CN105988240B - Color filter manufacturing method, color filter and liquid crystal display device - Google Patents
Color filter manufacturing method, color filter and liquid crystal display device Download PDFInfo
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- CN105988240B CN105988240B CN201510086475.1A CN201510086475A CN105988240B CN 105988240 B CN105988240 B CN 105988240B CN 201510086475 A CN201510086475 A CN 201510086475A CN 105988240 B CN105988240 B CN 105988240B
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Abstract
A method of manufacturing a color filter, and a liquid crystal display device, the method of manufacturing the color filter comprising: forming first to fourth color resistors in the first to fourth openings of the pixel region, respectively; the fourth color resistor in each pixel area is a laminated structure of an auxiliary color resistor and a first touch electrode layer, or the fourth color resistor in a part of the pixel areas is a high-transmittance auxiliary color resistor, the fourth color resistor in the other part of the pixel areas is a laminated structure of a high-transmittance auxiliary color resistor and a first touch electrode layer, and the first touch electrode layer is used for touch detection. The light transmittance of the auxiliary color resistor is greater than the average light transmittance of the first to third color resistors, so that the overall light transmittance of the color filter is improved, and the brightness of the liquid crystal display device can be improved.
Description
Technical Field
The invention relates to the field of display, in particular to a color filter manufacturing method, a color filter and a liquid crystal display device.
Background
Liquid crystal display devices are widely used in various fields with advantages of small size, light weight, low radiation, and the like.
A typical liquid crystal display device includes an array substrate (i.e., a TFT substrate), a color filter (CF substrate) opposite to the array substrate, and liquid crystal filled between the array substrate and the color filter. The array substrate and the electrodes on the color filter adjust the passing rate of external light by controlling the deflection of liquid crystal molecules, so that the display purpose is achieved.
Referring to fig. 1, there is shown a schematic cross-sectional view of a prior art color filter comprising: a first glass substrate 10, a Black Matrix (BM) layer 11 on the first glass substrate 10, a color pixel layer (RGB layer) 12 between the Black Matrix layers, a planarization layer (OC layer) 13 covering the Black Matrix layer and the pixel region layer 12, and a Spacer Pillar (PS) 14 disposed on the planarization layer 13. Wherein, the color pixel layer 12 includes: a blue (B) pixel 121, a red (R) pixel 122, and a green (G) pixel 123 for transmitting blue, red, and green light, respectively, of the white light.
At present, a liquid crystal display device with an In-box touch detection function is a hot spot of the technology, and the liquid crystal display device is generally called as an In-cell TP. In-cell TP of the prior art, because one or two ITO touch conductive layers are additionally arranged In the liquid crystal display device, the overall brightness of the liquid crystal display device is reduced, and when the ITO touch conductive layers are thicker, the color gamut of the liquid crystal display device is also indirectly influenced.
Therefore, how to improve the brightness of the lcd device with the in-box touch detection function is a problem to be solved urgently by those skilled in the art.
Disclosure of Invention
The invention aims to provide a color filter manufacturing method, a color filter and a liquid crystal display device, wherein the color filter integrated with a touch detection function is manufactured, and the light transmission capability of the color filter is improved so as to improve the brightness of the liquid crystal display device
In order to solve the above problems, the present invention provides a method for manufacturing a color filter, comprising:
providing a substrate;
forming a black matrix layer on the substrate, wherein the black matrix layer comprises a plurality of pixel areas arranged in an array, and each pixel area comprises a first opening, a second opening, a third opening and a fourth opening which are arranged in parallel;
forming first to fourth color resists in the first to fourth openings of the pixel region;
the fourth color resistor in each pixel area is a lamination structure of an auxiliary color resistor and the first touch electrode layer, or the fourth color resistor in a part of the pixel areas is the auxiliary color resistor, the fourth color resistor in the other part of the pixel areas is a lamination structure of the auxiliary color resistor and the first touch electrode layer, and the first touch electrode layer of the auxiliary color resistor is used for touch detection.
Optionally, the step of forming the stacked structure includes: and sequentially forming an auxiliary color resistor and a first touch electrode layer.
Optionally, the auxiliary color resistor is a colorless transparent color resistor, and the light transmittance of the auxiliary color resistor is greater than the light transmittance of the first to third color resistors.
Optionally, the auxiliary color resistor is a yellow transparent color resistor.
Optionally, the step of forming the first to fourth color resists in the first to fourth openings of the pixel region includes:
forming first to third color resistors in the first to third openings of the pixel region, then forming organic material layers in the fourth opening and on the first to third color resistors, removing the organic material layers on the first to third color resistors and the black matrix layer, and reserving the organic material layer in the fourth opening as an auxiliary color resistor;
and forming a first touch electrode layer on the auxiliary color resistor.
Optionally, the material of the organic material layer is the same as the material of the first to third color resists, and is a negative photoresist material, or the material of the organic material layer is a negative photosensitive resin material.
