green pixel G and blue pixel B.Red pixel R, green pixel G and blue picture Element B, for disperse multiple organic pigment in the transparent resins such as acrylic resin respectively, is formed by known photoetching method.

Color filter is laminated with transparent resin layer 5.Transparent resin layer 5 is laminated with transparent electrode pattern 6 further. Transparent electrode pattern 6 is such as formed by nesa coatings such as the conductive metal oxides being referred to as ITO, it is possible to by known Photoetching method carries out pattern formation.

In the present embodiment, transparent electrode pattern 6 such as, is used during the detection of the i.e. change of direct capacitance when touch sensing As the detecting electrode of touch sensing, when liquid crystal drive, it is used as being applied with liquid crystal is entered between itself and pixel electrode 25 The common electrode of the voltage of row cutting.Liquid crystal drive is alternately carried out with the detection of the change of direct capacitance.That is, divide in different timing Time ground detect.

The source signal that will supply from multiple holding wires, such as, be alternately replaced by positive polarity to odd-numbered line and even number line Signal and the signal of negative polarity and give, it is possible to the some reversion carrying out adjacent pixel drives.

Or, transparent electrode pattern 6 can also carry out making the polarity inversion of positive and negative as drive electrode (scan electrode) Public electrode reversion drive.

As shown in Figure 17, the most each 1st light absorption resin bed pattern 1 of the partial pattern of black electrodes 4, metal level figure Case the 2 and the 2nd light absorption resin bed pattern 3, electrically independent by separated part 15.Separated part 15 is equipped with colour filter The colour superimposition portion 26 of device, suppresses the transmission of light from backlight unit outgoing by the overlap of 2 kinds of colors.In colour superimposition In portion 26, preferably red pixel R is overlapping with blue pixel B.

Although it is not shown, but in the position being provided with such separated part 15, when overlooking, array base palte 23 is possessed Any one or the gold identical with these of holding wire (source electrode line) 41, scan line (gate line) 42 and auxiliary capacitance line 43 Belong to the pattern of wiring, arrange in the way of blocking separated part 15.Therefore, it is possible to eliminate the light leak from backlight unit.

In the manufacture method of the base plate for liquid crystal display device of the 1st embodiment, after the formation of metal layer pattern 2, Via multiple pixel openings portion 4a between metal layer pattern 2 and transparent resin layer 5 insert red pixel R, green pixel G and Blue pixel B, it is possible to manufacture the display part 111 of so composition.

In this case, in the flow chart shown in Figure 11, in the 1st light absorption resin bed pattern dry of step S16 Between the coating formation process of the transparent resin layer of formula etching work procedure and step S17, insert the formation work of color filter (R, G, B) Sequence.

(the 3rd embodiment)

It follows that the 3rd embodiment of the present invention is illustrated, but the position identical with above-mentioned embodiment is composed Give identical symbol and the description thereof will be omitted, only difference is illustrated.

In present embodiment, in addition to the composition i.e. composition of metal layer pattern 2 of black electrodes 4, with the 1st embodiment Identical, therefore quote Fig. 2.But, the repetitive description thereof will be omitted, illustrates having discrepant metal layer pattern 2.Additionally, this The black electrodes 4 of embodiment can act as above-mentioned 2nd embodiment and the black electrodes of the 4th embodiment described later.

In the present embodiment, the metal layer pattern 2 shown in Fig. 2 is to be closed by the copper containing aerobic at 0.015 μm thickness The gold i.e. essence of the 1st metal level (layer) and 0.18 μm thickness is without in the two-layer of copper alloy that is the 2nd metal level (layer) of aerobic The total the thickness further layer of copper and the copper alloy of indium i.e. copper and indium alloy layer obtained so that 0.015 μm thickness carries out stacking The layer of 0.21 μm is formed.That is, metal layer pattern 2 is made up of multiple layers, closest to the layer of the 2nd transparency carrier 20 in multiple layers For copper and indium alloy layer.

Essence does not contains aerobic, is meant that when the film forming of copper alloy not import oxygen.The copper alloy meaning containing aerobic is Refer to, when the film forming of this part, such as, the oxygen of 10at% is entered for argonio conductance and carry out film forming.

The metal level (the 1st metal level and the 2nd metal level) of the two-layer being initially formed employ the magnesium of 0.5at% with The copper alloy of the aluminum (remainder is copper) of 0.5at%.

Copper and indium alloy layer is set in the copper of 78at% the copper alloy of the indium containing 22at%.

