CN105435600A - Pollution gas purification system and purification method - Google Patents
Pollution gas purification system and purification method Download PDFInfo
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- CN105435600A CN105435600A CN201510945916.9A CN201510945916A CN105435600A CN 105435600 A CN105435600 A CN 105435600A CN 201510945916 A CN201510945916 A CN 201510945916A CN 105435600 A CN105435600 A CN 105435600A
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- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
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- B01D53/34—Chemical or biological purification of waste gases
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- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
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- B01D53/34—Chemical or biological purification of waste gases
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Abstract
The invention provides a pollution gas purification system and purification method, and particularly, relates to the purification system and purification method for gas containing H2S and other sulfur compounds, NH3, trimethylamine and other amines, and VOCs and other harmful components. The pollution gas purification system includes a chemical looping combustion reactor, adsorption towers, gas pipelines, a pressure gauge, a pressure regulating valve, a fan, a heater, electric valves and three-way valves, the chemical looping combustion reactor is filled with an oxygen carrier, and the adsorption towers are filled with adsorbents. The pollution gas purification method comprises the processes of adsorption, heating, desorption, reduction, oxidation and the like. The pollution gas purification system allows a temperature swing adsorption principle and a chemical looping combustion principle to be organically combined and to be applied to the treatment of the pollution gas, thereby achieving desulfurization of the sulfur compounds, denitrification of the NH3 and amines, and decomposition of the VOCs with high efficiency and low energy consumption.
Description
Technical field
The present invention relates to a kind of gas purge system, particularly relate to a kind of cleaning system and method for dusty gas Temp .-changing adsorption principle combined with burning chemistry chains principle.
Background technology
Refuse landfill, chemical plant, the places such as coating factory, often need to arrange corresponding gas cleaning plant, with process that it produces containing H
2the sulphur compounds such as S, NH
3and the foul gas of the amine such as trimethylamine, butanediamine or containing the waste gas of the VOCs such as triphen, formaldehyde.In addition, the unstripped gas such as rubbish landfill gas, mine gas, coke-stove gas, also need to purify preconditioning technique accordingly, to remove H wherein
2s, NH
3, the harmful components such as naphthalene.
At present, the gas purification technique be most widely used is Temp .-change adsorptive process and Temp .-changing adsorption-Production by Catalytic Combustion Process.Temp .-change adsorptive process needs to carry out desorption and regeneration after adsorbent is saturated, desorption H out
2s, NH
3deng secondary pollution can be caused to environment, thus still need harmless treatment.And when being used for raw material gas purifying, usually a part for Purge gas is used as desorption gas, thus the yield of Purge gas is caused to reduce.Temp .-changing adsorption-Production by Catalytic Combustion Process utilizes hot-air or steam to carry out desorption and regeneration to adsorption tower, and desorption gas imports catalytic combustor and carries out catalytic combustion process.Although this technology solves secondary pollution problem, also there is weak point.Such as, H is contained in process
2during the gas of the sulphur compounds such as S, there is catalyst sulfur poisoning and cause catalytic activity to reduce.At process NH
3or during amine, particularly there iing O
2coexist in case, need strict Controlling Technology condition, otherwise a large amount of NO can be produced
x, cause the selective decline of denitrogenation.In addition, when adopting the heat medium beyond steam to carry out desorption, adsorbate heated medium diluted, and causes the calorific value of desorption gas to decline, and thus needs to provide combustion-supporting fuel to catalytic burner, causes energy consumption to increase.
Comprehensively above-mentioned to containing H
2the sulphur compounds such as S, NH
3, the harmful components such as amine and VOCs such as trimethylamine the prior art of dusty gas purification, there is processing procedure loaded down with trivial details, treatment conditions require strict, easily produce a large amount of NO
x, easily there is catalyst sulfur poisoning, easily cause Purge gas yield low, the problems such as energy consumption is high.
