CN105809720B - System and method for maskless direct-write photoetching - Google Patents
System and method for maskless direct-write photoetching Download PDFInfo
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- CN105809720B CN105809720B CN201510434808.5A CN201510434808A CN105809720B CN 105809720 B CN105809720 B CN 105809720B CN 201510434808 A CN201510434808 A CN 201510434808A CN 105809720 B CN105809720 B CN 105809720B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
- H01J37/3023—Programme control
- H01J37/3026—Patterning strategy
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
- G06F30/39—Circuit design at the physical level
- G06F30/398—Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31752—Lithography using particular beams or near-field effects, e.g. STM-like techniques
- H01J2237/31754—Lithography using particular beams or near-field effects, e.g. STM-like techniques using electron beams
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31761—Patterning strategy
- H01J2237/31762—Computer and memory organisation
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Abstract
The invention discloses the system and method for maskless direct-write photoetching.This method comprises: receiving the multiple pixels for indicating integrated circuit (IC) layout；Identification is suitable for the first subset of the pixel of the first compression method；And identification is suitable for the second subset of the pixel of the second compression method.This method further includes compressing the first subset and second subset using the first compression method and the second compression method respectively, to generate compressed data.This method further includes that compressed data is transmitted to maskless direct write device, for manufacturing substrate.In embodiment, the first compression method uses run-length encoding, and the second compression method uses the coding based on dictionary.Due to mixing compression method, compressed data can be unziped it with the data rate expansion ratio for being sufficiently used for high-volume IC manufacture.
Description
Technical field
The embodiment of the present invention is related to integrated circuit device, more particularly, to the system for maskless direct-write photoetching
And method.
Background technique
Semiconductor integrated circuit (IC) industry has gone through rapid growth.During IC develops, functional density
(that is, quantity of the interconnection devices of every chip area) generally increases, and geometric dimension (that is, can produce using manufacturing process
Minimal modules (or line)) reduce.This scaled technique is usually mentioned by improving production efficiency and reducing relevant cost
For benefit.Such scaled complexity for also increasing processing and manufacturing IC, and in order to realize these progress, it needs
Similar development in IC manufacture.
For example, electron beam (e beam) technology has been used in the manufacture using the semiconductor devices of maskless lithography.At one
In example, the electron beam data pattern generator (DPG) of computer control is used to incident electron beam guiding being coated with electronics
The semiconductor substrate (target) of sensitive photoresist layer.Then the exposed portion of lithographic glue, leaves figure on a semiconductor substrate
The photoresist layer of case, patterned photoresist layer is as the masking element for being used for further photoetching process.Typical electronics
Beam DPG turns to incident electron beam to form grey-scale raster images in target.Use number
The pixel of format is indicated the image of formation.In view of a large amount of figure submitting to electron beam DPG and being handled by electron beam DPG
As data, usually using lossless data compression and decompression.However, being difficult to providing high solution for high-volume semiconductors manufacture
Enough compressions are realized while compressed data rate.
Summary of the invention
The embodiment provides a kind of methods, comprising the following steps: receiving indicates integrated circuit (IC) layout
Multiple pixels；Identification is suitable for the first subset of the pixel of the first compression method；Identification is suitable for the second compression method
The second subset of the pixel, wherein the second subset and first subset be not be overlapped；The pixel is implemented compressed
Journey, to generate compressed data, wherein the compression process includes: to compress first son using first compression method
Collection；With use second compression method to compress the second subset；And the compressed data is transmitted to maskless direct write
Device, for manufacturing substrate.
Another embodiment of the present invention provides a kind of method for forming integrated circuit (IC), comprising the following steps: receives
Indicate the ordered set of the pixel of the layout of the IC；The ordered set is analyzed by using the first compression method to identify the picture
First subset of element；Residuary subset is initialized, the residuary subset includes the institute other than the pixel in first subset
State the member of ordered set；The residuary subset is analyzed by using the second compression method to identify the second subset of the pixel；
The residuary subset is reduced into the second subset；Compression process is implemented to the ordered set, so that compressed data is generated,
In, the compression process includes: that the member of first subset is compressed using first compression method；With use described second
Compression method compresses the member of the second subset；And the compressed data is stored in tangible medium, for next
A IC operation stage.
Another embodiment of the present invention provides a kind of maskless direct-write photoetching system, comprising: compression unit, the compression
Unit is configured that the ordered set for receiving the pixel for indicating integrated circuit (IC) layout；Institute is compressed by using travel compression method
It states the first part of ordered set and compresses the second part of the ordered set using the compression method based on dictionary to generate pressure
Contracting data；And using compressed data described in instruction set encoding, to generate the compressed data of coding.
Detailed description of the invention
When reading in conjunction with the accompanying drawings, from it is described in detail below can best understanding each aspect of the present invention.It should be emphasized that
According to the standard practices in industry, the purpose that all parts are not drawn on scale and are merely to illustrate.In fact, in order to clear
Discussion, the size of all parts can arbitrarily increase or reduce.
Fig. 1 is the block diagram of the simplification of the embodiment of electron-beam lithography system.
Fig. 2 is the schematic diagram of the simplification of the part of the system of Fig. 1 according to the embodiment.
Fig. 3 shows the method for the manufacture wafer of various aspects according to the present invention.
Fig. 4 shows the flow chart of the part of the method for Fig. 3 according to the embodiment.
Fig. 5 shows the hardware/software system of one or more embodiments for carrying out the present invention.
Specific embodiment
Following disclosure provides the different embodiments or example of many different characteristics for realizing provided theme.
The specific example of component and arrangement is described below to simplify the present invention.Certainly, these are only example, are not intended to limit this
Invention.For example, in the following description, above second component or the upper formation first component may include the first component and second
Component directly contacts the embodiment of formation, and also may include can be formed between the first component and second component it is additional
Component, so that the embodiment that the first component and second component can be not directly contacted with.In addition, the present invention can be in each example
Middle repeat reference numerals and/or character.The repetition is for purposes of simplicity and clarity, and itself not indicate to be discussed
Relationship between each embodiment and/or configuration.
