CN105510354B - A kind of method of on-line checking multi-way amplification laser system optic element damage - Google Patents
A kind of method of on-line checking multi-way amplification laser system optic element damage Download PDFInfo
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- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
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- G01N21/88—Investigating the presence of flaws or contamination
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Abstract
The present invention relates to a kind of methods of on-line checking multi-way amplification laser system optic element damage, belong to technical field of laser detection, bright field illumination is carried out to inject the prime Repetition Frequency Laser of multi-way amplification laser system, switch the state of spatial filter, near-field image is acquired in laser system output terminal, near-field image under spatial filter different conditions is observed, judge optical element with the presence or absence of damage, according to near-field image situation of change, the offset of difference amplification journey impaired loci and damage dot pattern, determine impaired loci position and size, the present invention is low with equipment cost, it is simple in structure, it is easy to operate, effectively reduce the time of on-line checking, the characteristics of flexibility ratio is high, suitable for the on-line checking of High power multi-pass amplification laser system optic element damage.
Description
Technical field
The invention belongs to technical field of laser detection, relate in particular to a kind of on-line checking multi-way amplification laser system light
The method for learning element damage.
Background technology
In High power multi-pass amplification laser system, when laser intensity reaches sufficiently high magnitude, optical element will be sent out
This phenomenon usually is known as damaging by a series of raw irreversible, catastrophic variations.Laser Induced Damage is a complicated mistake
Journey is influenced by many factors such as the environmental conditions residing for optical element material property, laser parameter, optical element.
The mechanism of damage mainly has three classes：Thermal process, avalanche breakdown process and multiphoton ionization process.Thermal process is originated from material
Expect the absorption to laser energy, for optical element in polishing process, element surface can form polishing sedimentary, polish sedimentary
Impurity can absorb laser energy strongly so that the temperature change of material part is very big, generates thermal stress damage optical element；When sharp
When the electric field strength that light is formed at fault in material is sufficiently high, electronics will be stripped from lattice, and the avalanche breakdown of material is caused to be broken
It is bad；When laser intensity further improves, electronics can be stripped out from lattice, and be instantaneously excited to higher energy
Grade, it will multiphoton ionization phenomenon occur, and then destroy optical element.
For system safety and beam quality, it is necessary to the damage of optical element be detected in time, and take and accordingly arrange
It applies.At present, the optic element damage on-line checking of multi-way amplification laser system passes through figure mostly using light field or dark field imaging technique
As collecting device is imaged different element, to obtain the information such as the position of impaired loci and size.But amplify laser in multi-way
In system, due to the optical element up to tens of that system uses, each element testing is both needed to mobile collection equipment and it is imaged,
Required detection time is long, meanwhile, different optical elements can be located at identical imaging surface, and impaired loci information interferes with each other, influences to damage
The accurate judgement of point position.
Invention content
For various deficiencies of the prior art, to solve the above-mentioned problems, it is proposed that a kind of equipment cost is low, structure is simple
Single, easy to operate, to effectively reduce on-line checking time, flexibility ratio is high, amplifies laser suitable for on-line checking High power multi-pass
The method of system optics damage.
To achieve the above object, the present invention provides following technical solution：
A kind of method of on-line checking multi-way amplification laser system optic element damage carries out light field photograph to laser system
It is bright, switch the state of spatial filter, near-field image is acquired in laser system output terminal, under spatial filter different conditions
Near-field image is observed, and optical element is judged with the presence or absence of damage, according to near-field image situation of change, the offset of impaired loci
With damage dot pattern, impaired loci position and size are determined.
Further, the light source for bright field illumination being carried out to laser system is the prime Repetition Frequency Laser of an injection laser system.
Further, the laser system includes first order amplification light path and second level amplification light path, and described first and second grade puts
Spatial filter one is provided between big light path, is set between the second level amplification light path and the output terminal of laser system free
Between wave filter two.
