CN1060570C - Sculpture technology for composite containing polyurethane - Google Patents
Sculpture technology for composite containing polyurethane Download PDFInfo
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- CN1060570C CN1060570C CN 96116473 CN96116473A CN1060570C CN 1060570 C CN1060570 C CN 1060570C CN 96116473 CN96116473 CN 96116473 CN 96116473 A CN96116473 A CN 96116473A CN 1060570 C CN1060570 C CN 1060570C
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- polyurethane
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Abstract
The present invention relates to an etching technology of a composite containing polyurethane. The technology uses 0.5% to 5% (weight) of alkali metal hydroxide alcoholic solution as an etching agent, at the temperature of 10 DEG C to 40 DEG C, the etching operation is carried out for 24 hours to 300 hours, the polyurethane components in copolymer are effectively etched, and the phase structure of the copolymer is reflected. The present invention can be widely used for the etching operation of the composite containing the polyurethane.
Description
The present invention relates to the lithographic method that the STUDY ON Scanning Electron Microscope high polymer alloy is used, particularly contain the lithographic method of urethane composition about STUDY ON Scanning Electron Microscope.
Scanning electron microscope is widely used in studying the form and the phase structure of polymer blend because sample preparation is quick, easy.The zone that black and white is different on the stereoscan photograph is because the pattern on sample respective regions surface determines.Under individual cases, for example when sample be two phase structure, and disperse phase is when being spherical particle, on the cold section of low temperature, dispersed phase particles or protrude in and observe the surface or only stay pothole on the surface, this moment, surface topography directly reflected two phase structure.Yet in most of the cases, the two phase structure of blend is often covered by the surface topography of sample, thus the conclusion that leads to errors.In order to obtain the real phase structure of blend, adopt solvent or reagent that less important composition dissolving or branch in two phase compositions are taken off usually, real phase structure is fully come out.Therefore, to the polymer blend of forming by two or more polymkeric substance, it is even more important that the selection of etching agent and etching condition just seems, should guarantee the adequacy to disperse phase (minor consistuent) etching, avoids etching agent to external phase (main component) structural damage again.Only in this way, could clearly observe the true form of each component in the blend.
For the blend that contains polyurethane elastomer, can't find a kind ofly to make polyurethane dissolving and to the undissolved suitable solvent of other component of polymkeric substance in the past.Document Journal of Applied polymer Science, Vol.50 has introduced the lithographic technique of polyurethane/styrene-acrylonitrile random copolymer composition among the 719-727 (1993).But only introduced the technology of etching styrene-acrylonitrile random copolymers in the document, thereby the form of composition can not observe polyurethane as minor consistuent the time.In order to overcome the shortcoming that conventional art exists, provide a kind of can be with scanning electron microscopic observation to the technology that contains the urethane composition true form, the present inventor has invented the lithographic technique that is used to contain urethane composition.
Technical purpose of the present invention is to realize by following technical scheme: a kind of lithographic method that is used to contain urethane composition, etching agent to polyurethane component is the alcoholic solution of alkali metal hydroxide, its concentration percent by weight is 0.5～5%, etching time is 24～300 hours, and etching temperature is 10～40 ℃.
Above-mentioned etching agent alkali metal hydroxide is NaOH or potassium hydroxide.Alkali metal hydroxide alcoholic solution concentration percent by weight preferable range is 1～2%, and the etching time preferable range is 120～240 hours, and the etching temperature preferable range is 20～30 ℃.
Fig. 1 wherein, Fig. 2, Fig. 3, Fig. 4 is respectively the random copolymers of styrene-acrylonitrile and the composition that thermoplastic polyurethane forms, wherein the ratio of the random copolymers of styrene-acrylonitrile and thermoplastic polyurethane is 90: 10,80: 20,70: 30,60: 40, with the electromicroscopic photograph after the alkali metal alcohol solution etching polyurethane component, Fig. 5 is the random copolymers of styrene-acrylonitrile and the ternary composition of polyurethane component and ethylene-vinyl acetate formation, with the electromicroscopic photograph after the alkali metal alcohol solution etching polyurethane component.
Present technique is utilized the hydrolyzable of polyurethane, adopt the chemical etchant of alkali metal hydroxide alcoholic solution as polyurethane, the polyurethane component that contains in two yuan of polyurethane component or the ternary composition is carried out etching, obtained the real phase structure of composition, obtained the good technical effect.
