CN105827121A - Electrolyte plasma polishing power supply system and control method thereof - Google Patents
Electrolyte plasma polishing power supply system and control method thereof Download PDFInfo
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- CN105827121A CN105827121A CN201610283528.3A CN201610283528A CN105827121A CN 105827121 A CN105827121 A CN 105827121A CN 201610283528 A CN201610283528 A CN 201610283528A CN 105827121 A CN105827121 A CN 105827121A
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M7/00—Conversion of ac power input into dc power output; Conversion of dc power input into ac power output
- H02M7/003—Constructional details, e.g. physical layout, assembly, wiring or busbar connections
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02H—EMERGENCY PROTECTIVE CIRCUIT ARRANGEMENTS
- H02H9/00—Emergency protective circuit arrangements for limiting excess current or voltage without disconnection
- H02H9/02—Emergency protective circuit arrangements for limiting excess current or voltage without disconnection responsive to excess current
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- Power Engineering (AREA)
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- Mechanical Treatment Of Semiconductor (AREA)
Abstract
The invention relates to the technical field of metal material surface treatment, specifically to an electrolyte plasma polishing power supply system and control method thereof, and the system provides pulsation power for metal surface treatment. The power supply system comprises a monitoring module, and a power module, a heat exchange module, a filter module and a modulation module which are connected in sequence, wherein the monitoring module is electrically connected with the rest of modules. The electrolyte plasma polishing power supply system solves the problems existing in the prior art that when a direct current power supply is adopted to supply power, the fault rate is high, the efficiency is low and the process quality is not easy to control. Through adoption of a medium phase-change heat exchange technology, the work efficiency and reliability of the power supply are improved; through setting of appropriate capacitance and inductance parameters, negative influence of surge current on the power supply and a power grid is inhibited, and surge current required by a polishing process is provided at the same time; and through the arrangement of the modulation module between the filter module and polishing equipment, pulsation polishing is realized. The power supply system remarkably improves processing efficiency and process quality, and also saves energy and reduces consumption, thereby generating relatively large economic benefits.
Description
Technical field
The present invention relates to technical field of metal material surface treatment, be specifically related to a kind of electrolyte plasma polishing power-supply system and control method thereof.
Background technology
Metal parts to be processed is placed in electrolyte solution, forms air film on its surface, by electric discharge and chemical reaction flattened faces under the effect of electric field, make piece surface reach the roughness of requirement.The method is for the process on metal parts surface, deburring can be completed, remove the techniques such as oxide layer, trimming, polishing, substitute machinery (manually) and chemical method, not only efficiency is high, quality is good, also allow for realizing automatization's Continuous maching, greatly reduce processing cost simultaneously, stop dust pollution, solve pollution problem and potential safety hazard present in machinery, chemical process.
This processing method uses DC source to utilize plasma continuous discharge flattened faces, the electric discharge of plasma initial stage can produce the biggest surge, on the one hand surge provides the energy of necessity to deburring or polishing, and on the other hand, power supply and electrical network are caused impact greatly and interference by surge.Prior art uses power frequency supply, meets the requirement of technique by increasing reserve capacity, thus brings that equipment is huge, energy consumption is high, inefficient problem.Such as the most not mentioned form of power and power supply controls such as Chinese patent CN201010598876-novel polishing machine, the polishing of CN201210149145-electrolyte plasma, CN201210361700-Electrolyte plasma polisher for quantity production, the physicochemical electron beam polishing method of Chinese patent CN01118250-discloses voltage adjusting range (240V～380V), surge current is any limitation as or utilizes by the technical measures being all not directed to take necessity, and therefore actual effect is that equipment is huge, inefficiency.The most in actual applications; comparing with power frequency supply, if using high frequency switch power can improve power supplying efficiency, but Switching Power Supply is in order to protect power device generally to use soft starting mode; the ability of its antisurge; being unfavorable for that overload uses, and the initial stage surge current of polishing is usually specified 5～6 times, the width of surge also can reach some milliseconds; if meeting surge by increasing the output of power supply; its power factor (PF) is low, and cost is high, thus reduces the cost performance of equipment.
