CN105182508A - Optical System For A Lithographic Device - Google Patents
Optical System For A Lithographic Device Download PDFInfo
- Publication number
- CN105182508A CN105182508A CN201510411738.1A CN201510411738A CN105182508A CN 105182508 A CN105182508 A CN 105182508A CN 201510411738 A CN201510411738 A CN 201510411738A CN 105182508 A CN105182508 A CN 105182508A
- Authority
- CN
- China
- Prior art keywords
- concave spherical
- optical system
- spherical mirror
- lens
- mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/008—Systems specially adapted to form image relays or chained systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
Abstract
The invention relates to a unit-magnification optical system that is telecentric in the image and object space, for use in medium-resolution lithography, comprising: a Dyson-Winne structure having a spherical concave mirror (10) working for an object (31) and an image (32) passing through its center of curvature, and an optical unit (11) placed in the vicinity of the center of curvature of said mirror, characterized in that it comprises, between the concave mirror and the optical unit: - a group (40) consisting of at least two lenses situated in the vicinity of said optical unit and having a field correction function and function for confining beams in a reduced volume, and; - a group (50) consisting of at least two other lenses situated in the vicinity of the concave mirror and serving to correct the opening and chromatism.
Description
Technical field
The present invention relates to the optical system for photolithography.
Background technology
Photolithography is generally applied to the manufacture of high performance 1/10th micron-scale resolution integrated circuit.
But some application does not but need the precision of the above-mentioned type, 1 only need be satisfied with to several micron-sized lithography sharpness.It is emphasized that employing photolithography, for the welding of the multilayer circuit in the manufacture of carrying out interconnected contact and the circuit board overlapped each other.The superiority of foregoing circuit is, electronic wafer can be used to design and utilize the overlap of multiple single wafer, therefore, each wafer is easy to Design and manufacture.
The technology applied for the manufacture of aforementioned contact is illustrated by Figure 1A and 1B.In known First Series step, because the light 7 utilizing the light-emitting device coming from lithoprinting equipment to send throws light on, therefore, usual linear magnification is used for large perform region, and one deck resin bed 2 is positioned on circuit board 1 (or the technical term of prior art librarian use is referred to as " wafer " usually).Illumination is carried out by means of only some region of mask, is hollowed out by the resin of special process by region 3, so that filling is suitable for the material forming solder joint.In general, this relates to gold (people are referred to as " au bump ").Equally, in another series of steps known, the circuit shown in Figure 1B and circuit board 1 can be obtained, it be furnished with similar in spherical solder joint 6.
Usually, two solder joints 6 distance 4 of separating is general between 50 to 500 μm.Therefore, the lithoprinting equipment used, implements and does not need very high precision, and the lithoprinting equipment at contrast current techniques tip, does not also have high definition, note that it can is the sharpness of 1/10th μm of levels.All up to standard for the sharpness of above-mentioned application 2 μm of levels and the distortion of maximum 0.3 μm.
The thickness of resin bed 2 is at about 5 to 100 μm.Therefore, this equipment should have the large depth areas of 50 μm to 100 μm.
Finally, such integrated circuit should be the product that the industrial system with optimum productivity manufactures.Therefore, this equipment should have a region large as far as possible, for illuminating the area large as far as possible of plate large as far as possible within preset time and/or given plate.Described equipment also should be able to be suitable for polytype for industrial high power illuminating lamp, especially for the frequency spectrum ray g of high-pressure mercury-vapor lamp that can use the undissolved maximum necessary luminous flux of photosensitive resin, h and i.
In addition, compared with the optics that object space and image space are the hearts far away, extremely desirable when optical lithography, advocate as prior art personnel, that is, effective cone-shaped beam well perpendicular to object plane and image planes, when carrying out each step of lithography process, cover the deviation of the location, face, unfavorable image side of portraying, so that system does not change the deviation of focusing.
The description of the object of the invention and prior art
The present invention seeks to the optical texture proposing a kind of lithography:
-a kind of single magnification (copying 1/1) is described,
-be particularly suitable for general sharpness to require (1 to several micron order),
-can run at the important area of the heart far away of object space and image space,
-particularly there is multiple compact nature simultaneously, price is not expensive and performance good (especially can run under ray at the g of mercury vapor lamp, i and h).
