CN105304340A - Preparation method of porous titanium dioxide thin film for dye-sensitized solar cell - Google Patents
Preparation method of porous titanium dioxide thin film for dye-sensitized solar cell Download PDFInfo
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- CN105304340A CN105304340A CN201510672868.0A CN201510672868A CN105304340A CN 105304340 A CN105304340 A CN 105304340A CN 201510672868 A CN201510672868 A CN 201510672868A CN 105304340 A CN105304340 A CN 105304340A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02E10/542—Dye sensitized solar cells
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Abstract
The invention discloses a preparation method of a porous titanium dioxide thin film for a dye-sensitized solar cell, and belongs to the field of porous material preparation. The preparation method comprises the steps of (1) providing a substrate material with the surface being clean, and depositing a titanium containing organic-inorganic composite film at the surface of the substrate material by adopting a molecular layer deposition technology; and (2) carrying out heat treatment on the prepared substrate material with the titanium containing organic-inorganic composite film being deposited at the surface for 2-5h at a temperature of 400-600 DEG C so as to acquire a porous titanium dioxide thin film. The thickness of the prepared porous titanium dioxide thin film can be controlled precisely, pore distribution is uniform, the specific surface area is large, the uniformity and crystallization are good, the impedance is small, the photo-generated current density is significantly improved, and the photoelectric performance can be greatly improved. In addition, the preparation method is simple in process equipment, small in number of operation procedures, mild in reaction condition, high in production efficiency, low in cost and energy consumption, pollution-free for the ecological environment, good in repeatability, excellent in actual use effect and suitable for large-scale application.
Description
Technical field
The invention belongs to porous material preparation field, particularly relate to a kind of preparation method of used by dye sensitization solar battery porous titanium dioxide thin-film.
Background technology
The sustainable development of energy and environment is just becoming two important development strategies of world today's human society.Along with the progress of science and technology and the development of human society, the demand of people to the energy sharply increases, and the development & application of new forms of energy is imperative.As a kind of inexhaustible, nexhaustible clean reproducible energy, the research on utilization of solar energy causes the fervent concern of whole world researcher.Wherein, DSSC is exactly a kind of like this photoelectric device effectively utilizing solar energy, its manufacture craft is simple, with low cost, stable performance, environmentally safe, thus there is good development prospect.But DSSC in actual applications photoelectric conversion efficiency is on the low side, this greatly limits its development.As the support of dye molecule and the transmission of absorption and charge carrier and carrier of separating, nano-titanium dioxide film plays very important role because having excellent photoelectric properties in raising photoelectric conversion efficiency, and film specific area is the key factor of the various performances determining DSSC, wherein, preparing loose structure titanium deoxid film is one of important channel increasing film specific area.
In the prior art of loose structure titanium deoxid film, Chinese patent CN201310677816.3, publication date is on March 12nd, 2014, name is called " a kind of preparation method of porous titanium dioxide thin-film ", the method using hollow glass micropearl as matrix, with Cu-Zn or Cu-Mn alloy for target, magnetron sputtering C u-Zn or Cu-Mn alloy firm, acidity or alkaline solution is adopted to carry out de-Alloying Treatment again, more also dry by washed with de-ionized water; Then the glass microballoon of dried parcel Porous Cu is passed through magnetron sputtering deposition titanium dioxide again, thus prepare poriferous titanium dioxide.Adopt the porous titanium dioxide thin-film prepared of the method to have larger surface area, optically catalytic TiO 2 effect under ultraviolet light can be improved, but in raising photoelectric conversion efficiency limited efficiency.Chinese patent CN200610049154.5, publication date is on January 18th, 2006, name is called " a kind of method preparing porous titanium dioxide thin-film ", the method take iso-butyl titanate as presoma, EGME is solvent, take hydroxylated cellulose as additive, sol-gel process is adopted to prepare porous titanium dioxide thin-film by Best-Effort request, porous titanium dioxide thin-film prepared by the method has better hydrophily and photocatalytic activity, and reunion when effectively prevent the hydrolysis of TiO 2 particles, and by changing Best-Effort request number of times, can the thickness of porous titanium dioxide thin-film, but effect is still limited in raising photoelectric conversion efficiency.Chinese patent CN200910096794.5, publication date is on March 19th, 2009, name is called " a kind of double-layer nanostructured anatase titanium dioxide photoelectric film and preparation method thereof ", the method adopts sol-gel process titania nanoparticles film to be spun on surface coverage to be had on the titanium-base of poriferous titanium dioxide network layer, because between interface titania nanoparticles and mesh structural porous titanium dioxide network, staggered inlaying exists cooperative effect and the photoelectric properties that improve film, and film forming is even, degree of crystallinity is good, purity is higher, but, the titanium dioxide nano-particle poor compatibility of boundary, its poor durability, strongly limit DSSC industrialized development.
