CN106054524A - Photoresist for CTP plate aluminum plate base - Google Patents
Photoresist for CTP plate aluminum plate base Download PDFInfo
- Publication number
- CN106054524A CN106054524A CN201610461154.XA CN201610461154A CN106054524A CN 106054524 A CN106054524 A CN 106054524A CN 201610461154 A CN201610461154 A CN 201610461154A CN 106054524 A CN106054524 A CN 106054524A
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- China
- Prior art keywords
- aluminum plate
- sulfonic acid
- photoresists
- photoresist
- ctp
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
The invention discloses a photoresist for a CTP plate aluminum plate base. The photoresist comprises (1) an unsaturated water-soluble polymer with -(X)-(Y)-(Z)- structure, and the photoresist is characterized in that X represents a copolymerization unit containing a sulfonic acid group, Y represents a carboxylic acid copolymerization unit containing branches of two unsaturated double bonds, Z represents acrylic ester copolymerization unit containing one unsaturated double bond branch; and the photoresist also comprises (2) a photopolymerisable prepolymer, (3) a polyfunctional monomer, (4) one or more than one initiators for photopolymerization, and (5) one or more than one dyes or pigments. In the invention, after a photosensitive composite is used, photosensitivity of a lithograph plate is high, dot reducibility is good, after exposure through an ultraviolet light source, the plate can be directly washed with tap water or being printed on a machine without being treated by any washing processing step, and long press life can be realized.
Description
Technical field
The present invention relates to a kind of UV-CTP, specifically refer to a kind of photoresists for CTP version aluminum plate foundation.
Background technology
It is known that the lithography process of sensitive lithographic plate at least needs two steps to complete, one will be coated with photosensitive composition
Forme is exposed under specific light source by frisket (e.g., positive flap-type and negative-type frisket), forms an optical image therefrom and dives
Shadow；Two be above exposure after forme carry out a so-called follow-up development step, by this process, it is unnecessary to remove
Coating.Pre-coating sensitive lithographic is the flaky material as support with aluminum or polyester, and can be prepared by above-mentioned two step
There is oleophylic and hydrophilic surface simultaneously, be suitable for lithographic printing.Generally, in a negative-type system, exposure position by
Polymerization or crosslinking in coating change, and become that developer solution is insoluble or indissoluble, such that it is able in development step by forme not
The coating at exposure position removes.Otherwise, in a positive flap-type system, development step is to be removed by the material at plate exposure position
Go.Development step generally includes with developing agent rinsing and washing, generally shows in a processing unit containing developing agent
Shadow.Developing agent used by positive-type sensitive lithographic plate is typically highly basic, generally possibly together with organic molten in addition to highly basic in negative developers
Agent, such as benzyl alcohol etc..Certainly, the most useful heating means of the development of optical image or alternate manner complete.
The shortcoming of two kinds of above-mentioned (the wettest and hot) developing process be time-consuming, cost is the highest.And, have when using volatility
When machine thing or highly basic are as developing agent, these waste liquid ground process and will bring environmental problem.
Along with development and the raising of people's living standard of printing industry, countries in the world are more and more higher to the requirement of environmental protection,
Thus needing a kind of forme that need not chemical treatment before printing or be not required to any process, this not only can be conducive to ring
Protect, and this is also beneficial to reduce printing cost, reduce the space of pressroom and reduce the time of presswork.
The structure of the positive flap-type forme being not required to process after imaging before printing is disclosed (as seen United States Patent (USP)
No.5,1 02,771；5,225,316 and 5,314,785).These patents disclose with containing acrylate or methacrylic acid
Forme and light acid based on the light sensitive layer of ester polymer produce system.When image is exposed under light radiation, irradiate at light
The polymer in region is decomposed to form hydrophilic, and the polymer in the region that not light irradiates keeps ink affinity.