We have understood a large amount of for such photolithographic optical texture being designed and having developed.
Fig. 2 describes the first embodiment of this equipment of the present invention, and " DysonWinne " type structure is shown.Described equipment comprises the center of curvature carrys out reference concave spherical mirror 10 by C.Mirror 10 reflects the light of selfluminous device (not shown), through mask M in order to such as, to being used for some part reflection of the plate W forming required image, solder joint.If M and W is positioned on the center of curvature C of mirror, the picture of the M on W will be desirable optical image, but M and W can not obscure, and thus described equipment is inoperative.Though because mask M and plate W is not but positioned at completely on the center of curvature C of sphere concave mirror in same plane, as shown in Figure 3, deviation is slightly had all respectively in optical axial upper and lower, therefore, equipment comprises the lens 11 and 12 of the curved surface with mirror 10, for correcting the aberration of generation.But the equipment shown in Fig. 2 has defect, and especially M and W is positioned at same plane, this is just difficult to make equipment carry out correlation displacement when throwing light on by actuator.In addition, for throwing light on and the size of industrializing implementation dual-purpose, equipment region 7 width is too little.Because M and W should be positioned at the center of curvature and the correcting lens 11 and 12 of mirror 10 by convergence, be convenient to force to limit the determined value of Dyson-Wynne type equipment performance in the effective coverage of circular optical parts, this just causes the limitation of existing equipment.
Fig. 4 illustrates the second embodiment of known device.Have and the on all four optical texture addressed above, a sphere concave mirror 10 and concentric lens 11 and 12.But, lens 11 and 12 comprise two reflectings surface 20 and 22 (prior art personnel are also called " closing up prism "), so that light runs through mask M, and, in order to illuminate the light from mirror (10) of plate all no longer through the center of curvature and the lens 11 and 12 of mirror 10, but will be overlapping.Closing up of such light allows M and W no longer may be placed in same plane.Therefore, can W be moved at horizontal plane and move M at clinoplane.The surface level comprising W and the clinoplane comprising M all and the effective cone of rays propagated between sphere concave mirror 10 and 11,12 groups, lens tangent, to reduce region, thus cause lens 11 and 12 to correct.Lens 11 and 12 are all concentric with mirror 10, in fact, must reduce the angle that light all incides the region of mirror 10 and lens 11,12.But, the equipment shown in Fig. 4 or existing defects.In fact, M is positioned at clinoplane, so, will encounter difficulties at its installation, maintenance and Mechanical Moving.In addition, the peak width of equipment in order to allow illumination to have a compatible size of commercial Application plate still too little because M and W leans on too near each other, also lean on too near with center of curvature C.Equipment shown in Fig. 4, only to correct small distortion, astigmatism or distortion by lens 11 and 12, because light should keep vertical incidence as far as possible on the surface of mirror 10 and lens 11,12, this is because people wish that equipment keeps concentric as far as possible relative to mirror center C.
According to document US6.424.471, also understand a kind of projection optics structure comprising lens and separator volume.
Meet the magnification of 1/4 except this structure and be applicable to except submicroscopic application, people also will propose their floor areas especially and adopt a kind of polarization separator volume to reduce aberration, and this just makes complex structure and improves production cost.
In addition, by document US6.556.278, people understand the different schemes of the lithographic optics aspect of single magnification.The scheme mentioned in the document does not possess gratifying compactedness, and on the contrary, the document is advocated and used little complete optical device to obtain large operation area.
The optical plan of another kind of single magnification is suggested in document US2003/0223127.But the concave mirror in the scheme proposed in the document is not the structure using " DysonWinne " type, but a kind of structure of reflecting surface mirror.The problem of the document is not considered " DysonWinne " type structure aberration, does not allow said structure no longer compact certainly.
Summary of the invention
The present invention proposes a kind of defect at least made up in above-mentioned defect.
