CN105738295A - Emissivity measuring device based on tri-off-axis parabolic mirrors and double reference black bodies - Google Patents
Emissivity measuring device based on tri-off-axis parabolic mirrors and double reference black bodies Download PDFInfo
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Abstract
The invention discloses an emissivity measuring device based on tri-off-axis parabolic mirrors and double reference black bodies.The emissivity measuring device comprises a spectrograph (1), a high-temperature black body heating device (2), a sample heating device (3), the high-temperature reference black body (4), the low-temperature reference black body (5), a horizontal displacement platform (6), an electronic control rotary table (7), a displacement control system (8), a computer (9), a diaphragm (10), a low-temperature black body heating device (11), the off-axis parabolic mirror I (12), the off-axis parabolic mirror II (13) and the off-axis parabolic mirror III (14).Material normal spectral emissivity is measured within the spectral region of 1-14 micrometers and the temperature range of 50-800 DEG C, influence on measuring results by instrument short-term drifting and environment changes is reduced by means of the device, and measurement efficiency and measurement uncertainty are improved.
Description
Technical field
The present invention relates to material thermal physical property parameter technical field, particularly to a kind of emissivity measurement device based on three off axis paraboloidal mirrors and double; two reference blackbody, it is adaptable to measure metal, non-metal material surface For Normal Spectral Emittance.
Background technology
For Normal Spectral Emittance is one of important thermal physical property parameter of material, characterizes material surface spectral radiant energy radianting capacity.In commercial Application and scientific research, the method for radiation temperature measurement obtains and is widely applied all the more, in order to measure the temperature of material surface accurately, it is necessary to know measured surface emissivity.Additionally, in weapons SoS, one of important indicator evaluating Material-stealth performance is its spectral emissivity characteristic.Material spectrum emissivity is the important foundation physical data of radiation temperature measurement, radiation heat transfer analysis, Material-stealth performance evaluation.But, the factors complexity such as spectral emissivity and the component of material, temperature, wave-length coverage, apparent condition is relevant, and for specific practical measuring examples, the correlation spectrum emissivity data in existing document can not fully meet application demand.
The Correlative measurement method of For Normal Spectral Emittance of Materials has been carried out many research work by the scholar being engaged in thermal measurement science both at home and abroad.Difference according to test philosophy, emissivity measurement method can be divided into calorimetry, bounce technique, energy method etc..Wherein fourier spectrometer method is adopted to carry out the research work of emissivity measurement comparatively typical, such as: 1) 2003, Japan Yajima et al. adopts separation black matrix method to establish the test system that can simultaneously measure full spectral emissivity and optical constant under a set of high temperature, and molybdenum and zirconium oxide sample have been tested when spectral region 2 μm～10 μm, temperature range 900K～1400K；2) 2004, USA National Institute of Standard and Technology (NIST) utilizes a series of blackbody radiation source to establish a kind of new material spectrum emissivity measurement system, measurement temperature range is 600K～1400K, wave-length coverage is 1 μm～20 μm, mainly opaque material is measured.3) 2008, German federal physical technique academy (PTB) develops a kind of emissivity measurement device for industry calibration, this device is to be compared to measure material spectrum emissivity by the radiation of high-quality black matrix Yu sample, it considers environmental radiation and inherently radiates with spectrogrph.Measuring temperature range is 80 DEG C～400 DEG C, and wave-length coverage is 4 μm～40 μm.) 2008 years, China National Measuring Science Research Inst. (NIM) cooperates with University Of Tianjin, have developed the spectral emissivity measurement apparatus based on grating monochromator, utilize this device to can be implemented in 473K～1000K, the measurement of 2 μm～15 μ m interior orientation spectral emissivities.
Current material spectrum emissivity measurement system has a lot, and the spectral emissivity measurement system being based particularly on Fourier spectrometer becomes the mainstream development trend of emissivity measurement.But, current material spectrum emissivity measurement system mostly measures inefficiency, and is affected relatively big by environmental change and instrument short term drift, and therefore actual measurement effect is unsatisfactory.For problem above, invent a kind of emissivity measurement device based on three off axis paraboloidal mirrors and double; two reference blackbody, there is certain practical significance.