The unfavorable factor using DC voltage to polish is: there is the shortcomings such as discharge process energy is uncontrollable, surface of polished is second-rate, electrolyte loss is very fast.Chinese patent CN101173361.B-non-equilibrium liquid condition composite pulse plasma polishing method attempts to use pulse to substitute direct current in polishing process, its starting point is " pulse is more beneficial for plasma and produces; discharge ion can be made to obtain higher kinetic energy, thus obtain more preferable mirror effect and faster polishing velocity ".Given this, which disclose a kind of employing pulse finishing method, but the method is confined to a kind of isopulse processing mode " makes reaction be in the most violent state ", and air film is stablized in the not mentioned change utilizing pulse parameter in polishing process, control discharge energy and reach the most accurate surface treatment effect.This isopulse processing method is degrading the steady-state conditions of air film in actual applications, air film tend to disappear moment can produce high current peak, making chopper bear the biggest impact, the most this method can be only applied in the most low power polishing, and practicality is restricted.It addition, the existing commonly used water-cooled of polishing power supply or air-cooled mode are dispelled the heat.Water-cooled heat exchange there is the problem that 1. equipment occupation space is big；2. the mineral in water separates out fouling reduction heat exchange efficiency, blocks heat exchanger channels；The most specially treated water use cost is high.Air-cooled heat exchange there is the problem that the most air-cooled heat exchange brings the corrosive gas in environment and dust into power source internal, adds the fault rate that equipment runs, shortens the service life of equipment；The most air-cooled efficiency is low, limits the performance of equipment effectiveness.
Summary of the invention
Using DC source to power for prior art and there is the problems such as energy consumption is high, processing quality is not easily controlled, the present invention uses high-frequency inversion mode as power supply, the power device using medium phase change technique to be power supply heat radiation；By arranging the impact to power supply of the applicable inductance surge current suppression in output loop, applicable electric capacity is set technique needs surge current is provided.
The technical scheme is that and be achieved in that: a kind of electrolyte plasma polishing power-supply system, intelligent alterable electric power is provided for Treatment of Metal Surface, it is characterized in that, this power-supply system is made up of with the power module being sequentially connected with, heat exchange module, filtration module, modulation module monitoring module, and described monitoring module is electrically connected with remaining each module respectively.
The alternating voltage that electrical network inputs is become DC voltage by described power module, utilizes heat exchange module to cool down power device；Heat exchange module uses medium phase-change heat-exchange technology to cool down the power device of power-supply system, and heat transfer process is by monitoring module control；Filtration module connects power supply, utilizes lc circuit buffer, LC parameter can Automatic Combined within the specific limits, the impact to high frequency switch power of the effective surge current suppression, the surge current of needs is provided for glossing simultaneously；Modulation module connects filtration module and polissoir, is pulse voltage by the DC voltage conversion of filtered for power module rear output, detects curent change, regulate pulse parameter in real time, form stable air film in polishing process；Monitoring module is monitored and controlled DC voltage amplitude, pulse parameter, solution temperature concentration, heat transferring medium flow etc..
Preferably, described power module uses one or more groups frequency range to form at the full-bridge converter topology DC source of 10KHz～50KHz, and voltage magnitude is adjusted by the way of monitoring module uses analog or digital, and voltage regulation limits is 150V～500V.
Preferably, described heat exchange module uses medium phase-change heat-exchange mode plasma polishing power supply to carry out closing heat exchange, the boiling point 50 DEG C ± 10% of medium.Making the power device temperature of power supply less than 60 DEG C, solution water-cooled use cost is high, the life-span is short, and air-cooled heat exchange corrosive atmosphere is on power supply reliability and the impact in life-span.
Preferably, it is provided with lc circuit between power supply and load, the impact to power supply of the plasma discharge surge is limited by the characteristic of inductance, the surge of necessity is provided for plasma discharge by the characteristic of electric capacity simultaneously, LC parameter the most as required can Automatic Combined, make high frequency switch power be applied to electrolyte plasma polishing technique and be possibly realized.
Preferably, pulse frequency range of accommodation 1KHz of described modulation module～20kHz；Voltage magnitude 150V～500V；Dutycycle 5%～100%.Compared with DC voltage polishing, it is the energy being controlled electric discharge by regulation pulse parameter that pulse polishes more favourable effect, to reach optimum polishing effect, and regulates pulse parameter in real time with the process of polishing and stablize air film, limits surge and transship.