Further, it is described switching spatial filter state, laser system output terminal acquisition near-field image method be：
(1) spatial filter one is switched to coarse pored state, spatial filter two is switched to macropore state, in laser system
Output terminal acquires near-field image one；
(2) spatial filter one is switched to the poroid state of filtering, spatial filter two is switched to macropore state, in laser system
Output terminal of uniting acquires near-field image two；
(3) spatial filter one is switched to the poroid state of filtering, spatial filter two is switched to the poroid state of filtering, in laser
System output acquires near-field image three.
Further, the acquisition order of the near-field image two, three can be interchanged.
Further, the method observed the near-field image under spatial filter different conditions is：
There is not modulation point on the near-field image one, then there is no damages for the optical element of laser system；It is described near
Occurs modulation point in field picture one, then the optical element of laser system has damage, according to near-field image situation of change, further
Judge impaired loci position.
Further, the method for the further judgement impaired loci position is：
A, there is not modulation point or edge blurry modulation point occurs, and do not have on near-field image three in the near-field image two
There is modulation point, then the impaired loci is located at the optical element of first order amplification light path；
B, there is sharp-edged modulation point in the near-field image two, modulation point or appearance does not occur on near-field image three
Edge blurry modulation point, then at least optical element of second level amplification light path is there are impaired loci, compares the near-field image one, near
Modulation point in field picture two, and be labeled respectively to there is variation and unchanged modulation point；
(1) according to the laser optical path of the multi-way amplification laser system, the clearly impaired loci positioned at second level amplification light path
The distributing position rule of modulation point is generated in different amplification journeys；
(2) the distributing position rule according to step (1) is clearly amplified with corresponding other of unchanged modulation point
The distributing position of modulation point in journey；
(3) if the modulation point that there is variation on near-field image two is respectively positioned on distributing position described in step (2), only the
There are impaired locis for the optical element of two level amplification light path；
(4) if the modulation point that there is variation on near-field image two is not entirely located in the distributing position described in step (2),
There are impaired locis for the optical element of first and second grade of amplification light path.
Further, the corresponding laser facula of light path where the impaired loci is a*b, and the impaired loci is in the inclined of vertical direction
Shifting amount is labeled as Δ y, the offset according to impaired loci, and the method for determining impaired loci position is：
(1) in the near-field image one, corresponding position of the impaired loci in two different amplification journeys is taken, and respectively
Labeled as A points, B points, 2 points of offset pixels d in vertical direction of A, B are read；
(2) unified pixel D of the near-field image one in vertical direction is read；
(3) offset of impaired loci is calculated
(4) Δ y and practical translational movement of the optical element each in laser system in vertical direction are compared, the two numerical value
When identical, the impaired loci is located at the corresponding optical element of the practical translational movement.
Further, the actual size of the impaired loci is m*n, described according to damage dot pattern, determines impaired loci size
Method is：
(1) in the near-field image one, corresponding position of the impaired loci in any amplification journey is taken, and labeled as C
Point determines the barycenter of C points, carries out contour fitting to C points, obtains its sectional view；
(2) in the sectional view obtained by step (1), C points is read in horizontal, vertical direction pixel, are respectively labeled as x, y；
(3) the corresponding laser facula of the light path with reference to where impaired loci is a*b and the unified picture of the near-field image one
Plain A*D calculates the actual size of impaired loci, wherein,
Further, in the sectional view, it is the distance between 10% two point that it is recessed, which to calculate contour line, and the distance is
C points are in horizontal, vertical direction pixel.
The beneficial effects of the invention are as follows：
1st, the present invention do not need to be equipped with additional lighting source, Image Acquisition light path and equipment, effectively reduce equipment into
This, it is simple in structure.
2nd, the present invention by switching the state of amplification system spatial filter, and acquire the near field under different conditions online
Image can carry out automatic processed offline, easy to operate, effectively reduce the time of on-line checking, and flexibility ratio is high.