Summary of the invention
The purpose of the present invention is to propose to a kind of emissivity measurement device based on three off axis paraboloidal mirrors and double; two reference blackbodies, it is achieved 1～14 μm of spectral region, 50～800 DEG C of temperature ranges For Normal Spectral Emittance of Materials measure.
The present invention is achieved by the following technical solutions.
A kind of emissivity measurement device based on three off axis paraboloidal mirrors and double; two reference blackbody that the present invention proposes, including: spectrogrph, high temperature blackbody heater, sample heating device, high temperature reference blackbody, low temperature reference blackbody, horizontal displacement platform, automatically controlled turntable, displacement control system, computer, diaphragm, low temperature black matrix heater, off-axis cut open object plane mirror I, off-axis cuts open object plane mirror II and off-axis cuts open object plane mirror III.
The optical signal received is changed into the signal of telecommunication by described spectrogrph, and is sent to computer.Described spectrogrph is Fourier transform infrared spectrometer.
Described high temperature blackbody heater is fixedly mounted on horizontal displacement platform, and its internally installed high temperature reference blackbody, high temperature reference blackbody is used for providing high temperature reference signal.The temperature range of high temperature blackbody heater is 50 DEG C～800 DEG C.
Described sample heating device is fixedly mounted on horizontal displacement platform, its internally installed testing sample.The temperature range of described sample heating device is 50 DEG C～800 DEG C.
Described horizontal displacement platform is fixing in the horizontal plane, and its function is to move horizontally under the control of displacement control system.
Described automatically controlled turntable is fixing in the horizontal plane, the axis of automatically controlled turntable and plane-parallel；Automatically controlled turntable is installed off-axis and cuts open object plane mirror I；Automatically controlled turntable cuts open object plane mirror I offer for off-axis and moves horizontally, vertically moves and spinfunction.
Off-axis is cutd open object plane mirror I and the optical signal received reflexes to off-axis is cutd open object plane mirror II；Off-axis cuts open the reflection light of object plane mirror II after diaphragm, arrives off-axis and cuts open object plane mirror III.Off-axis is cutd open object plane mirror III and the optical signal received is reflexed to spectrogrph.Described diaphragm is placed on off-axis and cuts open object plane mirror II and off-axis is cutd open between object plane mirror III, plays restriction visual field and eliminates the effect of veiling glare.
Described off-axis cuts open object plane mirror I, off-axis cuts open object plane mirror II and off-axis is cutd open object plane mirror III and is 90 ° of off axis paraboloidal mirrors.
Described low temperature black matrix heater is fixing in the horizontal plane, and the axisymmetrical that low temperature black matrix heater and high temperature blackbody heater are relative to automatically controlled turntable.Its internally installed low temperature reference blackbody of low temperature black matrix heater, low temperature reference blackbody is used for providing low temperature reference signal.The temperature range of described low temperature black matrix heater is 50 DEG C～800 DEG C.
Described computer is connected with spectrogrph and displacement control system respectively；The effect of computer is: 1. receives spectrogrph and sends the signal of telecommunication of coming, calculates the spectral emissivity of testing sample.2. displacement control signal is provided to displacement control system.
Described displacement control system is connected with computer, horizontal displacement platform and automatically controlled turntable respectively.Displacement control system receives computer and sends the displacement control signal of coming, and controls horizontal displacement platform and the motion of automatically controlled turntable.
The work process of described emissivity measurement device is:
Step 1: described emissivity measurement device is started shooting and preheated.