Summary of the invention
In order to achieve the above object, the invention provides that a kind of specific area is large, film forming evenly, well-crystallized, used by dye sensitization solar battery porous titanium dioxide thin-film that purity is high preparation method.
The invention provides a kind of preparation method of used by dye sensitization solar battery porous titanium dioxide thin-film, it comprises the following steps:
Steps A, provides the base material of surface cleaning, adopts molecular-layer deposition technology at substrate material surface deposition titaniferous Organic inorganic film;
Step B, material steps A obtained is heat treatment 2-5h at 400-600 DEG C, obtains porous titanium dioxide thin-film.
The beneficial effect of the preparation method of used by dye sensitization solar battery porous titanium dioxide thin-film provided by the invention is:
(1) nano-titanium dioxide film that prepared by the present invention is loose structure, and pore scale is at nano-scale range, and distribution of pores is more even;
(2) the present invention to be combined with heat treatment phase by molecular-layer deposition technology and to prepare porous titanium dioxide thin-film, increase the specific area of titanium deoxid film, meanwhile, due to guarantor's type characteristic of molecular-layer deposition technology, ensure the uniformity of substrate material surface deposition of titanium oxide film.Porous titanium dioxide thin-film film forming prepared by the present invention is even, well-crystallized, and purity is high, and compared with the titanium deoxid film adopting sol-gel process to prepare with tradition, impedance is less, and photogenerated current density significantly improves, and greatly improves its photoelectric properties;
(3) the present invention can by the thickness regulating number of deposition cycles accurately to control porous titanium dioxide thin-film;
(4) porous titanium dioxide thin-film prepared of the present invention, process equipment is simple, and operating process is few, and reaction condition is gentle, and production efficiency is high, cost and energy consumption lower, pollution-free to biological environment, and reproducible, be suitable for scale application.
Accompanying drawing explanation
Fig. 1 is the structural representation of the porous titanium dioxide thin-film that the present invention prepares.
Embodiment
As shown in Figure 1, the invention provides a kind of preparation method of used by dye sensitization solar battery porous titanium dioxide thin-film, it comprises the following steps:
Steps A, provides the base material 2 of surface cleaning, adopts molecular-layer deposition technology at base material 2 surface deposition titaniferous Organic inorganic film;
Step B, material steps A obtained is heat treatment 2-5h at 400-600 DEG C, obtains porous titanium dioxide thin-film 1.
Preferably, in described steps A, under Ultrasonic Conditions, use organic solvent and washed with de-ionized water base material 2, then the base material 2 after cleaning is dried up the base material 2 obtaining surface cleaning with compressed nitrogen.Concrete, described organic solvent is the one in isopropyl alcohol, alcohol, chloroform or acetone.
Preferably, described step B comprises,
Steps A 1, puts into the base material 2 of surface cleaning the reaction chamber that temperature is the atomic layer deposition apparatus of 80-150 DEG C, purges 5-30min with 50-100sccm high pure nitrogen;
Steps A 2, by TiCl
4or titanium tetraisopropylate is heated to 60-100 DEG C of formation TiCl
4or titanium tetraisopropylate steam, and with impulse form by TiCl
4or titanium tetraisopropylate steam sends into reaction cavity, the burst length is 0.05-0.2s, and open-assembly time is 8-15s, then purges with high pure nitrogen, and purge time is 15-30s;
Steps A 3, dihydroxylic alcohols or polyalcohol are heated to 100-200 DEG C and form dihydroxylic alcohols or polyalcohol steam, reaction cavity is sent into again with impulse form, burst length is 0.1-1s, open-assembly time is 20-45s, then purges with high pure nitrogen, and purge time is 30-45s, complete primary depositing circulation, i.e. one deck titaniferous Organic inorganic film at base material 2 surface deposition;
Steps A 4, the deposition cycle of repetition steps A 2-A3 100-20000 time.
Preferred further, in described steps A 3, dihydroxylic alcohols is the one in ethylene glycol, propylene glycol or butanediol; Polyalcohol is the one in glycerol, trimethylolethane, pentaerythrite, xylitol or sorbierite.
