CN105887092A - PCB acid etching liquid suitable for ozone recycling method - Google Patents

PCB acid etching liquid suitable for ozone recycling method Download PDF

Info

Publication number
CN105887092A
CN105887092A CN201610275202.6A CN201610275202A CN105887092A CN 105887092 A CN105887092 A CN 105887092A CN 201610275202 A CN201610275202 A CN 201610275202A CN 105887092 A CN105887092 A CN 105887092A
Authority
CN
China
Prior art keywords
etching liquid
pcb
acidic etching
content
applicable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201610275202.6A
Other languages
Chinese (zh)
Other versions
CN105887092B (en
Inventor
黄洪
邢征
司徒粤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
South China University of Technology SCUT
Original Assignee
South China University of Technology SCUT
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by South China University of Technology SCUT filed Critical South China University of Technology SCUT
Priority to CN201610275202.6A priority Critical patent/CN105887092B/en
Publication of CN105887092A publication Critical patent/CN105887092A/en
Application granted granted Critical
Publication of CN105887092B publication Critical patent/CN105887092B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/46Regeneration of etching compositions
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/10Etching compositions
    • C23F1/14Aqueous compositions
    • C23F1/16Acidic compositions
    • C23F1/18Acidic compositions for etching copper or alloys thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

The invention discloses PCB acid etching liquid suitable for an ozone recycling method. The PCB acid etching liquid is prepared from bivalence copper with the content being 130 g/L-170 g/L, high-solubility chlorate with the content being 120 g/L-200 g/L, hydrochloric acid with the content being 1.5 mol/L-2.5 mol/L, a stabilizing agent with the content being 1 g/L-10 g/L, a wetting agent with the content being 0.1 g/L-0.3 g/L and a banking agent with the content being 0.1 g/L-0.5 g/L. According to the PCB acid etching liquid, sodium chloride in the original process is removed, chlorate higher in solubility is adopted so that crystallization can be convenient, the formula totally adapts to a new technological process, subsequent crystallization treatment is facilitated, and an original acid etching liquid formula is simplified.

