CN105300869A - Device and method for measuring gas permeability of material by virtue of differential vacuum gauge - Google Patents
Device and method for measuring gas permeability of material by virtue of differential vacuum gauge Download PDFInfo
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Abstract
The invention discloses a device and a method for measuring the gas permeability of a material by virtue of a differential vacuum gauge, and is used for solving the problem of low measuring sensitivity existing in the prior art. The device comprises a gas source, a deflation measurement chamber, a reference thin film chamber, a differential amplifier and vacuum gauges, wherein the air source is connected with a gas chamber; the gas chamber is communicated with a permeation chamber; the permeation chamber is provided with a heater and communicated with an accumulation chamber; the accumulation chamber is provided with a heater and connected with the vacuum gauge A; the signal end of the vacuum gauge is electrically connected with one end of the differential amplifier; the deflation measurement chamber is connected with the vacuum gauge B; the signal end of the vacuum gauge B is electrically connected with the other input end of the differential amplifier; the output end of the differential amplifier is electrically connected with the signal input ends of the vacuum gauges; the deflation measurement chamber is also communicated with the reference thin film chamber; the deflation measurement chamber and the reference thin film chamber are provided with heaters; the gas chamber, the accumulation chamber, the deflation measurement chamber and the reference thin film chamber are communicated with a high-vacuum pump; the high-vacuum pump is communicated with a low-vacuum pump.
Description
Technical field
The invention belongs to the gas permeability field of measuring technique of the encapsulating material of the objects such as electromechanical device, food, medicine, specifically disclose device and the measuring method thereof that material gas permeability measured by a kind of difference vacuum meter.
Background technology
The article such as electron device, food, medicine need packaging or the encapsulating material with low gas permeability, to prevent in use and storing process, harmful gas enters in device (as organic electroluminescence device), causes the performance of device or life-span to decline; Or prevent harmful gas from entering in food and pharmaceutical packing, cause food and medicine to go bad; Or prevent from, outside the material vapor effusion packaging of food or medicine, causing the quality of food and medicine decline or lost efficacy.
Want Design and manufacture to go out to meet and use and the encapsulation of the electron device of memory requirement, food and medicine or wrappage, just must possess and these be encapsulated or equipment that the gas permeability of wrappage is measured and measuring method.
The method measuring the gas permeability of material has a variety of, and wherein a kind of is utilize mass-spectrometer measurement technology to measure the gas permeability of material, sees US Patent No. 4944180A, Chinese patent ZL200810045129.9 and ZL201310026422.1.It is high that this kind of device has measurement sensistivity, the feature that measuring speed is fast, but price comparison is expensive.Another method utilizes differential pressure conditioner as sensor to measure the permeability of film, as Chinese patent CN104729973A.The venting that this design solves measuring system preferably affects problem to measurement accuracy, but there is following shortcoming:
(1) pressure difference that can measure of the differential pressure pickup-differential pressure conditioner adopted is minimum is 1Pa magnitude, when the gas permeability of film is very little, just cannot measure when the pressure reduction of generation is less than 1Pa magnitude, limit the raising of measurement sensistivity.
(2) do not have to consider how to eliminate the impact of film venting on measurement accuracy, and in real work, tested film is organic material mostly, outgassing rate is higher, larger on the impact of measurement accuracy.
(3) measuring chamber and reference chamber lead to the pump-line of vacuum pump is series connection, middle also have a vacuum valve, the effective pumping speed of vacuum system to measuring chamber and reference chamber is differed greatly, causes in bakeout degassing process, two rooms are unequal by the gas flow extracted, degassing effect is unbalanced, after bakeout degassing process completes, the background pressure of two rooms and discharge quantity must be unequal, enter measuring chamber even without infiltration gas, also can produce pressure reduction, thus produce measuring error.