The present invention proposes a kind of optical system of single magnification especially, the image space of the heart far away and object space, for the lithographic application of general sharpness, comprising:
The structure of-known " DysonWinne " type, this structure has a concave spherical mirror, for an object and picture by the center of curvature of above-mentioned concave spherical mirror and an optical module be placed near its center of curvature.
It is characterized in that, it comprises above-mentioned concave mirror and optical module:
-one optically focused group, is at least made up of two lens, is positioned near above-mentioned optical module, have the function of correcting area, and propagates by concentrating on converging ray between above-mentioned concave mirror, optical module and optically focused group the size reducing concave spherical mirror,
-one at least two other lens combination, is positioned near above-mentioned concave mirror, and has the function corrected aperture and chromatic aberration.
The superiority of this structure is, allows a large region and effectively can improve the compactedness of optics, can obtain high-quality required picture simultaneously.
Especially the picture region that is greater than concave mirror diameter 70% can be obtained.
Other features of the present invention, object and superiority thereof will be described below.Particularly because region increases, the scheme addressed can make mask holder and board mount mutually remove, to be convenient to insertion machine device.Also can throw light on to the larger surface of plate in each exposure in the region of launching, and improve plant efficiency.
In addition, mask holder and board mount can be parallel to the optic axis of system.Therefore, the installation of mask and plate, maintenance and mobilely all greatly to simplify, support element design difficulty is little, and price is not expensive.Removing by support element, can make support element be separated from other opticses of system, carries out the simplification installed and move freely like this with regard to improvement mask and plate.
Accompanying drawing explanation
-Figure 1A and 1B illustrates the prior art manufacturing solder joint;
-Fig. 2 illustrates the first embodiment of the embodiment of a lithoprinting optical system;
-Fig. 3 illustrates the view of the photolithography system of single magnification and the optical region of Dyson – Winne type system;
-Fig. 4 illustrates the second embodiment of the known embodiment of lithoprinting optical system of single magnification;
-Fig. 5 and 6 illustrates two kinds of possibility embodiments of optical system of the present invention.
In accompanying drawing, similar parts adopt same label to indicate.
Embodiment
Fig. 5 and 6 illustrates two embodiments of two kinds of embodiments of an optical system of a lithoprinting equipment of the present invention.Other embodiments are also possible, but describe.
Fig. 5 describes an optical system, and this system does not have the light that can accept from mask M and is reflected back the prism of plate W.
Fig. 6 describes a more successful embodiment of an optical system, and this system has two reflecting prisms.
Particularly, this optical system describes the telecentric structure of prior art personnel known " DysonWinne " type, " DysonWinne " concept that the thickening prism of the refractive surface of object immediate vicinity is main composition is positioned at according to the center of curvature, it has a concave spherical mirror 10, is placed in object near its center of curvature and picture and optical module 11 for one.
This structure comprises a group be at least made up of two lens 40, be positioned near above-mentioned optical module 11, there is the function of correcting area, and, can by assembling light beam to reduce the size of described concave spherical mirror 10, and comprise the group 50 of at least two other prisms, be positioned at the vicinity of above-mentioned concave mirror (10) and have the function of alignment aperture and look elephant.Forming the glass of the prism of two groups 40 and 50, is all that the technical criteria calculated with reference to optical combination is selected, to guarantee to carry out chromatic aberration correction in the scope of required spectrum.
This structure also comprises support element 31 and 32, is suitable on the one hand accepting and keeping a mask M, is suitable on the other hand accepting and keeping a plate W.Component 31 is designed to connect mask M and facility 32 is designed to matching plate W.
The correction facility of formation group 40 and 50 is positioned at support element 31, between 32 and mirror 10.In other words, this light come from photolithography equipment light-emitting device and through the mask M be positioned on support element 31, described light via correction facility, corrected facility again to pass, and illuminated the plate W on support element 32 before being reflected by mirror 10.
The refractive power of above-mentioned group 40 is corrected and when walking along the street line is between optics group 40 and 50, is almost parallel to optical axial for what make the light of optical axial farthest.By this method, the overall dimensions of optical element all rationally reduces, and the price of the price of optical material, processing and polishing also all reduces.