Additionally, these copper alloys contain the impurity that can not keep away of trace.Indium can be set to the addition of copper alloy 0.5at%～40at%.The fusing point of the indium of monomer is relatively low, and the copper containing the indium being added with the addition more than 50at% closes Gold, worries its thermostability.

Indium possessing 22at% etc. rich in the tin-copper alloy film of the copper and indium alloy layer of indium, heat treatment step after film forming and by Indium sesquioxide., the formation of inhibited oxidation copper was formed before the time passes through and forms copper oxide.Indium sesquioxide. can become good leading Electrolemma, damages electrical contact the most hardly.In the case of the formation of copper oxide is less, it is possible to easy and cover portion of terminal Nesa coating is electrically connected, it is possible to increase with manufacturing process and install relevant reliability.

Additionally, the reflected colour on the surface of copper and indium alloy layer becomes connects subalbous color, it is possible to avoid being caused by copper monomer Red color development.Centreization about reflected colour, it is not limited to indium, it is also possible to adjust adding of foregoing illustrative alloying element Add ratio to realize.Embodiments of the present invention these technology relevant with copper alloy disclosed, it is possible to be applied to array base palte The metal line 40 of 23.

Rich in the copper and indium alloy of indium, refer to the copper and indium alloy of the indium containing 10～40at%.By rich in indium, it is possible to Suppress to form copper oxide in surface portion, the most easily carry out electrical contact.

Such as, using copper-titanium alloy as surface layer, by copper alloy inside be set to thin alloy (alloying element be 3at% Following copper alloy) the double-deck tin-copper alloy film constituted in, if titanium is more than 10at% relative to copper, then erosion during Wet-type etching Quarter rate step-down.In this case, the etching causing the tin-copper alloy film of the surface portion rich in titanium to remain with hat is bad.

In copper and indium alloy, even if the amount of alloying element is divided in the way of different on the film thickness direction of this tin-copper alloy film Cloth, is not easy to produce this etching bad.Indium, to the copper and indium alloy that the addition of copper alloy is 0.5at%～40at%, has Thermostability to about 500 DEG C, the most such as, can fully tackle and possess IGZO etc. as the thin film transistor (TFT) of channel layer Array base palte, from the annealing of the scopes of 350 DEG C to 500 DEG C.The metal line 40 of array base palte 23 can be by copper and indium Alloy is formed.

In the present embodiment, transparent electrode pattern 6 is used as detecting electrode when touch sensing, uses when liquid crystal drive As the common electrode being applied with the voltage that liquid crystal is driven between itself and pixel electrode 25.When touch sensing, respectively Individual detecting electrode becomes the most common current potential of same current potential, such as, can also be formed by connecting as " earthing potential " with the framework of electric conductivity. Touch sensing drives and can carry out respectively in different timing timesharing from liquid crystal drive.

(the 4th embodiment)

It follows that the 4th embodiment of the present invention is illustrated with reference to Figure 18 and Figure 19, but for above-mentioned enforcement The position that mode is identical gives identical symbol and the description thereof will be omitted, only illustrates difference.

As shown in Figure 18, the display part 112 of present embodiment has the liquid crystal display dress possessing color filter (R, G, B) Put with substrate 22B, liquid crystal layer 24 and array base palte 23B.

The transparent electrode pattern 6 being had at base plate for liquid crystal display device 22B opposed with the 2nd transparency carrier 20 Face, is formed with recess 6a.When the vertical view that Z in the stacking direction observes, recess 6a is formed at and the 1st direction of pixel openings portion 4a The position of the transparent electrode pattern 6 that the central part of X is overlapping.Recess 6a extends along the 2nd direction Y.For instance, it is possible to will be in transparent tree The resin material used in the formation of lipid layer 5 is set to the photoresist of alkali soluble, is formed by known photoetching method Recess 6a.The response high speed of liquid crystal molecule 24a～24l of the liquid crystal layer 24 configured at the position opposed with recess 6a.

Base plate for liquid crystal display device 22B has alignment films 71 between transparent electrode pattern 6 and liquid crystal layer 24.

Eliminate the pixel of symbol, be that line is symmetrical when overlooking relative to Central Line M, this Central Line M be formed as polygon The side of the pixel openings portion 2a of shape is parallel and pixel is halved.

In array base palte 23B, replace the pixel electrode 25 of array base palte 23, and possess a pair pixel corresponding with each pixel Electrode 25a, 25b, auxiliary capacitance electrode 56a, 56b and alignment films 72.

