CN105817447A - Silicon wafer washer for processing of solar panel - Google Patents
Silicon wafer washer for processing of solar panel Download PDFInfo
- Publication number
- CN105817447A CN105817447A CN201610306457.4A CN201610306457A CN105817447A CN 105817447 A CN105817447 A CN 105817447A CN 201610306457 A CN201610306457 A CN 201610306457A CN 105817447 A CN105817447 A CN 105817447A
- Authority
- CN
- China
- Prior art keywords
- rinse bath
- silicon wafer
- heated barrier
- washing tank
- steel plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 23
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 23
- 239000010703 silicon Substances 0.000 title claims abstract description 23
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 16
- 239000010959 steel Substances 0.000 claims abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 230000004888 barrier function Effects 0.000 claims description 31
- 230000001105 regulatory effect Effects 0.000 claims description 7
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 238000005406 washing Methods 0.000 abstract 9
- 238000005192 partition Methods 0.000 abstract 4
- 238000007599 discharging Methods 0.000 abstract 1
- 238000004140 cleaning Methods 0.000 description 10
- 239000012530 fluid Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000008439 repair process Effects 0.000 description 2
- RSWGJHLUYNHPMX-ONCXSQPRSA-N abietic acid Chemical compound C([C@@H]12)CC(C(C)C)=CC1=CC[C@@H]1[C@]2(C)CCC[C@@]1(C)C(O)=O RSWGJHLUYNHPMX-ONCXSQPRSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000002910 solid waste Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a silicon wafer washer for processing of a solar panel. The silicon wafer washer comprises a machine box and a washing tank, wherein the washing tank is mounted inside the machine box; an electric control box is arranged at the left side of the washing tank and is positioned on the machine box; a base is arranged inside the machine body and is positioned under the washing tank; an ultrasonic transducer is fixedly mounted on the base; a bottom panel of the washing tank is composed of a vibrating surface steel plate; the vibrating surface steel plate is positioned at the upper end face of the ultrasonic transducer and is in contact connection with the upper end face of the ultrasonic transducer; heating partition plates are symmetrically arranged at the middle part of the washing tank; the bottom ends of two heating partition plates are connected with a heating resistor wire net; a clearance is formed between the two sidewalls, opposite to the washing tank, of each heating partition plate; a temperature sensor is arranged inside each clearance; a water discharging pipe is arranged at the right end of the vibrating surface steel plate; a water charging pipe is arranged at the upper part of the right sidewall of the washing tank; a supporting frame is erected between the heating partition plates. The silicon wafer washer for processing of the solar panel is good in washing effect, high in production efficiency, easy to operate and convenient to maintain.
Description
Technical field
The present invention relates to a kind of cleaning machine, be specially a kind of solar panels processing silicon wafer cleaner, belong to solar panels process equipment field.
Background technology
Abundant solar radiant energy is the important energy, is the energy that can freely utilize of inexhaustible, nexhaustible, pollution-free, cheap, the mankind.Solar energy clean energy resource is that the luminous energy of the sun is converted into the heat energy of other forms, electric energy, chemical energy, does not produce other harmful gas or solid wastes, be a kind of environmental protection, safe and pollution-free novel energy in energy sources conversion.The conversion of solar energy needs to use solar panels, and monocrystal silicon, because of its exclusive characteristic, is often used as the material that solar panels are indispensable.
Monocrystal silicon can form the damage layer of 10--40 micron in the course of processing after machinery is cut into slices at silicon chip surface, and the impurity such as there are oils and fats, paraffin, Colophonium in surface, metal ion, therefore needed to be carried out before making solar panels.Existing cleaning equipment, is difficult to carry out temperature control, causes cleaning performance bad, and is difficult to operation, cumbersome to the cleaning operation of silicon chip, inefficient.
For solving the problems referred to above, therefore it is proposed that a kind of solar panels processing silicon wafer cleaner.
Summary of the invention
The technical problem to be solved in the present invention is the defect overcoming prior art, it is provided that a kind of solar panels processing silicon wafer cleaner.
