CN105807580A - Workpiece six freedom degree position and attitude measurement sensor device - Google Patents
Workpiece six freedom degree position and attitude measurement sensor device Download PDFInfo
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- CN105807580A CN105807580A CN201410848264.2A CN201410848264A CN105807580A CN 105807580 A CN105807580 A CN 105807580A CN 201410848264 A CN201410848264 A CN 201410848264A CN 105807580 A CN105807580 A CN 105807580A
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Abstract
The invention discloses a workpiece six freedom degree position and attitude measurement sensor device. The device realizes simultaneous measurement of a workpiece along vertical and horizontal directions. The device comprises a light source for providing light beams for workpiece detection and several optical elements for projecting the light beams to the workpiece and respectively transmitting the reflected lights of the workpiece to a first photoelectric detector and a second photoelectric detector. The device is characterized in that the first photoelectric detector is used for detecting a workpiece vertical degree and the second photoelectric detector is used for detecting a workpiece horizontal degree.
Description
Technical field
The present invention relates to photoetching technique, particularly for workpiece six-degree of freedom position and the attitude-measuring sensor device of litho machine.
Background technology
Along with the development of liquid crystal display industry, liquid crystal size constantly increases, and the requirement of the resolution of scanning litho machine is also improved constantly.Alignment sensor and focusing and leveling sensor as level important in litho machine to vertical position and attitude-measuring sensor device, to requiring more to measure a little, higher precision, higher repeatability, and can adapt to the deformation of big glass substrate and the complexity of Technology.Meanwhile, the structure of many objective lens array, also require that alignment and focusing and leveling sensor possess less bulk.
In patent CN100524024, nikon company of Japan proposes a kind of exposure device for advanced lines TFT, Fig. 1 show the exposing unit of its proposition and focusing and leveling and the distribution schematic diagram to locating tab assembly point, the measurement point of multiple focusing and alignment is arranged, it is achieved the scanning survey to whole glass substrate in the width range of glass substrate.Before exposure, the face type of the focusing whole glass substrate of sensor scan can be utilized, the compensation of opposite type during for exposing, and in the process of scanning, alignment mark is measured.For this patent, on the one hand, because of factors such as the deformation of glass substrate, warpages in scanning process, easily make alignment mark generation out of focus phenomenon, focus and be directed at apart arrangement, it is impossible to obtaining the accurate defocusing amount of alignment mark, cannot be carried out compensating in result of calculation.On the other hand, focusing and apart arrangement to locating tab assembly point, cannot be carried out focusing while also making to need locating tab assembly in whole scanning process and measure, add the time that scanning runs.
Traditional focusing and leveling sensor test philosophy is as in figure 2 it is shown, be typical principle of triangulation.The advantage of this testing scheme is in encapsulation litho machine, can be arranged in object lens exposure field center by measuring point, it is achieved the accurate focusing leveling of exposure field, but its shortcoming is for placing projected branch and detection branch respectively, and shared volume is bigger.In the scanning litho machine of advanced lines, FLS is arranged in the middle of splicing object lens, it is not necessary to exposure field center is measured, therefore, by the less layout being more conducive to locus based on Spectral Confocal principle focusing and leveling sensor of volume.
Summary of the invention
The present invention proposes and a kind of can measure the workpiece level measurement apparatus to position and vertical position simultaneously, its same position of workpiece can be carried out level to vertical position measurement.
A kind of workpiece six-degree of freedom position of the present invention and attitude-measuring sensor device, for can simultaneously to the vertical of workpiece and level to measurement, including light source, for providing the light beam detected needed for described workpiece；And some optical elements, for described light beam being projected to described workpiece, and the reflection light on described workpiece being respectively sent to the first photodetector and the second photodetector, described first photodetector, for detecting the vertical angle value of described workpiece；Described second photodetector, for detecting the horizontal angle value of described workpiece.
Further, described first photodetector is linear array detector or confocal detection device, and described second photodetector is planar array detector or two-dimensional array detecting light spectrum instrument.
Further, described some optical elements at least include a spectroscope, a prism assemblies, two lens and for detecting described first photodetector of the vertical angle value of described workpiece.
Further, described some optical elements organize optical element and for detecting described second photodetector of the horizontal angle value of described workpiece after organizing optical element, a set of imaging before at least including a spectroscope, a set of imaging.
Further, it is characterized in that, described some optical elements at least also include projection slit assembly, illuminating mirror group, first spectroscope, big aberration assembly, second spectroscope, group before imaging, visible ray filter plate, group after imaging, level is to image-forming component, infrared filter, first detection mirror group, detection slit assembly, second detection mirror group, prism assemblies, 3rd detection mirror group and vertical image-forming component, described light source, described projection slit assembly, described illuminating mirror group, described first spectroscope, described big aberration assembly, before described second spectroscope and imaging, group is common components；Group after described common components and described visible ray filter plate, described imaging, described level are to image-forming component and described second photodetector composition level to measuring Sensor Measurement Unit；Described common components forms vertical Sensor Measurement Unit with described infrared filter, described first detection mirror group, described detection slit assembly, described second detection mirror group, described prism assemblies, described 3rd detection mirror group, described vertical image-forming component and described first photodetector.