Moreover, for ease of description, can be used herein such as " ... under ", " in ... lower section ", " lower part ", " ... it
On ", the spatially relative term on " top " etc., to describe an element or component and another (or other) member as shown in the figure
The relationship of part or component.Other than the orientation shown in figure, spatially relative term is intended to include device in use or operation
Different direction.Device can otherwise orient (be rotated by 90 ° or in other directions), and space used herein is opposite
Descriptor can be explained similarly accordingly.
The present invention generally relates to maskless lithography systems and method.More particularly it relates to electron-beam direct writing
Data transmission system and method in photoetching.E-beam direct write lithography, which is hopeful to generate, has the more dense of small parts size
Microchip.But e-beam direct write lithography is generally subjected to low output.In order to keep being comparable to modern optical lithography system
Output, it is needed to be up to the rate processing data of 5 Tera-bits per seconds (Tb/sec).On the data road of electron-beam direct writing system
Lossless data compression and decompression are used in diameter design, to improve its output.Common method, which concentrates on, to be had
The compression method of high compression ratio (ratio for being defined as original data volume and amount of compressed data).When compressed data is transmitted to electricity
When beamlet direct write device, high compression ratio reduces data-rate requirements.But it also restored the data of electron-beam direct writing device
Journey complicates and causes its decompression data rate low.On the other hand, simple compression method generally can not generate enough
Data compression.The present invention is solved the problems, such as above by being laid out adjustable mixing compressing/decompressing method and system.Such as
It will show, the embodiment of the present invention can generate high data compression, while provide high decompression data rate, to pass through
Electron-beam direct writing system come meet to high-volume manufacture requirement.In the following discussion, it gives about e-beam direct write lithography
Embodiment and/or example.However, inventive concept of the invention be not so limit to and multiple embodiments can be applied to
Other maskless straight-writing systems such as use the system of the ion beam or other charge particles other than electron beam.
Fig. 1 shows the electron-beam direct writing system 100 that can have benefited from one or more aspects of the present invention.Referring to Fig.1,
System 100 can implement electron-beam direct writing in manufacturing or repairing multiple wafers.System 100 includes the electricity for generating electron beam 104
Component 102, curved beam machine (beam-bender) 106, digital pattern generator (DPG) 108, projection optics component 110 and rotation work
Make platform 112, rotary table 112 keeps and be aligned one or more substrates 114, in manufacture or restoring integrated circuit
(IC) exposure appropriate in.Electron beam 104 can be single electronic beam or multi electron beam.In the embodiment illustrated, system
100 further include the data compression unit 118 for being connected to DPG 108.Data compression unit 118 is configured to receive data file 116.
In embodiment, data file 116 includes indicating the ordered set of the pixel of the layout of a part of IC or IC.Data compression unit
118 compression data files 116 and generate compression data file 120.Compression data file 120 is then submitted into DPG 108,
To be used for data decompression and recovery.In the present embodiment, implement data compression unit 118 and DPG 108 in a system.
Optionally, data compression unit 118 and DPG 108 can be implemented in different systems, and their direct or indirect connections
For the data communication between them.
In embodiment, substrate 114 is semiconductor crystal wafer.Wafer 114 includes the silicon with the material layer being formed thereon
Substrate or other substrates appropriate.Other substrate materials appropriate include: another suitable elemental semiconductor, such as diamond or
Germanium；Suitable compound semiconductor, such as silicon carbide, indium arsenide or indium phosphide；Or suitable alloy semiconductor, such as silicon carbide
Germanium, gallium arsenide phosphide or InGaP.
Before exposure, wafer 114 is coated with resist (or photoresist) layer.Photoresist layer is to incident electron beam 104
It is sensitive and can be positive photoresist or negative photoresist.Positive photoresist is generally insoluble in developer but is exposing
Become solvable after radiation (such as electron beam 104).Negative photoresist has opposite performance: it is usually soluble in development
Agent, but become after irradiation insoluble.Wafer 114 can be cleaned before photoresist coating and/or is coated in photoresist
Soft baking wafer 114 later.Based on data file 116/120, the reflection of DPG 108 or absorption electron beam 104, to utilize IC cloth
Office's exposed photoresist layer.After exposition, next step is carried out to use photoetching process to form a part of IC or IC.Example
Such as, wafer 114 can be subjected to postexposure bake, development and hard baking process, to form pattern in photoresist layer.By pattern
The photoresist layer of change is used as etching mask to etch wafer 114.Etch process may include dry ecthing, wet etching or other etchings
Technology.It then can be by the method appropriate of such as wet removing or plasma ashing come stripping photolithography glue-line.Implement next
A step on wafer 114 to form various parts, such as doped region, dielectric components and multi-layer interconnection piece.
Fig. 2 shows the signals of the simplification of the compression unit 118 and DPG 108 of each embodiment building according to the present invention
Figure.Referring to Fig. 2, compression unit 118 includes topological analysis's instrument 202, mixing compressor 204 and hybrid coder 206；And DPG
108 include hybrid decoder 208.
Compression unit 118 is configured to receive a part of the IC layout or IC layout that are present in data file 116.Each
In a embodiment, data are successively extracted from GDSII the or OASIS design document of IC or from the design document of other suitable formats
File 116.Data file 116 can have the proximity correction of merging, position effect correction and/or other shapes correction.
IC layout is rendered as pixel in addition, distributing by tonal gradation.For example, IC pattern can be split by based on simple
The image pixel intensities for the individual 20nm (or smaller) that the method (simplex based method) of shape method calculates.In embodiment
In, 32 tonal gradation intensity can be used.In instances, data file 116 includes indicating the ordered set of the pixel of IC layout,
In each pixel correspond to IC layout a part.The size of the part depends on the diameter of incident electron beam 104.Each
Pixel may include indicating multiple positions of desired tonal gradation intensity.Target is arrived into the scanning of data file 116 by DPG 108
On 114.However, when data are transmitted to DPG 108 from compression unit 118, in order to reduce data-rate requirements, compress and
Encoded data files 116.