Summary of the invention
In order to solve above-mentioned prior art Problems existing, the present invention proposes a kind of cleaning system and purification method of dusty gas, particularly for containing low concentration H
2s, NH
3, the harmful components such as amine and VOCs dusty gas, technical problem to be solved is in the processing procedure of dusty gas, there is not the sulfur poisoning of catalyst, can not produce NO
x, treatment conditions are easy to control, and energy consumption is low, thus is more suitable for practicality.
The object of the invention to solve the technical problems realizes by the following technical solutions.
The cleaning system of a kind of dusty gas proposed according to the present invention, is characterized in that: described cleaning system comprises burning chemistry chains reactor, the 1st adsorption tower, dusty gas pipeline, air duct, Purge gas pipeline, reduction reaction product gas pipeline, oxidation reaction product gas pipeline, desorption gas circulating line, circulating fan, burning chemistry chains reactor pressure meter and pressure-regulating valve and motor-driven valve group; Desorption gas circulating line is provided with heater; Be filled with oxygen carrier in described burning chemistry chains reactor, be filled with adsorbent in adsorption tower, described dusty gas contains H
2the sulphur compounds such as S, NH
3, one or more harmful components in the volatile organic matter such as amine and dimethylbenzene such as trimethylamine.
The object of the invention to solve the technical problems also can be applied to the following technical measures to achieve further.
Preferably, the cleaning system of aforesaid dusty gas, wherein said oxygen carrier is the one or more kinds of mixtures of copper base load oxysome, iron-based oxygen carrier or Ni-based oxygen carrier, and described adsorbent is one or more mixture of active carbon, silica gel, activated alumina or molecular sieve.
Preferably, the cleaning system of aforesaid dusty gas, the active material of wherein said copper base load oxysome is CuO, and carrier is Al
2o
3, SiO
2or TiO
2in one or more kinds of mixtures; The active material of described iron-based oxygen carrier is Fe
2o
3, carrier is Al
2o
3, SiO
2or TiO
2in one or more kinds of mixtures; The active material of described Ni-based oxygen carrier is NiO, and carrier is Al
2o
3, SiO
2or TiO
2in one or more kinds of mixtures.
Preferably, the cleaning system of aforesaid dusty gas, wherein said cleaning system also comprises the 2nd adsorption tower, and the transfer valve group of the 1st adsorption tower and the 2nd adsorption tower.
Preferably, the cleaning system of aforesaid dusty gas, wherein said cleaning system also comprises sulfur dioxide capturing device, and described sulfur dioxide capturing device is arranged on oxidation reaction gas pipeline.
Preferably, the cleaning system of aforesaid dusty gas, wherein said sulfur dioxide capturing device is make the dry desulfurization device of desulfurizing agent, the wet desulphurization device making desulfurizing agent with limestone/lime slurries or concentrated sulfuric acid process units with calcium oxide.
Preferably, the cleaning system of aforesaid dusty gas, wherein said cleaning system also comprises oxygen rich gas pipeline or pure oxygen gas pipeline.
The object of the invention to solve the technical problems also adopts following technical scheme to realize.
The purification method of a kind of dusty gas proposed according to the present invention, adopts the cleaning system of above-mentioned dusty gas, it is characterized in that: comprise,
(1) adsorb.Dusty gas enters in the 1st described adsorption tower, and the harmful components in described dusty gas are by the 1st described absorption tower adsorbs;
(2) heat.When harmful components concentration reaches setting value in the Purge gas of the 1st described adsorption column outlet, desorption gas is circulated between the 1st adsorption tower, burning chemistry chains reactor, and heats;
(3) desorption.When the temperature of described desorption gas and the 1st adsorption tower reaches setting value, described harmful components from the 1st adsorption tower by desorption out;
(4) reduce.Burning chemistry chains comprises the reduction process of oxidation state oxygen carrier and the oxidative regeneration process of reduction-state oxygen carrier.When the temperature of burning chemistry chains reactor reaches setting value, described by the oxidation state oxygen carrier generation reduction reaction in desorption harmful components out and described burning chemistry chains reactor, oxidation state oxygen carrier is converted into reduction-state oxygen carrier or metal sulfide; Regulate pressure, make the maintain constant pressure of described burning chemistry chains reactor;
(5) be oxidized.When harmful components concentration in the desorption gas at the 1st described adsorption column outlet place is reduced to setting value, make the 1st adsorption tower cooling.Open air duct or oxygen rich gas pipeline or purity oxygen pipeline valve, reduction-state oxygen carrier in described burning chemistry chains reactor or metal sulfide and oxygen generation oxidation regeneration react, and make the oxygen concentration in the gaseous product of described oxidation regeneration reaction reach setting value.