Optionally, the step of forming the first to fourth color resists in the first to fourth openings of the pixel region includes:
forming first to third color resistors in the first to third openings of the pixel region, and then forming an organic material layer in the fourth opening and on the first to third color resistors, wherein the organic material layer in the fourth opening is used as an auxiliary color resistor;
and forming a first touch electrode layer on the auxiliary color resistor.
Optionally, the step of forming the second color resistance includes: and sequentially forming a first touch electrode layer and an auxiliary color resistor.
Optionally, the material of the first touch electrode layer is a transparent conductive oxide.
The present invention also provides a color filter comprising:
a substrate;
a black matrix layer on the substrate;
the pixel regions are positioned in the black matrix layer and are arranged in an array mode, the pixel regions comprise first, second, third and fourth openings which are arranged in parallel, first to third color resistors are formed in the first to third openings, and a fourth color resistor is formed in the fourth opening;
the fourth color resistor in each pixel area is a lamination structure of an auxiliary color resistor and a touch electrode layer, or the fourth color resistor in a part of the pixel areas is the auxiliary color resistor, the second color resistor in the other part of the pixel areas is the lamination structure of the auxiliary color resistor and a first touch electrode layer, and the first touch electrode layer of the auxiliary color resistor is used for touch detection.
Optionally, the auxiliary color resistor is a colorless transparent color resistor, and the light transmittance of the auxiliary color resistor is greater than the light transmittance of the first to third color resistors.
Optionally, the auxiliary color resistor is a yellow transparent color resistor.
Optionally, the material of the first touch electrode layer is a transparent conductive oxide, and the thickness of the first touch electrode layer is in the range of 150-1600 angstroms.
Optionally, in the stacked structure, the first touch electrode layer is located above the auxiliary color resistor, or the first touch electrode layer is located below the auxiliary color resistor.
Optionally, an organic material layer is disposed on the first to third color resists and in the fourth opening, and the organic material layer in the fourth opening is used as an auxiliary color resist.
Optionally, in the pixel regions arranged in the array, the first to fourth color resistors in each pixel region are arranged in the same order, the first touch electrode layers on the fourth color resistors in each row of pixel regions are connected end to form a strip electrode, and the adjacent strip electrodes form a touch electrode.
Optionally, in the pixel regions arranged in the plurality of arrays, the first to fourth color resistors in each pixel region are arranged in the same order, the first touch electrode layers on the plurality of fourth color resistors in some rows of pixel regions are connected end to form strip electrodes, and the adjacent strip electrodes form one touch electrode.
Optionally, the touch electrode is connected to an electrode lead.
Optionally, the first to fourth color resists and the black matrix layer are provided with spacing pillars.
The present invention also provides a liquid crystal display device comprising:
the color filter provided by the invention;
the array substrate is arranged opposite to the color filter, and a second touch electrode layer is arranged on the array substrate and used for forming mutual capacitance with the first touch electrode layer on the color filter;
a liquid crystal layer between the color filter and the array substrate;
and the touch detection circuit is electrically connected with the first touch electrode layer and the second touch electrode layer and is used for detecting mutual capacitance formed by the first touch electrode layer and the second touch electrode layer so as to realize touch detection.
Compared with the prior art, the technical scheme of the invention has the following advantages: in the pixel regions of the color filter of the present invention, the fourth color resistor in each pixel region is a stacked structure of an auxiliary color resistor and a first touch electrode layer, or the fourth color resistor in a part of the pixel regions is an auxiliary color resistor, and the fourth color resistor in another part of the pixel regions is a stacked structure of an auxiliary color resistor and a first touch electrode layer, where the first touch electrode layer is used for touch detection. The light transmittance of the auxiliary color resistor is larger than the average light transmittance of the first to third color resistors, so that the overall light transmittance of the color filter is improved, and the brightness of the touch detection mode liquid crystal display device in the box is improved.
Furthermore, the auxiliary color resistor is a yellow transparent color resistor, so that the chromaticity domain of the color filter can be improved, and further, the chromaticity domain of the liquid crystal display device can be improved.
Drawings
FIG. 1 is a schematic cross-sectional view of a color filter of the prior art;
fig. 2 is a schematic flow chart of a method for manufacturing a color filter according to the present invention;
fig. 3 to 8 are schematic views of a first embodiment of a method of manufacturing a color filter according to the present invention;
fig. 9 is a sectional view showing a step of forming a fourth color resist in the second embodiment of the color filter manufacturing method of the present invention;
fig. 10 is a schematic view of a color filter formed by the third embodiment of the method for manufacturing a color filter of the present invention;
fig. 11 is a sectional view showing a step of forming a fourth color resist in the method of manufacturing a color filter of the present invention;
fig. 12 is a schematic view of a first embodiment of a color filter of the present invention;
fig. 13 is a cross-sectional view of a pixel region in the color filter of fig. 12;
FIG. 14 is a schematic diagram of a touch electrode in the color filter of FIG. 12;
fig. 15 is a schematic view of a second embodiment of a color filter of the present invention;
fig. 16 is a cross-sectional view of a third embodiment of a color filter of the present invention;
FIG. 17 is a cross-sectional view of an embodiment of a liquid crystal display device according to the invention.