Preferred further, in described steps A 3, each deposition cycle makes the titaniferous Organic inorganic film thickness obtained increase to 0.06-0.12nm.
Further preferred, repeat deposition cycle 1000-10000 time of steps A 2-A3 in described steps A 4.
Preferably, described base material 2 is the silicon dioxide electro-conductive glass of doped with fluorine, i.e. FTO electro-conductive glass, indium tin oxide electro-conductive glass, i.e. ITO electro-conductive glass, mix the zinc oxide electro-conductive glass of aluminium, i.e. AZO electro-conductive glass, the one in monocrystalline silicon piece, Copper Foil or nonwoven fabrics.
Preferably, in described step B, heat treatment is carried out in air, oxygen or inert atmosphere.
Preferably, the specific area that the specific area obtaining porous titanium dioxide thin-film 1 in described step B is is 60-400m
2/ g, pore scale is at 8 ~ 10nm.。
Below in conjunction with specific embodiment, describe the present invention further.Certainly described embodiment is only a part of embodiment of the present invention; instead of whole embodiment; based on the embodiment in the present invention, those skilled in the art, not making the every other embodiment obtained under creative work prerequisite, belong to protection scope of the present invention.
Embodiment 1
First, with isopropyl alcohol cleaning FTO electro-conductive glass under Ultrasonic Conditions, then the FTO electro-conductive glass compressed nitrogen after cleaning is dried up;
Secondly, FTO electro-conductive glass is put into the reaction chamber that temperature is the atomic layer deposition apparatus of 80 DEG C, purge 5min with 50sccm high pure nitrogen;
Then, be the TiCl of 97% by purity
4be heated to 60 DEG C and form TiCl
4steam, and with impulse form by TiCl
4steam sends into reaction cavity, and the burst length is 0.05s, and open-assembly time is 8s, then purges with high pure nitrogen, and purge time is 15s;
Next, ethylene glycol is heated to 100 DEG C and forms ethylene glycol steam, reaction cavity is sent into again with impulse form, burst length is 0.1s, open-assembly time is 20s, then purges with high pure nitrogen, and purge time is 30s, complete primary depositing circulation, namely deposited one deck titaniferous Organic inorganic film at substrate material surface;
Using such method repeats this deposition cycle 20000 times;
Finally, by the surface deposition that obtains the FTO electro-conductive glass of the doped with fluorine of titaniferous Organic inorganic film in air atmosphere at 450 DEG C heat treatment 5h, organic component in removing titaniferous Organic inorganic film, thus obtain porous titanium dioxide thin-film.
Adopt porous TiO prepared by above-mentioned technological parameter
2film, each deposition cycle can make the titaniferous Organic inorganic film thickness obtained increase to 0.06nm, and therefore, porous titanium dioxide thin-film thickness 1200nm, specific area is 400m
2/ g, average pore size 8nm.
Embodiment 2
First, with alcohol washes ITO electro-conductive glass under Ultrasonic Conditions, then the ITO electro-conductive glass compressed nitrogen after cleaning is dried up;
Secondly, ITO electro-conductive glass is put into the reaction chamber that temperature is the atomic layer deposition apparatus of 150 DEG C, purge 30min with 100sccm high pure nitrogen;
Then, be that the titanium tetraisopropylate of 97% is heated to 65 DEG C of formation titanium tetraisopropylate steams by purity, and with impulse form, titanium tetraisopropylate steam sent into reaction cavity, burst length is 0.2s, open-assembly time is 15s, then purges with high pure nitrogen, and purge time is 30s;
Next, glycerol is heated to 120 DEG C and forms glycerol steam, reaction cavity is sent into again with impulse form, burst length is 1s, open-assembly time is 30s, then purges with high pure nitrogen, and purge time is 45s, complete primary depositing circulation, namely deposited one deck titaniferous Organic inorganic film at substrate material surface;
Using such method repeats this deposition cycle 10000 times;
Finally, by the surface deposition that obtains the ITO electro-conductive glass of the doped with fluorine of titaniferous Organic inorganic film in air atmosphere at 600 DEG C heat treatment 2h, organic component in removing titaniferous Organic inorganic film, thus obtain porous titanium dioxide thin-film.
Adopt porous TiO prepared by above-mentioned technological parameter
2film, each deposition cycle can make the titaniferous Organic inorganic film thickness obtained increase to 0.08nm, and therefore, porous titanium dioxide thin-film thickness 800nm, the specific area of titanium deoxid film is 220m
2/ g, pore scale is at 8.325nm.