Further, described monitoring module carries out three grades of monitorings；First order monitoring VD and power supply heat exchange, be automatically adjusted heat exchange power according to load state, be automatically adjusted output voltage according to technological requirement；The second level selects and controls inductance and capacitance parameter；Third level monitoring and regulation pulse parameter, direct current (dutycycle is 100%) is used as polished the initial stage, it is not more than 30% with polishing process regulation pulse duty factor, and feed back polishing electric current, by changing pulse voltage amplitude or duty-cycle limit surge current, to obtain metastable air film.
Preferably, described monitoring module uses PLC or embedded scm controller.
Preferably, described monitoring module uses the mode of analog or digital to realize the manually or automatically regulation of pulse parameter.
In addition present invention also offers a kind of control method utilizing electrolyte plasma polishing power-supply system to be polished, comprise the steps:
A) power module uses full-bridge converter topology that the alternating voltage that electrical network inputs is become DC voltage；
B) heat exchange module uses medium phase-change heat-exchange mode (evaporative condenser) to cool down the power device of power-supply system；
C) filtration module uses LC to arrange, LC parameter can Automatic Combined within the specific limits, by inductance suppression current surge to power surges, be the surge current that electric discharge provides that glossing needs by electric capacity；
D) modulation module is between filtration module and polissoir, is pulse voltage by DC voltage conversion, carries out pulse parameter regulation according to polishing process, controls the energy of plasma discharge and metastable air film；
E) monitoring module regulates DC voltage, pulse parameter according to technological requirement, selects and controls inductance L and electric capacity C parameter, and be monitored the heat exchange situation of power supply；
Preferably, solution temperature, concentration, electric current density, the parameter of process time are detected and control by described monitoring module processes technique according to metal material surface requirement respectively.
Preferably, described monitoring module is additionally provided with work timing, state shows, malfunction shows, fault acoustic-optic alarm.
The present invention solves defect present in background technology, has the advantages that
The present invention provides variable power for Treatment of Metal Surface, solves prior art and uses DC source to power to there is the problems such as fault rate is high, efficiency is low, processing quality is not easily controlled.The present invention improves work efficiency and the reliability of power supply by using medium phase-change heat-exchange technology；By arranging applicable capacitor and inductor parameter in the loop between power supply and output, surge current suppression, to power supply and the adverse effect of electrical network, provides glossing to need surge current simultaneously；By arranging modulation module between filtration module and polissoir, realize pulsation polishing, utilize pulse parameter to control the energy of plasma discharge and stable air film, make pulsation plasma polishing be applied to actual production and become a reality, reach the polishing effect required, reduce electrolyte consumption simultaneously.This electric power system significantly improves working (machining) efficiency and processing quality, reduces equipment cost simultaneously, not only increases product quality the most energy-saving and cost-reducing, creates bigger economic benefit.
Accompanying drawing explanation
Fig. 1 is the theory of constitution block diagram of the present invention；
Fig. 2 is the theory of constitution block diagram of heat exchange module；
Fig. 3 is the impulse waveform of modulation module output；
Fig. 4 is the equivalent circuit diagram of filtration module；
Fig. 5 is the process chart of electrolyte plasma polishing；
Detailed description of the invention
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, it is clear that described embodiment is only a part of embodiment of the present invention rather than whole embodiments.Based on the embodiment in the present invention, the every other embodiment that those of ordinary skill in the art are obtained under not making creative work premise, broadly fall into the scope of protection of the invention.
