CN105734497A - Device and method for coating crystal plates through vacuum evaporation - Google Patents
Device and method for coating crystal plates through vacuum evaporation Download PDFInfo
- Publication number
- CN105734497A CN105734497A CN201610296002.9A CN201610296002A CN105734497A CN 105734497 A CN105734497 A CN 105734497A CN 201610296002 A CN201610296002 A CN 201610296002A CN 105734497 A CN105734497 A CN 105734497A
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- Prior art keywords
- vacuum evaporation
- plate
- crystalline substance
- vacuum
- cabinet
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to equipment and a method belonging to the technical field of refrigeration device production and provides a device and a method for coating crystal plates through vacuum evaporation. The device is characterized by comprising a cabinet body, wherein a conveyer is arranged on the cabinet body; the cabinet body is provided with an airtight structure and a vacuum device; a vacuum evaporation device is installed above the conveyer; placing dishes of crystal plates are arranged on the conveyer; a dust collection device and an electrostatic discharge device are also arranged in the cabinet body. The method is characterized by placing the crystal plates below the vacuum evaporation device to be coated with a consumable, namely nickel, palladium or silver, thus forming the semiconductor crystal plates with a coating film. Refrigeration device crystal plate coating films which have the effects of saving the consumable and reducing waste and have good environment friendliness and good binding forces with the crystal plates can be produced by adopting the device.
Description
Technical field
The present invention relates to the equipment of cooling component production technical field and method, specifically vacuum evaporation crystalline substance plate coating apparatus and vacuum evaporation crystalline substance plate film plating process.
Background technology
Cooling component includes crystal grain and porcelain plate, described crystal grain main component is three telluride two bismuths, crystal grain is formed by brilliant plate cutting, by crystal particle welding on porcelain plate before need to be formed one layer of plated film nickel, palladium or silver layer on the surface of crystal grain, in order to crystal grain and porcelain plate combine well.
In prior art, hot spray apparatus is used to be combined in by Coating Materials on brilliant plate, the shortcoming that the amount of making a concerted effort that such device has that Coating Materials (nickel, palladium or silver) waste is serious, environmental-protecting performance is poor, nickel and crystalline substance harden is poor.
The apparatus and method adopting thermal spraying by Coating Materials (nickel, palladium or silver) heat fusing and spray on brilliant plate, it may have the shortcoming that the amount of making a concerted effort that Coating Materials waste is serious, environmental-protecting performance is poor, plated film and crystalline substance harden is poor.
Summary of the invention
The purpose of the present invention is aiming at disadvantages mentioned above, there is provided one to save consumptive material, reduce waste, the feature of environmental protection is good, plated film and crystalline substance harden measured vacuum evaporation crystalline substance plate coating apparatus with joint efforts, also provide for a kind of save consumptive material, reduce that waste, the feature of environmental protection be good, nickel and crystalline substance harden measured vacuum evaporation crystalline substance plate film plating process with joint efforts.
Vacuum evaporation cooling component crystalline substance plate coating apparatus of the present invention is achieved in that: vacuum evaporation crystalline substance plate coating apparatus, it is characterized in that: include cabinet, cabinet has transporter, cabinet has closed structure and vacuum extractor, at transporter vacuum deposition apparatus installed above, described transporter has the holding tray of brilliant plate.
Say further, in cabinet, be additionally provided with dust arrester and static release device.
Vacuum evaporation crystalline substance plate film plating process of the present invention is achieved in that from vacuum evaporation crystalline substance plate film plating process, is placed on by crystalline substance plate inside vacuum deposition apparatus and carries out plated film below, and the consumptive material of plated film is nickel, palladium or silver, it is possible to form the semiconductor crystal plate of one layer of plated film.
Good technical scheme is: cleaned with the hydrochloric acid solution of first 1-2% before brilliant plate vacuum evaporation, directly dries, then carry out vacuum evaporation.
The invention has the beneficial effects as follows: such vacuum evaporation crystalline substance plate coating apparatus can be produced saving consumptive material, reduces waste, the feature of environmental protection is good, plated film and crystalline substance harden measured cooling component crystalline substance plate plated film with joint efforts, the advantage also with the brilliant plate of protection.
Such vacuum evaporation crystalline substance plate film plating process has saving consumptive material, reduces waste, the feature of environmental protection is good, nickel and crystalline substance harden measured advantage with joint efforts; cleaned with the hydrochloric acid solution of first 1-2% before brilliant plate vacuum evaporation; directly dry; carry out vacuum evaporation again; there is coating more firmly advantage, the advantage also with the brilliant plate of protection.
Accompanying drawing explanation
Fig. 1 is the structural representation of vacuum evaporation crystalline substance plate coating apparatus of the present invention.
Wherein: 1, cabinet 2, transporter 3, vacuum extractor 4, vacuum deposition apparatus 5, holding tray 6, dust arrester 7, static release device.
Detailed description of the invention
Below in conjunction with drawings and Examples, the present invention is further illustrated.
As it is shown in figure 1, vacuum evaporation crystalline substance plate coating apparatus, it is characterized in that: include cabinet 1, cabinet has transporter 2, cabinet has closed structure and vacuum extractor 3, at transporter vacuum deposition apparatus 4 installed above, described transporter has the holding tray 5 of brilliant plate.
So brilliant plate just can be placed on holding tray to carry out vacuum evaporation, form coating, and compared with hot spray apparatus, the plated film of generation has saving consumptive material, reduces waste, the feature of environmental protection is good, plated film and crystalline substance harden measured advantage of making a concerted effort.
Say further, in cabinet, be additionally provided with dust arrester 6 and static release device 7.