In order to solve above-mentioned technical problem, the invention provides following technical scheme:
One solar panels processing silicon wafer cleaner of the present invention, including cabinet and rinse bath, it is contained in cabinet inside in described rinse bath, it is positioned at cabinet on the left of described rinse bath and is provided with electric cabinet, what described cabinet inside was positioned at rinse bath is arranged right below base, ultrasonic transducer it is installed with on base, the bottom panel of described rinse bath is made up of vibration plane steel plate, described vibration plane steel plate is positioned at the upper surface of ultrasonic transducer, and contact connects, it is arranged with heated barrier in the middle part of described rinse bath, two described heated barrier bottoms connect resistive heater net, gap is had between described heated barrier and rinse bath two lateral walls, inner space is provided with temperature sensor, described vibration plane steel plate right-hand member is provided with outlet pipe, described rinse bath right side wall top is provided with water inlet pipe, set up between described heated barrier and have support frame.
Further, described temperature sensor is fixed between heated barrier and rinse bath in gap by gripper shoe, and described heated barrier is fixed on inside rinse bath by groove, and has gap between heated barrier bottom and vibration plane upper surface of steel plate.
Further, described support frame is U-shaped stainless steel structure, and described support frame medial surface is provided with horizontal groove, is provided with hollowed-out board in groove, and described support frame bottom surface is positioned at the top of resistive heater net.
Further, being provided with temperature regulating device inside described electric cabinet, described temperature sensor, heated barrier and resistive heater net connect temperature regulating device by wire respectively.
The present invention is reached to provide the benefit that: by heated barrier and resistive heater net, enclosed carries out heating and can heat cleanout fluid the most rapidly and uniformly, temperature sensor moment detection temperature, keep the temperature that cleanout fluid is relatively stable, improve cleaning performance, support frame is erected in heated barrier, it is easy to pick and place, simplify operation, and multilamellar hollowed-out board is set inside support frame, improve cleaning efficiency, increase production capacity, heated barrier, temperature sensor and hollowed-out board all use detachable installation, it is easy to maintenance and repair, it is prone to cleaning operation, reduce labor intensity.
Accompanying drawing explanation
Accompanying drawing is for providing a further understanding of the present invention, and constitutes a part for description, is used for together with embodiments of the present invention explaining the present invention, is not intended that limitation of the present invention.In the accompanying drawings:
Fig. 1 is the structural representation of the present invention a kind of solar panels processing silicon wafer cleaner；
Fig. 2 is the workflow diagram of the present invention a kind of solar panels processing silicon wafer cleaner；
Fig. 3 is the workflow diagram of the present invention a kind of solar panels processing silicon wafer cleaner；
In figure: 1, cabinet；2, resistive heater net；3, ultrasonic transducer；4, outlet pipe；5, temperature sensor；6, water inlet pipe；7, heated barrier；8, support frame；9, rinse bath；10, electric cabinet；11, hollowed-out board；12, vibration plane steel plate.
Detailed description of the invention
Below in conjunction with accompanying drawing, the preferred embodiments of the present invention are illustrated, it will be appreciated that preferred embodiment described herein is merely to illustrate and explains the present invention, is not intended to limit the present invention.
Embodiment 1
nullAs Figure 1-3，A kind of solar panels processing silicon wafer cleaner，Including cabinet 1 and rinse bath 9，Cabinet 1 it is contained in internal in described rinse bath 9，It is positioned at cabinet 1 on the left of described rinse bath 9 and is provided with electric cabinet 10，What described cabinet 1 was internally located at rinse bath 9 is arranged right below base，Ultrasonic transducer 3 it is installed with on base，The bottom panel of described rinse bath 9 is made up of vibration plane steel plate 12，Described vibration plane steel plate 12 is positioned at the upper surface of ultrasonic transducer 3，And contact connects，It is arranged with heated barrier 7 in the middle part of described rinse bath 9，Two described heated barrier 7 bottoms connect resistive heater net 2，Gap is had between described heated barrier 7 and rinse bath 9 two lateral walls，Inner space is provided with temperature sensor 5，Described vibration plane steel plate 12 right-hand member is provided with outlet pipe 4，Described rinse bath 9 right side wall top is provided with water inlet pipe 6，Set up between described heated barrier 7 and have support frame 8.
