CN106011788B - A kind of apparatus for removing foreign material - Google Patents
A kind of apparatus for removing foreign material Download PDFInfo
- Publication number
- CN106011788B CN106011788B CN201610487570.7A CN201610487570A CN106011788B CN 106011788 B CN106011788 B CN 106011788B CN 201610487570 A CN201610487570 A CN 201610487570A CN 106011788 B CN106011788 B CN 106011788B
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- CN
- China
- Prior art keywords
- nozzle
- vacuum
- tight
- housing
- foreign material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
Abstract
The invention discloses a kind of apparatus for removing foreign material, including remove pipeline and the removing component set on the removing pipeline one end；It includes inner and outer tubes to remove pipeline, and has gap between inner tube and outer tube；It removes component and includes nozzle and the vacuum (-tight) housing being centered around on the outside of the nozzle, and there are gaps between vacuum (-tight) housing and nozzle；Nozzle is tightly connected with inner tube, and the removing gas conveyed in inner tube is sprayed from the nozzle, and vacuum (-tight) housing is tightly connected with outer tube, and the gap between vacuum (-tight) housing and nozzle, is communicated in the gap between inner and outer tubes, will remove gas absorption.Gas is removed in inner tube conveying, and it is sprayed from nozzle, the particle being deposited on pedestal will be made by the base-plates surface that blows off, under the resorption of Outer Tube, gap between vacuum (-tight) housing and nozzle is sucked out the particle of base-plates surface of being blown off by Outer Tube, to which effectively the particle on pedestal in vacuum chamber be absorbed.
Description
Technical field
The present invention relates to apparatus for removing foreign material fields, more particularly to a kind of removed applied to the indoor impurity of vacuum chamber to set
It is standby.
Background technology
Currently, with the development of display technology, display panel is (such as：AMOLED panel, LED panel etc.) it has obtained extensively
General application.In the processing procedure of display panel, need to carry out the techniques such as plated film, etching on a display panel, to enhance display surface
The display characteristic of plate uses characteristic.
Above-mentioned technique is usually completed in vacuum chamber, as shown in Figure 1, in Fig. 1, pedestal is provided in vacuum chamber
(susceptor), display panel is positioned on pedestal, to carry out above-mentioned technique.
Based on this, for coating process, such as vapor deposition, plasma enhanced chemical vapor deposition may be used
(Plasma Enhanced Chemical Vapor Deposition, PECVD) mode forms a film on a display panel.It formed a film
Cheng Zhong, used Coating Materials will produce a certain amount of residue particles (particle), these particle can be deposited on base
Seating face.
For etching technics, dry etching, the process can be used also to will produce greatly the film on display panel
The particle of amount is simultaneously deposited on base-plates surface.
In subsequent processing procedure, the particle for being deposited on base-plates surface is possible to attachment on a display panel, to right
The product quality of display panel impacts.
The prior art is unidirectionally wiped for the particle within vacuum chamber frequently with the non-dust cloth for speckling with absolute ethyl alcohol
It wipes, or is absorbed particle by high vacuum (High Vacuum, HV) suction pipe.
But for aforesaid way in the prior art, when being wiped using non-dust cloth, particle will be adhered to constantly
In design on fabric surface, during wiping, the particle of design on fabric surface is it is possible to be adhered to base-plates surface；Using HV suction pipes
When absorption, for adhering to stronger particle on pedestal, HV suction pipes can not completely absorb particle.
Invention content
The embodiment of the present invention provides a kind of apparatus for removing foreign material, is difficult to vacuum chamber effectively to solve traditional mode
In impurity particle remove the problem of.
