CN106033162A - Array substrate and alignment method thereof - Google Patents
Array substrate and alignment method thereof Download PDFInfo
- Publication number
- CN106033162A CN106033162A CN201510112982.8A CN201510112982A CN106033162A CN 106033162 A CN106033162 A CN 106033162A CN 201510112982 A CN201510112982 A CN 201510112982A CN 106033162 A CN106033162 A CN 106033162A
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- China
- Prior art keywords
- surrounding zone
- alignment
- alignment film
- base palte
- array base
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- 239000000758 substrate Substances 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 title claims abstract description 30
- 239000004744 fabric Substances 0.000 claims description 35
- 230000002093 peripheral effect Effects 0.000 abstract 5
- 239000004973 liquid crystal related substance Substances 0.000 description 13
- 239000004642 Polyimide Substances 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 241001122767 Theaceae Species 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
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- Liquid Crystal (AREA)
Abstract
The invention discloses an array substrate and an alignment method thereof. The substrate comprises a display area and a peripheral area. The pixel circuit is arranged in the display area. The routing is arranged in the peripheral area and is connected with the pixel circuit. The alignment film is disposed in the display region and the peripheral region. The flat layer is arranged on the peripheral area, so that the peripheral area is flattened. According to the array substrate provided by the invention, by arranging the flat layer, the alignment process is not influenced by the pitch of the routing wires when the alignment step is carried out on the array substrate.
Description
Technical field
The present invention relates to a kind of array base palte.
Background technology
Along with scientific and technological progress, the use of liquid crystal display is more and more universal.At liquid crystal mesogens display
In operation principle, owing to liquid crystal has optical activity, therefore by liquid crystal layer is applied electric field, can control
Polarised direction through the light of liquid crystal layer.Additionally, the orientation of liquid crystal need to be limited by alignment film, also
I.e. alignment film provides the liquid crystal initial arrangement direction being positioned at border.Therefore, the display quality of liquid crystal display
With its alignment film, there is certain relation.
In the technique of alignment film, generally it is initially formed polyimides (polyimide, PI).Then, then profit
Orientation is carried out so that polyimides produces along alignment direction and extends with the tip of alignment cloth hair and polyimides
The groove of arrangement, its further groove provides the liquid crystal pretilt angle being positioned at border.Furthermore, allocating process
The display quality of quality and liquid crystal display also have certain relatedness.Therefore, how can effectively promote and join
To the quality of technique, one of current important research and development problem of real genus, also become the side of currently associated area research
To.
Summary of the invention
The present invention provides a kind of array base palte and its alignment method, thus overcomes the drawbacks described above of prior art.
In allocating process, for adapting to the view directions designed by liquid crystal display, alignment cloth hair enters joins
May be 45 degree, 90 degree or 135 degree to the angle of film.Therefore, when alignment cloth hair be positioned at surrounding zone
After alignment film contact, alignment cloth hair will be affected by being positioned at the cabling of surrounding zone so that alignment cloth tippy tea
There is bifurcated or change direction in end, and causes the problem that orientation is uneven and then affects display quality.
In consideration of it, the array base palte of following embodiments of the present invention is provided with flatness layer, wherein flatness layer sets
It is placed on cabling so that the gap between cabling is filled and led up by flatness layer.Therefore, when being entered by alignment cloth hair
During row orientation, alignment cloth hair will not be affected by being positioned at the cabling of surrounding zone, and then it is uneven to improve orientation
Problem.Therefore, the allocating process quality of array base palte and yield can be promoted, and the most related carry
Rise the display quality of the follow-up liquid crystal display completed.
One aspect of present invention is to provide a kind of array base palte, comprise substrate, image element circuit,
Cabling, alignment film and flatness layer.Substrate comprises viewing area and surrounding zone.Image element circuit is arranged at aobvious
Show district.Cabling is arranged at surrounding zone, and is connected with image element circuit.Alignment film is arranged at viewing area and week
Border area.Flatness layer is arranged at surrounding zone, planarizes surrounding zone whereby.