Description

A kind of ozone absorption method of being applicable to PCB Acidic etching liquid
Technical field
The present invention relates to PCB (printed circuit board (PCB)) Manufacturing Techniques field, be specifically related to a kind of PCB acidic etching liquid being applicable to ozone absorption method.
Background technology
In printed circuit board manufactures, rerouting except, outside addition process etc., traditional printed circuit board is all to be removed by the part copper that need not on PCB plate in chemical reaction mode so that it is the circuitous pattern needed for formation more.And the mode of the figure transfer used as circuitous pattern part or painting wire mark makes the photic antibody erosion agent of organic compound objects system or uses metal resist layer to cover circuitous pattern surface, prevent metallic copper etched.Therefore, indispensable important step during etch process is currently manufactured printed circuit board plate.At present PCB industry internal layer the most frequently used for H2O2/HCl System and NaClO3Both acidic etching liquids of/HCl system, the kind of this type of etching solution is many, and the difference of formula can cause the etching quality effect obtained variant.But either hydrogen peroxide or sodium chlorate, the most unavoidably come up against a series of problems.Hydrogen peroxide storage difficulty, easily decomposes, easily causes potential safety hazard.Although sodium chlorate is the most stable, but along with the carrying out of reaction, the amount of sodium chloride constantly rises so that sodium chloride eventually exceeds its dissolubility and separates out, and etching causes inevitably impact.Currently designed go out a set of system utilizing ozone to carry out oxidation regeneration, but be not adapted to new reaction system by the formula of former process conditions.
Summary of the invention
Because above reason, it is an object of the invention to propose a kind of PCB acidic etching liquid being applicable to ozone absorption method, solve to use the acidic etching liquid formulation challenges under new technique.
The purpose of the present invention is achieved through the following technical solutions.
A kind of PCB acidic etching liquid being applicable to ozone absorption method, the component of this PCB acidic etching liquid includes: mother solution copper, hydrochloric acid, tranquilizer, shore protection agent, wetting agent, the chlorate of highly dissoluble and water.
Preferably, described mother solution copper is copper chloride (CuCl2);Described tranquilizer is carbamide;Described shore protection agent is mercapto benzothiazole (MBT);Described wetting agent is 2-ethylhexanol sulphuric acid vinegar sodium;The chlorate of described highly dissoluble is the chlorate that dissolubility is higher than copper chloride.
Preferably, the chlorate of described highly dissoluble is calcium chloride or zinc chloride.
Preferably, described mother solution copper content in PCB acidic etching liquid is 130 ~ 170g/L.
Preferably, described hydrochloric acid content in PCB acidic etching liquid is 1.5 ~ 2.5mol/L.
Preferably, the chlorate of described highly dissoluble content in PCB acidic etching liquid is 120 ~ 200g/L.
Preferably, described tranquilizer content in PCB acidic etching liquid is 1 ~ 10g/L.
Preferably, described wetting agent content in PCB acidic etching liquid is 0.1 ~ 0.3g/L.
Preferably, described shore protection agent content in PCB acidic etching liquid is 0.1 ~ 0.5g/L.
Preferably, the described PCB acidic etching liquid temperature when spray is 45 ~ 55 DEG C.
Compared with prior art, the invention have the advantages that and technique effect:
The present invention removes the sodium chloride in script technique, then uses the chlorate that dissolubility is bigger to facilitate crystallization, and this formula adapts to new technological flow, beneficially later crystallization completely and processes, and simplifies acid etching formula of liquid originally.
Detailed description of the invention
For making the object, technical solutions and advantages of the present invention clearer, below in conjunction with specific embodiment, the present invention is described in more detail.
Embodiment 1
A kind of PCB acidic etching liquid being applicable to ozone absorption method, mixed by following each component, and the content of each component is in etching solution: etching mother solution copper (copper chloride) 150g/L, hydrochloric acid 2mol/L, calcium chloride 160g/L, tranquilizer (carbamide) 5g/L, wetting agent (2-ethylhexanol sulphuric acid vinegar sodium) 0.2g/L, shore protection agent (MBT) 0.3g/L, remaining is water.
The acidic etching processes of this system there occurs following reaction:
1, erosion copper reaction: metallic copper is lost by the cupric in solution and bites off, reaction equation:
3Cu+3CuCl2 → 6CuCl
2, regenerative response: metallic copper is etched the Cu in tank liquor2+Aoxidize and dissolve, the 2Cu generated+The ozone oxidation being passed into again in system is oxidized to Cu through serial reaction2+, and these Cu2+Continue again, with the metallic copper on plate face reacts, therefore to make etching solution more metallic copper can be stung eating away.Here it is the circular regeneration reaction of etching solution, see below reaction equation: 2CuCl+O3 + 2HCl → 2CuCl2 + H2O +O2
