CN105384952A - Method for adjusting and controlling block copolymer self-assembled orientation by using mechanical shearing force - Google Patents
Method for adjusting and controlling block copolymer self-assembled orientation by using mechanical shearing force Download PDFInfo
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Abstract
The present invention relates to the field of functional polymer material technologies, in particular to a method for adjusting and controlling amphiphilic block copolymer self-assembled orientation by using a mechanical shearing force. The method comprises the following steps: (1) preparing a block copolymer solution; (2) performing a mechanical shearing force on the block copolymer solution, and enabling the block copolymer solution to form a thin film; and (3) annealing the thin film obtained in step (2) under a vacuum condition at 80-160 DEG C for 0.5-48 h or carrying out solvent annealing on the thin film at room temperature for 24-96 h to carry out micro phase separation on the block copolymer so as to form a hexagonally-arranged columnar body micro domain parallel to a substrate. According to the regulation method, self-assembled structure orientation is adjusted and controlled by applying the mechanical shearing force to an amphiphilic block copolymer solution, and a columnar body micro domain is changed into a self-assembled structure parallel to the substrate from the orientation perpendicular to the substrate.
Description
Technical field
The present invention relates to functional high molecule material technical field, particularly a kind of mechanical shear stress that utilizes is to the regulate and control method of Self-Assembling of Block Copolymer orientation.
Background technology
21 century is the information age, and opto-electronic information technology is the principal character of current era.Ordered micro structure material, as important materials indispensable in opto-electronic information technology, becomes the center of gravity that society is paid close attention to.In order to process the fine structure material satisfied the demands, we still face this two problems: the fine structure material 1, facilitating controlled preparing to have predetermined structure is still had any problem so far; 2, there is size clear area in tradition " from top to bottom " and Macromolecular self-assembly technology, cannot process the structured material of 5 ~ 50nm scope.Segmented copolymer can form the micro phase separation structure with geometry in particular due to the uncompatibility between block, and wherein hexagonal columnar body domain structure is widely studied in the blank of 5 ~ 50nm scope owing to can fill up ordinary photolithographic technique.People are that etching Template preparation has gone out the fine structure material of many orderly Nano grades with segmented copolymer, and the method has huge commercial value in some cyclic array materials of preparation.Control the self-assembly pattern of segmented copolymer thus become one of research emphasis of segmented copolymer etching template.Through years of researches, it is found that two kinds of arrangement modes of column microcell: arranged in parallel and arranged vertically, surface energy primarily of different block section determines, therefore the arrangement mode controlling hexagonal columnar body microcell is many starts with from the different block section surface energy of adjustment, mainly contains and applies outfield, substrate modification, graphio epitaxy etc.
Such as, the application for a patent for invention that application publication number is CN104395230A discloses provides directional orientation Block Copolymer Thin Film and the regional annealing technique for the production of directional orientation Block Copolymer Thin Film, described regional annealing technique comprises the method by soft shearing force technique induced levels orientation segmented copolymer, and induces the method for vertical orientated segmented copolymer by means of the annealing of sharply dynamic area.
Application publication number is that the application for a patent for invention of CN103408783A discloses a kind of preparation method with regular vertical channel porous-film, solvent is first used to anneal to Block Copolymer Thin Film, induction segmented copolymer is separated, formed and there is vertical orientated Microphase Structure, to carry out selectivity to segmented copolymer disperse phase swelling by swelling again, change dispersiveness into pore passage structure, thus the porous-film of the orderly vertical channel structure of height of formation.
Because a certain regulate and control method can not be applicable to all segmented copolymers, therefore, the self-assembly pattern exploring more method regulation and control segmented copolymer has great importance to the development of segmented copolymer etching template and application.
Summary of the invention
The object of this invention is to provide a kind of mechanical shear stress that utilizes to the regulate and control method of Self-Assembling of Block Copolymer orientation.