In some embodiments, flatness layer is between alignment film and substrate.
In some embodiments, alignment film is between flatness layer and substrate.
In some embodiments, flatness layer thickness is between 0.5 micron to 5 micron.
In some embodiments, alignment film thickness is between 80 nanometers to 135 nanometers.
One aspect of present invention is to provide the alignment method of a kind of array base palte, comprises following step
Suddenly.The viewing area and surrounding zone of substrate are formed image element circuit and the cabling of interconnection respectively.
Viewing area and surrounding zone are formed alignment film.The alignment film of surrounding zone forms flatness layer, whereby
Planarization surrounding zone.The orientation of alignment film is carried out by alignment cloth hair.
One aspect of present invention is to provide the alignment method of a kind of array base palte, comprises following step
Suddenly.The viewing area and surrounding zone of substrate are formed image element circuit and the cabling of interconnection respectively.
Surrounding zone is formed flatness layer, planarizes surrounding zone whereby.Viewing area and surrounding zone are formed and joins
To film.The orientation of alignment film is carried out by alignment cloth hair.
In some embodiments, flatness layer thickness between 0.5 micron to 5 micron, alignment film thickness
Between 80 nanometers to 135 nanometers.
In some embodiments, the step of the orientation being carried out alignment film by alignment cloth hair also comprises following
Step.Alignment cloth hair is from entrance viewing area, surrounding zone.
In sum, the array base palte of the present invention is provided with flatness layer, and wherein flatness layer is positioned on surrounding zone.
Specifically, flatness layer is arranged on the path of alignment cloth hair entrance viewing area.Therefore, when passing through orientation
When cloth hair carries out the orientation of alignment film, alignment cloth hair will not be affected by being positioned at the cabling of surrounding zone.More enter
For one step, alignment cloth hair will not make its most advanced and sophisticated generation bifurcated or change direction because of the gap between cabling,
And and then improve the problem that orientation is uneven.The most therefore, by arranging flatness layer, the orientation work of array base palte
Skill quality and yield can be promoted.
Accompanying drawing explanation
Figure 1A is the schematic top plan view of the array base palte according to one embodiment of the present invention.
Figure 1B is the generalized section of the line segment BB ' along Figure 1A.
Fig. 1 C is the schematic side view of the array base palte of Figure 1A.
Fig. 2 is the schematic top plan view that the array base palte according to one embodiment of the present invention carries out orientation.
Fig. 3 A is the generalized section of the array base palte according to another embodiment of the present invention.
Fig. 3 B is the schematic side view of the array base palte of Fig. 3 A.
Fig. 4 is the alignment method flow chart of the array base palte of Figure 1A～1C.
Fig. 5 is the alignment method flow chart of the array base palte of Fig. 3 A～3B.
Detailed description of the invention
Figure 1A is the schematic top plan view of the array base palte 100 according to one embodiment of the present invention.Figure 1B
Generalized section for the line segment BB ' along Figure 1A.Array base palte 100 comprises substrate 110, image element circuit
120, cabling 122, terminal 124, alignment film 130 and flatness layer 140.Substrate 110 comprises viewing area
112 and surrounding zone 114.Image element circuit 120 is arranged at viewing area 112.Cabling 122 is arranged at periphery
District 114, and connect image element circuit 120 and terminal 124.Alignment film 130 is arranged at viewing area 112 and week
Border area 114.Flatness layer 140 is arranged at surrounding zone 114, whereby planarization surrounding zone 114.
In surrounding zone 114, alignment film 130 covers substrate 110 and cabling 122.Flatness layer 140 covers
Alignment film 130 so that the surface of the corresponding surrounding zone 114 of array base palte 100 is flat surfaces 142.
Specifically, owing to there is gap between the cabling 122 of surrounding zone 114, therefore substrate 110
And between cabling 122 can the section of there are poor, formation is had the surface 113 of fluctuating by this section of difference.By smooth
Layer 140 and the configuration of alignment film 130, the section difference between substrate 110 and cabling 122 can be configured institute by this
Fill up.
