CN106011788A - Impurity removing equipment - Google Patents
Impurity removing equipment Download PDFInfo
- Publication number
- CN106011788A CN106011788A CN201610487570.7A CN201610487570A CN106011788A CN 106011788 A CN106011788 A CN 106011788A CN 201610487570 A CN201610487570 A CN 201610487570A CN 106011788 A CN106011788 A CN 106011788A
- Authority
- CN
- China
- Prior art keywords
- pipeline
- vacuum
- shower nozzle
- foreign material
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning In General (AREA)
Abstract
The invention discloses impurity removing equipment. The impurity removing equipment comprises a removing pipeline and a removing part which is arranged at one end of the removing pipeline. The removing pipeline comprises an inner pipeline and an outer pipeline and a gap is left between the inner pipeline and the outer pipeline. The removing part comprises a spraying nozzle and a vacuum hood which is arranged outside the spraying nozzle in an surrounding way and the gap is left between the vacuum hood and the spraying nozzle. The spraying nozzle is connected with the inner pipeline in a sealed way and removing gas conveyed in the inner pipeline is sprayed from the spraying nozzle. The vacuum hood is connected with the outer pipeline in a sealed way and the gap between the vacuum hood and the spraying nozzle communicates with the gap between the inner pipeline and the outer pipeline, so that the removing gas can be sucked and removed. According to the equipment, the removing gas is conveyed by the inner pipeline and sprayed from the spraying nozzle, so that particles deposited on a foundation support can be blown away from the surface of the foundation support; under the sucking and removing actions of the outer pipeline, the particles blown away from the surface of the foundation support are sucked out by the outer pipeline from the gap between the vacuum hood and the spraying nozzle; so that the particles on the foundation support in a vacuum cavity can be sucked and removed effectively.
Description
Technical field
The present invention relates to apparatus for removing foreign material field, particularly relate to a kind of impurity being applied in vacuum chamber clear
Except equipment.
Background technology
At present, along with the development of Display Technique, display floater is (such as: AMOLED panel, LED face
Plate etc.) it is widely applied.In the processing procedure of display floater, need to carry out on a display panel plated film,
The techniques such as etching, in order to strengthen the display characteristic of display floater or to use characteristic.
Above-mentioned technique generally completes in vacuum chamber, as it is shown in figure 1, in Fig. 1, arrange in vacuum chamber
Having pedestal (susceptor), display floater is positioned on pedestal, to carry out above-mentioned technique.
Based on this, for coating process, such as evaporation, PECVD can be used
Deposition (Plasma Enhanced Chemical Vapor Deposition, PECVD) mode is at display floater
Upper film forming.In film forming procedure, the Coating Materials used can produce a certain amount of residue particles (particle),
These particle can be deposited on base-plates surface.
For etching technics, the thin film on display floater can be used dry etching, this process also can
Produce substantial amounts of particle and be deposited on base-plates surface.
In follow-up processing procedure, the particle being deposited on base-plates surface likely adheres on a display panel,
Thus the product quality of display floater is impacted.
Prior art is for the particle within vacuum chamber, unidirectional frequently with the non-dust cloth speckling with dehydrated alcohol
Wiping, or by fine vacuum (High Vacuum, HV) suction pipe, particle is absorbed.
But, for aforesaid way of the prior art, when using non-dust cloth wiping, particle will not
Breaking and stick to design on fabric surface, during wiping, the particle of design on fabric surface is it is possible to stick to base
Seating face；When using HV suction pipe to absorb, for adhering to stronger particle on pedestal, HV suction pipe is also
Completely particle can not be absorbed.
Summary of the invention
The embodiment of the present invention provides a kind of apparatus for removing foreign material, is difficult to effectively by true in order to solve traditional mode
The problem that impurity particle in plenum chamber is removed.
The present invention provides a kind of apparatus for removing foreign material, including: remove pipeline and be located at this removing pipeline one end
Remove parts；Described removing pipeline comprises inner and outer tubes, has space between said inner tube and outer tube；
Described removing parts comprise shower nozzle and are centered around the vacuum (-tight) housing outside this shower nozzle, described vacuum (-tight) housing and institute
State and between shower nozzle, leave space；
Described shower nozzle is tightly connected with said inner tube, in said inner tube, the removing gas of conveying is from described shower nozzle
Middle ejection；
Described vacuum (-tight) housing is tightly connected with described outer tube, the space between described vacuum (-tight) housing and described shower nozzle, even
Lead to the space between said inner tube and outer tube, to be absorbed by described removing gas.
