CN105821467B - A kind of electric deposition device for being used to prepare high-resolution α sources - Google Patents
A kind of electric deposition device for being used to prepare high-resolution α sources Download PDFInfo
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- CN105821467B CN105821467B CN201610196264.8A CN201610196264A CN105821467B CN 105821467 B CN105821467 B CN 105821467B CN 201610196264 A CN201610196264 A CN 201610196264A CN 105821467 B CN105821467 B CN 105821467B
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- electroplating bath
- internal layer
- resolution
- deposition device
- electric deposition
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
Abstract
The invention belongs to radioactive source preparing technical field, discloses a kind of electric deposition device for being used to prepare high-resolution α sources.The electric deposition device includes power supply, electroplating bath, bottom claim, magnet and platinum electrode；The electroplating bath is inside and outside double-layer structure, and internal layer upper end and bottom are provided with opening；The internal layer of electroplating bath is used to contain electro-deposition plating solution, and the diagonal angle of outer layer is provided with cooling circulating water import and cooling circulating water outlet；The opening of the internal layer upper end is provided with sealing ring and the top cover labyrinth of top, and the opening of internal layer bottom is respectively arranged with lower seal and the lower sealing cover of lower section；The bottom is referred to as negative electrode, is close to below the duct among lower seal；The platinum electrode stretches to distance plating trench bottom 0.5cm~1cm opening position from the radial center opening position of electroplating bath internal layer upper end.α sources prepared by the device have electrodeposition efficiency height, plated layer compact, the beneficial effect that uniformity is good and deposit thickness is small.
Description
Technical field
The invention belongs to radioactive source preparing technical field, and in particular to a kind of electro-deposition for being used to prepare high-resolution α sources
Device.
Background technology
Some α-radionuclides in Environmental radioactive monitoring, Nuclear Accident Emergency monitoring are because with stronger toxicity and very long
Half-life period, so it has special status in influence of the nuclear accident to environment and formulation radioactive pollution disposal method.This
The content that class α-radionuclide migrates after being discharged with accident in surrounding environment sample is very low, it is difficult to use instrument direct measurement.In measure
Difficulty is not only in that content is low, is easily lost in sample making course, easily by the cross pollution of other α-radionuclide institutes, but also due to
Under complicated ecological condition, they have chemical form complicated and changeable.Comparatively, such sample most simply and rapidly measures
Method is measured using alpha spectrometer, but expends the time if single separating and measuring is carried out to each α-radionuclide, people, material resources
Cost is too high.A kind of method for more saving is that multiple α-radionuclides are carried out while measured, between each nucleic to be measured and other interference
As the principal element of influence measurement result.
For example, the α-radionuclide in Nuclear Accident Emergency is formed in addition to each nucleic of natural uranium series, actinium series and thorium family, harm is larger
Transuranic element in also include the neptunium, plutonium, curium, the isotope such as californium that are likely to occur.These nucleic itself decay alpha-particle energy exists
Between (3900~6200) keV.Ideal spectrum parameter is as shown in table 1.As it can be seen from table 1 although whole spectrum is segmented into 12
Area, the energy bite between area and area is both greater than greatly 50keV, but nuclide energy is closer in area.
Table 1 presses the α-radionuclide of energy packet
Actinides measurement is carried out using more nucleic simultaneous analysis methods, it is desirable to is divided at one or in most two or three of spectrums
The activity of all actinides α-radionuclides that can be measured in sample is separated out, it is crucial to prepare high resolution measurement source.High-resolution source
It is set to tell same group two or three Main Ingredients and Appearances simultaneously in α spectrometrys.In table 1 in same group between each component
Even if interference can not be completely eliminated, when carrying out spectrum unscrambling with function-fitting method using inversion matrix method or solution simultaneous equations, high score
The sample source of resolution also contributes to the accuracy calculated.For using alpha spectrometer to survey after needing Radiochemical Separation in accident emergency monitoring
For the sample of amount, high-resolution α sources can obtain accurately nucleic data to be measured when composing and analyzing and be spent so as to reduce sample preparation
The time taken, improve emergency response speed.