Seeing Figure 1B and Fig. 1 C the most again, wherein Fig. 1 C is that the side-looking of array base palte 100 of Figure 1A is shown
It is intended to.In the present embodiment, alignment film 130 is between flatness layer 140 and substrate 110.Additionally,
Alignment film 130 extends to viewing area 112 from surrounding zone 114, and covers image element circuit 120, wherein periphery
District 114 is same layer alignment film 130 with the alignment film 130 of viewing area 112.In the present embodiment, flat
Smooth layer 140 only covers the alignment film 130 being positioned at surrounding zone 114, therefore when carrying out follow-up allocating process,
The alignment film 130 being positioned at viewing area 112 remains able to by alignment cloth hair friction matching.
Fig. 2 is the schematic top plan view that the array base palte 100 to one embodiment of the present invention carries out orientation.
When alignment cloth hair 150 array substrate 100 to be utilized carries out orientation, alignment cloth hair 150 will be along arrow
Entrance surrounding zone, direction 114, then enters back into viewing area 112, and to the alignment film 130 in viewing area 112
Carry out orientation.
When orientation, alignment cloth hair 150 can first contact surrounding zone 114.When alignment cloth hair 150 contacts periphery
During district 114, due to the existence of flatness layer 140, what alignment cloth hair 150 was contacted would is that flat surfaces
142, therefore will not there be bifurcated at the tip of alignment cloth hair 150 because of the section of touching difference or change nyctitropic
Situation occurs.The most therefore, the allocating process that alignment film 130 is carried out by alignment cloth hair 150 also will not
Significant non-uniform phenomenon is had to produce.
It is to say, by the configuration of flatness layer 140 with alignment film 130, alignment cloth hair 150 is to orientation
The orientation that film 130 is carried out will be evenly so that utilizes this liquid crystal manufactured by array base palte 100
Show that the display quality of device is obtained in that lifting.
Returning to Figure 1B, in the present embodiment, the thickness of cabling 122 is 0.6 micron, namely cabling 122
And the section difference degree of depth between substrate 110 is 0.6 micron.Additionally, in the present embodiment, alignment film 130
Thickness between 80 nanometers to 135 nanometers, and the thickness of flatness layer 140 is between 0.5 micron to 5
Between Wei meter.
In the present embodiment, flatness layer 140 is 1.5 microns with the general thickness of alignment film 130, therefore
The section that the degree of depth is 0.6 micron can be filled up poor.It should be appreciated, however, that the thickness of cabling 122 provided above,
And the section difference degree of depth between cabling 122 and substrate 110 is merely illustrative, is not intended to limit the present invention.
Those skilled in the art belonging to the present invention, can according to actual needs, elastic selection flatness layer 140 and alignment film
The thickness of 130, if the section difference can filled up between cabling 122 and substrate 110.
As shown in Figure 1 C, only cover the alignment film 130 being positioned at surrounding zone 114 due to flatness layer 140, because of
Between this viewing area 112 and surrounding zone 114, the section of having is poor.But, compared to cabling 122 and substrate 110
Between section poor, the section difference between viewing area 112 and surrounding zone 114 is single section of difference, and this single section
Difference is across whole array base palte 100, the problem the most not having uniformity.
Please return Figure 1A.The flatness layer 140 of present embodiment can cover terminal 124, in order to end
Son 124 is electrically connected with external circuit.Additionally, complete can be provided with on the alignment film after orientation 130 frame
Glue district 116, this Kuang Jiao district 116 can be used to arrange frame glue to carry out follow-up attaching process.
Fig. 3 A is the generalized section of the array base palte 100 according to another embodiment of the present invention, and it cuts open
Position, face is identical with Figure 1B.Fig. 3 B is the schematic side view of the array base palte 100 of Fig. 3 A.This enforcement
Mode is with the difference of previous embodiment: the flatness layer 140 of present embodiment is positioned at alignment film 130
And between substrate 110.