The pre-coating photosensitive negative-type lithographic plate being not required to before printing after imaging process also is known to this field.In imaging and print
It is not required between brush process the kind of step forme in United States Patent (USP) No.3,231,378；3,285,745；With 3,409,487 in public
Open.These formes contain a kind of photosensitive composition comprising phenolic resin, ethylene oxide polymer and light sensitizer.When it exposes
Time under actinic radiation, make phenolic resin aoxidize, thus add ink affinity.The shortcoming of these formes is that they are in printing
During ink affinity easily reduce, to such an extent as to need the balance guarantee between the strict ink/water controlled on printer to print normally
Brush, the most also can make forme become inoperable.United States Patent (USP) No.3,793,033 discloses and adds people's hydroxyl second in constituent
Base cellulose esters.The forme obtained will not become blind version (i.e. during printing, lithographic plate is not subject to ink, image impairment), and only need to be on printer
Ink/water balance carries out less control.The phenolic resin that one obvious unfavorable conditions of this composition is intended to solidifying obtains
Obtain suitable printer printing.Thus need to be formed a two-layer system on prepared printing plate precursor, i.e. containing phenolic aldehyde tree
One layer of sensitizing oxidant layer should be added again in lipid layer.If being not coated with sensitizing oxidant layer so phenolic resin after hardening will divide when solidification
Solve.
The another kind of negative-type forme being not required to process in imaging and pressroom is those based on the forme of multilamellar photosensitive layer.Logical
Often, as in United States Patent (USP) No.4,600,679 and 4,104,072 and European Patent Publication No No.450, described in 199,
These structures are having a hydrophilic photosensitive layer, an extra play for photo-hardening to be connected with ground floor near version base.These
Structure generally serves to the negative-type photosensitive composition based on aromatics diazonium compound as the hydrophilic layer near version base.This
One shortcoming of a little formes is that it has scumming (i.e. background position inking) and pollutes the trend of printer.This shortcoming needs in print
First forme is cleaned with suitable abluent (i.e. fountain solution) before brush.Therefore, the addition of diazonium compound and resin is for for " nothing
Processing " forme of version is harmful.Forme disclosed in PCT Application No. No.93-05446, does not wherein have diazonium to become in hydrophilic layer
Point, it is thus eliminated that the printer pollution problem caused by the unreacted diazo substance of residual.Described version includes
Version/version base, closest to the o photopolymerizable hydrophilic layer of version base, and one second photopolymer separated near edition base is hydrophobic
Layer.Photosensitive hydrophilic layer is that the degree of functionality of version is to be exposed on by two layers based on the polymerizable material of not diazonium-containing compound
Lose water solublity and hardening under actinic radiation and obtain.This edition only needs a printer equipped with ink and fountain solution with in exposure
The leaflet that rear acquisition is good, without carrying out prewashing version before printing.Owing to this structure has outer hydrophobic layer, if before printing
Do not process remove background parts hydrophobic substance so cannot obtain with routine version identical water performance of ink.
Summary of the invention
It is an object of the invention to provide a kind of photoresists for CTP version aluminum plate foundation so that UV-CTP version is at ultraviolet
Directly can rinse or without any washing processing step with tap water after light source exposure, can be printed on the machine and available high
Pressrun.
The purpose of the present invention is achieved through the following technical solutions:
A kind of photoresists for CTP version aluminum plate foundation, comprise following six kinds of components: (1) one-(X)-(Y)-(Z)-structure
Unsaturated water-soluble polymer, and the performed polymer of (2) a kind of photopolymerization and (3) a kind of polyfunctional monomer, and (4) are a kind of
Or more than one Photoepolymerizationinitiater initiater, and (5) one or more dyestuff or pigment, and (6) one or more
Solvent；Wherein, X represents the copolymerization units containing sulfonic acid group, and Y represents the carboxylic acid of the side chain containing two unsaturated double-bonds altogether
Poly-unit, Z represents the acrylic ester copolymer unit containing a unsaturated double-bond side chain；X is selected from vinyl sulfonic acid, styrene sulphur
Acid, 2 hydroxyl-3-allyloxy-1-propyl sulfonic acid, isoprene sulfonic acid, X accounts for 17%～20% mol ratio of copolymer.
Y is the acrylic or methacrylic acid copolymerization units of the side chain containing two unsaturated double-bonds.
Y is the acrylic or methacrylic acid copolymerization units containing a unsaturated double-bond substituted GMA grafting.
Y accounts for 20%～40% mol ratio of copolymer.
Z is the acrylate containing a unsaturated double-bond substituted radical or methacrylic acid copolymer unit.
Z accounts for 30%～50% mol ratio of copolymer.