In embodiment, the IC that the analysis of topological analysis's instrument 202 is indicated by data file 116 is laid out, and the analysis can be with
The part of the IC layout of the compression method of selection is adapt to including identifying.Basic principle is in the different layers or layer of IC layout
Different piece can show different features.As a result, some parts good can be suitable for a kind of simple compression side
Method (that is, not being related to many computational complexities), and some other parts are for another simple compression method.However, can
It can be not present for whole single simple compression method.For example, it is 3 that the first part of data file 116, which can be intensity,
20 Continuous Gray Scale grades.This is the good candidate for run-length encoding, rather than 20 data elements are sent to DPG
108, a pair of of data element can be sent (pixel value=3 repeat=20).Continue the example, another part of data file 116
Can be alternately or duplicate data pattern, such as (2,3,2,3,2,3) or (2, Isosorbide-5-Nitrae, 3,3,2, Isosorbide-5-Nitrae, 3,3,2, Isosorbide-5-Nitrae, 3,
3), this is not suited well for run-length encoding, but is especially suited well for the encoding scheme based on dictionary.However, number
Run-length encoding may be suited well for according to another part of file 116 or based on the coding of dictionary.It is appreciated that single
Complicated compression method can be used for compression data file 116.But as discussed above, such method leads to DPG 108
Design high complexity and be unsatisfactory for write-in data-rate requirements to mass production.Each embodiment of the invention is looked for
Go out the difference in data file 116 and different simple compression methods be applied to the different piece of data file 116,
To realize whole good compression ratio, while relatively straight cut of decompression and decoding in DPG 108 being kept to work as.
In instances, topological analysis's instrument 202 determines: the first part of data file 116 is suitable for the first compression method, all
Such as based on the compression method of stroke, and the second part of data file 116 is suitable for the second compression method, such as based on dictionary
Compression method.In addition, topological analysis's instrument 202 can determine: the Part III of data file 116 is not suitable for any simple
Compression method and being preferably left is uncompressed.First part, second part and Part III can be inserted.For example,
Data file 116 may include continuous 12 pixels for being suitable for run-length encoding, subsequent be suitable for the coding based on dictionary
Continuous 15 pixels and subsequent 8 pixels for being suitable for run-length encoding.First part, second part and Part III
All various combinations and arrangement be within.If using the encoding scheme based on dictionary, cloth score of the game
Analyzer 202 can extraly construct dictionary.For example, can be first to storage by dictionary creation with user-defined maximum entry limitation
In part.Each entry of dictionary includes the word (or phrase) for coding and decoding data file 116.Using being given above reality
Example, if data file 116 includes pixel (2, Isosorbide-5-Nitrae, 3,3,2, Isosorbide-5-Nitrae, 3,3,2, Isosorbide-5-Nitrae, 3,3), then dictionary can be constructed as
With an entry A=(2,1,4,3,3) and it is encoded to the data of (A, A, A).In various embodiments, topological analysis's instrument 202
Two or more compression methods can be used in its analysis, and every kind of compression method can be advantageously simple lossless pressure
Contracting method.
Compressor 204 is mixed according to the analysis implemented by topological analysis's instrument 202 come compression data file 116.It continues the above
The example of discussion, mixing compressor 204 are come the first part of compression data file 116 using the first compression method, use second
Compression method carrys out the second part of compression data file 116, and the Part III of data file 116 is remained uncompressed number
According to (that is, initial data).If topological analysis's instrument 202 has been built up dictionary, mixes compressor 204 and correspondingly use the word
Allusion quotation.As a result, mixing compressor 204 generates data flow (and the number for compressing by different method and usually mixing
According to some parts may be at all uncompressed).In order to make DPG 108 suitably restore data file 116, not only need to transmit mixed
Compressed data is closed, and needs to transmit how compressed data are.This can be realized by a variety of designs or mode.For example,
It can be synchronously used with mixing compressed evidence with outer control signal, and control signal and point out to DPG 108 for corresponding
The compression method of compressed data.In the present embodiment, hybrid coder 206 uses in-band signaling method-instruction set by data pressure
Contracting method is transferred to DPG 108.
In embodiment, hybrid coder 206 uses the instruction set with 5 bit opcodes (or OPCODES).For example, mixed
Closing encoder 206 can be used the exemplary OPCODES as shown in following table 1.
Table 1: exemplary OPCODES
It is appreciated that the example shown in table 1 is not limiting.In various embodiments, hybrid coder 206 can make
With the instruction set with different OPCODES and/or different parameters.Hybrid coder 206 simplifies compression unit 118 and DPG
Data processing between 108.As a result, compressed data 120 is the compressed data of coding.
Referring now still to Fig. 2, hybrid decoder 208 is located in DPG 108 and is responsible for restoring number from the compressed data 120 of coding
According to file 116.The data encoding and compression that the reversion of hybrid decoder 208 is implemented by compression unit 118.In various embodiments,
Hybrid decoder 208 can use the copy and hybrid coder 206 of the dictionary or the dictionary that are constructed by topological analysis's instrument 202
The copy of used instruction set or the instruction set.Due to encoding scheme, hybrid decoder 208 can decode in one step
Conciliate compressed data.Moreover, because use it is simple coding and compression method, hybrid decoder 208 usually can use compared with
Few gate circuit number is to implement and with minimum data path delay.Due to several, this is particularly conducive to maskless lithography system
System, such as electron-beam direct writing system 100.For example, it reduces the power consumption of DPG 108.It is also to place lenticule or reflecting mirror
More spaces are left in DPG 108.In addition, it makes quickly to be treated as possibility in DPG 108, thus raw for high-volume IC
It produces and enough data rates is provided.
The division of compression unit 118 as shown in Figure 2 is only example.In various embodiments, without departing substantially from of the invention
In the case where range, can flexibly Ground Split, merging or assembled unit 202,204 and 206 function.In addition, compression unit 118
It can be used in a system or different systems with DPG 108, and can be with hardwire, cable or wireless communication
Connection.In addition it is possible to use being able to carry out the hardware/software system of series of instructions to implement compression unit 118 and DPG
108, and hardware/software system may include below one or more: general purpose microprocessor, special microprocessor, scene
Programmable gate array (FPGA), specific integrated circuit (ASIC), storage equipment and other peripheral equipments.