Step 2: testing sample is arranged in sample heating device；Computer controls horizontal displacement platform and automatically controlled turntable displacement by displacement control system, makes off-axis cut open object plane mirror I and is directed at testing sample.The wavelength receiving signal of spectrogrph is set, represents by sign of lambda, λ ∈ [1,14], unit: μm；
Step 3: testing sample is heated to Ts, Ts∈ [50,800], unit: DEG C.After temperature stabilization, spectrometer measurement obtains testing sample at TsMeasured value at temperature, and send it to computer.
Step 4: computer controls horizontal displacement platform and automatically controlled turntable displacement by displacement control system, makes off-axis cut open object plane mirror I and is directed at high temperature reference blackbody.
Step 5: high temperature reference blackbody is heated to T2, T2∈ [50,800], unit: DEG C.After temperature stabilization, spectrometer measurement obtains high temperature reference blackbody at T2Measured value at temperature, and send it to computer.
Step 6: computer controls automatically controlled turntable by displacement control system and rotates and the motion in horizontally and vertically direction, makes axle cut open object plane mirror I and is directed at low temperature reference blackbody.
Step 7: low temperature reference blackbody is heated to T1, T1∈ [50,800], unit: DEG C；And T1<T2.After temperature stabilization, spectrogrph obtains low temperature reference blackbody at T1Measured value at temperature, and send it to computer.
Step 8: computer according to the testing sample received at TsMeasured value at temperature, high temperature reference blackbody are at T2Measured value at temperature and low temperature reference blackbody are at T1Measured value at temperature, calculates the spectral emissivity obtaining testing sample.
Described computer calculates the method for the spectral emissivity obtaining testing sample:
Step 8.1: opening relationships formula, such as formula (1).
Wherein, λ is wavelength, λ ∈ [1,14], unit: μm；T1For low temperature reference blackbody temperature；T2For high temperature reference blackbody temperature；Lb(λ, T1) for low temperature reference blackbody at T1Spectral radiance at temperature, for known quantity；Lb(λ, T2) for high temperature reference blackbody at T2Spectral radiance at temperature, for known quantity；Vb(λ, T1) the low temperature reference blackbody that receives for computer is at T1Measured value at temperature；Vb(λ, T2) the high temperature reference blackbody that receives for computer is at T2Measured value at temperature；The spectral response functions that R (λ) is spectrogrph；S (λ) is spectrogrph background function.
Step 8.2: by solution formula (1) described equation, calculates and obtains spectral response functions R (λ) and spectrogrph background function S (λ).
Step 8.3: calculated by formula (2) and obtain testing sample at TsSpectral radiance at temperature.
Vs(λ, Ts)=R (λ) Ls(λ, Ts)+S(λ)(2)
Wherein, TsFor testing sample temperature；Vs(λ, Ts) testing sample that receives for computer is at TsMeasured value at temperature；Ls(λ, Ts) for testing sample at TsSpectral radiance at temperature.
Step 8.4: calculated the spectral emissivity obtaining testing sample by formula (3).
Ls(λ, Ts)=εsLb(λ, Ts)+(1-εs) L (λ, Te)(3)
Wherein, Ls(λ, Ts) for testing sample at temperature TsTime spectral radiance；Lb(λ, Ts) for general black matrix at temperature TsTime spectral radiance, for known quantity；TeFor ambient temperature, Te∈ [-60,60], unit: DEG C；L (λ, Te) for ambient light spectrum radiance, for known quantity.
Beneficial effect
A kind of emissivity measurement device based on three off axis paraboloidal mirrors and double; two reference blackbody that the present invention proposes compared with the prior art relatively, has the advantage that
1) double; two reference blackbody is adopted can to realize the synchro measure of the black matrix under different temperatures, effectively eliminate the short term drift impact on emissivity measurement of system, thus reducing the change meeting avoiding the factors such as the environmental radiation impact on measurement result accuracy, improve the uncertainty of measurement；
2) by the application of accurate off-axis parabolic mirror, the spherical aberration existed in spherical optics system is eliminated, at the overall picture element simultaneously effective improving optical system promoting emittance intensity；
3) the three off axis paraboloid mirror mirror systems adopted can produce an intermediate image plane determined in the optical path, and this just brings great convenience to limit the optical property Optimum Operation such as system visual field or elimination stray radiation by arranging aperture diaphragm for the later stage.