3rd, the present invention determines that impaired loci is located at which section amplifies light path according to near-field image first, then again to damaging point image
It is handled, determines the specific location of impaired loci, ensured the uniqueness of impaired loci position, effectively shorten detection time.
4th, the present invention is simple and practicable, and the optic element damage especially suitable for High power multi-pass amplification laser system is examined online
It surveys.
5th, the present invention carries out bright field illumination using the prime Repetition Frequency Laser of an injection laser system to laser system, effectively avoids
Influence under the conditions of dark field detection to damage imaging quality.
6th, the present invention can realize the faulted condition of online tracer element, and the hot spot with reference to optical element present position is practical
Size and Pixel Dimensions, obtain impaired loci size, and according to actual needs, lesion element is replaced, is effectively ensured by operator
The construction progress and operational efficiency of laser system.
Description of the drawings
Fig. 1 is the laser system light path schematic diagram of the present invention；
Fig. 2 is the spatial filter structure diagram of the present invention；
Fig. 3 (a) is the near-field image one that routine monitoring equipment acquires in the embodiment of the present invention two；
(b) be in the embodiment of the present invention two routine monitoring equipment acquire near-field image two；
(c) be in the embodiment of the present invention two routine monitoring equipment acquire near-field image three；
Fig. 4 (a) is the near-field image one that routine monitoring equipment acquires in the embodiment of the present invention three；
(b) be in the embodiment of the present invention three routine monitoring equipment acquire near-field image two；
(c) be in the embodiment of the present invention three routine monitoring equipment acquire near-field image three；
Fig. 5 is the schematic diagram that inner cavity section impaired loci offset is calculated in the embodiment of the present invention two；
Fig. 6 is the schematic diagram that motors in boost phase penetration impaired loci offset is calculated in the embodiment of the present invention three；
Fig. 7 is the translational movement curve graph of the optical element vertical direction of the present invention；
Fig. 8 (a) be in the embodiment of the present invention two impaired loci in X-direction section curve schematic diagram；
(b) be in the embodiment of the present invention two impaired loci in Y direction section curve schematic diagram；
Fig. 9 (a) be in the embodiment of the present invention three impaired loci in X-direction section curve schematic diagram；
(b) be in the embodiment of the present invention three impaired loci in Y direction section curve schematic diagram.
In attached drawing：First order amplifier 1, second level amplifier 2, spatial filter 1, spatial filter 24, hysteroscope 5,
Lens 1, lens 27, lens 38, lens 49, inversion device 10, macropore 11, filtering hole 12；
Pass1, pass2, pass3, pass4 represent the corresponding impaired locis of first, second, third and fourth Cheng Fang great respectively；
D is the offset pixels of pass3, pass4 in vertical direction, and D is full mouth of the near-field image one in vertical direction
Diameter pixel；
Wherein, in Fig. 5, Fig. 6 abscissa represent horizontal direction pixel, ordinate represent vertical direction pixel；In Fig. 7
Abscissa represents optical element serial number, and ordinate represents vertical direction translational movement (mm)；Abscissa represents in Fig. 8 (a), Fig. 9 (a)
Horizontal direction pixel, ordinate represent gray scale；Abscissa represents vertical direction pixel in Fig. 8 (b), Fig. 9 (b), and ordinate represents
Gray scale.
Specific embodiment
It is right with reference to the attached drawing of the present invention in order to which those skilled in the art is made to more fully understand technical scheme of the present invention
Technical scheme of the present invention carries out clear, complete description, and based on the embodiment in the application, those of ordinary skill in the art exist
The other similar embodiments obtained under the premise of not making creative work should all belong to the range of the application protection.
Embodiment one：
A kind of method of on-line checking laser system optical element damage including carrying out bright field illumination to laser system, is cut
The state of spatial filter is changed, near-field image is acquired in laser system output terminal, to the near field under spatial filter different conditions
Image is observed, and optical element is judged with the presence or absence of damage, according to near-field image situation of change, the offset of impaired loci and damage
Hinder dot pattern, determine impaired loci position and size.
