CN105446083B - It is a kind of that there is the exposure machine of stamp - Google Patents
It is a kind of that there is the exposure machine of stamp Download PDFInfo
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- CN105446083B CN105446083B CN201410428551.8A CN201410428551A CN105446083B CN 105446083 B CN105446083 B CN 105446083B CN 201410428551 A CN201410428551 A CN 201410428551A CN 105446083 B CN105446083 B CN 105446083B
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Abstract
The present invention, which discloses, a kind of has the function of the exposure machine of stamp, including the exposure system being made of light source, mask, object lens, substrate and work stage, it is characterised in that：Stamp system is further included, the stamp system includes light source, stamp system fixed module, and liquid crystal digital shows mask module, stamp position adjusting type modules and coding, positioning software module；The stamp system is worked at the same time with the exposure system.The exposure function of the present invention is carried out at the same time the stamp of each exposure field edge screen during exposure, can be evident as follow-up coder and shorten the production time, so that whole producing line improves production capacity, while does not change the configuration of producing line equipment.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors, and in particular, to one kind is used for flat display field exposure manufacture process
There is the exposure machine of stamp.
Background technology
In the TFT of FPD（Thin Film Transistor：Thin film transistor (TFT)）In panel manufacture processing procedure, exposure machine
For the making of TFT component graphics, and coder（Titler）The coding of each screen makes on panel.This coding is used
In the quality tracking in subsequent production manufacturing process to each screen.In the first layer graphic making producing line of TFT panel manufacture
On be equipped with exposure machine and coder.
The market demand of mobile phone screen is very big at present, and the TFT producing lines of big generation start to turn the mobile phone for doing small size in many
Screen, so since, the number of screen made on the glass substrate of same generation can greatly increase, therefore, the production capacity of coder
Obvious deficiency.
Currently in order to not increasing stamp equipment, without improving producing line cost and transformation producing line configuration, current practice uses more
Set coder only to beat the coding of part of screen, to reduce the time of substrate stamp, so that producing line improves yield, complete production capacity.
This approach increases the difficulty that product is followed the trail of extremely, improves difficulty during product anomaly analysis, makes the product quality of producing line
Risk is followed the trail of to improve.
The content of the invention
, can be in TFT device figures it is an object of the invention to propose a kind of exposure machine that stamp can be realized in exposure process
During shape is made, yield is not influenced, is not take up extra producing line manufacturing time, by the coding of the edge screen of each exposure field
Make, can so greatly reduce the pitch time of follow-up coder, so that yield is greatly improved, while cost increase is remote small
In the price of increase stamp equipment, producing line configuration is not used as any transformation.
The present invention disclose it is a kind of there is the exposure machine of stamp, including by light source, mask, object lens, substrate and workpiece
The exposure system of platform composition, it is characterised in that：Stamp system is further included, the stamp system includes light source, and stamp system is fixed
Module, liquid crystal digital show mask module, stamp position adjusting type modules and coding, positioning software module；The stamp system
Worked at the same time with the exposure system.
Further, the stamp system fixed module includes frame and guide rail, and the liquid crystal digital shows mask mould
Block is fixed on the guide rail, and is moved along the guide rail parallel in the work stage.
Further, the stamp system is fixed on the object lens both sides.
Further, the stamp system is fixed on the frame above the work stage.
Further, spectral module is further included, makes the stamp system and the exposure system common light source.
Further, the spectral module includes semi-transparent semi-reflecting prism and speculum.
Further, the coding, positioning software module are exposed the setting of field sequence, guide rail movement velocity is set
Put and adjust, calculating and input, the input of stamp coordinate and the calculating that liquid crystal digital is shown.
Further, during the exposure, stamp, the liquid crystal digital shows the movement of mask and the movement of substrate
It is parallel.
The exposure function that this patent is announced is carried out at the same time the stamp of each exposure field edge screen during exposure, can
It is evident as follow-up coder and shortens the production time, so that whole producing line improves production capacity, while does not change the configuration of producing line equipment.
Brief description of the drawings
It can be obtained further by following detailed description of the invention and institute's accompanying drawings on the advantages and spirit of the present invention
Solution.