The present invention provides a kind of apparatus for removing foreign material, including：Remove pipeline and the removing portion set on the removing pipeline one end
Part；The removing pipeline includes inner and outer tubes, has gap between said inner tube and outer tube；
The vacuum (-tight) housing for removing component and including nozzle and being centered around on the outside of the nozzle, the vacuum (-tight) housing and the nozzle
Between there are gaps；
The nozzle is tightly connected with said inner tube, the removing gas conveyed in said inner tube is sprayed from the nozzle；
The vacuum (-tight) housing is tightly connected with the outer tube, and the gap between the vacuum (-tight) housing and the nozzle is communicated in institute
The gap between inner and outer tubes is stated, the removing gas is absorbed.
Further, the said inner tube other end, which is equipped with, removes gas valve, and the removing gas valve is defeated into said inner tube
Enter to remove gas.
Further, the removing gas includes compression drying air CDA
Further, the outer tube other end is equipped with high vacuum HV admission air valves, and the HV admission air valves are by the removing gas
Body is absorbed by the outer tube.
Further, the removing component flexible connection is in the removing pipeline.
Apparatus for removing foreign material in the present invention includes the removing pipeline with double-skin duct structure, and with nozzle and very
The removing component of sky cover, in actual use, the vacuum (-tight) housing for removing component is buckled on pedestal, forms local sealing ring
Border, inner tube convey CDA gases, and are sprayed from nozzle, and CDA will so that the particle being deposited on pedestal is blown off pedestal table
Face, under the resorption of Outer Tube, the particle of the base-plates surface that blown off is by the gap between vacuum (-tight) housing and nozzle
It is sucked out by Outer Tube.Compared with prior art, the CDA air-flows sprayed from nozzle have stronger pressure, can effectively by
Particle blows off base-plates surface, simultaneously as vacuum (-tight) housing, which is buckled in base-plates surface, forms sealed environment, therefore blown off
Particle will not be interspersed among in vacuum chamber, but be sucked out immediately by outer tube.To effectively by pedestal in vacuum chamber
On particle absorb.
Description of the drawings
Attached drawing described herein is used to provide further understanding of the present invention, and constitutes the part of the present invention, this hair
Bright illustrative embodiments and their description are not constituted improper limitations of the present invention for explaining the present invention.In the accompanying drawings：
Fig. 1 is that display panel in the prior art is in the schematic diagram in vacuum chamber；
Fig. 2 a are a kind of structural schematic diagram of apparatus for removing foreign material D1 provided in an embodiment of the present invention；
The schematic cross-section for the removing pipeline 10 that Fig. 2 b are the apparatus for removing foreign material D1 in Fig. 2 a；
Fig. 3 a and 3b are schematic diagrames of the apparatus for removing foreign material D1 provided in an embodiment of the present invention in practical application；
Fig. 4 is the structural schematic diagram of another apparatus for removing foreign material D2 provided in an embodiment of the present invention；
Fig. 5 is the overall cross section of the apparatus for removing foreign material D2 in Fig. 4.
Specific implementation mode
To make the object, technical solutions and advantages of the present invention clearer, below in conjunction with the specific embodiment of the invention and
Technical solution of the present invention is clearly and completely described in corresponding attached drawing.Obviously, described embodiment is only the present invention one
Section Example, instead of all the embodiments.Based on the embodiments of the present invention, those of ordinary skill in the art are not doing
Go out the every other embodiment obtained under the premise of creative work, shall fall within the protection scope of the present invention.
As shown in Figure 2 a, an embodiment of the present invention provides a kind of primary structures of apparatus for removing foreign material D1, wherein impurity is clear
Except equipment D1 includes mainly：It removes pipeline 10, remove component 20.It removes component 20 and specifically includes nozzle 201 and vacuum (-tight) housing 202.
As shown in Figure 2 b, include inner tube 101 and outer tube 102 in the removing pipeline 10 to remove the schematic cross-section of pipeline 10.
In conjunction with Fig. 2 a and 2b, removes component 20 and be set to 10 one end of removing pipeline.Remove the inner tube 101 and outer tube that pipeline includes
102 are not bonded, between have gap.
