CN105791811B - A kind of three-dimensional test mark version and its design and forming method - Google Patents
A kind of three-dimensional test mark version and its design and forming method Download PDFInfo
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- CN105791811B CN105791811B CN201410783740.7A CN201410783740A CN105791811B CN 105791811 B CN105791811 B CN 105791811B CN 201410783740 A CN201410783740 A CN 201410783740A CN 105791811 B CN105791811 B CN 105791811B
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Abstract
A kind of three-dimensional test mark version and its design and forming method, wherein the three-dimensional test mark version includes the multiple test mark plates being arranged along depth direction, per the test, mark plate is respectively provided with an at least test pattern, and the test pattern of any one of test mark plate and the test pattern of test mark plate described in other are not arranged overlappingly along the depth direction.
Description
Technical field
The present invention relates to a kind of optical system testing field, in particular to a kind of three-dimensional test mark version and its method, wherein
The test pattern provided by the three-dimensional test mark version in different depth, makes photographic device to be tested at least only need mobile one
Step is even motionless, so that it may the image with different depth information is obtained, it is quick to photographic device progress to realize
Test and adjustment.
Background technique
Along with advancing by leaps and bounds for technology, using the intelligent electronic devices such as electronics, communication as the high-tech industry of representative
It quickly emerges, and occupies the most middle and high-end market of electronic equipment.In intelligent electronic device, photographic device conduct
A kind of carrier of the extension of human sight apparatus, becomes core devices and further has been widely used, for example, in intelligence
It can mobile phone, personal digital assistant, tablet computer, laptop, PC terminal, the vehicles, medical instrument and monitoring device
In equal products, it is all configured with an at least photographic device, booming take the photograph also has been achieved in the fast development of these products simultaneously
As device industry.
The further of intelligent electronic device develops and the change of consumer demand, also guide photographic device initially towards
Development in terms of miniaturization, micromation and high imaging quality, therefore, while the volume of photographic device is compressed continuously, again
There can be the image quality of high quality to become the direction of technical research.
Photographic device itself is a very accurate and complicated device, mainly includes photographing module part and image
The motor of sensor and the positional relationship for adjusting photographing module part and imaging sensor, such as voice coil motor.It is taking the photograph
As device manufacturing process in, most important process is exactly relied on photographing module part and imaging sensor in a manner of matched
It is installed together in support components such as microscope bases, thus, so that having between photographing module part and imaging sensor opposite
Stable positional relationship.However, during by photographing module part and image sensor package, due to photographing module part
There are image planes inclinations when itself is imaged, while there is tilt tolerances between each element of photographic device, and due to being sealed
Fill the limitation of the precision of technique, the light and imaging sensor for recording image information for receiving imaging sensor
Itself have a certain range but unfixed inclination and offset, finally make the entire optical system including photographic device at
As quality is by serious decaying.
So before being packaged the elements such as photographing module part and imaging sensor, to photographing module part
The gradient of image planes and the receiving surface of imaging sensor is necessary when being tested and being adjusted, this process be broadly divided into test and
Adjust two processes.Traditional mode tested optical system includes orthographic projection (target using transmission-type and reflective)
With inverse projection (target uses transmission-type), the test philosophy of both modes is that dollying module or target is leaned on to change quilt
The relative position of photographing module part and target or imaging sensor is surveyed, thus, obtain the function of image quality and defocusing curve
Relationship, then the focal position by calculating each target position and tilt vector, to test photographing module part and target or image
The relative inclination of sensor, and be adjusted according to the relative inclination.However, it is existing according to above-mentioned principle to optical system
There is very big technological deficiencies for the device that system is tested, and are tested photographic device and are adjusted so that having severely impacted
Whole efficiency.Specifically, the equipment for being traditionally used for test photographic device need gradually moving parts it is complete to depict
The functional relation of image quality and defocusing curve needs telephone expenses longer time；During testing photographic device,
If the image planes tilt angle of photographing module part is larger, in order to collect the higher focal position of target picture, need more greatly away from
Liftoff dollying module section is possible to bump against traditional during photographing module is partially toward imaging sensor movement
The appearance of situations such as mechanism member or degumming of equipment, so that causing to test and correct failure；The volume of traditional equipment is big, needs
More space is occupied, so as to test photographic device spent cost big.
Therefore, traditional equipment can not necessarily be applied on a large scale.To, if it is possible to reducing traditional equipment
On the basis of volume and cost, effectively photographic device is tested and adjusted, and increases substantially image quality, becomes industry
The problem of boundary's urgent need to resolve.
Summary of the invention
It is an object of the present invention to provide a kind of three-dimensional test mark version and its methods, wherein passing through the three-dimensional test
The test pattern that there is provided in different depth of mark version makes photographic device to be tested that shifting at least only be needed to move a step or even motionless, just
The image with different depth information can be obtained, the photographic device is quickly tested and adjusted to realize.
It is an object of the present invention to provide a kind of three-dimensional test mark version and its methods, wherein the three-dimensional test mark version
When testing the photographic device, it is only necessary to the minimum mobile primary photographic device, it will be able to obtain the camera shooting
The image quality of device and the functional relation of related data parameter, and the camera shooting is filled based on the functional relation subsequent
The relative position of the photographing module and imaging sensor set and gradient are adjusted, thus, reduce process.
It is an object of the present invention to provide a kind of three-dimensional test mark version and its methods, wherein the three-dimensional test mark version
Allow only to shoot an image, and the focal length of the photographic device and image planes inclination can be analyzed simultaneously, thus, it obtains
Corresponding data are used to support subsequent adjustment out.
It is an object of the present invention to provide a kind of three-dimensional test mark version and its methods, wherein the three-dimensional test mark version
It is capable of providing different scenery depth, for traditional test equipment, the three-dimensional test mark version enables to test
The volume of equipment can be designed to sufficiently small, thus, save the motion space due to needing to reserve the photographic device and
Bring design margin, to be reduced as far as the volume of test equipment.
It is an object of the present invention to provide a kind of three-dimensional test mark version and its methods, wherein the three-dimensional test mark version
The trend that the photographic device is increasingly minimized and is miniaturized can be met, and solve adjusting the photographic device at the same time
The relative position with imaging sensor when, brought traditional technique between causing it to touch the bottom mechanism of test equipment
The problem of bottleneck.
It is an object of the present invention to provide a kind of three-dimensional test mark version and its methods, wherein the three-dimensional test mark version
At least one described test pattern can be formed in different planes and conplane different location, thus, the camera shooting
Device can collect the test pattern of the different depth in the three-dimensional test mark version in the state of static state, with
It is subsequent that resolving power analysis is carried out to the photographic device.
It is an object of the present invention to provide a kind of three-dimensional test mark version and its method, the three-dimensional test mark version can be with
It is needed according to different tests to be replaced, and the specification of the three-dimensional test mark version can also be adjusted to, and conveniently be made
With.
It is an object of the present invention to provide a kind of three-dimensional test mark version and its methods, wherein the three-dimensional test mark version
Include any side that depth information may be implemented and guarantee picture contrast such as transmission-type, reflective, projection, zoom-type
Formula.