Detailed Description
As described In the background, the In-cell TP of the prior art has a reduced overall brightness due to the addition of one/two ITO touch conductive layers In the lcd device.
In order to solve the above technical problems, the present invention provides a method for manufacturing a color filter, wherein first to fourth color resists are formed in first to fourth openings of a pixel region; the fourth color resistor in each pixel area is a laminated structure of an auxiliary color resistor and a first touch electrode layer, or the fourth color resistor in a part of the pixel areas is a high-transmittance auxiliary color resistor, the fourth color resistor in the other part of the pixel areas is a laminated structure of a high-transmittance auxiliary color resistor and a first touch electrode layer, and the first touch electrode layer is used for touch detection. The light transmittance of the auxiliary color resistor is larger than the average light transmittance of the first to third color resistors, so that the overall light transmittance of the color filter is improved, and the brightness of the touch detection mode liquid crystal display device in the box is improved.
Referring to fig. 2, fig. 2 is a flow chart illustrating a method for manufacturing a color filter according to the present invention. The method for manufacturing the color filter provided by the invention comprises the following basic steps:
step S1: providing a substrate;
step S2: forming a black matrix layer on the substrate, wherein the black matrix layer comprises a plurality of pixel areas arranged in an array, and each pixel area comprises a first opening, a second opening, a third opening and a fourth opening which are arranged in parallel;
step S3: forming first to fourth color resistors in the first to fourth openings of the pixel areas, wherein the fourth color resistor in each pixel area is a lamination structure of an auxiliary color resistor and a first touch electrode layer, or the fourth color resistor in a part of the pixel areas is the auxiliary color resistor, the fourth color resistor in another part of the pixel areas is the lamination structure of the auxiliary color resistor and a first touch electrode layer, the first touch electrode layer is used for touch detection, and the light transmittance of the auxiliary color resistor is greater than the average light transmittance of the first to third color resistors.
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.
Referring to fig. 3 to 8, schematic diagrams of an embodiment of a method for manufacturing a color filter according to the present invention are shown.
Referring to fig. 3, step S1 is performed to provide the substrate 100. In this embodiment, the substrate 100 is a glass substrate, but the material of the substrate 100 is not limited in the present invention, and in other embodiments, the substrate 100 may also be a transparent plastic substrate.
With continuing reference to fig. 3, step S2 is performed to form a black matrix layer 101 on the substrate 100, where the black matrix layer 101 includes a plurality of pixel regions arranged in an array, and each pixel region includes first, second, third, and fourth openings arranged in parallel.
It should be noted that fig. 3 shows a cross-sectional view of one of the pixel regions, and the pixel region shown in fig. 3 includes a first opening 201, a second opening 202, a third opening 203, and a fourth opening 204 arranged in parallel.
In this embodiment, the black photoresist layer may be formed by coating, and the black matrix layer 101 may be formed by exposing and developing the black photoresist layer, but the forming method of the black matrix layer 101 is not limited in the present invention.
In this embodiment, the shapes of the first opening 201, the second opening 202, the third opening 203 and the fourth opening 204 are rectangular, but the shapes of the first opening 201, the second opening 202, the third opening 203 and the fourth opening 204 are not limited in the present invention, and in other embodiments, the shapes of the first opening 201, the second opening 202, the third opening 203 and the fourth opening 204 may also be other shapes of the pixel region in the IPS display mode or the FFS display mode in the related art.
Referring to fig. 4 to 6, step S3 is performed to form a first color resistor 301 in the first opening 201, a second color resistor 302 in the second opening 202, a third color resistor 303 in the third opening 203, and a fourth color resistor 304 in the fourth opening 204 of the pixel region.
The fourth color resistor 304 in each pixel area is a stacked structure of an auxiliary color resistor and a first touch electrode layer, or the fourth color resistor 304 in a part of the pixel areas is an auxiliary color resistor, the fourth color resistor 304 in another part of the pixel areas is a stacked structure of an auxiliary color resistor and a first touch electrode layer, and the first touch electrode layer is used for touch detection.
Specifically, referring to fig. 4, in the present embodiment, first to third color resists are formed in the first to third openings of the pixel region, and the first to third color resists are a red resist, a green resist and a blue resist, respectively. However, the present invention does not limit the color arrangement order of the first to third color resists. The materials of the first to third color resists may be common materials for forming a red resist, a green resist and a blue resist in the prior art.
It should be noted that, in this embodiment, the heights of the first color resistor 301, the second color resistor 302 and the third color resistor 303 are in the range of 1 to 4 micrometers, but the heights of the first to third color resistors are not limited by the present invention.
