CN105483639B

CN105483639B - Vacuum processing method and vacuum treatment installation

Info

Publication number: CN105483639B
Application number: CN201510845151.1A
Authority: CN
Inventors: 津田英司
Original assignee: NAKA LIQUID CONTROL Co Ltd
Current assignee: NAKA LIQUID CONTROL Co Ltd
Priority date: 2014-12-01
Filing date: 2015-11-26
Publication date: 2018-04-20
Anticipated expiration: 2035-11-26
Also published as: JP5769861B1; CN105483639A; JP2016105448A

Abstract

The present invention provides the vacuum processing method and vacuum treatment installation that high-air-tightness is realized with simple structure.The vacuum processing method moves into mouth from workpiece to be opened/closed and moves into workpiece in vacuum tank successively, and after edge is set as the work transporting path conveyance workpiece in the vacuum tank of vacuum state, mouth is taken out of from workpiece to be opened/closed to take out of workpiece outside vacuum tank successively, it is characterized in that, when the transfer path room for being provided with transfer path and be arranged on the room to be avoided of the workpiece connected in vacuum tank with transfer path room move into mouth and take out of be set as vacuum state before mouth opens wide when, the workpiece on transfer path is moved to be avoided indoor and close the entrance of room to be avoided into airtight conditions, in moving into mouth and take out of after mouth performs the taking out of and move into of workpiece from opening, when closing moves into mouth and takes out of mouth and be set as vacuum state in transfer path room, open the entrance of room to be avoided and return to indoor workpiece to be avoided on transfer path.

Description

Vacuum processing method and vacuum treatment installation

Technical field

Be used to be moved to workpiece successively in vacuum tank the present invention relates to one kind and perform under vacuum conditions deaerate or The vacuum processing method of the designated treatments such as deaeration and a kind of vacuum treatment installation for being used to perform the vacuum processing method.

Background technology

As the sputter equipment 1 of tandem, such as propose the sputter equipment described in a kind of patent document 1.Such as Fig. 9 Shown, sputter equipment 1 includes being used to perform the film forming room 2 of film process and a left side for film forming room 2 is arranged on by isolating valve 3A, 3B Right loading room 4 and taking-up room 5.Film forming room 2 is provided with the conveyance instrument 6 for transporting the substrate tray 8 for carrying substrate.This Outside, film forming room 2, load room 4 and take out room 5 and include exhaust system 7 independently, internal pressure by exhaust system 7 from By changing into state (hereinafter referred to as vacuum pressure) and atmospheric pressure close to vacuum.

This sputter equipment 1 generally operates as follows.

Closed in isolating valve 3A, 3B and film forming room 2 remains the state of vacuum pressure, dress is received in substrate tray 8 Enter the room after 4, load room 4 and be vented by exhaust system 7 until it becomes vacuum pressure.Then, open load room 4 and film forming room 2 it Between isolating valve 3A, the entrance of substrate tray 8 from film forming room 2 is moved to film forming room 2, closes isolating valve 3A.Substrate tray 8 into Transported and after various film process have been performed to substrate in film room 2 by transporting instrument 6, open preexhaust into vacuum The isolating valve 3B taken out between room 5 and film forming room 2 of pressure, substrate tray 8 are moved to from the outlet of film forming room 2 and take out room 5.Close After closing isolating valve 3B, the inside of taking-up room 5 is reverted to atmospheric pressure, substrate tray 8 is taken out from room 5 is taken out.

Prior art literature：

Patent document

Patent document 1：Japanese Unexamined Patent Publication 2006-307275 publications

In the sputter equipment 1 of above-mentioned composition, the entrance of substrate tray 8 from 4 side of loading room of film forming room 2 is moved into, into Conveyance, takes out of from the outlet of 5 side of taking-up room of film forming room 2 in film room 2, and film forming room 2 is by being arranged on the entrance of film forming room 2 and going out Isolating valve 3A, 3B at mouthful are generally maintained at vacuum state.However, problem is：Due to the use of two isolating valves 3A, 3B, it is necessary to For opening and closing the construction of isolating valve 3A, 3B respectively, therefore complexity is constructed, and the air-tightness of film forming room also becomes bad Change.

The content of the invention

Currently invention addresses the above subject, it is desirable to provide a kind of to be realized by simple structure at the vacuum of high-air-tightness Reason method and vacuum treatment installation.

Vacuum processing method according to the present invention, the vacuum processing method from workpiece to be opened/closed move into mouth by workpiece according to It is secondary to be moved in vacuum tank, along after the work transporting path conveyance workpiece being set as in the vacuum tank of vacuum state, Mouth is taken out of from workpiece to be opened/closed to take out of workpiece to outside the vacuum tank successively, it is characterised in that：When the vacuum tank The interior transfer path room for being provided with the transfer path and connected with the transfer path room and be arranged on the vacuum and hold Workpiece room to be avoided in device it is described move into mouth and take out of be set as vacuum state before mouth opens wide when, make on the transfer path Workpiece be moved to it is described to be avoided indoor and by the entrance closing of room to be avoided into airtight conditions, moving into mouth described in unlimited Taken out of with described after mouth performs the taking out of and move into of workpiece, mouth is moved into described in closing and takes out of mouth and sets the transfer path room For vacuum state when, open wide the room to be avoided entrance simultaneously the indoor workpiece to be avoided is returned into the transfer path On.