Fig. 3 show various aspects according to the present invention for using system 100 (Fig. 1) manufacture IC (or multiple IC)
The flow chart of method 300.Specifically, method 300 includes such as the above implementation IC cloth discussed in conjunction with compression unit 118 (Fig. 2)
The step of office data analysis, identification, compression and coding.Additional operation can be provided before and after, during method 300,
And for the Additional examples of composition of method, some operations of description are can replace, eliminate or reset.Method 300 is example, and
It is not intended to be limited to the present invention, other than clearly enumerating in claim.Method 300 is described below with reference to Fig. 1 and Fig. 2.
In operation 302, method 300 receives data file 116, and data file 116 includes corresponding to integrated circuit (IC)
Multiple pixels of a part of layout or IC layout.Multiple pixel organizations are ordered set (that is, sequence).In embodiment, multiple
Pixel is present in computer-readable medium.Multiple pixels can have the proximity correction of merging, position effect correction and/
Or other shapes correction.In embodiment, multiple pixels are assigned the tonal gradation of intensity from 0 to 31.
In operation 304, method 300 identifies the first son of the pixel for being suitable for the first compression method from multiple pixels
Collection.In embodiment, this analyzes ordered set by using the first compression method and one group of user-defined parameter and realizes.?
In example, the first compression method is travel compression method and user-defined condition includes that " being greater than m has same intensity etc.
The contiguous pixels of grade ", wherein " m " is user-defined parameter.Continue the example, any pixel subset for meeting standard is all wrapped
It includes in the first subset.In various embodiments, the first compression method is lossless simple compression method.
In operation 306, method 300 initializes residuary subset, and residuary subset includes in addition to picture those of in the first subset
The member of multiple pixels except element.Residuary subset stores in temporary memory, to be used for next step.In specific condition
Under, residuary subset can be empty set, and method 300 can skip to the operation 312 for compression.However, in reality, it is remaining
Subset is not usually empty set.
In operation 308, method 300 is suitable for the second subset of the pixel of the second compression method from residuary subset identification.
Since second subset is selected from residuary subset, so second subset and the first subset be not be overlapped.In embodiment, this is by using
Two compression methods and one group of user-defined parameter are realized to analyze residuary subset.In instances, the second compression method is base
In the compression method of dictionary, and user-defined parameter includes the maximum amount of dictionary entry (for example, 1024), most major term length
The threshold value (for example, 2) of (for example, 32), minimum word length (for example, 8) and event.In a further example, 308 building word of operation
Allusion quotation, and can be included in second subset with any pixel of dictionary encoding.In embodiment, it can be laid out independently of IC
Construct dictionary.In the present embodiment, dictionary creation is to be adaptable to IC layout, and IC is laid out the data compression for usually optimizing it.?
In each embodiment, the second compression method is lossless simple compression method.Fig. 4 will be combined to present about operation 308 more
Detail discussion.
In operation 310, method 300 reduces residuary subset by second subset, that is, has included from residuary subset removal
The pixel those of in second subset.In some cases, residuary subset can become empty set later, this shows that ordered set will be complete
It is compressed entirely by the first and second compression methods.In some cases, there are still some pixels left in residuary subset.At this
In a little situations, method 300 can also include the steps that compressing to identify for third using similar with operation 304 or operation 308
The third subset of the pixel of method.In the present embodiment, operation 310 after, the pixel in residuary subset will be left not by
It compresses (that is, initial data).
In operation 312, method 300 executes mixing compression process.In the present embodiment, this includes using the first compression side
Method compresses the first subset (operation 312a) and using the second compression method compression second subset (operation 312b).In the present embodiment
In, the first compression method is travel compression method, and the second compression method is the compression method based on dictionary.In addition, remaining son
The pixel of concentration is uncompressed.Operation 312 generates compressed datas, and compressed data generally includes compress with the first compression method the
Second part and Part III initial data a part of, with the compression of the second compression method, wherein first part, second part
It is usually to mix with Part III.
In operation 314, method 300 uses instruction set encoding compressed data.This and combine hybrid coder 206 (Fig. 2)
What is discussed is similar.Operation 314 generates the compressed data 120 of coding.
In operation 316, the compressed data 120 of coding is transmitted to maskless direct write device, such as system 100 by method 300
(Fig. 1), for manufacturing substrate.In embodiment, be stored in the compressed data 120 of coding can be straight by maskless for method 300
In the tangible medium for writing device access.In this embodiment, IC layout may only be compressed primary, and then be used for multiple times to be used for
High-volume manufactures.In another embodiment, method 300 transmits the compression of coding when the compressed data 120 of coding is made available by
Data 120, and the compressed data 120 of coding is only partially stored, to be used for data buffering purpose.Which reduce systems 100
In storage demand.
In operation 318, method 300 forms a part of IC or IC with the compressed data of coding.In embodiment, this is wrapped
Include decoding and decompression process, the mistake that decoding and decompression process reversion are carried out by 312 and 314 pairs of data files 116 of operation
Journey.This is discussed similar with combination hybrid decoder 208 (Fig. 2).After the ordered set for restoring pixel, maskless direct write
Device exposure has the target of pixel, to form pattern in target.This is discussed similar with combination Fig. 1.
Although described above be directed to high-volume wafer production, inventive concept can be applied similarly to fabrication mask,
Wherein, substrate 114 (Fig. 1) is mask substrate, and mask substrate may include such as quartz, silicon, silicon carbide or silica-titania
The low thermal expansion material of compound.
Fig. 4 shows to operate the flow chart of the method 400 of the embodiment of 308 (Fig. 3).Method is briefly described below
400。
In operation 402, method 400 initializes the library in the internal storage of storage medium or compression unit 118.Method
400 are also initialized as second subset initial empty set, and candidate word long (CWL) is initialized as being initially that most major term is long
(parameter that user-defined or system determines).