A kind of electrolyte plasma polishing power-supply system as shown in Figure 1 and control method.It is divided into following five modules.Power module uses the combination of full-bridge high-frequency switch module, and the alternating voltage that electrical network inputs is become DC voltage.The frequency of alteration switch is 20kHz；Voltage magnitude range of accommodation 150V～500V, rated capacity is 100KW.The purpose using high frequency switch power is to improve the dynamic response of power supply, power supplying efficiency and control performance, reduces equipment volume and weight, improves the cost performance of power supply.Heat exchange module connects power module, uses medium phase-change heat-exchange technology that the power device of power supply is circulated cooling, has reached energy-conservation, has improved power work efficiency and the purpose of reliability.nullHeat exchange work process is as shown in Figure 2，The device needing heat exchange in power module includes high frequency transformer and power model，In the present embodiment, circulating cooling medium is introduced into power model，Enter transformator again，Select medium phase transition temperature about 50 DEG C (boiling point)，Supervising device utilizes temperature sensor to detect the surface temperature of each power module radiator，Control frequency conversion voltage adjusting device and adjust different pipeline medium pressure，When spreader surface temperature is higher than phase transition temperature (50 DEG C)，Medium evaporator strip walks heat，Frequency conversion voltage adjusting device is started working，High-temperature medium is promoted to flow，The highest flowing of temperature rise is the fastest，Exchange capability of heat is the strongest，Flow of steam at high temperature enters condenser，Cryogenic media after cooling is recycled into power module，Heat exchange module is 35 DEG C in ambient temperature，When condenser uses air-cooled, specified exchange capability of heat is 20KW，System finally controls radiator temperature less than 60 DEG C，Pressure medium is automatically adjusted according to temperature height in the range of 0～0.3MP.Filtration module utilizes lc circuit to connect power module and modulation module.Filtration module equivalent circuit diagram is as shown in Figure 4, lc circuit is utilized to connect power module and modulation module, according to rated output power and frequency configuration inductance and capacitance parameter in the present embodiment, requirement according to different process, K1 in output module is manually or automatically selected to connect 2, K2 closes, and inductance and electric capacity exist simultaneously；K1 connects 1, and K2 disconnects, and inductance and electric capacity eliminate simultaneously；K1 connects 2, and K2 disconnects, and eliminates electric capacity, and inductance exists；K1 connects 1, K2 closes, and eliminates inductance, and electric capacity exists.By arranging suitable inductance L, electric current on inductance is utilized the characteristic surge current suppression of transition prime (containing electrical network) not impacted；Simultaneously by arranging suitable electric capacity C, utilizing electric capacity accumulation of energy and capacitor voltage at both ends can not the characteristic of transition be that technique provides the surge current needed.Modulation module provides variable power for polishing, and DC voltage is modulated into pulse voltage by it, and the pulse voltage waveform after modulation is as shown in Figure 3.The range of accommodation of positive pulse parameter: voltage U1 is 150～500V；Frequency f is 1KHz～20KHz；The positive half cycle of dutycycle ρ is 5%～100%, and plasma polishing process is depended in the selection of pulse parameter.The polishing initial stage typically uses DC voltage (ρ=100%) to be easy to produce stable air film, along with polishing process dutycycle is progressively decreased to a certain value to meet surface quality requirements；In polishing process, isopulse makes air-film thickness change according to certain rules, resonance can be formed under certain condition, when air film tends to disappearing, the rising edge in pulse voltage produces great electric current, is thus degrading the working condition of chopper and the surface quality of polishing.The technical program regulates pulse parameter in real time by detection curent change and reaches to limit the purpose of air film resonance.For certain particular/special requirement, pulse voltage arranges negative half period U2, and dutycycle is in negative half period range of accommodation 0～50%.Monitoring module uses method of embedded micro-controller.Monitoring module carries out three grades of monitorings；The first order monitoring include current feedback and regulation VD, by preset use numeral by the way of realize regulation, while can be automatically adjusted in the different process segments according to technological requirement；The second level selects and controls inductance L and electric capacity C parameter, third level monitoring and regulation pulse parameter, also according to preset or technological requirement, uses the mode of numeral to realize being automatically adjusted of pulse parameter.At the initial stage of technical process, owing to workpiece is formed without stable air film, surge current is very big, now needs, by inductance L current limliting, simultaneously need to electric capacity provides the energy formed required for air film, to be therefore concurrently accessed inductance L and electric capacity C in output loop；In the stabilization sub stage of technique, surge current is decreased to the scope that power supply can bear, and now can remove inductance L and electric capacity C, to reduce reactive loss simultaneously.
The work process of the present invention is: technical process as shown in Figure 5.The alternating voltage that electrical network inputs is become DC voltage by power module；In polishing process, heat exchange module utilizes medium phase-change heat-exchange technology (evaporative condenser) that the power device of power supply is circulated cooling；Filtration module is as buffer stage, and by the lc circuit arranged, limit inrush currents, to power surges, provides the discharge energy needed simultaneously for polishing；The DC voltage conversion exported from filtration module is pulse voltage by modulation module, regulates pulse parameter in real time according to preset and feedback；Monitoring module monitoring and regulation DC voltage, pulse parameter, inductance L and electric capacity C parameter.Monitoring module also controls polissoir, metal parts dive to be processed is placed in electrolyte solution, form plasma state air film on its surface under the effect of electric field, by discharge removal effect and Plasma chemical reaction flattened faces, piece surface is made to reach roughness and the mirror effect of requirement.In the most practical example, the operation principle of monitoring module is as it is shown in figure 5, use programmable logic controller (PLC) PLC, and the parameters such as solution temperature, concentration, electric current density, process time are detected and control by requirement respectively that process technique according to metal material surface；Be additionally provided with work timing on monitoring module, state shows, malfunction shows, fault acoustic-optic alarm.