3, reaction only: Cu+O3 +2HCl → CuCl2 + H2O + O2
PCB acidic etching liquid under the process conditions carrying out oxid-reclamatiom utilization under the conditions of ozone that the present embodiment uses eliminates oxidant originally;Under conditions of spray temperature is 50 DEG C, etch uniformity can reach 98%;Etching factor 3.5.The stability of effective guarantee etching solution and the precision of circuit etching figure, it is effectively improved the speed of circuit etching figure, and get rid of the sodium chloride that dissolubility is less than copper chloride completely, then use the chlorate of high-dissolvability to instead of sodium chloride, while ensureing chlorine ion concentration, can obtain, during ensure that later crystallization, the copper chloride that purity is higher, and the highly dissoluble chloride after crystallizing further is reusable.
Embodiment 2
A kind of PCB acidic etching liquid being applicable to ozone absorption method, the content of etching solution component and each component is: etching mother solution copper (copper chloride) 130g/L, hydrochloric acid 1.5mol/L, calcium chloride 120g/L, tranquilizer (carbamide) 1g/L, wetting agent (2-ethylhexanol sulphuric acid vinegar sodium) 0.1g/L, shore protection agent (MBT) 0.1g/L, remaining is water.
The acidic etching processes of this system there occurs following reaction:
1, erosion copper reaction: metallic copper is lost by the cupric in solution and bites off, reaction equation:
3Cu+3CuCl2 → 6CuCl
2, regenerative response: metallic copper is etched the Cu in tank liquor2+Aoxidize and dissolve, the 2Cu generated+The ozone oxidation being passed into again in system is oxidized to Cu through serial reaction2+, and these Cu2+Continue again, with the metallic copper on plate face reacts, therefore to make etching solution more metallic copper can be stung eating away.Here it is the circular regeneration reaction of etching solution, see below reaction equation: 2CuCl+O3 + 2HCl → 2CuCl2 + H2O +O2
3, reaction only: Cu+O3 +2HCl → CuCl2 + H2O + O2
PCB acidic etching liquid under the process conditions carrying out oxid-reclamatiom utilization under the conditions of ozone that the present embodiment uses eliminates oxidant originally;Under conditions of spray temperature is 50 DEG C, etch uniformity can reach 90%;Etching factor 3.2.The stability of effective guarantee etching solution and the precision of circuit etching figure, it is effectively improved the speed of circuit etching figure, and get rid of the sodium chloride that dissolubility is less than copper chloride completely, then use the chlorate of high-dissolvability to instead of sodium chloride, while ensureing chlorine ion concentration, can obtain, during ensure that later crystallization, the copper chloride that purity is higher, and the highly dissoluble chloride after crystallizing further is reusable.
Embodiment 3
A kind of PCB acidic etching liquid being applicable to ozone absorption method, the content of etching solution component and each component is: etching mother solution copper (copper chloride) 170g/L, hydrochloric acid 2.5mol/L, calcium chloride 200g/L, tranquilizer (carbamide) 10g/L, wetting agent (2-ethylhexanol sulphuric acid vinegar sodium) 0.3g/L, shore protection agent (MBT) 0.5g/L, remaining is water.
The acidic etching processes of this system there occurs following reaction:
1, erosion copper reaction: metallic copper is lost by the cupric in solution and bites off, reaction equation:
3Cu+3CuCl2 → 6CuCl
2, regenerative response: metallic copper is etched the Cu in tank liquor2+Aoxidize and dissolve, the 2Cu generated+The ozone oxidation being passed into again in system is oxidized to Cu through serial reaction2+, and these Cu2+Continue again, with the metallic copper on plate face reacts, therefore to make etching solution more metallic copper can be stung eating away.Here it is the circular regeneration reaction of etching solution, see below reaction equation: 2CuCl+O3 + 2HCl → 2CuCl2 + H2O +O2
3, reaction only: Cu+O3 +2HCl → CuCl2 + H2O + O2
PCB acidic etching liquid under the process conditions carrying out oxid-reclamatiom utilization under the conditions of ozone that the present embodiment uses eliminates oxidant originally;Under conditions of spray temperature is 50 DEG C, etch uniformity can reach 90%;Etching factor 3.2.The stability of effective guarantee etching solution and the precision of circuit etching figure, it is effectively improved the speed of circuit etching figure, and get rid of the sodium chloride that dissolubility is less than copper chloride completely, then use the chlorate of high-dissolvability to instead of sodium chloride, while ensureing chlorine ion concentration, can obtain, during ensure that later crystallization, the copper chloride that purity is higher, and the highly dissoluble chloride after crystallizing further is reusable.
Those of ordinary skill in the field are it is understood that the foregoing is only the specific embodiment of the present invention; it is not limited to the present invention; all within the spirit and principles in the present invention, any modification, equivalent substitution and improvement etc. done, should be included within the scope of the present invention.

