CN105506641A - Cleaning and polishing agent for copper - Google Patents
Cleaning and polishing agent for copper Download PDFInfo
- Publication number
- CN105506641A CN105506641A CN201410501293.1A CN201410501293A CN105506641A CN 105506641 A CN105506641 A CN 105506641A CN 201410501293 A CN201410501293 A CN 201410501293A CN 105506641 A CN105506641 A CN 105506641A
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- Prior art keywords
- cleaning
- parts
- copper
- polishing agent
- agent
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Detergent Compositions (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
The invention relates to a cleaning and polishing agent for copper. The cleaning and polishing agent for copper comprises, by weight, 1.5 to 3 parts of coconut oil fat, 8 to 16 parts of oleic acid, 1 to 2 parts of ammonia water, 30 to 60 parts of a petroleum solvent, 0.2 to 0.4 part of benzotriazole, 15 to 30 parts of diatomite, 0.2 to 0.3 part of an antirust agent and 43 to 86 parts of water. The cleaning and polishing agent has the beneficial effects of good cleaning effect and high brightness.
Description
Technical field
The invention belongs to and relate to copper field of surface treatment, be specifically related to a kind of cleaning-polishing agent for copper.
Background technology
Copper component, in use for some time due to the corrosion of environment for use, can produce rusty stain, weldering spot and oxidizing substance etc. on surface.Current some rumbling compounds are on the market complete not to fine-structured surface full of vigour, also there is certain pollution to environment.
Summary of the invention
For above-mentioned weak point, the invention provides a kind of cleaning-polishing agent for copper, the spot that not only derusts is effective, also improves the luminance brightness of copper.
The technical solution adopted for the present invention to solve the technical problems is: a kind of cleaning-polishing agent for copper, with parts by weight, composed of the following components: coconut oil fat 1.5 ~ 3, oleic acid 8 ~ 16, ammoniacal liquor 1 ~ 2, petroleum solvent 30 ~ 60, benzene well triazole 0.2 ~ 0.4, diatomite 15 ~ 30, rust-preventive agent 0.2 ~ 0.3, water 43 ~ 86.
Adopt above technical scheme, the present invention is directed to the oxide compound on brass work, rusty stain etc. has good removal effect, and luminance brightness is high.
Embodiment
Below in conjunction with specific embodiment, the invention will be further described.
Embodiment 1
For a cleaning-polishing agent for copper, with parts by weight, composed of the following components:
Coconut oil fat 1.5, oleic acid 8, ammoniacal liquor 1, petroleum solvent 30, benzene well triazole 0.2, diatomite 15, rust-preventive agent 0.2, water 43.
Embodiment 2
For a cleaning-polishing agent for copper, with parts by weight, composed of the following components:
Coconut oil fat 3, oleic acid 16, ammoniacal liquor 2, petroleum solvent 60, benzene well triazole 0.4, diatomite 30, rust-preventive agent 0.3, water 86.
Claims (3)
1. for a cleaning-polishing agent for copper, it is characterized in that: with parts by weight, composed of the following components:
Coconut oil fat 1.5 ~ 3, oleic acid 8 ~ 16, ammoniacal liquor 1 ~ 2, petroleum solvent 30 ~ 60, benzene well triazole 0.2 ~ 0.4, diatomite 15 ~ 30, rust-preventive agent 0.2 ~ 0.3, water 43 ~ 86.
2. a kind of cleaning-polishing agent for copper according to claim 1, is characterized in that: with parts by weight, composed of the following components:
Coconut oil fat 1.5, oleic acid 8, ammoniacal liquor 1, petroleum solvent 30, benzene well triazole 0.2, diatomite 15, rust-preventive agent 0.2, water 43.
3. a kind of cleaning-polishing agent for copper according to claim 1, is characterized in that: with parts by weight, composed of the following components:
Coconut oil fat 3, oleic acid 16, ammoniacal liquor 2, petroleum solvent 60, benzene well triazole 0.4, diatomite 30, rust-preventive agent 0.3, water 86.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410501293.1A CN105506641A (en) | 2014-09-26 | 2014-09-26 | Cleaning and polishing agent for copper |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410501293.1A CN105506641A (en) | 2014-09-26 | 2014-09-26 | Cleaning and polishing agent for copper |
Publications (1)
Publication Number | Publication Date |
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CN105506641A true CN105506641A (en) | 2016-04-20 |
Family
ID=55714930
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201410501293.1A Pending CN105506641A (en) | 2014-09-26 | 2014-09-26 | Cleaning and polishing agent for copper |
Country Status (1)
Country | Link |
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CN (1) | CN105506641A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107675197A (en) * | 2017-09-30 | 2018-02-09 | 徐州中泰能源科技有限公司 | A kind of copper product cleaning agent |
-
2014
- 2014-09-26 CN CN201410501293.1A patent/CN105506641A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107675197A (en) * | 2017-09-30 | 2018-02-09 | 徐州中泰能源科技有限公司 | A kind of copper product cleaning agent |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
WD01 | Invention patent application deemed withdrawn after publication | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20160420 |