It is an object of the present invention to provide a kind of three-dimensional test mark version and its methods, wherein the three-dimensional test mark version
The test pattern may include triangle, circle, ellipse, black and white line to, it is cross or star-shaped etc. single or
The pattern of any image quality that can calculate the photographic device after combination, thus, facilitate the three-dimensional test mark version quilt
Selection and preparation.
It is an object of the present invention to provide a kind of three-dimensional test mark version and its method, the test pattern assist into
The test of the row photographic device and when carrying out resolving power analysis to it, will not generate more noises, thus, it is ensured that test
Accuracy.
It is an object of the present invention to provide a kind of three-dimensional test mark version and its methods, by combining the test pattern
The three-dimensional test mark version formed later, the data of the available resolving power for more reflecting the photographic device, rear
It is continuous to ensure to go on smoothly to what the photographic device was adjusted.
It is an object of the present invention to provide a kind of three-dimensional test mark version and its methods, in the same field range,
When the test pattern of each layer is captured by the photographing module of the photographic device, in the picture of the photographing module of the photographic device
Face is not in the phenomenon that interfering, thus, it is ensured that the reliability of test result and the precision of test.
It is an object of the present invention to provide a kind of three-dimensional test mark version and its method, the knot of the three-dimensional test mark version
Structure is simple, at low cost, is suitable for large-scale production application.
In order to achieve the above object, the present invention provides a kind of three-dimensional test mark version, the three-dimensional test mark version include along
Multiple test mark plates of depth direction setting, the test mark plate are respectively provided with an at least test pattern, and any one
The test pattern of a test mark plate and the test pattern of other test mark plates are along the depth
Direction is not arranged overlappingly.
An example according to the present invention, sets the rear burnt fitting precision parameter of a photographic device to be tested as a, focal length parameter
For EFL, the location parameter of the three-dimensional test mark version is set as h, the location parameter of test mark plate is h described in any layerj, institute
The layer number parameter for stating test mark plate is j；Wherein, the position of the three-dimensional test mark version meets function expression：A=- (EFL*
(-hj)/(EFL-hj)-(EFL*(-h)/(EFL-h)))。
An example according to the present invention sets the layer number parameter of the test mark plate as n, sets the photographic device
Tolerance parameter is t, and mobile step number parameter is s；Wherein, the number of plies of the test mark plate meets function expression：N=f (t, a,
s)。
An example according to the present invention sets the layout parameter of the test pattern as d, and plate is marked in test described in any layer
Any test pattern to this layer it is described test mark plate centre distance be dij, set the test view of the photographic device
Field parameters are F；Wherein, the layout of the test pattern meets function expression：dij=f ' (F, hij, EFL).
An example according to the present invention, sets the dimensional parameters of the test pattern as L, any one test pattern
Dimensional parameters are Lij, the parameter tolerance of the three-dimensional test mark version is t ', and medium refraction index parameter is n ', and software calculating is allowed
Disc of confusion parameter be s ', set the test visual field permissible range parameter of the photographic device as △ F；Wherein, the test chart
The size of case meets function expression：Lij=f " (dij, △ F, t ', n ', s ').
The shape of an example according to the present invention, the test pattern is selected from rectangular, triangle, circle, ellipse, cross
The combination of shape, black and white line to one or more of, star.
An example according to the present invention, the three-dimensional test mark version have the 2-100 layer tests mark plate, described in each layer
Test mark plate has the 1-1000 test patterns.It will be understood by those skilled in the art that the number of plies and test here
The specific value of pattern number is only used as the present invention that illustrates rather than limit.
An example according to the present invention, the three-dimensional test mark version be selected from transmission-type, reflective, projection or zoom at
As one of formula is formed.
An example according to the present invention, the three-dimensional test mark version further includes an at least load-carrying unit, the load-carrying unit
It overlaps and is positioned apart from；Wherein, the load-carrying unit is respectively formed the test mark plate, and the test pattern is selectively
It is arranged or is formed in the test mark plate.
An example according to the present invention, the load-carrying unit are made of clear material.
The present invention also provides a kind of three-dimensional test mark versions, arrange wherein the three-dimensional test mark version has along depth direction
And nonoverlapping multi-layer testing pattern, test pattern described in adjacent two layers is arranged apart from one another by ground, to form the solid
Test mark version.
An example according to the present invention, the three-dimensional test mark version further includes an at least load-carrying unit, the load-carrying unit
It overlaps and is positioned apart from；Wherein, the load-carrying unit is respectively formed a test mark plate, and the test pattern is located at the survey
Test-object plate.
The shape of an example according to the present invention, the test pattern is selected from rectangular, triangle, circle, ellipse, cross
The combination of shape, black and white line to one or more of, star.
An example according to the present invention, wherein there are the three-dimensional test mark version 2-100 layers of test to mark plate, each layer
The test mark plate has the 1-1000 test patterns.It will be understood by those skilled in the art that the number of plies here and
The specific value of test pattern number is only used as the present invention that illustrates rather than limit.
The present invention also provides a kind of design methods of three-dimensional test mark version, which is characterized in that the method includes the steps：
(A) by counting the parameter of tested photographic device, the position of the three-dimensional test mark version is determined；And
(B) according to the required precision of the photographic device, described in the number of plies and design for determining the three-dimensional test mark plate
The layout of the test pattern of test mark plate.
An example according to the present invention further comprises step in the step (B)：Determine the test pattern
Size.
An example according to the present invention sets the rear burnt fitting precision of a photographic device to be tested in the step (A)
Parameter is a, and focal length parameter is EFL, and the location parameter for setting the three-dimensional test mark version tests mark plate as h, described in any layer
Location parameter be hj, the layer number parameter of the test mark plate is j；Wherein, the position of the three-dimensional test mark version meets letter
Number expression formula：
A=- (EFL* (- hj)/(EFL-hj)-(EFL*(-h)/(EFL-h)))；Wherein, according to the value for the h being calculated,
Determine the position of the three-dimensional test mark version.
An example according to the present invention sets the layer number parameter of the test mark plate as n in the step (A), if
The tolerance parameter of the fixed photographic device is t, and mobile step number parameter is s；Wherein, the number of plies of the test mark plate meets function
Expression formula：N=f (t, a, s)；And the layout parameter of the test pattern is set as d, test mark plate appoints described in any layer
The centre distance of one test pattern to this layer of test mark plate is dij, set the test visual field ginseng of the photographic device
Number is F；Wherein, the layout of the test pattern meets function expression：dij=f ' (F, hij, EFL)；Wherein, according to calculating
N and d outijValue, determine it is described test mark plate the number of plies and the test pattern layout.
An example according to the present invention, sets the dimensional parameters of the test pattern as L, any one test pattern
Dimensional parameters are Lij, the parameter tolerance of the three-dimensional test mark version is t ', and medium refraction index parameter is n ', and software calculating is allowed
Disc of confusion parameter be s ', set the test visual field permissible range parameter of the photographic device as △ F；Wherein, the test chart
The size of case meets function expression：Lij=f " (dij, △ F, t ', n ', s ')；Wherein, according to the L being calculatedijValue, really
The size of the fixed test pattern.
The shape of an example according to the present invention, the test pattern is selected from rectangular, triangle, circle, ellipse, cross
The combination of shape, black and white line to one or more of, star.