Total refractive power of above-mentioned group 50 is faint and just under 50% of the refractive power of mirror 10.In the equipment that prior art is addressed, support element and correcting lens are all positioned at the center of curvature closest to mirror, especially as shown in Figure 6, optical module 11 can comprise one be suitable for closing up from mask M or be transmitted into plate W light beam close up prism.Close up under prism presents the form in two faces 20 and 22 in block 11, two faces 20 and 22 are relative to the extension at 45 ° of the main axis of concave mirror.Also all therefore close up through mask M or the light that illuminates plate W, in fact, it can make the similar optical axial along being parallel to system of support element 31 and 32 extend.Obviously, support element 31 and 32 is arranged like this, so that mask M and plate W also can extend along the optical axial being parallel to system.For prior art, this design and keep technology in a horizontal plane greatly to simplify mask and plate.
Above-mentioned support element 31 and 32 also comprises the optical axial direction be suitable for along being almost parallel to system and moves mask M and/or plate W facility 33.
Superiority of the present invention is, can design optical object of the present invention, makes the distance of support element 31 and 32 and system optics axis be greater than the radial floor area of mirror 10 and facility 11,40 and 50.
Like this, space is unimpeded, and support element moves freely.
Meanwhile, said structure can at such as 44*44mm
2large regions act on, instead of the 22*44mm mentioned in prior art
2region act on, in prior art, to be in the region of observation state too compact for optical object.The feature of described compactedness is, the size of object area and be made up of the concave mirror of " DysonWinne " type as being greater than 65% of usual large optical element diameter.
Such as, be preferably, the lens of the group 40 addressed or group 50 are made up of the surface comprising aspheric surface shape.
In Fig. 5, system comprises a concave-sphere 10, goes out to be furnished with the group 50 of 2 lens formations near concave-sphere 10.Group 40 is made up of 3 lens.Significant figure relative aperture is NA=0.18. for picture region, and we can be mask and plate extraction 44*44m
2region.By the sharpness that this optics is intensive be on the whole surface 2 μm in order to cover the g (435nm) of high-pressure mercury-vapor lamp, the spectral region of three kinds of rays of h (405nm), i (365nm).
In Fig. 6, system comprises the light refraction prism in mask M and plate W direction.Group 40 is only made up of two lens.Serviceability is closely but a little less than the serviceability of the system shown in Fig. 5.
Optical module 11 shown in Fig. 6 is prisms of a reflecting surface formula, and be individual obvious distortion one by one shown in Fig. 5, wherein, optical module does not have reflecting surface, and the mask of transmitting and the plate of acceptance are all in a plane with the axes normal of general optical axial i.e. concave-sphere 10.
In the above two embodiments, annular as region around the effective coverage for mask M and plate W, according to the design described by figure (3), this annular is greater than 65% of concave mirror (10) as the diameter in region, and concave mirror, optical module and different lens are all distributed on one and are similar in the big envelope of cylinder, to obtain assembly space well-to-do in the good compact performance peace printing machine of system.
The internal diameter of this cylinder is less than 250mm, and in it, length is less than 750mm.
The length of the waves against run is between 360 to 435nm.
Claims (5)
1. optical system, described optical system has single magnification, is the heart far away in image space and object space, and for the lithography of intermediate resolution, comprising:
The structure of-" Dyson-Winne " type, described structure has concave spherical mirror and optical module, and described concave spherical mirror is used for making object and picture through its center of curvature, and described optical module is configured near the center of curvature of described concave spherical mirror,
Comprise between described concave spherical mirror and described optical module:
-the group that is made up of at least two lens, wherein, described at least two lens are positioned near described optical module, and have regional correction function and the light velocity is constrained in the function in the volume of reduction,
-the group that is made up of at least two other lenses, wherein, described at least two other lenses are positioned near the forward of described concave spherical mirror, and have the major function corrected aperture and aberration,
The feature of described optical system is, is wholely greater than 65% of the diameter of described concave spherical mirror as region.
2. the optical system according to aforementioned claim, is characterized in that, described concave spherical mirror, described optical module and different lens are all distributed in the sealing cover of substantially cylindrical.