Pixel electrode 25a, 25b and auxiliary capacitance electrode 56a, 56b configure symmetrically relative to Central Line M line respectively. Auxiliary capacitance electrode 56a, 56b are arranged in multiple liquid crystal layer 24 the i.e. insulating barrier 28a's of insulating barrier 28 closest to liquid crystal layer 24 With pixel electrode 25a, 25b opposition side.That is, auxiliary capacitance electrode 56a, 56b is on stacked direction Z, is formed via insulating barrier 28a Than pixel electrode 25a, 25b further from the position of liquid crystal layer 24.

When observing abreast with stacked direction Z, overlapping portion (a part of) R6 of auxiliary capacitance electrode 56a and pixel electrode 25a is overlapping, and extension (remainder) R7 of auxiliary capacitance electrode 56a is not overlapping with pixel electrode 25a.Equally, with stacking When direction Z observes abreast, overlapping portion (a part of) R8 of auxiliary capacitance electrode 56b is overlapping with pixel electrode 25b, auxiliary capacitor Extension (remainder) R9 of electrode 56b is not overlapping with pixel electrode 25b.The extension R7 of auxiliary capacitance electrode 56a and The extension R9 of auxiliary capacitance electrode 56b along the length (overhang) of the 1st direction X, such as, can be about 1 μm to 6 μm etc. like that Less.The overhang of extension R7, R9 suitably can be adjusted according to liquid crystal material, drive condition, the thickness etc. of liquid crystal layer 24 Whole.

Compared with pixel electrode 25a, auxiliary capacitance electrode 56a is further from Central Line M.That is, with auxiliary capacitance electrode 56a's Overlapping portion R6 compares, extension R7 is further from Central Line M.

Auxiliary capacitance electrode 56a, 56b can be set to the transparency electrode figure possessed with base plate for liquid crystal display device 22B What case 6 was identical determines the most common current potential of current potential or earthing potential.Or, pixel electrode 25a, 25b are being applied liquid crystal drive electricity During pressure, it is possible to auxiliary capacitance electrode 56a, 56b are being set to the current potential different from this liquid crystal drive voltage or rightabout (just, Negative is anti-) current potential.

Owing to transparent electrode pattern 6 is for determine current potential, therefore by auxiliary capacitance electrode 56a, 56b are applied not in short time Same current potential, it is possible to prevent burning of liquid crystal, or can be used in the high speed of liquid crystal response.

Between the overlapping portion R6 of pixel electrode 25a and auxiliary capacitance electrode 56a and pixel electrode 25b with auxiliary electricity Hold between the overlapping portion R8 of electrode 56b, be respectively formed with auxiliary capacitor.

The position that Z in the stacking direction between insulating barrier 28 is overlapping with recess 6a when observing, is provided with light-shielding pattern 73. Light-shielding pattern 73 is formed by the material identical with holding wire 41.

Auxiliary capacitance electrode 56a, 56b and pixel electrode 25a, 25b are formed by nesa coatings such as ITO.Pixel electricity Pole 25a, 25b electrically connect with not shown thin film transistor (TFT) 45, and are applied in liquid crystal drive voltage via thin film transistor (TFT) 45.

Liquid crystal molecule 24a～24l of liquid crystal layer 24 has negative dielectric constant anisotropy.In Figure 18, liquid crystal molecule 24a ～24l shows that pixel electrode 25a, 25b are not applied to the initial orientation state of voltage.

Alignment films 71,72 is so that the long side direction of liquid crystal molecule 24a～24l is from stacked direction Z-direction auxiliary capacitance electrode Direction that 56a, 56b and pixel electrode stagger (by close to the end of the 1st transparency carrier 10 from Central Line M away from the way of) tilt Mode, to liquid crystal molecule give pretilt theta.

Display part 112, as common display part, possesses polarization plates, polarizer etc., omits diagram in this Figure 18.

Additionally, display part 112 can also possess and 1 to 3 polarizer of polarization plates laminating.

Present embodiment set forth below in, be used as and transparent electrode pattern 6 by auxiliary capacitance electrode 56a, 56b Situation for idiostatic common electrode illustrates.

Alignment films 71,72 so that liquid crystal molecule 24a～24l from stacked direction Z-direction auxiliary capacitance electrode 56a, 56b from pixel The direction that electrode 25a, 25b stretch out tilts and becomes, relative to Central Line M, the mode that line is symmetrical, gives pre-dumping to liquid crystal molecule Angle θ.Alignment films 72 is at least formed between surface and the liquid crystal layer 24 of pixel electrode 25a, 25b.