In addition, vacuum treatment installation includes according to the present invention：Vacuum tank, the vacuum tank are provided with transfer path Room and the room to be avoided of workpiece, the transfer path room move into mouth, can be opened and closed in the other end with workpiece to be opened/closed at one end Workpiece take out of mouth and move into mouth and the transfer path for taking out of the workpiece between mouth described, the workpiece it is to be avoided Room is connected in the top of the transfer path room with transfer path room；Vacuum exhaust mechanism, the vacuum exhaust mechanism can incite somebody to action The vacuum tank switching is set as vacuum state and atmospheric pressure state；Work transporting mechanism, the work transporting mechanism will be from It is described move into mouth and move into the indoor workpiece of transfer path of the vacuum tank and be transported to along the transfer path described take out of mouth； And lifting platform, the lifting platform configuration is on the indoor transfer path of the transfer path and in the transfer path room and institute State and carry out descending operation between room to be avoided.The lifting platform has the work for the entrance that can close the room to be avoided in the above Part supporting surface, is provided with the guide mechanism for the part for forming the transfer path on the workpiece support face, while in institute State and lifting platform is provided between lifting platform and the entrance of room to be avoided by the closing of the entrance of room to be avoided into airtight conditions Sealing mechanism.

The workpiece being moved in vacuum tank in vacuum tank away from being continued to put in such a way during taking out of Under vacuum state, the processing that deaeration etc. is specified is performed in the meantime.

First, in unit one from when moving into mouth and being moved to the transfer path room of vacuum tank, after moving into mouth and closing, Handled by being vacuum state in vacuum exhaust mechanism setting vacuum tank and starting vacuum defoamation etc..By workpiece along transfer path The transfer path of room is transported on the workpiece support face of lifting platform.Before second workpiece is moved into, lifting platform is set to increase simultaneously Make the workpiece on lifting platform to be avoided to room to be avoided.Since the entrance of room to be avoided is blocked by lifting platform and is closed by sealing mechanism Into airtight conditions, therefore room to be avoided remains vacuum state.

Then, after transfer path room is set by vacuum exhaust mechanism as atmospheric pressure state, opening moves into mouth and by the Two workpiece are moved to the transfer path room of vacuum tank.Since transfer path room is atmospheric pressure state, mouth envelope is being moved into After closing, it is vacuum state to be set by vacuum exhaust mechanism in vacuum tank.In room to be avoided, unit one to be avoided is to be avoided In continue the processing such as vacuum defoamation or perform the processing specified.When being set as vacuum state in transfer path room, lifting Platform declines and the entrance of room to be avoided opens wide, it is to be avoided in workpiece back on the transfer path of transfer path room.

Then, back to the unit one on transfer path and from second workpiece that mouth moves into is moved into along transfer path The transfer path of room is transported.In the embodiment for making a room to be avoided workpiece to be avoided, unit one, which is transported to, to take out of Mouthful, second workpiece is transported on the workpiece support face of lifting platform.Before the 3rd workpiece is moved into, lifting platform is set to increase simultaneously Make the workpiece on lifting platform to be avoided to room to be avoided.Since the entrance of room to be avoided is blocked by lifting platform and is closed by sealing mechanism Into airtight conditions, therefore room to be avoided remains vacuum state.Then, open to move into mouth and the 3rd workpiece is moved to vacuum and hold The transfer path room of device.Also open at the same time and take out of mouth, unit one is taken out of from mouth is taken out of.

In addition it is also possible to make in room to be avoided two workpiece to be avoided.In this case, back to first on transfer path Workpiece and transported at the same time on the workpiece support face of lifting platform from second workpiece that mouth moves into is moved into.Moving into the 3rd work Before part, lifting platform is increased and make unit one and second workpiece to be avoided to room to be avoided.

As described above, due to the workpiece that is moved in vacuum tank move into mouth and take out of it is to be avoided in vacuum when mouth is opened Room to be avoided in container, therefore become and continue to be placed under vacuum state.Further, since workpiece in room to be avoided is to be avoided is from treating It is that transfer path room is returned to after transfer path room is set as vacuum state to keep away when room returns to transfer path room, therefore is continued It is placed under vacuum state.In this way, the workpiece being moved in vacuum tank away from being put under vacuum conditions during taking out of Put in vacuum tank, perform the processing specified in the meantime.

According to the present invention, due to being provided with being generally maintained at the room to be avoided of vacuum state and in workpiece from transfer path Room is to be avoided to moving into for next workpiece and taking out of for processed workpiece is performed on the basis of room to be avoided, and workpiece is to be avoided afterwards Room is back to the structure on the transfer path of transfer path room, therefore the entrance of room to be avoided only sets one.Therefore, with The prior art sets the room for performing designated treatment like that on transfer path and entrance and exit in the room set respectively every It is simple in structure and air-tightness can be improved from valve to keep the structure of vacuum state to compare.

Preferably, said workpiece transport mechanism includes：Move back and forth plate, more bar-like members, reciprocating mechanism and drive Motivation structure, moves back and forth plate and moves back and forth along the transfer path of workpiece, more bar-like members relative to described to remove The mode that can carry out retreat operation in path room is sent to be made by the reciprocating motion plate support, reciprocating mechanism when transporting workpiece Each bar-like member proceeds to the rear positions of each workpiece, driving mechanism make foregoing reciprocating motion plate only move back and forth workpiece just into To distance.

According to aforementioned structure, when transporting workpiece, first, bar-like member is by reciprocating mechanism relative to transfer path Indoor advance and the rear portion for being positioned at workpiece.Here, rear portion refers to that mouth will be moved into towards the side for taking out of mouth from transfer path room During to as front, the front side of workpiece is front portion, and opposite direction side is rear portion.

Then, reciprocating motion plate is only moved positive feeding distance towards the front of workpiece by driving mechanism, back and forth transported The bar-like member of movable plate support pushes away signature workpiece from rear portion and positive feeding distance is only transported along transfer path.Terminate in the conveyance of workpiece When, bar-like member is retreated from the rear positions of workpiece by reciprocating mechanism, move back and forth plate and returned by driving mechanism To original position.