Referring to fig. 5, after forming the first to third color resists in the first to third openings of the pixel region, an organic material layer (not shown) is formed in the fourth opening 204 and on the first to third color resists, the organic material layer above the first to third color resists and the black matrix layer 101 is removed, and the organic material layer in the fourth opening 204 is remained as the auxiliary color resist 103. The organic material layer is a transparent organic material that can be removed by exposure and development, for example, a negative photosensitive resin material similar to the planarization layer (OC) in the color filter of the prior art, so the manufacturing method of this embodiment has high compatibility with the manufacturing process of the color filter of the prior art, and is convenient for production.
In this embodiment, the auxiliary color resistor 103 is a colorless transparent color resistor, and the transmittance of the auxiliary color resistor 103 is higher than that of any one of the first to third color resistors, so that the transmittance of the entire color filter can be improved.
However, the invention is not limited to whether the auxiliary color resistor 103 is a colorless transparent color resistor, in other embodiments, the auxiliary color resistor 103 may also be a yellow transparent color resistor, when the auxiliary color resistor 103 is a yellow transparent color resistor, the transmittance of the auxiliary color resistor 103 is greater than the average of the transmittances of the first to third color resistors, which can also improve the overall transmittance of the color filter, and in addition, the auxiliary color resistor 103 and the first to third color resistors can form a four-color additive color mixing effect of red, green, blue and yellow, which can also effectively improve the chromaticity domain of the color filter compared with a pixel region with only red, green, and blue color resistors.
It should be noted that, in the present embodiment, the height of the auxiliary color resistor 103 is similar to the height of the first to third color resistors, and is in the range of 1 to 4 micrometers, but the height of the auxiliary color resistor 103 is not limited by the present invention.
Referring to fig. 6, a first touch electrode layer 105 is formed on the auxiliary color resistor 103, in this embodiment, the first touch electrode layer 105 is an indium tin oxide thin film, and an indium tin oxide material layer is formed on the black matrix layer 101, the first to third color resistors and the auxiliary color resistor 103 by sputtering, and then exposed, developed and etched by using a positive photoresist, so as to remove the indium tin oxide material layer on the black matrix layer 101, the first to third color resistors, and the remaining indium tin oxide material layer on the auxiliary color resistor 103 forms the first touch electrode layer 105. However, the forming method and material of the touch electrode layer 105 are not limited in the present invention, and in other embodiments, the first touch electrode layer 105 may also be other transparent conductive oxides in the prior art.
It should be noted that if the thickness of the first touch electrode layer 105 is too large, the light transmittance of the fourth color resistor may be reduced, and if the thickness of the first touch electrode layer 105 is too small, the film forming quality may be poor, thereby affecting the touch accuracy of the touch unit formed by the first touch electrode layer 105, in this embodiment, the thickness of the first touch electrode layer 105 is in the range of 150-1600 angstroms, which can be ensured, and the heights of the first to third color resistors and the fourth color resistor 304 are not significantly different.
In this embodiment, a first touch electrode layer 105 is formed on each auxiliary color resistor 103 on the color filter, the auxiliary color resistor 103 and the first touch electrode layer 105 form a fourth color resistor 304, and the fourth color resistor 304 in each pixel region is a stacked structure of the auxiliary color resistor 103 and the first touch electrode layer 105.
Referring to fig. 7 in combination, a top view of the color filter formed in the present embodiment after the first touch electrode layer 105 is formed is shown. The dotted line frame a1 circles the pixel region shown in fig. 5 and 6. As shown in fig. 7, the black matrix layer 101 includes a plurality of pixel regions arranged in an array, and the arrangement order of the first to fourth color resists in each of the plurality of pixel regions arranged in an array is the same. In this embodiment, the first touch electrode layers 105 on the fourth color resistors 304 in each row of pixel regions are connected end to form strip electrodes 107, and the adjacent strip electrodes 107 form one touch electrode. It should be noted that fig. 7 does not show the auxiliary color resistor 103 covered by the first touch electrode layer 105, and the arrangement of the first to fourth color resistors in the pixel region may be combined with fig. 6.
Therefore, the color filter formed by the embodiment has a touch detection function. Although the fourth color resistor 304 is provided with the first touch electrode layer 105, the first touch electrode layer 105 formed by the transparent conductive material has a high transmittance in a visible light range, and has a small influence on the light transmittance of the fourth color resistor 304, and the auxiliary color resistor 103 has a high light transmittance, so that the light transmittance of the fourth color resistor 304 can be effectively improved, the light transmittance of each pixel region is improved, and the light transmittance of the whole color filter is further improved. The color filter formed by the embodiment can be used for forming the in-box touch detection mode liquid crystal display device, so that the color filter formed by the embodiment can improve the brightness of the in-box touch detection mode liquid crystal display device. In addition, the first touch electrode layer 105 is formed only on the auxiliary color resistor 103, and thus, the light transmittance and chromaticity of the first to third color resistors are not affected by the first touch electrode layer 105.
Referring to fig. 8, a spacer 104 is formed on the first to fourth color resists. In other embodiments, the spacer may also be formed on the black matrix layer 101.
