CN105223780A - Projection slit and focusing and leveling sensor - Google Patents
Projection slit and focusing and leveling sensor Download PDFInfo
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- CN105223780A CN105223780A CN201410243346.4A CN201410243346A CN105223780A CN 105223780 A CN105223780 A CN 105223780A CN 201410243346 A CN201410243346 A CN 201410243346A CN 105223780 A CN105223780 A CN 105223780A
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Abstract
Present invention is disclosed a kind of projection slit and focusing and leveling sensor, described projection slit be used for be measured surface formed along direction of measurement arrangement M arrange hot spot, described hot spot have various shape or towards, to realize gradual many precision, multiple range measurement.Described focusing and leveling sensor comprises described projection slit and photodetector array, and described photodetector array is equipped with the signal processing channel corresponding to each hot spot.Hot spot distribution in the present invention has progressive measuring accuracy and progressive range, can adapt to different measuring accuracy demands.To same measurand, measuring accuracy can be realized from low to high, measure the transition that range is descending, reduce in the difficulty measuring center searching hot spot, make measuring process be easier to control.
Description
Technical field
The present invention relates to semi-conductor device technology field, particularly relate to a kind of projection slit for projection aligner and focusing and leveling sensor.
Background technology
Along with projection aligner's operation wavelength constantly reduce, numerical aperture constantly increases, its measuring accuracy to focusing and leveling sensor requires also day by day harsh.The measurement optical system of current high-end photo-etching machine focusing leveling sensor generally adopts two telecentric beam paths of SC structure, and its measurement range is:
Wherein d is the width of accurate measurement hot spot on direction of measurement, and θ is optical axis and projection hot spot place plane, silicon chip face or the angle detecting hot spot place plane normal.
Shown in Fig. 1 is the measuring principle figure of the focusing and leveling sensor adopted in patent CN103365103A, the all parts of this figure describes in detail and please refer to this patent, wherein, lamp optical system 1 will measure spot projection on silicon chip face 12 through projection optical system after being illuminated by the measurement hot spot in projection slit 3, be irradiated on photodetector array 11 through detection optical system after silicon chip face 12 is reflected, for improving measuring accuracy, modulated by control system gated sweep catoptron 6 pairs of signals.
But in the prior art focusing and leveling sensor only with a kind of size, a kind of shape, a kind of towards accurate measurement hot spot, this make the measurement range of its accurate measurement hot spot and measuring accuracy very single.For making up this shortcoming, the thick side spots that general employing is lower in the peripheral disposition measuring accuracy of accurate measurement hot spot, measurement range is larger, to reach the object taking into account range and measuring accuracy.But the range gap of thick side spots and accurate measurement hot spot is still very large, even if even sometimes detected thick side spots still can not detect accurate measurement hot spot.Therefore, how to improve this problem, just seem particularly important.
Summary of the invention
The object of the invention is to, provide a kind of projection slit and focusing and leveling sensor, large to solve the difficulty measuring center searching hot spot at present, measuring process does not allow manageable problem.
For solving the problems of the technologies described above, the invention provides a kind of projection slit, for be measured surface formed along direction of measurement arrangement M arrange hot spot, it is characterized in that, described hot spot have various shape or towards.
Optionally, for described projection slit, described M arranges hot spot along direction of measurement being arrange distribution more, often comprises multiple size, the consistent hot spot of shape in row.
Optionally, for described projection slit, to be positioned at middle row's hot spot for benchmark, all the other row's hot spots are arranged in described benchmark both sides.
Optionally, for described projection slit, to be positioned at middle row's hot spot for benchmark, the shape of two row's hot spots of benchmark equidistant described in described benchmark two lateral extent and towards identical.
Optionally, for described projection slit, the hot spot of adjacent row on direction of measurement width according to setting specifications vary.
Optionally, for described projection slit, the row's hot spot being positioned at centre and the width of many rows hot spot on direction of measurement being positioned at its side are equal difference distribution, and the width of the hot spot of middle row is minimum.
Optionally, for described projection slit, the width of described hot spot is 0.2mm ~ 1mm.
Optionally, for described projection slit, the size shape of each row's hot spot is consistent, often in row hot spot towards consistent and differ from the hot spot of adjacent row towards.
Optionally, for described projection slit, a middle row is oriented vertical survey direction, and all the other rows are tilted by vertical survey direction from closely and far along clockwise direction gradually by the row that distance is middle.