In this way, due to making bar-like member be positioned at the rear portion of workpiece when transporting workpiece, terminate in the conveyance of workpiece When bar-like member is retreated from the rear portion of workpiece and make bar-like member delocalization on transfer path or on lifting platform, therefore will not Hinder the descending operation of lifting platform.

In the vacuum treatment installation, further include moving-in mechanism and take out of mechanism, workpiece is positioned in and removes by moving-in mechanism Enter the workpiece support face above platform and be moved to from the mouth of moving into the transfer path room of the vacuum tank, take out of mechanism The indoor workpiece of the transfer path of the vacuum tank is positioned in the workpiece support face taken out of above platform and is taken out of from described Mouth is taken out of outside the vacuum tank.Preferably, moving between mouth and take out of platform described in the carrying-station and workpiece Take out of to be provided with carrying-station between mouth and take out of platform and will move into mouth and take out of mouth closing into the close of airtight conditions with workpiece Sealing mechanism.

According to aforementioned structure, due to carrying-station with take out of platform by sealing mechanism will move into mouth with take out of mouth close it is into airtight State, therefore the vacuum state of transfer path room can be kept.

Further, since the workpiece being positioned in above carrying-station is moved to after the operation of mouth is moved into carrying-station closing In transfer path room, and it is logical from conveyance after taking out of platform and opening wide the operation for taking out of mouth to be positioned in the workpiece taken out of above platform Road room is taken out of, therefore can improve treatment effeciency.

According to the present invention, the room to be avoided of vacuum state is generally maintained at due to being provided with vacuum tank and treats this The entrance for keeping away room is closed as the structure of airtight conditions, therefore is only opened and closed an entrance of room to be avoided, so that structure It is simple and air-tightness can be improved.

Brief description of the drawings

Fig. 1 is the view for showing vacuum treatment installation according to embodiment of the present invention, to be shown very with section The front view of empty container.

Fig. 2 is the sectional view along the line A-A of Fig. 1 vacuum tanks cut off.

Fig. 3 is the sectional view along the line B-B of Fig. 2 vacuum tanks cut off.

Fig. 4 is the rearview of vacuum treatment installation.

Fig. 5 is the explanatory drawin for showing vacuum processing method flow.

Fig. 6 is the explanatory drawin for showing vacuum processing method flow.

Fig. 7 is the explanatory drawin for showing vacuum processing method flow.

Fig. 8 is the explanatory drawin for showing vacuum processing method flow.

Fig. 9 is the explanatory drawin for showing the prior art.

Description of reference numerals

10 vacuum treatment installations

20 vacuum tanks

22 move into mouth

23 take out of mouth

24 transfer paths

25 rooms to be avoided

30A, 30B vacuum exhaust mechanism

40 work transporting mechanisms

41 move back and forth plate

42A is to 42C bar-like members

3A is to 43C reciprocating mechanisms

44 driving mechanisms

50 elevating mechanisms

60 moving-in mechanism

70 take out of mechanism

100 lifting platforms

100a workpiece supports face

101st, 102 two guide rails (guide mechanism)

110 carrying-stations

120 take out of platform

P work plates

W workpiece

Embodiment

Hereinafter, embodiments of the present invention are explained with reference to.

Fig. 1 to Fig. 4 shows the structure of vacuum treatment installation 10 according to embodiment of the present invention.

Exemplary vacuum treatment installation 10 includes in figure：Vacuum tank 20, vacuum exhaust mechanism 30A, 30B, work transporting Mechanism 40, lifting platform 100, platform elevating mechanism 50, carrying-station 110, moving-in mechanism 60, take out of platform 120, take out of mechanism 70, vacuum Container 20 includes transfer path room 21 and workpiece W rooms 25 to be avoided, and vacuum exhaust mechanism 30A, 30B can be by inside vacuum tank 20 Switching is set to vacuum state and atmospheric pressure state, and work transporting mechanism 40 will be moved in transfer path room 21 from mouth 22 is moved into Workpiece W be transported to along transfer path 24 and take out of mouth 23, lifting platform 100 is used to workpiece W being transported to from transfer path room 21 The room to be avoided 25 of the top position of path room 21 is sent, platform elevating mechanism 50 makes lifting platform 100 carry out descending operation, carrying-station 110 For workpiece W to be moved in transfer path room 21, moving-in mechanism 60 makes carrying-station 110 carry out descending operation, takes out of platform 120 and uses In workpiece W is taken out of from transfer path room 21, taking out of mechanism 70 makes to take out of the progress descending operation of platform 120.

In the vacuum treatment installation 10 of the present embodiment, the workpiece W loaded on work plate P is placed in carrying-station 110 And it is moved to successively in vacuum tank 20 from the mouth 22 of moving into of workpiece W to be opened/closed.Workpiece W is set to the true of vacuum state on edge After the transfer path 24 of workpiece W in empty container 20 is transported, it is positioned in and takes out of on platform 120 and removed from workpiece W to be opened/closed Outlet 23 is moved to outside vacuum tank 20 successively.

, will be from right side towards left side in Fig. 1, i.e. move into mouth 22 from transfer path room 21 in addition, in the following description Front is used as towards the direction for taking out of mouth 23, using the direction opposite with front as rear.Workpiece W is transported towards front.This Outside, the above-below direction using the above-below direction of Fig. 1 as vacuum treatment installation 10.In addition, in Fig. 2 using left side as face side, it is right Side is as rear side.Fig. 3, Fig. 4 using the direction from left side towards right side as in front of.

In addition, in Fig. 2, vacuum tank 20 is illustrated with section, and other parts are illustrated with side.In Fig. 4, omit Platform elevating mechanism 50, moving-in mechanism 60, the view for taking out of mechanism 70.Fig. 3 by vacuum tank 20, move back and forth 41 (it of plate Describe afterwards) and sealing plate 45 (afterwards describe) illustrated with section, and other parts are illustrated with overlooking.