For achieving the above object, the technical scheme that concrete employing is following:
Utilize mechanical shear stress to a regulate and control method for Self-Assembling of Block Copolymer orientation, comprise the following steps:
(1) block copolymer solution is prepared;
(2) mechanical shear stress is applied to described block copolymer solution, and make block copolymer solution form film;
(3) by step (2) gained film 80 ~ 160 DEG C of annealing (thermal annealing) 0.5 ~ 48h or at room temperature solvent annealing 24-96h under vacuum, make segmented copolymer generation microphase-separated, form the column microcell being parallel to substrate, Hexagonal array.
Regulate and control method provided by the invention goes for most common segmented copolymer, preferably, described segmented copolymer is selected from one or more that polystyrene-block-polymethylmethacrylate (PS-b-PMMA), polystyrene-block-polyoxygenated ethane (PS-b-PEO), polystyrene-block-polyvinylpyridine (PS-b-P4VP) and polyoxygenated ethane-block-side chain contain in the polymethylmethacrylate (PEO-b-PMAAz) of azo group.Concrete, the molecular formula of PEO-b-PMAAz is as follows:
Above-mentioned segmented copolymer all can select all products of the prior art, and the present invention does not make particular determination to this.
In the inventive solutions, the object of step (1) obtains block copolymer solution, and generally, the mass concentration of block copolymer solution is 0.1 ~ 10%, be preferably 0.2 ~ 2%, now can better regulate and control Self-Assembling of Block Copolymer orientation.
Concrete, in step (1), during preparation block copolymer solution, solvent used is volatile solvent, such as, in toluene, benzene, chloroform, methylene dichloride one or more.
In the inventive solutions, step (2) adopts icroextrusion equipment to apply mechanical shear stress to described block copolymer solution.
Concrete, described icroextrusion equipment is selected from the one in airtight injection device or airtight sample introduction equipment, can select all products on the market, is preferably 2mL microsyringe (resistance to air loss).
Sample introduction (entering block copolymer solution) speed when adopting icroextrusion equipment applying mechanical shear stress in step (2) is 0.1 ~ 5ml/min, is preferably 0.5 ~ 1mL/min.
Step (2) makes the film forming mode of block copolymer solution be: in substrate surface spin-coating film, rotating speed is 500 ~ 5000rpm, and spin-coating time is 30 ~ 60s; Preferably, rotating speed is 2000rpm, and spin-coating time is 30s.
One or more in silicon chip, glass (containing conductive glass), mica or polymeric membrane chosen by substrate described in step (2).Described polymeric membrane specifically can choose PET film or PI film.
In step of the present invention (2), film is become to be main thin film-forming method in substrate surface spin coating, only on copper mesh, when sample preparation, just on the water surface, be paved into film at employing transmission electron microscope observing, available copper mesh fishes for described Block Copolymer Thin Film simultaneously.
In the inventive solutions, step (3) is in annealing process, because segmented copolymer has formed one-dimentional structure micella before the anneal, the hexagonal columnar structure perpendicular to substrate cannot be formed, so the column microcell being parallel to substrate, Hexagonal array finally can only be formed.Concrete, for different types of segmented copolymer, its annealing way is also different, and mainly contain thermal annealing and solvent and to anneal two kinds of modes, concrete, one or more in toluene, benzene, chloroform, methylene dichloride chosen by step (3) described solvent.
Polyoxygenated ethane-block-side chain is contained to the polymethylmethacrylate (PEO-b-PMAAz) of azo group, the operation steps of step (3) is: by step (2) gained film 80 ~ 160 DEG C of annealing 0.5 ~ 48h under vacuum, be preferably 120 ~ 150 DEG C of annealing 2 ~ 24h under vacuum, be more preferably 140 DEG C of annealing 2h under vacuum.
