CN1562730A - Method for adjusting and controlling configuration of self-assembling block copolymer template oriented to nano micro machining - Google Patents

Method for adjusting and controlling configuration of self-assembling block copolymer template oriented to nano micro machining Download PDF

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CN1562730A
CN1562730A CN 200410013641 CN200410013641A CN1562730A CN 1562730 A CN1562730 A CN 1562730A CN 200410013641 CN200410013641 CN 200410013641 CN 200410013641 A CN200410013641 A CN 200410013641A CN 1562730 A CN1562730 A CN 1562730A
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block copolymer
template
self
solvent
nano
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CN100429142C (en
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王铀
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哈尔滨工业大学
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00031Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0147Film patterning
    • B81C2201/0149Forming nanoscale microstructures using auto-arranging or self-assembling material

Abstract

A process for controlling the form of the block copolymer template used for nano-class microprocessing includes dissolving the block copolymer in oxylene solvent, pouring it on the surface of substrate, natural volatilizing, putting the substrate in an enclosed container, dropping organic solvent, and sealing for some time.

Description

面向纳米微加工嵌段共聚物模板自组装形态调控方法 Nano template for micromachining block copolymers self-assembled morphology about methods

技术领域 FIELD

:本发明涉及一种在纳米微加工时所需要的模板图案的调控方法。 : The present invention relates to a method for the regulation of nanoparticles when required for processing of the template pattern.

背景技术 Background technique

:目前,制备加工纳米结构有三种不同的途径:一种是用宏观的块体物质,通过去掉多余的部分,加工成纳米结构,通常称之为自上向下方法,属于传统的微细加工技术,包括光刻技术和分子束外延技术;另一种是把微观体系的物质单元组装成纳米器件,通常称之为自下向上方法,属于正在兴起的微细加工技术,包括扫描探针的操纵装配技术、分子模板技术与化学合成技术。 : At present, processing nanostructures prepared in three different ways: one is the macroscopic bulk material, by removing the excess portion processed into the nanostructures, commonly referred to as top-down method, a traditional microfabrication techniques , and a photolithography technique including molecular beam epitaxy; the other is the substance micro system of units assembled into a nanodevice, commonly called bottom-up method, part of the emerging microfabrication technology, comprising a scanning probe actuating assembly technology, molecular template technique and chemical synthesis techniques. 以上两种纳米加工都存在一个无法回避问题:即当材料包含纳米结构时,其结构单元数量是惊人的。 Two or more Nanofabrication an unavoidable problem exists: i.e., when a material comprising a nanostructure, the number of structural units is staggering. 如果沿用传统的加工方式对逐个结构进行加工,即使工艺上可行,从所需的时间与成本角度去考虑则根本行不通。 If using the traditional processing methods for processing one by one structure, even if feasible process, from the required time and cost point of view to consider is unworkable. 难怪有人感叹:纳米材料是科学家的梦想,工程师的梦魇。 No wonder people sigh: nanomaterials nightmare is a dream of scientists and engineers. 第三种途径是把第一种与第二种方法结合在一起“自组装”技术。 A third approach is to combine the first and second method, "self-assembly" technique. 所谓自组装是一种无外来因素条件下形成超分子结构或介观超结构的过程。 The so-called self-assembly process is the formation of supramolecular structures or mesoscopic superstructures external factors in a non conditions. 自组装制造过程是绿色的、环境友好的,效率是极高的。 Self-assembly manufacturing process is green, environmentally friendly, efficiency is very high. 由于以上诸多优点并源于纳米科技发展的需要,源于生物的自组装技术近年来已引起科学家高度重视并迅速成为最热门的研究领域。 Because of these many advantages derived from the needs and development of nano-technology, bio-derived self-assembly technology in recent years it has attracted great attention of scientists and quickly became the most popular field of study. 1996年,Whitesides等人(发表于Science)首先利用离子刻蚀技术将嵌段共聚物的球形微区图案复制到50nm厚的SiN2模板材料上,得到每平方厘米具有1011个微孔的SiN2膜材料(见图1),标志着利用嵌段共聚物自组装模板技术进行纳米微加工新技术技术的开始。 In 1996, Whitesides et al (published in Science) firstly copy spherical ion etching pattern block copolymer microdomains onto the template material SiN2 50nm thick, having obtained 1,011 per square centimeter of the microporous film material SiN2 (see FIG. 1), marking the beginning for the self-assembled nano-templates art technology micromachining technology using a block copolymer.