Embodiment 3
First, clean Copper Foil with chloroform under Ultrasonic Conditions, then the Copper Foil compressed nitrogen after cleaning is dried up;
Secondly, Copper Foil is put into the reaction chamber that temperature is the atomic layer deposition apparatus of 100 DEG C, purge 20min with 70sccm high pure nitrogen;
Then, be that the titanium tetraisopropylate of 97% is heated to 65 DEG C of formation titanium tetraisopropylate steams by purity, and with impulse form, titanium tetraisopropylate steam sent into reaction cavity, burst length is 0.2s, open-assembly time is 15s, then purges with high pure nitrogen, and purge time is 30s;
Next, glycerol is heated to 120 DEG C and forms glycerol steam, reaction cavity is sent into again with impulse form, burst length is 1s, open-assembly time is 30s, then purges with high pure nitrogen, and purge time is 45s, complete primary depositing circulation, namely deposited one deck titaniferous Organic inorganic film at substrate material surface;
Using such method repeats this deposition cycle 1000 times;
Finally, by the surface deposition that obtains the Copper Foil of the doped with fluorine of titaniferous Organic inorganic film in air atmosphere at 400 DEG C heat treatment 5h, organic component in removing titaniferous Organic inorganic film, thus obtain porous titanium dioxide thin-film.
Adopt porous TiO prepared by above-mentioned technological parameter
2film, each deposition cycle can make the titaniferous Organic inorganic film thickness obtained increase to 0.96nm, and therefore, porous titanium dioxide thin-film thickness 96nm, the specific area of titanium deoxid film is 106m
2/ g, pore scale is at 9.45nm.。
Embodiment 4
First, clean nonwoven fabrics with acetone under Ultrasonic Conditions, then the nonwoven fabrics compressed nitrogen after cleaning is dried up;
Secondly, nonwoven fabrics is put into the reaction chamber that temperature is the atomic layer deposition apparatus of 100 DEG C, purge 20min with 70sccm high pure nitrogen;
Then, be the TiCl of 97% by purity
4be heated to 60 DEG C and form TiCl
4steam, and with impulse form by TiCl
4steam sends into reaction cavity, and the burst length is 0.05s, and open-assembly time is 8s, then purges with high pure nitrogen, and purge time is 15s;
Next, ethylene glycol is heated to 100 DEG C and forms ethylene glycol steam, reaction cavity is sent into again with impulse form, burst length is 0.1s, open-assembly time is 20s, then purges with high pure nitrogen, and purge time is 30s, complete primary depositing circulation, namely deposited one deck titaniferous Organic inorganic film at substrate material surface;
Using such method repeats this deposition cycle 100 times;
Finally, by the surface deposition that obtains the nonwoven fabrics of the doped with fluorine of titaniferous Organic inorganic film in air atmosphere at 500 DEG C heat treatment 4h, organic component in removing titaniferous Organic inorganic film, thus obtain porous titanium dioxide thin-film.
Adopt porous TiO prepared by above-mentioned technological parameter
2film, each deposition cycle can make the titaniferous Organic inorganic film thickness obtained increase to 0.12nm, and therefore, porous titanium dioxide thin-film thickness 12nm, the specific area of titanium deoxid film is 60m
2/ g, pore scale is at 9.854nm.。
Claims (10)
1. a preparation method for used by dye sensitization solar battery porous titanium dioxide thin-film, it comprises the following steps:
Steps A, provides the base material of surface cleaning, adopts molecular-layer deposition technology at substrate material surface deposition titaniferous Organic inorganic film;
Step B, material steps A obtained is heat treatment 2-5h at 400-600 DEG C, obtains porous titanium dioxide thin-film.
2. the preparation method of used by dye sensitization solar battery porous titanium dioxide thin-film as claimed in claim 1, it is characterized in that: in described steps A, under Ultrasonic Conditions, use organic solvent and washed with de-ionized water base material, then the base material compressed nitrogen after cleaning is dried up the base material obtaining surface cleaning.
3. the preparation method of used by dye sensitization solar battery porous titanium dioxide thin-film as claimed in claim 2, is characterized in that: described organic solvent is the one in isopropyl alcohol, alcohol, chloroform or acetone.