Fig. 1 has the function of the exposure machine structure schematic diagram of stamp for the present invention；
Fig. 2 has the function of the top view of the stamp system of the exposure machine of stamp for the present invention；
Fig. 3 is present invention exposure, stamp schematic diagram；
Fig. 4 is light-dividing device structure diagram in another embodiment of the present invention.
Embodiment
The specific embodiment that the invention will now be described in detail with reference to the accompanying drawings.
As shown in Figure 1, the present invention have the function of the exposure machine of stamp including by light source 1, mask 2, object lens 3, substrate 4 and
Work stage 5 forms exposure system, for substrate graph exposure.Further include by light source 6, stamp system fixed module 7, liquid crystal digital
Mask 8, stamp position adjusting type modules 9 and coding, the stamp system of positioning software module composition are shown, in exposure process
Middle stamp.Stamp system is worked at the same time with exposure system.Stamp system fixed module 7 is fixedly mounted on the both sides of 3 lens barrel of object lens,
As shown in Fig. 2, including frame 10 and guide rail 11, liquid crystal digital shows that mask 8 is fixed on guide rail 11, and guide rail 11 can carry liquid
Brilliant numerical monitor mask 8 does the movement parallel to base plate exposure scanning direction, it can be achieved that accelerating, deceleration or uniform motion.Liquid crystal
Numerical monitor mask 8 can realize that dynamic digital coding is shown by the coding of equipment, positioning software system, in different screens
During stamp, it can realize that different codings is shown.Coding, positioning software system can realize each screen different coding calculating and to
Go out, the input and calculating of coding site coordinate, and the calculating and adjusting of guide rail movement velocity.
Fig. 3 is present invention exposure, stamp schematic diagram.As shown in figure 3, the microscope carrier of exposure machine carries glass substrate side as shown
To movement, while exposure machine proceeds by the exposure of each exposure field 15 as shown in the figure.When each exposure field 15 exposes, lens barrel
And its object lens 3 are motionless, mask 2 and underlying workpiece platform 5 make opposite scanning motion.At the same time, guide rail 11 carries liquid crystal digital
Display mask 8 carries out the movement parallel to substrate, and movement velocity can control.When light source 6 is exposed on by mask 8 by encoding 16
When on the edge screen 17 of exposure field, the speed that guide rail 11 moves is consistent with the movement velocity of lower section glass substrate 4.Stamp position
Adjustment optical system 9 can be adjusted according to the position that software systems calculate, and the figure for encoding 16 is accurately positioned at institute
Need position.
In another embodiment of the present invention, stamp system is also mountable on the frame above work stage.Exposure system
System and stamp system can be with common light sources, as shown in Figure 4.The light source 1 of exposure machine passes through spectral module 12, makes the stamp system
With the exposure system common light source.Spectral module 12 can be semi-transparent semi-reflecting prism 13 and speculum 14.
The exposure of the present invention and the technical process of stamp are as follows：When a piece of glass substrate enters exposure machine, substrate carries out
After routine contraposition adjustment, proceed by by field exposure process, exposure is that the order of the exposure field 15 provided according to software carries out
's.When starting exposure in each field, stamp device is ready for ready.Interior when proceeding by scan exposure on the spot, guide rail carries
Liquid crystal digital shows that mask reaches first required stamp position by certain speed and is exposed stamp, mask during stamp
It is consistent to move and speed parallel with substrate motion.Then guide rail carries mask and reaches second stamp position progress stamp, successively
Stamp position needed for edge is completed.Mask motion speed can be set in software, so as to stamp temporal summation all in field
Control within the time that an exposure field is completed.
The preferred embodiment of the simply present invention described in this specification, above example is only illustrating the present invention
Technical solution rather than limitation of the present invention.All those skilled in the art pass through logic analysis, reasoning under this invention's idea
Or the limited available technical solution of experiment, all should be within the scope of the present invention.