4) achieving spectral region 1 μm～14 μm, the measurement of the For Normal Spectral Emittance that temperature range is 50 DEG C～800 DEG C, system is applicable to the various material spectrum emissivity measurements such as metal, nonmetal, conductor, non-conductor.
Accompanying drawing explanation
Fig. 1 is the structural representation in the specific embodiment of the invention based on three off axis paraboloidal mirrors and the emissivity measurement device of double; two reference blackbody；
Wherein, 1-spectrogrph 2-high temperature blackbody heater, 3-sample heating device, 4-high temperature reference blackbody, 5-low temperature reference blackbody, 6-horizontal displacement platform, the automatically controlled turntable of 7-, 8-displacement control system, 9-computer, 10-diaphragm, 11-low temperature black matrix heater, 12-off-axis cuts open object plane mirror I, 13-off-axis is cutd open object plane mirror II, 14-off-axis and cutd open object plane mirror III, 15-testing sample.
Detailed description of the invention
Below in conjunction with drawings and Examples, the present invention will be further described.
The emissivity measurement device based on three off axis paraboloidal mirrors and double; two reference blackbody in the present embodiment, as it is shown in figure 1, include: spectrogrph 1, high temperature blackbody heater 2, sample heating device 3, high temperature reference blackbody 4, low temperature reference blackbody 5, horizontal displacement platform 6, automatically controlled turntable 7, displacement control system 8, computer 9, diaphragm 10, low temperature black matrix heater 11, off-axis cut open object plane mirror I 12, off-axis cuts open object plane mirror II13 and off-axis cuts open object plane mirror III14.
The optical signal received is changed into the signal of telecommunication by spectrogrph 1, and is sent to computer 9.Spectrogrph 1 is Fourier transform infrared spectrometer.
High temperature blackbody heater 2 is fixedly mounted on horizontal displacement platform 6, and its internally installed high temperature reference blackbody 4, high temperature reference blackbody 4 is used for providing high temperature reference signal.The temperature range of high temperature blackbody heater 2 is 50 DEG C～800 DEG C.
Sample heating device 3 is fixedly mounted on horizontal displacement platform 6, its internally installed testing sample 15.The temperature range of sample heating device 3 is 50 DEG C～800 DEG C.
Horizontal displacement platform 6 is fixing in the horizontal plane, and its function is to move horizontally under the control of displacement control system 8.
Automatically controlled turntable 7 is fixing in the horizontal plane, the axis of automatically controlled turntable 7 and plane-parallel；Automatically controlled turntable 7 is installed off-axis and cuts open object plane mirror I 12；Automatically controlled turntable 7 cuts open object plane mirror I 12 offer for off-axis and moves horizontally, vertically moves and spinfunction.
Off-axis cuts open object plane mirror II13 and off-axis, and to cut open object plane mirror I 12 coaxial；Off-axis is cutd open object plane mirror I 12 and the optical signal received reflexes to off-axis is cutd open object plane mirror II13；Off-axis cuts open the reflection light of object plane mirror II13 after diaphragm 10, arrives off-axis and cuts open object plane mirror III14.Off-axis is cutd open object plane mirror III14 and the optical signal received is reflexed to spectrogrph 1.Diaphragm 10 is placed on off-axis and cuts open object plane mirror II13 and off-axis is cutd open between object plane mirror III14, plays restriction visual field and eliminates the effect of veiling glare.
Off-axis cuts open object plane mirror I 12, off-axis cuts open object plane mirror II13 and off-axis is cutd open object plane mirror III14 and is 90 ° of off axis paraboloidal mirrors.