In operation 404, method 400 is from the pixel selection candidate word in residuary subset.Candidate word is continuous CWL pixel
Part, that is, the quantity of the pixel in candidate word is equal to CWL.In embodiment, operation 404 is identified remaining using slip window sampling
All possible candidate word in subset.For example, the slide ruler using 1 and the ordered set from pixel (1,2,3,4,5,6,7),
Operation 404 generates two candidate words: candidate word A=(1,2,3,4,5,6) and candidate word B=(2,3,4,5,6,7) with CWL=6.
In action 406, method 400 calculates the amount R of event, with each candidate word for identification.For example, if waiting
Word is selected to occur in residuary subset once, then the quantity of event is equal to 1；If candidate word occurs twice in residuary subset,
The quantity of event is equal to 2；And so on.In embodiment, operation 406 also arranges time by the respective numbers of their event
Word is selected, and top ranked candidate word is used for next operation.
In embodiment, method 400 is performed simultaneously operation 404 and 406, wherein method 400 is scanned by slip window sampling
Residuary subset calculates the corresponding event of candidate word, and arrangement candidate to find all possible candidate word during scanning
Word.This saves computing resource and accelerates operation.In addition, in embodiment, operation 404 and 406 generates and keeps a column
Candidate word and their ranking.The list can be by operating with to accelerate whole process later.
In operation 408, method 400 determines whether top ranked candidate word appears in residual set and be enough to add
To dictionary.In embodiment, this by comparing the event of top ranked candidate word amount R and user-defined parameter (thing
The threshold value of part) Thd realizes.If meeting condition " R > Thd ", candidate word becomes qualified candidate word, and method 400 is moved
To operation 410.If candidate word is unqualified, method 400 moves to operation 416.
In act 410, method 400 determines whether dictionary has expired, that is, whether the quantity of the entry in dictionary has reached
Maximum entry limitation.If dictionary has been expired, method 400 moves to operation 420, under operation 420 is connected in method 300 (Fig. 3)
One step.Otherwise, method 400 moves to operation 412.
In operation 412, method 400 updates dictionary and second subset.In embodiment, this includes by qualified candidate word
It is added to dictionary and all events of qualified candidate word is moved into second subset from residuary subset.In another embodiment,
The qualified candidate word update dictionary and second subset with highest event number of operation 412.
In operation 414, method 400 has added to the institute of the qualified candidate word of dictionary by subtracting from residuary subset
There is event to update residuary subset.Then, for example, the column generated in previous loops by searching for operation 404 and 406 are candidate
Word, method 400 obtain next top ranked candidate word, and repetitive operation 408,410,412 and 414.Method 400 is repeatedly
It repeats above operation, until it does not find that qualified candidate word (operation 408) or its discovery dictionary have expired (operation 410).
In operation 416, method 400 determine the long CWL of candidate word whether be less than or equal to minimum word it is long (it is user-defined or
The parameter that system determines).If it is affirmative, then method 400 moves to operation 420.Otherwise, method 400 moves to operation 418.
In operation 418, method 400 reduces the long CWL of candidate word.In embodiment, operation 418 will on each entry
CWL reduces 1.In another embodiment, CWL is reduced user-defined parameter by operation 418.Then, method 400 moves to 404 simultaneously
And it is iteratively repeated operation 404,406,408,410,412,414 and 416, until meeting in operation 410 and 416 for moving to behaviour
Make one in 420 condition.
Fig. 5 shows the hardware/software system 500 of the embodiment as compression unit 118 and/or DPG 108 (Fig. 1).
System 500 includes microprocessor 502, input equipment 504, storage equipment 506, Video Controller 508, system storage 510, shows
Show device 514 and communication equipment 516, all these equipment are interconnected by one or more bus 512.Storage equipment 506 can be
Floppy disk drive, hard disk drive, CD-ROM, CD drive or any other form storage equipment.In addition, storage equipment
506 can receive floppy disk, CD-ROM, DVD-ROM or any other form that may include computer executable instructions
Computer-readable medium.In addition, communication equipment 516 can be modem, network interface card or any other equipment so that computer
System can be communicated with other nodes.
In embodiment, microprocessor 502 is general purpose microprocessor.Optionally, microprocessor 502 is that such as scene can compile
The fine hardware platform of journey gate array (FPGA) or specific integrated circuit (ASIC).
Such as hardware/software system of system 500 typically at least include be able to carry out machine readable instructions hardware and
For executing the software of the step of generating expected result (usually machine readable instructions).
Hardware typically at least includes such as client machine (also referred to as personal computer or server) and hand-held processing equipment
The platform with processor ability of (such as smart phone, palm PC (PDA) or personal computing devices (PCD)).In addition, hard
Part may include any physical equipment that can store machine readable instructions, such as memory or other data storage devices.Its
The hardware of his form includes hardware subsystem, it may for example comprise such as modem, modem card, port and port card
Transmission device, and, for example, such as processing equipment of field programmable gate array (FPGA), specific integrated circuit (ASIC).
Software includes any machine code being stored in any storage medium of such as RAM or ROM and is stored in other
Machine code in equipment (for example, such as floppy disk, flash memory or CD ROM).For example, software may include source code or target generation
Code.In addition, software includes any instruction set that can be executed in client machine or server.
For the particular embodiment of the present invention, the combination of software and hardware is also used for providing the function and performance of enhancing.One
A example is that software function is fabricated directly in silicon chip.It should therefore be understood that the combination of hardware and software is also included within firmly
It is contemplated by the present invention as in the definition of part/software systems and therefore possible equivalent structure and equivalent processes.
Computer-readable medium includes the passive data memory unit and such as CD of such as random access memory (RAM)
The semipermanent data memory of read-only memory (CD-ROM).In addition, the embodiment of the present invention can be embodied in the RAM of computer
In, standard computer is converted into new specific calculation machine.
Data structure be can make it possible the embodiment of the present invention data definition tissue.For example, data knot
Structure can provide the tissue of data or the tissue of executable code.Data-signal can pass through transmission medium deliver and store and
Various data structures are transmitted, and therefore can be used for transmitting the embodiment of the present invention.