More specifically, in surrounding zone 114, flatness layer 140 covers substrate 110 and cabling 122.Join
Flatness layer 140 is covered to film 130.Owing to flatness layer 140 can planarize surrounding zone 114, therefore when joining
When film 130 is covered on flatness layer 140, the position at alignment film 130 place is by flatness layer 140 institute
The flat surfaces 142 provided.Therefore, the surface 132 of alignment film 130 will be also smooth surface, and not
Have excessive section poor.
Similarly, when alignment film 130 is carried out allocating process, owing to alignment cloth hair is in surrounding zone 114
Interior touched would is that flat surfaces.Therefore, the tip of alignment cloth hair will not be because of the section of touching
Differ from and have bifurcated or change the generation of nyctitropic situation.The most therefore, alignment film 130 is carried out by alignment cloth hair
Allocating process there will not be significant non-uniform phenomenon produce.
Fig. 4 is the alignment method flow chart of the array base palte 100 of Figure 1A～1C.The array of Figure 1A～1C
The alignment method of substrate 100 comprises the steps of.Step P10, respectively in the viewing area 112 of substrate 110
And on surrounding zone 114, form image element circuit 120 and the cabling 122 of interconnection.Step P20,
Alignment film 130 is formed on viewing area 112 and surrounding zone 114.Step P30, in joining of surrounding zone 114
Flatness layer 140, whereby planarization surrounding zone 114 is formed on film 130.Step P40, passes through alignment cloth
Hair carries out the orientation of alignment film 130.
Fig. 5 is the alignment method flow chart of the array base palte 100 of Fig. 3 A～3B.The array of Fig. 3 A～3B
The alignment method of substrate 100 comprises the steps of.Step S10, respectively in the viewing area 112 of substrate 110
And on surrounding zone 114, form image element circuit 120 and the cabling 122 of interconnection.Step S20,
Flatness layer 140, whereby planarization surrounding zone 114 is formed on surrounding zone 114.Step S30, in viewing area
112 and surrounding zone 114 on formed alignment film 130.Step S40, carries out alignment film by alignment cloth hair
The orientation of 130.
In sum, the array base palte of the above-mentioned embodiment of the present invention is provided with the flatness layer being positioned at surrounding zone.
Therefore, when being carried out the orientation of array base palte by alignment cloth hair, alignment cloth hair will not be positioned at week
The cabling impact in border area so that alignment cloth tippy tea end has bifurcated or changes the generation of nyctitropic situation.
Although with numerous embodiments disclosure as above, so it is not intended to limit the present invention to the present invention, appoint
What those skilled in the art, without departing from the spirit and scope of the present invention, can make various different selection
And amendment, therefore protection scope of the present invention is limited by claims and equivalents thereof.
Claims (10)
1. an array base palte, it is characterised in that described array base palte comprises:
Substrate, it comprises viewing area and surrounding zone；
Image element circuit, it is arranged at described viewing area；
A plurality of cabling, it is arranged at described surrounding zone, and is connected with described image element circuit；
Alignment film, it is arranged at described viewing area and described surrounding zone；And
Flatness layer, it is arranged at described surrounding zone, planarizes described surrounding zone whereby.
2. array base palte as claimed in claim 1, it is characterised in that described flatness layer be positioned at described in join
To between film and described substrate.
3. array base palte as claimed in claim 1, it is characterised in that described alignment film is positioned at described flat
Between smooth layer and described substrate.
4. array base palte as claimed in claim 1, it is characterised in that described flatness layer thickness is between 0.5
Micron is between 5 microns.
5. array base palte as claimed in claim 1, it is characterised in that described alignment film thickness is between 80
Nanometer is between 135 nanometers.
