CN105731544B - A kind of preparation method of the one-dimensional dilute magnetic semiconductor material of Uniform Doped - Google Patents

A kind of preparation method of the one-dimensional dilute magnetic semiconductor material of Uniform Doped Download PDF

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CN105731544B
CN105731544B CN201610053385.7A CN201610053385A CN105731544B CN 105731544 B CN105731544 B CN 105731544B CN 201610053385 A CN201610053385 A CN 201610053385A CN 105731544 B CN105731544 B CN 105731544B
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zinc powder
oxide
powder
tube
passed
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CN105731544A (en
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罗永松
闫海龙
彭涛
陆阳
程晋炳
罗荣杰
候晓艺
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Xinyang Normal University
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    • C01G45/00Compounds of manganese
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    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
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Abstract

The invention discloses a kind of preparation method of the one-dimensional dilute magnetic semiconductor material of Uniform Doped, including following preparation process:Mol ratio is referred to as 9:1~19:1 zinc powder and metal oxide, is put into quartzy bottom of the tube;The rate of heat addition of zinc powder and metal oxide is set respectively, seals tube furnace, and full of quartz ampoule is heated after protective gas, start to be passed through reacting gas after temperature reaches 520 DEG C;Under protective gas protection, with 10 DEG C/min heating rate heated quarty tube to 600~800 DEG C, oxygen is passed through, its flow velocity is 20~40Sccm, until reaction terminates;Finally cool under vacuum atmosphere, to room temperature is cooled to, takes out sample and directly characterized.The present invention realizes the Uniform Doped of the element such as manganese, cobalt in ZnO nano-wire, moreover, not producing dephasign in parent after doping.Method described by patent of the present invention is applied to be doped Multimetal oxide, to zinc oxide, manganese oxide, cobalt oxide etc. and the more Yuans metal oxides such as cobalt acid nickel, mangaic acid nickel.