Summary of the invention
The low problem of measurement sensistivity that the present invention exists to solve prior art, and the device providing a kind of difference vacuum meter to measure material gas permeability and measuring method thereof, overcome the shortcoming that existing pressure differential method is measured, lower pressure reduction can be measured, improve the sensitivity of measuring; Simultaneously can eliminate tested film phenomenon of deflation, and eliminate measuring chamber and reference chamber discharge quantity non-uniform phenomenon to the impact of film permeation rate measurement accuracy, thus improve measuring accuracy.
For solving the problems of the technologies described above, the technical solution adopted in the present invention is:
The device of material gas permeability measured by a kind of difference vacuum meter, it is characterized in that, comprise source of the gas, venting measuring chamber, reference thin film room, differential amplifier and vacuum meter, described source of the gas is connected with gas compartment through pipeline and reduction valve, described gas compartment is communicated with the permeate chamber for placing tested film, described permeate chamber is equipped with permeate chamber well heater, described permeate chamber is communicated with accumulating chamber, described accumulating chamber is equipped with accumulating chamber well heater, described accumulating chamber is connected with vacuum gauge A, the signal end of vacuum gauge A is electrically connected with an input end of differential amplifier, venting measuring chamber is connected with vacuum gauge B, the signal end of vacuum gauge B is electrically connected with another input end of differential amplifier, the output terminal of differential amplifier is electrically connected with the signal input part of vacuum meter, described venting measuring chamber is also communicated with the reference thin film room for placing reference thin film, and described venting measuring chamber and reference thin film room are equipped with venting measuring chamber well heater and reference thin film chamber heater respectively, described gas compartment, accumulating chamber, venting measuring chamber and reference thin film room are communicated with high vacuum pump through gas compartment extraction valve, accumulating chamber extraction valve, venting measuring chamber extraction valve and reference thin film room extraction valve respectively, and described high vacuum pump is communicated with roughing pump through low vacuum valve.
The material of described permeate chamber and reference thin film room, structure and measure-alike; The material of described tested film and reference thin film and measure-alike; Being vacuum seal between the edge of described tested film and the inwall of permeate chamber, is vacuum seal between the edge of described reference thin film and the inwall of reference thin film room.
Described accumulating chamber and the venting material of measuring chamber, structure are all identical with size.
Described vacuum gauge A and vacuum gauge B is one species and is the vacuum gauge of same model.
Described vacuum gauge is the one in High Voltage ionization gauge, Pirani gauge, thermocouple rule or thin-film electro content regulation.
The input end of described differential amplifier is equipped with single-ended-double-width grinding switching device shifter.
Described high vacuum pump is turbomolecular pump, ODP or cryo pump, and described roughing pump is rotary vane mechanical pump.
Described gas compartment extraction valve, accumulating chamber extraction valve, venting measuring chamber extraction valve and reference thin film room extraction valve are high vacuum valve.
A measuring method for the device of the gas permeability of material measured by difference vacuum meter, it is characterized in that, comprises the following steps:
Step 1: by tested diaphragm seal to be measured in permeate chamber, will be sealed in reference thin film room with tested membraneous material and measure-alike reference thin film;
Step 2: open gas compartment extraction valve, accumulating chamber extraction valve, venting measuring chamber extraction valve and reference thin film room extraction valve, opens roughing pump and low vacuum valve takes out low vacuum to whole system;
Step 3: when pressure gauge reading is 0 atmospheric pressure, open vacuum meter, differential amplifier is set to single ended input pattern, vacuum meter independent measurement vacuum gauge A or vacuum gauge B;