In addition, high-resolution α sources can be used for the scale of alpha spectrometer detection efficient or energy, and used as stabilizer source, such as
Reactor-loop vapor leakage monitoring instrument and Radon Exhalation Rate Measuring Apparatus device etc. are all using high-resolution241Am sources are as spectrum stabilization
Source, the size of its energy resolution have important influence to final measurement result.As can be seen here, high-resolution in practical application
The preparation in rate α sources has tight demand.At present, also without the report that high-resolution α sources are prepared using electric deposition device in open source literature
Road.
The content of the invention
(1) goal of the invention
According to the problems of prior art, the invention provides a kind of electrodeposition efficiency is high, plated layer compact and uniformly
The electric deposition device in the good preparation high-resolution α sources of property.
(2) technical scheme
In order to solve the problems of prior art, technical scheme provided by the invention is as follows：
It is a kind of to be used to preparing the electric deposition device in high-resolution α sources, the electric deposition device includes power supply, electroplating bath, bottom claim,
Magnet and platinum electrode；The material of the electroplating bath is glass, and it is inside and outside double-layer structure, and internal layer upper end and bottom are provided with out
Mouthful；The internal layer of the electroplating bath is used to contain electro-deposition plating solution, and the diagonal angle of outer layer is provided with cooling circulating water import and cooling
Circulating water outlet, the passage flowed through between outer layer inwall and inner layer outer wall for cooling circulating water；
The opening of the internal layer upper end is provided with sealing ring and the top cover labyrinth of top, the opening punishment of internal layer bottom
Lower seal and the lower sealing cover of lower section are not provided with；Top cover labyrinth, upper sealing ring, electroplating bath internal layer, lower seal and under it is close
The duct run through is formed between capping；It is bolted between top cover labyrinth and lower sealing cover；Set at the duct of lower sealing cover
It is equipped with screw socket；
The bottom is referred to as negative electrode, is close to below the duct among lower seal；Bottom claims lower section to be provided with pad, pad
Lower section is provided with gim peg, and the gim peg is connected through a screw thread with lower sealing cover to claim to fix bottom；The pad, gim peg,
Bolt is electrically conductive.
The platinum electrode from the radial center opening position of electroplating bath internal layer upper end stretch to distance plating trench bottom 0.5cm~
1cm opening position；The positive pole of the power supply is connected by anode connecting line with platinum electrode upper end；Power cathode is connected by negative electrode
Bolt connection between line and top cover labyrinth and lower sealing cover, avoid negative electrode connecting line and directly claim to be connected the bottom of with；
The magnet is radial magnet, and it is permanent magnet, highly highly consistent with electroplating bath；The radial magnet is relative to electricity
The magnetic field intensity of coating bath center position is 0.6T~1T, at 1~5cm of electroplating bath side.
Preferably, the import of cooling circulating water is located at the electroplating bath lower left corner or the lower right corner, diagonal angle of the outlet positioned at import.
Preferably, the power supply is D.C. regulated power supply.
Preferably, the material at the bottom is referred to as noble metal, stainless steel or aluminium.
Preferably, the platinum electrode is connected with stirring motor, in electrodeposition process the rotating speed of platinum electrode be 40~60 turns/
Point.
Preferably, the material of the upper sealing ring and lower seal is polytetrafluoroethylene (PTFE).
(3) beneficial effect
The electric deposition device provided using invention has electrodeposition efficiency height, plated layer compact, uniformity good and deposit thickness
Small beneficial effect, it is specific as follows：
1. the electric deposition device includes inside and outside layer glass groove, wherein outer layer is used to be passed through cooling water, takes away electro-deposition
The overall caloric value of solution in journey, avoids temperature from rising the loose phenomenon of coating brought.