Further, described second photodetector uses visible light wave range measurement, described first photodetector to use monochromatic visible light or Infrared measurement.
Further, described some optical elements at least include a shutter, and described shutter is closed when only having described first photodetector work, open when described second photodetector work.
Measurement apparatus according to the present invention, can carry out vertical measurement while alignment, and can know that the defocusing amount of alignment mark, thus improving the productivity of exposure device.Compared with tradition alignment and focusing sensor, volume is more compact, and space of being more convenient for is arranged, the quantity of point is measured in alignment and focusing can increase at least one times.Six-degree of freedom position proposed by the invention and attitude-measuring sensor can carry out different layout designs, are applicable not only to the TFT litho machine of advanced lines, and are equally applicable to dual stage and 90nm step-by-step scanning photo-etching device.
Accompanying drawing explanation
Can be described in detail by invention below about the advantages and spirit of the present invention and institute's accompanying drawings is further understood.
Fig. 1 show focusing of the prior art and alignment measurement point distribution schematic diagram；
Fig. 2 show focusing and leveling sensor principle schematic of the prior art；
Fig. 3 show the structural representation of the six-degree of freedom position according to embodiments of the invention 1 and attitude measuring；
Fig. 4 show the structural representation to sensor of the level in the six-degree of freedom position according to embodiments of the invention 1 and attitude measuring；
Fig. 5 show level formed image on the image-forming component of sensor in six-degree of freedom position and attitude measuring according to an embodiment of the invention；
The structural representation of the vertical sensor that Fig. 6 show in the six-degree of freedom position according to embodiments of the invention 1 and attitude measuring；
Fig. 7 show the measuring principle figure of the vertical sensor according to embodiments of the invention 1；
Fig. 8 show the image that the six-degree of freedom position according to embodiments of the invention 1 obtains after treatment with the become image on image-forming component in the vertical sensor in attitude measuring；
Fig. 9 show the structural representation of the six-degree of freedom position according to embodiments of the invention 2 and attitude measuring.
Detailed description of the invention
Specific embodiments of the invention are described in detail below in conjunction with accompanying drawing.
Fig. 3 show the structural representation of the embodiment 1 of the workpiece six-degree of freedom position according to the present invention and attitude measuring, this measurement apparatus includes light source 101, projection slit assembly 102, illuminating mirror group 103, first spectroscope (Amici prism) 104, big aberration assembly 105, second spectroscope (Amici prism) 106, 107 are organized before imaging, measure workpiece 108, visible ray filter plate 109, 110 are organized after imaging, area array CCD 111, infrared filter 112, first detection mirror group 113, detection slit assembly 114, second detection mirror group 115, prism assemblies 116, 3rd detection mirror group 117, line array CCD (LCCD) 118.Wherein assembly 101 ~ 107 is common components, and itself and assembly 109 ~ 111 form level to measuring sensor, and meanwhile, common components 101 ~ 107 forms vertical sensor with assembly 112 ~ 118.Described level uses visible light wave range to measuring sensor, and vertical sensor uses infrared band, can be synchronously performed measurement, be independent of each other on measuring.
Fig. 4 show the structural representation to sensor of the level in said apparatus, the light wherein sent by light source 101 sequentially passes through slit 102, illuminating mirror group 103, first spectroscope (Amici prism) 104, big aberration assembly 105, it is irradiated on workpiece 108 after organizing 107 before second spectroscope (Amici prism) 106 and imaging, on such as alignment mark 300, after the reflection of aligned labelling 300, reflection light organizes 107 before passing sequentially through imaging, second Amici prism 106, after organizing 110 after visible ray filter plate 109 and imaging, area array CCD 111 generates labelling image, the level of this alignment mark can be obtained to position after image procossing.
Fig. 5 show level to the formed image on area array CCD of the labelling 300 measured by sensor, and on workpiece, this mark part is metallic region, reflectance more than non-marked area, thus on CCD after imaging the gray value of marked region more than non-marked area.By template matching algorithm, the level obtaining labelling can be calculated to position.
Fig. 6 show the structural representation of vertical sensor, the light wherein sent by light source 101 sequentially passes through slit 102, illuminating mirror group 103, first Amici prism 104, big aberration assembly 105, it is irradiated to workpiece 108 after organizing 107 before second Amici prism 106 and imaging, reflection light on workpiece 108 organizes 107 before sequentially passing through imaging, second Amici prism 106 and big aberration assembly 105 form the light beam with big aberration, it is then passed through the first Amici prism 104 and infrared filter 112 forms infrared light, then through the first detection mirror group 112, detection slit assembly 114 and the second detection mirror group 115 form directional light, imaging on LCCD118 after prism assemblies 116 and the 3rd detection mirror group 117.