Preferably, the purification method of aforesaid dusty gas, when in the Purge gas of the 1st described adsorption column outlet, harmful components concentration reaches setting value, described dusty gas is made to enter in the 2nd described adsorption tower, meanwhile, carry out described heating, desorption, reduction and oxidizing process, when harmful components concentration reaches setting value in the Purge gas of the 2nd described adsorption column outlet, described dusty gas is entered in the 1st described adsorption tower, enters next circulation.
Preferably, the purification method of aforesaid dusty gas, also comprises, and makes the reaction product gas of described oxidation regeneration enter described sulfur dioxide capturing device.
Preferably, the purification method of aforesaid dusty gas, the desorption temperature of the wherein said adsorption tower described in step (3) is 100 ~ 300 DEG C; The temperature of the reduction reaction described in step (4) is 200 ~ 500 DEG C; The temperature of the oxidation regeneration reaction described in step (5) is 150 ~ 500 DEG C.
By technique scheme, cleaning system and the purification method of dusty gas of the present invention at least have following advantages:
(1) energy consumption is low.Desorption process and reduction process adopt the mode being come heating adsorption agent and oxygen carrier by the gas in closed cycle adsorption tower, avoid the thermal loss taken away when a large amount of desorption gas leaves system, and the reduction reaction of Cu base load oxysome and harmful components is exothermic reaction, heat is that self is used, and thus the energy consumption of desorption process and reduction process is low;
(2) the sulphur trapping of sulphur compound can be realized.In reduction process, H
2sulphur in the sulphur compounds such as S is captured down with the form of metal sulfide.In oxidative regeneration process then, SO can be realized by passing into oxygen enrichment
2enrichment method, thus cost and the energy consumption of follow-up dry method or wet desulfurizing process can be saved.If pass into pure oxygen, pure SO can be obtained
2, can the concentrated sulfuric acid etc. be translated into, thus realize SO
2effective utilization;
(3) the selective height of ammonia and amine denitrogenation, denitrification effect is remarkable.For containing O simultaneously
2ammonia and the denitrogenation of amine, adsorption process can realize ammonia, amine and O
2separation, then there is no O
2under the condition coexisted, in burning chemistry chains reactor, realize the denitrogenation of ammonia and amine.With O
2cross strong oxidability to compare, the oxidation state of the oxygen carriers such as copper base has strong and weak suitable oxidability, can by NH
3be oxidized to the nitrogen of zeroth order with the nitrogen in amine, and be difficult to be further oxidized to the NO of positive divalence or the NO of positive tetravalence
2, thus denitrogenation is effective, selective height;
(4) harmful components total emission volumn is few.Because the emission flow of reduzate gas and oxidation product gas is more much smaller than existing process for purifying, so the total emission volumn of harmful components residual in emission gases is considerably less;
(5) different from Production by Catalytic Combustion Process, can not there is sulfur poisoning in oxygen carrier.The active component metal oxide of oxygen carrier is a large amount of, although in course of reaction meeting and H
2s etc. generate metal sulfide, but again can be converted into metal oxide in oxidation regeneration reaction subsequently, thus there is not the problem of oxygen carrier sulfur poisoning.