Optionally, for described projection slit, described slant range is 0 ~ 90 °.
Optionally, for described projection slit, the hot spot of adjacent row on direction of measurement width according to setting specifications vary, often in row hot spot towards consistent and differ from the hot spot of adjacent row towards.
Optionally, for described projection slit, the row's hot spot being positioned at centre and the width of many rows hot spot on direction of measurement being positioned at its side are equal difference distribution, and the width of the hot spot of middle row is minimum.
Optionally, for described projection slit, the width of described hot spot is 0.2mm ~ 1mm.
Optionally, for described projection slit, a middle row is oriented vertical survey direction, and all the other rows approach from a distance rise to be tilted gradually along clockwise direction by vertical survey direction by the row that distance is middle.
Optionally, for described projection slit, described slant range is 0 ~ 90 °.
The present invention also provides a kind of focusing and leveling sensor, comprises projection slit and photodetector array, and described projection slit is projection slit as above; Described photodetector array is equipped with the signal processing channel corresponding to each hot spot.
Compared with prior art, in projection slit provided by the invention and focusing and leveling sensor, described projection slit can be measured surface formed along direction of measurement arrangement M arrange hot spot, described hot spot have various shape or towards, to realize gradual many precision, multiple range measurement.Compared to existing technology, the hot spot distribution in the present invention has progressive measuring accuracy and progressive range, can adapt to different measuring accuracy demands.To same measurand, measuring accuracy can be realized from low to high, measure the transition that range is descending, reduce in the difficulty measuring center searching hot spot, make measuring process be easier to control.
Accompanying drawing explanation
Fig. 1 is the measuring principle figure of the focusing and leveling sensor in prior art and the present invention;
Fig. 2 is the schematic diagram of the hot spot that in first embodiment of the invention, projection slit is formed;
Fig. 3 is the schematic diagram of the hot spot that in second embodiment of the invention, projection slit is formed;
Fig. 4 is the schematic diagram of the hot spot that in third embodiment of the invention, projection slit is formed.
Embodiment
Below in conjunction with schematic diagram, projection slit of the present invention and focusing and leveling sensor are described in more detail, which show the preferred embodiments of the present invention, should be appreciated that those skilled in the art can revise the present invention described here, and still realize advantageous effects of the present invention.Therefore, following description is appreciated that extensively knowing for those skilled in the art, and not as limitation of the present invention.
In order to clear, whole features of practical embodiments are not described.They in the following description, are not described in detail known function and structure, because can make the present invention chaotic due to unnecessary details.Will be understood that in the exploitation of any practical embodiments, a large amount of implementation detail must be made to realize the specific objective of developer, such as, according to regarding system or the restriction about business, change into another embodiment by an embodiment.In addition, will be understood that this development may be complicated and time-consuming, but be only routine work to those skilled in the art.
In the following passage, more specifically the present invention is described by way of example with reference to accompanying drawing.According to the following describes and claims, advantages and features of the invention will be clearer.It should be noted that, accompanying drawing all adopts the form that simplifies very much and all uses non-ratio accurately, only in order to object that is convenient, the aid illustration embodiment of the present invention lucidly.
Inventor, through to study for a long period of time discoverys, projection slit is measured the measurement range that the width of hot spot on direction of measurement determines focusing and leveling sensor, and its width on direction of measurement is larger, and measuring accuracy is lower, but measurement range is larger, and vice versa.Therefore by being arranged on the measurement hot spot group of the width gradual change on direction of measurement in projection slit, the measuring accuracy of gradual change can be obtained and measure range.Thus, the invention provides a kind of projection slit and focusing and leveling sensor, the M that described projection slit is used for being formed along direction of measurement arrangement on surface to be measured arranges hot spot, and M is positive integer, described hot spot have various shape or towards, to realize gradual many precision, multiple range measurement.Described focusing and leveling sensor comprises described projection slit and photodetector array, and described photodetector array is equipped with the signal processing channel corresponding to each hot spot.
Below enumerate the preferred embodiment of described projection slit and focusing and leveling sensor, to clearly demonstrate content of the present invention, will be clear that, content of the present invention is not restricted to following examples, and other improvement by the routine techniques means of those of ordinary skill in the art are also within thought range of the present invention.
