CN1051869C - Improved photoresistance for cathode ray tube and preparation method - Google Patents

Improved photoresistance for cathode ray tube and preparation method Download PDF

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Publication number
CN1051869C
CN1051869C CN96105378A CN96105378A CN1051869C CN 1051869 C CN1051869 C CN 1051869C CN 96105378 A CN96105378 A CN 96105378A CN 96105378 A CN96105378 A CN 96105378A CN 1051869 C CN1051869 C CN 1051869C
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China
Prior art keywords
photoresist coating
coating
glass
photoresist
vinylpyrrolidone
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Expired - Fee Related
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CN96105378A
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Chinese (zh)
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CN1167332A (en
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童华苏
胡俊民
俞有中
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Chunghwa Picture Tubes Ltd
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Chunghwa Picture Tubes Ltd
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Priority to CN96105378A priority Critical patent/CN1051869C/en
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Publication of CN1051869C publication Critical patent/CN1051869C/en
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Abstract

The present invention relates to a mixture which is mixed by the primary color fluorophor, organic bonding agents such as polyvinyl alcohol (PVA), and photoresistance agents and is used for coating on the inner surface of a video display screen panel of a glass panel of a cathode ray tube (CRT). The vinyl-pyrrolidone-vinyl alcohol (VP-VA) copolymer is added into the mixture of the fluorophor, the organic bonding agents and the photoresistance agents in a range of 0.1 to 30 wt%. The VP-VA copolymer has the VP: VA molar ratio in the range from 20: 80 to 80: 20.