[embodiment 1]
The composition that forms with the thermoplastic polyurethane of the random copolymers and 10% (weight) of the styrene-acrylonitrile of STUDY ON Scanning Electron Microscope 90% (weight), with the NaOH alcoholic solution of 2% (weight) etching agent as polyurethane component, under 20 ℃ of temperature conditions of temperature, after the etching 60 hours, from Fig. 1, can observe, polyurethane component has obtained good dispersion in the random copolymers external phase of styrene-acrylonitrile, dispersed phase size is in the great majority at 0.5 μ m.[embodiment 2]
The composition that forms with the thermoplastic polyurethane of the random copolymers and 20% (weight) of the styrene-acrylonitrile of STUDY ON Scanning Electron Microscope 80% (weight), with the potassium hydroxide alcoholic solution of 0.8% (weight) etching agent as polyurethane component, under 25 ℃ of temperature conditions, after the etching 150 hours, can observe from Fig. 2, polyurethane component has obtained good dispersion in the random copolymers external phase of styrene-acrylonitrile.[embodiment 3]
The composition that forms with the thermoplastic polyurethane of the random copolymers and 30% (weight) of the styrene-acrylonitrile of STUDY ON Scanning Electron Microscope 70% (weight), with the NaOH alcoholic solution of 4% (weight) etching agent as polyurethane component, under 30 ℃ of temperature conditions, after the etching 240 hours, can observe from Fig. 3, polyurethane component has obtained good dispersion in the random copolymers external phase of styrene-acrylonitrile.[embodiment 4]
The composition that forms with the thermoplastic polyurethane of the random copolymers and 40% (weight) of the styrene-acrylonitrile of STUDY ON Scanning Electron Microscope 60% (weight), with the NaOH alcoholic solution of 1.5% (weight) etching agent as polyurethane component, under 25 ℃ of temperature conditions, after the etching 200 hours, can observe from Fig. 4, polyurethane component has obtained good dispersion in the random copolymers external phase of styrene-acrylonitrile.[embodiment 5]
Contain the thermoplastic polyurethane of random copolymers and 5% (weight) of styrene-acrylonitrile of 76% (weight) and the ternary composition that 19% ethylene-vinyl acetate forms with STUDY ON Scanning Electron Microscope, with the NaOH alcoholic solution of 1.0% (weight) etching agent as polyurethane component, under 26 ℃ of temperature conditions, after the etching 160 hours, after from Fig. 5, can observing polyurethane component and being etched, the ethylene-vinyl acetate disperse phase is by the embedding of polyurethane component institute, polyurethane component is positioned on the interface of random copolymers external phase of ethylene-vinyl acetate disperse phase and styrene-acrylonitrile, has played compatilizer.
Claims (4)
1. lithographic method that is used to contain urethane composition, the etching agent that it is characterized in that polyurethane component is the alcoholic solution of alkali metal hydroxide, and the concentration percent by weight is 0.5～5%, and etching time is 24～300 hours, and etching temperature is 10～40 ℃.
2. according to the described lithographic method that is used to contain urethane composition of claim 1, it is characterized in that alkali metal hydroxide is NaOH or potassium hydroxide.
3. according to the described lithographic method that is used to contain urethane composition of claim 1, the concentration percent by weight that it is characterized in that the alkali metal hydroxide alcoholic solution is 1～2%.
4. according to the described lithographic method that is used to contain urethane composition of claim 1, the time that it is characterized in that the etching polyurethane component is 120～240 hours, and temperature is 20～30 ℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 96116473 CN1060570C (en) | 1996-08-20 | 1996-08-20 | Sculpture technology for composite containing polyurethane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 96116473 CN1060570C (en) | 1996-08-20 | 1996-08-20 | Sculpture technology for composite containing polyurethane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1174342A CN1174342A (en) | 1998-02-25 |
| CN1060570C true CN1060570C (en) | 2001-01-10 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 96116473 Expired - Fee Related CN1060570C (en) | 1996-08-20 | 1996-08-20 | Sculpture technology for composite containing polyurethane |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1060570C (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108330703B (en) * | 2018-04-04 | 2021-03-23 | 深圳歌力思服饰股份有限公司 | Waterproof and warm-keeping fabric with otter fur-like structure and preparation method thereof |
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1996
- 1996-08-20 CN CN 96116473 patent/CN1060570C/en not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| CN1174342A (en) | 1998-02-25 |
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| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C06 | Publication | ||
| PB01 | Publication | ||
| C14 | Grant of patent or utility model | ||
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| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20010110 Termination date: 20100820 |