As shown in Figure 1, select certain domestic high power large-scale laser, the laser includes first order amplification light path and the
Two level amplifies light path, is provided with spatial filter 1 between first and second grade of amplification light path, light path is amplified in the second level
Spatial filter 24, one 6 structure of the hysteroscope 5, first order amplifier 1 and lens are provided between the output terminal of laser system
Into the inner cavity section of first order amplification light path, the lens 27, second level amplifier 2 and lens 38 form second level amplification light path
Motors in boost phase penetration.
The light beam of laser system is injected from one 3 far field of spatial filter, is transmitted after first order amplifier 1 once amplification
To hysteroscope 5, reflected by hysteroscope 5 through 1 two amplifications of first order amplifier, second level amplifier 2 one is arrived by spatial filter 1
Secondary amplification, continues to be transferred to spatial filter 24, reinjects spatial filter 24 by inversion device 10, amplifies by the second level
After 2 two amplifications of device, three, four amplifications are carried out by spatial filter 1 to first order amplifier 1 again, using the second level
Amplifier 2 exports after amplifying for the third time, i.e., described first order amplification light path is amplified for quadruple pass, and second level amplification light path is put for three journeys
Greatly.
For multi-way amplification laser system since self-security considers, system must be designed to open loop light path, difference amplification journey
Between there are near field offset, different optical element offsets to determine value, and identity element vertical direction, horizontal direction it is inclined
Shifting amount is identical.
As shown in Fig. 2, being provided with macropore 11, filtering hole 12 on the aperture runner of spatial filter, rotate the aperture and turn
Wheel carries out macropore 11, the state switching for filtering hole 12.
According to light propagation law, light field is distributed in the focal position of lens 1, lens 27, lens 38, lens 49
For Fourier transformation, carry out blocking filtering using filtering hole 12 in focal position, filter out radio-frequency component, then export near field and show as
Radio-frequency component filters out, and impaired loci is generally being in the light a little for the system emphasized, necessarily brings radio-frequency component, before filtering hole 12
Optical element under the filter action in filtering hole 12, does not occur modulation point or edge occurs there are during impaired loci in near-field image
Fuzzy modulation point, the near-field image are acquired by the routine monitoring equipment of laser system output state.
A kind of method of on-line checking laser system optical element damage, specific operation process are as follows：
First, bright field illumination is carried out to laser system using the prime Repetition Frequency Laser of an injection laser system；
2nd, spatial filter 1 is switched to 11 state of macropore, spatial filter 24 is switched to 11 state of macropore, swash
Photosystem output terminal acquires near-field image one；Spatial filter 1 is switched to filtering 12 state of hole, spatial filter 24 is cut
11 state of macropore is changed to, near-field image two is acquired in laser system output terminal；Spatial filter 1 is switched to filtering 12 shape of hole
State, spatial filter 24 are switched to filtering 12 state of hole, and near-field image three is acquired in laser system output terminal；
3rd, there is not modulation point on the near-field image one, then there is no damages for the optical element of laser system；It is described
Occurs modulation point on near-field image one, then the optical element of laser system has damage, according to near-field image situation of change, into one
Step judges impaired loci position；
4th, there is not modulation point or edge blurry modulation point occurs, and do not have on near-field image three in the near-field image two
Modulation point is occurred, then the impaired loci is located at the optical element of first order amplification light path, and number=near field of impaired loci
The amplification number of passes of the sum of modulation point/first order amplification light path on image one；
There is sharp-edged modulation point in the near-field image two, modulation point does not occur on near-field image three or side occurs
Edge obscures modulation point, then at least there are impaired locis for the optical element of second level amplification light path, compare the near-field image one, near field
Modulation point on image two, and be labeled respectively to there is variation and unchanged modulation point；
(1) according to the laser optical path of the multi-way amplification laser system, the clearly impaired loci positioned at second level amplification light path
The distributing position rule of modulation point is generated in different amplification journeys；
(2) the distributing position rule according to step (1) is clearly amplified with corresponding other of unchanged modulation point
The distributing position of modulation point in journey；
(3) if the modulation point that there is variation on near-field image two is respectively positioned on distributing position described in step (2), only the
Two level amplification light path optical element there are impaired loci, and on number=near-field image one of impaired loci modulation point sum/
Amplify the amplification number of passes of light path in the second level；
(4) if the modulation point that there is variation on near-field image two is not entirely located in the distributing position described in step (2),
The optical element of first and second grade of amplification light path there are impaired loci, and in the second level amplification light path impaired loci number=near
Unchanged modulation point number in field picture two, the number=(modulated on near-field image one of impaired loci in first order amplification light path
The amplification number of passes of the number * second level amplification light path of impaired loci in the sum of point-second level amplification light path)/first order amplification light
The amplification number of passes on road；
5th, the offset of impaired loci is calculated, to determine the specific location and size of impaired loci.