对于自组装技术作为加工方法而言,新的机遇与挑战并存:一方面是是如何利用自组装模板制备相应结构纳米材料(模板图案的复制);另一方面的是如何人为调控自组装模板图案以调控希望构造的纳米结构(模板图案的调控)。 For the purposes of self-assembly technique as a processing method, new opportunities and challenges: on the one hand is how to use the template prepared from the corresponding assembled nanomaterials structure (the template pattern replication); on the other hand how the artificial regulation of the self-assembled patterned template configured to regulate the desired nanostructure (regulated patterned template). 图案的复制已知可以通过刻蚀技术实现(离子、臭氧、紫外线选择性地除去部分材料)。 Known replication pattern can be achieved (ions, ozone, ultraviolet portion of the material is selectively removed) by etching techniques. 模板图案的调控技术目前还亟待提高,因为它是模板纳米加工技术的关键:只有调控出所需图案的模板才有可能复制出理想的结构。 Control technology template pattern is still needs to be improved because it is the key template nanometer processing technology: only the regulation of the template of the desired pattern will it be possible to replicate the desired structure. 目前能调控嵌段共聚物形态的处理方法主要有:高温退火处理、外加电场处理、剪切处理等三种方法。 The current treatment capable of modulating the block copolymer morphology are: high-temperature annealing process, the three methods applied electric field processing, shear processing. 其中剪切处理由于对处理样品厚度有要求,不适用于涉及模板应用的形态调控。 Wherein the shear treatment required due to the thickness of the treated sample, the regulation does not apply to form the template directed. 剩余的两种方法一方面对于形态调控能力有限,调控得到的有序形态是唯一的,更谈不上进行几百纳米微小模板调控;另一方面处理工艺比较复杂,所需时间很长。 The remaining two methods to form an aspect of the regulation of the limited capacity of the ordered form of regulation is obtained only, not to mention a few hundred nanometers for a minute regulation template; complicated treatment process on the other hand, the time required is very long.

发明内容 SUMMARY

:本发明的目的在于提供一种简单、高效的面向纳米微加工嵌段共聚物模板自组装形态调控方法,具体操作方法为:将嵌段共聚物溶解在二甲苯溶剂中配制成0.1~1wt%浓度的溶液,室温条件下浇铸在原子水平级平整的基片表面上,自然挥发成膜,将此浇铸膜与附着的基片放置于密闭容器内,密闭容器内垫有具有吸附溶剂蒸汽能力的材料,然后在室温下向密闭容器底部的具有吸附溶剂蒸汽能力的材料上滴加嵌段共聚物材料的良溶剂或选择性溶剂后迅速盖好盖子密封,有机溶剂的滴加量为足以使溶剂蒸汽压达到饱和,1小时~7天后取出即为面向纳米微加工嵌段共聚物模板。 : Object of the present invention is to provide a simple, efficient process for the nanoparticles self-assembled block copolymers form template regulation method, specific methods of operation: the block copolymer is dissolved in a xylene solvent formulated as 0.1 ~ 1wt% concentration solution, at room temperature is cast on a flat horizontal surface atoms of the substrate stage, natural evaporation deposition, this cast film is adhered with the substrate placed in a sealed container, the sealed container having an inner pad solvent vapor adsorption capacity quickly cover the lid sealing material, and having a good solvent or selective solvent solution of the block copolymer material on the solvent vapor adsorption capacity of the material to the bottom of the sealed container at room temperature was added dropwise a sufficient amount of organic solvent solvent saturated vapor pressure, for 1 hour to 7 days out for micromachining is the nano-block copolymer templates. 模板形态的自由调控是实现按人的意愿进行纳米微加工的前提与基础,本发明丰富了嵌段共聚物纳米模板的调控技术,与现有的调控技术相比,它具有如下优点:1.它具有调控参数的多样性:本发明可以针对不同的需要使用不同类型的有机溶剂;通过调控温度改变溶剂蒸汽压;另外,溶剂与模板接触时间的不同也会产生不同的效果,从而影响着模板的调控结果。 Free form template is regulated to achieve the prerequisite and foundation nano micromachining according to the wishes of the person, the present invention enriches the block copolymer nano-template control technology compared with the conventional control technology, which has the following advantages: 1. it has a variety of controllable parameters: the present invention may be used for different needs of different types of organic solvents; temperature-controlled by changing the solvent vapor pressure; Furthermore, different templates solvent contact time will produce different effects, thus affecting the template regulatory results. 总之,调控参数的多样性决定着调控出来模板的形态具有多样性;2.调控过程高度可控;3.调控模板形态高度有序;4.调控不需复杂设备,工艺简单,成本低,效率高;5.在调控的同时溶剂蒸汽还具有刻蚀的功能,能在基片上得到几百纳米尺度的各种图案,这一点对于未来纳米零件的加工技术有重要意义;6.通过局部刻蚀与调控,用本发明的方法还可以得到类似于圆锥齿轮形状的自组装模板图案(见图6),这意味着将来利用这类模板可以加工纳米齿轮(见图7)。 In summary, the diversity of the parameters determines the regulation of regulation morphological diversity out template;. 2 process is highly controllable regulation; 3. Regulation highly ordered morphology template; 4. regulation does not require complicated equipment, simple process, low cost, efficiency high; 5 while the solvent vapor etching regulation also has the function of various patterns can be obtained dimensions of a few hundred nanometers on the substrate, which is part of the future nano-machining technology is important;. 6 by partially etching and control, by the method of the present invention can also obtain a similar conical gear shape pattern of self-assembled template (see FIG. 6), which means that the future use of such templates may be processed nanometers gear (see FIG. 7).