Further, the said inner tube other end is provided with removing gas valve, and this removing gas valve is in described
In pipe, gas is removed in input.
Further, described removing gas includes compression drying air CDA
Further, the described outer tube other end is provided with fine vacuum HV admission air valve, and this HV admission air valve will
Described removing gas is absorbed by described outer tube.
Further, described removing parts flexibly connect in described removing pipeline.
Apparatus for removing foreign material in the present invention comprises the removing pipeline with double-skin duct structure, and has spray
Head and the removing parts of vacuum (-tight) housing, in actual use, the vacuum (-tight) housing removing parts is buckled on pedestal,
Forming the sealed environment of local, inner tube conveying CDA gas, and spray from shower nozzle, CDA will make to sink
Amass the particle on pedestal by the base-plates surface that blows off, under the resorption of Outer Tube, by the pedestal that blows off
The particle on surface by from the gap between vacuum (-tight) housing and shower nozzle by Outer Tube sucking-off.With prior art phase
Ratio, from shower nozzle, the CDA air-flow of ejection has stronger pressure, and can blow off pedestal effectively by particle
Surface, simultaneously as vacuum (-tight) housing is buckled in base-plates surface forms sealed environment, the particle therefore blown off
Will not intersperse among in vacuum chamber, but immediately by outer tube sucking-off.Thus, effectively by vacuum chamber
Particle on pedestal absorbs.
Accompanying drawing explanation
Accompanying drawing described herein is used for providing a further understanding of the present invention, constitutes the part of the present invention,
The schematic description and description of the present invention is used for explaining the present invention, is not intended that the improper limit to the present invention
Fixed.In the accompanying drawings:
Fig. 1 is the schematic diagram that display floater of the prior art is in vacuum chamber；
The structural representation of a kind of apparatus for removing foreign material D1 that Fig. 2 a provides for the embodiment of the present invention；
Fig. 2 b is the schematic cross-section removing pipeline 10 of the apparatus for removing foreign material D1 in Fig. 2 a；
The apparatus for removing foreign material D1 that Fig. 3 a and 3b provides for the embodiment of the present invention signal when reality is applied
Figure；
The structural representation of the another kind of apparatus for removing foreign material D2 that Fig. 4 provides for the embodiment of the present invention；
Fig. 5 is the global sections schematic diagram of the apparatus for removing foreign material D2 in Fig. 4.
Detailed description of the invention
For making the object, technical solutions and advantages of the present invention clearer, specifically real below in conjunction with the present invention
Execute example and technical solution of the present invention is clearly and completely described by corresponding accompanying drawing.Obviously, described
Embodiment is only a part of embodiment of the present invention rather than whole embodiments.Based on the enforcement in the present invention
Example, the every other enforcement that those of ordinary skill in the art are obtained under not making creative work premise
Example, broadly falls into the scope of protection of the invention.
As shown in Figure 2 a, embodiments provide the primary structure of a kind of apparatus for removing foreign material D1, its
In, apparatus for removing foreign material D1 specifically includes that removing pipeline 10, removes parts 20.Remove parts 20 to have
Body includes shower nozzle 201 and vacuum (-tight) housing 202.As shown in Figure 2 b, for removing the schematic cross-section of pipeline 10,
This removing pipeline 10 comprises inner tube 101 and outer tube 102.
In conjunction with Fig. 2 a and 2b, remove parts 20 and be located at removing pipeline 10 one end.It is interior that removing pipeline comprises
Pipe 101 is not fitted with outer tube 102, between there is space.
Remove parts 20 comprise shower nozzle 201 and be centered around the vacuum (-tight) housing 202 outside this shower nozzle 201, and institute
State and leave space between vacuum (-tight) housing 202 and described shower nozzle 201.
Described shower nozzle 201 is tightly connected with said inner tube 101, described vacuum (-tight) housing 202 and described outer tube 102
It is tightly connected, and the space between described vacuum (-tight) housing 202 and described shower nozzle 201, it is communicated in said inner tube 101
And the space between outer tube 102.
In actual applications, inner tube 101 is used for carrying removing gas, owing to inner tube 101 is close with shower nozzle 201
Envelope connects, so, remove gas and just can spray from shower nozzle 201.Outer tube 102 is used for absorbing removing gas
Body.Removing gas can be specifically a kind of gas being referred to as compression drying air (CDA).
Specifically, apparatus for removing foreign material D1 carries out schematic diagram when impurity is removed as shown in figs. 3 a and 3b,
Apparatus for removing foreign material D1 can be buckled on base-plates surface, that is, vacuum (-tight) housing 202 is buckled in base-plates surface, shape
Becoming sealing area, now, the inner tube 101 removed in pipeline 10 carries CDA gas, CDA gas from
Spraying in shower nozzle 201 and act on base-plates surface, blow off base-plates surface by the particle of the deposition on pedestal,
Meanwhile, the particle blown off is absorbed by the outer tube 102 removed in pipeline 10.