The system can be designed as working in any certain architectures.For example, the system can be in single computer, local
Network, Wide Area Network, internet, executes on hand-held and other portable and wireless devices and network client-server network.
Although being not intended to be limited to, one or more embodiments of the invention is semiconductor using maskless direct-write photoetching
Manufacture provides many benefits.For example, the embodiment of the present invention provides whole good IC layout compression ratio (CR), keep simultaneously
Decompression and relatively straight cut of decoding in maskless direct write device are worked as, to provide good decompression data rate.Relatively
High data rate expansion ratio (DER) (ratio for being defined as decompression data rate and compressed data rate) has been tested
Middle realization.In many cases, DER is substantially equal to CR and they are all larger than 3, this meets the needs of to high-volume IC manufacture.
In addition, each embodiment of the invention can be implemented with few gate circuit number and have minimum data path delay.This is especially
Be conducive to maskless lithography system, because it reduces the power consumption of system, left for lenticule or reflecting mirror to be placed in system
More spaces, and make quickly to be treated as possibility in system, to provide enough data rates for high-volume IC production.
In an illustrative aspect, the present invention is for a kind of method for manufacturing substrate.This method comprises: receiving indicates integrated
Multiple pixels of circuit (IC) layout；Identification is suitable for the first subset of the pixel of the first compression method；And identification is suitable for
The second subset of the pixel of second compression method, wherein second subset and the first subset be not be overlapped.This method further includes to pixel
Compression process is executed, to generate compressed data.Compression process includes compressing the first subset using the first compression method and making
Second subset is compressed with the second compression method.This method further includes that compressed data is transmitted to maskless direct write device, for making
Make substrate.
In the above-mentioned methods, wherein the method also includes: using compressed data described in instruction set encoding, to generate
The compressed data of coding, wherein transmitting the compressed data includes transmitting the compressed data of the coding.
In the above-mentioned methods, wherein the method also includes: using compressed data described in instruction set encoding, to generate
The compressed data of coding, wherein transmitting the compressed data includes transmitting the compressed data of the coding, wherein the nothing is covered
Mould direct write device is configured to restore the multiple pixel from the compressed data and described instruction collection of the coding.
In the above-mentioned methods, wherein first compression method and second compression method are lossless compression.
In the above-mentioned methods, wherein first compression method is travel compression method.
In the above-mentioned methods, wherein second compression method is the compression method based on dictionary.
In the above-mentioned methods, wherein second compression method is the compression method based on dictionary, wherein described in identification
For second subset the following steps are included: initialization residuary subset, the residuary subset includes in addition to the pixel in first subset
Except the multiple pixel member；Initialize dictionary；Candidate word is selected from the residuary subset, wherein the candidate word
Word with M contiguous pixels is long；Check the quantity of the event of the candidate word in the residuary subset；And it is if described
The quantity of event is greater than event threshold and the dictionary is less than, implements the renewal process included the following steps: by the candidate
Word is added to the dictionary；The second subset is moved to from the residuary subset with by all events of the candidate word.
In the above-mentioned methods, wherein second compression method is the compression method based on dictionary, wherein described in identification
For second subset the following steps are included: initialization residuary subset, the residuary subset includes in addition to the pixel in first subset
Except the multiple pixel member；Initialize dictionary；Candidate word is selected from the residuary subset, wherein the candidate word
Word with M contiguous pixels is long；Check the quantity of the event of the candidate word in the residuary subset；And it is if described
The quantity of event is greater than event threshold and the dictionary is less than, implements the renewal process included the following steps: by the candidate
Word is added to the dictionary；The second subset is moved to from the residuary subset with by all events of the candidate word, wherein
The method also includes: before implementing the renewal process: being arranged by the respective numbers of the event in the residuary subset
Arrange the long all candidate words of the word with M, wherein the implementation of the renewal process is executed according to the arrangement.
In the above-mentioned methods, wherein second compression method is the compression method based on dictionary, wherein described in identification
For second subset the following steps are included: initialization residuary subset, the residuary subset includes in addition to the pixel in first subset
Except the multiple pixel member；Initialize dictionary；Candidate word is selected from the residuary subset, wherein the candidate word
Word with M contiguous pixels is long；Check the quantity of the event of the candidate word in the residuary subset；And it is if described
The quantity of event is greater than event threshold and the dictionary is less than, implements the renewal process included the following steps: by the candidate
Word is added to the dictionary；The second subset is moved to from the residuary subset with by all events of the candidate word, wherein
The method also includes: implement the first repetitive process, first repetitive process be iteratively repeated it is described selection, it is described verification and
The step of conditionally implementing the renewal process, until a generation in the following conditions: the dictionary reaches maximum entry
Limitation；And the residuary subset does not include the word length with M and has the quantity of the event greater than the event threshold
Candidate word.
In the above-mentioned methods, wherein second compression method is the compression method based on dictionary, wherein described in identification
For second subset the following steps are included: initialization residuary subset, the residuary subset includes in addition to the pixel in first subset
Except the multiple pixel member；Initialize dictionary；Candidate word is selected from the residuary subset, wherein the candidate word
Word with M contiguous pixels is long；Check the quantity of the event of the candidate word in the residuary subset；And it is if described
The quantity of event is greater than event threshold and the dictionary is less than, implements the renewal process included the following steps: by the candidate
Word is added to the dictionary；The second subset is moved to from the residuary subset with by all events of the candidate word, wherein
The method also includes: implement the first repetitive process, first repetitive process be iteratively repeated it is described selection, it is described verification and
The step of conditionally implementing the renewal process, until a generation in the following conditions: the dictionary reaches maximum entry
Limitation；And the residuary subset does not include the word length with M and has the quantity of the event greater than the event threshold
Candidate word, wherein the method also includes: implement the second repetitive process, second repetitive process is iteratively repeated for from M
Contiguous pixels first repetitive process long down toward each word of N number of contiguous pixels, wherein M and N is integer and N is big
In zero and be less than M.
