CN105842842B - A kind of dot structure of resistance to deformation and lower substrate and electric moistening display including it - Google Patents

A kind of dot structure of resistance to deformation and lower substrate and electric moistening display including it Download PDF

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Publication number
CN105842842B
CN105842842B CN201610329981.3A CN201610329981A CN105842842B CN 105842842 B CN105842842 B CN 105842842B CN 201610329981 A CN201610329981 A CN 201610329981A CN 105842842 B CN105842842 B CN 105842842B
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resistance
deformation
dot structure
slot
display area
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CN105842842A (en
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周蕤
唐彪
吴昊
郭媛媛
罗伯特·安德鲁·海耶斯
周国富
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South China Normal University
Shenzhen Guohua Optoelectronics Co Ltd
Academy of Shenzhen Guohua Optoelectronics
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South China Normal University
Shenzhen Guohua Optoelectronics Co Ltd
Academy of Shenzhen Guohua Optoelectronics
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/004Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
    • G02B26/005Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid based on electrowetting

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)

Abstract

The invention discloses a kind of dot structure of resistance to deformation and include its lower substrate and electric moistening display, in display area, dot structure surrounds multiple pixel compartments, pixel compartments are arranged in array, in the outer region of display area, dot structure is equipped with resistance to deformation slot of at least two row around display area interruption setting, and resistance to deformation slot is strip slot, and each row resistance to deformation slot shifts to install;After melting down heat treatment process, outer region in display area, dot structure material can be shunk outward, under this contraction, resistance to deformation slot is stretched deformation, since each column resistance to deformation slot shifts to install, the tensile stress that the outer region of display area generates is absorbed in deformation, substantially reduce the tensile stress for being transmitted to the pixel wall to form pixel compartments, it is significantly reduced the deformation of electric moistening display pixel compartments after melting down heat treatment process, improve the uniformity of subsequent ink fill process, prevent hydrophobicity insulating layer damaged in the outer region tension stress of display area.