The corresponding laser facula of light path where the impaired loci is a*b, and the impaired loci is in the offset mark of vertical direction
Δ y, the offset according to impaired loci are denoted as, the method for determining impaired loci position is：
(1) in the near-field image one, corresponding position of the impaired loci in two different amplification journeys is taken, and respectively
Labeled as A points, B points, 2 points of offset pixels d in vertical direction of A, B are read, according to light propagation law, in order to judge to damage
The specific location and size of point, choose the position closest from imaging surface, can effectively reduce the calculating come due to diffraction zone
Error, preferably, choosing corresponding position of the impaired loci in most latter two amplification journey；
(2) unified pixel D of the near-field image one in vertical direction is read；
(3) offset of impaired loci is calculatedDue to the symmetric design of laser system, promote the impaired loci
It is identical in vertical, horizontal direction offset；
(4) Δ y and practical translational movement of the optical element each in laser system in vertical direction are compared, the two numerical value
When identical, the impaired loci is located at the corresponding optical element of the practical translational movement.
The actual size of the impaired loci is m*n, and described according to damage dot pattern, the method for determining impaired loci size is：
(1) in the near-field image one, corresponding position of the impaired loci in any amplification journey is taken, and labeled as C
Point determines the barycenter of C points, carries out contour fitting to C points, its sectional view is obtained, preferably, taking the impaired loci at last
The corresponding position of a amplification journey；
(2) in the sectional view obtained by step (1), C points is read in horizontal, vertical direction pixel, are respectively labeled as x, y；
(3) the corresponding laser facula of the light path with reference to where impaired loci is a*b and the unified picture of the near-field image one
Plain A*D calculates the actual size of impaired loci, wherein,
Embodiment two：
As shown in figure 3, when spatial filter 1, spatial filter 24 are switched to 11 state of macropore, near-field image
One there are 4 modulation dot patterns, illustrates that, there are impaired loci in laser system, 4 modulation points are an impaired loci in difference
Amplify the position in journey；Spatial filter 1 is switched to filtering 12 state of hole, spatial filter 24 maintains 11 state of macropore
When, near-field image two is without modulation point；Filtering 12 state of hole, spatial filter 24 is maintained to be switched to filtering spatial filter 1
During 12 state of hole, near-field image three also without modulation point, judges that the impaired loci is located at the inner cavity section of first order amplification light path.
As shown in fig. 7, according to the setting sequence of optical element each in laser system, serial number is write to each optical element, it should
Figure lists practical translational movement of each optical element in vertical direction, by the practical translation of Δ y=16.5mm and each optical element
Amount is compared, it can be seen that Δ y is identical with the practical translational movement of No. 9 optical elements, and the impaired loci is located at the 9 of laser system
Number optical element carries out undercarriage observation to the optical element, is implicitly present in impaired loci, and No. 9 optical elements are located at
The inner cavity section of first order amplification light path demonstrates the correctness of the detection technique.