It should be noted that, in other embodiments, the auxiliary color resistor 103 may also be formed by other materials, for example, in the steps of forming the first to third color resistors in the first to third openings of the pixel region, and forming the organic material layer in the fourth opening and on the first to third color resistors, the organic material layer may be a negative photosensitive resin material same as the first to third color resistors, and the organic material layer is different from the first to third color resistors only in that the organic material layer does not contain pigment or only contains pigment showing yellow.
Referring to fig. 9, there is shown a cross-sectional view of a step of forming a fourth color resist in the second embodiment of the color filter manufacturing method of the present invention. This embodiment is substantially the same as the first embodiment, and the same parts as the first embodiment will not be described again, but different from the first embodiment in that:
in the step of forming the fourth color resistor, first to third color resistors are formed in the first to third openings of the pixel region, and then an organic material layer 109 is formed in the fourth opening and on the first to third color resistors, wherein the organic material layer 109 is filled in the fourth opening, and the organic material layer 109 in the fourth opening is used as the auxiliary color resistor 103; a first touch electrode layer 105 is formed on the auxiliary color resistor 103.
By using the method for forming the fourth color resist, the organic material layer 109 on the first to third color resists does not need to be removed, thereby simplifying the process steps and improving the productivity compared with the first embodiment.
Referring to fig. 10, there is shown a top view of a color filter formed by the third embodiment of the method of manufacturing a color filter of the present invention. This embodiment is substantially the same as the first embodiment, and the same parts as the first embodiment will not be described again, but different from the first embodiment in that:
in the step of forming the fourth color resistor, the fourth color resistor in a part of the pixel area is the auxiliary color resistor 103, the fourth color resistor in another part of the pixel area is a stacked structure of the auxiliary color resistor 103 and a first touch electrode layer 105 (shown in fig. 6), and the first touch electrode layer 105 is used for touch detection.
Specifically, in this embodiment, the plurality of pixel regions on the color filter are arranged in an array, the first touch electrode layers 105 on the plurality of fourth color resistors 304 in the pixel regions in some columns are connected end to form strip electrodes 107, and the adjacent strip electrodes 107 form one touch electrode. Optionally, two adjacent columns of the strip-shaped electrodes 107 may be separated by one or more pixel regions, and in the pixel region where the first touch electrode layer 105 is not disposed, the fourth color resists 304 only include the transparent auxiliary color resists 103, so that the color filter formed by the manufacturing method of this embodiment has better overall light transmittance.
It should be noted that, in the present embodiment, the number of the pixel regions between two adjacent strip-shaped electrodes 107 is the same, so that the plurality of strip-shaped electrodes 107 are regularly arranged, which does not cause a visual problem in macroscopic viewing.
Referring to fig. 11, there is shown a cross-sectional view of a step of forming a fourth color resist in a fourth embodiment of the color filter manufacturing method of the present invention. This embodiment is substantially the same as the first embodiment, and the same parts as the first embodiment will not be described again, but different from the first embodiment in that:
in the fourth opening, a first touch electrode layer 105 is formed, and an auxiliary color resistor 103 is formed on the first touch electrode layer 105.
The invention also provides a color filter which can be formed by but not limited to the manufacturing method provided by the invention.
Referring to fig. 12 and 13, there are shown schematic views of a first embodiment of a color filter of the present invention, wherein fig. 13 is a sectional view of a pixel region encircled by a dotted line box B1 in fig. 12.
Referring to fig. 12 and 13 in combination, the color filter of the present embodiment includes:
a substrate 100';
a black matrix layer 101 'on the substrate 100';
and a plurality of pixel regions arranged in an array in the black matrix layer 101 ', the pixel regions including a first opening, a second opening, a third opening and a fourth opening (not shown) arranged in parallel, the first opening having a first color resistor 301 ' formed therein, the second opening having a second color resistor 302 ' formed therein, the third opening having a third color resistor 303 ' formed therein, the fourth opening having a fourth color resistor 304 ' formed therein, the first to fourth color resistors being used for color filtering, so that light passing through the color filter becomes color light, and the additive color mixing principle is satisfied.
In this embodiment, the fourth color filter 304 'in a part of the pixel regions is the auxiliary color filter 103', the fourth color filter 304 'in another part of the pixel regions is a stacked structure of the auxiliary color filter 103' and the first touch electrode layer 105 ', and the first touch electrode layer 105' is used for touch detection.
The auxiliary color resistor 103 'is arranged in the pixel area, the auxiliary color resistor 103' and the first to third color resistors jointly modulate light passing through the color filter, so that the light transmittance of the pixel area can be effectively improved, the overall light transmittance of the color filter is improved, and the brightness of the in-box touch detection mode liquid crystal display device is further improved.
In this embodiment, the substrate 100 ' is a glass substrate, but the material of the substrate 100 ' is not limited in the present invention, and in other embodiments, the substrate 100 ' may also be a transparent plastic substrate.
In the present embodiment, the first to third color resists are a red resist, a green resist and a blue resist, respectively, but the color arrangement order of the first to third color resists is not limited in the present invention.