The present invention also provides a kind of forming methods of three-dimensional test mark version, wherein the method includes the steps：
(a) determine that in a test mark plate, at least one test is respectively set in the predeterminable area in an at least predeterminable area
Pattern；And
(b) multiple tests mark plate is superimposedly arranged, and makes the test pattern for testing mark plate and its
The test pattern dislocation ground arrangement of his the test mark plate, to form the three-dimensional test mark version.
An example according to the present invention successively marks plate spoke by the test by light in the step (b)
It penetrates, to enhance the contrast of the test pattern with this layer of test mark plate.
One light source is set to the top of the three-dimensional test mark version in the above-mentioned methods by an example according to the present invention,
So that the light that the light source generates successively is radiated by test mark plate from the top down.
An at least light source is set to the three-dimensional test mark version in the above-mentioned methods by an example according to the present invention
Lower part, so that the light that the light source generates successively is radiated by test mark plate from bottom to top.
An example according to the present invention, the light by the test mark plate is uniform light.
The present invention provides a kind of forming method of three-dimensional test mark version, wherein the method includes the steps：By a projection source
It is set to the light radiation path of a light source, wherein the projection source is able in a default sky when the light source generates light
It is interior to form nonoverlapping multi-layer testing pattern along depth direction, and test pattern described in adjacent two layers is arranged apart from one another by ground
Column, to form the three-dimensional test mark version.
An example according to the present invention, the projection source are set between the light source and the pre-set space.
An example according to the present invention, the projection source include a plane mark version and a variable focus lens package, wherein described
Plane mark version is set between the light source and the variable focus lens package, so that the light that the light source generates, is able to institute
The information for stating plane mark version is radiated to the pre-set space through the variable focus lens package.
An example according to the present invention, the plane mark version also has an at least test target, wherein the test target
It is able to project by the variable focus lens package to the pre-set space, to form the test pattern.
The shape of an example according to the present invention, the test pattern is selected from rectangular, triangle, circle, ellipse, cross
The combination of shape, black and white line to one or more of, star.
Detailed description of the invention
Fig. 1 is the photographing module of photographic device and the relation schematic diagram of imaging sensor.
Fig. 2 is the flow diagram of the parameter determination process of three-dimensional test mark version according to the present invention.
Fig. 3 is the schematic layout pattern of the test pattern of any layer test mark plate according to the present invention.
Fig. 4 to fig. 6 is the schematic diagram of a preferred embodiment of three-dimensional test mark version according to the present invention respectively.
Fig. 7 to Figure 10 is the schematic diagram of second preferred embodiment of three-dimensional test mark version according to the present invention respectively.
Figure 11 to Figure 14 is the schematic diagram of the third preferred embodiment of three-dimensional test mark version according to the present invention respectively.
Figure 15 to Figure 17 is the schematic diagram of the 4th preferred embodiment of three-dimensional test mark version according to the present invention respectively.
Figure 18 is the design method flow diagram of three-dimensional test mark version according to the present invention.
Figure 19 is the generation type flow diagram of three-dimensional test mark version according to the present invention.
Specific embodiment
It is described below for disclosing the present invention so that those skilled in the art can be realized the present invention.It is excellent in being described below
Embodiment is selected to be only used as illustrating, it may occur to persons skilled in the art that other obvious modifications.It defines in the following description
Basic principle of the invention can be applied to other embodiments, deformation scheme, improvement project, equivalent program and do not carry on the back
Other technologies scheme from the spirit and scope of the present invention.
In a preferred embodiment of the invention, a photographing module 11, an imaging sensor 12 and other necessary components
A photographic device 10 is formed by components such as microscope bases, the photographing module 11 is being sealed with described image sensor 12
When dress, there are image planes inclinations when due to the photographing module 11 imaging, while depositing between other components of the photographic device 10
It is limited, needed to the focal length of the photographic device 10 and described is taken the photograph in tilt tolerance and precision by packaging technology
It is tested as the image planes of module 11 and described image sensor 12 tilt, to obtain corresponding data, and is based on subsequent
The data are adjusted it, thus, it is ensured that image quality of the photographic device 10 after packed complete.Such as Fig. 1,
Unmatched a kind of situation between the unjustified photographing module 11 and described image sensor 12 is shown, is shown at this
In example, due to, there is a little inclination, causing to take the photograph by described between the photographing module 11 and described image sensor 12
As the light of object that module 11 captures can not accurately be received by described image sensor 12, thus, lead to image blur.
It should be understood by those skilled in the art that the photographing module 11 also has with described image sensor 12 except Fig. 1 is shown
Example except other unmatched situations, for example, the image planes of the photographing module 11 itself tilt etc..
As shown in Figures 3 to 16, the present invention is intended to provide a kind of three-dimensional test mark version, is filled with being used for auxiliary to the camera shooting
10 are set to be tested, wherein the three-dimensional test mark version includes the multiple test mark plates 20 being arranged along depth direction, it is described
Test mark plate 20 is respectively provided with an at least test pattern 21, thus, so that the test pattern 21 forms the scape of different depth
Object information.During testing the photographic device 10, by the note of the photographing module 11 capture different depth
It is loaded with the light of 21 information of test pattern, then received by described image sensor 12 and carries out further photoelectricity turn
Change, thus, a signal of the relationship between the photographing module 11 and described image sensor 12 that carries is generated on backstage, and
It is adjusted based on the signal subsequent.
It is noted that the relevant parameter of the three-dimensional test mark version need the type based on the photographic device 10 into
The number of plies, spacing and the three-dimensional test mark version of the test mark plate 20 of version are marked in row setting, such as the three-dimensional test
Position, the shape of the test pattern 21, size, position, density etc..
It is the design flow diagram of the three-dimensional test mark version as shown in Figure 2, specifically, when the camera shooting to be tested fills
Set 10 type be determined after, need first to be measured the related test parameters of the photographic device 10, including described take the photograph
As parameters such as the test visual field of device 10, focal length, measuring distance, rear burnt fitting precision demands.The camera shooting is filled for convenience
The relationship set between 10 and the parameter of the three-dimensional test mark version is described, and sets the test visual field ginseng of the photographic device 10
Number is F, and correspondingly, focal length parameter is EFL, and rear coke fitting precision parameter is a, wherein rear coke fitting precision a is determined by fitting demand
It is fixed, and it is fitted the demand that demand depends on software processing.The measuring distance of the three-dimensional test mark version is further set as Z,
Wherein ZjIndicate the measuring distance of the jth layer test mark plate 20, and the value range of j is j>=2, for example, Z1Indicate the
The measuring distance of one layer of test mark plate 20, wherein first layer refers to the three-dimensional test mark version farthest from the camera shooting
The test mark plate 20 of module 11, and Z1It is determined when originally determined by the type of the photographic device 10, that is to say, that
After the type of the photographic device 10 to be tested is determined, the measuring distance of test mark plate 20 described in first layer is same
Step determines.It further, based on the parameter, can be to described after the relevant parameter of the photographic device 10 is measured
The position of solid test mark version and the number of plies of the test mark plate 20 are calculated.Specifically, the setting three-dimensional survey
The location parameter of test-object version is h, then it should be understood by those skilled in the art that the position of test mark plate 20 described in any layer
Setting parameter is hj, for example, hjIndicate the position of the jth layer test mark plate 20, and the value range of j is j>=2；Wherein,
The function expression of the position of the test mark version meets：A=- (EFL* (- hj)/(EFL-hj)-(EFL*(-h)/(EFL-
h))).It, can be by the value of calculating h, to determine the test mark of the three-dimensional test mark version based on above-mentioned function expression
The position of plate 20.
