CN105316636A - Degassing device in magnetic control direct current sputtering system - Google Patents
Degassing device in magnetic control direct current sputtering system Download PDFInfo
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- CN105316636A CN105316636A CN201510806228.4A CN201510806228A CN105316636A CN 105316636 A CN105316636 A CN 105316636A CN 201510806228 A CN201510806228 A CN 201510806228A CN 105316636 A CN105316636 A CN 105316636A
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- magnetic control
- sputtering system
- transmission
- storing dish
- direct current
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Abstract
The invention discloses a degassing device in a magnetic control direct current sputtering system. The degassing device in the magnetic control direct current sputtering system comprises a degassing cavity and transmission tracks extending into the degassing cavity; the transmission tracks are composed of two parallel transmission chains in the degassing cavity; multiple transmission holes are formed in the two transmission chains respectively and are in one-to-one correspondence; a transmission connecting rod is disposed in each transmission hole and is of an L-shaped structure, and containing plates for containing materials are disposed at the ends of the transmission connecting rods; the containing plates extend in the horizontal direction. By means of the degassing device in the magnetic control direct current sputtering system in the technical scheme, the upper end faces and the lower end faces of the materials can make contact with air, so that the wet gas removing effect on the materials by the degassing cavity is remarkably improved.
Description
Technical field
The present invention relates to a kind of semiconductor processing, degasifying device in especially a kind of magnetic control d.c. sputtering system.
Background technology
In magnetic control d.c. sputtering, material needs to carry out degassing processing to it before processing, namely by adding the moisture of heat abstraction material in transport with storage process.Material is brought in degasification chamber often through transport tape by existing degasifying device, to carry out heat treated to it.But because material is in transmitting procedure, its lower surface remains the laminating with transport tape, its degassing effect is caused to be difficult to be guaranteed.
Summary of the invention
The technical problem to be solved in the present invention is to provide degasifying device in a kind of magnetic control d.c. sputtering system, and it can make the moisture removal effect of material be able to remarkable improvement.
For solving the problems of the technologies described above, the present invention relates to degasifying device in a kind of magnetic control d.c. sputtering system, it includes except gas chamber, and extends to the transporting rail of degasification chamber interior; Described degasification chamber interior is provided with electric heat source; Described except among gas chamber, transporting rail is made up of two conveyor chains parallel to each other, and be respectively arranged with multiple transmission hole among two conveyor chains, the transmission hole among two conveyor chains is relative one by one; Transmission connecting rod is provided with in each transmission hole, transmission connecting rod adopts " L " type structure, it includes and extends in the horizontal direction, and the first bar section be connected with transmission hole, and the second bar section vertically extended, the end of the second bar section is provided with the storing dish for placing material, and storing dish extends in the horizontal direction.
As a modification of the present invention, the length of each storing dish in transporting rail radial direction is at most 1/4 of two conveyor chain spacing, it can guarantee to keep enough contacts area between the lower surface of material and air, to guarantee that its heating is ensured with the effect of dehumidifying.
As a modification of the present invention, the length in the vertical direction of each storing dish in transporting rail radial direction from top to bottom increases gradually.Adopt above-mentioned design, it can make material when dropping by factors such as mechanical vibration, can be clamped under the said structure of two storing dishes, and the reduction of working (machining) efficiency is caused in all the other regions to avoid it to crash into except in gas chamber.
As a modification of the present invention, the upper surface of each storing dish is provided with rubber antiskid layer, it includes many anti-skidding lines, and it significantly increases the frictional force between material and storing dish by rubber antiskid layer, thus the probability that material is dropped is able to remarkable improvement.
Adopt degasifying device in the magnetic control d.c. sputtering system of technique scheme, it is by the vibrational power flow of transporting rail, makes material be mounted on two storing dishes, to complete the connection between material and storing dish by its two ends; Conveyor chain drives transmission connecting rod to be communicated with material to carry out in transmitting procedure, and the upper surface of material and lower surface all can keep the contact with air, thus makes to remove gas chamber and be able to remarkable improvement for the moisture removal effect of material; Meanwhile, adopt said structure, transmission connecting rod is by storing dish and material gravity effect, and it remains at vertical direction, so material can be able to stable support and transmission.