4. the preparation method of used by dye sensitization solar battery porous titanium dioxide thin-film as claimed in claim 1, is characterized in that: described steps A comprises,
Steps A 1, puts into the base material of surface cleaning the reaction chamber that temperature is the atomic layer deposition apparatus of 80-150 DEG C, purges 5-30min with 50-100sccm high pure nitrogen;
Steps A 2, by TiCl
4or titanium tetraisopropylate is heated to 60-100 DEG C of formation TiCl
4or titanium tetraisopropylate steam, and with impulse form by TiCl
4or titanium tetraisopropylate steam sends into reaction cavity, the burst length is 0.05-0.2s, and open-assembly time is 8-15s, then purges with high pure nitrogen, and purge time is 15-30s;
Steps A 3, dihydroxylic alcohols or polyalcohol are heated to 100-200 DEG C and form dihydroxylic alcohols or polyalcohol steam, reaction cavity is sent into again with impulse form, burst length is 0.1-1s, open-assembly time is 20-45s, then purges with high pure nitrogen, and purge time is 30-45s, complete primary depositing circulation, namely deposited one deck titaniferous Organic inorganic film at substrate material surface;
Steps A 4, the deposition cycle of repetition steps A 2-A3 100-20000 time.
5. the preparation method of used by dye sensitization solar battery porous titanium dioxide thin-film as claimed in claim 4, is characterized in that: in described steps A 3, dihydroxylic alcohols is the one in ethylene glycol, propylene glycol or butanediol; Polyalcohol is the one in glycerol, trimethylolethane, pentaerythrite, xylitol or sorbierite.
6. the preparation method of used by dye sensitization solar battery porous titanium dioxide thin-film as claimed in claim 4, is characterized in that: in described steps A 3, each deposition cycle makes the titaniferous Organic inorganic film thickness obtained increase to 0.06-0.12nm.
7. the preparation method of used by dye sensitization solar battery porous titanium dioxide thin-film as claimed in claim 4, is characterized in that: deposition cycle 1000-10000 time repeating steps A 2-A3 in described steps A 4.
8. the preparation method of used by dye sensitization solar battery porous titanium dioxide thin-film as claimed in claim 1, is characterized in that: described base material is the one in the silicon dioxide electro-conductive glass of doped with fluorine, indium tin oxide electro-conductive glass, the zinc oxide electro-conductive glass mixing aluminium, monocrystalline silicon piece, Copper Foil or nonwoven fabrics.
9. the preparation method of used by dye sensitization solar battery porous titanium dioxide thin-film as claimed in claim 1, is characterized in that: in described step B, heat treatment is carried out in air, oxygen or inert atmosphere.
10. the preparation method of used by dye sensitization solar battery porous titanium dioxide thin-film as claimed in claim 1, is characterized in that: the specific area obtaining porous titanium dioxide thin-film in described step B is 60-400m
2/ g, pore scale is at 8 ~ 10nm.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105944714A (en) * | 2016-05-24 | 2016-09-21 | 昆明理工大学 | Sulfur-resistant denitration catalyst preparation method |
| CN110512189A (en) * | 2019-06-14 | 2019-11-29 | 邱越 | A kind of aperture adjustable porous metal oxide preparation method based on molecular-layer deposition |
| WO2022056762A1 (en) * | 2020-09-17 | 2022-03-24 | 中国科学院大连化学物理研究所 | Preparation method for porous oxide |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101752093A (en) * | 2010-02-26 | 2010-06-23 | 上海交通大学 | Preparation method for photonic crystal structure film electrode of dye solar cell |
| CN101779258A (en) * | 2007-07-25 | 2010-07-14 | 聚合物华润有限公司 | Solar cell and method for preparation thereof |
-
2015
- 2015-10-16 CN CN201510672868.0A patent/CN105304340B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101779258A (en) * | 2007-07-25 | 2010-07-14 | 聚合物华润有限公司 | Solar cell and method for preparation thereof |
| CN101752093A (en) * | 2010-02-26 | 2010-06-23 | 上海交通大学 | Preparation method for photonic crystal structure film electrode of dye solar cell |
Non-Patent Citations (1)
| Title |
|---|
| RAJANKUMAR L.PATEL等: "Highly porous titania films coated on sub-micron particles with tunable thickness by molecular layer deposition in a fluidized bed reactor", 《CERAMICS INTERNATIONAL》 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105944714A (en) * | 2016-05-24 | 2016-09-21 | 昆明理工大学 | Sulfur-resistant denitration catalyst preparation method |
| CN110512189A (en) * | 2019-06-14 | 2019-11-29 | 邱越 | A kind of aperture adjustable porous metal oxide preparation method based on molecular-layer deposition |
| WO2022056762A1 (en) * | 2020-09-17 | 2022-03-24 | 中国科学院大连化学物理研究所 | Preparation method for porous oxide |
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