The foregoing is only presently preferred embodiments of the present invention, not in order to limit the present invention, all within the spirit and principles in the present invention, any modification, equivalent substitution and improvement etc. made, should be included within the scope of the present invention.
Claims (7)
1. an electrolyte plasma polishing power-supply system, pulsation electric power is provided for Treatment of Metal Surface, it is characterized in that, described electrolyte plasma polishing power-supply system is made up of with the power module being sequentially connected with, heat exchange module, filtration module, modulation module monitoring module, and described monitoring module is electrically connected with remaining each module respectively.
2. electrolyte plasma polishing power-supply system as claimed in claim 1, it is characterised in that: the alternating voltage that electrical network inputs is become DC voltage by described power module；The DC voltage conversion that power module is exported by modulation module is pulse voltage, carries out pulse parameter regulation according to preset；Described filtration module uses lc circuit, including inductance, electric capacity and switch, by switching the combination of closed and disconnected, controls electric capacity and/or the change of inductance, and described monitoring module is monitored and regulates DC voltage, pulse parameter, selects and control inductance and electric capacity.
3. electrolyte plasma polishing power-supply system as claimed in claim 1 or 2, it is characterized in that: described power module uses one or more groups frequency range to form at the full-bridge converter topology DC source of 10KHz～50KHz, voltage magnitude is adjusted by the way of monitoring module uses analog or digital, and voltage regulation limits is 150V～500V.
4. electrolyte plasma polishing power-supply system as claimed in claim 3, it is characterised in that: described heat exchange module uses medium phase-change heat-exchange mode to cool down the power device of power-supply system, and the boiling point of medium is 50 DEG C ± 10%.
5. electrolyte plasma polishing power-supply system as claimed in claim 4, it is characterised in that: described monitoring module is point three grades of monitoring in power-supply system；First order monitoring VD and power supply heat exchange, be automatically adjusted heat exchange power according to load state, be automatically adjusted output voltage according to technological requirement；The second level selects and controls inductance and capacitance parameter, third level monitoring and regulation pulse parameter.
6. electrolyte plasma polishing power-supply system as claimed in claim 5, it is characterised in that: described modulation module connects polissoir, range of accommodation frequency 1KHz of modulation module～20kHz, dutycycle 100%～5%.
7. the control method utilizing the electrolyte plasma polishing power-supply system described in any one of claim 1～6 to be polished, comprises the steps:
A) power module uses full-bridge converter topology that the alternating voltage that electrical network inputs is become DC voltage；
B) heat exchange module uses medium phase-change heat-exchange mode to cool down the power device of power-supply system；
C) filtration module uses LC to arrange, and suppresses the current surge impact to power supply by inductance, provides surge current by electric capacity accumulation of energy for polishing electric discharge；
D) DC voltage conversion is pulse voltage by modulation module, carries out pulse parameter regulation according to preset and feedback, controls the energy of technical process plasma discharge；
E) monitoring module regulates DC voltage, pulse parameter according to technological requirement, selects inductance and capacitance parameter, and is monitored the heat exchange situation of power supply, protects circuit.
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| CN110184608A (en) * | 2019-06-11 | 2019-08-30 | 广东工业大学 | A kind of electrolyte plasma polishing machine and its polishing method |
| TWI694181B (en) * | 2018-08-29 | 2020-05-21 | 陳嘉朗 | Frequency conversion polarization of polishing device and method |
| CN112152582A (en) * | 2020-08-25 | 2020-12-29 | 中山市博顿光电科技有限公司 | Filter circuit of ion source driving power supply and filter parameter detection method and device thereof |
| CN112589543A (en) * | 2020-12-01 | 2021-04-02 | 江苏徐工工程机械研究院有限公司 | Control system and control method for electrolyte plasma polishing equipment |
| TWI790834B (en) * | 2021-11-26 | 2023-01-21 | 財團法人金屬工業研究發展中心 | Method of Plasma Electrolytic Polishing |
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Application publication date: 20160803 |