It should be noted that, in this embodiment, the heights of the first color resistor 301 ', the second color resistor 302 ', and the third color resistor 303 ' are in the range of 1 to 4 micrometers, but the heights of the first to third color resistors are not limited by the present invention. Optionally, the height of the auxiliary color resistor 103' is the same as the height of the first to third color resistors.
In this embodiment, the auxiliary color resistor 103 'is a colorless transparent color resistor, so the transmittance of the auxiliary color resistor 103' is higher than that of the first to third color resistors, and the transmittance of the entire color filter can be further improved. However, the invention is not limited to whether the auxiliary color resistor 103' is a colorless transparent color resistor.
In other embodiments, the auxiliary color resistor 103 ' may also be a yellow transparent color resistor, when the auxiliary color resistor 103 ' is a yellow transparent color resistor, the transmittance of the auxiliary color resistor 103 is greater than the average of the transmittances of the first to third color resistors, and the auxiliary color resistor 103 ' and the first to third color resistors can form a four-color additive color mixing effect of red, green, blue and yellow, so that compared with a three-color pixel region with only red, green and blue color resistors, the chromaticity domain of the color filter can be effectively increased, and further the chromaticity domain of the liquid crystal display device can be increased.
In this embodiment, the material of the auxiliary color resistor 103' is the same negative photosensitive resin material as the planarization layer (OC) in the color filter of the prior art, so that the color filter of this embodiment has high compatibility with the prior art and is easy to manufacture. However, the material of the auxiliary color resistor 103 'is not limited in the present invention, and in other embodiments, the auxiliary color resistor 103' can also be formed by using a negative photosensitive resin material used for forming a red photoresist, a green photoresist and a blue photoresist in the prior art.
In this embodiment, the first touch electrode layer 105 ' is an indium tin oxide thin film, but the material of the first touch electrode layer 105 ' is not limited in the present invention, and in other embodiments, the first touch electrode layer 105 ' may also be other transparent conductive oxides in the prior art.
It should be noted that the thickness of the first touch electrode layer 105 ' is selected by taking transmittance and touch sensitivity into consideration, if the thickness of the first touch electrode layer 105 ' is too large, the transmittance of the fourth color resistor may be decreased, and if the thickness of the first touch electrode layer 105 ' is too small, the film quality may be poor, and the unit impedance may be too large, so that the touch sensitivity is poor.
In this embodiment, the fourth color resistor 304 'in a part of the pixel regions is the auxiliary color resistor 103', the fourth color resistor 304 'in another part of the pixel regions is a stacked structure of the auxiliary color resistor 103' and the first touch electrode layer 105 ', and the first touch electrode layer 105' can be used to form a mutual capacitance for touch detection, so that the color filter provided by this embodiment has a touch detection function, although the fourth color resistor 304 'has the first touch electrode layer 105', the first touch electrode layer 105 'formed by a transparent conductive oxide has a very high transmittance in a visible light range, and has a very small influence on the light transmittance of the fourth color resistor 304', and the light transmittance of the auxiliary color resistor 103 'is high, so that the light transmittance of the fourth color resistor 304' can be effectively improved, and the light transmittance of each pixel region is improved, thereby improving the light transmittance of the entire color filter. The color filter of the present embodiment can be used to form an in-cell touch detection mode liquid crystal display device, and thus the color filter of the present embodiment can improve the brightness of the in-cell touch detection mode liquid crystal display device. In addition, the first touch electrode layer 105 ' is formed only on the auxiliary color resistor 103 ', and thus, the light transmittance and chromaticity of the first to third color resistors are not affected by the first touch electrode layer 105 '.
As shown in fig. 12, in this embodiment, the plurality of pixel regions on the color filter are arranged in an array, the plurality of fourth color resistors 304 ' in a part of the columns of pixel regions are of a stacked structure of the first touch electrode layer 105 ' and the auxiliary color resistor 103 ', and the plurality of fourth color resistors 304 ' in a part of the columns of pixel regions only include the auxiliary color resistor 103 '. The first touch electrode layers 105 'in the fourth color resistors 304' in the partial row pixel area are connected end to form strip electrodes 107 ', and the adjacent strip electrodes 107' form one touch electrode. Optionally, adjacent touch electrodes may be separated by one or more pixel regions, and in a pixel region where the first touch electrode layer 105 ' is not disposed, the fourth color filter 304 ' only includes the transparent auxiliary color filter 103 ', so that the color filter provided by this embodiment has better overall light transmittance.
It should be noted that, in the present embodiment, the number of the pixel regions between two adjacent columns of the strip electrodes 107 'is the same, so that the plurality of strip electrodes 107' are regularly arranged, which does not cause a visual problem in macroscopic viewing.
As shown in fig. 13, a spacer 104 'is further formed on the first to fourth color resists, and for clarity of illustration, the spacer 104' is not shown in fig. 12. In other embodiments, the spacer pillars 104 'may also be located on the black matrix layer 101'.