As shown in Figure 1, it is fixed on pedestal (not shown) and is arranged on the branch with foot of the lower section of vacuum tank 20 Support platform 200 is provided with platform elevating mechanism 50, moving-in mechanism 60 and takes out of mechanism 70, in addition, vacuum tank 20 is installed to installation Pillar 210 above supporting table 200.

As shown in Figure 1 to Figure 3, vacuum tank 20 has the transfer path room 21 of rectangular-shape, in transfer path room 21 What the one end on the anteroposterior direction of bottom wall 21a was provided with workpiece W to be opened/closed moves into mouth 22, and being provided with another side to open The workpiece W's closed takes out of mouth 23, and the transfer path 24 formed with workpiece W between moving into mouth 22 and taking out of mouth 23.

In addition, vacuum tank 20 has the room to be avoided 25 of the workpiece W of rectangular-shape.Room 25 to be avoided is positioned at transfer path room 21 top, the entrance 26 in room 25 to be avoided are connected with transfer path room 21.

The room to be avoided 25 of the present embodiment is set to the size that two workpiece can be made to be avoided, or can make a work Part size to be avoided, or more than three workpiece size to be avoided can be made.

The mouth 22 of moving into of transfer path room 21 is closed by configuring in the rectangular carrying-station 110 for moving into the lower section of mouth 22 Into airtight conditions.

Carrying-station 110 is formed to the size that mouth 22 is moved into closing, by moving-in mechanism 60 relative to transfer path room 21 mouth 22 of moving into carries out descending operation.It is provided with above carrying-station 110 and closes into airtight conditions for mouth 22 will to be moved into Sealing mechanism 111.Sealing mechanism 111 is the embedded O-ring in the groove that four edges along above carrying-station 110 are formed Mechanism.It will be moved into the state of mouth 22 closes in carrying-station 110, sealing mechanism 111 abuts the bottom wall 21a's of transfer path room 21 Move into the face around mouth 22.The situation of vacuum state is set to by vacuum exhaust mechanism 30A, 30B in vacuum tank 20 Under, carrying-station 110 is adsorbed to the face moved into around mouth 22, transfer path room 21 due to the vacuum pressure of transfer path room 21 Move into mouth 22 by O-ring closing into sealing state.

In addition, as shown in Figure 1, Figure 3, workpiece support platform 113 is installed via support stick 112 above carrying-station 110. 113a is provided with the guide mechanism being made of two guide rails 114,114 above workpiece support platform 113.In this two guide rails 114th, the work plate P of mounting workpiece W is supported between 114 with moving freely.By loading the carrying-station 110 of workpiece W by moving into What mechanism 60 rose and closed transfer path room 21 moves into mouth 22, and workpiece W is moved in transfer path room 21 from mouth 22 is moved into.

The mouth 23 that takes out of of transfer path room 21 is closed by configuring in the rectangular platform 120 that takes out of for moving into the lower section of mouth 22 Into airtight conditions.

It is identical with the structure of carrying-station 110 to take out of platform 120, by taking out of the taking out of relative to transfer path room 21 of mechanism 70 Mouth 23 carries out descending operations.Taking out of O-ring is provided with above platform 120 and is embedded in groove sealing mechanism 121.Taking out of platform Workpiece support platform 123 is installed via support stick 122 above 120.123a is provided with by two above workpiece support platform 123 The guide mechanism that bar guide rail 124,124 is formed.Decline and open wide by taking out of mechanism 70 by the platform 120 that takes out of for loading workpiece W Transfer path room 21 takes out of mouth 23, and workpiece W is moved to outside transfer path room 21 from mouth 23 is taken out of.

Above-mentioned lifting platform 100 configure carrying-station 110 workpiece support platform 113 and take out of the workpiece support platform of platform 120 Between 123, descending operation is carried out between the entrance 26 of transfer path 24 and room to be avoided 25 by platform elevating mechanism 50.By The lifting of lifting platform 100, the work plate P for the workpiece support face 100a being positioned in above lifting platform 100 are moved to room to be avoided 25 or taken out of from room 25 to be avoided.

Lifting platform 100 can support the size of two work plate P for workpiece support face 100a, be formed to room 25 to be avoided Entrance 26 close into the sizes of airtight conditions.

Transfer path room 21 upper wall 21b and be provided with sealing on the inside of the wall around the entrance 26 of room 25 to be avoided Mechanism 28.The mechanism of embedded O-ring in the groove that sealing mechanism 28 is formed for the wall around the entrance 26 of room 25 to be avoided, Transfer path room 21 is atmospheric pressure state and in the case that room to be avoided 25 is vacuum state, due to the vacuum pressure of room 25 to be avoided, Lifting platform 100 is adsorbed to the O-ring of the sealing mechanism 28 of the wall around entrance 26, so as to keep the airtight of room 25 to be avoided State.

Workpiece support face 100a above lifting platform 100 is formed with the vectoring aircraft being made of two guide rails 101,101 Structure.The work plate P for being placed with workpiece W is supported between this two guide rail 101,101 with moving freely.

In addition, between the workpiece support platform 113 and lifting platform 100 of carrying-station 110 and taking out of the workpiece branch of platform 120 Accessory plate 130 is provided between support platform 123 and lifting platform 100.Accessory plate 130 is supported on transfer path room via support stick 131 On 21 bottom wall 21a.130a is provided with two auxiliary guide rails 133,133 above each accessory plate 130.

The guiding that the transfer path 24 of the workpiece W of transfer path room 21 is made of two guide rails 114,114 of carrying-station 110 Mechanism, the guide mechanism being made of two guide rails 124,124 for taking out of platform 120, two guide rails 101,101 by lifting platform 100 The guide mechanism of composition and the auxiliary guide rail 133,133 of accessory plate 130 are formed.