6. the alignment method of an array base palte, it is characterised in that described alignment method comprises the steps of
The viewing area and surrounding zone of substrate are formed respectively interconnection image element circuit and a plurality of walk
Line；
Described viewing area with and surrounding zone on formed alignment film；And
The described alignment film of described surrounding zone is formed flatness layer, planarizes described surrounding zone whereby；
The orientation of described alignment film is carried out by alignment cloth hair.
7. the alignment method of array base palte as claimed in claim 6, it is characterised in that described flatness layer
Thickness between 0.5 micron to 5 micron, described alignment film thickness between 80 nanometers to 135 nanometers it
Between.
8. the alignment method of array base palte as claimed in claim 6, it is characterised in that joined by described
Xiang Bumao carries out the step of the orientation of described alignment film, also comprises the steps of
Described alignment cloth hair enters described viewing area from described surrounding zone.
9. the alignment method of an array base palte, it is characterised in that described alignment method comprises the steps of
The viewing area and surrounding zone of substrate are formed respectively interconnection image element circuit and a plurality of walk
Line；
Described surrounding zone is formed flatness layer, planarizes described surrounding zone whereby；
Described viewing area and described surrounding zone are formed alignment film；And
The orientation of described alignment film is carried out by alignment cloth hair.
10. the alignment method of array base palte as claimed in claim 9, it is characterised in that described flatness layer
Thickness between 0.5 micron to 5 micron, described alignment film thickness between 80 nanometers to 135 nanometers it
Between.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW104102577A TW201627731A (en) | 2015-01-26 | 2015-01-26 | Array substrate and method for rubbing the same |
| TW104102577 | 2015-01-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106033162A true CN106033162A (en) | 2016-10-19 |
| CN106033162B CN106033162B (en) | 2019-05-24 |
Family
ID=57151085
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510112982.8A Expired - Fee Related CN106033162B (en) | 2015-01-26 | 2015-03-16 | array substrate and alignment method thereof |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN106033162B (en) |
| TW (1) | TW201627731A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109270755A (en) * | 2018-09-30 | 2019-01-25 | 惠科股份有限公司 | Display panel and display device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012143729A (en) * | 2011-01-14 | 2012-08-02 | Hitachi High-Technologies Corp | Print coating method |
| CN102636910A (en) * | 2011-12-29 | 2012-08-15 | 友达光电股份有限公司 | Display panel and manufacturing method thereof |
| CN103019445A (en) * | 2012-09-17 | 2013-04-03 | 友达光电股份有限公司 | Touch panel and touch display panel |
| CN103151304A (en) * | 2012-11-02 | 2013-06-12 | 友达光电股份有限公司 | Array substrate of display panel and manufacturing method thereof |
| CN103929880A (en) * | 2013-01-10 | 2014-07-16 | 元太科技工业股份有限公司 | Circuit substrate structure and manufacturing method thereof |
-
2015
- 2015-01-26 TW TW104102577A patent/TW201627731A/en unknown
- 2015-03-16 CN CN201510112982.8A patent/CN106033162B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012143729A (en) * | 2011-01-14 | 2012-08-02 | Hitachi High-Technologies Corp | Print coating method |
| CN102636910A (en) * | 2011-12-29 | 2012-08-15 | 友达光电股份有限公司 | Display panel and manufacturing method thereof |
| CN103019445A (en) * | 2012-09-17 | 2013-04-03 | 友达光电股份有限公司 | Touch panel and touch display panel |
| CN103151304A (en) * | 2012-11-02 | 2013-06-12 | 友达光电股份有限公司 | Array substrate of display panel and manufacturing method thereof |
| CN103929880A (en) * | 2013-01-10 | 2014-07-16 | 元太科技工业股份有限公司 | Circuit substrate structure and manufacturing method thereof |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109270755A (en) * | 2018-09-30 | 2019-01-25 | 惠科股份有限公司 | Display panel and display device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106033162B (en) | 2019-05-24 |
| TW201627731A (en) | 2016-08-01 |
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Granted publication date: 20190524 Termination date: 20200316 |