Described temperature sensor 5 is fixed between heated barrier 7 and rinse bath 9 in gap by gripper shoe, it is internal that described heated barrier 7 is fixed on rinse bath 9 by groove, and have gap between heated barrier 7 bottom and vibration plane steel plate 12 upper surface, described support frame 8 is U-shaped stainless steel structure, described support frame 8 medial surface is provided with horizontal groove, hollowed-out board 11 it is provided with in groove, described support frame 8 bottom surface is positioned at the top of resistive heater net 2, described electric cabinet 10 is internal is provided with temperature regulating device, described temperature sensor 5, heated barrier 7 and resistive heater net 2 connect temperature regulating device by wire respectively.
It should be noted that, one solar panels processing silicon wafer cleaner operation principle of the present invention is: be intermolecular kinetic energy by ultrasonic transducer 3 by changes mechanical energy, silicon chip surface is carried out, temperature sensor 5 moment detection temperature, temperature regulating device heats according to feedback control heated barrier 7 and resistive heater net 2 enclosed, the most rapidly and uniformly cleanout fluid can be heated, keep the temperature that cleanout fluid is relatively stable, improve cleaning performance, support frame 8 is erected in heated barrier 7, support frame 8 is internal arranges multilamellar hollowed-out board 11, improve cleaning efficiency, increase production capacity, heated barrier 7, temperature sensor 5 and hollowed-out board 11 all use detachable installation, it is easy to maintenance and repair, it is prone to cleaning operation, reduce labor intensity.
Last it is noted that the foregoing is only the preferred embodiments of the present invention, it is not limited to the present invention, although the present invention being described in detail with reference to previous embodiment, for a person skilled in the art, technical scheme described in foregoing embodiments still can be modified by it, or wherein portion of techniques feature is carried out equivalent.All within the spirit and principles in the present invention, any modification, equivalent substitution and improvement etc. made, should be included within the scope of the present invention.
Claims (4)
- null1. a solar panels processing silicon wafer cleaner，Including cabinet (1) and rinse bath (9)，Cabinet (1) it is contained in internal in described rinse bath (9)，Described rinse bath (9) left side is positioned at cabinet (1) and is provided with electric cabinet (10)，It is characterized in that，What described cabinet (1) was internally located at rinse bath (9) is arranged right below base，Ultrasonic transducer (3) it is installed with on base，The bottom panel of described rinse bath (9) is made up of vibration plane steel plate (12)，Described vibration plane steel plate (12) is positioned at the upper surface of ultrasonic transducer (3)，And contact connects，Described rinse bath (9) middle part is arranged with heated barrier (7)，Two described heated barrier (7) bottoms connect resistive heater net (2)，Gap is had between described heated barrier (7) and rinse bath (9) two lateral walls，Inner space is provided with temperature sensor (5)，Described vibration plane steel plate (12) right-hand member is provided with outlet pipe (4)，Described rinse bath (9) right side wall top is provided with water inlet pipe (6)，Set up between described heated barrier (7) and have support frame (8).
- A kind of solar panels processing silicon wafer cleaner the most according to claim 1, it is characterized in that, described temperature sensor (5) is fixed between heated barrier (7) and rinse bath (9) in gap by gripper shoe, it is internal that described heated barrier (7) is fixed on rinse bath (9) by groove, and has gap between heated barrier (7) bottom and vibration plane steel plate (12) upper surface.
- A kind of solar panels processing silicon wafer cleaner the most according to claim 1, it is characterized in that, described support frame (8) is U-shaped stainless steel structure, described support frame (8) medial surface is provided with horizontal groove, being provided with hollowed-out board (11) in groove, described support frame (8) bottom surface is positioned at the top of resistive heater net (2).