For polystyrene-block-polyoxygenated ethane (PS-b-PEO), polystyrene-block-polymethylmethacrylate (PS-b-PMMA) and polystyrene-block-polyvinylpyridine (PS-b-P4VP), the operation steps of step (3) is: by step (2) gained film in toluene/water steam system under room temperature (10 ~ 35 DEG C) solvent annealing 24 ~ 96h, be preferably 48h.
The present invention regulates and controls by adopting the self-assembly pattern of mode to segmented copolymer applying mechanical shear stress.By applying mechanical force to segmented copolymer, the orientation of Self-Assembling of Block Copolymer structure changes, and column microcell becomes the direction being parallel to substrate from the direction perpendicular to substrate.Compared with the regulate and control method of other Self-Assembling of Block Copolymer pattern, the present invention applies mechanical shear stress to the solution before film forming, do not need to use other main equipments and substrate modification, widely applicable, be more suitable for the Block Copolymer Thin Film that big area prepares orientation arranged in parallel.
Accompanying drawing explanation
Fig. 1 is the atomic force microscopy (AFM figure) without Block Copolymer Thin Film before shearing force process in embodiment 1;
Fig. 2 is the atomic force microscopy (AFM figure) of gained Block Copolymer Thin Film after process in embodiment 1.
Fig. 3 is the transmission electron microscope photo (TEM figure) that embodiment 2 processes rear gained Block Copolymer Thin Film;
Fig. 4 is the transmission electron microscope photo (TEM figure) that embodiment 3 processes rear gained Block Copolymer Thin Film.
Embodiment
Following examples for illustration of the present invention, but are not used for limiting the scope of the invention.
Embodiment 1
The present embodiment is utilize mechanical force to the regulate and control method of PEO-b-PMAAz Self-Assembling of Block Copolymer orientation, specifically comprises the following steps:
(1) utilize chloroform as solvent, preparation massfraction be 2% PEO-b-PMAAz (molecular weight is 31.7kg/mol, PEO volume parts is 15%) block copolymer solution, without shearing force process, spin coating 30s under 2000rpm rotating speed, after 140 degree of vacuum annealing 2h, as shown in Figure 1, dark parts is PEO microcell to the atomic force microscopy (AFM figure) of gained Block Copolymer Thin Film in FIG, and light-colored part is PMMAz external phase.Fig. 1 (b) is AFM vertical view, and Fig. 1 (a) is AFM sectional view, and form PEO column microcell arranged vertically, wherein the diameter of PEO column microcell is about 15nm, and width between centers is 20nm;
(2) adopt the airtight sampler of 2mL trace to apply mechanical shear stress with the speed of 0.5mL/min to the block copolymer solution that step (1) obtains, become film in silicon chip spin coating, rotating speed is 2000rpm, spin coating 30s;
(3) film step (2) obtained is 140 DEG C of annealing 2h under vacuum, make segmented copolymer generation microphase-separated, obtain PEO column microcell arranged in parallel, as shown in Figure 2, wherein, Fig. 2 (a) is AFM vertical view, and Fig. 2 (b) is AFM sectional view, and wherein PEO column size is substantially identical with the sample without shearing treatment.
Embodiment 2
The present embodiment is utilize mechanical force to the regulate and control method of PEO-b-PMAAz Self-Assembling of Block Copolymer orientation, specifically comprises the following steps:
(1) utilize toluene as solvent, preparation massfraction is PEO-b-PMAAz (molecular weight is 20kg/mol, PEO volume parts the is 23%) block copolymer solution of 0.5%;
(2) adopt the airtight sampler of 2mL trace to apply shearing force with the speed of 1mL/min to step (1) gained block copolymer solution, be paved into film in water liquid level, copper mesh drags for film;
(3) film step (2) obtained is 140 DEG C of annealing 2h under vacuum, make segmented copolymer generation microphase-separated, form the column microcell being parallel to substrate, Hexagonal array.After ruthenium dye, as shown in Figure 3, wherein dark parts is PEO microcell to the TEM figure of gained film, and light-colored part is PMMAz external phase.The figure on the left side represents (11) direction in figure 3, and the figure on the right represents (10) direction, and as seen from Figure 3, in segmented copolymer, PEO microcell defines homogeneous texture.(illustrate: 11 and 10 is both directions that this structure is observed under the tem.)