2. the electric deposition device is by setting platinum electrode apart from electroplating bath distance from bottom, magnet strength and distance, device knot
The composite factors such as structure, which can be realized, deserves to be called the horizontal target cationic of trace with the quantitative bottom that is deposited on of the efficiency close to 100%,
Radionuclide research of its deposition efficiency for high specific activity is significant.
3. being provided with radial magnet in the side of electroplating bath, and rationally it is provided with magnetic field of magnets direction, intensity and distance
The distance of electroplating bath, the movement of electrodeposition process intermediate ion is accelerated, accelerate the deposition velocity of plated α-radionuclide, the jail of deposition
Solidity strengthens.Meanwhile reduce the thickness of deposition, improve energy resolution.
4. the material of electroplating bath is glass, reduces and the suction of impurity and chamber wall to radionuclide is introduced in plating solution
It is attached, radionuclide utilization ratio is improved, avoids radiocontamination.
5. bottom claims with being provided with polytetrafluoroethylene sealing gasket circle at electroplating bath lower ending opening, it is acted on can also be right in addition to sealing
Bottom claims the electro-deposition area of middle active nucleus to be limited, and the lower sealing washer by changing different pore size can prepare not homologous
The radioactive source of spot, the utilization rate of electric deposition device is improved, reduce the generation of radwaste.
6. the bottom of electric deposition device is designed using screw socket, sealed with a screwed stainless steel bolt.On the one hand just
Hot operation is carried out in operating personnel, on the other hand radioactive solution can be prevented according to the thickness adjusting elasticity degree that bottom claims
Leakage produces contamination.
7. power cathode is avoided directly by the bolt connection between negative electrode connecting line and top cover labyrinth and lower sealing cover
Claim to be connected the bottom of with, because claiming to be connected the sealing for being unfavorable for radioactivity plating solution the bottom of with.The application passes through electrically conductive pad, electrically conductive solid
Determine bolt, electrically conductive closure and bolt and then solve this problem well.
Brief description of the drawings
Fig. 1 is the electric deposition device schematic diagram in the preparation high-resolution α sources that the application provides；Wherein 1 is platinum electrode；2 are
Bottom claims；3 be lower seal；4 be upper sealing ring；5 be electroplating bath；6 be bolt；7 be pad；8 be gim peg；9 be lower sealing cover；
10 be top cover labyrinth；11 be coolant outlet；12 be cooling water inlet；13 be magnet.
Embodiment
Below in conjunction with specification drawings and specific embodiments, the present invention is further elaborated.
Embodiment 1
It is a kind of to be used to preparing the electric deposition device in high-resolution α sources, the electric deposition device include D.C. regulated power supply power supply,
Electroplating bath 5, the bottom of stainless steel claim 2, magnet 13 and platinum electrode 1；The material of the electroplating bath 5 is glass, and it is inside and outside two
Rotating fields, internal layer upper end and bottom are provided with opening；The internal layer of the electroplating bath 5 is used to contain electro-deposition plating solution, outer layer
Cooling circulating water import 12 is provided with the lower right corner, the upper left corner is provided with cooling circulating water outlet 11；Outside outer layer inwall and internal layer
The passage flowed through between wall for cooling circulating water；The platinum electrode 1 is connected with stirring motor, and platinum electrode 1 turns in electrodeposition process
Speed is 40 revs/min.
The opening of the internal layer upper end is provided with sealing ring 4 and the top cover labyrinth 10 of top, the opening of internal layer bottom
Place is respectively arranged with lower seal 3 and the lower sealing cover 9 of lower section；Top cover labyrinth 10, upper sealing ring 4, electroplating bath internal layer, lower sealing
The duct run through is formed between circle 3 and lower sealing cover 9；Connected between top cover labyrinth 10 and lower sealing cover 9 by bolt 6；Under it is close
Screw socket is provided with the duct of capping 9；
The bottom claims 2 to be used as negative electrode, is close to below the duct among lower seal 3；It is electrically conductive that bottom claims 2 lower sections to be provided with
Pad 7, the lower section of pad 7 is provided with conductive gim peg 8, and the gim peg 8 and lower sealing cover 9 are connected through a screw thread with the bottom of by
2 are claimed to fix.