Step 4: when gauge reading is less than 100Pa, opens high vacuum pump, to whole system pumping high vacuum;
Step 5: gauge reading is less than 10
-2during Pa magnitude, open permeate chamber well heater, reference thin film chamber heater, accumulating chamber well heater and venting measuring chamber well heater and carry out bakeout degassing;
Step 6: close accumulating chamber well heater and venting measuring chamber well heater; Regulate the heter temperature of permeate chamber well heater and reference thin film chamber heater to specific temperature;
Step 7: accumulating chamber and venting measuring chamber temperature drop to room temperature, and vacuum meter reading is reduced to 10
-4pa magnitude;
Step 8: differential amplifier switches to double-width grinding pattern, vacuum meter carries out difference measurement to the signal of vacuum gauge A and vacuum gauge B simultaneously, the reading P of record vacuum meter
0;
Step 9: close gas compartment extraction valve, accumulating chamber extraction valve, venting measuring chamber extraction valve and reference thin film room extraction valve; Then open reduction valve immediately, source of the gas is filled in gas compartment, make the pressure P in gas compartment
2reduction valve is closed, if be now t=0 when reaching 1 atmospheric pressure;
Step 10: the change of record vacuum meter reading P and the numerical value of time of penetration t;
Step 11: establish P-P
0=P
1, P
1the funtcional relationship of t change is in time:
In above formula: P
2gas pressure intensity in-gas compartment 3;
K-gas is to the infiltration coefficient of tested film 8
The infiltrating area of A-tested film 8
The thickness of d-tested film 8
The volume of V-accumulating chamber 10;
Step 12: obtain k value by the formula in step 11, then go out permeability Q (g/m according to following formulae discovery
2day);
In above formula: the molal weight of μ-gas
R-gas universal constant
T-temperature.
Compared with prior art, the present invention has following beneficial effect:
The present invention is at the venting measuring chamber end as differential pressure measurement benchmark, a physical dimension and the identical reference thin film room of permeate chamber are set, wherein one and the identical reference thin film of tested film are installed, its gas of releasing introduces venting measuring chamber, the pressure produced becomes a part for pressure reduction benchmark, thus can be cancelled in the measurements, improve the accuracy of measurement.
Permeate chamber and venting measuring chamber are in parallel with the pump-line between vacuum pump, and line size is identical, make the effective pumping speed of vacuum pump to two rooms identical, in permeability survey process, the discharge quantity of two rooms is substantially equal with background pressure, pressure reduction can not be produced, eliminate the impact of two room venting factors to greatest extent, improve the accuracy of permeability survey.
Ionization vacuum ga(u)ge in the present invention adopts High Voltage ionization vacuum ga(u)ge, and the pressure measurement scope of this vacuum gauge is 10
3pa-10
-4pa, with such two vacuum gauges, difference pre-amplifier and ion gauges, forming one can measure 10
-3the high sensitivity differential pressure pickup of Pa magnitude pressure reduction, can significantly improve the sensitivity of permeability survey.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention;
Mark in figure: 1, source of the gas, 2, reduction valve, 3, gas compartment, 4, tensimeter, 5, gas compartment extraction valve, 6, permeate chamber well heater, 7, permeate chamber, 8, tested film, 9, accumulating chamber well heater, 10, accumulating chamber, 11, vacuum gauge A, 12, accumulating chamber extraction valve, 13, vacuum gauge B, 14, venting measuring chamber, 15, venting measuring chamber well heater, 16, reference thin film room, 17, reference thin film, 18, reference thin film chamber heater, 19, reference thin film room extraction valve, 20, venting measuring chamber extraction valve, 21, differential amplifier, 22, vacuum meter, 23, roughing pump, 24, low vacuum valve, 25, high vacuum pump.
Embodiment
Below in conjunction with embodiment, the invention will be further described, and described embodiment is only the present invention's part embodiment, is not whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making other embodiments used obtained under creative work prerequisite, belongs to protection scope of the present invention.
