CN105446083A - An exposure machine having a code printing function - Google Patents
An exposure machine having a code printing function Download PDFInfo
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- CN105446083A CN105446083A CN201410428551.8A CN201410428551A CN105446083A CN 105446083 A CN105446083 A CN 105446083A CN 201410428551 A CN201410428551 A CN 201410428551A CN 105446083 A CN105446083 A CN 105446083A
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Abstract
An exposure machine having a code printing function is disclosed. The exposure machine comprises an exposure system including a light source, a mash, an objective, a substrate and a workpieces stage. The exposure machine is characterized in that the exposure machine also comprises a code printing system, the code printing system comprises a light source, a code printing system fixing module, a liquid crystal digital display module, a code printing position adjusting module and a coding and positioning software module, and the code printing system and the exposure system work simultaneously. The exposure machine can print a code onto an edge screen of each exposure field at the same time of exposure, thus significantly shortening production time for subsequent titlers, and increasing the productivity of a whole production line without equipment configuration changes of the production line.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors, particularly, relate to a kind of exposure machine with stamp function for flat display field exposure manufacture process.
Background technology
TFT(ThinFilmTransistor in flat pannel display: thin film transistor (TFT)) panel manufactures in processing procedure, and exposure machine is used for the making of TFT component graphics, and the coding of coder (Titler) each screen on panel makes.This coding is used for following the trail of the quality of each screen in subsequent production manufacture process.Produce on line at the ground floor graphic making of TFT panel manufacture and be all furnished with exposure machine and coder.
The market demand of current mobile phone screen is very large, and in many, large TFT from generation to generation produces line and starts to turn and do undersized mobile phone screen, and like this, the number of screen that the glass substrate of same generation makes can increase greatly, and therefore, the production capacity of coder is obviously not enough.
At present in order to not increase stamp equipment, need not improve and produce line cost and the configuration of transformation product line, the many employings of current practice arrange the coding that coder only beats part of screen, reduce the time of substrate stamp, to produce line improving productive rate, complete production capacity.This approach increases the abnormal difficulty of following the trail of of product, improve difficulty during product anomaly analysis, the product quality tracing risk of product line is improved.
Summary of the invention
The object of the invention is to propose a kind of exposure machine that can realize stamp in exposure process, in the process that can make at TFT component graphics, do not affect productive rate, occupying volume does not produce line manufacturing time outward, the coding of the edge screen of each exposure field is made, the pitch time of follow-up coder can be greatly reduced like this, thus greatly improve productive rate, cost increases the price much smaller than increasing stamp equipment simultaneously, produces line configuration and is not used as any transformation.
The present invention discloses a kind of exposure machine with stamp function, comprise the exposure system be made up of light source, mask, object lens, substrate and work stage, it is characterized in that: also comprise stamp system, described stamp system comprises light source, stamp system stuck-module, liquid crystal digital display mask module, stamp position adjusting type modules and coding, positioning software module; Described stamp system and described exposure system work simultaneously.
Further, described stamp system stuck-module comprises framework and guide rail, and described liquid crystal digital display mask module is fixed on described guide rail, and moves along described guide rail parallel in described work stage.
Further, described stamp system is fixed on described object lens both sides.
Further, described stamp system is fixed on the framework above described work stage.
Further, also comprise spectral module, make described stamp system and described exposure system common light source.
Further, described spectral module comprises semi-transparent semi-reflecting prism and catoptron.
Further, described coding, positioning software module carry out calculating that the setting of exposure field order, the setting of guide rail movement speed and adjustment, liquid crystal digital show and input, the input of stamp coordinate and calculating.
Further, in described exposure, stamp process, the described liquid crystal digital display motion of mask and the Motion Parallel of substrate.
The exposure function that this patent is announced carries out the stamp of each exposure field edge screen in the process of exposure simultaneously, can be evident as follow-up coder and shorten the production time, so that whole piece produces line improve production capacity, does not change the configuration of producing line equipment simultaneously.
Accompanying drawing explanation
Can be further understood by following detailed Description Of The Invention and institute's accompanying drawings about the advantages and spirit of the present invention.