Needing exist for explanation, the material of the inner tube 101 and outer tube 102 of removing pipeline 10 can be gold
Genus, alloy, polrvinyl chloride (PVC) etc..The material of the shower nozzle 201 removing parts 20 can also be gold
Genus, alloy, polrvinyl chloride (PVC) etc.；The material of vacuum (-tight) housing 202 can be caulking gum, or resin,
The composites such as aerogel blanket-polyurethane.Here the restriction to the application it is not intended that.
Visible, the apparatus for removing foreign material in the present invention comprises the removing pipeline with double-skin duct structure, and
Having the removing parts of shower nozzle and vacuum (-tight) housing, in actual use, the vacuum (-tight) housing removing parts is buckled in base
On seat, forming the sealed environment of local, inner tube conveying CDA gas, and spray from shower nozzle, CDA will
Make the particle being deposited on pedestal by the base-plates surface that blows off, under the resorption of Outer Tube, blown
From base-plates surface particle by from the gap between vacuum (-tight) housing and shower nozzle by Outer Tube sucking-off.With existing
Technology is compared, and from shower nozzle, the CDA air-flow of ejection has stronger pressure, can effectively be blown by particle
From base-plates surface, simultaneously as vacuum (-tight) housing is buckled in base-plates surface forms sealed environment, therefore blown off
Particle will not intersperse among in vacuum chamber, but immediately by outer tube sucking-off.Thus, effectively by vacuum
In chamber, the particle on pedestal absorbs.
As another embodiment of the present invention, as shown in Figure 4, the present invention also provides for a kind of apparatus for removing foreign material
D2.In the diagram,
In actual applications, the inner tube 101 ' other end is provided with compression drying air CDA valve 30, for defeated
Send CDA gas.Outer tube 102 ' the other end is provided with fine vacuum HV admission air valve 40, for sucking-off impurity.
Concrete connected mode can be as it is shown in figure 5, Fig. 5 be the overall sectional view of apparatus for removing foreign material, at Fig. 5
In visible, CDA valve 30 penetrates the tube wall of outer tube 102 ' and is connected with inner tube 101 ', in order to input CDA
Gas (certainly, in actual applications, CDA valve 30 and the external equipment that CDA gas can be provided
It is connected, is not intended that limitation of the invention here, therefore and not shown in FIG. 5).Correspondingly, at Fig. 5
In, HV admission air valve 40 is connected with outer tube 102 ', (similarly, exists in order to get rid of gas and particle
In actual application, HV admission air valve 40 is connected with the equipment with HV air suction function, does not constitute this
The restriction of invention, therefore and not shown in FIG. 5).
Under a kind of mode in the present embodiment, described removing parts 20 ' flexibly connect in described removing pipeline
10 ', in other words, the angle and direction removing parts 20 ' can arbitrarily regulate, it is simple to is carrying out impurity removing
Time use.
The foregoing is only embodiments of the invention, be not limited to the present invention.For this area skill
For art personnel, the present invention can have various modifications and variations.All institutes within spirit and principles of the present invention
Any modification, equivalent substitution and improvement etc. made, within should be included in scope of the presently claimed invention.
Claims (5)
1. an apparatus for removing foreign material, it is characterised in that described apparatus for removing foreign material include remove pipeline and
It is located at the removing parts of this removing pipeline one end；Described removing pipeline comprises inner and outer tubes, said inner tube with
There is between outer tube space；
Described removing parts comprise shower nozzle and are centered around the vacuum (-tight) housing outside this shower nozzle, described vacuum (-tight) housing and institute
State and between shower nozzle, leave space；
Described shower nozzle is tightly connected with said inner tube, and in said inner tube, the removing gas of conveying is from described shower nozzle
Ejection；
Described vacuum (-tight) housing is tightly connected with described outer tube, the space between described vacuum (-tight) housing and described shower nozzle, even
Lead to the space between said inner tube and outer tube, to be absorbed by described removing gas.
2. apparatus for removing foreign material as claimed in claim 1, it is characterised in that the said inner tube other end sets
Having removing gas valve, this removing gas valve inputs removing gas in said inner tube.
3. apparatus for removing foreign material as claimed in claim 2, it is characterised in that described removing gas includes
Compression drying air CDA.