The platinum electrode 1 is stretched to apart from the bottom of electroplating bath 5 from the radial center opening position of the internal layer upper end of electroplating bath 5
0.5cm opening position.
The positive pole of the power supply is connected by anode connecting line with the upper end of platinum electrode 1；Power cathode passes through negative electrode connecting line
With the bolt connection between top cover labyrinth 10 and lower sealing cover 9, avoid negative electrode connecting line and directly claim 2 to be connected the bottom of with.
The magnet 13 is radial magnet, and it is permanent magnet, highly highly consistent with electroplating bath；The radial magnet relative to
The magnetic field intensity of electroplating bath center position is 0.8T, at the 2cm of electroplating bath side.
Preferably, the material of the upper sealing ring 4 and lower seal 7 is polytetrafluoroethylene (PTFE).
To verify the effect of the present apparatus, it is prepared for respectively with the method used in common electro-deposition method and this patent241Am electro-deposition source, two introduces a collections measure in alpha spectrometer, as a result prove the energy resolution in electro-deposition source prepared by the present apparatus
Improve 20% (α energy is at 5.485MeV).
Embodiment 2
As different from Example 1, platinum electrode 1 stretches to distance from the radial center opening position of the internal layer upper end of electroplating bath 5
Electroplate trench bottom 1cm opening position；The bottom 2 is referred to as silver；The rotating speed of platinum electrode 1 is 60 revs/min in electrodeposition process.
Radial magnet is 0.6T relative to the magnetic field intensity of electroplating bath center position, at the side 3cm of electroplating bath 5.
Embodiment 3
As different from Example 1, platinum electrode 1 stretches to distance electricity from the radial center opening position of electroplating bath internal layer upper end
Plate trench bottom 0.8cm opening position；The bottom 2 is referred to as aluminium；The rotating speed of platinum electrode 1 is 50 revs/min in electrodeposition process.
Radial magnet is 1T relative to the magnetic field intensity of the center position of electroplating bath 1, at the 1cm of electroplating bath side.
Claims (5)
1. a kind of electric deposition device for being used to prepare high-resolution α sources, it is characterised in that the electric deposition device includes power supply, electricity
Coating bath, bottom claim, magnet and platinum electrode；The material of the electroplating bath is glass, and it is inside and outside double-layer structure, internal layer upper end and bottom
It is provided with opening；The internal layer of the electroplating bath is used to contain electro-deposition plating solution, and the diagonal angle of outer layer is provided with cooling circulating water
Import and cooling circulating water outlet, the passage flowed through between outer layer inwall and inner layer outer wall for cooling circulating water；
The opening of the internal layer upper end is provided with sealing ring and the top cover labyrinth of top, and the opening of internal layer bottom is set respectively
It is equipped with lower seal and the lower sealing cover of lower section；Top cover labyrinth, upper sealing ring, electroplating bath internal layer, lower seal and lower sealing cover
Between form the duct run through；It is bolted between top cover labyrinth and lower sealing cover；It is provided with the duct of lower sealing cover
Screw socket；
The bottom is referred to as negative electrode, is close to below the duct among lower seal；Bottom claims lower section to be provided with pad, pad lower section
Gim peg is provided with, the gim peg is connected through a screw thread with lower sealing cover to claim to fix bottom；The pad, gim peg, bolt
It is electrically conductive；
The platinum electrode stretches to distance plating trench bottom 0.5cm~1cm from the radial center opening position of electroplating bath internal layer upper end
Opening position；The positive pole of the power supply is connected by anode connecting line with platinum electrode upper end；Power cathode passes through negative electrode connecting line
Bolt connection between top cover labyrinth and lower sealing cover, avoid negative electrode connecting line and directly claim to be connected the bottom of with；
The magnet is radial magnet, and it is permanent magnet, highly highly consistent with electroplating bath；The radial magnet is relative to electroplating bath
The magnetic field intensity of center position is 0.6T~1T, at 1~5cm of electroplating bath side,
The platinum electrode is connected with stirring motor, and the rotating speed of platinum electrode is 40~60 revs/min in electrodeposition process.
