CN105223789A - Colored filter and display device method for making - Google Patents
Colored filter and display device method for making Download PDFInfo
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- CN105223789A CN105223789A CN201410286330.1A CN201410286330A CN105223789A CN 105223789 A CN105223789 A CN 105223789A CN 201410286330 A CN201410286330 A CN 201410286330A CN 105223789 A CN105223789 A CN 105223789A
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Abstract
The invention discloses a kind of colored filter method for making, it at least comprises the following steps: provide substrate and an image capture device that one has a first surface; Form black matrix" on the first surface, described black matrix" is by the multiple pixel region of described first surface gap-forming, and described pixel region at least comprises one first subpixel area, and described first subpixel area has the first figure; Form the first filter layer on the first surface, described first filter layer at least covers described first subpixel area; Described image capture device catches the first figure of described first subpixel area, carries out first time patterning processes, form the first filter layer pattern according to described first figure.
Description
Technical field
The present invention relates to technical field of flat panel display, particularly relate to a kind of colored filter method for making.
Background technology
The colorize of display panel is generally by white light conversion being become R-G-B (hereinafter referred to as R-G-B) three primary colors light beam, and coordinates other assemblies such as display dielectric layer and polaroid to reach the effect of different color image.Light conversion element in this process is referred to as colored filter, and its structure comprises transparent substrate, black matrix" (hereinafter referred to as BM) and RGB dyed layer.
In the manufacturing process of current colored filter, first on transparent substrate, make black-matrix layer and alignment mark, then RGB dyed layer is formed according to alignment mark, but the making of alignment mark needs first reserved location on transparent substrate, and the existence of reserved location needs special space, special space may affect the arrangement of active graphical, thus causing the utilization factor of substrate to reduce, the rising of cost of manufacture, is therefore unfavorable for the lifting of efficiency and the decline of cost.
Summary of the invention
In view of this, the invention provides a kind of alignment mark without the need to extra reserved location, raise the efficiency, cost-effective colored filter and display panel method for making.
Described colored filter method for making provided by the invention, it at least comprises the following steps:
Substrate and an image capture device that one has a first surface are provided; Form black matrix" on the first surface, described black matrix" is by the multiple pixel region of described first surface gap-forming, and described pixel region at least comprises one first subpixel area, and described first subpixel area has the first figure; Form the first filter layer on the first surface, described first filter layer at least covers described first subpixel area; Described image capture device catches the first figure of described first subpixel area, carries out first time patterning processes according to described first figure, the first exposure figure to described first filter layer.
In described colored filter provided by the invention, described pixel region also comprises arranged adjacent and by isolated second subpixel area of described black matrix" and the 3rd subpixel area, described second subpixel area is between described first subpixel area and the 3rd subpixel area, described second subpixel area has second graph, and described 3rd subpixel area has the 3rd figure.
In described colored filter provided by the invention, described method for making also comprises: form the second filter layer on the first surface, described second filter layer at least covers described second subpixel area, described image capture device catches the second graph of described second subpixel area, carry out second time patterning processes according to described second graph, form the second filter layer pattern; Form the 3rd filter layer on the first surface, described 3rd filter layer at least covers described 3rd subpixel area, described image capture device catches the 3rd figure of described 3rd subpixel area, carries out third time patterning processes according to described 3rd figure, forms the 3rd filter layer pattern.
In described colored filter method for making provided by the invention, described first time patterning processes comprise, described first filter layer forms the first photoresist; There is provided one first mask plate, be positioned over by described first mask plate on the substrate being formed with the first photoresist, described first mask plate has first exposure figure corresponding with described first figure; According to described first figure, the first exposure figure, first time patterning processes is carried out to described first filter layer.