By reference to the accompanying drawings, the device of material gas permeability measured by difference vacuum meter of the present invention, comprises source of the gas 1, venting measuring chamber 14, reference thin film room 16, differential amplifier 21 and vacuum meter 22, wherein, source of the gas of the present invention can for being equipped with the gas cylinder of tested gas, described source of the gas 1 is connected with gas compartment 3 through pipeline and reduction valve 2, gas compartment is equipped with tensimeter 4, for detecting the pressure in gas compartment, described gas compartment 3 is communicated with the permeate chamber 7 for placing tested film 8, described permeate chamber 7 is equipped with permeate chamber well heater 6, described permeate chamber 7 is communicated with accumulating chamber 10, described accumulating chamber 10 is equipped with accumulating chamber well heater 9, described accumulating chamber 10 is connected with vacuum gauge A11, the signal end of vacuum gauge A11 is electrically connected with an input end of differential amplifier 22, venting measuring chamber 14 is connected with vacuum gauge B13, the signal end of vacuum gauge B13 is electrically connected with another input end of differential amplifier 22, the output terminal of differential amplifier 22 is electrically connected with the signal input part of vacuum meter 22, described venting measuring chamber 14 is also communicated with the reference thin film room 16 for placing reference thin film 17, and described venting measuring chamber 14 and reference thin film room 16 are equipped with venting measuring chamber well heater 15 and reference thin film chamber heater 18 respectively, described gas compartment 3, accumulating chamber 10, venting measuring chamber 14 and reference thin film room 16 are communicated with high vacuum pump 25 through gas compartment extraction valve 5, accumulating chamber extraction valve 12, venting measuring chamber extraction valve 20 and reference thin film room extraction valve 19 respectively, and described high vacuum pump 25 is communicated with roughing pump 23 through low vacuum valve 24.
The material of described permeate chamber 7 and reference thin film room 16, structure and measure-alike; The material of described tested film 8 and reference thin film 17 and measure-alike; Being vacuum seal between the edge of described tested film 8 and the inwall of permeate chamber 7, is vacuum seal between the edge of described reference thin film 17 and the inwall of reference thin film room 16.
Described accumulating chamber 10 and the venting material of measuring chamber 14, structure are all identical with size.
Described vacuum gauge A11 and vacuum gauge B13 is one species and is the vacuum gauge of same model.
Wherein, vacuum gauge is the one in High Voltage ionization gauge, Pirani gauge, thermocouple rule or thin-film electro content regulation.
The input end of described differential amplifier 21 is equipped with single-ended-double-width grinding switching device shifter, by arranging single-ended-double-width grinding end-grain cutting changing device, make differential amplifier 21 can carry out single ended input to the signal of vacuum gauge A11 and vacuum gauge B13 separately, also can carry out both-end Differential Input to vacuum gauge A11 and vacuum gauge B13 simultaneously.Wherein, for single-ended-double-width grinding switching device shifter, those skilled in the art understands and understands, and does not repeat them here.
Described high vacuum pump 25 is turbomolecular pump, ODP or cryo pump, and described roughing pump 23 is rotary vane mechanical pump.
Described gas compartment extraction valve 5, accumulating chamber extraction valve 12, venting measuring chamber extraction valve 20 and reference thin film room extraction valve 19 are high vacuum valve.
Using be filled with purity higher than 99% the welding bottle of oxygen as source of the gas; Tested film is PET film, is namely to measure oxygen for the permeability of PET film when T=80 DEG C.Before test, valve used of the present invention is all in closed condition, and be full of air in each container and pipeline, each equipment is not all energized.Certain the present invention can also measure the film permeability under specific temperature (as T=70 DEG C, 75 DEG C etc.) of other sources of the gas for other materials.
Below, to measuring oxygen for the permeability of PET film when T=80 DEG C, step of the present invention is described in further detail.