Low temperature black matrix heater 11 is fixing in the horizontal plane, and the axisymmetrical that low temperature black matrix heater 11 and high temperature blackbody heater 2 are relative to automatically controlled turntable 7.Its internally installed low temperature reference blackbody 5 of low temperature black matrix heater 11, low temperature reference blackbody 5 is used for providing low temperature reference signal.The temperature range of low temperature black matrix heater 11 is 50 DEG C～800 DEG C.
Computer 9 is connected with spectrogrph 1 and displacement control system 8 respectively；The effect of computer 9 is: 1. receives spectrogrph 1 and sends the signal of telecommunication of coming, calculates the spectral emissivity of testing sample 15.There is provided displacement control signal 2. to displacement control system 8.
Displacement control system 8 is connected with computer 9, horizontal displacement platform 6 and automatically controlled turntable 7 respectively.Displacement control system 8 receives computer 9 and sends the displacement control signal of coming, and controls horizontal displacement platform 6 and automatically controlled turntable 7 moves.
The work process of emissivity measurement device is:
Step 1: emissivity measurement device is started shooting and preheats.
Step 2: testing sample 15 is arranged in sample heating device 3；Computer 9 controls horizontal displacement platform 6 and automatically controlled turntable 7 displacement by displacement control system 8, makes off-axis cut open object plane mirror I 12 and is directed at testing sample 15.The wavelength receiving signal of spectrogrph 1 is set, represents by sign of lambda, λ ∈ [1,14], unit: μm；
Step 3: testing sample 15 is heated to Ts, Ts∈ [50,800], unit: DEG C.After temperature stabilization, spectrogrph 1 is measured and is obtained testing sample 15 at TsMeasured value at temperature, and send it to computer 9.
Step 4: computer 9 controls horizontal displacement platform 6 and automatically controlled turntable 7 displacement by displacement control system 8, makes off-axis cut open object plane mirror I 12 and is directed at high temperature reference blackbody 4.
Step 5: high temperature reference blackbody 4 is heated to T2, T2∈ [50,800], unit: DEG C.After temperature stabilization, spectrogrph 1 is measured and is obtained high temperature reference blackbody 4 at T2Measured value at temperature, and send it to computer 9.
Step 6: computer 9 controls automatically controlled turntable 7 by displacement control system 8 and rotates and the motion in horizontally and vertically direction, makes axle cut open object plane mirror I 12 and is directed at low temperature reference blackbody 5.
Step 7: low temperature reference blackbody 5 is heated to T1, T1∈ [50,800], unit: DEG C；And T1<T2.After temperature stabilization, spectrogrph 1 obtains low temperature reference blackbody 5 at T1Measured value at temperature, and send it to computer 9.
Step 8: computer 9 according to the testing sample 15 received at TsMeasured value at temperature, high temperature reference blackbody 4 are at T2Measured value at temperature and low temperature reference blackbody 5 are at T1Measured value at temperature, calculates the spectral emissivity obtaining testing sample 15, particularly as follows:
Step 8.1: opening relationships formula, such as formula (1).
Wherein, λ is wavelength, λ ∈ [1,14], unit: μm；T1For low temperature reference blackbody temperature；T2For high temperature reference blackbody temperature；Lb(λ, T1) for low temperature reference blackbody 5 at T1Spectral radiance at temperature, for known quantity；Lb(λ, T2) for high temperature reference blackbody 4 at T2Spectral radiance at temperature, for known quantity；Vb(λ, T1) the low temperature reference blackbody 5 that receives for computer 9 is at T1Measured value at temperature；Vb(λ, T2) the high temperature reference blackbody 4 that receives for computer 9 is at T2Measured value at temperature；The spectral response functions that R (λ) is spectrogrph 1；S (λ) is spectrogrph background function.
Step 8.2: by solution formula 1 equation, calculates and obtains spectral response functions R (λ) and spectrogrph background function S (λ).
Step 8.3: calculated by formula (2) and obtain testing sample 15 at TsSpectral radiance at temperature.