Fig. 1 is the exposure machine structure schematic diagram that the present invention has stamp function;
Fig. 2 is the vertical view that the present invention has the stamp system of the exposure machine of stamp function;
Fig. 3 is exposure of the present invention, stamp schematic diagram;
Fig. 4 is light-dividing device structural representation in another embodiment of the present invention.
Embodiment
Specific embodiments of the invention are described in detail below in conjunction with accompanying drawing.
As shown in Figure 1, the exposure machine that the present invention has a stamp function comprises and forms exposure system, for substrate graph exposure by light source 1, mask 2, object lens 3, substrate 4 and work stage 5.Also comprise by light source 6, stamp system stuck-module 7, liquid crystal digital display mask 8, stamp position adjusting type modules 9 and coding, positioning software module composition stamp system, for stamp in exposure process.Stamp system and exposure system work simultaneously.Stamp system stuck-module 7 is fixedly mounted on the both sides of object lens 3 lens barrel, as shown in Figure 2, comprise framework 10 and guide rail 11, liquid crystal digital display mask 8 is fixed on guide rail 11, guide rail 11 can carry liquid crystal digital display mask 8 and do the motion being parallel to base plate exposure direction of scanning, can realize accelerating, slow down or uniform motion.Liquid crystal digital display mask 8 realizes the display of dynamic numerical coding by the coding of equipment, positioning software system, when different screen stamps, can realize different coding displays.Coding, positioning software system can realize the calculating of each screen different coding and provide, the input of coding site coordinate and calculating, and the calculating of guide rail movement speed and adjustment.
Fig. 3 is exposure of the present invention, stamp schematic diagram.As shown in Figure 3, the microscope carrier of exposure machine carries glass substrate such as direction as shown and moves, and exposure machine starts the exposure carrying out each exposure field 15 as shown in the figure simultaneously.When each exposure field 15 exposes, lens barrel and object lens 3 motionless, mask 2 does relative scanning motion with underlying workpiece platform 5.Meanwhile, guide rail 11 carries the motion that liquid crystal digital display mask 8 carries out being parallel to substrate, and movement velocity can control.When on coding 16 to be exposed on exposure field by light source 6 edge screen 17 by mask 8, the speed that guide rail 11 moves is consistent with the movement velocity of below glass substrate 4.The position that adjustment optical system 9 in stamp position can calculate according to software systems adjusts, and the figure of coding 16 is positioned at desired location accurately.
In another embodiment of the present invention, stamp system also can be installed on the framework above work stage.Exposure system and stamp system can common light source, as shown in Figure 4.The light source 1 of exposure machine, through spectral module 12, makes described stamp system and described exposure system common light source.Spectral module 12 can be semi-transparent semi-reflecting prism 13 and catoptron 14.
The technological process of exposure of the present invention and stamp is as follows: when a slice glass substrate enters exposure machine, after substrate carries out routine contraposition adjustment, starts to carry out by field exposure process, and exposure is that the order of the exposure field 15 provided according to software is carried out.When starting to expose in each field, stamp device is also ready.When starting then and there to carry out scan exposure, guide rail carries liquid crystal digital display mask and arrives first required stamp position by certain speed and carry out exposure stamp, and in stamp process, mask motion is parallel with substrate motion and speed is consistent.Then guide rail carries mask and arrives second stamp position and carry out stamp, is completed stamp position needed for edge successively.Mask motion speed can be arranged in software, so that stamp temporal summation all in field controlled in time of completing an exposure field.
Just preferred embodiment of the present invention described in this instructions, above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (8)
1. one kind has the exposure machine of stamp function, comprise the exposure system be made up of light source, mask, object lens, substrate and work stage, it is characterized in that: also comprise stamp system, described stamp system comprises light source, stamp system stuck-module, liquid crystal digital display mask module, stamp position adjusting type modules and coding, positioning software module; Described stamp system and described exposure system work simultaneously.
2. there is the exposure machine of stamp function as claimed in claim 1, it is characterized in that: described stamp system stuck-module comprises framework and guide rail, described liquid crystal digital display mask module is fixed on described guide rail, and moves along described guide rail parallel in described work stage.
3. there is the exposure machine of stamp function as claimed in claim 1, it is characterized in that: described stamp system is fixed on described object lens both sides.
4. there is the exposure machine of stamp function as claimed in claim 1, it is characterized in that: described stamp system is fixed on the framework above described work stage.