Step 1: be sealed in permeate chamber 7 by tested film 8 to be measured, will be sealed in reference thin film room 16 with tested film 8 material and measure-alike reference thin film 17;
Step 2: open gas compartment extraction valve 5, accumulating chamber extraction valve 12, venting measuring chamber extraction valve 20 and reference thin film room extraction valve 19, opens roughing pump 23 and low vacuum valve 24 pairs of whole systems take out low vacuum;
Step 3: when tensimeter 4 reading is 0 atmospheric pressure, open vacuum meter 22, differential amplifier 21 is set to single ended input pattern, vacuum meter 22 independent measurement vacuum gauge A or vacuum gauge B;
Step 4: when gauge 22 reading is less than 100Pa, opens high vacuum pump 25, to whole system pumping high vacuum;
Step 5: gauge 22 reading is less than 10
-2during Pa magnitude, open permeate chamber well heater 6 and reference thin film chamber heater 18, make permeate chamber and reference thin film room temperature arrive 100 DEG C; Open accumulating chamber well heater 9 and venting measuring chamber well heater 15, make accumulating chamber 10 and venting measuring chamber 14 temperature reach 200 DEG C, bakeout degassing is carried out to system; Each well heater work 2 hours and more than, reach the object of bakeout degassing;
Step 6: close accumulating chamber well heater 9 and venting measuring chamber well heater 15; Regulate heter temperature to 80 DEG C or other specific temperature of permeate chamber well heater 6 and reference thin film chamber heater 18;
Step 7: when accumulating chamber 10 and venting measuring chamber 14 temperature drop to room temperature, vacuum meter reading should be reduced to 10
-4pa magnitude; Otherwise show that vacuum system somewhere exists small opening, leak detection should be shut down and repair;
Step 8: differential amplifier 21 switches to double-width grinding pattern, vacuum meter 22 carries out difference measurement to the signal of vacuum gauge A11 and vacuum gauge B13 simultaneously, the reading P of record vacuum meter 22
0;
Step 9: close gas compartment extraction valve 5, accumulating chamber extraction valve 12, venting measuring chamber extraction valve 20 and reference thin film room extraction valve 19; Then open reduction valve 2 immediately, the oxygen (source of the gas) in welding bottle is filled in gas compartment 3, makes the pressure P in gas compartment 3
2reduction valve is closed, if be now t=0 when reaching 1 atmospheric pressure;
Step 10: the change of record vacuum meter reading P and the numerical value of time of penetration t, when P value is greater than P
0during value suitable multiple, start to record P value and t value;
Step 11: establish P-P
0=P
1, according to used vacuum gauge for the relative sensitivity characteristic of oxygen to P
1value is revised, and obtains real P
1value; Real P
1the funtcional relationship of t change is in time:
In above formula: P
2gas pressure intensity in-gas compartment 3;
K-gas is to the infiltration coefficient of tested film 8
The infiltrating area of A-tested film 8
The thickness of d-tested film 8
The volume of V-accumulating chamber 10;
Step 12: obtain k value by the formula in step 11, then go out permeability Q (g/m according to following formulae discovery
2day);
In above formula: the molal weight of μ-gas
R-gas universal constant
T-temperature.
Above formula is applicable to P
2>>P
1condition.In actual measurement, P
2be at least an atmospheric pressure, and P
1for low vacuum, this condition generally can meet.
Claims (9)
1. the device of a difference vacuum meter measurement material gas permeability, it is characterized in that, comprise source of the gas, venting measuring chamber, reference thin film room, differential amplifier and vacuum meter, described source of the gas is connected with gas compartment through pipeline and reduction valve, described gas compartment is communicated with the permeate chamber for placing tested film, described permeate chamber is equipped with permeate chamber well heater, described permeate chamber is communicated with accumulating chamber, described accumulating chamber is equipped with accumulating chamber well heater, described accumulating chamber is connected with vacuum gauge A, and the signal end of vacuum gauge A is electrically connected with an input end of differential amplifier; Venting measuring chamber is connected with vacuum gauge B, and the signal end of vacuum gauge B is electrically connected with another input end of differential amplifier; The output terminal of differential amplifier is electrically connected with the signal input part of vacuum meter; Described venting measuring chamber is also communicated with the reference thin film room for placing reference thin film, and described venting measuring chamber and reference thin film room are equipped with venting measuring chamber well heater and reference thin film chamber heater respectively; Described gas compartment, accumulating chamber, venting measuring chamber and reference thin film room are communicated with high vacuum pump through gas compartment extraction valve, accumulating chamber extraction valve, venting measuring chamber extraction valve and reference thin film room extraction valve respectively, and described high vacuum pump is communicated with roughing pump through low vacuum valve.