Above-mentioned explanation is only the general introduction of technical solution of the present invention, in order to better understand technological means of the present invention, and can be implemented according to the content of description, coordinates accompanying drawing to be described in detail as follows below with preferred embodiment of the present invention.
Accompanying drawing explanation
Fig. 1 is the cleaning system schematic diagram of the dusty gas of the embodiment of the present invention 1.
Fig. 2 is the cleaning system schematic diagram of the dusty gas of the embodiment of the present invention 2.
Fig. 3 is the cleaning system schematic diagram of the dusty gas of the embodiment of the present invention 3.
Fig. 4 is the schematic diagram of the cleaning system of embodiment of the present invention 4-7 dusty gas.
Detailed description of the invention
For further setting forth the present invention for the technological means reaching predetermined goal of the invention and take and effect, below in conjunction with accompanying drawing and preferred embodiment, to cleaning system and its detailed description of the invention of purification method, structure, feature and effect thereof of a kind of dusty gas proposed according to the present invention, be described in detail as follows.In the following description, the not necessarily same embodiment that different " embodiment " or " embodiment " refers to.In addition, special characteristic, structure or feature in one or more embodiment can be combined by any suitable form.
Embodiment 1
Please refer to Fig. 1.The cleaning system of the dusty gas described in the present embodiment comprises: the burning chemistry chains reactor 101 being filled with oxygen carrier 103, be filled with the adsorption tower 102 of adsorbent 104, dusty gas pipeline 105, air duct 106, Purge gas pipeline 107, reduction reaction product gas pipeline 108, oxidation reaction product gas pipeline 109, desorption gas circulating line 110, circulating fan 111 and motor-driven valve group 113 ~ 117, and burning chemistry chains reactor pressure control valve 112 is set on reduction reaction product gas pipeline 108, desorption gas circulating line 110 between circulating fan 111 and burning chemistry chains reactor 101 is provided with heater 118.
The oxygen carrier that the present embodiment adopts is copper base load oxysome, and its active material is CuO, and carrier is Al
2o
3; The adsorbent adopted is active carbon.
Dusty gas enters adsorption tower 102 through dusty gas pipeline 105 and carries out adsorption cleaning process.Sulphur compound in dusty gas, NH
3, the harmful components such as amine and volatile organic matter are adsorbed by adsorbent 104 at normal temperatures, Purge gas is discharged from Purge gas pipeline 107.
When the adsorbent 104 in adsorption tower 102 adsorbs saturated, the total concentration of the harmful components namely in Purge gas reaches setting value 10mg/m
3time, close the motor-driven valve 113 and 114 on dusty gas pipeline 105 and Purge gas pipeline 107, open the motor-driven valve 115 on desorption gas circulating line 110, start circulating fan 111, desorption gas is circulated between adsorption tower 102, desorption gas circulating line 110, heater 118, burning chemistry chains reactor 101, starts heater 118 pairs of desorption gas simultaneously and heat.When adsorption tower is heated to 100 DEG C, described harmful components from adsorbent desorption out.
When burning chemistry chains reactor 101 is heated to 200 DEG C, the oxidation state oxygen carrier in desorption harmful components out and burning chemistry chains reactor 101 carries out reduction reaction, wherein H
2s and oxidation state oxygen carrier react and generate solid metallic sulfide and steam; Sulphur compound and oxidation state oxygen carrier react and generate solid metallic sulfide, steam and carbon dioxide; NH
3react with oxidation state oxygen carrier and generate nitrogen and steam; Amine and oxidation state oxygen carrier react and generate nitrogen, steam and carbon dioxide; Volatile organic matter and oxidation state oxygen carrier water generation reaction steam and carbon dioxide; Meanwhile, oxidation state oxygen carrier is converted into reduction-state oxygen carrier; Regulate described burning chemistry chains reactor pressure control valve 112, a part for the desorption gas that burning chemistry chains reactor 101 is exported is discharged from reduction reaction product gas pipeline 108 as reduzate gas, to maintain the pressure of burning chemistry chains reactor at 0 ~ 5kPa.G.