5. there is the exposure machine of stamp function as claimed in claim 1, it is characterized in that: also comprise spectral module, make described stamp system and described exposure system common light source.
6. there is the exposure machine of stamp function as claimed in claim 5, it is characterized in that: described spectral module comprises semi-transparent semi-reflecting prism and catoptron.
7. there is the exposure machine of stamp function as claimed in claim 1, it is characterized in that: described coding, positioning software module carry out calculating that the setting of exposure field order, the setting of guide rail movement speed and adjustment, liquid crystal digital show and input, the input of stamp coordinate and calculating.
8. have the exposure machine of stamp function as claimed in claim 1, it is characterized in that: in described exposure, stamp process, the described liquid crystal digital display motion of mask is with the Motion Parallel of substrate and speed is consistent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410428551.8A CN105446083B (en) | 2014-08-28 | 2014-08-28 | It is a kind of that there is the exposure machine of stamp |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410428551.8A CN105446083B (en) | 2014-08-28 | 2014-08-28 | It is a kind of that there is the exposure machine of stamp |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105446083A true CN105446083A (en) | 2016-03-30 |
| CN105446083B CN105446083B (en) | 2018-05-04 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410428551.8A Active CN105446083B (en) | 2014-08-28 | 2014-08-28 | It is a kind of that there is the exposure machine of stamp |
Country Status (1)
| Country | Link |
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| CN (1) | CN105446083B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106773520A (en) * | 2016-12-30 | 2017-05-31 | 武汉华星光电技术有限公司 | A kind of mask plate, controller and the method for entering Mobile state stamp using mask plate |
| CN109041441A (en) * | 2018-09-14 | 2018-12-18 | 东莞市多普光电设备有限公司 | A kind of pcb board batch management exposure method and its exposure sources |
| CN110842375A (en) * | 2019-11-15 | 2020-02-28 | Tcl华星光电技术有限公司 | Code printing device, manufacturing method and display device |
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| US20040112879A1 (en) * | 2002-12-16 | 2004-06-17 | Masaki Mori | Identification-code laser marking method and apparatus |
| CN101121221A (en) * | 2006-08-09 | 2008-02-13 | 株式会社迪思科 | Laser beam irradiation apparatus and laser working machine |
| CN101833201A (en) * | 2009-03-12 | 2010-09-15 | 北京京东方光电科技有限公司 | Method for marking sequence number of scanning lines and mask plate |
| CN103324037A (en) * | 2013-07-04 | 2013-09-25 | 北京京东方光电科技有限公司 | Exposure device and method |
| CN103969943A (en) * | 2013-01-25 | 2014-08-06 | 北京京东方光电科技有限公司 | Method for marking substrate |
-
2014
- 2014-08-28 CN CN201410428551.8A patent/CN105446083B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040112879A1 (en) * | 2002-12-16 | 2004-06-17 | Masaki Mori | Identification-code laser marking method and apparatus |
| CN101121221A (en) * | 2006-08-09 | 2008-02-13 | 株式会社迪思科 | Laser beam irradiation apparatus and laser working machine |
| CN101833201A (en) * | 2009-03-12 | 2010-09-15 | 北京京东方光电科技有限公司 | Method for marking sequence number of scanning lines and mask plate |
| CN103969943A (en) * | 2013-01-25 | 2014-08-06 | 北京京东方光电科技有限公司 | Method for marking substrate |
| CN103324037A (en) * | 2013-07-04 | 2013-09-25 | 北京京东方光电科技有限公司 | Exposure device and method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106773520A (en) * | 2016-12-30 | 2017-05-31 | 武汉华星光电技术有限公司 | A kind of mask plate, controller and the method for entering Mobile state stamp using mask plate |
| CN109041441A (en) * | 2018-09-14 | 2018-12-18 | 东莞市多普光电设备有限公司 | A kind of pcb board batch management exposure method and its exposure sources |
| CN110842375A (en) * | 2019-11-15 | 2020-02-28 | Tcl华星光电技术有限公司 | Code printing device, manufacturing method and display device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105446083B (en) | 2018-05-04 |
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Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Applicant after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Applicant before: Shanghai Micro Electronics Equipment Co., Ltd. |
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