The display part 112 of present embodiment such as by by base plate for liquid crystal display device 22B and array base palte 23B via Liquid crystal layer 24 laminating is formed.In orientation process, it is possible to pixel electrode 25a, 25b are applied liquid crystal drive voltage (such as, 1V Exchange or the voltage of direct current to 20V) while vertical orientated alignment films 71,72 is irradiated the electromagnetic waves such as light, give Pretilt theta.The light used in orientation process, can be polarized light, can also be non-polarized light.

In the present embodiment, the normal direction (stacked direction Z) of real estate being set to 0 °, pretilt theta represents and normal Direction angulation.Additionally, pretilt theta such as can pass through Journal of Applied Physics, Vol.48No.5, P.1783-1792 the crystal rotation method etc. described in (1977) measures.

If pixel electrode 25a, 25b are applied with liquid crystal drive voltage, the most as shown in Figure 19, pixel electrode 25a, Between 25b and auxiliary capacitance electrode 56a, 56b (being extension R7, R9 in more detail), it is formed and is showed by electric lines of force L9 Electric field.Meanwhile, it is formed between pixel electrode 25a, 25b and transparent electrode pattern 6 by vertical direction, the electric power of incline direction The electric field of line L10 performance.Liquid crystal molecule 24a～24f electric field based on such incline direction, the side in the 1st direction X is i.e. Direction of action D1 tilts.Illustrate in greater detail for, after upon being applied with liquid crystal drive voltage, liquid crystal molecule 24a, 24b, 24f just tilts, and is affected by liquid crystal molecule 24a, 24b, the 24f tilted, and liquid crystal molecule 24c～24e is immediately to direction of action D1 topples over.

Liquid crystal molecule 24g～24l tilts to direction of action D2 contrary with direction of action D1.It is in the strongest electricity Liquid crystal molecule 24a, 24l of field, full out action, become the triggering for making liquid crystal display high speed.It is in tilting electric field Liquid crystal molecule 24b～24f, 24g～24k, also as liquid crystal molecule 24a, 24l, carry out action at high speed.Liquid crystal molecule 24b～ 24f, 24g～24k carry out action, thus liquid crystal display high speed in phase with liquid crystal molecule 24a, 24l phase.

By utilizing tilting electric field to make liquid crystal molecule 24a～24l tilt, even thus having as in the present embodiment Liquid crystal molecule 24a～24l of less pretilt theta, it is also possible to make it drive as substantially having bigger tilt angle.Cause This, by utilizing tilting electric field to make liquid crystal molecule 24a～24l tilt, it is possible to realize the high speed of liquid crystal display.

Such as, by utilizing tilting electric field to make liquid crystal molecule 24a～24l tilt, even the most about 0.1 ° to 0.9 ° The less pretilt theta of scope, it is also possible to make liquid crystal molecule 24a～24l action at high speed.Additionally, at vertical orientated liquid crystal In display, although the liquid crystal molecule that tilt angle is bigger is easily toppled over, but owing to having bigger tilt angle, even if therefore black aobvious There is also light leak when showing, have the trend that contrast reduces.

Additionally, in the present embodiment, about employing touching of touch electrode i.e. black electrodes 4 and transparent electrode pattern 6 Touching sensing, it constitutes and as driving means and above-mentioned 1st embodiment etc., therefore omits the description.

Above, referring to the drawings the 1st embodiment and the 4th embodiment of the present invention is described in detail, but specifically Composition be not limited to this embodiment, also include the change of the composition of the scope without departing from present subject matter, combine, delete Deng.Further, it is possible to the composition shown in each embodiment is appropriately respectively combined and utilizes.

Such as, in above-mentioned 1st embodiment to the 4th embodiment, thin film transistor (TFT) 45 is to be used by oxide semiconductor Thin film transistor (TFT) in channel layer but it also may be the thin film transistor (TFT) that silicon semiconductor is used for channel layer.

The liquid crystal drive mode of liquid crystal indicator is set to vertical orientated (VA) mode, but is not limited to this.Liquid crystal The liquid crystal drive mode of showing device in addition, such as, can also properly select use HAN (Hybrid-aligned Nematic)、TN(Twisted Nematic)、OCB(Optically Compensated Bend)、CPA(Continuous Pinwheel Alignment)、ECB(Electrically Controlled Birefringence)、TBA(Transverse Bent Alignment) etc. vertical Electric Field Mode, tilting electric field mode.