Claims (10)

1. the PCB acidic etching liquid being applicable to ozone absorption method, it is characterised in that the component of this PCB acidic etching liquid comprises: mother solution copper, hydrochloric acid, tranquilizer, shore protection agent, wetting agent, the chlorate of highly dissoluble and water.
A kind of PCB being applicable to ozone absorption method the most according to claim 1 Acidic etching liquid, it is characterised in that described mother solution copper is copper chloride;Described tranquilizer is carbamide;Described shore protection agent is mercapto benzothiazole;Described wetting agent is 2-ethylhexanol sulphuric acid vinegar sodium;The chlorate of described highly dissoluble is the chlorate that dissolubility is higher than copper chloride.
A kind of PCB being applicable to ozone absorption method the most according to claim 2 Acidic etching liquid, it is characterised in that the chlorate of described highly dissoluble is calcium chloride or zinc chloride.
A kind of PCB being applicable to ozone absorption method the most according to claim 1 Acidic etching liquid, it is characterised in that described mother solution copper content in PCB acidic etching liquid is 130 ~ 170g/L.
A kind of PCB being applicable to ozone absorption method the most according to claim 1 Acidic etching liquid, it is characterised in that described hydrochloric acid content in PCB acidic etching liquid is 1.5 ~ 2.5mol/L.
A kind of PCB being applicable to ozone absorption method the most according to claim 1 Acidic etching liquid, it is characterised in that the chlorate of described highly dissoluble content in PCB acidic etching liquid is 120 ~ 200g/L.
A kind of PCB being applicable to ozone absorption method the most according to claim 1 Acidic etching liquid, it is characterised in that described tranquilizer content in PCB acidic etching liquid is 1 ~ 10g/L.
A kind of PCB being applicable to ozone absorption method the most according to claim 1 Acidic etching liquid, it is characterised in that described wetting agent content in PCB acidic etching liquid is 0.1 ~ 0.3g/L.
A kind of PCB being applicable to ozone absorption method the most according to claim 1 Acidic etching liquid, it is characterised in that described shore protection agent content in PCB acidic etching liquid is 0.1 ~ 0.5g/L.
A kind of PCB being applicable to ozone absorption method the most according to claim 1 Acidic etching liquid, it is characterised in that described PCB The acidic etching liquid temperature when spray is 45 ~ 55 DEG C.
CN201610275202.6A 2016-04-28 2016-04-28 A kind of PCB acidic etching liquid suitable for ozone absorption method Expired - Fee Related CN105887092B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610275202.6A CN105887092B (en) 2016-04-28 2016-04-28 A kind of PCB acidic etching liquid suitable for ozone absorption method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610275202.6A CN105887092B (en) 2016-04-28 2016-04-28 A kind of PCB acidic etching liquid suitable for ozone absorption method

Publications (2)

Publication Number Publication Date
CN105887092A true CN105887092A (en) 2016-08-24
CN105887092B CN105887092B (en) 2019-01-15

Family

ID=56703035

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610275202.6A Expired - Fee Related CN105887092B (en) 2016-04-28 2016-04-28 A kind of PCB acidic etching liquid suitable for ozone absorption method

Country Status (1)

Country Link
CN (1) CN105887092B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108174520A (en) * 2017-12-20 2018-06-15 深圳市板明科技有限公司 Liquid medicine is lost in a kind of sudden strain of a muscle suitable for MSAP techniques

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4636282A (en) * 1985-06-20 1987-01-13 Great Lakes Chemical Corporation Method for etching copper and composition useful therein
CN1629357A (en) * 2003-12-16 2005-06-22 清英实业有限公司 Surface coarsening agent for copper or copper alloys
CN102995021A (en) * 2011-09-08 2013-03-27 关东化学株式会社 Etching solution composition and etching method for copper and copper alloy
CN103890233A (en) * 2012-09-28 2014-06-25 Mec股份有限公司 Microetching agent for copper, supplementary liquid for same, and manufacturing method for circuit board
CN103952702A (en) * 2014-05-04 2014-07-30 深圳市实锐泰科技有限公司 Etching liquid and method for etching fine lines of flexible circuit board by using same
CN104073804A (en) * 2014-06-17 2014-10-01 长沙牧泰莱电路技术有限公司 PCB (Polychlorinated Biphenyl) acidic etching solution