In order to transport work plate P along transfer path 24, by the support stick 112 of carrying-station 110, the support stick of platform 120 is taken out of 122 and the length of support stick 131 of accessory plate 130 be adjusted such that above the workpiece support platform 113 of carrying-station 110 The height of 113a, take out of the height of 123a above the workpiece support platform 123 of platform 120, the workpiece support face 100a of lifting platform 100 Height align with the height of 130a above accessory plate 130.

The guide rail 101 of lifting platform 100 and auxiliary guide rail 133,133 in the end for moving into 22 side of mouth be tapered portion 101a, 133a, so as to lead in the transfer path 24 from the transfer path 24 of carrying-station 110 to lifting platform 100, from the conveyance of lifting platform 100 When road 24 is to the conveyance work plate P of transfer path 24 for taking out of platform 120, the transmission of work plate P becomes easy.

Vacuum exhaust mechanism 30A, 30B is arranged on the one end and another side of vacuum tank 20, can be by vacuum tank Switching is set to vacuum state and atmospheric pressure state in 20.The vacuum exhaust mechanism 30A of side includes being used to hold vacuum at one end Become the pump and valve of vacuum state in device 20, include being used to make in vacuum tank 20 in the vacuum exhaust mechanism 30B of another side Transfer path room 21 become atmospheric pressure state valve.

The upper wall 21b and side wall 21c of transfer path room 21, the upper wall 25a and side wall 25b of room to be avoided 25 are provided with for seeing That examines workpiece W takes out of the shielding window spied on plate 27 and realized by glass system moved into.

Specifically, transfer path room 21 upper wall 21b the position moved into mouth 22, take out of mouth 23 with transfer path room 21 Put corresponding position and be respectively formed with opening 21d-1,21d-2, in the room to be avoided with workpiece W 25 of the upper wall 25a of room 25 to be avoided The position of the position correspondence of entrance 26 is formed with opening 25c-1, in transfer path room 21 and the side of the face side of room to be avoided 25 Wall 21c, 25b are respectively formed with corresponding opening 21d-3,25c-2.

The outside of the upper wall 25a and side wall 25b of upper wall 21b and side wall 21c, room to be avoided 25 in transfer path room 21, and Accordingly around opening 21d-1,21d-2,21d-3,25c-1,25c-2 formed with groove, O-ring 27a is embedded with groove. Plate 27 is spied on to lock and be configured to from outer side covers opening 21d-1,21d-2,21d-3,25c-1,25c-2 by locking plate 27b, When becoming vacuum state by vacuum exhaust mechanism 30A in transfer path room 21 or room to be avoided 25, spy on plate 27 and be adsorbed to phase Wall 21b, 21c, 25a, 25b sides answered, maintain airtight conditions.

In addition, the bottom wall 21a in transfer path room 21 moves into mouth 22 and takes out of between mouth 23 formed with for assembling Lifting platform 100 is configured to the assembling opening 21g in transfer path room 21 during vacuum tank 20.The assembling is closed with opening Plate 21h is closed.

As shown in Figure 1, foregoing elevating mechanism 50 includes two parallel guide rods 51,51, level board 52, lifting circle Cylinder 53, two parallel guide rods 51,51 pass through the closing at the bottom wall 21a for the transfer path room 21 for being arranged on vacuum tank 20 Opening 21f, 21f of plate 21h is simultaneously connected to below lifting platform 100, the lower end of 52 supporting guide rod 51,51 of level board, lifting Platform 200 is supported with cylinder 53 to support.Lifting is attached to two below level board 52 with the upper end of the bar 53a of cylinder 53 Position between guide rod 51,51.

Be provided with below the closed plate 21h of the bottom wall 21a of the transfer path room 21 of vacuum tank 20 has in inside The guiding cylinder 54,54 of bullport (not shown).Guiding cylinder 54,54 bullport be connected to foregoing closed plate 21h opening 21f, 21f..Two guide rods 51,51 pass through opening 21f, 21f of closed plate 21h and the drawing for guiding cylinder 54,54 of transfer path room 21 Guide hole, in this way, level board 52 are moved back and forth in the up-down direction in a manner of non-rotating.

O-ring (not shown) is internally provided with opening 21f, 21f, is moved along the vertical direction even in guide rod 51,51 In the case of dynamic, vacuum tank 20 still keeps airtight conditions.

It is provided with below the closed plate 21h of the bottom wall 21a of transfer path room 21 in lifting platform 100 and room 25 to be avoided Wall around entrance 26 mitigates damper 56a, 56a that the vibration in lifting platform 100 occurs when abutting.Pass through level board Damper 56a, 56a are abutted above 52, stops the ascending motion of platform elevating mechanism 50.

Further, it is provided with to mitigate when lifting platform 100 declines and stops above supporting table 200 and occurs in lifting platform Damper 56b, 56b of vibration in 100.By abutting damper 56b, 56b of supporting table 200 below level board 52, make The descending motion of platform elevating mechanism 50 stops.

The moving-in mechanism 60 of said workpiece W includes：Two parallel guide rods 61,61, lifting cylinder 63, level board 62, two parallel guide rods 61,61 are linked to below carrying-station 110, and lifting is coupled with the upper end of the bar 63a of cylinder 63 The position between two guide rods 61,61 below to carrying-station 110, level board 62 are supported under two guide rods 61,61 End.Lifting cylinder 63 is installed to supporting table 200.Supporting table 200 is provided with two guiding cylinders 64,64, and guide rod 61,61 passes through Guide the bullport (not shown) of cylinder 64,64.By guide cylinder 64,64 with freely movably support two guide rods 61, 61, carrying-station 110 is moved back and forth in a manner of non-rotating in the up-down direction.