- A kind of solar panels processing silicon wafer cleaner the most according to claim 1, it is characterized in that, described electric cabinet (10) is internal is provided with temperature regulating device, and described temperature sensor (5), heated barrier (7) and resistive heater net (2) connect temperature regulating device by wire respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610306457.4A CN105817447A (en) | 2016-05-11 | 2016-05-11 | Silicon wafer washer for processing of solar panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610306457.4A CN105817447A (en) | 2016-05-11 | 2016-05-11 | Silicon wafer washer for processing of solar panel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105817447A true CN105817447A (en) | 2016-08-03 |
Family
ID=56528585
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610306457.4A Pending CN105817447A (en) | 2016-05-11 | 2016-05-11 | Silicon wafer washer for processing of solar panel |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105817447A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106362984A (en) * | 2016-12-03 | 2017-02-01 | 无锡艾科瑞思产品设计与研究有限公司 | Plate washing machine capable of circularly washing screen plates |
| CN109720087A (en) * | 2019-01-08 | 2019-05-07 | 京东方科技集团股份有限公司 | A kind of printing screen cleaning device and cleaning system |
| CN110965133A (en) * | 2019-12-06 | 2020-04-07 | 亳州新诚达时装有限公司 | Belt cleaning device is used in eiderdown production with disinfection function |
| CN113102371A (en) * | 2021-04-12 | 2021-07-13 | 清华大学 | Silicon wafer cleaning equipment for solar cell processing |
| CN114725240A (en) * | 2022-04-02 | 2022-07-08 | 广东高景太阳能科技有限公司 | Thick silicon crystal material processing device and processing method |
| CN117711991A (en) * | 2024-02-05 | 2024-03-15 | 苏州智程半导体科技股份有限公司 | Wafer groove type cleaning equipment |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1199368A (en) * | 1997-09-29 | 1999-04-13 | Suzuki Motor Corp | Ultrasonic washing machine |
| CN201848403U (en) * | 2010-11-03 | 2011-06-01 | 温州电力局 | Fully automatic ultrasonic integrated treating machine for sampler of electrical oil-filled equipment |
| CN202151624U (en) * | 2011-07-11 | 2012-02-29 | 苏州赤诚洗净科技有限公司 | Isolation type ultrasonic transmission cleaning device |
| CN205099790U (en) * | 2015-11-09 | 2016-03-23 | 晶科能源有限公司 | Thin silicon material belt cleaning device |
| CN205732105U (en) * | 2016-05-11 | 2016-11-30 | 江苏峰谷源储能技术研究院有限公司 | A kind of solar panels processing silicon wafer cleaner |
-
2016
- 2016-05-11 CN CN201610306457.4A patent/CN105817447A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1199368A (en) * | 1997-09-29 | 1999-04-13 | Suzuki Motor Corp | Ultrasonic washing machine |
| CN201848403U (en) * | 2010-11-03 | 2011-06-01 | 温州电力局 | Fully automatic ultrasonic integrated treating machine for sampler of electrical oil-filled equipment |
| CN202151624U (en) * | 2011-07-11 | 2012-02-29 | 苏州赤诚洗净科技有限公司 | Isolation type ultrasonic transmission cleaning device |
| CN205099790U (en) * | 2015-11-09 | 2016-03-23 | 晶科能源有限公司 | Thin silicon material belt cleaning device |
| CN205732105U (en) * | 2016-05-11 | 2016-11-30 | 江苏峰谷源储能技术研究院有限公司 | A kind of solar panels processing silicon wafer cleaner |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106362984A (en) * | 2016-12-03 | 2017-02-01 | 无锡艾科瑞思产品设计与研究有限公司 | Plate washing machine capable of circularly washing screen plates |
| CN109720087A (en) * | 2019-01-08 | 2019-05-07 | 京东方科技集团股份有限公司 | A kind of printing screen cleaning device and cleaning system |
| CN109720087B (en) * | 2019-01-08 | 2020-08-18 | 京东方科技集团股份有限公司 | Printing screen cleaning device and cleaning system |
| CN110965133A (en) * | 2019-12-06 | 2020-04-07 | 亳州新诚达时装有限公司 | Belt cleaning device is used in eiderdown production with disinfection function |
| CN113102371A (en) * | 2021-04-12 | 2021-07-13 | 清华大学 | Silicon wafer cleaning equipment for solar cell processing |
| CN114725240A (en) * | 2022-04-02 | 2022-07-08 | 广东高景太阳能科技有限公司 | Thick silicon crystal material processing device and processing method |
| CN117711991A (en) * | 2024-02-05 | 2024-03-15 | 苏州智程半导体科技股份有限公司 | Wafer groove type cleaning equipment |
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| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20160803 |