So before vacuum evaporation, it is possible to brilliant plate is carried out dedusting and to release electrostatic in cabinet, it is ensured that coating better effects if.
Embodiment 1
A, crystalline substance plate is placed through thermal spraying, sprayed on material nickel, form the first brilliant plate, its utilization rate reaches 10%, and being scattering into the nickel in surrounding is 90%, and with such brilliant plate making semiconductor refrigeration member, ability to bear is poor.
Embodiment 2
A, crystalline substance plate is placed through vacuum evaporation, plates material material nickel, form the second brilliant plate, its utilization rate reaches 40%, and being scattering into the nickel in surrounding is 60%, makes semiconductor refrigeration member with such brilliant plate, ability to bear (i.e. the adhesion of crystal grain and porcelain plate) is better, porcelain plate not damaged.
Embodiment 3
A, cleaned with the hydrochloric acid solution of first 1% before brilliant plate evaporation, directly dry, by crystalline substance plate through vacuum evaporation, plate material material nickel, form trimorphism plate, its utilization rate reaches 40%, and being scattering into the nickel in surrounding is 60%, makes semiconductor refrigeration member with such brilliant plate, plated film is more firm, ability to bear (i.e. the adhesion of crystal grain and porcelain plate) is better, and the strength destroying plated film increases by 20%, porcelain plate not damaged.
Embodiment 4
A, cleaned with the hydrochloric acid solution of first 2% before brilliant plate evaporation, directly dry, by crystalline substance plate through vacuum evaporation, plate material material nickel, form the 4th brilliant plate, its utilization rate reaches 40%, being scattering into the nickel in surrounding is 60%, makes semiconductor refrigeration member with such brilliant plate, and ability to bear (i.e. the adhesion of crystal grain and porcelain plate) is better, the strength destroying plated film increases by 23%, porcelain plate not damaged.
Embodiment 5
A, cleaned with the hydrochloric acid solution of first 1.5% before brilliant plate evaporation, directly dry, by crystalline substance plate through vacuum evaporation, plating material material nickel, forms the 4th brilliant plate, and its utilization rate reaches 40%, being scattering into the nickel in surrounding is 60%, making semiconductor refrigeration member with such brilliant plate, ability to bear (i.e. the adhesion of crystal grain and porcelain plate) is best. and the strength destroying plated film increases by 25%, porcelain plate not damaged.
Above-described embodiment 3,4,5 confirms, washs with dilute hydrochloric acid, and it just leaves ion in face, it is possible to make coating connect more firm.
Above-mentioned nickel is changed into silver or palladium, obtains same result, it was demonstrated that vacuum evaporation semiconductor crystal plate is feasible, and the advantage with the adhesion saved between material, minimizing pollution, increase plated film and brilliant plate.
The foregoing is only specific embodiments of the invention, but the architectural feature of the present invention is not limited to this, any those skilled in the art is in the field of the invention, and change or the modification made all are encompassed in the scope of the claims of the present invention.
Claims (4)
1. vacuum evaporation cooling component crystalline substance plate coating apparatus, it is characterized in that: include cabinet having transporter on cabinet, cabinet has closed structure and vacuum extractor, at transporter vacuum deposition apparatus installed above, described transporter has the holding tray of brilliant plate.
2. vacuum evaporation cooling component crystalline substance plate coating apparatus according to claim 1, is characterized in that: be additionally provided with dust arrester and static release device in cabinet.
3. vacuum evaporation crystalline substance plate film plating process, is placed on crystalline substance plate inside vacuum deposition apparatus and carries out plated film below, and the consumptive material of plated film is nickel, palladium or silver, it is possible to form the semiconductor crystal plate of one layer of plated film.
4. vacuum evaporation crystalline substance plate film plating process according to claim 3, is characterized in that: cleaned with the hydrochloric acid solution of first 1-2% before brilliant plate evaporation, directly dries, then carry out vacuum evaporation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610296002.9A CN105734497A (en) | 2016-05-08 | 2016-05-08 | Device and method for coating crystal plates through vacuum evaporation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610296002.9A CN105734497A (en) | 2016-05-08 | 2016-05-08 | Device and method for coating crystal plates through vacuum evaporation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105734497A true CN105734497A (en) | 2016-07-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610296002.9A Pending CN105734497A (en) | 2016-05-08 | 2016-05-08 | Device and method for coating crystal plates through vacuum evaporation |
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| CN (1) | CN105734497A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103956573A (en) * | 2014-05-21 | 2014-07-30 | 湖州泰和汽车零部件有限公司 | Method for manufacturing radar protection hood |
| CN204251689U (en) * | 2014-10-14 | 2015-04-08 | 南京邮电大学 | A kind of vacuum plating unit |
| CN205635761U (en) * | 2016-05-08 | 2016-10-12 | 河南鸿昌电子有限公司 | Brilliant board coating film device of vacuum deposition |
-
2016
- 2016-05-08 CN CN201610296002.9A patent/CN105734497A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103956573A (en) * | 2014-05-21 | 2014-07-30 | 湖州泰和汽车零部件有限公司 | Method for manufacturing radar protection hood |
| CN204251689U (en) * | 2014-10-14 | 2015-04-08 | 南京邮电大学 | A kind of vacuum plating unit |
| CN205635761U (en) * | 2016-05-08 | 2016-10-12 | 河南鸿昌电子有限公司 | Brilliant board coating film device of vacuum deposition |
Non-Patent Citations (1)
| Title |
|---|
| 沈丽等: "共晶二元Sn基焊料与Bi2(Te09Se0.1)3 基热电材料的界面反应", 《金属功能材料》 * |
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| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20160706 |