Embodiment 3
The present embodiment, for utilizing the regulate and control method of mechanical shear stress p-poly-phenyl ethene-block-polyoxyethylene (PS-b-PEO) Self-Assembling of Block Copolymer orientation, specifically comprises the following steps:
(1) utilize toluene as solvent, preparation massfraction is polystyrene-block-polyoxygenated ethane (molecular weight is 30kg/mol, and wherein PEO volume parts the is 14%) block copolymer solution of 2%;
(2) adopt the airtight sampler of 2mL trace to apply shearing force with the speed of 1mL/min to step (1) gained block copolymer solution, be paved into film in water liquid level, copper mesh drags for film;
(3) film step (2) obtained annealing at room temperature 48 hours in toluene/water steam system, makes segmented copolymer generation microphase-separated, forms the column microcell being parallel to substrate, Hexagonal array.After ruthenium dye, as shown in Figure 4, wherein dark parts is PEO microcell to the TEM figure of gained film, and light-colored part is PS external phase.As shown in Figure 4, in segmented copolymer, PEO microcell forms the column microcell being parallel to substrate, Hexagonal array.
As long as there is toluene and water vapour in described toluene/water steam system simultaneously, to the proportioning of toluene and water vapour without particular requirement.
Also can obtain being parallel to according to the method for embodiment 3 the column microcell of substrate, Hexagonal array when segmented copolymer selects polystyrene-block-polymethylmethacrylate (PS-b-PMMA) and polystyrene-block-polyvinylpyridine (PS-b-P4VP), not repeat them here.
Although above the present invention is described in detail with a general description of the specific embodiments, on basis of the present invention, can make some modifications or improvements it, this will be apparent to those skilled in the art.Therefore, these modifications or improvements without departing from theon the basis of the spirit of the present invention, all belong to the scope of protection of present invention.
Claims (10)
1. utilize mechanical shear stress to a regulate and control method for Self-Assembling of Block Copolymer orientation, it is characterized in that, comprise the following steps:
(1) block copolymer solution is prepared;
(2) mechanical shear stress is applied to described block copolymer solution, and make block copolymer solution form film;
(3) by step (2) gained film 80 ~ 160 DEG C of annealing 0.5 ~ 48h or at room temperature solvent annealing 24 ~ 96h under vacuum, make segmented copolymer generation microphase-separated, form the column microcell being parallel to substrate, Hexagonal array.
2. regulate and control method according to claim 1, it is characterized in that, described segmented copolymer is selected from polystyrene-block-polymethylmethacrylate, polystyrene-block-polyoxygenated ethane, polystyrene-block-polyvinylpyridine and polyoxygenated ethane-block-side chain and contains one in the polymethylmethacrylate of azo group.
3. regulate and control method according to claim 1 and 2, is characterized in that, described in step (1), the mass concentration of block copolymer solution is 0.1 ~ 10%, is preferably 0.2 ~ 2%.
4. regulate and control method according to claim 1 and 2, it is characterized in that, in step (1), during preparation block copolymer solution, one or more in toluene, benzene, chloroform, methylene dichloride all chosen by solvent used and step (3) described solvent.
5. regulate and control method according to claim 1 and 2, is characterized in that, step (2) adopts icroextrusion equipment to apply mechanical shear stress to described block copolymer solution.
6. regulate and control method according to claim 5, is characterized in that, sample introduction speed when adopting icroextrusion equipment applying mechanical shear stress in step (2) is 0.1 ~ 5ml/min, is preferably 0.5 ~ 1ml/min.