In the above-mentioned methods, wherein second compression method is the compression method based on dictionary, wherein described in identification
For second subset the following steps are included: initialization residuary subset, the residuary subset includes in addition to the pixel in first subset
Except the multiple pixel member；Initialize dictionary；Candidate word is selected from the residuary subset, wherein the candidate word
Word with M contiguous pixels is long；Check the quantity of the event of the candidate word in the residuary subset；And it is if described
The quantity of event is greater than event threshold and the dictionary is less than, implements the renewal process included the following steps: by the candidate
Word is added to the dictionary；The second subset is moved to from the residuary subset with by all events of the candidate word, wherein
Transmitting the compressed data includes transmitting the dictionary.
In in terms of the another exemplary, the present invention is for a kind of method for forming integrated circuit (IC).This method includes connecing
It receives the ordered set for the pixel for indicating IC layout and ordered set is analyzed by using the first compression method to identify the first of pixel
Subset.This method further includes initialization residuary subset and analyzes residuary subset by using the second compression method to identify pixel
Second subset, residuary subset includes the member of the ordered set other than the pixel in the first subset.This method further include by
Residuary subset reduces second subset.This method further includes executing compression process to ordered set, to generate compressed data.It is compressed
Journey include using the first compression method compress the first subset member and using the second compression method compression second subset at
Member.This method further includes that compressed data is stored in tangible medium, to be used for next IC operation stage.
In the above-mentioned methods, wherein the method also includes: using compressed data described in instruction set encoding, to generate
The compressed data of coding, wherein storing the compressed data includes storing the compressed data of the coding.
In the above-mentioned methods, wherein the method also includes: using compressed data described in instruction set encoding, to generate
The compressed data of coding, wherein storing the compressed data includes storing the compressed data of the coding, from the pressure of the coding
Contracting data and described instruction collection restore the ordered set of the pixel.
In the above-mentioned methods, wherein first compression method is travel compression method, and second compression method
It is the compression method based on dictionary.
In the above-mentioned methods, wherein identify the second subset the following steps are included: initialization dictionary；Candidate word is long
It is long to be initialized as most major term；Candidate word is selected from the residuary subset, wherein each candidate word all has equal to the time
The word for selecting word long is long；For each candidate word, the quantity of the event of the corresponding candidate word in the residuary subset is calculated；
And each candidate word is implemented if the respective numbers of event are greater than event threshold and the dictionary is less than
The renewal process included the following steps: corresponding candidate word is added to the dictionary；With will be in the residuary subset
All events of corresponding candidate word move to the second subset.
In the above-mentioned methods, wherein identify the second subset the following steps are included: initialization dictionary；Candidate word is long
It is long to be initialized as most major term；Candidate word is selected from the residuary subset, wherein each candidate word all has equal to the time
The word for selecting word long is long；For each candidate word, the quantity of the event of the corresponding candidate word in the residuary subset is calculated；
And each candidate word is implemented if the respective numbers of event are greater than event threshold and the dictionary is less than
The renewal process included the following steps: corresponding candidate word is added to the dictionary；With will be in the residuary subset
All events of corresponding candidate word move to the second subset, the method also includes: implementing the renewal process
Before: the candidate word is arranged by the respective numbers of the event in the residuary subset.
In the above-mentioned methods, wherein identify the second subset the following steps are included: initialization dictionary；Candidate word is long
It is long to be initialized as most major term；Candidate word is selected from the residuary subset, wherein each candidate word all has equal to the time
The word for selecting word long is long；For each candidate word, the quantity of the event of the corresponding candidate word in the residuary subset is calculated；
And each candidate word is implemented if the respective numbers of event are greater than event threshold and the dictionary is less than
The renewal process included the following steps: corresponding candidate word is added to the dictionary；With will be in the residuary subset
All events of corresponding candidate word move to the second subset, the method also includes: it is long to reduce the candidate word；With
And it is iteratively repeated and selects the candidate word, the quantity of calculating event, conditionally implement described in the renewal process and reduction
The long step of candidate word, until a generation in the following conditions: the dictionary reaches maximum entry limitation；With the candidate word
It is long that length becomes equal to or be less than minimum word.
In terms of another exemplary, the present invention is directed to maskless direct-write photoetching system.The system includes compression unit, compression
Unit is configured to receive the ordered set for the pixel for indicating integrated circuit (IC) layout.Compression unit is additionally configured to by using stroke
Compression method compress ordered set first part and using based on dictionary compression method compress ordered set second part come
Generate compressed data.Compression unit is additionally configured to using instruction set encoding compressed data, to generate the compressed data of coding.?
In embodiment, which further includes decoder element, and decoder element is connected to compression unit and is configured to the pressure from coding
The ordered set of contracting data recovery pixel.
In above system, wherein the system also includes: decoder element, the decoder element are connected to described
It compression unit and is configured to restore the ordered set of the pixel from the compressed data of the coding.
Foregoing has outlined the features of several embodiments, so that side of the invention may be better understood in those skilled in the art
Face.It should be appreciated by those skilled in the art that they can be easily using designing or modifying based on the present invention for real
It grants the identical purpose of embodiment defined herein and/or realizes other process and structures of identical advantage.Those skilled in the art
Member it should also be appreciated that this equivalent constructions without departing from the spirit and scope of the present invention, and without departing substantially from essence of the invention
In the case where mind and range, they can make a variety of variations, replace and change herein.
Claims (17)
1. a kind of method for forming integrated circuit (IC), comprising the following steps:
Receive the multiple pixels for indicating integrated circuit (IC) layout；
Identification is suitable for the first subset of the pixel of the first compression method；
Identification is suitable for the second subset of the pixel of the second compression method, wherein the second subset and first son
Collection is not overlapped, wherein second compression method is the compression method based on dictionary, identifies that the second subset includes following step
It is rapid:
Residuary subset is initialized, the residuary subset includes the multiple pixel other than the pixel in first subset
Member；
Initialize dictionary；
Candidate word is selected from the residuary subset, wherein the candidate word has the word of M contiguous pixels long；
Check the quantity of the event of the candidate word in the residuary subset；And
If the quantity of the event is greater than event threshold and the dictionary is less than, implement to include the following steps updated
Journey:
The candidate word is added to the dictionary；With
All events of the candidate word are moved into the second subset from the residuary subset；
Compression process is implemented to the pixel, to generate compressed data, wherein the compression process includes:
First subset is compressed using first compression method；With
The second subset is compressed using second compression method；And
The compressed data is transmitted to maskless direct write device, for manufacturing substrate.