Description

A kind of dot structure of resistance to deformation and lower substrate and electric moistening display including it
Technical field
The present invention relates to the dot structure of electrowetting display technology field more particularly to a kind of resistance to deformation and including under it Substrate and electric moistening display.
Background technology
Electric moistening display, also referred to as electric wet-type display, are a kind of reflected displaying devices, by base in conduction in structure Plate, packaging adhesive frame and lower substrate composition, lower substrate include electrically-conductive backing plate(TFT or ito substrate), hydrophobicity insulating layer, pixel knot Structure layer.Filled with ink and the mutual insoluble fluid of two kinds of electrolyte solution in the seal cavity of upper and lower base plate composition, electrowetting is aobvious Show device by the relative motion of two kinds of fluids to generate display effect:When between upper and lower base plate without applying voltage, oil Ink is spread in pixel compartments, shows the color of ink;Upon application of a voltage, ink is shunk, and shows the color of lower substrate.Due to electricity It soaks display device and realizes display effect by the fluid reflection environment light source of relative motion, with low energy consumption, stingless to human eye Swash property, fast response time, can show the remarkable advantages such as dynamic video.
Referring to Figures 1 and 2, Fig. 1 is the vertical view of electric moistening display lower substrate(Non- equal proportion), Fig. 2 is aobvious for electrowetting Show that the front view of device lower substrate, lower substrate include ITO/TFT substrates 1 ', hydrophobicity insulating layer 2 ' and dot structure layer 3 ', hydrophobic Property insulating layer 2 ' be covered on ITO/TFT substrates 1 ', hydrophobicity insulating layer 2 ' is continuous membrane structure, protection ITO/TFT substrates 1 '. It is discontinuous dot structure layer 3 ' on hydrophobicity insulating layer 2 ', wherein intermediate pixelated array lattice structural region is viewing area Domain 4 ', dot structure layer 3 ' surrounds multiple pixel compartments 5 ' in display area 4 ', and pixel compartments 5 ' are hollow and expose the hydrophobic of bottom Property insulating layer 2 ', the sizes of pixel compartments 5 ' is 100-200um.Since hydrophobicity insulating layer 2 ' has non-stick and release performance, It both directly will appear the phenomenon that sticking bad and delamination when preparing dot structure layer 3 ' above.Therefore, electric at present It soaks in device process flow, needs to carry out surface modification after preparing hydrophobicity insulating layer 2 ' to improve its adhesion, then exist Coating photoresist material preparation dot structure layer 3 ' thereon.After the exposure imaging for completing dot structure layer 3 ', then by lower substrate It is placed in atmosphere furnace and melts down heat treatment(180-240℃)To restore the surface hydrophobicity of hydrophobicity insulating layer 2 '.It is such to melt down heat Treatment process can cause the Other substrate materials 7 ' outside display area to shrink, and dot structure layer 3 ' is made to deform, as Fig. 3 shows.Especially It is in the edge 8 ' of display area 4 '(For round rectangle dashed region in Fig. 3), pixel compartments 5 ' will produce 100-300um's Displacement and deformation 9 '(For dotted-line ellipse region in Fig. 3).This deformation 9 ' will have a direct impact on subsequent ink filling work procedure and display Device display effect deforms the breakage for resulting even in pixel wall and hydrophobicity insulating layer, to directly result in display when serious Failure.
Invention content
Technical problem to be solved by the invention is to provide a kind of dot structure of resistance to deformation and including its lower substrate and Electric moistening display.
The technical solution used in the present invention is:
A kind of dot structure of resistance to deformation, in intermediate region, dot structure surrounds multiple pixel compartments, and the pixel compartments are in battle array Row arrangement, pixelated array lattice structural region is display area, and in the outer region of display area, dot structure is equipped at least two For row around the resistance to deformation slot of display area interruption setting, the resistance to deformation slot is strip slot, respectively arranges the resistance to deformation slot dislocation Setting.
In some specific embodiments, each resistance to deformation slot and the pixel compartments near it in each row resistance to deformation slot Spacing it is equal.
In a preferred embodiment, near the pixel compartments of that row resistance to deformation slot of the pixel compartments Yu most outer Spacing is equal to the spacing of two neighboring pixel compartments.
In a preferred embodiment, the spacing of adjacent two row resistance to deformation slot is equal to the spacing of two neighboring pixel compartments.
In some specific embodiments, the width of each resistance to deformation slot is equal in each row resistance to deformation slot.
In some specific embodiments, the width of the resistance to deformation slot is 20-40 μm.
In some specific embodiments, the pixel compartments of four Angle Positions of the display area are towards the angle outside array For circular arc.
In some specific embodiments, the outer region at four angles of the display area is equipped with arc-shaped resistance Shape slot, the resistance to deformation slot and the circular arc close to its pixel compartments are concentric.
The present invention also provides the pixel knots of a kind of lower substrate of electric moistening display, including resistance to deformation as described above Structure.
The present invention also provides a kind of electric moistening displays, include the lower substrate of electric moistening display as described above.
The beneficial effects of the invention are as follows:
For preparing melting down heat treatment process and can cause what dot structure deformed to ask during electric moistening display at present Topic, the present invention is by the way that in the outer region of display area, at least two row of setting are interrupted the resistance to deformation of setting around display area Slot, the resistance to deformation slot are strip slot, respectively arrange the resistance to deformation slot and shift to install, and furnace treatment is being returned to reduce the pixel compartments Deformation after science and engineering skill;After melting down heat treatment process, the outer region in the display area, dot structure material can be outside Side is shunk, and under this contraction, the resistance to deformation slot is stretched deformation, since resistance to deformation slot described in each column shifts to install, Stretcher strain converts the contraction of dot structure layer outer to the dilatating and deformable of resistance to deformation slot, exists to reduce electric moistening display The deformation in pixel compartments region after heat treatment process is melted down, the uniformity of subsequent ink fill process is improved.Meanwhile resistance to deformation slot Deformation, which reduces, is heat-shrinked caused relative displacement between dot structure layer and hydrophobicity insulating layer, reduces and melts down heat treatment The shear stress that hydrophobicity insulating layer is subject in the outer region of display area after technique, prevents hydrophobicity insulating layer on this boundary Breakage, to improve product quality and yields.
Description of the drawings
Fig. 1 is the vertical view of traditional electric moistening display lower substrate;
Fig. 2 is the front view of traditional electric moistening display lower substrate;
Fig. 3 is that traditional electric moistening display dot structure melts down the front and back deformation schematic diagram of heat treatment process;
Fig. 4 is the vertical view of the electric moistening display lower substrate of resistance to deformation;
Fig. 5 is Section A-A figure in Fig. 4;
Fig. 6 is the pattern schematic diagram of mask plate;
Fig. 7 is that the dot structure of two row resistance to deformation slots melts down the front and back deformation partial schematic diagram of heat treatment process;