Description

A kind of preparation method of the one-dimensional dilute magnetic semiconductor material of Uniform Doped
Technical field
The present invention relates to metal oxide nano-material preparing technical field, specifically a kind of one-dimensional dilute magnetic of Uniform Doped half The preparation method of conductor material.
Background technology
Today's society is the society that information is dominated, the processing of information, transmission and the unprecedented scale and speed of memory requirement.Electricity The electric charge attribute and spin attribute of son play important role in information processing and transmission, but people for electron charge with The research of spin attribute is parallel development.The electric charge of dilute magnetic semiconductor set electron and spin, utilize dilute magnetic semiconductor Self-spining device made of nanostructured has the advantages that Stability Analysis of Structures, low in energy consumption, pollution-free, fast response time.Metal-doped oxygen It is the very important research direction in one, dilute magnetic semiconductor material field to change zinc.
The current method for preparing high-quality ZnO dilute magnetic semiconductor mainly has following two:(1) with zinc powder and other metals Compound is raw material, and the ZnO nano-structure of magnesium-yttrium-transition metal doping is prepared using chemical vapour deposition technique;(2) by high-purity Zinc powder and other metal sheetings simultaneously sinter target into, and laser beam focus is made to heated point of the material of target material surface on the surface of target Separate out and, the metal-doped ZnO nano-structure of race is crossed with oxygen reaction generation.In (1) kind method, due in preparation process In employ plurality of raw materials, the molten boiling point of different material is different, is difficult to realize the uniformity of doping.Especially doping concentration is higher When, it is very easy to dephasign occur.In (2) kind method, although the doping of higher concentration can be realized, the sample of preparation Mostly thin-film material, the pattern of nanostructured are not easily controlled very much.
The content of the invention
Goal of the invention:In order to overcome the deficiencies in the prior art, the present invention provides a kind of one-dimensional dilute magnetic of Uniform Doped The preparation method of semi-conducting material.
Technical scheme:In order to solve the above technical problems, a kind of one-dimensional dilute magnetic semiconductor material of Uniform Doped of the present invention Preparation method, including following preparation process:
Step 1:Mol ratio is weighed as 9:1~19:1 zinc powder and metal oxide, is put into quartzy bottom of the tube;
Step 2:The rate of heat addition of zinc powder and metal oxide is set respectively, seals tube furnace, and full of after protective gas Quartz ampoule is heated, starts to be passed through reacting gas after temperature reaches 520 DEG C;
Step 3:Under protective gas protection, with 10 DEG C/min heating rate heated quarty tube to 600~800 DEG C, lead to Enter oxygen, its flow velocity is 20~40Sccm, until reaction terminates;
Step 4:Finally cool under vacuum atmosphere, until being cooled to room temperature, take out sample and directly characterized.
Preferably, the purity of zinc powder is 99.99% in the step 1, and the purity of metal oxide is 99.9%.
Preferably, the mol ratio of zinc powder and metal oxide is 19 in the step 1:1.
Preferably, the mol ratio of zinc powder and metal oxide is 9 in the step 1:1.
Preferably, zinc powder is placed in same root test tube or is respectively put into two test tubes with metal oxide powder.
Preferably, the protection gas in the step 2 is argon gas, and reacting gas is oxygen.
Preferably, zinc powder is respectively put into two quartz ampoules or is put into same stone with metal oxide in the step 1 English bottom of the tube.
Preferably, zinc powder is respectively put into two quartzy bottom of the tube with metal oxide in the step 1, in each quartz ampoule Oral area set silicon base, the carrier as sample grown.
Preferably, the metal oxide is chlorination manganese powder or chlorination cobalt powder or manganese dioxide powder.
Beneficial effect:A kind of preparation method of the one-dimensional dilute magnetic semiconductor material of Uniform Doped of the present invention, is realized in ZnO The Uniform Doped of the element such as manganese, cobalt in nano wire, moreover, not producing dephasign in parent after doping.Side described by patent of the present invention Method is applied to be doped Multimetal oxide.Such as to zinc oxide, manganese oxide, cobalt oxide and cobalt acid nickel, mangaic acid nickel Etc. more Yuans metal oxides.Multi-temperature zone chemical gaseous phase depositing process described in the invention has relatively low manufacture and is produced into This, preparation technology is simple, and parameter is easily controlled, and sample purity and crystallinity are very high, has to the uniformity of dilute magnetic semiconductor doping Large increase, and performance is greatly improved, the well-regulated geometrical morphology of one-dimension zinc oxide based diluted magnetic semiconductor prepared Higher doping concentration, and there is room-temperature ferromagnetic.
Brief description of the drawings
Fig. 1 is the general profile chart of dual temperature area chemical vapor deposition unit;
Fig. 2 is horizontal quartz plate in growth room, the schematic diagram of quartz ampoule modes of emplacement;
The pattern for the additive Mn nano structure of zinc oxide that Fig. 3 is prepared using manganese dioxide as doped raw material single temperature zone method Figure;
The shape appearance figure for the additive Mn nano structure of zinc oxide that Fig. 4 is prepared using manganese chloride as doped raw material single temperature zone method;
Fig. 5 is the shape appearance figure of the additive Mn zinc oxide nano rod prepared using manganese chloride as doped raw material dual temperature area method;
Fig. 6 is the XRD for the additive Mn zinc oxide nano rod that doping concentration is 2.8%;
Fig. 7 is the ESEM shape of the Co-doped ZnO nanometer rods prepared using cobalt chloride as doped raw material dual temperature area method Looks figure.
Embodiment
The present invention is further described with embodiment below in conjunction with the accompanying drawings.
Embodiment 1
(1) mol ratio is weighed as 19 with electronic balance:Zinc powder and purity that 1 purity is 99.99% are the two of 99.9% Manganese powder is aoxidized, the two is uniformly put into the bottom of a quartz ampoule after mixing using agate mortar, as shown in figure 1, by quartz ampoule It is placed on horizontal long quartz glass plate, quartz plate is finally sent to suitable position in horizontal pipe furnace, and with stainless steel method Orchid seals tube furnace;