When whole or most of desorption and regenerations of the adsorbent 104 in adsorption tower 102, i.e. the total concentration of the harmful components in the desorption gas of adsorption tower 102 outlet is reduced to 50mg/m
3time, close the motor-driven valve 115 on desorption gas circulating line 110, adsorption tower 102 enters the process of cooling; Close burning chemistry chains reactor pressure control valve 112, open the motor-driven valve 116 and 117 on air duct 106 and oxidation product gas pipeline 109, air is entered in burning chemistry chains reactor 101 and carries out oxidation regeneration reaction with reduction-state oxygen carrier, reduction-state oxygen carrier and oxygen reaction generate oxidation state oxygen carrier, solid metallic sulphur compound and oxygen reaction generate oxidation state oxygen carrier and sulfur dioxide, and oxidation product gas is discharged through oxidation reaction product gas pipeline 109.Oxidation regeneration reaction is carried out at 150 DEG C.
When whole or most of oxidized regeneration of reduction-state oxygen carrier in burning chemistry chains reactor 101, namely when the oxygen concentration in oxidation product gas reaches 2%, stop circulating fan 111, close the motor-driven valve 116 and 117 on air duct 106 and oxidation product gas pipeline 109.And when adsorption tower 102 temperature is close to normal temperature, open the motor-driven valve 113 and 114 on dusty gas pipeline 105 and Purge gas pipeline 107, make dusty gas enter adsorption tower 102 and carry out adsorption cleaning, thus complete the circulation of an adsorption-desorption-redox-absorption.
To process NH
3for example, the oxidation state of copper base load oxysome and NH at 200 DEG C
3reduction reaction, and at 150 DEG C reduction-state and O
2oxidation regeneration reaction reaction equation and standard free energy change and reaction heat as follows:
3CuO+2NH
3(g)=3Cu+N
2(g)+3H
2O(g)△G
o=-78.56kcal/mol
△H
o=-40.05kcal/mol
2Cu+O
2(g)=2CuO△G
o=-55.72kcal/mol
△H
o=-74.16kcal/mol
In addition, to process H
2s is example, the oxidation state of copper base load oxysome and H at 200 DEG C
2the reaction of S and at 150 DEG C metal sulfide and O
2oxidation regeneration reaction reaction equation and standard free energy change and reaction heat as follows:
CuO+H
2S(g)=CuS+H
2O(g)△G
o=-29.94kcal/mol
△H
o=-28.93kcal/mol
CuS+1.5O
2(g)=CuO+SO
2(g)△G
o=-86.25kcal/mol
△H
o=-94.99kcal/mol
Embodiment 2
Please refer to Fig. 2.The present embodiment is compared with embodiment 1, and difference is: the oxygen carrier that the present embodiment adopts is iron-based oxygen carrier, and its active material is Fe
2o
3, carrier is SiO
2; The adsorbent adopted is silica gel.In desorption process, the desorption temperature of the 1st adsorption tower 102 is 150 DEG C, and in reduction reaction process, the temperature of reduction reaction is 300 DEG C, in oxidative regeneration process, and the temperature of oxidation regeneration reaction is 250 DEG C.
Embodiment adds desorption gas circulating line 206 and motor-driven valve 205 that the 2nd adsorption tower 200, the transfer valve group 203 and 204 of the 1st adsorption tower 102 and the 2nd adsorption tower 200, burning chemistry chains reactor 101 and the 2nd adsorption tower 200 that are filled with adsorbent 201 be connected.