Fig. 8 is that the dot structure of three row resistance to deformation slots melts down the front and back deformation partial schematic diagram of heat treatment process.
Specific implementation mode
It is the vertical view of the electric moistening display lower substrate of resistance to deformation with reference to Fig. 4-5, Fig. 4, Fig. 5 is Section A-A in Fig. 4 Figure, the present invention provides a kind of lower substrate of the electric moistening display of resistance to deformation, electric moistening display is also referred to as electricity moistening display Device, present invention is equally applicable to electric wet-type display, lower substrate includes ITO/TFT substrates 1, hydrophobicity insulating layer 2 and resistance The dot structure 3 of shape, hydrophobicity insulating layer 2 are covered on ITO/TFT substrates 1, and in the present embodiment, hydrophobicity insulating layer 2 is Continuous membrane structure, protection ITO/TFT substrates 1.The dot structure 3 is covered in the upper surface of described hydrophobicity insulating layer 2, and described The outer edge of dot structure 3 exceeds the outer edge of the hydrophobicity insulating layer 2.The dot structure 3, in intermediate region, pixel Structure 3 surrounds multiple pixel compartments 5, and the pixel compartments 5 are arranged in array, and pixelated array lattice structural region is display area 4, Fig. 4 Middle dotted line institute frame region is display area 4, and in the outer region 10 of display area 4, dot structure 3 is equipped at least two row and surrounds The resistance to deformation slot 6 of the interruption setting of display area 4, the resistance to deformation slot 6 is strip slot, respectively arranges the dislocation of resistance to deformation slot 6 and sets It sets.Each resistance to deformation slot 6 is equal with the spacing of pixel compartments 5 near it in each row resistance to deformation slot 6.Each row resistance to deformation slot The width of each resistance to deformation slot 6 is equal in 6, and the width of the resistance to deformation slot 6 is 20-40 μm, the width of the resistance to deformation slot 6 with It the size dimension of pixel compartments 5 and changes, when the length of side of the pixel compartments 5 is less than 150 μm, the width of the resistance to deformation slot 6 20 μm of lower limiting value is selected, when the length of side of the pixel compartments 5 is more than 200 μm, the width of the resistance to deformation slot 6 chooses 40 μm of limit value.
In a preferred embodiment, near the pixel compartments of that row resistance to deformation slot 6 and most outer of the pixel compartments 5 5 spacing is equal to the spacing of two neighboring pixel compartments 5, and the spacing of adjacent two row resistance to deformation slot 6 is equal to two neighboring pixel compartments 5 Spacing.How many row resistance to deformation slots 6 are specifically set, are determined by the width in the outer region 10 of the display area 4, when the display When the width < 5mm in the outer region 10 in region 4, the columns of setting resistance to deformation slot 6 is two row, when outside the display area 4 When along the width G T.GT.GT 5mm in region 10, often increases 2mm width and then increase the row resistance to deformation slot 6.
The pixel compartments 5 of four angles, 7 position of the display area 4 towards the angle outside array be circular arc.Preferably implementing In example, the pixel compartments 5 of four angles, 7 position of the display area 4 are that a quarter is round, and radius is equal to other pixel compartments 5 The length of side.The outer region 10 at four angles 7 of the display area 4 is equipped with arc-shaped resistance to deformation slot 6, the resistance to deformation slot 6 It is concentric with the circular arc close to its pixel compartments 5.The resistance to deformation in the outer region 10 of the four edges of the display area 4 Slot 6 is parallel to the pixel compartments 5 closed on and is arranged towards the side outside array.The outer region 10 of the four edges of the display area 4 The resistance to deformation slot 6 is rectangle resistance to deformation slot 8, and the length of the rectangle resistance to deformation slot 8 is equal to the size of pixel compartments 5, and described Rectangle resistance to deformation slot 8 shifts to install.In a preferred embodiment, the center line of the width direction of the rectangle resistance to deformation slot 8 It is directed at the center in each 6 gap of resistance to deformation slot of adjacent column.
The preparation method of the dot structure 3 of resistance to deformation as described above, includes the following steps:(1)Preparing has pixel compartments 5 With the mask plate of 6 pattern of resistance to deformation slot;(2)One layer of photoetching is coated on preparing the ITO/TFT substrates 1 for having hydrophobicity insulating layer 2 The mask plate is aligned by glue material with substrate 1;(3)Based on the mask plate after alignment to the photoetching glue material of coating Material is exposed processing, and the pattern development on the mask plate is imaged onto on the hydrophobicity insulating layer 2.If the positivity used The pattern of Other substrate materials, the mask plate 9 is as shown in Figure 6.In other examples, preparation method can also include following Step:(1)Prepare the mask plate with 6 pattern of pixel compartments 5 and resistance to deformation slot;(2)One layer of light is coated on ITO/TFT substrates 1 The mask plate is aligned by photoresist material with substrate 1;(3)Based on the mask plate after alignment to the photoresist of coating Material is exposed processing, and the pattern development on the mask plate is imaged onto on ITO/TFT substrates 1;(4)Then again in pixel Layer of hydrophobic insulating materials is arranged in the upper surface of structure 3 and ITO/TFT substrates 1;(5)Then it is surrounded in dot structure 3 recessed Protective layer material is filled in slot, is then removed the hydrophobicity insulating materials of the upper surface of the dot structure 3, is obtained discrete pattern Hydrophobicity insulating layer 2.
With reference to Fig. 7-8, Fig. 7 is that deformation is partially schematic before and after the dot structure of two row resistance to deformation slots melts down heat treatment process Figure, Fig. 8 are that the dot structure of three row resistance to deformation slots melts down the front and back deformation partial schematic diagram of heat treatment process, complete dot structure After 3 exposure imaging, then lower substrate is placed in atmosphere furnace and melts down heat treatment(180-240℃)To restore hydrophobicity insulating layer 2 Surface hydrophobicity.Outer region 10 in the display area 4, as shown in arrow direction in figure, dot structure material is outside Side is shunk, and under this contraction, the resistance to deformation slot 6 is stretched deformation.Since resistance to deformation slot 6 described in each column shifts to install, The deformation of shrinkage direction is switched to the deformation of normal direction by the action of pulling stress on the outside of dot structure material layer when outermost side channel interval, The slot interval for inside is remake, the deformation through two row resistance to deformation slots, the outer region 10 for absorbing the display area 4 generates Tensile stress, substantially reduce the tensile stress for being transmitted to the pixel wall to form the pixel compartments 5, it is described so as to be substantially reduced The deformation of pixel compartments 5.Meanwhile the deformation of resistance to deformation slot reduce dot structure layer and hydrophobicity insulating layer caused by thermal contraction it Between relative displacement, reduce the hydrophobicity insulating layer 2 in the outer region of the display area 4 after melting down heat treatment process by Shear stress, to prevent hydrophobicity insulating layer 2 damaged in the outer region of the display area 4.The display area 4 The width in outer region 10 is bigger, and the shrinkage that pixel structural material generates after melting down heat treatment process is bigger, so that with institute The increase for stating the width in the outer region 10 of display area 4 needs to increase resistance to deformation slot columns, to improve the energy for absorbing deformation Power.