7. regulate and control method according to claim 1 and 2, is characterized in that, step (2) makes the film forming mode of block copolymer solution be: in substrate surface spin-coating film, rotating speed is 500 ~ 5000rpm, and spin-coating time is 30 ~ 60s; Preferably, rotating speed is 2000rpm, and spin-coating time is 30s.
8. regulate and control method according to claim 7, is characterized in that, described in step (2), one or more in silicon chip, glass, mica or polymeric membrane chosen by substrate.
9. the regulate and control method according to any one of claim 2 ~ 8, it is characterized in that, polyoxygenated ethane-block-side chain is contained to the polymethylmethacrylate of azo group, the operation steps of step (3) is: by step (2) gained film 80 ~ 160 DEG C of annealing 0.5 ~ 48h under vacuum, be preferably 120 ~ 150 DEG C of annealing 2 ~ 24h under vacuum.
10. the regulate and control method according to any one of claim 2 ~ 8, it is characterized in that, for polystyrene-block-polyoxygenated ethane, polystyrene-block-polymethylmethacrylate and polystyrene-block-polyvinylpyridine, the operation steps of step (3) is: by step (2) gained film at room temperature solvent annealing 24 ~ 96h.
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105801889A (en) * | 2016-03-28 | 2016-07-27 | 辽宁工程技术大学 | Preparation method of polymethyl methacrylate macromolecule extended chain |
| CN105884988A (en) * | 2016-04-22 | 2016-08-24 | 北京航空航天大学 | P4VP-b-PMA (Az) block copolymer, high-through hexagonal prism membrane with adjustable prism diameter and preparation method of membrane |
| CN105968394A (en) * | 2016-05-30 | 2016-09-28 | 四川大学 | Preparation method of single-domain-area large-area orderly nanometer array structure segmented copolymer membrane |
| CN107602889A (en) * | 2016-07-19 | 2018-01-19 | 中国科学技术大学 | A kind of surface crystallization thin polymer film and preparation method thereof |
| CN111403458A (en) * | 2020-03-27 | 2020-07-10 | 深圳市华星光电半导体显示技术有限公司 | Color conversion layer and method for manufacturing the same |
| CN111944379A (en) * | 2020-08-25 | 2020-11-17 | 上海大学 | Application of carbohydrate-based block copolymer self-assembled micro-nano structure in anti-icing |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1562730A (en) * | 2004-03-24 | 2005-01-12 | 哈尔滨工业大学 | Method for adjusting and controlling configuration of self-assembling block copolymer template oriented to nano micro machining |
| US20100102415A1 (en) * | 2008-10-28 | 2010-04-29 | Micron Technology, Inc. | Methods for selective permeation of self-assembled block copolymers with metal oxides, methods for forming metal oxide structures, and semiconductor structures including same |
| CN102161773A (en) * | 2011-01-18 | 2011-08-24 | 浙江大学 | Method for preparing organic/inorganic composite honeycomb-patterned ordered film |
| CN102796271A (en) * | 2012-07-13 | 2012-11-28 | 天津大学 | Controllable self-assembly method for block polymer on elastic substrate |
| US20130209693A1 (en) * | 2012-02-10 | 2013-08-15 | Rohm And Haas Electronic Materials Llc | Block copolymer and methods relating thereto |
| CN103923342A (en) * | 2014-04-03 | 2014-07-16 | 西北工业大学 | Preparation method of segmented copolymer nanopore film containing cyclodextrin chains and simultaneously having temperature responsiveness |
| CN104395230A (en) * | 2012-06-05 | 2015-03-04 | 阿克伦大学 | Fabrication of directionally oriented block copolymer films |
| CN104629066A (en) * | 2014-05-09 | 2015-05-20 | 中国科学院宁波材料技术与工程研究所 | Film self-assembling preparation method and device thereof |