Being set to black electrodes 4 i.e. metal layer pattern 2 for scan electrode and transparent electrode pattern 6 is detecting electrode.

But it is also possible to transparent electrode pattern 6 as drive electrode and the black electrodes mode as detecting electrode, will drive The effect of moving electrode and detecting electrode is exchanged and is used.Or, it is also possible to it is set to respective formation direction is being exchanged 90 degree just Copulation is put.

The explanation of symbol

1 the 1st light absorption resin bed pattern

1a, 2a, 3a pixel openings portion (peristome)

2 metal layer patterns

3 the 2nd light absorption resin bed patterns

5 transparent resin layers

6 transparent electrode patterns

10 the 1st transparency carriers

10a interarea (face)

16 auxiliary conductors

22,22A, 22B base plate for liquid crystal display device (display base plate)

23,23B array base palte

24 liquid crystal layers

25,25a, 25b pixel electrode

28,28a insulating barrier

40 metal lines

45 thin film transistor (TFT)s

46 channel layers

56a, 56b auxiliary capacitance electrode

100 liquid crystal indicators

110,111,112 display part

120 control portions

B blue pixel

G green pixel

R red pixel

R6, R8 overlapping portion (a part of)

R7, R9 extension (remainder)

X the 1st direction

Y the 2nd direction

Z stacked direction

Claims (according to the amendment of treaty the 19th article)

1. a kind of liquid crystal indicator [after amendment], possesses:

Display part, is stacked gradually by display base plate, liquid crystal layer and array base palte and forms；And

Control portion, is controlled above-mentioned display part and touch sense function,

Above-mentioned display base plate is sequentially laminated with on the face opposed with above-mentioned liquid crystal layer of the 1st transparency carrier: be formed with peristome Multiple 1st light absorption resin bed patterns, be formed with multiple metal layer patterns of peristome, be formed with multiple the of peristome 2 light absorption resin bed patterns, transparent resin layer and the most independent multiple transparent electrode patterns,

When observing along the stacked direction of above-mentioned display base plate, above-mentioned liquid crystal layer and above-mentioned array base palte stacking, Duo Geshang State the 1st light absorption resin bed pattern, multiple above-mentioned metal layer pattern and multiple above-mentioned 2nd light absorption resin bed pattern tool There is the most equal setting-out width, and, be formed as same shape and overlap,

Multiple above-mentioned metal layer patterns arrange on 1st direction orthogonal with above-mentioned stacked direction with the state of mutually insulated joins Put,

Multiple above-mentioned transparent electrode patterns are the most just being distinguished with above-mentioned stacked direction and above-mentioned 1st direction with the state of mutually insulated It is arranged on the 2nd direction handed over,

Each above-mentioned metal layer pattern has with at least one party in alloy-layer that copper is main material and layers of copper,

Above-mentioned array base palte have on the face opposed with above-mentioned liquid crystal layer of the 2nd transparency carrier pixel electrode, thin film transistor (TFT), Metal line and the insulating barrier of multilamellar,

The liquid crystal molecule that above-mentioned liquid crystal layer is had has negative dielectric constant anisotropy,

The initial orientation direction of above-mentioned liquid crystal molecule is vertical direction,

Above-mentioned liquid crystal layer is driven by the vertical electric field having between transparency electrode and the pixel electrodes of above-mentioned transparent electrode pattern It is dynamic,

In above-mentioned touch sense function, above-mentioned transparency electrode be across high resistance body ground connection have determine current potential detection electricity Pole, multiple above-mentioned metal layer patterns are drive electrode, to multiple above-mentioned transparent electrode patterns and multiple above-mentioned metal layer patterns it Between apply to touch driving voltage, detect direct capacitance between multiple above-mentioned metal layer pattern and multiple above-mentioned transparent electrode pattern Change,

The frequency of liquid crystal drive voltage determining to be applied between above-mentioned transparency electrode and the pixel electrodes of current potential is touched with above-mentioned The frequency touching driving voltage is different.

2. liquid crystal indicator as claimed in claim 1, wherein,

Above-mentioned array base palte possesses: pixel electrodes；And auxiliary capacitance electrode, upper across connect with pixel electrodes State insulating barrier, be arranged in and above-mentioned liquid crystal layer opposition side,

Above-mentioned auxiliary capacitance electrode forms the overlapping portion between pixel electrodes and above-mentioned auxiliary capacitor electricity when overlooking The extension that pole is stretched out from pixel electrodes,

Line configures symmetrically relative to the Central Line by above-mentioned peristome two decile for above-mentioned overlapping portion and above-mentioned extension,

Above-mentioned auxiliary capacitance electrode is applied in the voltage different from above-mentioned liquid crystal drive voltage.