2. the device of material gas permeability measured by difference vacuum meter according to claim 1, it is characterized in that, the material of described permeate chamber and reference thin film room, structure and measure-alike; The material of described tested film and reference thin film and measure-alike; Being vacuum seal between the edge of described tested film and the inwall of permeate chamber, is vacuum seal between the edge of described reference thin film and the inwall of reference thin film room.
3. the device of material gas permeability measured by difference vacuum meter according to claim 1, it is characterized in that, material, the structure of described accumulating chamber and measuring chamber of exitting are all identical with size.
4. the device of material gas permeability measured by difference vacuum meter according to claim 1, it is characterized in that, described vacuum gauge A and vacuum gauge B is one species and is the vacuum gauge of same model.
5. the device of material gas permeability measured by difference vacuum meter according to claim 4, it is characterized in that, described vacuum gauge is the one in High Voltage ionization gauge, Pirani gauge, thermocouple rule or thin-film electro content regulation.
6. the device of material gas permeability measured by difference vacuum meter according to claim 1, and it is characterized in that, the input end of described differential amplifier is equipped with single-ended-double-width grinding switching device shifter.
7. the device of material gas permeability measured by difference vacuum meter according to claim 1, and it is characterized in that, described high vacuum pump is turbomolecular pump, ODP or cryo pump, and described roughing pump is rotary vane mechanical pump.
8. the device of material gas permeability measured by difference vacuum meter according to claim 1, it is characterized in that, described gas compartment extraction valve, accumulating chamber extraction valve, venting measuring chamber extraction valve and reference thin film room extraction valve are high vacuum valve.
9. a measuring method for the device of the gas permeability of material measured by difference vacuum meter, it is characterized in that, comprises the following steps:
Step 1: by tested diaphragm seal to be measured in permeate chamber, will be sealed in reference thin film room with tested membraneous material and measure-alike reference thin film;
Step 2: open gas compartment extraction valve, accumulating chamber extraction valve, venting measuring chamber extraction valve and reference thin film room extraction valve, opens roughing pump and low vacuum valve takes out low vacuum to whole system;
Step 3: when pressure gauge reading is 0 atmospheric pressure, open vacuum meter, differential amplifier is set to single ended input pattern, vacuum meter independent measurement vacuum gauge A or vacuum gauge B;
Step 4: when gauge reading is less than 100Pa, opens high vacuum pump, to whole system pumping high vacuum;
Step 5: gauge reading is less than 10
-2during Pa magnitude, open permeate chamber well heater, reference thin film chamber heater, accumulating chamber well heater and venting measuring chamber well heater and carry out bakeout degassing;
Step 6: close accumulating chamber well heater and venting measuring chamber well heater; Regulate the heter temperature of permeate chamber well heater and reference thin film chamber heater to specific temperature;
Step 7: accumulating chamber and venting measuring chamber temperature drop to room temperature, and vacuum meter reading is reduced to 10
-4pa magnitude;
Step 8: differential amplifier switches to double-width grinding pattern, vacuum meter carries out difference measurement to the signal of vacuum gauge A and vacuum gauge B simultaneously, the reading P of record vacuum meter
0;
Step 9: close gas compartment extraction valve, accumulating chamber extraction valve, venting measuring chamber extraction valve and reference thin film room extraction valve; Then open reduction valve immediately, source of the gas is filled in gas compartment, make the pressure P in gas compartment