It removes component 20 and includes nozzle 201 and the vacuum (-tight) housing 202 being centered around on the outside of the nozzle 201, and the vacuum (-tight) housing
There are gaps between 202 and the nozzle 201.
The nozzle 201 is tightly connected with said inner tube 101, and the vacuum (-tight) housing 202 is tightly connected with the outer tube 102,
And the gap between the vacuum (-tight) housing 202 and the nozzle 201, it is communicated in the gap between said inner tube 101 and outer tube 102.
In practical applications, inner tube 101 removes gas for conveying, since inner tube 101 and nozzle 201 are tightly connected, institute
With removing gas can spray from nozzle 201.Outer tube 102 removes gas for absorbing.It can be specifically one to remove gas
Kind is known as the gas of compression drying air (CDA).
Specifically, as shown in figs. 3 a and 3b, impurity removing is set schematic diagram when apparatus for removing foreign material D1 progress impurity removing
Standby D1 can be buckled on base-plates surface, that is, vacuum (-tight) housing 202 is buckled in base-plates surface, form sealing area, at this point, removing pipeline
Inner tube 101 in 10 conveys CDA gases, and CDA gases spray from nozzle 201 and act on base-plates surface, will be heavy on pedestal
Long-pending particle blows off base-plates surface, and at the same time, the outer tube 102 removed in pipeline 10 inhales the particle to be blown off
It removes.
What needs to be explained here is that removing the inner tube 101 of pipeline 10 and the material of outer tube 102 can be metal, alloy, gather
Vinyl chloride (PVC) etc..The material for removing the nozzle 201 of component 20 can also be metal, alloy, polyvinyl chloride (PVC) etc.；Vacuum
The material of cover 202 can be the composite materials such as caulking gum or resin, aerogel blanket-polyurethane.Here it does not constitute to this Shen
Restriction please.
As it can be seen that the apparatus for removing foreign material in the present invention includes the removing pipeline with double-skin duct structure, and with spray
The removing component of head and vacuum (-tight) housing, in actual use, the vacuum (-tight) housing for removing component is buckled on pedestal, is formed local close
Seal ring border, inner tube conveys CDA gases, and is sprayed from nozzle, and CDA will make the particle being deposited on pedestal by the base that blows off
Seating face, under the resorption of Outer Tube, the particle of the base-plates surface that blown off is by the sky between vacuum (-tight) housing and nozzle
It is sucked out by Outer Tube at gap.Compared with prior art, the CDA air-flows sprayed from nozzle have stronger pressure, can be effectively
Particle is blown off base-plates surface, simultaneously as vacuum (-tight) housing, which is buckled in base-plates surface, forms sealed environment, therefore blown off
Particle will not be interspersed among in vacuum chamber, but be sucked out immediately by outer tube.To effectively by pedestal in vacuum chamber
On particle absorb.
As another embodiment of the present invention, as shown in figure 4, the present invention also provides a kind of apparatus for removing foreign material D2.In Fig. 4
In,
In practical applications, the 101 ' other end of inner tube is equipped with compression drying air CDA valves 30, for conveying CDA gases.
102 ' the other end of outer tube is equipped with high vacuum HV admission air valves 40, for impurity to be sucked out.Specific connection type can be such as Fig. 5 institutes
Show, Fig. 5 is the entirety sectional view of apparatus for removing foreign material, in Figure 5 as it can be seen that CDA valves 30 penetrate the tube wall of outer tube 102 ' with it is interior
Pipe 101 ' connects, to input CDA gases (certainly, in practical applications, CDA valves 30 and the outside for being capable of providing CDA gases
Equipment is connected, and does not constitute limitation of the invention here, therefore and not shown in FIG. 5).Correspondingly, in Figure 5, HV air-breathings
Valve 40 is connect with outer tube 102 ', to exclude gas and particle (similarly, in practical applications, HV admission air valves 40
It is connected with the equipment with HV air suction functions, does not constitute limitation of the invention, therefore and not shown in FIG. 5).