Further, the layer number parameter of the test mark plate 20 is set as n, and 10 tolerance parameter of photographic device is
T, wherein 10 tolerance t of the photographic device is determined by processing procedure, it includes but be not limited to be tested the height of the photographic device 10, incline
Tiltedly, the tolerances such as offset；The mobile step number parameter of the photographic device 10 is further set as s, it is worth mentioning at this point that, it is tested described
The mobile step number s of photographic device 10>=1, that is to say, that the photographic device 10 is carried out using the three-dimensional test mark version
During test, the mobile primary photographic device 10 is at least only needed, so that it may obtain corresponding supplemental characteristic；Wherein institute
The function expression for stating the number of plies of test mark plate 20 meets：N=f (t, a, s).Based on above-mentioned function expression, can pass through
The value of n is calculated, to determine the number of plies of the test mark plate 20.
It correspondingly, can be with after determining the number of plies of position and the test mark plate 20 of the three-dimensional test mark version
Continue to determine shape, the positions and dimensions of the test pattern 21.In some embodiments of the invention, the test pattern 21
Shape it is unrestricted, can be selected from rectangular, triangle, circle, ellipse, cross, black and white line in, star graphic
One or more kinds of combinations.It is noted that the shape of the test pattern 21 can also be that other any can be used to
The icon for calculating the image quality of the photographic device 10, including entity icon and the icon distinguished by color.
As an example, as shown in figure 3, set the layout parameter of the test pattern 21 of the three-dimensional test mark version as d,
Wherein the layout parameter d of the test pattern 21 represents the density of the test pattern 21, and therefore, plate is marked in any test
The centre distance of 20 any test pattern 21 to this layer of test mark plate 20 is set to parameter dij, wherein i table
Show position of the test pattern 21 on this layer of test mark plate 20, j indicates the layer of this layer of test mark plate 20
Number, for example, dijIndicate the layout of i-th of test pattern 21 of the jth layer test mark plate 20；The wherein test chart
The function expression of the layout of case 21 meets：dij=f ' (F, hij, EFL), it is worth mentioning at this point that, visual field F is tested by institute to be measured
State the decision of photographic device 10, hijIt can be obtained by the function expression of the position of the three-dimensional test mark version to calculate.It is based on
Above-mentioned function expression, can be by calculating dijValue, to determine the layout of the test pattern 21.I other words based on above-mentioned
Function expression can determine the layout density of the test pattern 21 of the test mark plate 20, it is worth mentioning at this point that,
In some embodiments, the density of the test pattern 21 of the test mark plate 20 can be consistent, can also be inconsistent.
Further, as shown in figure 3, setting the dimensional parameters of the test pattern 21 as L, correspondingly, any survey
The dimensional parameters for attempting case 21 are Lij, wherein accordingly LijThis described test pattern 21 is represented to this layer of test mark version
The distance of the central point of layer 20 is dij, for example, LijIndicate i-th of test pattern 21 of the jth layer test mark plate 20
Size.Test visual field span permissible range parameter is further set as △ F, the production parameter tolerance of version is marked in the three-dimensional test
Medium refraction index parameter for t ', the three-dimensional test mark version is n ', and it is s ' that software, which calculates permitted disc of confusion parameter, wherein
The function expression of the size of the test pattern 21 meets：Lij=f " (dij, △ F, t ', n ', s ').Based on above-mentioned function table
It, can be by calculating L up to formulaijValue, to determine the size of the test pattern 21.
It is noted that calculating the size L of the test pattern 21ijProcess be the three-dimensional test mark version items
Parameter makes the process that tolerance is balanced with it, and in the size L for working as the test pattern 21ijValue determine after, institute
The production tolerance for stating three-dimensional test mark version synchronizes determination.It's also worth mentioning that when the parameters of the three-dimensional test mark version
After determination, these parameters can be based on, make shown three-dimensional test mark version.
Correspondingly, as shown in figure 18, the present invention provides a kind of design method of three-dimensional test mark version, wherein the method packet
Include step：
(A) by counting the parameter of tested photographic device 10, the position of the three-dimensional test mark version is determined；And
(B) according to the required precision of the photographic device 10, the layer of the test mark plate of the three-dimensional test mark version is determined
The layout of the test pattern of number and the design test mark plate.
Specifically, in the step (A), it is first after the type of the photographic device 10 to be tested is determined
The relevant parameter to the photographic device 10 is first needed to count, test visual field, coke including the photographic device 10
It, can be with it should be understood by those skilled in the art that according to different use needs away from parameters such as, rear burnt fitting precisions
Further the other parameters of the photographic device 10 to be tested are counted, to obtain the comprehensive ginseng of the photographic device 10
Number data, thus, set out the scheme of the more preferably described three-dimensional test mark version.
It further, further comprise step in the step (B)：Determine the size of the test pattern 21.
Preferably, in the step (A), the rear burnt fitting precision parameter of the photographic device 10 to be tested is set as a,
Focal length parameter is EFL, sets the location parameter of the three-dimensional test mark version as h, the position of mark plate 20 is tested described in any layer
Parameter is hj；Wherein, the position of the three-dimensional test mark version meets function expression：A=- (EFL* (- hj)/(EFL-hj)-
(EFL*(-h)/(EFL-h)))；Wherein, according to the value for the h being calculated, the position of the three-dimensional test mark version is determined.
Preferably, in the step (A), the layer number parameter of the test mark plate 20 is set as n, sets the camera shooting
The tolerance parameter of device 10 is t, and mobile step number parameter is s；Wherein, the number of plies of the test mark plate 20 meets function representation
Formula：N=f (t, a, s)；And the layout parameter of the test pattern 21 is set as d, test mark plate 20 appoints described in any layer
The centre distance of one test pattern 21 to this layer of test mark plate 20 is dij, set the test of the photographic device 10
Visual field parameter is F；Wherein, the layout of the test pattern 21 meets function expression：dij=f ' (F, hij, EFL)；Wherein, root
According to the n and d being calculatedijValue, determine it is described test mark plate 20 the number of plies and the test pattern 21 layout.
Preferably, the dimensional parameters of the test pattern 21 are set as L, the dimensional parameters of any one test pattern 21
For Lij, the parameter tolerance of the three-dimensional test mark version is t ', and medium refraction index parameter is n ', and software calculates permitted disc of confusion
Parameter is s ', sets the test visual field permissible range parameter of the photographic device 100 as △ F；Wherein, the test pattern 21
Size meets function expression：Lij=f " (dij, △ F, t ', n ', s ')；Wherein, according to the L being calculatedijValue, determine institute
State the size of test pattern 21.