The present invention compared with prior art, has such advantages as and beneficial effect:
1, the manufacture method of sensitive lithographic plate in the present invention, through electrolyzing and coarsening and anodic oxidation the aluminium plate after carrying out sealing pores
Before being coated with the above-mentioned chemical processing-free negative graph photosensitive composition being suitable for UV-CTP on base, with the present invention-(X)-(Y)-(Z)-
The unsaturated water-soluble polymer of structure carries out hydrophilicity-imparting treatment to aluminum substrate.This sensitive lithographic plate is adapted for use with UV-CTP platemaking machine
Plate-making.This sensitive lithographic plate, after using UV-CTP platemaking machine scan exposure, can not use developing liquid developing to use tap water to rush
Wash, i.e. obtain printable sensitive lithographic plate.This sensitive lithographic plate is after using UV-CTP platemaking machine scan exposure, straight without any process
Connect and can lock up press printing；
2, due to the fact that employing component and method, be allowed to have plurality of advantages, i.e. light sensitivitys is high, redeeming a vow to a god property of site is good, with
Directly can rinse with tap water or can be printed on the machine without any washing processing step after ultraviolet light source exposure.Forme picture and text
Part lipophile is good, and blank parts does not goes up dirty, and available high pressrun, is especially suitable for UV-CTP platemaking machine.
Detailed description of the invention
For making the object, technical solutions and advantages of the present invention clearer, below in conjunction with embodiment, the present invention is made
Further describing in detail, the exemplary embodiment of the present invention and explanation thereof are only used for explaining the present invention, are not intended as this
The restriction of invention.
Embodiment 1
The present invention is suitable for the chemical processing-free negative graph photosensitive composition of UV-CTP and mainly comprises following six kinds of components: (1) is a kind of
The unsaturated water-soluble polymer of-(X)-(Y)-(Z)-structure, and the performed polymer of (2) a kind of photopolymerization and (3) a kind of many officials
Can single group body, and (4) one or more Photoepolymerizationinitiater initiater, and (5) one or more dyestuff or pigment, and
(6) one or more solvent；Wherein, X represents the copolymerization units containing sulfonic acid group, and Y represents containing two unsaturations
The carboxyl acid copolymer unit of the side chain of double bond, Z represents the acrylic ester copolymer unit containing a unsaturated double-bond side chain.
In the present invention, X is selected from vinyl sulfonic acid, styrene sulfonic acid, 2-hydroxyl-3-allyloxy-1-propyl sulfonic acid, isoamyl
Diene sulfonic acid.X accounts for 17% mol ratio of copolymer.Y is the acrylic or methacrylic of the side chain containing two unsaturated double-bonds
Acid copolymerization units.Or, Y is the acrylic or methacrylic acid copolymerization list containing a unsaturated double-bond substituted GMA grafting
Unit.Y accounts for 20% mol ratio of copolymer.Z be the acrylate containing a unsaturated double-bond substituted radical or methacrylic acid altogether
Poly-unit.Z accounts for 30% mol ratio of copolymer.In the unsaturated water-soluble polymer of-(X)-(Y)-(Z)-structure, unsaturated double
Key sum accounts for 60% mol ratio of polymer.
In the present invention be coated with in electrolyzing and coarsening and anodic oxidation the aluminum substrate after carrying out sealing pores above-mentioned
It is suitable for the chemical processing-free negative graph photosensitive composition of UV-CTP.
In the present invention be coated with in electrolyzing and coarsening and anodic oxidation the aluminum substrate after carrying out sealing pores above-mentioned suitable
Before the chemical processing-free negative graph photosensitive composition of UV-CTP, with the unsaturated water of the present invention-(X)-(Y)-(Z)-structure
Soluble polymer carries out hydrophilicity-imparting treatment to aluminum substrate.This sensitive lithographic plate is adapted for use with the plate-making of UV-CTP platemaking machine.This sensitive lithographic plate
After using UV-CTP platemaking machine scan exposure, developing liquid developing can not be used to use tap water to rinse, i.e. obtain printing
The sensitive lithographic plate of brush.This sensitive lithographic plate, after using UV-CTP platemaking machine scan exposure, directly can be lockd up without any process
Press printing.