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4636282A (en) * 1985-06-20 1987-01-13 Great Lakes Chemical Corporation Method for etching copper and composition useful therein
CN1629357A (en) * 2003-12-16 2005-06-22 清英实业有限公司 Surface coarsening agent for copper or copper alloys
CN102995021A (en) * 2011-09-08 2013-03-27 关东化学株式会社 Etching solution composition and etching method for copper and copper alloy
CN103890233A (en) * 2012-09-28 2014-06-25 Mec股份有限公司 Microetching agent for copper, supplementary liquid for same, and manufacturing method for circuit board
CN103952702A (en) * 2014-05-04 2014-07-30 深圳市实锐泰科技有限公司 Etching liquid and method for etching fine lines of flexible circuit board by using same
CN104073804A (en) * 2014-06-17 2014-10-01 长沙牧泰莱电路技术有限公司 PCB (Polychlorinated Biphenyl) acidic etching solution

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
张招贤等: "《涂层钛电极》", 31 May 2014, 北京:冶金工业出版社 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108174520A (en) * 2017-12-20 2018-06-15 深圳市板明科技有限公司 Liquid medicine is lost in a kind of sudden strain of a muscle suitable for MSAP techniques
CN108174520B (en) * 2017-12-20 2020-08-28 深圳市板明科技股份有限公司 Flash etching liquid medicine suitable for MSAP (multiple-addition-fragmentation chain) process

Also Published As

Publication number Publication date
CN105887092B (en) 2019-01-15

Similar Documents

Publication Publication Date Title
EP2165007B1 (en) A method for etching copper and recovery of the spent etching solution
US10087368B2 (en) High-efficiency high-quality and safe alkaline cupric chloride etchant for printed circuit board
US2908557A (en) Method of etching copper
CN104073804B (en) A kind of PCB acidic etching liquid
CN102942278A (en) Method for treating acidic copper-containing waste liquid
US9315393B2 (en) Hydrogen chloride removal process
CN106795633A (en) The manufacture method of etchant, the engraving method of multilayer film and display device
JP2009203493A (en) Etching method and method for regenerating etching liquid
TWI649405B (en) A highly efficient and environmentally friendly printed circuit board alkaline copper chloride etching solution
CN105887092A (en) PCB acid etching liquid suitable for ozone recycling method
TW201604126A (en) Method and apparatus for recycling waste sulfuric acid
CN112064030A (en) Printed circuit board alkaline etching solution suitable for copper extraction through electrolysis
JPS6363633B2 (en)
CN110106506A (en) A kind of acidic etching liquid regeneration method
US9301399B2 (en) Method of treating wiring substrate and wiring substrate manufactured by the same
CN112410792B (en) PCB iron-free nitric acid type tin stripping water and regeneration and reuse method thereof
US20060191376A1 (en) Method and devices for recycling copper from a discarded circuit board and a discarded fluid containing copper
JP2700982B2 (en) Etching equipment
CN105908189A (en) Method for reusing PCB acid etching liquid by ozone oxidation circulation
CN105776312A (en) Recovery method for invalid alkaline copper-containing etching liquid
JP2011181890A (en) Silver treatment agent, treatment method of silver, and method of forming conductor pattern
JP4580085B2 (en) Method for etching metal tin or tin alloy and metal tin or tin alloy etchant
TWI726677B (en) Method and system for regenerating acid etching waste liquid
TWI543930B (en) A Recycling Method for Treating Copper Nitrate Waste Liquid with Acetic Acid
JPH0631447B2 (en) Etching method for transparent conductive film

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20190115

CF01 Termination of patent right due to non-payment of annual fee