(2) tube furnace is evacuated using mechanical pump, starts to heat quartz ampoule after 30 minutes, 10 DEG C of heating rate/ min.In heating process, it is passed through argon gas and is set as 100Sccm as protection gas, rate of flow of fluid.
(3) when zinc powder is after being warming up to 520 DEG C, oxygen, flow rate set 30Sccm are passed through.When zinc powder and manganese dioxide powder After reaching 800 DEG C, constant temperature 60min is kept.
(4) cool after end to be heated under vacuum atmosphere, until room temperature, takes out sample and directly characterized.
(5) Fig. 2 is the shape appearance figure of additive Mn nano structure of zinc oxide prepared by single temperature zone method, in figure, quartz plate length Three quartz ampoules can be fixed on quartz plate by 20cm, wide 4cm, the quartz plate, and test tube neck high 8cm, half circular diameter 9cm mix Miscellaneous raw material is manganese dioxide powder.From figure 3, it can be seen that most of additive Mn nano structure of zinc oxide is bar-shaped for the hexagonal of rule Profile, there is the block nanostructured in part to occur at the top of nanometer rods, nanowire diameter 300-500nm.
Embodiment 2
(1) mol ratio is weighed as 9 with electronic balance:The chlorination that the zinc powder and purity that 1 purity is 99.99% are 99.9% Manganese powder, the different quartzy bottom of the tube of length is put it into respectively, is placed on two quartz ampoules on horizontal long quartz plate afterwards, will Silicon base is lain in a horizontal plane at the quartzy mouth of pipe, and quartz plate finally is sent into suitable position in tube furnace, will with steel flange Tube furnace seals.
(2) tube furnace is evacuated using mechanical pump, chlorination manganese powder and zinc powder are warming up to 800 DEG C and 550 after 80min DEG C, oxygen is passed through afterwards, and manganese chloride keeps constant temperature, and zinc powder keeps constant temperature, constant temperature time 30min after reaching 650 DEG C.Adding In thermal process, argon gas is passed through as protection gas, flow rate set 100Sccm.
(3) reaction cools after terminating under vacuum atmosphere, until room temperature, takes out sample and directly characterized.
(4) Fig. 4 is the shape appearance figure of additive Mn nano structure of zinc oxide prepared by dual temperature area method.It can be seen that, received by Fig. 4 The pattern of rice structure is very irregular, most of to be made up of block structure, a diameter of 1-2 μm of nanometer blocks.
Embodiment 3
(1) mol ratio is weighed as 9 with electronic balance:The chlorination that the zinc powder and purity that 1 purity is 99.99% are 99.9% Manganese powder, the different quartzy bottom of the tube of length is put it into respectively.Two quartz ampoules are placed on horizontal long quartz plate afterwards such as Shown in Fig. 2, silicon base is lain in a horizontal plane at the quartzy mouth of pipe.Quartz plate is finally sent to suitable position in tube furnace, with not Rust steel flange seals tube furnace.
(2) tube furnace is evacuated using mechanical pump, chlorination manganese powder and zinc powder are warming up to 800 DEG C respectively after 80min With 550 DEG C, be passed through oxygen afterwards, manganese chloride keeps constant temperature, and zinc powder keeps constant temperature after reaching 650 DEG C, and constant temperature time is 30min.In heating process, argon gas is passed through as protection gas, flow rate set 100Sccm.
(3) reaction cools after terminating under vacuum atmosphere, until room temperature, takes out sample and directly characterized.
(4) Fig. 5 is the shape appearance figure of additive Mn nano structure of zinc oxide prepared by dual temperature area method.By Fig. 5 it can be seen that, it is double Warm area method prepare additive Mn nano structure of zinc oxide by rule the bar-shaped structure composition of hexagonal, nanometer rods it is a diameter of 150-200nm。
(5) Fig. 6 is the XRD for the additive Mn zinc oxide nano rod that doping concentration is 2.8%.Diffraction maximum and hexagonal wurtzite Structure zinc oxide meets very well.And without the diffraction maximum for finding other impurities, illustrate that sample adulteration is very uniform.
Embodiment 4
(1) mol ratio is weighed as 19 with electronic balance:The zinc powder and purity that 1 purity is 99.99% are 99.9% chlorination Cobalt powder, the two is put into the quartzy bottom of the tube of length different length, after guarantee is put into tube furnace, the two is in different warm areas.
(2) tube furnace is evacuated using mechanical pump, chlorination cobalt powder and zinc powder are warming up to 400 DEG C respectively after 60min With 550 DEG C, keep constant temperature after zinc powder reaches 650 DEG C.In heating process, it is passed through argon gas and is set as protection gas, gas flow rate It is set to 100Sccm.
(3) when zinc powder is after being warming up to 550 DEG C, oxygen, flow rate set 30Sccm are passed through.
(4) reaction cools after terminating under vacuum atmosphere, until room temperature, takes out sample and directly characterized.
(5) Fig. 7 is the shape appearance figure of Co-doped ZnO nanostructured prepared by dual temperature area method.By Fig. 7 it can be seen that, cobalt Doping zinc-oxide has fairly regular geometrical morphology, has fraction of particle to occur in nanometer rods, nanometer rods it is a diameter of 150-500nm。
The testing result of the comparative example 1 of embodiment 2 can be seen that the Zinc oxide-base prepared using two-step method from table 1 Dilute magnetic semiconductor material has more regular geometrical morphology, and doping concentration can reach 3% even more high, and doping is first in sample Element is evenly distributed, and dephasign does not occur.And the Zinc oxide based rare magnetic semiconductor material prepared using two-step method all has stronger The intensity of magnetization, Curie temperature is more than room temperature.
The detection device of above example is by X-ray diffractometer (D8/Advance), SEM SEM (Hitachi S4800), superconducting quantum interference device (SQUID) (MPMS-XL7Quantum Design, Inc.) etc. carry out observation analysis.
Table 1 is the comparison of magnetic property of zinc oxide nanowire in different embodiments
Embodiment Actual doping depth Saturation magnetization Curie temperature Coercive field
Actual example 1 0.4% 0.87μB/Mn 313K 43Oe
Actual example 2 3.4% Paramagnetism - -
Embodiment 3 2.8% 0.48μB/Mn 297K 67Oe
Actual example 4 5.6% 0.27μB/Co 304K 52Oe
Described above is only the preferred embodiment of the present invention, it should be pointed out that:For the ordinary skill people of the art For member, under the premise without departing from the principles of the invention, some improvements and modifications can also be made, these improvements and modifications also should It is considered as protection scope of the present invention.