Embodiment 2
In photosensitive composition of the present invention-polymer of (X)-(Y)-(Z)-structure is a kind of water-soluble poly containing unsaturated double-bond
Compound.Wherein, X represents the copolymerization units containing sulfonic acid group, and Y represents the carboxyl acid copolymer list containing two unsaturated double-bond side chains
Unit, Z represents the acrylic ester copolymer unit containing a unsaturated double-bond side chain.
The copolymerization units represented as X, as long as the compound containing alkenes unsaturated group and sulfonic acid group can.
Alkenes unsaturated group ensures and other unit copolymerization, and sulfonic acid group ensures preferable water solublity.X is selected from vinyl sulfonic acid, benzene
Vinyl sulfonic acid, 2-hydroxyl-3-allyloxy-1-propyl sulfonic acid, isoprene sulfonic acid etc..The ratio that X is shared in whole polymer
Example in 17%～20% molar ratio range, preferably 19%～20%.During less than 19%, white space is easily kept on file,
During higher than 20%, the ink affinity of forme is the best.
The copolymerization units represented as Y, be the acrylic or methacrylic acid of side chain containing two unsaturated double-bonds altogether
Poly-unit.Wherein the side chain containing two unsaturated double-bonds is by being first grafted GMA monomer in acrylic or methacrylic acid, so
After on GMA, be grafted alkenes unsaturated double-bond again reach.The ethylenically unsaturated monomers that can be used to grafting can be selected from third
Alkene acyl chlorides, methacrylic chloride, allyl isocyanate and isocyanatoethyl methacrylate etc..Y is at whole polymer
In play adjustment hydrophilic and the effect of photo-crosslinking curing rate, by introducing two unsaturated groups on Y, can significantly carry
The ratio of unsaturated double-bond in high polymer, the most even can make unsaturated double-bond in whole polymer in the present invention
Ratio reach 150%, so can be greatly enhanced laser curing velocity, can ensure that again enough hydrophilic simultaneously.Y is whole
Ratio shared in polymer is preferred in 20%～40% molar ratio range, preferably 25%～30%.
The copolymerization units represented as Z, Z is the acrylate containing a unsaturated double-bond substituted radical or methacrylic acid
Copolymerization units.Available acrylate is selected from hydroethyl acrylate, methacrylic acid β hydroxyl ethyl ester, hydroxymethylacrylate methyl ester
Deng.The monomer of available grafting has acryloyl chloride, methacrylic chloride, allyl isocyanate and isocyanatoethyl methyl-prop
Olefin(e) acid ester etc..Z the ratio shared by whole copolymer 30%～50% molar ratio range in be preferred, preferably 35%～
45%.
In the unsaturated water-soluble polymer of-(X)-(Y)-(Z)-structure, unsaturated double-bond sum account for polymer 60 ~
80% mol ratio, preferably 65 ~ 75%.During less than 60%, it is impossible to obtain high curing rate and high crosslink density；Higher than 80
During %, the shelf stability for resin is unfavorable.
The unsaturated water-soluble polymer of-(X)-(Y)-(Z)-structure accounts for the 40%～80% of whole photosensitive layer dry weight, excellent
Select 50%-70%.During less than 40%, the coating of blank parts is difficult to erasing, and disadvantage dirty on blank position easily occurs；It is higher than
During 80 %, coating ink affinity is the best, easily becomes blind version.
Above-described detailed description of the invention, has been carried out the purpose of the present invention, technical scheme and beneficial effect further
Describe in detail, be it should be understood that the detailed description of the invention that the foregoing is only the present invention, be not intended to limit the present invention
Protection domain, all within the spirit and principles in the present invention, any modification, equivalent substitution and improvement etc. done, all should comprise
Within protection scope of the present invention.
Claims (6)
1. the photoresists for CTP version aluminum plate foundation, it is characterised in that: it mainly comprises following six kinds of components: (1) a kind of-
(X) the unsaturated water-soluble polymer of-(Y)-(Z)-structure, and the performed polymer of (2) a kind of photopolymerization and (3) a kind of many officials
Can single group body, and (4) one or more Photoepolymerizationinitiater initiater, and (5) one or more dyestuff or pigment, and
(6) one or more solvent；Wherein, X represents the copolymerization units containing sulfonic acid group, and Y represents containing two unsaturations
The carboxyl acid copolymer unit of the side chain of double bond, Z represents the acrylic ester copolymer unit containing a unsaturated double-bond side chain；Described X
Selected from vinyl sulfonic acid, styrene sulfonic acid, 2-hydroxyl-3-allyloxy-1-propyl sulfonic acid, isoprene sulfonic acid, X accounts for copolymer
17%～20% mol ratio.