Please refer to Fig. 1-Fig. 4, Fig. 1 is the measuring principle figure of the focusing and leveling sensor in the present invention; Fig. 2 ~ Fig. 4 is the schematic diagram of the hot spot that in the present invention's 3 preferred embodiments, projection slit is formed.As shown in Figure 2, in the first embodiment of the present invention, the M that described projection slit is formed along direction of measurement SC on surface to be measured arranges hot spot 31, described hot spot 31 is arranged in a border circular areas, described hot spot 31 along on direction of measurement in arranging distribution more, often comprise multiple size, hot spot 31 that shape is consistent in row.To be positioned at middle row's hot spot 31 for benchmark, all the other row's hot spots 31 are arranged in described benchmark both sides.Concrete, be preferably to be positioned at middle row's hot spot 31 for benchmark, the shape of two row's hot spots 31 of benchmark equidistant described in described benchmark two lateral extent and towards identical.In the present embodiment, for convenience of description, as being designated as the 3rd row, the 2nd row, the 1st row, the 0th row, the-1 row, the-2 row and the-3 row in Fig. 2 from top to bottom successively, with the 0th row for benchmark, the 1st row and the-1 arrange symmetrical, the 2nd arrange and to arrange symmetry, the 3rd with the-2 and arrange and the-3 arrange symmetry.Have employed 7 row's hot spots 31 in the present embodiment, but, in other embodiments, also can be that there is more row, or be less than the quantity of 7 rows.Preferably, reduce successively from the quantity of often arranging hot spot 31 away from the 0th row's hot spot, to adapt to the shape of measurement field.
In the present embodiment, the hot spot 31 of adjacent row on direction of measurement width according to setting specifications vary, such as, 0th to drain into the 3rd row's width of hot spot 31 on direction of measurement be that equal difference distributes, the width of the hot spot 31 of middle row is minimum, tolerance elects positive number as, make hot spot 31 drain into the 3rd row from the 0th and become large successively, the width of described hot spot 31 on direction of measurement can be 0.2mm ~ 1mm, preferably, the width of 0th row's hot spot 31 on direction of measurement is 0.45mm, the width of 1st row's hot spot 31 on direction of measurement is 0.6mm, the width of 2nd row's hot spot 31 on direction of measurement is 0.75mm, the width of 3rd row's hot spot 31 on direction of measurement is 0.9mm.-1 width of hot spot 31 on direction of measurement draining into the-3 row drains into the 3rd with the 1st respectively and arranges correspondent equal.In addition, described multiple hot spot 31 towards unanimously, be namely all the X-direction of vertically direction of measurement SC.
Below in conjunction with Fig. 1, the working condition that the projection slit 3 in the present embodiment is applied to when focusing and leveling sensor is measured is set forth.In FIG, if not there is special instruction, the concrete structure of its each parts please refer to the citing document of background technology, is not described in detail at this.
The photodetector array 11 of described focusing and leveling sensor is equipped with the signal processing channel corresponding to each hot spot 31, by partly enabling the Measurement channel of hot spot to reach required measuring accuracy and range, and the interchannel signal disturbing of unlike signal can be avoided in actual measurement.
Alternatively, when focusing and leveling system works, silicon chip face 12 topographical information recorded in real time can also be fed back to control system, control system makes its scan amplitude real-time change to adapt to different measurement hot spots by the amplitude of gated sweep catoptron 6.
Specific implementation process prescription is as follows: during focusing and leveling system works, first the scan amplitude of scanning reflection mirror 6 is set to low precision measure spot width, as the 3rd row and the-3 spot width of arranging, carry out low precision measure, now only open the passage of the photodetector array 11 of the 3rd row and the-3 row's correspondence, other pathway closure, avoids the interchannel signal disturbing of unlike signal.Then, the scan amplitude of scanning reflection mirror 6 is set to relative good accuracy and measures spot width, as the spot width of the 1st and the-1 row, carry out high-acruracy survey, now only open the passage of the photodetector array 11 of the 1st row and the-1 row's correspondence, other pathway closure, avoids the interchannel signal disturbing of unlike signal.Certainly, arranging the scan amplitude of scanning reflection mirror 6 is not limited to described in the present embodiment, insider is when facing different needs, can on the basis of the present embodiment, adopt suitable scan amplitude that sequence is set, thus realize measuring accuracy from low to high, measure the transition that range is descending, reduce in the difficulty measuring center searching hot spot, make measuring process be easier to control.