附图说明 BRIEF DESCRIPTION

:图1是利用离子刻蚀技术将嵌段共聚物SBS的球形微区图案复制到50nm厚的SiN2模板材料上,得到每平方厘米具有1011个微孔的SiN2膜材料的结构示意图,图2(尺寸800×800nm)是原子力显微镜(AFM)关于SEBS或SBS嵌段共聚物溶于二甲苯之后浇铸在基片上自然挥发成膜的形态图,图3是用具体实施方式三方法调控所得模板的AFM形态图(尺寸800×800nm),图4是用具体实施方式四方法调控所得模板的AFM形态图(尺寸800×800nm),图5是用具体实施方式五方法调控所得模板的AFM形态图(尺寸500×500nm),图6是是用具体实施方式六方法调控兼刻蚀的微小尺寸模板AFM形态图(尺寸800×800nm),图7是由图6模板所能加工微小零件的示意图。 : FIG. 1 is a copy using ion etching spherical SBS block copolymer microdomains onto the patterned template material SiN2 50nm thick, 1,011 per square centimeter to obtain a schematic view of the structure of the microporous film material having SiN2, FIG. 2 ( dimensions 800 × 800nm) is an atomic force microscope (AFM) on SEBS or SBS block copolymer morphology casting natural evaporation deposition on a substrate after FIG dissolved in xylene, FIG. 3 is a specific embodiment of the three methods of modulating the resulting template AFM AFM morphology images (size AFM morphology showing a state view (dimensions 800 × 800nm), FIG. 4 is a four methods of modulating the resulting template DETAILED DESCRIPTION (dimensions 800 × 800nm), FIG. 5 is a five methods of modulating the resulting template with specific embodiments 500 × 500nm), FIG. 6 is a schematic view of a fine size pattern using AFM morphology DETAILED DESCRIPTION FIG six and etching method of modulating (dimensions 800 × 800nm), FIG. 7 is a template that can be accommodated by the small parts in FIG. 6.