Correspondingly, the test pattern 21 of any one layer test mark plate 20 marks plate with other layer of test
20 test pattern 21 is not arranged overlappingly along the depth direction, in this way, described in capturing when the photographing module 11
When test pattern 21, the institute far from the photographing module 11 will not be blocked close to the test pattern 21 of the photographing module 11
State the light that test pattern 21 is transmitted.For example, in some specific embodiments of the invention, the test mark plate 20
The test pattern 21 is arranged in inverted trapezoidal, that is to say, that be more proximate to the test pattern 21 of the photographing module 11 away from
The distance at the center of this layer of test mark plate 20 is more less than the test pattern 21 far from the photographing module 11 away from this
The distance at the center of the layer test mark plate 20, and in this way, the test of the test mark plate 20
Pattern 21 can be captured by the photographing module 11, and form the image with depth information.
I other words the three-dimensional test mark version has along test pattern described in depth direction arrangement and nonoverlapping multilayer
21, the adjacent test pattern 21 is arranged apart from one another by ground, thus, form the three-dimensional test mark version.That is, in this hair
In bright some specific embodiments, the test mark needs of plate 21 are carried the test pattern 21 by carrier and are formed；And
In other embodiment of the invention, the test pattern 21 can also be formed through projection.
It is that the three-dimensional of first preferred embodiment according to the present invention tests mark version and its applied as shown in Figure 4, Figure 5 and Figure 6
Journey schematic diagram.The three-dimensional test mark version includes the test mark plate 20 being arranged along depth direction, wherein the test
Mark plate 20 is respectively provided at least one described test pattern 21, and the test of any one of test mark plate 20
Pattern 21 and the test pattern 21 of test mark plate 20 described in other are not arranged overlappingly along the depth direction.Into one
Step ground, the test pattern 21 has different physical characteristics from test mark plate 20, so that the test pattern 21
Can be easy to be identified and captured by the photographing module 11, for example, the test pattern 21 and the test mark plate 20 can be with
With different contrasts.
Preferably, the test mark plate 20 is formed by transparent material, in this way, the survey can be reduced as far as
The medium refraction index of test-object plate 20, thus, the test pattern 21 of any one layer test mark plate 20 can nothing
Differentially is identified and captured by the photographing module 11.That is, the test of any one layer test mark plate 20
Pattern 21 can without consume pass through other test mark plates 20 and be captured by the photographing module 11, thus, so that
The photographic device 10 can obtain the image of the three-dimensional test mark version with depth information.
As shown in figure 4, the three-dimensional test mark version tests the photographic device 10 using the principle of transmission-type,
Specifically, a light source 40 is arranged on the top of the three-dimensional test mark version, that is to say, that carried out to the photographic device 10
When test, the three-dimensional test mark version is between the light source 40 and the photographing module 10, in this way, the light source 40 generates
Uniform light can sequentially pass through test mark plate 20, and captured in turn by the photographing module 11.In this mistake
Cheng Zhong, the light source 40 when passing through test mark plate 20, can increase in proportion the test mark plate 20 and
Contrast between the test pattern 21 of this layer of test mark plate 20, thus, enable the test pattern 21
More easily is identified and captured by the photographing module 11.
If Fig. 5 and Fig. 6 are the top view and side view of the three-dimensional test mark version respectively, pass through the two views, this skill
The technical staff in art field will readily appreciate that such as position between the test pattern 21 of the test mark plate 20
The layout relationships such as set.
Correspondingly, in the test process by this mode, the light source 40 is allowed to generate uniform light first, these
Uniform light can sequentially pass through the test mark plate 20, and mark plate with the test for enhancing the test pattern 21
Contrast between 20.It is noted that being risen when the light that the light source 40 generates passes through test mark plate 20
The effect arrived is consistent, i.e., indistinguishably enhances the test chart of the test mark plate 20 with this layer of test mark plate 20
Contrast between case 21.In this way, carrying the test pattern 21 when capturing the light by the photographing module 11 and believing
The light of breath can be received by described image sensor 12, and carry out further photoelectric conversion.
It correspondingly, is that the three-dimensional of the second preferred embodiment according to the present invention tests mark version and its answer as shown in Figure 7 to 10
Use process schematic.The three-dimensional test mark version includes the test mark plate 20A being arranged along depth direction, wherein described
The test pattern 21A of the test pattern 21A of test mark plate 20A and other test mark plate 20A are along institute
Depth direction is stated not to be arranged overlappingly.Further, the test pattern 21A has different from test mark plate 20A
Physical characteristic, so that the test pattern 21A can be easy to be identified and captured by the photographing module 11, for example, the survey
Attempt case 21A and can have different contrasts from test mark plate 20A.
Further, as shown in fig. 7, the three-dimensional test mark version using reflective principle to the photographic device 10 into
Row test, specifically, an at least light source 40A is arranged in the lower part of the three-dimensional test mark version, for example, of the invention some
In specific embodiment, the light source 40A be can be set at two or more, so that the light energy that the light source 40A is generated
Enough flow uniformly across the test mark plate 20A.It is understood that when testing the photographic device 10, it is described
Solid test mark version is located at 11 top the light source 40A and the photographing module, and the light source 40A is around the photographing module
11 settings, the art seem that personnel should be appreciated that the distance between the light source 40A and the photographing module 11 and position
Relationship is set, can need to be not limiting upon the contents of the present invention and range to be adjusted based on different tests.
The light that the light source 40A is generated can equably sequentially pass through the test mark plate 20A, to enhance the survey
Contrast between test-object plate 20A and the test pattern 21 of this layer of test mark plate 20A, thus, so that described
Test pattern 21A can be easier to be identified and captured by the photographing module 11.
If Fig. 8 and Fig. 9 are the top view and side view of the three-dimensional test mark version respectively, pass through the two views, this skill
The technical staff in art field will readily appreciate that between the test pattern 21A of the test mark plate 20A such as
The layout relationships such as position.
It is noted that this specific embodiment of the invention shown in Fig. 7 and implementation of the invention shown in Fig. 4
The difference of example is：In the embodiment shown in fig. 4, the light that the light source 40 generates marks the top of version from the three-dimensional test
It is successively radiated to lower part, is finally captured by the photographing module 11；And in the embodiment shown in fig. 7, the light source 40A is generated
The lower part of light from the three-dimensional test mark version be successively radiated to top, for enhance the test mark plate 20A with it is described
Contrast between test pattern 21A.
In some embodiments of the invention, the test mark plate 20A can be made of solid material, can also pass through
The mode of projection is formed in space, for example, in the embodiment provided by Figure 10, the three-dimensional test mark version can also include
An at least load-carrying unit 30A, the load-carrying unit 30A is overlapped and is positioned apart from, and the load-carrying unit 30A is respectively formed
Plate 20A is marked in the test.It is noted that the spacing of the load-carrying unit 30A determine test mark plate 20A it
Between spacing, and the material of the load-carrying unit 30A and thickness directly affect the medium refraction of the three-dimensional test mark version
Therefore rate when selecting the material and thickness of the load-carrying unit 30A, needs the medium in view of the three-dimensional test mark version
Influence of the refractive index to the three-dimensional test mark version body.It will be further appreciated that the load-carrying unit 30A is by transparent material
Be made, in this way, either using transmission-type or it is reflective by the way of come using the three-dimensional test mark version when, the test is marked
The test pattern 21A of plate 20A can indistinguishably by the photographing module 11 identification and be captured, thus, it is ensured that it surveys
The accuracy of test result.