Please refer to Fig. 3, it is the schematic diagram of the hot spot of the projection slit formation of second embodiment of the invention.In order to make to describe succinctly, the present embodiment only describes the difference part with the first embodiment.The present embodiment comprises 7 row's hot spots 31, and the size shape of each row's hot spot 31 is consistent, often in row hot spot 31 towards consistent and differ from the hot spot 31 of adjacent row towards.Be in particular in, the 0th middle row is oriented vertical survey direction SC, and namely in X direction, all the other rows are tilted by X-direction from closely and far along clockwise direction gradually by the 0th row that distance is middle, and described slant range is 0 ~ 90 °.Preferably, in the 1st row and the-1 row, tilt angle alpha is 15 °, and in the 2nd row and the-2 row, inclination angle beta is 30 °, and in the 3rd row and the-3 row, angle of inclination γ is 45 °.For when having other rows, gradual variation can be taked in the angle of inclination of often arranging between 0 ~ 90 °.The present embodiment have employed often arranges the identical design of the size shape of hot spot 31, has specific angle by making often to arrange hot spot 31, achieves the measuring accuracy that can obtain gradual change equally and measures range.
Utilize the projection slit 3 of the present embodiment to be applied to working condition when focusing and leveling sensor is measured and the first embodiment roughly the same, do not repeat at this.
Please refer to Fig. 4, it is the schematic diagram of the hot spot of the projection slit formation of third embodiment of the invention.In order to make to describe succinctly, the present embodiment only describes the difference part with the first embodiment.The present embodiment comprises 7 row's hot spots 31, the hot spot 31 of adjacent row on direction of measurement SC width according to setting specifications vary, often in row hot spot 31 towards consistent and differ from the hot spot 31 of adjacent row towards.This shows, the 0th row's hot spot 31 being positioned at centre and the width of many rows hot spot 31 on direction of measurement SC being positioned at its side are equal difference distribution, namely there is the architectural feature of the first embodiment, in addition, also have the architectural feature of the second embodiment, the 0th middle row is oriented vertical survey direction SC, namely in X direction, but with the second embodiment unlike, all the other rows approach from a distance rise to be tilted gradually along clockwise direction by X-direction by the 0th row that distance is middle, and described slant range is 0 ~ 90 °.Concrete, in the 1st row and the-1 row, tilt angle alpha is 45 °, and in the 2nd row and the-2 row, inclination angle beta is 30 °, and in the 3rd row and the-3 row, angle of inclination γ is 15 °.For when having other rows, gradual variation can be taked in the angle of inclination of often arranging between 0 ~ 90 °.It is different that the present embodiment have employed the size shape of often arranging hot spot 31, and make often to arrange hot spot 31 and have specific angle, achieves the measuring accuracy that can obtain gradual change equally and measure range.
Utilize the projection slit 3 of the present embodiment to be applied to working condition when focusing and leveling sensor is measured and the first embodiment roughly the same, do not repeat at this.
By above-described embodiment, the feature of projection slit of the present invention and focusing and leveling sensor is shown.In the present invention, described projection slit can be measured surface formed along direction of measurement arrangement M arrange hot spot, described hot spot have various shape or towards, to realize gradual many precision, multiple range measurement.Compared to existing technology, the hot spot distribution in the present invention has progressive measuring accuracy and progressive range, can adapt to different measuring accuracy demands.To same measurand, measuring accuracy can be realized from low to high, measure the transition that range is descending, reduce in the difficulty measuring center searching hot spot, make measuring process be easier to control.
Obviously, those skilled in the art can carry out various change and modification to the present invention and not depart from the spirit and scope of the present invention.Like this, if these amendments of the present invention and modification belong within the scope of the claims in the present invention and equivalent technologies thereof, then the present invention is also intended to comprise these change and modification.
Claims (16)
1. a projection slit, for be measured surface formed along direction of measurement arrangement M arrange hot spot, it is characterized in that, described hot spot have various shape or towards.
2. projection slit as claimed in claim 1, is characterized in that, described M arrange hot spot along on direction of measurement in arranging distribution more, often comprise multiple size, hot spot that shape is consistent in row.
3. projection slit as claimed in claim 1, is characterized in that, to be positioned at middle row's hot spot for benchmark, all the other row's hot spots are arranged in described benchmark both sides.
4. projection slit as claimed in claim 1, its spy is, to be positioned at middle row's hot spot for benchmark, the shape of two row's hot spots of benchmark equidistant described in described benchmark two lateral extent and towards identical.