具体实施方式 Detailed ways

一:嵌段共聚物自组装模板一般需要溶剂浇铸制备,模板的厚度需控制在纳米尺度以内。 A: the self-assembled block copolymers generally require template preparation, solvent casting, stencil thickness should be controlled within the nanometer scale. 我们发现将厚度控制在100纳米以内嵌段共聚物薄膜,在室温下,利用有机良溶剂或选择性溶剂进行熏蒸,可以对模板的自组装图案进行全面的调控。 We found that controlling the thickness of 100 nm or less block copolymer film, at room temperature, using an organic good solvent or selective solvent fumigation, Full regulation of the self-assembled patterned template. 将嵌段共聚物溶解在二甲苯溶剂中配制成0.1~1wt%浓度的溶液,室温条件下浇铸在原子水平级平整的基片表面上,自然挥发成膜,将此浇铸膜与附着的基片放置于密闭容器内,密闭容器内垫有具有吸附溶剂蒸汽能力的材料,然后在室温下向密闭容器底部的具有吸附溶剂蒸汽能力的材料上滴加嵌段共聚物材料的良溶剂或选择性溶剂后迅速盖好盖子密封,有机溶剂的滴加量为足以使溶剂蒸汽压达到饱和,1小时~7天后取出即为面向纳米微加工嵌段共聚物模板。 Dissolving the block copolymer formulated as a 0.1 ~ 1wt% strength solution in xylene solvent, casting on a flat horizontal surface atoms of the substrate stage, forming natural evaporation at room temperature, this cast film is attached to a substrate placed in a sealed container, closed with a material having a mat solvent vapor adsorption capacity of the container, and having the bottom closed vessel at room temperature was added dropwise a good solvent of the block copolymer material on the solvent vapor adsorption capacity of the material or the selective solvent after quickly capped seal, dropping amount of organic solvent sufficient to permit the solvent saturated vapor pressure, for 1 hour to 7 days out for micromachining is the nano-block copolymer templates. 用这种方法调控的模板图案形态丰富、高度有序。 In this way the regulation of the template pattern form a rich, highly ordered.

具体实施方式二:本实施方式模板的调控方法为:将聚苯乙烯-饱和聚丁二烯-聚苯乙烯(SEBS)嵌段共聚物溶解在二甲苯溶剂中配制成0.1wt%浓度的溶液,20-30℃条件下浇铸在云母片上自然挥发成膜,膜的厚度最好要小于100纳米,模板形态如图2所示,将此浇铸膜与附着的云母片放置于垫有滤纸的培养皿内恒温在25℃,滴加良溶剂甲苯于培养皿底部的滤纸上,迅速盖好盖子,甲苯的滴加量为足以使溶剂蒸汽压达到饱和,3小时后将所得产品取出,调控后模板形态如图3所示。 DETAILED Embodiment 2: The method of the present embodiment, the regulation of the template is: Polystyrene - saturated polybutadiene - polystyrene (SEBS) block copolymer is dissolved formulated 0.1wt% strength solution in xylene solvent, casting natural evaporation at 20-30 deg.] C in conditions of film deposition on mica, the thickness of the film is preferably less than 100 nanometers, the template shape shown in Figure 2, this cast film and adhesion mica pad filter paper placed in a Petri dish the temperature at 25 ℃, the good solvent of toluene was added dropwise on the filter paper in the bottom of the dish, quickly cover the lid, the amount of toluene was added dropwise to the solvent vapor pressure sufficient to reach saturation after three hours the resulting product is removed, the template morphology regulation As shown in Figure 3. 然后再通过水面将嵌段共聚物薄膜(即模板)转移到要复型材料表面进行复型。 Then the block copolymer film (i.e., a template) by transferring the water to the surface of the material to be multiplexed type multiplex type.

具体实施方式三:本实施方式模板的调控方法为:将聚苯乙烯-聚丁二烯-聚苯乙烯(SBS)三嵌段共聚物溶解在二甲苯溶剂中配制成1wt%浓度的溶液,将单晶硅片放置于垫有绵花的培养皿内,室温条件下滴加二甲苯于培养皿底部的绵花上,然后将足以使溶剂蒸汽压达到饱和量的二甲苯浇铸在单晶硅片上,迅速盖好盖,10小时后将产品取出即得模板,调控后模板形态如图3所示,然后可以通过水面将嵌段共聚物模板转移到要复型材料表面进行复型即可。 DETAILED Embodiment 3: The method of the present embodiment, the regulation of the template to: polystyrene - polybutadiene - polystyrene (SBS) triblock copolymer was dissolved formulated 1wt% strength solution in xylene solvent, placed in a silicon wafer with a pad of cotton flower dish, xylene was added dropwise to the bottom of the dish cotton take room temperature, then the solvent vapor pressure will be sufficient to saturate the amount of xylene cast single crystal silicon wafer the rapid cover cap 10 hours the product is removed to obtain the template, the template shape after the regulation shown in Figure 3, may then be transferred by the water to the surface of the material block copolymer template type to be multiplexed can be multiplexed type.