Referring to fig. 14, a schematic diagram of the touch electrode in the color filter of the present embodiment is shown. In fig. 14, in order to illustrate and clarify the distribution of the touch electrodes, the first color resists 301 ' in each row, the second color resists 302 ' in each row, and the third color resists 303 ' in each row are simplified into a straight line. As shown in fig. 14, in the present embodiment, three adjacent stripe electrodes 107 'constitute one touch electrode 403 (three stripe electrodes 107' in the dotted line). The adjacent touch electrodes 403 are separated by three pixel regions. The adjacent touch electrodes 403 are respectively led out through a first electrode lead 401 and a second electrode lead 402 which are located at two sides of the pixel area array, and are electrically connected with an external touch detection chip. As can be seen from fig. 12 and 14, the touch electrodes 403 on the color filter of the present embodiment are arranged along the column direction of the pixel area array, and therefore, when the color filter of the present embodiment is used to form a liquid crystal display device with a touch detection function, the touch electrodes 403 can reflect the coordinates of touch detection points (positions touched by a finger) in the row direction of the pixel area array.
Referring to fig. 15, there is shown a top view of a second embodiment of a color filter of the present invention. This embodiment is substantially the same as the first embodiment, and the same parts as the first embodiment will not be described again, but different from the first embodiment in that:
in the plurality of pixel regions arranged in an array, the fourth color resistor in each pixel region is a stacked structure of the auxiliary color resistor 103 'and the first touch electrode layer 105'.
The first to fourth color resistors in each pixel area are arranged in the same order, the first touch electrode layers 105 'on the fourth color resistors 304' in each row of pixel areas are connected end to form strip electrodes 107 ', the adjacent strip electrodes 107' form a touch electrode, and each touch electrode is connected with an electrode lead.
The advantage of this is that the distribution density of the touch electrodes is larger, so that the touch detection of the liquid crystal display device using the color filter of the present embodiment is more sensitive.
Referring to fig. 16, a cross-sectional view of a third embodiment of a color filter of the present invention is shown. This embodiment is substantially the same as the first embodiment, and the same parts as the first embodiment will not be described again, but different from the first embodiment in that:
an organic material layer 109 ' is arranged on the first to third color resists and in the fourth opening, and the organic material layer 109 ' in the fourth opening is used as an auxiliary color resist 103 '; a first touch electrode layer 105 'is formed on the auxiliary color resistor 103'.
It should be noted that, in other embodiments, the first touch electrode layer 105 'may also be located below the auxiliary color resistor 103', which is not limited in the present invention.
The present invention also provides a liquid crystal display device, referring to fig. 17, which schematically shows a schematic diagram of an embodiment of the liquid crystal display device of the present invention, the liquid crystal display device includes:
the color filter 21 produced by the method for producing a color filter of the present invention. Specifically, in this embodiment, the color filter 21 is the color filter described in the first embodiment among the color filters provided by the present invention.
The array substrate 23 is disposed opposite to the color filter 21, and a second touch electrode layer 210 'is disposed on the array substrate 23 and is configured to form a mutual capacitance with the first touch electrode layer 105' on the color filter 21.
And a liquid crystal layer 22 between the color filter 21 and the array substrate 23.
And a touch detection circuit (not shown) electrically connected to the second touch electrode layer 210 'and the first touch electrode layer 105', and configured to detect a mutual capacitance formed between the second touch electrode layer 210 'and the first touch electrode layer 105', so as to implement touch detection.
The liquid crystal display device is an in-box touch detection liquid crystal display device with a touch detection function, and the light transmittance of the auxiliary color resistor 103' in the color filter 21 is greater than the average value of the light transmittances of the first to third color resistors, so that the light transmittance of the whole color filter 21 can be improved, and the liquid crystal display device has better brightness than the in-box touch detection liquid crystal display device in the prior art.
Specifically, in the present embodiment, the second touch electrode layer 210' on the array substrate includes a plurality of strip electrodes (not shown) arranged along a row direction of the pixel area array, and the sensing electrode can reflect coordinates of a touch detection point (a position touched by a finger) in a column direction of the pixel area array.
Although the present invention is disclosed above, the present invention is not limited thereto. Various changes and modifications may be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (17)
1. A method of making a color filter, comprising:
providing a substrate;
forming a black matrix layer on the substrate, wherein the black matrix layer comprises a plurality of pixel areas arranged in an array, and each pixel area comprises a first opening, a second opening, a third opening and a fourth opening which are arranged in parallel;
forming first to fourth color resistors in the first to fourth openings of the pixel region, respectively, including: forming transparent conductive oxides on the black matrix layer, the first to third color resistors and the auxiliary color resistor, removing the transparent conductive oxides on the black matrix layer and the first to third color resistors, and forming a first touch electrode layer on the transparent conductive oxides on the rest auxiliary color resistors;
the fourth color resistor in each pixel area is a laminated structure of an auxiliary color resistor and the first touch electrode layer, or the fourth color resistor in a part of the pixel areas is the auxiliary color resistor, the fourth color resistor in the other part of the pixel areas is a laminated structure of the auxiliary color resistor and the first touch electrode layer, the first touch electrode layer is used for touch detection, and the light transmittance of the auxiliary color resistor is greater than the average light transmittance of the first color resistor, the second color resistor and the third color resistor.