Fig. 7 show the measuring principle schematic diagram of vertical sensor; the polychromatic light sent by light source; the monochromatic light of different wave length it is divided into by mirror group; after being irradiated to workpiece surface; the monochromatic light of different wave length correspond to different defocusing amounts (can pass through to survey school and obtain the relation of wavelength and defocusing amount), then passes through workpiece reflection, imaging on LCCD after mirror group and prism transfer; because refractive index on prism of the monochromatic light of different-waveband is different, finally arrive and the position that is imaged on LCCD is also different.As shown in FIG., the workpiece defocusing amount corresponding with red light due to green light is different, and last green glow is different from HONGGUANG image space on LCCD.
Fig. 8 show the HONGGUANG in Fig. 7 and green glow imaging schematic diagram on LCCD, and wherein abscissa is the position of pixel on LCCD, correspond to different spectral bands, and vertical coordinate is gray value, λ1Corresponding green spectrum, λ2Corresponding red-light spectrum.The figure shows green glow and HONGGUANG by can imaging on LCCD after prism, but current workpiece is positioned over green glow focal point, then the intensity of green glow is more than HONGGUANG, is expressed as the gray value of green glow more than HONGGUANG, the measured value that defocusing amount is this vertical sensor that therefore green glow is corresponding on CCD.
Embodiment 2
The structure of the measurement apparatus according to embodiments of the invention 2 is as shown in Figure 9, itself and embodiment 1 are distinctive in that focusing and alignment sensor all use white light source, light path does not have filter plate device, but in alignment sensor, there is a shutter 200, this device generally uses vertical sensor to measure, when workpiece motion s to mark position, then shutter is opened and is carried out level to measurement.
The preferred embodiment of the simply present invention described in this specification, above example is only in order to illustrate technical scheme but not limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (7)
1. workpiece six-degree of freedom position and an attitude-measuring sensor device, for can simultaneously to the vertical of workpiece and level to measurement, it is characterised in that include light source, for providing the light beam detected needed for described workpiece；And some optical elements, for described light beam being projected to described workpiece, and the reflection light on described workpiece being respectively sent to the first photodetector and the second photodetector, described first photodetector, for detecting the vertical angle value of described workpiece；Described second photodetector, for detecting the horizontal angle value of described workpiece.
2. measurement apparatus according to claim 1, it is characterised in that described first photodetector is linear array detector or confocal detection device, described second photodetector is planar array detector or two-dimensional array detecting light spectrum instrument.
3. measurement apparatus according to claim 1, it is characterised in that described some optical elements at least include a spectroscope, a prism assemblies, two lens and for detecting described first photodetector of the vertical angle value of described workpiece.
4. measurement apparatus according to claim 1, it is characterized in that, described some optical elements organize optical element and for detecting described second photodetector of the horizontal angle value of described workpiece after organizing optical element, a set of imaging before at least including a spectroscope, a set of imaging.
5. measurement apparatus according to claim 1, it is characterized in that, described some optical elements at least also include projection slit assembly, illuminating mirror group, first spectroscope, big aberration assembly, second spectroscope, group before imaging, visible ray filter plate, group after imaging, level is to image-forming component, infrared filter, first detection mirror group, detection slit assembly, second detection mirror group, prism assemblies, 3rd detection mirror group and vertical image-forming component, described light source, described projection slit assembly, described illuminating mirror group, described first spectroscope, described big aberration assembly, before described second spectroscope and imaging, group is common components；Group after described common components and described visible ray filter plate, described imaging, described level are to image-forming component and described second photodetector composition level to measuring Sensor Measurement Unit；Described common components forms vertical Sensor Measurement Unit with described infrared filter, described first detection mirror group, described detection slit assembly, described second detection mirror group, described prism assemblies, described 3rd detection mirror group, described vertical image-forming component and described first photodetector.
6. measurement apparatus according to claim 2, it is characterised in that described second photodetector uses visible light wave range measurement, described first photodetector to use monochromatic visible light or Infrared measurement.
7. measurement apparatus according to claim 2, it is characterised in that described some optical elements at least include a shutter, described shutter is closed when only having described first photodetector work, opens when described second photodetector work.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105115476A (en) * | 2015-09-02 | 2015-12-02 | 合肥工业大学 | Flat plate inclination measurement device based on multi-point off-focus detection |
| CN111531407A (en) * | 2020-05-08 | 2020-08-14 | 太原理工大学 | Workpiece attitude rapid measurement method based on image processing |
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| CN102939531A (en) * | 2010-03-26 | 2013-02-20 | 德固萨有限责任公司 | Method for ascertaining material characteristics of an object |
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| JP2005209926A (en) * | 2004-01-23 | 2005-08-04 | Nikon Corp | Mark detecting method and apparatus thereof, exposure method and apparatus thereof, and device manufacturing method |
| US20070035708A1 (en) * | 2005-08-09 | 2007-02-15 | Canon Kabushiki Kaisha | Exposure apparatus |
| CN101093362A (en) * | 2006-06-22 | 2007-12-26 | Asml荷兰有限公司 | Method and apparatus for angular-resolved spectroscopic lithography characterization |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105115476A (en) * | 2015-09-02 | 2015-12-02 | 合肥工业大学 | Flat plate inclination measurement device based on multi-point off-focus detection |
| CN111531407A (en) * | 2020-05-08 | 2020-08-14 | 太原理工大学 | Workpiece attitude rapid measurement method based on image processing |
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