3. liquid crystal indicator as claimed in claim 1, wherein,

Above-mentioned thin film transistor (TFT) possesses the channel layer containing the metal-oxide of more than two kinds in gallium, indium, zinc, stannum, germanium.

4. liquid crystal indicator as claimed in claim 1, wherein,

Each above-mentioned metal layer pattern is made up of multilamellar,

At least one of multiple above-mentioned layers is above-mentioned alloy-layer.

5. liquid crystal indicator as claimed in claim 1, wherein,

Each above-mentioned metal layer pattern has above-mentioned alloy-layer,

Alloying element contained by above-mentioned alloy-layer be from magnesium, calcium, titanium, molybdenum, indium, stannum, zinc, aluminum, beryllium, nickel select a kind with On element.

6. liquid crystal indicator as claimed in claim 1, wherein,

Each above-mentioned metal layer pattern is made up of multilamellar,

In multiple above-mentioned layers, the layer closest to above-mentioned 2nd transparency carrier is copper and indium alloy layer.

7. liquid crystal indicator as claimed in claim 1, wherein,

Multiple above-mentioned transparent electrode patterns possess the auxiliary conductor that the resistivity of the above-mentioned transparent electrode pattern of resistivity ratio is little.

8. liquid crystal indicator as claimed in claim 1, wherein,

The above-mentioned peristome of above-mentioned 1st light absorption resin bed pattern, the above-mentioned peristome of above-mentioned metal layer pattern and on State the above-mentioned peristome of the 2nd light absorption resin bed pattern, possess formed by red color layer red pixel, formed by green layer Any one in green pixel and the blue pixel that formed by cyan coloring layer,

These red pixels, green pixel and blue pixel are inserted in multiple above-mentioned metal layer pattern along above-mentioned stacked direction And between above-mentioned transparent resin layer, and it is adjacent to respectively when observing along above-mentioned stacked direction arrange.

9. [delete]

Illustrate or state (according to the amendment of treaty the 19th article)

Amended claim 1 be dependent on the initial description 0045,0052,0054,0059,0064 section of application with And claim 1 and claim 9.Additionally, along with the amendment of claim 1, delete claim 9.

Claims

1. a liquid crystal indicator, possesses:

When observing along the stacked direction of above-mentioned display base plate, above-mentioned liquid crystal layer and above-mentioned array base palte stacking, Duo Geshang State the 1st light absorption resin bed pattern, multiple above-mentioned metal layer pattern and multiple above-mentioned 2nd light absorption resin bed pattern shape Become same shape and overlap,

Above-mentioned touch sense function at least includes following function: be set to determine current potential by multiple above-mentioned transparent electrode patterns, to multiple Apply between above-mentioned transparent electrode pattern and multiple above-mentioned metal layer pattern to touch driving voltage, to above-mentioned metal layer pattern with upper State the function that the change of the direct capacitance between transparent electrode pattern carries out detecting,

In the driving of above-mentioned liquid crystal layer, it is set to determine current potential by multiple above-mentioned transparent electrode patterns, to multiple above-mentioned transparency electrodes Apply liquid crystal drive voltage between pattern and pixel electrodes and above-mentioned liquid crystal layer is driven, and, above-mentioned touch is driven The frequency of galvanic electricity pressure is different from the frequency of above-mentioned liquid crystal drive voltage.

2. liquid crystal indicator as claimed in claim 1, wherein,

3. liquid crystal indicator as claimed in claim 1, wherein,

4. liquid crystal indicator as claimed in claim 1, wherein,

Each above-mentioned metal layer pattern is made up of multilamellar,

At least one of multiple above-mentioned layers is above-mentioned alloy-layer.

5. liquid crystal indicator as claimed in claim 1, wherein,

Each above-mentioned metal layer pattern has above-mentioned alloy-layer,

6. liquid crystal indicator as claimed in claim 1, wherein,

Each above-mentioned metal layer pattern is made up of multilamellar,

7. liquid crystal indicator as claimed in claim 1, wherein,

8. liquid crystal indicator as claimed in claim 1, wherein,

9. liquid crystal indicator as claimed in claim 1, wherein,

The liquid crystal molecule that above-mentioned liquid crystal layer is had has negative dielectric constant anisotropy, and initial orientation direction is vertical Direction.