In described colored filter method for making provided by the invention, described second time patterning processes comprises, and described second filter layer forms the second photoresist; There is provided one second mask plate, be positioned over by described second mask plate on the substrate being formed with the second photoresist, described second mask plate has second exposure figure corresponding with described second graph; According to described second graph, second time patterning processes is carried out to described second exposure figure, form the second filter layer pattern; Described third time, patterning processes comprised, and described 3rd filter layer forms the 3rd photoresist; There is provided one the 3rd mask plate, be positioned over by described 3rd mask plate on the substrate being formed with the 3rd photoresist, described 3rd mask plate has three exposure figure corresponding with described 3rd figure; According to described 3rd figure, third time patterning processes is carried out to described 3rd exposure figure, form the 3rd filter layer pattern.
In described colored filter method for making provided by the invention, described first filter layer, the second filter layer and the 3rd filter layer have identical thickness and span, and described first filter layer pattern, the second filter layer pattern and the 3rd filter layer pattern projection are on the first surface without overlapping region.
In described colored filter method for making provided by the invention, described first figure, second graph and the 3rd figure are to be closed and the figure of rule.Described image capture device at least comprises two optical reading camera lenses.
A kind of display device method for making, it at least comprises the step of above-mentioned colored filter method for making, and described display device method for making is also included in described colored filter forms chock insulator matter pattern step away from described substrate side.
In display device method for making provided by the invention, described display device method for making also comprises, and described image capture device catches the first figure of described first subpixel area, carries out the 4th patterning processes according to described first figure, forms chock insulator matter pattern.
In above-mentioned colored filter method for making provided by the invention, due to black matrix" formed after on the first surface gap-forming have multiple pixel region, described pixel region at least comprises the first subpixel area, described first subpixel area has the first figure, image capture device is utilized to remove the first figure of seizure first subpixel area, and form the first sub-pixel, therefore the position need presetting alignment mark at described first surface is eliminated, and the step of alignment mark also need be set at first surface, thus, colored filter method for making provided by the invention is conducive to improving manufacture craft efficiency and cost-saving.
Accompanying drawing explanation
Below in conjunction with drawings and Examples, the invention will be further described, in accompanying drawing:
Fig. 1 is the structural representation of the colored filter of a preferred embodiment provided by the invention;
Fig. 2 is the structural representation form black matrix" 102 on the first surface 101a of substrate after;
Fig. 3 is the schematic flow sheet of the method for making of colored filter described in Fig. 1.
Embodiment
For colored filter method for making provided by the invention is described, be described in detail below in conjunction with Figure of description and explanatory note.
Please refer to Fig. 1, it is the structural representation of the colored filter 100 of a better embodiment provided by the invention, and described colored filter 100 at least comprises a substrate 101, black matrix" 102, first filter layer pattern 111, second filter layer pattern 112 and the 3rd filter layer pattern 113.In the process making described colored filter 100, image capture device 130 (not shown) need be provided.
Described substrate 101 at least has a first surface 101a, and described first surface 101a is a smooth plane, and in other embodiments, first surface also can be smooth or rough curved surface or irregular surface.Described substrate 101 is made up of transparent material.
As shown in Figure 2, it is the structural representation after forming black matrix" 102 on described first surface 101a, described black matrix" 102 is by multiple for described first surface 101a gap-forming pixel region 120, described pixel region 120 at least comprises arranged adjacent and by isolated first subpixel area 121, second subpixel area 122 of described black matrix" 102 and the 3rd subpixel area 123, described second subpixel area 122 is between described first subpixel area 121 and described 3rd subpixel area 123.In present embodiment, described first subpixel area 121, second subpixel area 122 and the 3rd subpixel area 123 all rectangular.
Described first surface 101a forms the first filter layer, and described first filter layer at least covers described first subpixel area 121, and described first subpixel area 121 has the first figure 121a; Described image capture device 130 catches the first figure 121a of described first subpixel area 121, carries out first time patterning processes, form the first filter layer pattern 111 according to described first figure 121a.In present embodiment, described first time patterning processes comprise: on described first filter layer, form the first photoresist; There is provided one first mask plate, be positioned over by described first mask plate and be formed on the substrate 101 of the first photoresist, described first mask plate has first exposure figure corresponding with described first figure 121a; According to described first figure 121a, the first exposure figure, first time patterning processes is carried out to described first filter layer 111, form the first filter layer pattern 111.