The outside of cylinder 64,64 is guided to be provided with carrying-station 110 and transfer path below supporting table 200 and at two Mitigate damper 66a, 66a that the vibration in carrying-station 110 occurs when the wall moved into around mouth 22 of room 21 abuts.Pass through Damper 66a, 66a are abutted above level board 62, stops the ascending motion of moving-in mechanism 60.

Further, the outside of cylinder 64,64 is guided to be provided with carrying-station 110 above supporting table 200 and at two Mitigate damper 66b, 66b that the vibration in carrying-station 110 occurs when drop stops.Subtracted by being abutted below carrying-station 110 Device 66b, 66b are shaken, stops the descending motion of moving-in mechanism 60.

The mechanism 70 that takes out of of foregoing workpiece W is the structure same with the moving-in mechanism 60 of workpiece W, takes out of mechanism 70 and wraps Include：Two parallel guide rods 71,71, lifting cylinder 73, level board 72, two parallel guide rods 71,71 are linked to and removed Put into effect 120 below, lifting with the upper end of the bar 73a of cylinder 73 install to two guide rods 71 taken out of below platform 120, Position between 71, level board 72 support the lower end of two guide rods 71,71.Lifting cylinder 73 is installed to supporting table 200.Branch Support platform 200 is provided with two guiding cylinders 74,74, and guide rod 71,71 guides cylinders 74,74 through two.Below supporting table 200 The outside of cylinder 74,74 is guided to be provided with corresponding damper 76a, 76a, 76b, 76b above and at two.

As shown in Figures 2 to 4, said workpiece transport mechanism 40 transports workpiece W along the transfer path 24 of transfer path room 21, Including：Move back and forth plate 41, more bar-like member 42A to 42C (being three in figure), reciprocating mechanism 43A to 43C and driving Mechanism 44A, move back and forth plate 41 be arranged at transfer path room 21 and room to be avoided 25 rear side side wall 21c, 25b and along workpiece W transfer paths 24 move back and forth, and more bar-like member 42A to 42C in transfer path room 21 with can be relative to retreating The mode of movement is supported by reciprocating motion plate 41, and reciprocating mechanism 43A to 43C makes each bar-like member 42A when transporting workpiece W The rear positions of each workpiece W are proceeded to 42C, driving mechanism 44 makes reciprocating motion plate 41 only move back and forth positive feeding workpiece W's Distance.In addition, in Fig. 3, Fig. 4, the description to vacuum exhaust mechanism 30A, 30B is eliminated.

Plate 41 is moved back and forth to install to the outside of the side wall 21c of the rear side of transfer path room 21 via sealing plate 45.Tool Body, slot hole 21es of the side wall 21c formed with reciprocating motion longer in the longitudinal direction in transfer path room 21, at the same time It is roughly the same with the slot hole 21e of the reciprocating motion of the side wall 21c of transfer path room 21 that size is also formed with sealing plate 45 The slot hole 45a of reciprocating motion.Sealing plate 45 is so as to move back and forth the reciprocal fortune of the position and transfer path room 21 with slot hole 45a Mode consistent the slot hole 21e that employs is installed to the side wall 21c of transfer path room 21.Move back and forth plate 41 and be mounted to covering conveyance The slot hole 45a of the reciprocating motion of the slot hole 21e and sealing plate 45 of the reciprocating motion of the side wall 21c of path room 21.Sealing Around the slot hole 45a of the reciprocating motion of plate 45 and in the face of side wall 21c sides and the face of 41 side of plate is moved back and forth formed with O shapes Ring is embedded in sealing mechanism 45b, 45b of corresponding groove.By sealing mechanism 45b, 45b of the sealing plate 45, with reciprocating motion Plate 41 closes slot hole 21e, 45a of reciprocating motion into airtight conditions.

Each bar-like member 42A to 42C is by way of being inserted into supported hole 41a by reciprocating motion plate 41 with free to slide Mode supports, supported hole 41a by plate 41 is moved back and forth along workpiece W conveyance direction only separated by positive feeding workpiece W away from From and formed.In addition, the slot hole of the reciprocating motion of the side wall 21c of each bar-like member 42A to 42C insertion transfer paths room 21 The slot hole 45a of the reciprocating motion of 21e and sealing plate 45 simultaneously extends along the direction vertical with anteroposterior direction.

Include the reciprocating mechanism 43A to 43C that each bar-like member 42A to 42C is moved back and forth：Two parallel support rods 431st, 431, bar-like member 42A's two parallel support rods 431,431 is clipped in the middle to 42C and one end is installed to reciprocating motion plate 41；Install to the parallel-plate 432 of the other end of support stick 431,431；It is located at two support sticks 431,431 in parallel-plate 432 Between position support cylinder 433.The front end of the bar 433a of cylinder 433 is protruded from parallel-plate 432, links to bar-like member The base end part of 42A to 42C.When transporting workpiece W, protruded by the bar 433a of cylinder 433, make each bar-like member 42A to 42C's Untill front end advances up to the rear positions of each workpiece W on transfer path 24.At the end of the conveyance of workpiece W, pass through circle The bar 433a of cylinder 433 retracts, and the front end of each bar-like member 42A to 42C is retreated from transfer path 24, so as to without prejudice to lifting The lifting of platform 100.

As shown in Figure 2, Figure 4 shows, include the driving mechanism 44 that reciprocating motion plate 41 moves back and forth：It is arranged on reciprocating motion plate The joint cover 442 that reciprocating motion plate 41 is linked to without bar cylinder 441, by the movable part 443 of no bar cylinder 441 of 41 top. By the only motion of retreating of movable part 443 of no bar cylinder 441 to the distance of positive feeding workpiece W, move back and forth plate 41 and move back and forth And only conveyance is just feeding the distance of workpiece W.

