CN105803406B - 一种磁光记录介质镀膜用稀土过渡合金旋转靶材的制备方法及其制备靶材 - Google Patents
一种磁光记录介质镀膜用稀土过渡合金旋转靶材的制备方法及其制备靶材 Download PDFInfo
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- CN105803406B CN105803406B CN201610144237.6A CN201610144237A CN105803406B CN 105803406 B CN105803406 B CN 105803406B CN 201610144237 A CN201610144237 A CN 201610144237A CN 105803406 B CN105803406 B CN 105803406B
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- CN
- China
- Prior art keywords
- rare
- target
- transition metal
- target pipe
- earth
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201610144237.6A CN105803406B (zh) | 2016-03-14 | 2016-03-14 | 一种磁光记录介质镀膜用稀土过渡合金旋转靶材的制备方法及其制备靶材 |
Applications Claiming Priority (1)
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CN201610144237.6A CN105803406B (zh) | 2016-03-14 | 2016-03-14 | 一种磁光记录介质镀膜用稀土过渡合金旋转靶材的制备方法及其制备靶材 |
Publications (2)
Publication Number | Publication Date |
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CN105803406A CN105803406A (zh) | 2016-07-27 |
CN105803406B true CN105803406B (zh) | 2019-04-09 |
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CN201610144237.6A Active CN105803406B (zh) | 2016-03-14 | 2016-03-14 | 一种磁光记录介质镀膜用稀土过渡合金旋转靶材的制备方法及其制备靶材 |
Country Status (1)
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CN (1) | CN105803406B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107190242A (zh) * | 2017-05-12 | 2017-09-22 | 华侨大学 | 一种具有大范围可调矫顽力纳米厚度稀土‑过渡合金薄膜的制备方法 |
CN110453187B (zh) * | 2019-08-21 | 2020-09-01 | 东莞市欧莱溅射靶材有限公司 | 一种ito靶管与钛背管绑定预处理的方法 |
CN115533359A (zh) * | 2022-09-07 | 2022-12-30 | 有研稀土新材料股份有限公司 | 一种稀土旋转靶材及其制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1033654A (zh) * | 1987-09-17 | 1989-07-05 | 精工爱普生株式会社 | 光磁记录介质、溅射用靶及溅射用靶的制造方法 |
CN1136331A (zh) * | 1993-12-02 | 1996-11-20 | 材料研究公司 | 磁光合金溅射靶 |
CN104032274A (zh) * | 2014-06-12 | 2014-09-10 | 贵研铂业股份有限公司 | 一种CoCrPt系合金溅射靶材和薄膜及其制备方法 |
-
2016
- 2016-03-14 CN CN201610144237.6A patent/CN105803406B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1033654A (zh) * | 1987-09-17 | 1989-07-05 | 精工爱普生株式会社 | 光磁记录介质、溅射用靶及溅射用靶的制造方法 |
CN1136331A (zh) * | 1993-12-02 | 1996-11-20 | 材料研究公司 | 磁光合金溅射靶 |
CN104032274A (zh) * | 2014-06-12 | 2014-09-10 | 贵研铂业股份有限公司 | 一种CoCrPt系合金溅射靶材和薄膜及其制备方法 |
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Publication number | Publication date |
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CN105803406A (zh) | 2016-07-27 |
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Effective date of registration: 20200922 Address after: 110000 No. twenty-five, No. 91, developed by Shenyang economic and Technological Development Zone, Liaoning Patentee after: SHENYANG WEITAI SCIENCE AND TECHNOLOGY DEVELOPMENT Co.,Ltd. Address before: 214192 No. three, No. 99, Furong Road, Xishan economic and Technological Development Zone, Xishan District, Jiangsu, Wuxi Patentee before: WUXI XUMATIC NEW ENERGY TECHNOLOGY Co.,Ltd. |
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Effective date of registration: 20220615 Address after: 213000 No. 61, Fuyang Road, Tianning District, Changzhou City, Jiangsu Province Patentee after: Yaxin semiconductor materials (Jiangsu) Co.,Ltd. Patentee after: Yaxin Electronic Technology (Changzhou) Co., Ltd Address before: 110000 No.91, No.25 Kaifa Road, Shenyang Economic and Technological Development Zone, Liaoning Province Patentee before: SHENYANG WEITAI SCIENCE AND TECHNOLOGY DEVELOPMENT CO.,LTD. |
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