4. apparatus for removing foreign material as claimed in claim 1, it is characterised in that the described outer tube other end sets
Having fine vacuum HV admission air valve, described removing gas is absorbed by this HV admission air valve by described outer tube.
5. apparatus for removing foreign material as claimed in claim 1, it is characterised in that described removing parts are flexible
It is connected to described removing pipeline.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610487570.7A CN106011788B (en) | 2016-06-28 | 2016-06-28 | A kind of apparatus for removing foreign material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610487570.7A CN106011788B (en) | 2016-06-28 | 2016-06-28 | A kind of apparatus for removing foreign material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106011788A true CN106011788A (en) | 2016-10-12 |
| CN106011788B CN106011788B (en) | 2018-09-07 |
Family
ID=57085034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610487570.7A Active CN106011788B (en) | 2016-06-28 | 2016-06-28 | A kind of apparatus for removing foreign material |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106011788B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108893716A (en) * | 2018-06-29 | 2018-11-27 | 奕瑞影像科技（太仓）有限公司 | Coating system and substrate processing method using same |
| CN113412341A (en) * | 2019-02-11 | 2021-09-17 | 应用材料公司 | Method for removing particles from a wafer by plasma modification in pulsed PVD |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101134203A (en) * | 2006-08-28 | 2008-03-05 | 东京毅力科创株式会社 | Cleaning apparatus and cleaning method |
-
2016
- 2016-06-28 CN CN201610487570.7A patent/CN106011788B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101134203A (en) * | 2006-08-28 | 2008-03-05 | 东京毅力科创株式会社 | Cleaning apparatus and cleaning method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108893716A (en) * | 2018-06-29 | 2018-11-27 | 奕瑞影像科技（太仓）有限公司 | Coating system and substrate processing method using same |
| CN113412341A (en) * | 2019-02-11 | 2021-09-17 | 应用材料公司 | Method for removing particles from a wafer by plasma modification in pulsed PVD |
| US11932934B2 (en) | 2019-02-11 | 2024-03-19 | Applied Materials, Inc. | Method for particle removal from wafers through plasma modification in pulsed PVD |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106011788B (en) | 2018-09-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7552503B2 (en) | Apparatus and method for cleaning a surface with high pressure air | |
| KR101040706B1 (en) | Dry type ultrasonic wave cleaner for substrate | |
| CN106011788A (en) | Impurity removing equipment | |
| WO2015022732A1 (en) | Nozzle, cleaning apparatus and cleaning method | |
| TW201313343A (en) | Cleaning method using dry ice and device for the same | |
| CN107424896B (en) | Chamber cleaning system | |
| TW201822906A (en) | Dry ice cleaning device with dust collection capable of achieving dual purposed of applying dry ice cleaning and sucking dust and hazardous matter in air in one machine | |
| CN212310299U (en) | Dry-type ultrasonic cleaning device | |
| TW402528B (en) | Dust-removal apparatus and its method | |
| KR20190012584A (en) | Air knife and dust cleaning apparatus having the same | |
| KR100883280B1 (en) | Ultrasonic cleaning apparatus using by resonance | |
| CN104841603B (en) | A kind of water spray protection wall device and its method of work | |
| CN206286089U (en) | A kind of secondary-atomizing formula atomizer | |
| CN103446828A (en) | Novel dedusting generator mechanism | |
| KR200437869Y1 (en) | Vibration isolation nozzle in structure for air conditioner | |
| JP4938516B2 (en) | Dust-free static elimination system using shock wave | |
| JP7412184B2 (en) | Separator and processing equipment | |
| TWI775388B (en) | Cleaning spray gun structure and its construction method | |
| KR102313175B1 (en) | Dry Cleaning Device | |
| US20130045664A1 (en) | Sandblasting apparatus | |
| CN218690600U (en) | Mining pneumatic atomizer | |
| CN107876254B (en) | A kind of vehicle spray painting equipment | |
| CN219836848U (en) | Liquid crystal display panel cleaning machine with sealing structure | |
| FI20170063A1 (en) | A tight blast/suction head for a sandblasting device | |
| CN104233232A (en) | Multi-section detachable spray nozzle type silane ring and anti-blocking multi-hole spray nozzle for silane ring |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20201211 Address after: No.146 Tianying Road, high tech Zone, Chengdu, Sichuan Province Patentee after: Chengdu CHENXIAN photoelectric Co.,Ltd. Address before: Building 4, No.1 Longteng Road, Kunshan Development Zone, Suzhou City, Jiangsu Province Patentee before: KunShan Go-Visionox Opto-Electronics Co.,Ltd. |
|
| TR01 | Transfer of patent right |