A kind of photoresists for CTP version aluminum plate foundation, it is characterised in that: Y is containing two insatiable hungers
Acrylic or methacrylic acid copolymerization units with the side chain of double bond.
A kind of photoresists for CTP version aluminum plate foundation, it is characterised in that: Y is containing an insatiable hunger
The acrylic or methacrylic acid copolymerization units of GMA substituted with double bond grafting.
A kind of photoresists for CTP version aluminum plate foundation, it is characterised in that: Y accounts for the 20% of copolymer
～40% mol ratio.
A kind of photoresists for CTP version aluminum plate foundation, it is characterised in that: Z is containing a unsaturation
The acrylate of double bond substituted radical or methacrylic acid copolymer unit.
A kind of photoresists for CTP version aluminum plate foundation, it is characterised in that: Z accounts for the 30% of copolymer
～50% mol ratio.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610461154.XA CN106054524A (en) | 2016-06-23 | 2016-06-23 | Photoresist for CTP plate aluminum plate base |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610461154.XA CN106054524A (en) | 2016-06-23 | 2016-06-23 | Photoresist for CTP plate aluminum plate base |
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| Publication Number | Publication Date |
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| CN106054524A true CN106054524A (en) | 2016-10-26 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201610461154.XA Pending CN106054524A (en) | 2016-06-23 | 2016-06-23 | Photoresist for CTP plate aluminum plate base |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106867373A (en) * | 2017-03-28 | 2017-06-20 | 惠州市潮新科数字器材科技有限公司 | The photosensitive glue compositions of UV and its application in exempting from electrochemical treatments CTP editions |
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| CN101192004A (en) * | 2006-11-27 | 2008-06-04 | 乐凯集团第二胶片厂 | Chemical processing-free negative graph photosensitive composition suitable for UV-CTP and planographic printing plate manufactured therefor and planographic printing plate manufacture method |
| US20090142702A1 (en) * | 2007-12-04 | 2009-06-04 | Ray Kevin B | Methods of using violet-sensitive imageable elements |
| CN101881929A (en) * | 2010-06-22 | 2010-11-10 | 刘华礼 | Method for preparing rinse-free negative image CTP plate |
| KR20110120124A (en) * | 2010-04-28 | 2011-11-03 | 주식회사 엘지화학 | Alkali soluble polymer compounds and photoresist resin composition comprising the same |
| CN102540709A (en) * | 2010-12-30 | 2012-07-04 | 乐凯华光印刷科技有限公司 | Infrared sensitive chemistry-free light-sensing composition and lithographic printing plate made from same |
-
2016
- 2016-06-23 CN CN201610461154.XA patent/CN106054524A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101192004A (en) * | 2006-11-27 | 2008-06-04 | 乐凯集团第二胶片厂 | Chemical processing-free negative graph photosensitive composition suitable for UV-CTP and planographic printing plate manufactured therefor and planographic printing plate manufacture method |
| US20090142702A1 (en) * | 2007-12-04 | 2009-06-04 | Ray Kevin B | Methods of using violet-sensitive imageable elements |
| KR20110120124A (en) * | 2010-04-28 | 2011-11-03 | 주식회사 엘지화학 | Alkali soluble polymer compounds and photoresist resin composition comprising the same |
| CN101881929A (en) * | 2010-06-22 | 2010-11-10 | 刘华礼 | Method for preparing rinse-free negative image CTP plate |
| CN102540709A (en) * | 2010-12-30 | 2012-07-04 | 乐凯华光印刷科技有限公司 | Infrared sensitive chemistry-free light-sensing composition and lithographic printing plate made from same |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106867373A (en) * | 2017-03-28 | 2017-06-20 | 惠州市潮新科数字器材科技有限公司 | The photosensitive glue compositions of UV and its application in exempting from electrochemical treatments CTP editions |
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Application publication date: 20161026 |