As shown in figure 8, in the near-field image one, preferably, C points take quadruple pass to amplify corresponding impaired loci
Pass4, reading pass4, pixel x=10, vertical direction pixel y=10, the impaired loci corresponding position hot spot are in the horizontal direction
320mm × 320mm, the unified pixel A * D=563*563 of the near-field image one, the actual size of the impaired loci is m*
N, thenOperator can replace No. 9 optical elements, effectively according to actual needs
Ensure the construction progress and operational efficiency of laser system.
Embodiment three：
As shown in figure 4, when spatial filter 1, spatial filter 24 are switched to 11 state of macropore, near-field image
One, which occurs 3, clearly modulates dot pattern, illustrates that, there are impaired loci in laser system, 3 modulation points are an impaired loci
Position in different amplification journeys；Spatial filter 1 is switched to filtering 12 state of hole, spatial filter 24 is switched to filter
During 12 state of wave hole, near-field image three is there are modulation point, but edge blurry, as filters the filter effect in hole；By space filtering
When the maintenance filtering of device 1 12 state of hole, spatial filter 24 are switched to 11 state of macropore, near-field image two occurs 1 clearly
Dot pattern is modulated, compares the near-field image one, the modulation point on near-field image two, the modulation point there are variation is respectively positioned on laser
Amplify the corresponding position of different amplification journeys in light path in the second level, judge that the impaired loci is located at the boosting of second level amplification light path
Section.
As shown in fig. 7, Δ y=2.5mm and the practical translational movement of each optical element are compared, it can be seen that Δ y with
The practical translational movement of No. 26 optical elements is identical, and the impaired loci is located at No. 26 optical elements of laser system, to optics member
Part carries out undercarriage observation, is implicitly present in impaired loci, and No. 26 optical elements are located at the boosting of second level amplification light path
Section demonstrates the correctness of the detection technique.
As shown in figure 9, in the near-field image one, preferably, C points take quadruple pass to amplify corresponding impaired loci
Pass4, reading pass4, pixel x=18, vertical direction pixel y=18, the impaired loci corresponding position hot spot are in the horizontal direction
360mm × 360mm, the unified pixel A * D=569*569 of the near-field image one, the actual size of the impaired loci is m*
N, thenNo. 26 optical elements can be replaced, had according to actual needs by operator
Effect ensures the construction progress and operational efficiency of laser system.
If in addition, existing simultaneously multiple impaired locis in different amplification light path, take processing method one by one, i.e., it first will really
Fixed impaired loci is handled, and then acquires image, if finding, also there are modulation points in near-field image one, are further continued for impaired loci position
It puts and judges and handled, until near-field image is normal.
The present invention is described in detail above, described above, only the preferred embodiments of the invention, when cannot
Limit the scope of the present invention, i.e., it is all to make equivalent changes and modifications according to the application range, it all should still belong to covering scope of the present invention
It is interior.