Claims (10)

1. a kind of dot structure of resistance to deformation, which is characterized in that in intermediate region, dot structure surrounds multiple pixel compartments, described Pixel compartments are arranged in array, and pixelated array lattice structural region is display area, in the outer region of display area, dot structure Equipped at least two row around display area interruption setting resistance to deformation slot, the outer region of the display area four edges it is described Resistance to deformation slot is rectangle resistance to deformation slot, and the resistance to deformation slot in the outer region at the angle of the display area four is arc-shaped resistance to deformation Slot respectively arranges the resistance to deformation slot and shifts to install.
2. the dot structure of resistance to deformation according to claim 1, which is characterized in that each resistance in each row resistance to deformation slot Shape slot is equal with the spacing of the pixel compartments near it.
3. the dot structure of resistance to deformation according to claim 2, which is characterized in that near that row of the pixel compartments Resistance to deformation slot is equal to the spacing of two neighboring pixel compartments with the spacing of the pixel compartments of most outer.
4. the dot structure of resistance to deformation according to claim 2, which is characterized in that the spacing etc. of adjacent two row resistance to deformation slot In the spacing of two neighboring pixel compartments.
5. the dot structure of resistance to deformation according to claim 1, which is characterized in that each resistance in each row resistance to deformation slot The width of shape slot is equal.
6. the dot structure of resistance to deformation according to claim 1, which is characterized in that the width of the resistance to deformation slot is 20- 40μm。
7. the dot structure of resistance to deformation according to claim 1, which is characterized in that four Angle Positions of the display area Pixel compartments towards the angle outside array be circular arc.
8. the dot structure of resistance to deformation according to claim 7, which is characterized in that the outer at four angles in the display area The resistance to deformation slot in region and the circular arc close to its pixel compartments are concentric.
9. a kind of lower substrate of electric moistening display, which is characterized in that including such as claim 1-8 any one of them resistance to deformation Dot structure.
10. a kind of electric moistening display, which is characterized in that include the lower substrate of electric moistening display as claimed in claim 9.
CN201610329981.3A 2016-05-17 2016-05-17 A kind of dot structure of resistance to deformation and lower substrate and electric moistening display including it Active CN105842842B (en)

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CN107589539A (en) * 2017-09-30 2018-01-16 肇庆市华师大光电产业研究院 A kind of ink moves controllable electric moistening display part manufacture method
CN109061873A (en) * 2018-09-07 2018-12-21 华南师范大学 A kind of pixel wall, electric moistening display part and device
CN110660331B (en) * 2019-10-12 2021-08-03 云谷(固安)科技有限公司 Flexible display screen, flexible display panel and preparation method of spherical display screen
CN111968502A (en) * 2020-07-30 2020-11-20 合肥维信诺科技有限公司 Array substrate and display panel

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US9046682B2 (en) * 2013-11-05 2015-06-02 Amazon Technologies, Inc. Mechanical stress mitigation in electrowetting display structures
CN104932097B (en) * 2015-06-10 2017-08-18 华南师范大学 A kind of electric moistening display and preparation method thereof
CN105425386B (en) * 2015-12-24 2018-01-16 深圳市国华光电科技有限公司 A kind of Electrowetting device and preparation method thereof

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