Description

Improvement photoresist of cathode ray tube and preparation method thereof
The present invention refers to a kind of video image photoresist coating and preparation method that the demonstration fluorescent screen inner surface that contrast improves is used of providing especially about a kind of image display screen with cathode ray tube (CRT) of light-emitting fluophor demonstration fluorescent screen.
The basic fluorescent screen printing technology of CRT glass display fluorescent screen relates to the exposure of photosensitive colloid (light-sensitive colloid).This exposed region is soluble, and still keeps after developing.On the other hand, in black matrixization (black matrixing) method of design with the improvement color contrast, this end body printing need have the program of reversed polarity, because these end body openings are clear because of the black of peripheral region.This phosphor screen production process relates to photoresist is applied on the inner surface of this demonstration fluorescent screen.This photoresist typically comprises polyvinylpyrrolidone (polyvinyl pyrrolidone; PVP), 4,4 " two nitrine anti-stilbenes-2,2 " disulfonic acid (4,4 " diazidostilbene-2,2 " disulfonic acid), disodium salt and water.The bonding of this photoresist and this CRT face glass is the problem place that causes productive rate to reduce always.For overcoming this problem with polyvinyl alcohol (polyvinyl alcohol; PVA) add in this photoresist material.The adding of PVA provides two benefits.At first, basically, improved the adhesiveness between photoresist and face glass.Secondly, PVA added in this photoresist can press down oxygen making amount, make photoresist be exposed to the required time shortening of sclerosis ultraviolet light under.Yet,, PVA is added the form that can make this photoresist more be difficult to the uniform thickness film in the photoresist material is applied on this face glass because of incompatible between PVP and PVA.
The present invention solves existing foregoing problems in the prior art, and PVA can be added in the photoresist coating solution, provides the height between this coating and this face glass bonding, and the form that this coating can high uniform thickness film is applied on this face glass.
Therefore, one of the object of the invention is to provide a kind of improvement photoresist of using as image display device glass display screen panel inner surfaces such as CRT that is coated with.
Another object of the present invention is to improve the conventional lithography glue material,, this material can be applied on this glass display screen panel with the form of high uniform thickness film to eliminate the inconsistent problem between the photoresist material composition.
When another purpose of the present invention is that image used in making as CRT shows the fluorescent screen, the photoresist coating of the high uniform thickness of tool is applied on this surface, demonstration fluorescent screen and the increase productive rate.
These purposes of the present invention can reach by the photoresist coating that is positioned on the glass image display screen panel inner surface, and can avoid the shortcoming of prior art, this photoresist coating comprises polyvinylpyrrolidone (PVP) and polyvinyl alcohol (PVA), this improvement further comprises vinylpyrrolidone-vinyl alcohol (VP-VA) copolymer, by it being added in the described photoresist coating so that this photoresist coating can be applied to the form of high uniform thickness film on this glass image display screen panel.
Claims have been narrated the novel characteristics at feature of the present invention place.Yet, the present invention itself with and further purpose and its advantage can consult shown in embodiment and the accompanying drawing and obtain preferable understanding, wherein the identical numbering in different figure means components identical, wherein:
Fig. 1 system is provided with the vertical sectional drawing of CRT of photoresist coating according to principle of the present invention in the inner surface of its face glass;
Fig. 2 is a flow chart, the photoresist coating prepared according to the present invention is described and it is applied to step on the image display screen glass panel inner surface.
Embodiment
See also Fig. 1, it shows CRT10 sectional view in accordance with the principles of the present invention, is provided with the photoresist coating 24 based on fluorophor among this CRT.In the following discussion, " demonstration fluorescent screen ", " display screen panel " reach speech such as " panels " and are used alternatingly.CRT10 comprise the glass big envelope 12, panel forward of sealing or show fluorescent screen 14, tail neck portion 18, and in the middle of funnel-like part 16.This photoresist coating 24 comprises several discontinuous fluorescence lithosomic body or elements, and it is luminous thereon the time in electron beam incident, produces video image on panel.Color CRT 10 comprises three electron beams 22, towards this CRT face glass 14 and focusing thereon.The tail neck portion 18 that is positioned at CRT glass big envelope 12 has several electron guns 20, typically be arranged side by side so that electron beam 22 towards this demonstration fluorescent screen 14.These electron beams 22 are with magnetic deflection yoke (magnetic deflection yoke) vertical and horizontal deflection, together by the photoresist coating 24 based on fluorophor.In order to simplify, this magnetic deflection yoke is not shown among the figure.Several electron beam straight joint 26a of being separated by of tool and the shadow cover 26 that has skirt shape part 28 around it and this phosphor screen 14 are provided with in mode separately.The shadow cover that the skirt shape part 28 of this shadow cover is fixed in around this shadow cover is installed on the fixture 30.This shadow cover installing fixture 30 can be attached to the inner surface of CRT glass big envelope 12, and can comprise traditional attachments and location structure, as cover frame and device spring, because of the event of simplifications also is not shown among the figure.This shadow cover installing fixture 30 (as welding or beading) in a conventional manner is attached to the inner surface of this CRT glass big envelope 12, and this shadow cover 26 can be attached to this installing fixture in a conventional manner.Antistatic/antireflecting coating 32 is positioned at the outer surface of this demonstration fluorescent screen 14.
See also Fig. 2, it represents a flow chart with the square form, illustrates photoresist coating produced according to the present invention and it is applied to step on the image display screen glass panel inner surface.In step 40, form this photoresist coating so that it comprises polyvinylpyrrolidone (PVP), 4,4 " two nitrine anti-stilbenes-2,2 " disulfonic acid, disodium salt and water.And in the step 42 polyvinyl alcohol (PVA) is added in the photoresist coating that contains PVP to increase the adhesiveness between this coating and image display screen glass panel.The adding of PVA not only increases the adhesiveness between photoresist coating and face glass, and the oxygen amount is reduced, make between the hardening period after being deposited on this face glass in, this photoresist coating is exposed to the time shortening ultraviolet light under.In order to overcome the inconsistent problem between PVP and PVA, in step 44, vinylpyrrolidone-vinyl alcohol (VP-VA) copolymer is added in this photoresist coating.This VP-VA copolymer adds in this photoresist coating with the scope of 0.1~30wt%, has overcome the inconsistent problem between PVP and PVA, and this coating can be applied on the whole front panel inner surface of this face glass with the form of uniform thickness film more.This VP-VA copolymer adds in this photoresist coating with the scope of 0.1~30wt%.This copolymer has the functional group of VP and VA simultaneously, and it can be used as with PVP and PVA coupling agent crosslinked together, to eliminate the inconsistent problem between PVA and PVP basically.This adds to VP-VA copolymer in the photoresist coating and preferably has VP/VA mol ratio in 20/80 to 80/20 scope.Photoresist coating most preferred embodiment according to the present invention comprises following composition:
Azide (azide) 0.5 gram
PVP 5 grams
PVA 2.5 grams
Water 100 grams
VP-VA 5.0wt%
Therefore demonstrate the improvement photoresist coating that the image display screen panel inner surface in the CRT is used, it has the adhesiveness that is bonded to display screen panel of height, and can be applied on the inner surface of this display screen panel with the form of high uniform thickness film.This photoresist coating comprises the PVP that is added with PVA increasing the adhesiveness between this photoresist coating and glass display screen panel, and reduce the oxygen amount so that between hardening period this photoresist be exposed to time shortening ultraviolet light under.Inconsistent problem between PVP and PVA can obtain compensation by the adding of VP-VA copolymer, so that this photoresist coating can be applied on the inner surface of this display screen panel with the form of high uniform thickness film.
Most preferred embodiment of the present invention is in above expression and explanation, by improvement and the modification of the those skilled in the art who is familiar with this technology to it, neither disengaging protection scope of the present invention.Therefore, contain all these kinds as claims and fallen within modification and modification in the present invention's spirit and the scope.Only illustrating described in above stated specification and the accompanying drawing, but not in order to restriction the present invention.