When the adsorbent in the 1st adsorption tower 102 is saturated, the total concentration of the harmful components namely in Purge gas reaches setting value 10mg/m
3time, switch the triple valve 203 and 204 on dusty gas pipeline 105 and Purge gas pipeline 107, dusty gas is entered in the 2nd adsorption tower 200 and carries out adsorption cleaning, carry out the heat temperature raising to the 1st adsorption tower 102 in embodiment 1 simultaneously, the reduction of desorption process and burning chemistry chains reactor 101, oxidative regeneration process, when whole or most of oxidized regeneration of the reduction-state oxygen carrier of burning chemistry chains reactor 101, namely when in oxidation product gas, oxygen concentration reaches setting value 2%, stop circulating fan 111, close the motor-driven valve 116 and 117 on air duct 106 and oxidation product gas pipeline 109.
When the adsorbent 201 in the 2nd adsorption tower 200 adsorbs saturated, the total concentration of the harmful components namely in Purge gas reaches setting value 10mg/m
3time, switch the triple valve 203 and 204 on dusty gas pipeline 105 and Purge gas pipeline 107, dusty gas is entered in the 1st adsorption tower 102 and carries out adsorption cleaning, the 2nd adsorption tower 200 is carried out to reduction, the oxidative regeneration process of heat temperature raising, desorption process and burning chemistry chains reactor 101 simultaneously.By to each pipeline gas flow and the reasonable setting of each valve transfer time, the continuous purification of dusty gas can be realized.
To process trimethylamine, the oxidation state of iron-based oxygen carrier and the reduction reaction of trimethylamine at 300 DEG C, and at 250 DEG C reduction-state and O
2oxidation regeneration reaction reaction equation and standard free energy change and reaction heat as follows:
63Fe
2O
3+2C
3H
9N(g)=42Fe
3O
4+N
2(g)+9H
2O(g)+6CO
2(g)
4Fe
3O
4+O
2(g)=6Fe
2O
3△G
o=-77.54kcal/mol
△H
o=-111.83kcal/mol
Embodiment 3
Please refer to Fig. 3.The present embodiment is compared with embodiment 2 with embodiment 1, and difference is: the oxygen carrier that the present embodiment adopts is copper base load oxysome, and its active material is CuO, and carrier is TiO
2; The adsorbent adopted is activated alumina.In desorption process, the desorption temperature of the 1st adsorption tower 102 and the 2nd adsorption tower 200 is 250 DEG C, and in reduction reaction process, the temperature of reduction reaction is 400 DEG C, in oxidative regeneration process, and the temperature of oxidation regeneration reaction is 350 DEG C.
The present embodiment arranges sulfur dioxide capturing device 300 on oxidation reaction product gas pipeline 109, is used for trapping the SO in oxidation product gas
2, sulfur dioxide capturing device 300 is the wet desulphurization device making desulfurizing agent with the slurries of lime stone or lime.
To process methyl mercaptan, the oxidation state of copper base load oxysome and the reduction reaction of methyl mercaptan at 400 DEG C, and at 350 DEG C, metal sulfide and O
2oxidation regeneration reaction reaction equation and standard free energy change and reaction heat as follows:
4CuO+CH
3SH(g)=CuS+3Cu+CO
2+2H
2O(g)
△G
o=-121.34kcal/mol
△H
o=-69.87kcal/mol
CuS+1.5O
2(g)=CuO+SO
2(g)△G
o=-86.90kcal/mol
△H
o=-113.44kcal/mo
l
In addition, to process toluene, the oxidation state of copper base load oxysome and the reduction reaction of toluene at 400 DEG C, and at 350 DEG C reduction-state oxygen carrier and O
2oxidation regeneration reaction reaction equation and standard free energy change and reaction heat as follows:
18CuO+C
7H
8(g)=18Cu+7CO
2(g)+4H
2O(g)
2Cu+O
2(g)=2CuO△G
o=-47.15kcal/mol
△H
o=-73.4lkcal/mol
Embodiment 4
Please refer to Fig. 4.The oxygen carrier that the present embodiment adopts is the mixture of copper base and Ni-based oxygen carrier, and Z carrier is Al
2o
3and SiO
2, adsorbent is molecular sieve.In desorption process, the desorption temperature of the 1st adsorption tower 102 and the 2nd adsorption tower 200 is 300 DEG C, and in reduction reaction process, the temperature of reduction reaction is 500 DEG C, in oxidative regeneration process, and the temperature of oxidation regeneration reaction is 450 DEG C.