Accompanying drawing explanation
Fig. 1 is schematic diagram of the present invention (transmission connecting rod does not indicate);
Fig. 2 transmits connecting rod schematic diagram in the present invention;
Reference numerals list:
1-except gas chamber, 2-conveyor chain, 3-transmission hole, 4-transmission connecting rod, the 41-the first bar section, the 42-the second bar section, 43-storing dish, 44-rubber antiskid layer, 5-electric heat source.
Embodiment
Below in conjunction with embodiment, illustrate the present invention further, following embodiment should be understood and be only not used in for illustration of the present invention and limit the scope of the invention.It should be noted that, the word "front", "rear" of use is described below, "left", "right", "up" and "down" refer to direction in accompanying drawing, word " interior " and " outward " refer to the direction towards or away from particular elements geometric centre respectively.
Embodiment 1
Degasifying device in a kind of magnetic control d.c. sputtering system as shown in Figures 1 and 2, it includes except gas chamber 1, and extends to the transporting rail except gas chamber 1 inside; Described gas chamber 1 inside of removing is provided with electric heat source 5; Described except among gas chamber 1, transporting rail is made up of two conveyor chains 2 parallel to each other, and the transmission hole 3 be respectively arranged with among two conveyor chains 2 among multiple transmission hole 3, two conveyor chains 2 is relative one by one; Transmission connecting rod 4 is provided with in each transmission hole 3, transmission connecting rod 4 adopts " L " type structure, it includes and extends in the horizontal direction, and the first bar section 41 be connected with transmission hole 3, and the second bar section 42 vertically extended, the end of the second bar section 42 is provided with the storing dish 43 for placing material, and storing dish 43 extends in the horizontal direction.
As a modification of the present invention, the length of each storing dish 43 in transporting rail radial direction is 1/5 of two conveyor chain 2 spacing, it can guarantee to keep enough contacts area between the lower surface of material and air, to guarantee that its heating is ensured with the effect of dehumidifying.
As a modification of the present invention, the length in the vertical direction of each storing dish 43 in transporting rail radial direction from top to bottom increases gradually.Adopt above-mentioned design, it can make material when dropping by factors such as mechanical vibration, can be clamped under the said structure of two storing dishes, and the reduction of working (machining) efficiency is caused in all the other regions to avoid it to crash into except in gas chamber.
Adopt degasifying device in the magnetic control d.c. sputtering system of technique scheme, it is by the vibrational power flow of transporting rail, makes material be mounted on two storing dishes, to complete the connection between material and storing dish by its two ends; Conveyor chain drives transmission connecting rod to be communicated with material to carry out in transmitting procedure, and the upper surface of material and lower surface all can keep the contact with air, thus makes to remove gas chamber and be able to remarkable improvement for the moisture removal effect of material; Meanwhile, adopt said structure, transmission connecting rod is by storing dish and material gravity effect, and it remains at vertical direction, so material can be able to stable support and transmission.
Embodiment 2
As a modification of the present invention, the upper surface of each storing dish 43 is provided with rubber antiskid layer 44, it includes many anti-skidding lines, and it significantly increases the frictional force between material and storing dish by rubber antiskid layer, thus the probability that material is dropped is able to remarkable improvement.
All the other feature & benefits of the present embodiment are all identical with embodiment 1.
Claims (4)
1. a degasifying device in magnetic control d.c. sputtering system, it includes except gas chamber, and extends to the transporting rail of degasification chamber interior; Described degasification chamber interior is provided with electric heat source; It is characterized in that, described except among gas chamber, transporting rail is made up of two conveyor chains parallel to each other, and be respectively arranged with multiple transmission hole among two conveyor chains, the transmission hole among two conveyor chains is relative one by one; Transmission connecting rod is provided with in each transmission hole, transmission connecting rod adopts " L " type structure, it includes and extends in the horizontal direction, and the first bar section be connected with transmission hole, and the second bar section vertically extended, the end of the second bar section is provided with the storing dish for placing material, and storing dish extends in the horizontal direction.
2. according to degasifying device in magnetic control d.c. sputtering system according to claim 1, it is characterized in that, the length of each storing dish in transporting rail radial direction is at most 1/4 of two conveyor chain spacing.