-
2015
- 2015-09-15 CN CN201510587870.8A patent/CN105384952B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1562730A (en) * | 2004-03-24 | 2005-01-12 | 哈尔滨工业大学 | Method for adjusting and controlling configuration of self-assembling block copolymer template oriented to nano micro machining |
| US20100102415A1 (en) * | 2008-10-28 | 2010-04-29 | Micron Technology, Inc. | Methods for selective permeation of self-assembled block copolymers with metal oxides, methods for forming metal oxide structures, and semiconductor structures including same |
| CN102161773A (en) * | 2011-01-18 | 2011-08-24 | 浙江大学 | Method for preparing organic/inorganic composite honeycomb-patterned ordered film |
| US20130209693A1 (en) * | 2012-02-10 | 2013-08-15 | Rohm And Haas Electronic Materials Llc | Block copolymer and methods relating thereto |
| CN104395230A (en) * | 2012-06-05 | 2015-03-04 | 阿克伦大学 | Fabrication of directionally oriented block copolymer films |
| CN102796271A (en) * | 2012-07-13 | 2012-11-28 | 天津大学 | Controllable self-assembly method for block polymer on elastic substrate |
| CN103923342A (en) * | 2014-04-03 | 2014-07-16 | 西北工业大学 | Preparation method of segmented copolymer nanopore film containing cyclodextrin chains and simultaneously having temperature responsiveness |
| CN104629066A (en) * | 2014-05-09 | 2015-05-20 | 中国科学院宁波材料技术与工程研究所 | Film self-assembling preparation method and device thereof |
Non-Patent Citations (2)
| Title |
|---|
| BEATRIZ MARTÍN-GARCÍA ET AL.: ""Nanoparticle Self-Assembly Assisted by Polymers: The Role of Shear Stress in the Nanoparticle Arrangement of Langmuir and Langmuir Blodgett Films"", 《LANGMUIR》 * |
| JE GWON LEE ET AL.: ""Long-Range Ordered Self-Assembly of Novel Acrylamide-Based Diblock Copolymers for Nanolithography and Metallic Nanostructure Fabrication"", 《ADVANCED MATERIALS》 * |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105801889A (en) * | 2016-03-28 | 2016-07-27 | 辽宁工程技术大学 | Preparation method of polymethyl methacrylate macromolecule extended chain |
| CN105884988A (en) * | 2016-04-22 | 2016-08-24 | 北京航空航天大学 | P4VP-b-PMA (Az) block copolymer, high-through hexagonal prism membrane with adjustable prism diameter and preparation method of membrane |
| CN105884988B (en) * | 2016-04-22 | 2018-06-19 | 北京航空航天大学 | The adjustable high perforation hexagonal columnar film of P4VP-b-PMA (Az) block copolymer, column diameter and preparation method |
| CN105968394A (en) * | 2016-05-30 | 2016-09-28 | 四川大学 | Preparation method of single-domain-area large-area orderly nanometer array structure segmented copolymer membrane |
| CN107602889A (en) * | 2016-07-19 | 2018-01-19 | 中国科学技术大学 | A kind of surface crystallization thin polymer film and preparation method thereof |
| CN107602889B (en) * | 2016-07-19 | 2020-03-31 | 中国科学技术大学 | Surface crystallization polymer film and preparation method thereof |
| CN111403458A (en) * | 2020-03-27 | 2020-07-10 | 深圳市华星光电半导体显示技术有限公司 | Color conversion layer and method for manufacturing the same |
| CN111403458B (en) * | 2020-03-27 | 2023-04-07 | 深圳市华星光电半导体显示技术有限公司 | Color conversion layer and method for manufacturing the same |
| CN111944379A (en) * | 2020-08-25 | 2020-11-17 | 上海大学 | Application of carbohydrate-based block copolymer self-assembled micro-nano structure in anti-icing |
| CN111944379B (en) * | 2020-08-25 | 2021-11-16 | 上海大学 | Application of carbohydrate-based block copolymer self-assembled micro-nano structure in anti-icing |
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