具体实施方式四:本实施方式模板的调控方法为:将美国Shell公司生产的SEBS嵌段共聚物溶解在二甲苯溶剂中配制成0.5wt%浓度的溶液,20-30℃条件下浇铸在云母片上自然挥发成膜,膜的厚度为20纳米,模板形态如图2所示,将此浇铸膜与附着的云母片放置于垫有滤纸的培养皿内恒温在25℃,然后将足以使溶剂蒸汽压达到饱和量的选择性溶剂庚烷滴加于培养皿底部的滤纸上,迅速盖好盖,1小时后将产品取出即得调控后模板,所得模板形态如图4所示,然后可以通过水面将嵌段共聚物薄膜(即为所得模板)转移到要复型材料表面进行复型即可。 DETAILED DESCRIPTION Embodiment four: Method regulation embodiment of the template of the present embodiment to: U.S. Shell produced SEBS block copolymer is dissolved formulated 0.5wt% strength solution in xylene solvent, cast on 20-30 deg.] C under conditions mica natural evaporation deposition, the film thickness of 20 nm, the template shape shown in Figure 2, this cast film and adhesion mica placed in a petri dish on filter paper pad thermostat 25 ℃, then the solvent vapor pressure will be sufficient to saturated amount of a selective solvent of heptane was dropped on the filter paper in the Petri dish bottom, quickly cover cap, after removing the product after 1 hour to obtain regulatory template, resulting form template shown in Figure 4, the water can then be block copolymer film (i.e. the resulting template) to the surface of the material to be multiplexed are multiplexed type to type.

具体实施方式五:本实施方式模板的调控方法为:将美国Shell公司生产的SBS三嵌段共聚物溶解在二甲苯溶剂中配制成0.2wt%浓度的溶液,室温条件下浇铸在单晶硅片上自然挥发成膜,所得膜的厚度为40纳米,模板形态如图2所示,将此浇铸膜与附着的单晶硅片放置于垫有滤纸的培养皿内恒温在25℃,滴加足以使溶剂蒸汽压达到饱和量的环己烷于培养皿底部的滤纸上,迅速盖好盖,24小时后将产品取出即得调控后模板,所得模板形态如图5所示,然后可以通过水面将嵌段共聚物薄膜(即用本发明方法所得模板)转移到要复型材料表面进行复型即可。 DETAILED DESCRIPTION Five: The method of the present embodiment, the regulation of the template to: U.S. Shell produced SBS triblock copolymer was dissolved formulated 0.2wt% strength solution in xylene solvent at room temperature in the cast single crystal silicon wafer the natural evaporation deposition, thickness of the resulting film is 40 nm, the template shape shown in Figure 2, this cast film and adhesion to the silicon wafer is placed in a vessel with a filter paper pad thermostat at 25 ℃, sufficient dropwise the solvent is saturated vapor pressure of cyclohexane on the filter paper at the bottom of a petri dish, quickly cover cap, the product is taken out after 24 hours to obtain regulatory template, resulting form template shown in Figure 5, the water can then be block copolymer film (i.e., obtained by the method of the present invention the template) to the surface of the material type to be multiplexed can be multiplexed type.

具体实施方式六:本实施方式模板的调控方法为:将聚苯乙烯-饱和聚丁二烯-聚苯乙烯嵌段共聚物溶解在二甲苯溶剂中配制成0.8wt%浓度的溶液,20-30℃条件下浇铸在云母片上自然挥发成膜,模板形态如图2所示,将此浇铸膜放置带有磨口密闭性能非常好的称量瓶中,样品距离称量瓶底部1cm,滴加足以使溶剂蒸汽压达到饱和量的二甲苯于称量瓶底部迅速盖好盖,恒温25℃7天后将产品取出即得调控后模板,所得模板形态如图6所示,此时溶剂蒸汽已将大部分嵌段共聚物模板腐蚀掉,留下局部微小尺寸的模板图案,为利用此模板加工微纳米零件提供了条件。 DETAILED DESCRIPTION VI: - control method of this embodiment of the template is: Polystyrene - saturated polybutadiene - polystyrene block copolymer formulated as a dissolving 0.8wt% strength solution in xylene solvent, 20-30 casting natural evaporation under ℃ deposition on mica, the template shape shown in Figure 2, this cast film is placed very good performance in a weighing bottle with a ground enclosed, sample from the bottom of the weighing bottle 1cm, sufficient dropwise saturated vapor pressure of the solvent in the amount of xylene rapid weighing bottle bottom cover cap, the thermostat 25 ℃ 7 days after the product is removed to obtain the regulation of the template, the template shown in Figure 6. the resulting configuration wherein the solvent vapor has a large partial block copolymer template etched, leaving a pattern of the local micro-sized template, provided the conditions for the use of this micro-nano template processing part.