Purity oxygen is imported through purity oxygen pipeline 400 oxidative regeneration process that burning chemistry chains reactor 101 carries out reduction-state oxygen carrier and metal sulfide by the present embodiment, and reaction generates oxidation state oxygen carrier and pure SO
2.The sulfur dioxide capturing device 300 of the present embodiment is concentrated sulfuric acid process units.
Embodiment 5
Please refer to Fig. 4.The oxygen carrier that the present embodiment adopts is the mixture of iron-based and Ni-based oxygen carrier, Al
2o
3and TiO
2adsorbent is the combination of in active carbon, silica gel, activated alumina or molecular sieve any two, in desorption process, the desorption temperature of the 1st adsorption tower 102 and the 2nd adsorption tower 200 is 200 DEG C, in reduction reaction process, the temperature of reduction reaction is 500 DEG C, in oxidative regeneration process, and the temperature of oxidation regeneration reaction is 500 DEG C.
The sulfur dioxide capturing device 300 of the present embodiment is the dry desulfurization device making desulfurizing agent with calcium oxide.
Embodiment 6
Please refer to Fig. 4.The oxygen carrier that the present embodiment adopts is the mixture of copper base and iron-based oxygen carrier, TiO
2and SiO
2in adsorption tower, from bottom to top the adsorbent of slicing and filling is followed successively by active carbon, silica gel and activated alumina, in desorption process, the desorption temperature of the 1st adsorption tower 102 and the 2nd adsorption tower 200 is 200 DEG C, in reduction reaction process, the temperature of reduction reaction is 450 DEG C, in oxidative regeneration process, and the temperature of oxidation regeneration reaction is 500 DEG C.
The sulfur dioxide capturing device 300 of the present embodiment is the dry desulfurization device making desulfurizing agent with calcium oxide.
Embodiment 7
Please refer to Fig. 4.The oxygen carrier that the present embodiment adopts is the mixture of copper base and iron-based oxygen carrier, in adsorption tower, from bottom to top the adsorbent of slicing and filling is followed successively by silica gel, activated alumina and molecular sieve, in desorption process, the desorption temperature of the 1st adsorption tower 102 and the 2nd adsorption tower 200 is 300 DEG C, in reduction reaction process, the temperature of reduction reaction is 500 DEG C, in oxidative regeneration process, and the temperature of oxidation regeneration reaction is 500 DEG C.
The sulfur dioxide capturing device 300 of the present embodiment is the dry desulfurization device making desulfurizing agent with calcium oxide.
The above, it is only preferred embodiment of the present invention, not do any pro forma restriction to the present invention, any simple modification done above embodiment according to technical spirit of the present invention, equivalent variations and modification, all still belong in the scope of technical solution of the present invention.
Claims (11)
1. a cleaning system for dusty gas, is characterized in that:
Described cleaning system comprises burning chemistry chains reactor, the 1st adsorption tower, dusty gas pipeline, air duct, Purge gas pipeline, reduction reaction product gas pipeline, oxidation reaction product gas pipeline, desorption gas circulating line, circulating fan, burning chemistry chains reactor pressure meter and pressure-regulating valve and motor-driven valve group; Desorption gas circulating line is provided with heater; Be filled with oxygen carrier in described burning chemistry chains reactor, be filled with adsorbent in adsorption tower, described dusty gas contains sulphur compound, NH
3, one or more harmful components in amine and volatile organic matter.
2. the cleaning system of dusty gas according to claim 1, is characterized in that:
Described oxygen carrier is the one or more kinds of mixtures of copper base load oxysome, iron-based oxygen carrier or Ni-based oxygen carrier;
Described adsorbent is one or more mixture of active carbon, silica gel, activated alumina or molecular sieve.