Further, the test pattern 21A can be set or be formed in the load-carrying unit 30A, respectively in institute
State the nonoverlapping test pattern 21A in depth of placement direction on test mark plate 20A.Specifically, in some embodiments,
The test pattern 21A can be arranged at an at least predeterminable area of the load-carrying unit 30A, and the predeterminable area
The parameters such as quantity, size and shape can pass through meter according to the function expression of the parameter of the above-mentioned calculating test pattern 21A
It calculates and obtains, in this way, can make the characteristic of the test pattern 21A that there is apparent area in the characteristic of the load-carrying unit 30A
Not, to facilitate the test pattern 21A to be identified and captured by the photographing module 11 subsequent.
It, can be true through the above way first on the load-carrying unit 30A in other embodiment of the invention
Then the fixed predeterminated position changes the load-carrying unit 30A described pre- by the processing means such as physically or chemically
If the physical characteristic of position, thus, so that the physical characteristic of the predeterminable area of the load-carrying unit 30A is in other regions
Physical characteristic has apparent difference, thus, the test pattern 21A is formed in the predeterminated position.Certainly, the art
It will be appreciated by the skilled person that the test mark version that can also there are other various ways to be formed in the load-carrying unit 30A
The test pattern 21A is formed on layer 20A.
Correspondingly, as shown in figure 19, the forming method for marking version is tested the present invention also provides a kind of solid, the method includes
Step：
(a) determine that in a test mark plate 20, at least one survey is respectively set in the predeterminable area in an at least predeterminable area
Attempt case 21；And
(b) multiple test mark plates 20 are superimposedly arranged, and make the test of the test mark plate 20
The dislocation of the test pattern 21 ground arrangement of pattern 21 and other test mark plates 20, to form the three-dimensional beta version.
Preferably, it in the step (b), is successively radiated by test mark plate 20 by light, to enhance
State the contrast of test pattern 21 with this layer of test mark plate 20.
Further, in the above-mentioned methods, a light source 50 is set to the top of the three-dimensional test mark version, so that institute
The light for stating the generation of light source 50 is successively radiated by test mark plate 20 from the top down.
Further, in the above-mentioned methods, an at least light source 50 is set to the lower part of the three-dimensional test mark version, so that
The light that the light source 50 generates is obtained successively to radiate from bottom to top by test mark plate 20.It is noted that by
The light of the test mark plate 20 is uniform light.It will be further appreciated that the quantity of the predeterminable area, size and shape
The parameters such as shape can be obtained according to the function expression of the parameter of the above-mentioned calculating test pattern 21 by calculating.
As shown in Figure 11 to 14, the present invention forms the three-dimensional test mark version using the principle of projection, relative to
For a specific embodiment of the invention that Fig. 4 and Fig. 7 are illustrated, this specific embodiment of the invention is using the side projected
Formula is formed, and is respectively formed the test as medium using air and is marked plate 20 and the test pattern 21, that is to say, that at this
In a embodiment, the three-dimensional test mark version can not need the load-carrying unit 30 to carry the test pattern 21.
As an example, as shown in figure 11, the three-dimensional test mark version includes an a light source 40B and projection source 50B, wherein
The projection source 50B is located on the path of the light source 40B radiation, that is to say, that light caused by the light source 40B is able to
It is radiated via the projection source 50B, thus, it can produce the image with depth information in pre-set space, for subsequent
The test of the photographic device 10B.
Correspondingly, the present invention can also provide a kind of forming method of three-dimensional test mark version, the method includes the steps：It will
The projection source 50B is set to the path that the light that the light source 40B is generated is radiated, wherein when the light source 40B generates light
When line, the projection source 50B is able to be projected out in the pre-set space along depth direction arrangement and nonoverlapping multi-layer testing
Pattern 21B, test pattern 21B described in adjacent two layers are arranged apart from one another by ground, thus, form the test mark version.Such as Figure 12 institute
Show, the light source 40B and the projection source 50B are respectively set at the default sky for being used to form the three-dimensional test mark version
Between side, and the projection source 50B is between the light source 40B and the pre-set space, so that the light source 40B
The light of radiation, which can project the information of the projection source 50B to formation in the pre-set space to have, tests mark described in multilayer
The three-dimensional test mark version of plate 20B.
In this embodiment, when being tested using test equipment the photographic device 10, the three-dimensional test
The test pattern 21B of mark version is formed in the pre-set space, using air as dielectric layer, therefore, is subtracted as much as possible
Influence of the refractive index of few dielectric layer to test result, so that it is guaranteed that measuring accuracy, and institute is formed by the way of projection
Stating the volume that another beneficial achievement brought by three-dimensional test mark version is the three-dimensional test mark version can further be contracted
It is small.
If Figure 13 and Figure 14 are the top view and side view for the three-dimensional test mark version that projection is formed respectively, by this two
A view, those skilled in the art will readily appreciate that the layouts such as the position of the test pattern 21 are closed
System.
It is to be tested using zoom-type principle the photographic device 10 as shown in Figure 15, Figure 16 and Figure 17, at this
In this embodiment of invention, the three-dimensional test mark version includes an a light source 40C and projection source 50C, wherein the projection
Source 50C is located on the path of the light source 40C radiation, that is to say, that light caused by the light source 40C is able to via described
Projection source 50C radiation, thus, it can produce the image with depth information in pre-set space, to be used for the subsequent camera shooting
The test of device 10.
As an example, as shown in figure 15, the light source 40C and the projection source 50C are respectively set at and are used to form institute
The top of the pre-set space of three-dimensional test mark version is stated, and the projection source 50C is located at the light source 40C and reserves with described
Between space, so that the information of the projection source 50C can be projected to described and pre- be left a blank by the light of light source 40C radiation
It is interior to form the three-dimensional test mark version with test mark plate 20C described in multilayer.
Further, the projection source 50C further includes an a plane mark version 51C and variable focus lens package 52C, wherein described
Plane mark version 51C is set between the light source 40C and the variable focus lens package 52C, and can the plane mark version 51C it is further
With an at least test target 511C, so that the light of light source 40C radiation can pass through the test target 511C
The variable focus lens package 52C forms the three-dimensional test mark version in the reserved space.It is noted that the test mesh
The parameters such as size, position and the quantity of 511C are marked to be able to be set based on the different demands of the three-dimensional test mark version.
If Figure 16 and Figure 17 are the top view and side view for the three-dimensional test mark version that projection is formed respectively, by this two
A view, those skilled in the art will readily appreciate that the layouts such as the position of the test pattern 21C are closed
System.
It is noted that when being tested by the three-dimensional test mark version the photographic device 10, it is described vertical
The test mode of the image quality of body test mark version can use OTF (Optical Transfer Function, optical delivery
Function), MTF (Modulation Transfer Function, modulation transfer function), SFR (Spatial Frequency
Response, spatial frequency response) or CTF (Contrast Transfer Function, contrast transfer function) in
The evaluation method of any resolving power that can characterize the photographic device 10 such as one or more carries out.Certainly, this technology is led
Domain it will be appreciated by the skilled person that in this process, can also be by other evaluation methods come to the photographic device 10
Image quality evaluated and tested.