Claims (9)

1. the photoresist coating of an improvement, this photoresist coating is located on the inner surface of glass image display screen panel, and comprises polyvinylpyrrolidone and polyvinyl alcohol, it is characterized in that this photoresist coating also comprises:
Make this photoresist coating can be applied to vinylpyrrolidone-ethenol copolymer on this glass image display screen panel with the form of high uniform thickness film.
2. improvement photoresist coating as claimed in claim 1, therein ethylene pyrrolidones-ethenol copolymer adds in this photoresist coating with the scope of 0.1~30wt%.
3. improvement photoresist coating as claimed in claim 2, therein ethylene pyrrolidones-ethenol copolymer have the vinylpyrrolidone-vinyl alcohol mol ratio in 20/80 to 80/20 scope.
4. one kind prepares the glass image display screen panel inner surface method of coating with photoresist, and this method comprises the following steps:
Formation comprises polyvinylpyrrolidone, 4,4 " two nitrine anti-stilbenes-2, the 2 " coating solution of disulfonic acid, disodium salt and water;
Polyvinyl alcohol is added in this coating solution to improve the adhesiveness that this coating solution is bonded to this glass image display screen panel; And
Vinylpyrrolidone-ethenol copolymer is added in this coating solution, wherein this vinylpyrrolidone-ethenol copolymer can be applied on this glass image display screen panel this coating solution from the form of high uniform thickness film as the coupling agent between polyvinylpyrrolidone and polyvinyl alcohol.
5. method as claimed in claim 4 also comprises the step of this vinylpyrrolidone-ethenol copolymer with the scope adding of 0.1~30wt% of this coating solution.
6. method as claimed in claim 5, therein ethylene pyrrolidones-ethenol copolymer have the vinylpyrrolidone-vinyl alcohol mol ratio in 20/80 to 80/20 scope.
7. glass cathode ray tube facepleates that has coating on its inner surface comprises:
The photoresist coating solution that comprises polyvinylpyrrolidone is located on the inner surface of this face glass;
Polyvinyl alcohol is arranged in this photoresist coating so that this photoresist coating is bonded to this face glass;
Vinylpyrrolidone-ethenol copolymer is arranged in this photoresist coating so that this photoresist coating can be applied to the form of high uniform thickness film on this face glass.
8. glass cathode ray tube facepleates as claimed in claim 7, the scope of therein ethylene pyrrolidones-ethenol copolymer are 0.1~30wt% of this photoresist coating.
9. glass cathode ray tube facepleates as claimed in claim 8, therein ethylene pyrrolidones-ethenol copolymer have the vinylpyrrolidone-vinyl alcohol mol ratio in 20/80 to 80/20 scope.
CN96105378A 1996-06-04 1996-06-04 Improved photoresistance for cathode ray tube and preparation method Expired - Fee Related CN1051869C (en)

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CN96105378A CN1051869C (en) 1996-06-04 1996-06-04 Improved photoresistance for cathode ray tube and preparation method

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Application Number Priority Date Filing Date Title
CN96105378A CN1051869C (en) 1996-06-04 1996-06-04 Improved photoresistance for cathode ray tube and preparation method

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CN1051869C true CN1051869C (en) 2000-04-26

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10147954B4 (en) * 2001-09-28 2007-04-19 Infineon Technologies Ag CARL for Bioelectronics: Substrate connection via conductive layer

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4526854A (en) * 1982-09-01 1985-07-02 Tokyo Shibaura Denki Kabushiki Kaisha Photoresist composition with water soluble bisazide and diazo compound
CN1043006A (en) * 1987-01-22 1990-06-13 株式会社东芝 The photoetching compositions of fluorescent screen of colour kinescope

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4526854A (en) * 1982-09-01 1985-07-02 Tokyo Shibaura Denki Kabushiki Kaisha Photoresist composition with water soluble bisazide and diazo compound
CN1043006A (en) * 1987-01-22 1990-06-13 株式会社东芝 The photoetching compositions of fluorescent screen of colour kinescope

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Assignee: CPT (Fuzhou) Co., Ltd.

Assignor: CPT (Bermuda) Co., Ltd.

Contract fulfillment period: In October 31, 2007, 5 years

Contract record no.: 200210156

Denomination of invention: Improved lithographic unit for cathode ray tube and method of making the same

Granted publication date: 20000426

License type: Jiao Cha

Record date: 20021231

LIC Patent licence contract for exploitation submitted for record

Free format text: LICENCE; TIME LIMIT OF IMPLEMENTING CONTACT: 2007.10.31, 5 YEARS

Name of requester: CHUNGHWA PICTURE TUBES (FUZHOU) CO., LTD.

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Granted publication date: 20000426

Termination date: 20100604