Under a kind of mode in the present embodiment, the removing component 20 ' flexible connection is changed in the removing pipeline 10 '
Yan Zhi, removing the angle and direction of component 20 ' can arbitrarily be adjusted, convenient for being used when carrying out impurity removing.
Example the above is only the implementation of the present invention is not intended to restrict the invention.For those skilled in the art
For, the invention may be variously modified and varied.It is all within spirit and principles of the present invention made by any modification, equivalent
Replace, improve etc., it should be included within scope of the presently claimed invention.
Claims (5)
1. a kind of apparatus for removing foreign material, which is characterized in that the apparatus for removing foreign material includes removing pipeline and set on the removing pipe
The removing component of road one end；The removing pipeline includes inner and outer tubes, has gap between said inner tube and outer tube；
The vacuum (-tight) housing for removing component and including nozzle and being centered around on the outside of the nozzle, between the vacuum (-tight) housing and the nozzle
There are gaps；The vacuum (-tight) housing is used for when removing impurity, is snapped onto on the pedestal with impurity；
The nozzle is tightly connected with said inner tube, and the removing gas conveyed in said inner tube is sprayed from the nozzle；
The vacuum (-tight) housing is tightly connected with the outer tube, the gap between the vacuum (-tight) housing and the nozzle, is communicated in described
The removing gas is absorbed in gap between pipe and outer tube.
2. apparatus for removing foreign material as described in claim 1, which is characterized in that the said inner tube other end, which is equipped with, removes gas trap
Door, which inputs into said inner tube removes gas.
3. apparatus for removing foreign material as claimed in claim 2, which is characterized in that the removing gas includes compression drying air
CDA。
4. apparatus for removing foreign material as described in claim 1, which is characterized in that the outer tube other end is equipped with high vacuum HV air-breathings
Valve, the HV admission air valves absorb the removing gas by the outer tube.
5. apparatus for removing foreign material as described in claim 1, which is characterized in that the removing component flexible connection is in the removing
Pipeline.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610487570.7A CN106011788B (en) | 2016-06-28 | 2016-06-28 | A kind of apparatus for removing foreign material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610487570.7A CN106011788B (en) | 2016-06-28 | 2016-06-28 | A kind of apparatus for removing foreign material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106011788A CN106011788A (en) | 2016-10-12 |
| CN106011788B true CN106011788B (en) | 2018-09-07 |
Family
ID=57085034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610487570.7A Active CN106011788B (en) | 2016-06-28 | 2016-06-28 | A kind of apparatus for removing foreign material |
Country Status (1)
| Country | Link |
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| CN (1) | CN106011788B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108893716B (en) * | 2018-06-29 | 2021-01-15 | 奕瑞影像科技（太仓）有限公司 | Coating system and substrate processing method |
| TW202340495A (en) * | 2019-02-11 | 2023-10-16 | 美商應用材料股份有限公司 | Physical vapor deposition methods |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101134203A (en) * | 2006-08-28 | 2008-03-05 | 东京毅力科创株式会社 | Cleaning apparatus and cleaning method |
-
2016
- 2016-06-28 CN CN201610487570.7A patent/CN106011788B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101134203A (en) * | 2006-08-28 | 2008-03-05 | 东京毅力科创株式会社 | Cleaning apparatus and cleaning method |
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| Publication number | Publication date |
|---|---|
| CN106011788A (en) | 2016-10-12 |
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| TR01 | Transfer of patent right |
Effective date of registration: 20201211 Address after: No.146 Tianying Road, high tech Zone, Chengdu, Sichuan Province Patentee after: Chengdu CHENXIAN photoelectric Co.,Ltd. Address before: Building 4, No.1 Longteng Road, Kunshan Development Zone, Suzhou City, Jiangsu Province Patentee before: KunShan Go-Visionox Opto-Electronics Co.,Ltd. |
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| TR01 | Transfer of patent right |