It should be understood by those skilled in the art that foregoing description and the embodiment of the present invention shown in the drawings are only used as illustrating
And it is not intended to limit the present invention.The purpose of the present invention has been fully and effectively achieved.Function and structural principle of the invention exists
It shows and illustrates in embodiment, under without departing from the principle, embodiments of the present invention can have any deformation or modification.
Claims (26)
1. a kind of three-dimensional test mark version, which is characterized in that including the multiple test mark plates being arranged along depth direction, the survey
Test-object plate is respectively provided with an at least test pattern, and the test pattern of any one of test mark plate and other
The test pattern of the test mark plate is not arranged overlappingly along the depth direction；
The rear burnt fitting precision parameter of a photographic device to be tested is wherein set as a, focal length parameter is EFL, sets the solid
The location parameter of test mark version is h, and the location parameter of test mark plate is h described in any layerj, the number of plies of the test mark plate
Parameter is j；Wherein, the position of the three-dimensional test mark version meets function expression：A=- (EFL* (- hj)/(EFL-hj)-
(EFL*(-h)/(EFL-h)))。
2. solid test mark version as described in claim 1, wherein the layer number parameter for setting the test mark plate is set as n
The tolerance parameter of the photographic device is t, and mobile step number parameter is s；Wherein, the number of plies of the test mark plate meets function table
Up to formula：N=f (t, a, s).
3. test mark version as claimed in claim 2 three-dimensional, wherein set the layout parameter of the test pattern as d, any layer
The centre distance of any test pattern of the test mark plate to this layer of test mark plate is dij, wherein further
If location parameter of the test pattern on this layer of test mark plate is i, the number of plies ginseng of this layer of test mark plate
Number is j, sets the test visual field parameter of the photographic device as F；Wherein, the layout of the test pattern meets function representation
Formula：dij=f ' (F, hij, EFL).
4. test mark version as claimed in claim 3 three-dimensional, wherein set the dimensional parameters of the test pattern as L, any one
The dimensional parameters of the test pattern are Lij, the parameter tolerance of the three-dimensional test mark version is t ', and medium refraction index parameter is n ',
It is s ' that software, which calculates permitted disc of confusion parameter, sets the test visual field permissible range parameter of the photographic device as △ F；Its
In, the size of the test pattern meets function expression：Lij=f " (dij, △ F, t ', n ', s ').
5. the three-dimensional test mark version as described in any in Claims 1-4, wherein the shape of the test pattern be selected from it is rectangular,
The combination of triangle, circle, ellipse, cross hairs, black and white line to one or more of, star.
6. the three-dimensional test mark version as described in any in Claims 1-4, wherein the three-dimensional test mark version has 2-100 layers
Plate is marked in the test, and each layer test mark plate has the 1-1000 test patterns.
7. the three-dimensional test mark version as described in any in Claims 1-4, wherein the three-dimensional test mark version be selected from transmission-type,
The formation of one of reflective, projection or varifocal imaging formula.
8. the three-dimensional test mark version as described in any in Claims 1-4, wherein the three-dimensional test mark version further includes at least one
Load-carrying unit, the load-carrying unit are overlapped and are positioned apart from；Wherein, the load-carrying unit is respectively formed the test mark version
Layer, the test pattern are selectively arranged or are formed in the test mark plate.
9. three-dimensional test mark version as claimed in claim 8, wherein the load-carrying unit is made of clear material.
10. a kind of three-dimensional test marks version, which is characterized in that the three-dimensional test mark version is with along depth direction arrangement and not
The multi-layer testing pattern of overlapping, test pattern described in adjacent two layers are arranged apart from one another by ground, to form the three-dimensional test mark
Version；Wherein the three-dimensional test mark version further includes an at least load-carrying unit, and the load-carrying unit is overlapped and is positioned apart from；Wherein
The load-carrying unit is respectively formed a test mark plate, and the test pattern is located at test mark plate；It wherein sets to be measured
The rear burnt fitting precision parameter for trying a photographic device is a, and focal length parameter is EFL, sets the position ginseng of the three-dimensional test mark version
Number is h, and the location parameter of test mark plate is h described in any layerj, the layer number parameter of the test mark plate is j；Wherein, institute
The position for stating three-dimensional test mark version meets function expression：A=- (EFL* (- hj)/(EFL-hj)-(EFL*(-h)/(EFL-
h)))。
11. test mark version as claimed in claim 10 three-dimensional, wherein the shape of the test pattern be selected from rectangular, triangle,
The combination of circle, ellipse, cross hairs, black and white line to one or more of, star.
12. three-dimensional test mark version as claimed in claim 10, wherein the three-dimensional test mark version has the 2-100 layers of test
Plate is marked, each layer test mark plate has the 1-1000 test patterns.
13. a kind of design method of three-dimensional test mark version, which is characterized in that the method includes the steps：
(A) by counting the parameter of tested photographic device, the position of the three-dimensional test mark version is determined；And
(B) it according to the required precision of the photographic device, determines the number of plies of the test mark plate of the three-dimensional test mark version and sets
Count the layout of the test pattern of the test mark plate；Wherein the three-dimensional test mark version includes along the more of depth direction setting
Plate is marked in a test, and the test mark plate is respectively provided at least one described test pattern, and any one of
The test pattern of the test pattern of test mark plate and other test mark plates is along the depth direction
It is not arranged overlappingly；
It further comprise step wherein in the step (B)：Determine the size of the test pattern；
Wherein in the step (A), the rear burnt fitting precision parameter of a photographic device to be tested is set as a, focal length parameter is
EFL sets the location parameter of the three-dimensional test mark version as h, and the location parameter of test mark plate is h described in any layerj, described
The layer number parameter of test mark plate is j；Wherein, the position of the three-dimensional test mark version meets function expression：A=- (EFL* (-
hj)/(EFL-hj)-(EFL*(-h)/(EFL-h)))；
Wherein, according to the value for the h being calculated, the position of the three-dimensional test mark version is determined.
14. design method as claimed in claim 13, wherein setting the layer of the test mark plate in the step (A)
Number parameter is n, sets the tolerance parameter of the photographic device as t, mobile step number parameter is s；Wherein, plate is marked in the test
The number of plies meets function expression：N=f (t, a, s)；And
The layout parameter of the test pattern is set as d, any test pattern of test mark plate described in any layer arrives this
The centre distance of the layer test mark plate is dij, wherein further setting the test pattern on this layer of test mark plate
Location parameter be i, this layer it is described test mark plate layer number parameter be j, set the test visual field parameter of the photographic device
For F；Wherein, the layout of the test pattern meets function expression：dij=f ' (F, hij, EFL)；
Wherein, according to the n and d being calculatedijValue, determine it is described test mark plate the number of plies and the test pattern cloth
Office.
15. design method as claimed in claim 14, wherein set the dimensional parameters of the test pattern as L, any one institute
The dimensional parameters for stating test pattern are Lij, the parameter tolerance of the three-dimensional test mark version is t ', and medium refraction index parameter is n ', soft
It is s ' that part, which calculates permitted disc of confusion parameter, sets the test visual field permissible range parameter of the photographic device as △ F；Its
In, the size of the test pattern meets function expression：Lij=f " (dij, △ F, t ', n ', s ')；
Wherein, according to the L being calculatedijValue, determine the size of the test pattern.