3. the optical system according to claim arbitrary in aforementioned claim, it is characterized in that, treat to be moved by lithographic mask and plate parallel surface, be further characterized in that, described optical module comprises reflecting surface, and wherein said reflecting surface is 45 ° relative to the axis of concave spherical mirror and extends with the light collected from described mask and launch as light beam to described plate.
4. the optical system according to claim arbitrary in aforementioned claim, is characterized in that, at least one in described lens is aspheric.
5. the optical system according to claim arbitrary in aforementioned claim, wherein, described concave spherical mirror is the Mangin mirror-type formed by carrying out the back side of described lens reflecting process.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0504362A FR2885234B1 (en) | 2005-04-29 | 2005-04-29 | OPTICAL SYSTEM FOR A PHOTOLITHOGRAPHY DEVICE |
| FR0504362 | 2005-04-29 | ||
| FR0508657A FR2885235B1 (en) | 2005-04-29 | 2005-08-22 | OPTICAL SYSTEM FOR A PHOTOLITHOGRAPHY DEVICE |
| FR0508657 | 2005-08-22 | ||
| CNA2006800148110A CN101171546A (en) | 2005-04-29 | 2006-05-02 | Optical system for a lithographic device |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2006800148110A Division CN101171546A (en) | 2005-04-29 | 2006-05-02 | Optical system for a lithographic device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105182508A true CN105182508A (en) | 2015-12-23 |
Family
ID=35431913
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510411738.1A Pending CN105182508A (en) | 2005-04-29 | 2006-05-02 | Optical System For A Lithographic Device |
| CNA2006800148110A Pending CN101171546A (en) | 2005-04-29 | 2006-05-02 | Optical system for a lithographic device |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2006800148110A Pending CN101171546A (en) | 2005-04-29 | 2006-05-02 | Optical system for a lithographic device |
Country Status (2)
| Country | Link |
|---|---|
| CN (2) | CN105182508A (en) |
| FR (2) | FR2885234B1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1959289A1 (en) * | 2007-02-13 | 2008-08-20 | Carl Zeiss SMT AG | Unit magnification projection objective |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4103989A (en) * | 1977-02-07 | 1978-08-01 | Seymour Rosin | Unit-power concentric optical systems |
| US4171871A (en) * | 1977-06-30 | 1979-10-23 | International Business Machines Corporation | Achromatic unit magnification optical system |
| US20040239893A1 (en) * | 2003-05-27 | 2004-12-02 | Mercado Romeo I. | Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5729331A (en) * | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| EP1102100A3 (en) * | 1999-11-12 | 2003-12-10 | Carl Zeiss | Catadioptric objective with beamsplitter |
| US6898025B2 (en) * | 2002-06-04 | 2005-05-24 | Pentax Corporation | Projection aligner and optical system therefor |
| WO2004019128A2 (en) * | 2002-08-23 | 2004-03-04 | Nikon Corporation | Projection optical system and method for photolithography and exposure apparatus and method using same |
-
2005
- 2005-04-29 FR FR0504362A patent/FR2885234B1/en not_active Expired - Fee Related
- 2005-08-22 FR FR0508657A patent/FR2885235B1/en not_active Expired - Fee Related
-
2006
- 2006-05-02 CN CN201510411738.1A patent/CN105182508A/en active Pending
- 2006-05-02 CN CNA2006800148110A patent/CN101171546A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4103989A (en) * | 1977-02-07 | 1978-08-01 | Seymour Rosin | Unit-power concentric optical systems |
| US4171871A (en) * | 1977-06-30 | 1979-10-23 | International Business Machines Corporation | Achromatic unit magnification optical system |
| US20040239893A1 (en) * | 2003-05-27 | 2004-12-02 | Mercado Romeo I. | Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2885235B1 (en) | 2008-07-18 |
| FR2885235A1 (en) | 2006-11-03 |
| FR2885234B1 (en) | 2008-07-11 |
| FR2885234A1 (en) | 2006-11-03 |
| CN101171546A (en) | 2008-04-30 |
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20151223 |
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| RJ01 | Rejection of invention patent application after publication |