2reduction valve is closed, if be now t=0 when reaching 1 atmospheric pressure;
Step 10: the change of record vacuum meter reading P and the numerical value of time of penetration t;
Step 11: establish P-P
0=P
1, P
1the funtcional relationship of t change is in time:
In above formula: P
2gas pressure intensity in-gas compartment;
K-gas is to the infiltration coefficient of tested film
The infiltrating area of A-tested film
The thickness of d-tested film
The volume of V-accumulating chamber;
Step 12: obtain k value by the formula in step 11, then go out permeability Q according to following formulae discovery;
In above formula: the molal weight of μ-gas
R-gas universal constant
T-temperature.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106290117A (en) * | 2016-10-19 | 2017-01-04 | 中国科学院光电研究院 | A kind of apparatus and method causing gas infiltration for testing material radiation |
| CN106442214A (en) * | 2016-08-31 | 2017-02-22 | 兰州空间技术物理研究所 | Material outgassing rate measuring device and method based on hot cathode gauges through static pressure rise method |
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| CN111551476A (en) * | 2020-04-24 | 2020-08-18 | 广州西唐机电科技有限公司 | Gas permeability testing system and method based on differential pressure method |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4944180A (en) * | 1988-08-26 | 1990-07-31 | The Dow Chemical Company | Permeation measurement device |
| CN101246095A (en) * | 2008-01-07 | 2008-08-20 | 电子科技大学 | Device and method for measuring air permeability of isolation material |
| CN101275893A (en) * | 2008-05-09 | 2008-10-01 | 昆明理工大学 | Method and apparatus for measuring bamboo lignum permeability |
| CN101975719A (en) * | 2010-11-05 | 2011-02-16 | 济南兰光机电技术有限公司 | Differential-pressure method gas permeameter with energy utilization monitoring capability and environment detecting capability |
| CN202486012U (en) * | 2012-03-27 | 2012-10-10 | 济南兰光机电技术有限公司 | Gas permeability test device |
| CN103115858A (en) * | 2013-01-24 | 2013-05-22 | 电子科技大学 | Measuring device and measuring method for measuring gas permeability of material |
| CN103471961A (en) * | 2013-09-26 | 2013-12-25 | 湖南航天机电设备与特种材料研究所 | Gas barrier property detection apparatus for aerostat ballonet body material |
| CN104729973A (en) * | 2015-04-15 | 2015-06-24 | 合肥工业大学 | Thin-film permeameter and measuring method thereof |
-
2015
- 2015-12-10 CN CN201510908556.5A patent/CN105300869B/en not_active Expired - Fee Related
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4944180A (en) * | 1988-08-26 | 1990-07-31 | The Dow Chemical Company | Permeation measurement device |
| CN101246095A (en) * | 2008-01-07 | 2008-08-20 | 电子科技大学 | Device and method for measuring air permeability of isolation material |
| CN101275893A (en) * | 2008-05-09 | 2008-10-01 | 昆明理工大学 | Method and apparatus for measuring bamboo lignum permeability |
| CN101975719A (en) * | 2010-11-05 | 2011-02-16 | 济南兰光机电技术有限公司 | Differential-pressure method gas permeameter with energy utilization monitoring capability and environment detecting capability |
| CN202486012U (en) * | 2012-03-27 | 2012-10-10 | 济南兰光机电技术有限公司 | Gas permeability test device |
| CN103115858A (en) * | 2013-01-24 | 2013-05-22 | 电子科技大学 | Measuring device and measuring method for measuring gas permeability of material |
| CN103471961A (en) * | 2013-09-26 | 2013-12-25 | 湖南航天机电设备与特种材料研究所 | Gas barrier property detection apparatus for aerostat ballonet body material |
| CN104729973A (en) * | 2015-04-15 | 2015-06-24 | 合肥工业大学 | Thin-film permeameter and measuring method thereof |
Non-Patent Citations (2)
| Title |
|---|
| 杨威 等: "OLED封装材料气体渗透率测试的发展", 《功能材料》 * |
| 王静 等: "阻隔材料的气体渗透率", 《强激光与粒子束》 * |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106442214B (en) * | 2016-08-31 | 2019-06-18 | 兰州空间技术物理研究所 | Static pressurizing method material outgassing rate measuring device and method based on hot cathode rule |
| CN106442214A (en) * | 2016-08-31 | 2017-02-22 | 兰州空间技术物理研究所 | Material outgassing rate measuring device and method based on hot cathode gauges through static pressure rise method |
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