Claims (7)

1.一种面向纳米微加工嵌段共聚物模板自组装形态调控方法,其特征在于将嵌段共聚物溶解在二甲苯溶剂中配制成0.1~1wt%浓度的溶液,室温条件下浇铸在原子水平级平整的基片表面上,自然挥发成膜,将此浇铸膜与附着的基片放置于密闭容器内,密闭容器内垫有具有吸附溶剂蒸汽能力的材料,然后在室温下向密闭容器底部的具有吸附溶剂蒸汽能力的材料上滴加嵌段共聚物材料的良溶剂或选择性溶剂后迅速盖好盖子密封,有机溶剂的滴加量为足以使溶剂蒸汽压达到饱和,1小时~7天后取出即为面向纳米微加工嵌段共聚物模板。 A nano-oriented microfabricated block copolymers self-assembled morphology template regulation method, wherein the block copolymer is dissolved in a xylene solvent formulated as 0.1 ~ 1wt% concentration solution, at the atomic level cast at room temperature the flat surface of the substrate stage, natural evaporation deposition, this cast film is adhered with the substrate placed in a sealed container with a material having a mat solvent vapor adsorption capacity of the sealed container, then the bottom of the sealed container at room temperature after quickly covered with a good solvent solution of the block copolymer material on the solvent vapor adsorption capacity of the material of the sealing cap or the selective solvent, the organic solvent is dropped amount sufficient to saturate the vapor pressure solvent removed 1 hour to 7 days that is, for processing block copolymer nanoparticles template.
2.根据权利要求1所述的面向纳米微加工嵌段共聚物模板自组装形态调控方法,其特征在于所述嵌段共聚物为聚苯乙烯—饱和聚丁二烯—聚苯乙烯嵌段共聚物或聚苯乙烯—聚丁二烯—聚苯乙烯嵌段共聚物。 The process for nanoparticles template block copolymer according to claim 1 self-assembled morphology regulation method, wherein the block copolymer is a polystyrene - saturated polybutadiene - polystyrene block copolymer or polystyrene - polybutadiene - polystyrene block copolymer.
3根据权利要求1或2所述的面向纳米微加工嵌段共聚物模板自组装形态调控方法,其特征在于二甲笨溶液浇涛于基片上挥发成膜的厚度小于100纳米。 3 The nano template for micromachining or block copolymer according to claim 12 self-assembled morphology regulation method, wherein a thickness of xylene and Tao volatilized solution was cast on a substrate a film of less than 100 nanometers.
4.根据权利要求1或2所述的面向纳米微加工嵌段共聚物模板自组装形态调控方法,其特征在于所述原子水平级平整的基片为云母片或单晶硅。 The process for nanoparticles template or block copolymer of claim 1 of the self-assembled morphology regulation method, wherein the atomic level stage flat substrate is single crystal silicon or mica.
5.根据权利要求1或2所述的面向纳米微加工嵌段共聚物模板自组装形态调控方法,其特征在于所述密闭容器为培养皿或称量瓶。 The nano-template for micromachining or block copolymer according to claim 12 self-assembled morphology regulation method, wherein said closed container is a dish or weighing bottle.
6.根据权利要求1或2所述的面向纳米微加工嵌段共聚物模板自组装形态调控方法,其特征在于所述具有吸附溶剂蒸汽能力的材料为滤纸或绵花。 The nano-template for micromachining or block copolymer according to claim 12 self-assembled morphology controlling methods, wherein said solvent vapor adsorbing material having the ability to filter paper or the cotton.
7.根据权利要求1或2所述的面向纳米微加工嵌段共聚物模板自组装形态调控方法,其特征在于良溶剂为甲苯或二甲苯,选择性溶剂为环乙烷或庚烷。 7. good solvent is toluene or xylene selective solvent is cyclohexane or heptane The nano template for micromachining or block copolymer according to claim 12 self-assembled morphology regulation method, wherein.
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