Described first surface 101a forms the second filter layer, and described second filter layer at least covers described second subpixel area 122, and described second subpixel area 122 has second graph 122a; Described image capture device 130 catches the second graph 122a of described second subpixel area 122, and carries out second time patterning processes according to described second graph 122a, forms the second filter layer pattern 112.In present embodiment, described second time patterning processes comprises, and described second filter layer forms the second photoresist; There is provided one second mask plate, be positioned over by described second mask plate and be formed on the substrate 101 of the second photoresist, described second mask plate has second exposure figure corresponding with described second graph 122a; According to described second graph 122a, the second exposure figure, second time patterning processes is carried out to described second filter layer, form the second filter layer pattern 112.
Described first surface 101a forms the 3rd filter layer, and described 3rd filter layer at least covers described 3rd subpixel area 123, and described 3rd subpixel area 123 has the 3rd figure 123a; Described image capture device 130 catches the 3rd figure 123a of described 3rd subpixel area 123, carries out third time patterning processes according to described 3rd figure 123a, forms the 3rd filter layer pattern 113.In present embodiment, described third time patterning processes comprise, described 3rd filter layer forms the 3rd photoresist; There is provided one the 3rd mask plate, be positioned over by described 3rd mask plate on the substrate 101 being formed with the 3rd photoresist, described 3rd mask plate has three exposure figure corresponding with described 3rd figure 123a; According to described 3rd figure 123a, the 3rd exposure figure, third time patterning processes is carried out to described 3rd filter layer, form the 3rd filter layer pattern 113.
In present embodiment, described first filter layer pattern 111, second filter layer pattern 112 and the 3rd filter layer pattern 113 have identical thickness and span, described thickness is described first filter layer pattern 111, second filter layer pattern 112 and the 3rd filter layer pattern 113 are at the height perpendicular to described first surface 101a, described span is described first filter layer pattern 111, second filter layer pattern 112 and the width of the 3rd filter layer pattern 113 on the direction being parallel to described first surface 101a, described first filter layer pattern 111, second filter layer pattern 112 and the projection of the 3rd filter layer pattern 113 on described first surface 101a are without overlapping region.Described first filter layer pattern 111 can be red filter layer pattern, green filter layer pattern or blue filter layer pattern, the second corresponding filter layer pattern 112 can be respectively green filter layer pattern and blue filter layer pattern or red filter layer pattern, and corresponding described 3rd filter layer pattern 113 can be respectively blue filter layer pattern, red filter layer pattern or green filter layer pattern.
In present embodiment, as shown in Figure 2, described first figure 121a, second graph 122a and the 3rd figure 123a are and close and with the figure of a breach, described breach is rectangular, it lays respectively on an angle of described first figure 121a, second graph 122a and the 3rd figure 123a, states the figure that the first figure 121a, second graph 122a and the 3rd figure 123a are described black matrix" 102 intervals.Described image capture device 130 at least comprises two optical reading camera lenses, such as CCD (Charge-coupledDevice, charge coupled cell).
Present invention also offers a display device method for making, described display device method for making at least comprises the step of the method for making of above-mentioned colored filter 100, in addition, described display device method for making is also included in described colored filter 100 forms chock insulator matter pattern (not shown) step away from described substrate 101 side.The step that described chock insulator matter pattern is formed comprises, dottle pin layer is formed away from described substrate 101 side at described colored filter 100, described image capture device 130 catches the first figure 121a of described first subpixel area 121, according to described first figure 121a, the 4th patterning processes is carried out to described dottle pin layer, form chock insulator matter pattern.In other embodiments, described image capture device 130 also can be utilized to catch the second graph 122a of described second subpixel area 122, the 4th patterning processes is carried out according to described second graph, form chock insulator matter pattern, or catch the 3rd figure 123a of the 3rd subpixel area 123, carry out the 4th patterning processes according to described 3rd figure 123a, form chock insulator matter pattern.In present embodiment the formation of chock insulator matter pattern also without the need to by prior art at the alignment mark that second surface is arranged, but can to complete by image capture device and the first figure.