In addition, the lower section for moving back and forth plate 41, which is provided with support, moves back and forth the bearing 411 of plate 41, while back and forth transporting The reciprocal fortune for moving back and forth plate 41 is provided between movable plate 41 and the side wall 21c of the rear side of transfer path room 21 and room to be avoided 25 Action-oriented guide rail 412.

Then, the vacuum processing method for having used the vacuum treatment installation 10 of the present invention is said using Fig. 5 to Fig. 8 It is bright.

Fig. 5 to Fig. 8 only simplifies the transfer path room of description vacuum tank 20 in order to illustrate the method for application of vacuum is performed 21st, room 25 to be avoided, move into mouth 22, take out of mouth 23, entrance 26, lifting platform 100, carrying-station 110, take out of platform 120, and eliminate Description to other structures.

In the following description, workpiece WA is illustrated from vacuum tank 20 is moved into the operation taken out of.

First, when workpiece WA is positioned in carrying-station 110 (Fig. 5 (A)), carrying-station 110 is risen by moving-in mechanism 60 And workpiece WA is moved to the transfer path room 21 of vacuum tank 20, mouth 22 (Fig. 5 (B)) is moved into by the closing of carrying-station 110.

Then, (in this case, room 25 to be avoided and transfer path in vacuum tank 20 are set by vacuum exhaust mechanism 30 In room 21) it is vacuum state and proceeds by the processing of vacuum defoamation etc..

Workpiece WA is transported along transfer path 24 by positive feeding distance by work transporting mechanism 40 and is positioned in lifting platform 100 Workpiece support face 100a on (Fig. 5 (C)).

Then, lifting platform 100 is increased by platform elevating mechanism 50, make workpiece WA (Fig. 5 (D)) to be avoided to room 25 to be avoided. It is to be avoided since the entrance 26 of room 25 to be avoided is blocked by lifting platform 100 and closes into airtight conditions by sealing mechanism 28 Room 25 remains vacuum state.

Then, after being set as atmospheric pressure state in transfer path room 21 by vacuum exhaust mechanism 30B, by moving into machine Structure 60 declines carrying-station 110, and opening moves into mouth 22.When second workpiece WB is placed on carrying-station 110 (Fig. 6 (A)), make to remove Enter platform 110 to rise, second workpiece WB is moved to transfer path room 21 (Fig. 6 (B)).

Since transfer path room 21 is atmospheric pressure state, after moving into mouth 22 and being closed as airtight conditions, pass through vacuum Exhaust gear 30A will be set as vacuum state in vacuum tank 20 (in this case, in transfer path room 21).In room 25 to be avoided Unit one WA to be avoided continues the processing of vacuum defoamation etc. in be avoided, but can also perform and refer in room 25 to be avoided Fixed processing.

When transfer path room 21 is set as vacuum state, lifting platform 100 declines and opens wide the entrance 26 of room 25 to be avoided, Workpiece WA in be avoided is returned on the transfer path 24 of transfer path room 21 (Fig. 6 (C)).

Then, back to the unit one WA on transfer path 24 and from the second workpiece WB edge moved into mouth 22 and moved into The transfer path 24 of transfer path room 21 only transports positive feeding distance (Fig. 6 (D)).In the example shown in the series of figures, due to that can treat Keeping away room 25 makes two workpiece W to be avoided, therefore two workpiece WA, WB are positioned on lifting platform 100.

Then, lifting platform 100 is increased by platform elevating mechanism 50 and make workpiece WA, WB to 25 (Fig. 7 to be avoided of room to be avoided (A)).The entrance 26 of room 25 to be avoided is blocked by lifting platform 100 and closes into airtight conditions, room 25 to be avoided by sealing mechanism 28 Remain vacuum state.

Then, after atmospheric pressure state is set as in transfer path room 21, decline carrying-station 110 by moving-in mechanism 60 And open and move into mouth 22, when the 3rd workpiece WC is placed on carrying-station 110 (Fig. 7 (B)), carrying-station 110 is increased and by the Three workpiece WC are moved to transfer path room 21 (Fig. 7 (C)).

Since transfer path room 21 is atmospheric pressure state, after moving into mouth 22 and being closed as airtight conditions, pass through vacuum Exhaust gear 30A will be set as vacuum state in transfer path room 21.In room 25 to be avoided, two workpiece WA, WB to be avoided are to be avoided During continue the processing specified of vacuum defoamation etc..

When being set as vacuum state in transfer path room 21, lifting platform 100 declines and opens wide the entrance 26 of room 25 to be avoided, Workpiece WA, WB in be avoided are returned on the transfer path 24 of transfer path room 21 (Fig. 7 (D)).

From room 25 to be avoided back to two workpiece WA, WB on transfer path 24 and from the 3rd workpiece moved into mouth 22 and moved into WC is transported along the transfer path 24 of transfer path room 21.That is, unit one WA, which is positioned in, to take out of on platform 120, second work Part WB and the 3rd workpiece WC is positioned on lifting platform 100 (Fig. 8 (A)).

Then, lifting platform 100 is increased and make workpiece WB, WC (Fig. 8 (B)) to be avoided to room 25 to be avoided.Room 25 to be avoided goes out Entrance 26 is blocked by lifting platform 100 and closes into airtight conditions by sealing mechanism 28, and room 25 to be avoided remains vacuum state.

Then, after atmospheric pressure state is set as in transfer path room 21, decline carrying-station 110 by moving-in mechanism 60 And open and move into mouth 22, the 4th workpiece WD is placed on carrying-station 110 (Fig. 8 (C)).