5. projection slit as claimed in claim 1, is characterized in that, the hot spot of adjacent row on direction of measurement width according to setting specifications vary.
6. projection slit as claimed in claim 5, is characterized in that, the row's hot spot being positioned at centre and the width of many rows hot spot on direction of measurement being positioned at its side are equal difference distribution, and the width of the hot spot of middle row is minimum.
7. projection slit as claimed in claim 6, it is characterized in that, the width of described hot spot is 0.2mm ~ 1mm.
8. projection slit as claimed in claim 1, is characterized in that, the size shape of each row's hot spot is consistent, often in row hot spot towards consistent and differ from the hot spot of adjacent row towards.
9. projection slit as claimed in claim 1, is characterized in that, a middle row is oriented vertical survey direction, and all the other rows are tilted by vertical survey direction from closely and far along clockwise direction gradually by the row that distance is middle.
10. projection slit as claimed in claim 9, it is characterized in that, described slant range is 0 ~ 90 °.
11. projection slit as claimed in claim 1, is characterized in that, the hot spot of adjacent row on direction of measurement width according to setting specifications vary, often in row hot spot towards consistent and differ from the hot spot of adjacent row towards.
12. projection slit as claimed in claim 11, is characterized in that, the row's hot spot being positioned at centre and the width of many rows hot spot on direction of measurement being positioned at its side are equal difference distribution, and the width of the hot spot of middle row is minimum.
13. projection slit as claimed in claim 12, is characterized in that, the width of described hot spot is 0.2mm ~ 1mm.
14. projection slit as claimed in claim 11, is characterized in that, a middle row is oriented vertical survey direction, and all the other rows approach from a distance rise to be tilted gradually along clockwise direction by vertical survey direction by the row that distance is middle.
15. projection slit as claimed in claim 14, it is characterized in that, described slant range is 0 ~ 90 °.
16. 1 kinds of focusing and leveling sensors, comprise projection slit and photodetector array, it is characterized in that, described projection slit is for as the projection slit in claim 1 ~ 15 as described in any one; Described photodetector array is equipped with the signal processing channel corresponding to each hot spot.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410243346.4A CN105223780B (en) | 2014-06-03 | 2014-06-03 | Projection slit and focusing and leveling sensor |
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| CN201410243346.4A CN105223780B (en) | 2014-06-03 | 2014-06-03 | Projection slit and focusing and leveling sensor |
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| CN105223780B CN105223780B (en) | 2017-12-29 |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4711567A (en) * | 1982-10-22 | 1987-12-08 | Nippon Kogaku K.K. | Exposure apparatus |
| JPH09304015A (en) * | 1996-05-09 | 1997-11-28 | Nikon Corp | Plane position detecting method, plane position adjusting device and projection exposure system |
| US6277533B1 (en) * | 1993-12-08 | 2001-08-21 | Nikon Corporation | Scanning exposure method |
| JP2006261644A (en) * | 2005-02-16 | 2006-09-28 | Nikon Corp | Exposure apparatus and method of aligning reticle with sensitive substrate stage |
| US20090135437A1 (en) * | 2007-11-28 | 2009-05-28 | Nikon Corporation | Autofocus system with error compensation |
| CN102243138A (en) * | 2011-08-05 | 2011-11-16 | 中国科学院光电技术研究所 | Focal plane detection device for projection lithography |
-
2014
- 2014-06-03 CN CN201410243346.4A patent/CN105223780B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4711567A (en) * | 1982-10-22 | 1987-12-08 | Nippon Kogaku K.K. | Exposure apparatus |
| US6277533B1 (en) * | 1993-12-08 | 2001-08-21 | Nikon Corporation | Scanning exposure method |
| JPH09304015A (en) * | 1996-05-09 | 1997-11-28 | Nikon Corp | Plane position detecting method, plane position adjusting device and projection exposure system |
| JP2006261644A (en) * | 2005-02-16 | 2006-09-28 | Nikon Corp | Exposure apparatus and method of aligning reticle with sensitive substrate stage |
| US20090135437A1 (en) * | 2007-11-28 | 2009-05-28 | Nikon Corporation | Autofocus system with error compensation |
| CN102243138A (en) * | 2011-08-05 | 2011-11-16 | 中国科学院光电技术研究所 | Focal plane detection device for projection lithography |
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