Vs(λ, Ts)=R (λ) Ls(λ, Ts)+S(λ)(2)
Wherein, TsFor testing sample temperature；Vs(λ, Ts) testing sample 15 that receives for computer 9 is at TsMeasured value at temperature；Ls(λ, Ts) for testing sample 15 at TsSpectral radiance at temperature.
Step 8.4: calculated the spectral emissivity obtaining testing sample 15 by formula (3).
Ls(λ, Ts)=εsLb(λ, Ts)+(1-εs) L (λ, Te)(3)
Wherein, Ls(λ, Ts) for testing sample 15 at temperature TsTime spectral radiance；Lb(λ, Ts) for general black matrix at temperature TsTime spectral radiance, for known quantity；TeFor ambient temperature, Te∈ [-60,60], unit: DEG C；L (λ, Te) for ambient light spectrum radiance, for known quantity.
The above is presently preferred embodiments of the present invention, and the present invention should not be limited to this embodiment and accompanying drawing disclosure of that.Every without departing from the equivalence completed under spirit disclosed in this invention or amendment, both fall within the scope of protection of the invention.
Claims (5)
1. the emissivity measurement device based on three off axis paraboloidal mirrors and double, two reference blackbody, it is characterized in that: comprising: spectrogrph (1), high temperature blackbody heater (2), sample heating device (3), high temperature reference blackbody (4), low temperature reference blackbody (5), horizontal displacement platform (6), automatically controlled turntable (7), displacement control system (8), computer (9), diaphragm (10), low temperature black matrix heater (11), off-axis cuts open object plane mirror I (12), off-axis cuts open object plane mirror II (13) and off-axis cuts open object plane mirror III (14)；
The optical signal received is changed into the signal of telecommunication by described spectrogrph (1), and is sent to computer (9)；Described spectrogrph (1) is Fourier transform infrared spectrometer；
Described high temperature blackbody heater (2) is fixedly mounted on horizontal displacement platform (6), and its internally installed high temperature reference blackbody (4), high temperature reference blackbody (4) is used for providing high temperature reference signal；The temperature range of described high temperature blackbody heater (2) is 50 DEG C～800 DEG C；
Described sample heating device (3) is fixedly mounted on horizontal displacement platform (6), its internally installed testing sample (15)；The temperature range of described sample heating device (3) is 50 DEG C～800 DEG C；
Described horizontal displacement platform (6) is fixing in the horizontal plane, and its function is to move horizontally under the control of displacement control system (8)；
Described automatically controlled turntable (7) is fixing in the horizontal plane, the axis of automatically controlled turntable (7) and plane-parallel；The upper off-axis of installing of automatically controlled turntable (7) cuts open object plane mirror I (12)；Automatically controlled turntable (7) cuts open object plane mirror I (12) offer for off-axis and moves horizontally, vertically moves and spinfunction；
Off-axis is cutd open object plane mirror I (12) and the optical signal received reflexes to off-axis is cutd open object plane mirror II (13)；Off-axis cuts open the reflection light of object plane mirror II (13) after diaphragm (10), arrives off-axis and cuts open object plane mirror III (14)；Off-axis is cutd open object plane mirror III (14) and the optical signal received is reflexed to spectrogrph (1)；Described diaphragm (10) is placed on off-axis and cuts open object plane mirror II (13) and off-axis is cutd open between object plane mirror III (14), plays restriction visual field and eliminates the effect of veiling glare；
Described low temperature black matrix heater (11) is fixing in the horizontal plane, and the axisymmetrical that low temperature black matrix heater (11) and high temperature blackbody heater (2) are relative to automatically controlled turntable (7)；Its internally installed low temperature reference blackbody (5) of low temperature black matrix heater (11), low temperature reference blackbody (5) is used for providing low temperature reference signal；The temperature range of described low temperature black matrix heater (11) is 50 DEG C～800 DEG C；
Described computer (9) is connected with spectrogrph (1) and displacement control system (8) respectively；The effect of computer (9) is: 1. receives spectrogrph (1) and sends the signal of telecommunication of coming, calculates the spectral emissivity of testing sample (15)；There is provided displacement control signal 2. to displacement control system (8)；
Described displacement control system (8) is connected with computer (9), horizontal displacement platform (6) and automatically controlled turntable (7) respectively；Displacement control system (8) receives computer (9) and sends the displacement control signal of coming, and controls horizontal displacement platform (6) and automatically controlled turntable (7) motion.