2. the method according to claim 1 for forming integrated circuit, further includes:
Using compressed data described in instruction set encoding, to generate the compressed data of coding, wherein transmit the compressed data packets
Include the compressed data for transmitting the coding.
3. the method according to claim 2 for forming integrated circuit, wherein the maskless direct write device is configured to from described
The compressed data and described instruction collection of coding restore the multiple pixel.
4. the method according to claim 1 for forming integrated circuit, wherein first compression method and second pressure
Contracting method is lossless compression.
5. the method according to claim 1 for forming integrated circuit, wherein first compression method is travel compression side
Method.
6. the method according to claim 1 for forming integrated circuit, further includes, before implementing the renewal process:
The long all candidate words of the word with M are arranged by the respective numbers of the event in the residuary subset, wherein according to
It is described to arrange to execute the implementation of the renewal process.
7. the method according to claim 1 for forming integrated circuit, further includes:
Implement the first repetitive process, first repetitive process is iteratively repeated the selection, the verification and conditionally real
The step of applying the renewal process, until a generation in the following conditions:
The dictionary reaches maximum entry limitation；And
The residuary subset does not include the word length with M and has the candidate of the quantity of the event greater than the event threshold
Word.
8. the method according to claim 7 for forming integrated circuit, further includes:
Implement the second repetitive process, second repetitive process be iteratively repeated for from M contiguous pixels down toward N number of contiguous pixels
Long first repetitive process of each word, wherein M and N is integer and N is greater than zero and is less than M.
9. the method according to claim 1 for forming integrated circuit, wherein transmitting the compressed data includes described in transmission
Dictionary.
10. a kind of method for forming integrated circuit (IC), comprising the following steps:
Receive the ordered set for indicating the pixel of layout of the integrated circuit；
The ordered set is analyzed by using the first compression method to identify the first subset of the pixel；
Residuary subset is initialized, the residuary subset includes the ordered set other than the pixel in first subset
Member；
The residuary subset is analyzed by using the second compression method to identify the second subset of the pixel, wherein described
Two compression methods are the compression methods based on dictionary, identify the second subset the following steps are included:
Initialize dictionary；
It is long that candidate word length is initialized as most major term；
Candidate word is selected from the residuary subset, wherein it is long that each candidate word all has the word long equal to the candidate word；
For each candidate word, the quantity of the event of the corresponding candidate word in the residuary subset is calculated；And
Each candidate word is implemented if the respective numbers of event are greater than event threshold and the dictionary is less than
The renewal process included the following steps:
Corresponding candidate word is added to the dictionary；With
All events of corresponding candidate word in the residuary subset are moved into the second subset；
The residuary subset is reduced into the second subset；
Compression process is implemented to the ordered set, to generate compressed data, wherein the compression process includes:
The member of first subset is compressed using first compression method；With
The member of the second subset is compressed using second compression method；And
The compressed data is stored in tangible medium, to be used for next integrated circuit technology stage.
11. the method according to claim 10 for forming integrated circuit, further includes:
Using compressed data described in instruction set encoding, to generate the compressed data of coding, wherein store the compressed data packets
Include the compressed data for storing the coding.
12. the method according to claim 11 for forming integrated circuit, further includes:
Restore the ordered set of the pixel from the compressed data and described instruction collection of the coding.
13. the method according to claim 10 for forming integrated circuit, wherein first compression method is travel compression
Method.
14. the method according to claim 10 for forming integrated circuit, further includes, before implementing the renewal process:
The candidate word is arranged by the respective numbers of the event in the residuary subset.
15. the method according to claim 10 for forming integrated circuit, further includes:
It is long to reduce the candidate word；And
It is iteratively repeated and selects the candidate word, the quantity of calculating event, conditionally implements the renewal process and reduce institute
The long step of candidate word is stated, until a generation in the following conditions:
The dictionary reaches maximum entry limitation；With
It is long that the candidate word length becomes equal to or be less than minimum word.
16. a kind of maskless direct-write photoetching system, comprising:
Compression unit, the compression unit are configured that
Receive the ordered set for indicating the pixel of integrated circuit (IC) layout；
The first part of the ordered set is compressed by using travel compression method and uses the compression method pressure based on dictionary
The second part of the ordered set that contracts generates compressed data, wherein using the compression method based on dictionary compress it is described orderly
The second part of collection the following steps are included:
Residuary subset is initialized, the residuary subset includes multiple other than the pixel in the first part of the ordered set
The member of pixel；
Initialize dictionary；
Candidate word is selected from the residuary subset, wherein the candidate word has the word of M contiguous pixels long；
Check the quantity of the event of the candidate word in the residuary subset；And
If the quantity of the event is greater than event threshold and the dictionary is less than, implement to include the following steps updated
Journey:
The candidate word is added to the dictionary；With
All events of the candidate word are moved to the second part of the ordered set from the residuary subset；And
Using compressed data described in instruction set encoding, to generate the compressed data of coding.
17. maskless direct-write photoetching system according to claim 16, further includes:
Decoder element, the decoder element are connected to the compression unit and are configured to the compressed data from the coding
Restore the ordered set of the pixel.
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| US14/600,668 | 2015-01-20 |
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| CN106709892A (en) * | 2016-11-15 | 2017-05-24 | 昂纳自动化技术（深圳）有限公司 | Rapid region expansion algorithm and device of any structure element based on stroke coding |
| CN108184082A (en) * | 2018-01-22 | 2018-06-19 | 豪威科技(上海)有限公司 | Image data transmission system and method |
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| CN105809720A (en) | 2016-07-27 |
| US9761411B2 (en) | 2017-09-12 |
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