In the above-mentioned colored filter method for making that present embodiment provides, due to black matrix" formed after on the first surface gap-forming have multiple pixel region, described pixel region at least comprises the first subpixel area, described first subpixel area has the first figure, image capture device is utilized to remove the first figure of seizure first subpixel area, therefore the position need presetting alignment mark at described first surface is eliminated, and the step of alignment mark also need be set at first surface, thus, the colored filter method for making that present embodiment provides is conducive to improving manufacture craft efficiency and cost-saving.
As shown in Figure 3, it at least comprises the steps: for the schematic flow sheet of the method for making of colored filter shown in Fig. 1, described method for making
Step S01: substrate and an image capture device that one has a first surface are provided.
Described substrate is made up of transparent material, and described first surface is a smooth plane, and in other embodiments, first surface also can be smooth or rough curved surface or irregular surface.
Step S02: form black matrix" on the first surface, described black matrix" is by the described first surface at least multiple pixel region of gap-forming, described pixel region comprises arranged adjacent and by isolated first subpixel area of described black matrix", the second subpixel area and the 3rd subpixel area, described first subpixel area has the first figure, described second subpixel area has second graph, and described 3rd subpixel area has the 3rd figure.
Step S03: form the first filter layer on the first surface, described first filter layer at least covers described first subpixel area.Described image capture device catches the first figure of described first subpixel area, carries out first time patterning processes, form the first filter layer pattern according to described first figure.
In present embodiment, described first time patterning processes comprise: on described first filter layer, form the first photoresist; There is provided one first mask plate, be positioned over by described first mask plate on the substrate being formed with the first photoresist, described first mask plate has first exposure figure corresponding with described first figure; According to described first figure, the first exposure figure, first time patterning processes is carried out to described first filter layer, form the first filter layer pattern.
Step S04: form the second filter layer on the first surface, described second filter layer at least covers described second subpixel area, described second subpixel area has second graph, described image capture device catches the second graph of described second subpixel area, carry out second time patterning processes according to described second graph, form the second filter layer pattern.
Described second time patterning processes comprises, and described second filter layer forms the second photoresist; There is provided one second mask plate, be positioned over by described second mask plate on the substrate being formed with the second photoresist, described second mask plate has second exposure figure corresponding with described second graph; According to described second graph, the second exposure figure, second time patterning processes is carried out to described second filter layer, form the second filter layer pattern.
Step S05: form the 3rd filter layer on the first surface, described 3rd filter layer at least covers described 3rd subpixel area, described 3rd subpixel area has the 3rd figure, described image capture device catches the 3rd figure of described 3rd subpixel area, carry out third time patterning processes according to described 3rd figure, form the 3rd filter layer pattern.
Described third time, patterning processes comprised, and described 3rd filter layer forms the 3rd photoresist; There is provided one the 3rd mask plate, be positioned over by described 3rd mask plate on the substrate being formed with the 3rd photoresist, described 3rd mask plate has three exposure figure corresponding with described 3rd figure; According to described 3rd figure, the 3rd exposure figure, third time patterning processes is carried out to described 3rd filter layer, form the 3rd filter layer pattern.
It is more than the better embodiment of colored filter method for making provided by the invention; the restriction to rights protection scope of the present invention can not be interpreted as; those skilled in the art should know; without departing from the inventive concept of the premise; also can do multiple improvement or replacement; these all improvement or replacement all should in the scope of the present invention, and namely the scope of the present invention should be as the criterion with claim.
Claims (10)
1. a colored filter method for making, it at least comprises the following steps:
Substrate and an image capture device that one has a first surface are provided;
Form black matrix" on the first surface, described black matrix" is by the multiple pixel region of described first surface gap-forming, and described pixel region at least comprises one first subpixel area, and described first subpixel area has the first figure;
Form the first filter layer on the first surface, described first filter layer at least covers described first subpixel area;
Described image capture device catches the first figure of described first subpixel area, carries out first time patterning processes, form the first filter layer pattern according to described first figure.