2. a kind of emissivity measurement device based on three off axis paraboloidal mirrors and double; two reference blackbodies as claimed in claim 1, it is characterised in that: described spectrogrph (1) is Fourier transform infrared spectrometer.
3. a kind of emissivity measurement device based on three off axis paraboloidal mirrors and double; two reference blackbodies as claimed in claim 1 or 2, it is characterised in that: described off-axis cuts open object plane mirror I (12), off-axis cuts open object plane mirror II (13) and off-axis is cutd open object plane mirror III (14) and is 90 ° of off axis paraboloidal mirrors.
4. a kind of emissivity measurement device based on three off axis paraboloidal mirrors and double; two reference blackbodies as claimed in claim 1 or 2, it is characterised in that: the work process of described emissivity measurement device is:
Step 1: described emissivity measurement device is started shooting and preheated；
Step 2: testing sample (15) is arranged in sample heating device (3)；Computer (9) controls horizontal displacement platform (6) and automatically controlled turntable (7) displacement by displacement control system (8), makes off-axis cut open object plane mirror I (12) and is directed at testing sample (15)；The wavelength receiving signal of spectrogrph (1) is set, represents by sign of lambda, λ ∈ [1,14], unit: μm；
Step 3: testing sample (15) is heated to Ts, Ts∈ [50,800], unit: DEG C；After temperature stabilization, spectrogrph (1) is measured and is obtained testing sample (15) at TsMeasured value at temperature, and send it to computer (9)；
Step 4: computer (9) controls horizontal displacement platform (6) and automatically controlled turntable (7) displacement by displacement control system (8), makes off-axis cut open object plane mirror I (12) and is directed at high temperature reference blackbody (4)；
Step 5: high temperature reference blackbody (4) is heated to T2, T2∈ [50,800], unit: DEG C；After temperature stabilization, spectrogrph (1) is measured and is obtained high temperature reference blackbody (4) at T2Measured value at temperature, and send it to computer (9)；
Step 6: computer (9) controls automatically controlled turntable (7) by displacement control system (8) and rotates and the motion in horizontally and vertically direction, makes axle cut open object plane mirror I (12) and is directed at low temperature reference blackbody (5)；
Step 7: low temperature reference blackbody (5) is heated to T1, T1∈ [50,800], unit: DEG C；And T1<T2；After temperature stabilization, spectrogrph (1) obtains low temperature reference blackbody (5) at T1Measured value at temperature, and send it to computer (9)；
Step 8: the testing sample (15) that computer (9) basis receives is at TsMeasured value at temperature, high temperature reference blackbody (4) are at T2Measured value at temperature and low temperature reference blackbody (5) are at T1Measured value at temperature, calculates the spectral emissivity obtaining testing sample (15).