Claims (5)
- A kind of 1. method of on-line checking multi-way amplification laser system optic element damage, it is characterised in that：To laser system into Row bright field illumination switches the state of spatial filter, and near-field image is acquired in laser system output terminal, to spatial filter difference Near-field image under state is observed, and optical element is judged with the presence or absence of damage, according to near-field image situation of change, impaired loci Offset and damage dot pattern, determine impaired loci position and size；The laser system include the first order amplification light path and the second level amplification light path, it is described first and second grade amplification light path between Spatial filter one is provided with, spatial filter is provided between the second level amplification light path and the output terminal of laser system Two；Wherein, it is described switching spatial filter state, laser system output terminal acquisition near-field image method be：(1) spatial filter one is switched to coarse pored state, spatial filter two is switched to macropore state, laser system export End acquisition near-field image one；(2) spatial filter one is switched to the poroid state of filtering, spatial filter two is switched to macropore state, defeated in laser system Outlet acquires near-field image two；(3) spatial filter one is switched to the poroid state of filtering, spatial filter two is switched to the poroid state of filtering, in laser system Output terminal acquires near-field image three；The method observed the near-field image under spatial filter different conditions is：There is not modulation point on the near-field image one, then there is no damages for the optical element of laser system；The near-field pattern As there is modulation point on one, then there is damage in the optical element of laser system, according to near-field image situation of change, further judge Impaired loci position；The corresponding laser facula of light path where the impaired loci is a*b, and the impaired loci is in the offset tag of vertical direction Δ y, the offset according to impaired loci, the method for determining impaired loci position are：(1) in the near-field image one, corresponding position of the impaired loci in two different amplification journeys is taken, and mark respectively For A points, B points, 2 points of offset pixels d in vertical direction of A, B are read；(2) unified pixel D of the near-field image one in vertical direction is read；(3) offset of impaired loci is calculated(4) Δ y and practical translational movement of the optical element each in laser system in vertical direction are compared, the two numerical value is identical When, the impaired loci is located at the corresponding optical element of the practical translational movement；The actual size of the impaired loci is m*n, and described according to damage dot pattern, the method for determining impaired loci size is：(1) in the near-field image one, corresponding position of the impaired loci in any amplification journey is taken, and be labeled as C points, really Determine the barycenter of C points, contour fitting is carried out to C points, obtains its sectional view；(2) in the sectional view obtained by step (1), C points is read in horizontal, vertical direction pixel, are respectively labeled as x, y；(3) the corresponding laser facula of the light path with reference to where impaired loci is the a*b and unified pixel A * of the near-field image one D, wherein, A represents the unified pixel in the horizontal direction of near-field image one, calculates the actual size of impaired loci, wherein,
- 2. a kind of method of on-line checking multi-way amplification laser system optic element damage according to claim 1, special Sign is：The light source that bright field illumination is carried out to laser system is the prime Repetition Frequency Laser of an injection laser system.
- 3. a kind of method of on-line checking multi-way amplification laser system optic element damage according to claim 2, special Sign is：The acquisition order of the near-field image two, three can be interchanged.
- 4. a kind of method of on-line checking multi-way amplification laser system optic element damage according to claim 3, special Sign is：It is described it is further judge impaired loci position method be：A, there is not modulation point or edge blurry modulation point occurs, and do not occur on near-field image three in the near-field image two Modulation point, then the impaired loci be located at the first order amplification light path optical element；B, there is sharp-edged modulation point in the near-field image two, modulation point does not occur on near-field image three or edge occurs Fuzzy modulation point, then at least there are impaired locis for the optical element of second level amplification light path, compare the near-field image one, near-field pattern It is labeled respectively as the modulation point on two, and to there is variation and unchanged modulation point；(1) according to the laser optical path of the multi-way amplification laser system, clearly the impaired loci positioned at second level amplification light path is not The distributing position rule of modulation point is generated with amplification journey；(2) the distributing position rule according to step (1) is clearly amplified with corresponding other of unchanged modulation point in journeys The distributing position of modulation point；(3) if the modulation point that there is variation on near-field image two is respectively positioned on the distributing position described in step (2), the only second level There are impaired locis for the optical element of amplification light path；(4) if the modulation point that there is variation on near-field image two is not entirely located in the distributing position described in step (2), the There are impaired locis for the optical element of I and II amplification light path.
- 5. a kind of method of on-line checking multi-way amplification laser system optic element damage according to claim 4, special Sign is：In the sectional view, it is the distance between 10% two point that it is recessed, which to calculate contour line, and the distance is C points in water Flat, vertical direction pixel.
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| CN110749606A (en) * | 2019-11-14 | 2020-02-04 | 中国工程物理研究院激光聚变研究中心 | Laser damage detection method and system based on optical element |
| CN113390342B (en) * | 2021-06-21 | 2023-03-14 | 中国工程物理研究院激光聚变研究中心 | Method for judging position of damage point of multi-pass amplification laser system |
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