2. colored filter method for making as claimed in claim 1, it is characterized in that: described pixel region also comprises arranged adjacent and by isolated second subpixel area of described black matrix" and the 3rd subpixel area, described second subpixel area is between described first subpixel area and the 3rd subpixel area, described second subpixel area has second graph, and described 3rd subpixel area has the 3rd figure.
3. colored filter method for making as claimed in claim 2, it is characterized in that: described method for making also comprises: form the second filter layer on the first surface, described second filter layer at least covers described second subpixel area, described image capture device catches the second graph of described second subpixel area, carry out second time patterning processes according to described second graph, form the second filter layer pattern; Form the 3rd filter layer on the first surface, described 3rd filter layer at least covers described 3rd subpixel area, described image capture device catches the 3rd figure of described 3rd subpixel area, carries out third time patterning processes according to described 3rd figure, forms the 3rd filter layer pattern.
4. colored filter method for making as claimed in claim 1, is characterized in that: described first time patterning processes comprise, described first filter layer forms the first photoresist; There is provided one first mask plate, be positioned over by described first mask plate on the substrate being formed with the first photoresist, described first mask plate has first exposure figure corresponding with described first figure; According to described first figure, the first exposure figure, first time patterning processes is carried out to described first filter layer, form the first filter layer pattern.
5. colored filter as claimed in claim 3, it is characterized in that: described second time patterning processes comprises, described second filter layer forms the second photoresist, one second mask plate is provided, being positioned over by described second mask plate is formed on the described substrate of the second photoresist, described second mask plate has second exposure figure corresponding with described second graph, according to described second graph, the second exposure figure, second time patterning processes is carried out to described second filter layer, form the second filter layer pattern; Described third time, patterning processes comprised, described 3rd filter layer forms the 3rd photoresist, there is provided use 1 the 3rd mask plate, be positioned over by described 3rd mask plate on the substrate being formed with the 3rd photoresist, described 3rd mask plate has three exposure figure corresponding with described 3rd figure; According to described 3rd figure, the 3rd exposure figure, third time patterning processes is carried out to described 3rd filter layer, form the 3rd filter layer pattern.
6. colored filter method for making as claimed in claim 5, it is characterized in that: described first filter layer, the second filter layer and the 3rd filter layer have identical thickness, described first filter layer pattern, the second filter layer pattern and the 3rd filter layer pattern projection are on the first surface without overlapping region.
7. colored filter method for making as claimed in claim 2, is characterized in that: described first figure, second graph and the 3rd figure are closed figure.
8. colored filter method for making as claimed in claim 7, is characterized in that: described image capture device at least comprises two optical reading camera lenses.
9. a display device method for making, it is characterized in that, at least comprise the step of the colored filter method for making as described in any one of claim 1-8, described display device method for making is also included in described colored filter forms chock insulator matter pattern step away from described substrate side.
10. display device method for making as claimed in claim 9, it is characterized in that: described display device method for making also comprises, described image capture device catches the first figure of described first subpixel area, carries out the 4th patterning processes according to described first figure, forms chock insulator matter pattern.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410286330.1A CN105223789A (en) | 2014-06-24 | 2014-06-24 | Colored filter and display device method for making |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410286330.1A CN105223789A (en) | 2014-06-24 | 2014-06-24 | Colored filter and display device method for making |
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| CN201410286330.1A Pending CN105223789A (en) | 2014-06-24 | 2014-06-24 | Colored filter and display device method for making |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101099106A (en) * | 2004-11-12 | 2008-01-02 | 集成方案株式会社 | Production method of substrate for liquid crystal display |
| CN102213857A (en) * | 2010-04-07 | 2011-10-12 | 上海广电富士光电材料有限公司 | Color filtering base plate and manufacturing method thereof |
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- 2014-06-24 CN CN201410286330.1A patent/CN105223789A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101099106A (en) * | 2004-11-12 | 2008-01-02 | 集成方案株式会社 | Production method of substrate for liquid crystal display |
| CN102213857A (en) * | 2010-04-07 | 2011-10-12 | 上海广电富士光电材料有限公司 | Color filtering base plate and manufacturing method thereof |
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