5. a kind of emissivity measurement device based on three off axis paraboloidal mirrors and double; two reference blackbodies as claimed in claim 4, it is characterised in that:
Described computer (9) calculates the method for the spectral emissivity obtaining testing sample (15):
Step 8.1: opening relationships formula, such as formula (1)；
Wherein, λ is wavelength, λ ∈ [1,14], unit: μm；T1For low temperature reference blackbody temperature；T2For high temperature reference blackbody temperature；Lb(λ, T1) for low temperature reference blackbody (5) at T1Spectral radiance at temperature, for known quantity；Lb(λ, T2) for high temperature reference blackbody (4) at T2Spectral radiance at temperature, for known quantity；Vb(λ, T1) the low temperature reference blackbody (5) that receives for computer (9) is at T1Measured value at temperature；Vb(λ, T2) the high temperature reference blackbody (4) that receives for computer (9) is at T2Measured value at temperature；The spectral response functions that R (λ) is spectrogrph (1)；S (λ) is spectrogrph background function；
Step 8.2: by solution formula (1) described equation, calculates and obtains spectral response functions R (λ) and spectrogrph background function S (λ)；
Step 8.3: calculated by formula (2) and obtain testing sample (15) at TsSpectral radiance at temperature；
Vs(λ, Ts)=R (λ) Ls(λ, Ts)+S(λ)(2)
Wherein, TsFor testing sample temperature；Vs(λ, Ts) testing sample (15) that receives for computer (9) is at TsMeasured value at temperature；Ls(λ, Ts) for testing sample (15) at TsSpectral radiance at temperature；
Step 8.4: calculated the spectral emissivity obtaining testing sample (15) by formula (3)；
Ls(λ, Ts)=εsLb(λ, Ts)+(1-εs) L (λ, Te)(3)
Wherein, Ls(λ, Ts) for testing sample (15) at temperature TsTime spectral radiance；Lb(λ, Ts) for general black matrix at temperature TsTime spectral radiance, for known quantity；TeFor ambient temperature, Te∈ [-60,60], unit: DEG C；L (λ, Te) for ambient light spectrum radiance, for known quantity.
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| CN106768355B (en) * | 2016-12-02 | 2019-04-19 | 绍兴文理学院 | A kind of solid high-temperature emission characteristics test device |
| CN106768355A (en) * | 2016-12-02 | 2017-05-31 | 绍兴文理学院 | A kind of solid high-temperature emission characteristics test device |
| CN107101994B (en) * | 2016-12-14 | 2019-12-03 | 中国航空工业集团公司北京长城计量测试技术研究所 | A kind of spectral emissivity measuring device of opaque material |
| CN107101994A (en) * | 2016-12-14 | 2017-08-29 | 中国航空工业集团公司北京长城计量测试技术研究所 | A kind of spectral emissivity measurement apparatus of opaque material |
| CN107727247A (en) * | 2017-11-18 | 2018-02-23 | 南京理工大学 | A kind of hot conditions trnaslucent materials spectral emissivity measurement apparatus and method |
| CN107727247B (en) * | 2017-11-18 | 2019-07-12 | 南京理工大学 | A kind of hot conditions trnaslucent materials spectral emissivity measuring device and method |
| CN108490022A (en) * | 2018-02-27 | 2018-09-04 | 航天材料及工艺研究所 | A kind of variable partial pressure of oxygen high ambient temperature heat-radiating properties test device and method |
| CN108490022B (en) * | 2018-02-27 | 2020-06-09 | 航天材料及工艺研究所 | Device and method for testing high-temperature thermal radiation performance in variable oxygen partial pressure environment |
| TWI792561B (en) * | 2019-04-02 | 2023-02-11 | 美商威摩有限責任公司 | Performance metric testing apparatus and method for determining a performance metric of an optical receiver assembly |
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| CN110207829A (en) * | 2019-05-30 | 2019-09-06 | 哈尔滨工业大学 | A kind of measurement method obtaining material temperature and spectrum direction emissivity simultaneously based on infrared spectrometer |
| CN110411576A (en) * | 2019-08-29 | 2019-11-05 | 河南师范大学 | A kind of low temperature spectra emissivity measurement system |
| CN110530524A (en) * | 2019-09-23 | 2019-12-03 | 河南师范大学 | A kind of direction emissivity rapid measurement device based on energy method |
| CN110686872A (en) * | 2019-11-06 | 2020-01-14 | 中国计量科学研究院 | Emissivity measurement method based on blackbody cavity normal-hemisphere reflection distribution ratio |
| CN113686451A (en) * | 2021-07-09 | 2021-11-23 | 中国科学院合肥物质科学研究院 | Spectral emissivity measuring method and system |
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