Further, make to take out of mechanism 120 to decline and open and take out of mouth 23, unit one WA is taken out of from mouth 23 is taken out of. Meanwhile carrying-station 110 is increased and the 4th workpiece WD is moved to transfer path room 21 (Fig. 8 (D)).

Hereinafter, it is moved to identical in vacuum tank 20, while workpiece W is taken out of from vacuum tank 20 successively with workpiece W.

In this way, move into mouth 22, take out of mouth 23 open when, due to the workpiece being moved in vacuum tank 20 it is to be avoided Room to be avoided 25 in vacuum tank 20, therefore become and continue to be placed under vacuum state.Further, since in be avoided in room 25 to be avoided Workpiece W is to return to remove after vacuum state is in setting transfer path room 21 when returning to transfer path room 21 from room 25 to be avoided Path room 21 is sent, therefore becomes and continues to be placed under vacuum state.In this way, be moved to workpiece W in vacuum tank 20 away from It is placed under vacuum conditions during taking out of in vacuum tank 20, performs the processing specified in the meantime.

According to aforementioned structure, be generally maintained at due to being provided with vacuum tank 20 vacuum state room to be avoided 25 and The entrance 26 of the room 25 to be avoided is closed as the construction of airtight conditions, therefore is only opened and closed an entrance 26 of room 25 to be avoided i.e. Can.Therefore, be arranged for carrying out like that in transport path with the prior art room of processing specified and the room entrance and Outlet sets isolating valve to keep the situation of vacuum state to compare respectively, vacuum treatment installation 10 of the invention and application of vacuum side Method, simple structure and can improve air-tightness.

In addition, according to above-mentioned embodiment, due to making moving into mouth 22, taking out of mouth 23, room to be avoided for transfer path room 21 25 entrance 26 with carrying-station 110, take out of platform 120, the descending operation of lifting platform 100 is correspondingly closed or opened wide, therefore Construction is simplified and can realize the efficient activity of processing.

In addition, in the present invention, there is provided room 25 to be avoided, when workpiece W carrying-in/carrying-out vacuum tanks 20, makes to have existed Keep vacuum state constant to be avoided still in room 25 to be avoided in the workpiece in vacuum tank 20.Therefore, with the prior art like that in work Be configured to carry out in part W transport paths the carrying-in/carrying-out of workpiece W room and for workpiece W processing room device phase Than, it is only necessary to it is moved to room 25 to be avoided and the time of transfer path room 21 is back to from room 25 to be avoided, workpiece W configurations can be made to exist The time lengthening of vacuum state.Therefore, in the case where workpiece W coats synthetic resin, by the way that workpiece W is configured in vacuum state For more time, deaeration processing can more efficiently be performed.

An embodiment of the invention is explained above, but the invention is not restricted to the above embodiment, but can Various appropriate changes are carried out to the present invention in the case of in the scope for not departing from the present invention.

In the present embodiment, for close move into mouth 22, the sealing mechanism 111,121 that takes out of mouth 23 is separately positioned on and removes Enter platform 110, take out of above platform 120, but can also be arranged on below the bottom wall 21a of transfer path room 21 and move into mouth 22nd, take out of around mouth 23.In addition, the sealing mechanism 28 of the entrance 26 for closing room 25 to be avoided is formed in entrance 26 At the wall of surrounding, but it can also be arranged on above lifting platform 100.

Also, the distributor of the discharge of synthetic resin etc. can be installed in the top of room 25 to be avoided, in vacuum state Workpiece W discharges resin and perform application of vacuum.

Claims

1. a kind of vacuum processing method, the vacuum processing method moves into workpiece very from the mouth of moving into of workpiece to be opened/closed successively In empty container, along after being set as the transfer path conveyance workpiece of the workpiece in the vacuum tank of vacuum state, from can be opened and closed The mouth that takes out of of workpiece workpiece is taken out of outside the vacuum tank successively, it is characterised in that

Connected when the transfer path room for being provided with the transfer path in the vacuum tank and with the transfer path room And the room to be avoided for the workpiece being arranged in the vacuum tank the transfer path room one end set described in move into mouth and What the other end of the transfer path room was set take out of when being set as vacuum state before mouth opens wide, and makes the work on the transfer path Part is moved to described to be avoided indoor and the entrance closing of room to be avoided is set as air into airtight conditions, the transfer path room Pressure condition, move into described in unlimited mouth and it is described take out of after mouth performs the taking out of and move into of workpiece, moved into described in closing mouth and When taking out of mouth and being set as vacuum state in the transfer path room, the entrance of the room to be avoided is opened wide and by the room to be avoided Interior workpiece is returned on the transfer path.

A kind of 2. vacuum treatment installation, it is characterised in that including：

Vacuum tank, the vacuum tank are provided with transfer path room and the room to be avoided of workpiece, and the transfer path room has One end workpiece to be opened/closed moves into mouth, taking out of mouth and removed in the mouth of moving into described in other end workpiece to be opened/closed The transfer path of workpiece between outlet, the room to be avoided of the workpiece connect in the top of the transfer path room and transfer path room It is logical；

The vacuum tank can be switched and be set as vacuum state and atmospheric pressure by vacuum exhaust mechanism, the vacuum exhaust mechanism State；

Work transporting mechanism, the work transporting mechanism is by out of described the transfer path room moved into mouth and move into the vacuum tank Workpiece be transported to along the transfer path and described take out of mouth；With

Lifting platform, lifting platform configuration on the indoor transfer path of the transfer path and the transfer path room with Descending operation is carried out between the room to be avoided,

The lifting platform has the workpiece support face for the entrance that can close the room to be avoided in the above, in the workpiece branch The guide mechanism for the part for forming the transfer path is provided with support face, while in the discrepancy of the lifting platform Yu room to be avoided Sealing mechanism of the lifting platform by the entrance closing of room to be avoided into airtight conditions is provided between mouthful.