Claims (1)

1. a kind of preparation method of the one-dimensional dilute magnetic semiconductor material of Uniform Doped, it is characterised in that including following preparation process:Step Rapid one:Mol ratio is weighed as 9 with electronic balance:The chlorination manganese powder that the zinc powder and purity that 1 purity is 99.99% are 99.9%, point The different quartzy bottom of the tube of length is not put it into;Two quartz ampoules are placed on horizontal long quartz plate afterwards, by silicon base Lie in a horizontal plane at the quartzy mouth of pipe;Quartz plate is finally sent to suitable position in tube furnace, with steel flange by tube furnace Sealing;
Step 2:Tube furnace is evacuated using mechanical pump, chlorination manganese powder and zinc powder are warming up to 800 DEG C respectively after 80 min With 550 DEG C, be passed through oxygen afterwards, manganese chloride keeps constant temperature, and zinc powder keeps constant temperature, constant temperature time 30 after reaching 650 DEG C min;In heating process, argon gas is passed through as protection gas, flow rate set is 100 sccm;
Step 3:Reaction cools after terminating under vacuum atmosphere, until room temperature, takes out sample and directly characterized.
CN201610053385.7A 2016-01-26 2016-01-26 A kind of preparation method of the one-dimensional dilute magnetic semiconductor material of Uniform Doped Expired - Fee Related CN105731544B (en)

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