2. A method of manufacturing a color filter as defined in claim 1, wherein the step of forming the fourth color resist of the stacked-layer structure comprises: and forming an auxiliary color resistor in the fourth opening, and forming a first touch electrode layer on the auxiliary color resistor.
3. A method of manufacturing a color filter as defined in claim 1, wherein the auxiliary color resist is a colorless transparent color resist, and a light transmittance of the auxiliary color resist is larger than a light transmittance of any of the first to third color resists.
4. A method of manufacturing a color filter as defined in claim 1, wherein the auxiliary color resist is a yellow transparent color resist.
5. A color filter manufacturing method as defined in claim 2, wherein the step of forming the first to fourth color resists in the first to fourth openings of the pixel region comprises:
forming first to third color resistors in the first to third openings of the pixel region;
then, forming an organic material layer in the fourth opening and on the first to third color resists, removing the organic material layer on the first to third color resists and the black matrix layer, and reserving the organic material layer in the fourth opening as an auxiliary color resist;
and forming a first touch electrode layer on all or part of the auxiliary color resistors.
6. A color filter manufacturing method as defined in claim 2, wherein the step of forming the first to fourth color resists in the first to fourth openings of the pixel region comprises:
forming first to third color resistors in the first to third openings of the pixel region, and then forming an organic material layer in the fourth opening and on the first to third color resistors, wherein the organic material layer in the fourth opening is used as an auxiliary color resistor;
and forming a first touch electrode layer on all or part of the auxiliary color resistors.
7. A method of manufacturing a color filter according to claim 5 or 6, characterized in that the material of the organic material layer is a negative photosensitive resin material.
8. A color filter, comprising:
a substrate;
a black matrix layer on the substrate;
be located the pixel district that a plurality of arrays in the black matrix layer were arranged, the pixel district is including the first, second, third and fourth opening that arrange side by side, be formed with first to third colour in first to the third opening respectively and hinder, be formed with the fourth colour in the fourth opening and hinder, it includes to form the fourth colour and hinder: forming transparent conductive oxides on the black matrix layer, the first to third color resistors and the auxiliary color resistor, removing the transparent conductive oxides on the black matrix layer and the first to third color resistors, and forming a first touch electrode layer on the transparent conductive oxides on the rest auxiliary color resistors;
the fourth color resistor in each pixel area is a laminated structure of an auxiliary color resistor and a touch electrode layer, or the fourth color resistor in a part of the pixel areas is the auxiliary color resistor, the fourth color resistor in the other part of the pixel areas is the laminated structure of the auxiliary color resistor and a first touch electrode layer, the first touch electrode layer is used for touch detection, and the light transmittance of the auxiliary color resistor is greater than the average light transmittance of the first color resistor to the third color resistor.
9. A color filter as defined in claim 8, characterized in that the auxiliary color resist is a colorless transparent color resist, and the light transmittance of the auxiliary color resist is larger than the light transmittances of the first to third color resists.
10. A color filter as defined in claim 8, characterized in that the auxiliary color resistance is a yellow transparent color resistance.
11. The color filter as defined in claim 8, wherein the material of the first touch electrode layer is transparent conductive oxide, and the thickness of the first touch electrode layer is in the range of 150-1600 angstroms.
12. A color filter as defined in claim 8, wherein the first touch electrode layer is located above the auxiliary color resistor in the fourth color resistor of the stacked structure.
13. A color filter as defined in claim 8, characterized in that an organic material layer is provided on the first to third color resists and in the fourth opening, the organic material layer in the fourth opening serving as an auxiliary color resist.
14. A color filter as defined in claim 8, wherein in a plurality of pixel regions arranged in an array, the first to fourth color resistors are arranged in the same order in each pixel region, the first touch electrode layers of the fourth color resistors in each column of pixel regions are connected end to form a strip electrode, and the adjacent strip electrodes form a touch electrode connected to an electrode lead.
15. A color filter as defined in claim 8, wherein in the plurality of pixel regions arranged in an array, the first to fourth color resistors are arranged in the same order in each pixel region, the first touch electrode layers of the plurality of fourth color resistors in some columns of pixel regions are connected end to form a stripe electrode, and the adjacent stripe electrodes form a touch electrode.
16. A color filter as defined in claim 8, characterized in that a spacer is provided on the first to fourth color resist or black matrix layers.
17. A liquid crystal display device, comprising:
a color filter according to any one of claims 8 to 16;
the array substrate is arranged opposite to the color filter, and a second touch electrode layer is arranged on the array substrate and used for forming mutual capacitance with the first touch electrode layer on the color filter;
a liquid crystal layer between the color filter and the array substrate;
and the touch detection circuit is electrically connected with the first touch electrode layer and the second touch electrode layer and is used for detecting mutual capacitance formed by the first touch electrode layer and the second touch electrode layer so as to realize touch detection.
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