3. the treatment system of dusty gas according to claim 2, is characterized in that:
The active material of described copper base load oxysome is CuO, and carrier is A1
2o
3, SiO
2or TiO
2in one or more kinds of mixtures;
The active material of described iron-based oxygen carrier is Fe
2o
3, carrier is A1
2o
3, SiO
2or TiO
2in one or more kinds of mixtures;
The active material of described Ni-based oxygen carrier is NiO, and carrier is A1
2o
3, SiO
2or TiO
2in one or more kinds of mixtures.
4. the cleaning system of dusty gas according to claim 1 and 2, is characterized in that:
Described cleaning system also comprises the 2nd adsorption tower, and the transfer valve group of the 1st adsorption tower and the 2nd adsorption tower.
5. the cleaning system of the dusty gas according to any one of claim 1-4, is characterized in that:
Described cleaning system also comprises sulfur dioxide capturing device, and described sulfur dioxide capturing device is arranged on described oxidation reaction gas pipeline.
6. the cleaning system of dusty gas according to claim 5, is characterized in that:
Described sulfur dioxide capturing device is make the dry desulfurization device of desulfurizing agent, the wet desulphurization device making desulfurizing agent with limestone/lime slurries or concentrated sulfuric acid process units with calcium oxide.
7. the cleaning system of the dusty gas according to any one of claim 1-6, is characterized in that:
Described cleaning system also comprises oxygen rich gas pipeline or pure oxygen gas pipeline.
8. a purification method for dusty gas, adopts the cleaning system of the dusty gas described in any one of claim 1-7, it is characterized in that: comprise,
(1) adsorb, dusty gas enters in the 1st described adsorption tower, and the harmful components in described dusty gas are by the 1st described absorption tower adsorbs;
(2) heat, when harmful components concentration reaches setting value in the Purge gas of the 1st described adsorption column outlet, desorption gas is circulated between the 1st adsorption tower, burning chemistry chains reactor, and heats;
(3) desorption, when the temperature of described desorption gas and the 1st adsorption tower reaches setting value, described harmful components from the 1st adsorption tower by desorption out;
(4) reduce, when the temperature of burning chemistry chains reactor reaches setting value, described by the oxidation state oxygen carrier generation reduction reaction in desorption harmful components out and described burning chemistry chains reactor, oxidation state oxygen carrier is converted into reduction-state oxygen carrier or metal sulfide; Regulate pressure, make the maintain constant pressure of described burning chemistry chains reactor;
(5) be oxidized, when harmful components concentration in the desorption gas at the 1st described adsorption column outlet place is reduced to setting value, make the 1st adsorption tower cooling, open air duct or oxygen rich gas pipeline or purity oxygen pipeline valve, reduction-state oxygen carrier in described burning chemistry chains reactor or metal sulfide and oxygen generation oxidation regeneration react, and make the oxygen concentration in the gaseous product of described oxidation regeneration reaction reach setting value.
9. the purification method of dusty gas according to claim 8, is characterized in that: also comprise,
(1), when harmful components concentration reaches setting value in the Purge gas of the 1st described adsorption column outlet, described dusty gas is entered in the 2nd described adsorption tower, meanwhile, carries out described heating, desorption, reduction and oxidizing process;
(2) when harmful components concentration reaches setting value in the Purge gas of the 2nd described adsorption column outlet, described dusty gas is entered in the 1st described adsorption tower, enter next circulation.
10. the purification method of dusty gas according to claim 8 or claim 9, is characterized in that: also comprise,
The reaction product gas of described oxidation regeneration is made to enter described sulfur dioxide capturing device.
The purification method of 11. dusty gas according to claim 8, is characterized in that:
The desorption temperature of the adsorption tower described in step (3) is 100 ~ 300 DEG C;
The temperature of the reduction reaction described in step (4) is 200 ~ 500 DEG C;
The temperature of the oxidation regeneration reaction described in step (5) is 150 ~ 500 DEG C.
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