3. according to degasifying device in magnetic control d.c. sputtering system according to claim 2, it is characterized in that, the length in the vertical direction of each storing dish in transporting rail radial direction from top to bottom increases gradually.
4., according to degasifying device in magnetic control d.c. sputtering system according to claim 3, it is characterized in that, the upper surface of each storing dish is provided with rubber antiskid layer, and it includes many anti-skidding lines.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510806228.4A CN105316636B (en) | 2015-11-20 | 2015-11-20 | Depassing unit in magnetic control d.c. sputtering system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510806228.4A CN105316636B (en) | 2015-11-20 | 2015-11-20 | Depassing unit in magnetic control d.c. sputtering system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105316636A true CN105316636A (en) | 2016-02-10 |
| CN105316636B CN105316636B (en) | 2018-04-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510806228.4A Active CN105316636B (en) | 2015-11-20 | 2015-11-20 | Depassing unit in magnetic control d.c. sputtering system |
Country Status (1)
| Country | Link |
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| CN (1) | CN105316636B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108239762A (en) * | 2018-04-14 | 2018-07-03 | 苏州赛森电子科技有限公司 | Degassing device in magnetic control direct current sputtering system |
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| US4187801A (en) * | 1977-12-12 | 1980-02-12 | Commonwealth Scientific Corporation | Method and apparatus for transporting workpieces |
| US4824753A (en) * | 1986-04-30 | 1989-04-25 | Minolta Camera Kabushiki Kaisha | Carrier coated with plasma-polymerized film and apparatus for preparing same |
| JPH09316695A (en) * | 1996-05-27 | 1997-12-09 | Shinko Kogyo Kk | Transporting device and surface treating device |
| CN201014891Y (en) * | 2006-07-10 | 2008-01-30 | 黑龙江迪尔制药机械有限责任公司 | Chain delivery mechanism for vacuum microwave drying container |
| CN103196719A (en) * | 2013-03-17 | 2013-07-10 | 中国科学院苏州纳米技术与纳米仿生研究所 | Micro/nano-particle sample carrying mesh storage device for transmission electron microscope, and sample preparation method |
| CN204237864U (en) * | 2014-11-28 | 2015-04-01 | 浙江佑谦特种材料有限公司 | A kind of coating equipment fixture washing unit |
| CN204779684U (en) * | 2015-06-06 | 2015-11-18 | 南京维泰新材料科技有限公司 | Work piece transmission device in quenching treatment technology |
| CN205188427U (en) * | 2015-11-20 | 2016-04-27 | 苏州赛森电子科技有限公司 | Gas removal equipment in magnetic control direct current sputtering system |
-
2015
- 2015-11-20 CN CN201510806228.4A patent/CN105316636B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4187801A (en) * | 1977-12-12 | 1980-02-12 | Commonwealth Scientific Corporation | Method and apparatus for transporting workpieces |
| US4824753A (en) * | 1986-04-30 | 1989-04-25 | Minolta Camera Kabushiki Kaisha | Carrier coated with plasma-polymerized film and apparatus for preparing same |
| JPH09316695A (en) * | 1996-05-27 | 1997-12-09 | Shinko Kogyo Kk | Transporting device and surface treating device |
| CN201014891Y (en) * | 2006-07-10 | 2008-01-30 | 黑龙江迪尔制药机械有限责任公司 | Chain delivery mechanism for vacuum microwave drying container |
| CN103196719A (en) * | 2013-03-17 | 2013-07-10 | 中国科学院苏州纳米技术与纳米仿生研究所 | Micro/nano-particle sample carrying mesh storage device for transmission electron microscope, and sample preparation method |
| CN204237864U (en) * | 2014-11-28 | 2015-04-01 | 浙江佑谦特种材料有限公司 | A kind of coating equipment fixture washing unit |
| CN204779684U (en) * | 2015-06-06 | 2015-11-18 | 南京维泰新材料科技有限公司 | Work piece transmission device in quenching treatment technology |
| CN205188427U (en) * | 2015-11-20 | 2016-04-27 | 苏州赛森电子科技有限公司 | Gas removal equipment in magnetic control direct current sputtering system |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108239762A (en) * | 2018-04-14 | 2018-07-03 | 苏州赛森电子科技有限公司 | Degassing device in magnetic control direct current sputtering system |
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| CN105316636B (en) | 2018-04-06 |
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