Claims (6)
1. a kind of have the function of the exposure machine of stamp, including the exposure being made of light source, mask, object lens, substrate and work stage
System, it is characterised in that：Stamp system is further included, the stamp system includes light source, stamp system fixed module, liquid crystal digital
Show mask module, stamp position adjusting type modules and coding, positioning software module；The stamp system fixed module includes frame
Frame and guide rail, the liquid crystal digital show that mask module is fixed on the guide rail, and guide rail, which can carry liquid crystal digital and show, to be covered
Mould module does the movement parallel to base plate exposure scanning direction；The stamp system is worked at the same time with the exposure system；Exposure,
During stamp, the liquid crystal digital shows that the movement of mask is consistent with the Motion Parallel and speed of substrate.
2. there is the exposure machine of stamp as claimed in claim 1, it is characterised in that：The stamp system is fixed on described
Object lens both sides.
3. there is the exposure machine of stamp as claimed in claim 1, it is characterised in that：The stamp system is fixed on described
Frame above work stage.
4. there is the exposure machine of stamp as claimed in claim 1, it is characterised in that：Spectral module is further included, is made described
Stamp system and the exposure system common light source.
5. there is the exposure machine of stamp as claimed in claim 4, it is characterised in that：The spectral module includes semi-transparent half
Anti- prism and speculum.
6. there is the exposure machine of stamp as claimed in claim 1, it is characterised in that：The coding, positioning software module
The setting of field sequence, the calculating that the setting of guide rail movement velocity is shown with adjustment, liquid crystal digital and input, stamp is exposed to sit
Target is inputted and calculated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410428551.8A CN105446083B (en) | 2014-08-28 | 2014-08-28 | It is a kind of that there is the exposure machine of stamp |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410428551.8A CN105446083B (en) | 2014-08-28 | 2014-08-28 | It is a kind of that there is the exposure machine of stamp |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105446083A CN105446083A (en) | 2016-03-30 |
| CN105446083B true CN105446083B (en) | 2018-05-04 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410428551.8A Active CN105446083B (en) | 2014-08-28 | 2014-08-28 | It is a kind of that there is the exposure machine of stamp |
Country Status (1)
| Country | Link |
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| CN (1) | CN105446083B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106773520A (en) * | 2016-12-30 | 2017-05-31 | 武汉华星光电技术有限公司 | A kind of mask plate, controller and the method for entering Mobile state stamp using mask plate |
| CN109041441A (en) * | 2018-09-14 | 2018-12-18 | 东莞市多普光电设备有限公司 | A kind of pcb board batch management exposure method and its exposure sources |
| CN110842375B (en) * | 2019-11-15 | 2022-03-08 | Tcl华星光电技术有限公司 | Code printing block of display screen, code printing method and display device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101121221A (en) * | 2006-08-09 | 2008-02-13 | 株式会社迪思科 | Laser beam irradiation apparatus and laser working machine |
| CN101833201A (en) * | 2009-03-12 | 2010-09-15 | 北京京东方光电科技有限公司 | Method for marking sequence number of scanning lines and mask plate |
| CN103324037A (en) * | 2013-07-04 | 2013-09-25 | 北京京东方光电科技有限公司 | Exposure device and method |
| CN103969943A (en) * | 2013-01-25 | 2014-08-06 | 北京京东方光电科技有限公司 | Method for marking substrate |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004200221A (en) * | 2002-12-16 | 2004-07-15 | Toray Eng Co Ltd | Laser marking method and device thereof |
-
2014
- 2014-08-28 CN CN201410428551.8A patent/CN105446083B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101121221A (en) * | 2006-08-09 | 2008-02-13 | 株式会社迪思科 | Laser beam irradiation apparatus and laser working machine |
| CN101833201A (en) * | 2009-03-12 | 2010-09-15 | 北京京东方光电科技有限公司 | Method for marking sequence number of scanning lines and mask plate |
| CN103969943A (en) * | 2013-01-25 | 2014-08-06 | 北京京东方光电科技有限公司 | Method for marking substrate |
| CN103324037A (en) * | 2013-07-04 | 2013-09-25 | 北京京东方光电科技有限公司 | Exposure device and method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105446083A (en) | 2016-03-30 |
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Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Applicant after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Applicant before: Shanghai Micro Electronics Equipment Co., Ltd. |
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