16. design method as claimed in claim 15, wherein the shape of the test pattern be selected from rectangular, triangle, circle,
The combination of ellipse, cross hairs, black and white line to one or more of, star.
17. a kind of forming method of three-dimensional test mark version, which is characterized in that the method includes the steps：
(a) determine that in a test mark plate, an at least test pattern is respectively set in the predeterminable area in an at least predeterminable area；
And
(b) multiple test mark plates are superimposedly arranged, and make the test pattern for testing mark plate and its
The test pattern dislocation ground arrangement of his the test mark plate, to form the three-dimensional test mark version, and the solid
The survey of the test pattern of any one of test mark plate of test mark version and other test mark plates
Attempt case and is not overlapped along depth direction；
The rear burnt fitting precision parameter of a photographic device to be tested is wherein set as a, focal length parameter is EFL, sets the solid
The location parameter of test mark version is h, and the location parameter of test mark plate is h described in any layerj, the number of plies of the test mark plate
Parameter is j；Wherein, the position of the three-dimensional test mark version meets function expression：A=- (EFL* (- hj)/(EFL-hj)-
(EFL*(-h)/(EFL-h)))。
18. method as claimed in claim 17, wherein successively being marked by the test in the step (b) by light
Plate radiation, to enhance the contrast of the test pattern with this layer of test mark plate.
19. a light source is set to the upper of the three-dimensional test mark version in the above-mentioned methods by method as claimed in claim 18
Portion, so that the light that the light source generates successively is radiated by test mark plate from the top down.
20. an at least light source is set to the three-dimensional test mark version in the above-mentioned methods by method as claimed in claim 18
Lower part so that the light source generate light successively by the test mark plate radiate from bottom to top.
21. the method as described in any in claim 18 to 20, wherein being uniform light by the light of the test mark plate
Line.
22. a kind of forming method of three-dimensional test mark version, which is characterized in that the method includes the steps：One projection source is arranged
In the light radiation path of a light source, wherein the projection source is able in a pre-set space when the light source generates light
Nonoverlapping multi-layer testing pattern is formed along depth direction, and test pattern described in adjacent two layers is arranged apart from one another by ground,
To form the three-dimensional test mark version；
The rear burnt fitting precision parameter of a photographic device to be tested is wherein set as a, focal length parameter is EFL, sets the solid
The location parameter of test mark version is h, and the location parameter of test pattern described in any layer is hj, the number of plies ginseng of the test mark plate
Number is j；Wherein, the position of the three-dimensional test mark version meets function expression：A=- (EFL* (- hj)/(EFL-hj)-(EFL*
(-h)/(EFL-h)))。
23. forming method as claimed in claim 22, wherein the projection source is set to the light source and the pre-set space
Between.
24. forming method as claimed in claim 22, wherein the projection source includes a plane mark version and a zoom lens
Group, wherein the plane mark version is set between the light source and the variable focus lens package, so that the light that the light source generates
Line is able to the information of the plane mark version being radiated to the pre-set space through the variable focus lens package.
25. forming method as claimed in claim 24, wherein the plane mark version also has an at least test target, wherein institute
It states test target to be able to project by the variable focus lens package to the pre-set space, to form the test pattern.
26. forming method as claimed in claim 22, wherein the shape of the test pattern be selected from rectangular, triangle, circle,
The combination of ellipse, cross hairs, black and white line to one or more of, star.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2015/091014 WO2016050195A1 (en) | 2014-09-30 | 2015-09-29 | Light box, stereo test chart, and adjustment device and application thereof |
| US14/872,014 US10432927B2 (en) | 2014-09-30 | 2015-09-30 | 3D test chart, adjusting arrangement, forming method and adjusting method thereof |
| US16/536,290 US10917635B2 (en) | 2014-09-30 | 2019-08-08 | 3D test chart, adjusting arrangement, forming method and adjusting method thereof |
| US17/129,754 US11575883B2 (en) | 2014-09-30 | 2020-12-21 | 3D test chart, adjusting arrangement, forming method and adjusting method thereof |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2014105242789 | 2014-09-30 | ||
| CN201410524278 | 2014-09-30 |
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| CN105791811A CN105791811A (en) | 2016-07-20 |
| CN105791811B true CN105791811B (en) | 2018-11-27 |
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| CN201410781236.3A Active CN105763869B (en) | 2014-09-30 | 2014-12-16 | Test, method of adjustment and the adjusting apparatus of photographic device |
| CN201410781368.6A Active CN105763870B (en) | 2014-09-30 | 2014-12-16 | A kind of cross DNA mitochondrial DNA test mark version and forming method thereof |
| CN201410783740.7A Active CN105791811B (en) | 2014-09-30 | 2014-12-16 | A kind of three-dimensional test mark version and its design and forming method |
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| CN201410781236.3A Active CN105763869B (en) | 2014-09-30 | 2014-12-16 | Test, method of adjustment and the adjusting apparatus of photographic device |
| CN201410781368.6A Active CN105763870B (en) | 2014-09-30 | 2014-12-16 | A kind of cross DNA mitochondrial DNA test mark version and forming method thereof |
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| CN107656419B (en) * | 2016-07-26 | 2023-06-23 | 宁波舜宇光电信息有限公司 | Depth correction test equipment and test method thereof |
| WO2018021722A1 (en) | 2016-07-29 | 2018-02-01 | 엘지이노텍(주) | Camera module and method for assembling same |
| CN109716748B (en) * | 2016-09-14 | 2022-03-22 | 富士胶片株式会社 | Evaluation system and evaluation method |
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| CN116760974B (en) * | 2023-08-22 | 2024-02-23 | 深圳市灿锐科技有限公司 | Method for automatically evaluating lens definition and depth effect |
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| CN1684502A (en) * | 2004-04-16 | 2005-10-19 | 信统科技股份有限公司 | Detecting method and its device for image sensing module focusing |
| CN1862305A (en) * | 2005-05-13 | 2006-11-15 | 信统科技股份有限公司 | Image sensing module multi-point focusing detecting method and apparatus thereof |
| CN101413843B (en) * | 2007-10-19 | 2011-03-30 | 鸿富锦精密工业（深圳）有限公司 | Method and device for measuring modulation transfer function value |
| CN101458156B (en) * | 2007-12-12 | 2011-03-30 | 鸿富锦精密工业（深圳）有限公司 | Measuring method of modulation transfer function value |
| CN101738305A (en) * | 2008-11-24 | 2010-06-16 | 金大凤 | Detection picture for detection device of camera module |
| CN101957553B (en) * | 2009-07-17 | 2014-02-19 | 鸿富锦精密工业（深圳）有限公司 | Method for measuring modulation transfer function value of measurement lens |
| JP5473493B2 (en) * | 2009-08-31 | 2014-04-16 | キヤノン株式会社 | Imaging apparatus and control method thereof |
| CN203444234U (en) * | 2013-06-29 | 2014-02-19 | 歌尔声学股份有限公司 | Lens testing device |
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| CN105763870B (en) | 2018-01-16 |
| CN105791811A (en) | 2016-07-20 |
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