CN105823555A - 一种连续太赫兹激光功率测试装置 - Google Patents
一种连续太赫兹激光功率测试装置 Download PDFInfo
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- CN105823555A CN105823555A CN201610330610.7A CN201610330610A CN105823555A CN 105823555 A CN105823555 A CN 105823555A CN 201610330610 A CN201610330610 A CN 201610330610A CN 105823555 A CN105823555 A CN 105823555A
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- 238000012360 testing method Methods 0.000 title claims abstract description 34
- 238000012545 processing Methods 0.000 claims description 9
- 239000000523 sample Substances 0.000 claims description 9
- 239000004020 conductor Substances 0.000 claims description 7
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- 230000007935 neutral effect Effects 0.000 claims description 7
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- 229910002909 Bi-Te Inorganic materials 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 230000035945 sensitivity Effects 0.000 abstract description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 230000003321 amplification Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000004043 responsiveness Effects 0.000 description 3
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- 238000000034 method Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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- 239000000758 substrate Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
Abstract
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CN201610330610.7A CN105823555B (zh) | 2016-05-18 | 2016-05-18 | 一种连续太赫兹激光功率测试装置 |
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CN105823555A true CN105823555A (zh) | 2016-08-03 |
CN105823555B CN105823555B (zh) | 2017-11-17 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106441557A (zh) * | 2016-08-17 | 2017-02-22 | 中国电子科技集团公司第四十研究所 | 一种多用途太赫兹光功率探头 |
CN107144345B (zh) * | 2017-05-16 | 2019-08-13 | 中国电子科技集团公司第四十一研究所 | 一种多波长与宽温度太赫兹激光功率计的校准方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004191244A (ja) * | 2002-12-12 | 2004-07-08 | Minolta Co Ltd | 分光装置及び補正方法 |
WO2008022474A1 (en) * | 2006-08-25 | 2008-02-28 | Abb Research Ltd | Camera-based flame detector |
CN104819773A (zh) * | 2015-04-21 | 2015-08-05 | 中国电子科技集团公司第四十一研究所 | 连续窄脉宽激光器峰值光功率的测试装置及方法 |
CN105181153A (zh) * | 2015-09-23 | 2015-12-23 | 西安工程大学 | 基于波形面积的雪崩光探测器增益测量方法 |
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2016
- 2016-05-18 CN CN201610330610.7A patent/CN105823555B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004191244A (ja) * | 2002-12-12 | 2004-07-08 | Minolta Co Ltd | 分光装置及び補正方法 |
WO2008022474A1 (en) * | 2006-08-25 | 2008-02-28 | Abb Research Ltd | Camera-based flame detector |
CN104819773A (zh) * | 2015-04-21 | 2015-08-05 | 中国电子科技集团公司第四十一研究所 | 连续窄脉宽激光器峰值光功率的测试装置及方法 |
CN105181153A (zh) * | 2015-09-23 | 2015-12-23 | 西安工程大学 | 基于波形面积的雪崩光探测器增益测量方法 |
Non-Patent Citations (1)
Title |
---|
杨明伟等: "融入FPGA技术的半导体激光器功率-电流-电压测试系统", 《光电子激光》 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106441557A (zh) * | 2016-08-17 | 2017-02-22 | 中国电子科技集团公司第四十研究所 | 一种多用途太赫兹光功率探头 |
CN107144345B (zh) * | 2017-05-16 | 2019-08-13 | 中国电子科技集团公司第四十一研究所 | 一种多波长与宽温度太赫兹激光功率计的校准方法 |
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Effective date of registration: 20190228 Address after: 266555 Xiangjiang 98, Huangdao District, Qingdao City, Shandong Province Patentee after: China Electronics Technology Instrument and Meter Co., Ltd. Address before: 266555 No. 98 Xiangjiang Road, Qingdao economic and Technological Development Zone, Shandong Patentee before: The 41st Institute of CETC |
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Address after: 266555 Xiangjiang 98, Huangdao District, Qingdao City, Shandong Province Patentee after: CLP kesiyi Technology Co.,Ltd. Address before: 266555 Xiangjiang 98, Huangdao District, Qingdao City, Shandong Province Patentee before: CHINA ELECTRONIC TECHNOLOGY INSTRUMENTS Co.,Ltd. |
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