CN106054537A - 一种用于毛细管放电euv光源的负载系统 - Google Patents
一种用于毛细管放电euv光源的负载系统 Download PDFInfo
- Publication number
- CN106054537A CN106054537A CN201610378019.9A CN201610378019A CN106054537A CN 106054537 A CN106054537 A CN 106054537A CN 201610378019 A CN201610378019 A CN 201610378019A CN 106054537 A CN106054537 A CN 106054537A
- Authority
- CN
- China
- Prior art keywords
- main pulse
- holes
- field electrode
- symmetrically arranged
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610378019.9A CN106054537B (zh) | 2016-05-31 | 2016-05-31 | 一种用于毛细管放电euv光源的负载系统 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610378019.9A CN106054537B (zh) | 2016-05-31 | 2016-05-31 | 一种用于毛细管放电euv光源的负载系统 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106054537A true CN106054537A (zh) | 2016-10-26 |
CN106054537B CN106054537B (zh) | 2017-11-03 |
Family
ID=57172563
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610378019.9A Active CN106054537B (zh) | 2016-05-31 | 2016-05-31 | 一种用于毛细管放电euv光源的负载系统 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106054537B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109026965A (zh) * | 2018-08-16 | 2018-12-18 | 株洲联诚集团控股股份有限公司 | 一种电动汽车高压箱内部绝缘支撑座 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005268186A (ja) * | 2004-03-22 | 2005-09-29 | Kazuhiko Horioka | プラズマ発生装置 |
US20120281189A1 (en) * | 2011-05-04 | 2012-11-08 | Media Lario S.R.L | Evaporative thermal management of grazing incidence collectors for EUV lithography |
CN104619104A (zh) * | 2015-02-16 | 2015-05-13 | 哈尔滨工业大学 | Xe介质毛细管放电检测用极紫外光源系统 |
CN104619105A (zh) * | 2015-02-16 | 2015-05-13 | 哈尔滨工业大学 | Xe介质毛细管放电检测用极紫外光源的放电室 |
-
2016
- 2016-05-31 CN CN201610378019.9A patent/CN106054537B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005268186A (ja) * | 2004-03-22 | 2005-09-29 | Kazuhiko Horioka | プラズマ発生装置 |
US20120281189A1 (en) * | 2011-05-04 | 2012-11-08 | Media Lario S.R.L | Evaporative thermal management of grazing incidence collectors for EUV lithography |
CN104619104A (zh) * | 2015-02-16 | 2015-05-13 | 哈尔滨工业大学 | Xe介质毛细管放电检测用极紫外光源系统 |
CN104619105A (zh) * | 2015-02-16 | 2015-05-13 | 哈尔滨工业大学 | Xe介质毛细管放电检测用极紫外光源的放电室 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109026965A (zh) * | 2018-08-16 | 2018-12-18 | 株洲联诚集团控股股份有限公司 | 一种电动汽车高压箱内部绝缘支撑座 |
Also Published As
Publication number | Publication date |
---|---|
CN106054537B (zh) | 2017-11-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100851901B1 (ko) | 이온 빔 추출장치 | |
JP4866243B2 (ja) | プラズマ処理システムにおいて基板を最適化する方法および装置 | |
JP6146535B2 (ja) | 方向性電磁鋼板の製造方法 | |
US20050217797A1 (en) | Methods and array for creating a mathematical model of a plasma processing system | |
WO2006120942A1 (ja) | プラズマ発生装置及びプラズマ発生方法 | |
JPS5531154A (en) | Plasma etching apparatus | |
CN106054537A (zh) | 一种用于毛细管放电euv光源的负载系统 | |
JP2007507848A (ja) | プラズマインピーダンスを決定するための方法及び装置 | |
TW200642980A (en) | Photosensitive thick-film dielectric paste composition and method for making an insulating layer using same | |
CN109696797A (zh) | Lele双重图形工艺方法 | |
CN105739249A (zh) | 激光辅助放电极紫外光源预电离等离子体电子温度测量方法 | |
Nehmadi et al. | Magnetic pulse compression for a copper vapour laser | |
CN106653336B (zh) | 一种制备具有简化误差测试功能的电流互感器的方法 | |
Mohammadi et al. | High frequency transformer design for specific static magnetising and leakage inductances using combination of multi-layer perceptron neural networks and fem simulations | |
CN113835313A (zh) | 一种基于高次谐波的极紫外光刻曝光方法 | |
JPS5770469A (en) | Method for measurement of parallel ground resistance | |
CN104619105B (zh) | Xe介质毛细管放电检测用极紫外光源的放电室 | |
CN112906254A (zh) | 一种变压器绕组漏磁场仿真建模方法 | |
CN102346380A (zh) | 基于归一化最速下降法光刻配置参数的优化方法 | |
Larigaldie | Study of the breakdown phase in a pseudospark switch. I. Basis experiments and crude model | |
CN102956505A (zh) | 开关管的制作方法、阵列基板的制作方法 | |
CN106154770B (zh) | 一种显影均匀性检测方法 | |
KR20040046702A (ko) | 이중 노광을 이용한 반도체 소자의 미세 패턴 형성방법 | |
Horne et al. | Development of a high-pulse-rate EUV source | |
TW445397B (en) | Method of etching apertures in a thin metal sheet to form a shadow mask for a color picture tube |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20210113 Address after: Building 9, accelerator, 14955 Zhongyuan Avenue, Songbei District, Harbin City, Heilongjiang Province Patentee after: INDUSTRIAL TECHNOLOGY Research Institute OF HEILONGJIANG PROVINCE Address before: 150001 No. 92 West straight street, Nangang District, Heilongjiang, Harbin Patentee before: HARBIN INSTITUTE OF TECHNOLOGY |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20230714 Address after: 150027 Room 412, Unit 1, No. 14955, Zhongyuan Avenue, Building 9, Innovation and Entrepreneurship Plaza, Science and Technology Innovation City, Harbin Hi tech Industrial Development Zone, Heilongjiang Province Patentee after: Heilongjiang Industrial Technology Research Institute Asset Management Co.,Ltd. Address before: Building 9, accelerator, 14955 Zhongyuan Avenue, Songbei District, Harbin City, Heilongjiang Province Patentee before: INDUSTRIAL TECHNOLOGY Research Institute OF HEILONGJIANG PROVINCE |
|
TR01 | Transfer of patent right |