A kind of 2. electric deposition device for being used to prepare high-resolution α sources according to claim 1, it is characterised in that cooling
The import of recirculated water is located at the electroplating bath lower left corner or the lower right corner, diagonal angle of the outlet positioned at import.
3. a kind of electric deposition device for being used to prepare high-resolution α sources according to claim 1, it is characterised in that described
Power supply is D.C. regulated power supply.
4. a kind of electric deposition device for being used to prepare high-resolution α sources according to claim 1, it is characterised in that described
The material at bottom is referred to as noble metal or stainless steel.
5. a kind of electric deposition device for being used to prepare high-resolution α sources according to claim 1, it is characterised in that described
The material of upper sealing ring and lower seal is polytetrafluoroethylene (PTFE).
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| CN201610196264.8A CN105821467B (en) | 2016-03-31 | 2016-03-31 | A kind of electric deposition device for being used to prepare high-resolution α sources |
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| CN201610196264.8A CN105821467B (en) | 2016-03-31 | 2016-03-31 | A kind of electric deposition device for being used to prepare high-resolution α sources |
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Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107190293A (en) * | 2017-04-26 | 2017-09-22 | 中国原子能科学研究院 | Magnetohydrodynamics electrodeposition process prepares the device of high-resolution αsource |
| CN107059096B (en) * | 2017-04-26 | 2019-06-18 | 中国原子能科学研究院 | The regulation device of magnetohydrodynamics electrodeposition process preparation high-resolution αsource |
| CN107034512B (en) * | 2017-04-26 | 2018-10-09 | 中国原子能科学研究院 | Magnetohydrodynamics electrodeposition process prepares the precipitation equipment of high-resolution αsource |
| CN107164792B (en) * | 2017-04-26 | 2019-06-18 | 中国原子能科学研究院 | Prepare the magnetohydrodynamics electro-deposition method of high-resolution αsource |
| CN107227482B (en) * | 2017-07-14 | 2023-07-25 | 中国环境科学研究院 | Electrodeposition sample preparation instrument suitable for alpha radioactive source preparation |
| CN109991645B (en) * | 2017-12-31 | 2023-02-17 | 中国人民解放军63653部队 | Detection efficiency determination method in thorium emanation accumulation measurement method |
| CN108707953B (en) * | 2018-06-28 | 2020-11-10 | 浙江惠尔涂装环保设备有限公司 | Magnetic field type double-anode cathode electrophoresis coating equipment |
| CN110438536A (en) * | 2019-07-30 | 2019-11-12 | 华东师范大学 | A kind of electro-deposition-auto-deposition prepares αsource experimental provision and its experimental method |
| CN113151881A (en) * | 2021-04-27 | 2021-07-23 | 中国工程物理研究院核物理与化学研究所 | Electroplating device suitable for preparation of small-area radiation source |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103184491A (en) * | 2011-12-28 | 2013-07-03 | 北京有色金属研究总院 | Electroplating apparatus applying external magnetic field on plating member and method |
| CN104562109A (en) * | 2014-12-05 | 2015-04-29 | 广西大学 | Flat electro brush plating experiment platform |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005320571A (en) * | 2004-05-07 | 2005-11-17 | Ebara Corp | Electrode structure for plating device |
-
2016
- 2016-03-31 CN CN201610196264.8A patent/CN105821467B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103184491A (en) * | 2011-12-28 | 2013-07-03 | 北京有色金属研究总院 | Electroplating apparatus applying external magnetic field on plating member and method |
| CN104562109A (en) * | 2014-12-05 | 2015-04-29 | 广西大学 | Flat electro brush plating experiment platform |
Non-Patent Citations (1)
| Title |
|---|
| "电沉积制备天然鈾α放射源";徐秉森等;《原子能科学技术》;19641231(第12期);第1360页 * |
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