CN105159036A - Temperature control system used for exposure light source of direct-write photoetching machine - Google Patents
Temperature control system used for exposure light source of direct-write photoetching machine Download PDFInfo
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- CN105159036A CN105159036A CN201510634896.3A CN201510634896A CN105159036A CN 105159036 A CN105159036 A CN 105159036A CN 201510634896 A CN201510634896 A CN 201510634896A CN 105159036 A CN105159036 A CN 105159036A
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Abstract
The invention provides a temperature control system used for an exposure light source of a direct-write photoetching machine. The temperature control system comprises a temperature monitoring module, a temperature processing and control module and a temperature control executing module. The temperature monitoring module is used for collecting internal working temperature of the exposure light source in real time and outputting a measurement value of the internal working temperature of the exposure light source to the temperature processing and control module; the temperature processing and control module is used for processing the measurement value of the internal working temperature of the exposure light source according to a preset target reference value of the internal working temperature of the exposure light source and the permissible error range and outputting a control signal to the temperature control executing module according to a processing result; the temperature control executing module is used for controlling the internal working temperature of the exposure light source according to the control signal transmitted by the temperature processing and control module. The temperature control system is capable of automatically controlling the internal working temperature of the exposure light source of the direct-write photoetching machine accurately and fast, low in cost and convenient to maintain.
Description
Technical field
The present invention relates to semiconductor lithography machine technology field, specifically a kind of temperature control system for direct-write type lithography machine exposure light source.
Background technology
Photoetching technique is for printing the characteristic composition of tool on the surface of a substrate.Such substrate can comprise be used for producing the semiconductor devices, the chip of multiple integrated circuit, flat-panel screens (such as liquid crystal display), circuit board, biochip, micromechanics electronic chip, photoelectron circuit chip etc.
Photoetching lithography process is placed in precisely locating platform system by mask plate or wafer, by vacuum suction, by the exposure device in lithographic equipment, the feature pattern of design is projected mask plate surface, in exposure process, the light trigger absorbing luminous energy resolves into free radical trigger monomer and carries out photopolymerization reaction, forms the build molecule being insoluble to dilute alkaline soln.When exposure lacks, because polymerization is not thorough, in developing process, the swelling deliquescing of glued membrane, causes the unintelligible even rete of lines to come off, causes film and copper in conjunction with bad; If over-exposed, can cause again development difficulty, such wiring board also can warp stripping in electroplating process, formation plating, so control exposure energy well to seem extremely important.
One of parts that photoetching technique is most crucial are exactly exposure light source, but there is the characteristic of negative temperature coefficient due to exposure light source, temperature rise is particularly remarkable to the reliability of exposure light source, stability influence, so heat radiation is very crucial to exposure light source, the working stability of good temperature control system guarantee exposure system must be adopted reliable.
The usual way of current control exposure light source working temperature adopts water cooling unit recirculated water to carry out temperature control, pipeline is accessed exposure light source radiating end, utilize water that heat is taken away, water is flow on main heating radiator (condenser) by pipeline and dispels the heat, but because litho machine internal work environment has particular/special requirement, there is certain defect in this temperature control mode, as conduction efficiency is low, can not control real-time exposure environment temperature, also need in addition water circulating pipe is installed, unacceptable at the issuable condensate water of device interior thus, also there is installation and maintenance difficulty simultaneously, the problems such as use cost is higher.
Summary of the invention
The object of the present invention is to provide a kind of temperature control system for direct-write type lithography machine exposure light source, to overcome the above-mentioned shortcoming that in prior art, photo-etching machine exposal light-source temperature controls.
Technical scheme of the present invention is:
For a temperature control system for direct-write type lithography machine exposure light source, this system comprises temperature monitoring module, Temperature Treatment control module and temperature and controls execution module;
Described temperature monitoring module, for Real-time Collection exposure light source internal operating temperature, and exports the measured value of described exposure light source internal operating temperature to Temperature Treatment control module;
Described Temperature Treatment control module, for according to the target fiducials value of exposure light source internal operating temperature preset and permissible error scope thereof, the measured value of described exposure light source internal operating temperature is processed, and outputs control signals to temperature control execution module according to result;
Described temperature controls execution module, controls exposure light source internal operating temperature for the control signal sent according to described Temperature Treatment control module.
The described temperature control system for direct-write type lithography machine exposure light source, this system also comprises temperature control status display module; Described temperature control status display module, for according to the result of Temperature Treatment control module to exposure light source internal operating temperature measured value, shows the real-time status of exposure light source internal operating temperature.
The described temperature control system for direct-write type lithography machine exposure light source, this system also comprises temperature control and management module; Described temperature control and management module is used for carrying out Storage and Processing to the exposure light source internal operating temperature data of Temperature Treatment control module Real-time Feedback, and when exposure light source cannot meet exposure require time, adjusted by the target fiducials value of Temperature Treatment control module to exposure light source internal operating temperature.
The described temperature control system for direct-write type lithography machine exposure light source, described temperature monitoring module is formed primarily of temperature sensor, and described temperature sensor is integrated in exposure light source inside.
The described temperature control system for direct-write type lithography machine exposure light source, described Temperature Treatment control module comprises A/D converter, data processing unit and temperature and controls to perform driving port, the input end of described A/D converter connects the output terminal of temperature monitoring module, the input end of the output terminal connection data processing unit of described A/D converter, the output terminal of described data processing unit controls to perform the input end driving port to connect temperature control execution module by temperature;
Described data processing unit, whether the measured value for real-time judge exposure light source internal operating temperature exceeds the permissible error scope of target fiducials value, if do not go beyond the scope, then controlling to perform by temperature drives port control temperature control execution module to quit work, if go beyond the scope and lower than target permission minimum value, then controlling to perform by temperature drives port control temperature control execution module to quit work, if go beyond the scope and higher than target permission maximal value, then control to perform driving port control temperature control execution module by temperature and start working.
The described temperature control system for direct-write type lithography machine exposure light source, described temperature controls execution module and comprises the first heat radiator, the first heat-conducting silicone grease, Peltier effect element, the second heat-conducting silicone grease and the second heat radiator, described first heat radiator, the first heat-conducting silicone grease and Peltier effect sets of elements are formed in exposure light source inside, and described second heat-conducting silicone grease and the second heat radiator are arranged on exposure light source outside; Described first heat radiator connects the refrigeration end of Peltier effect element by the first heat-conducting silicone grease, the radiating end of described Peltier effect element connects the second heat radiator by the second heat-conducting silicone grease, and the current controling end of described Peltier effect element connects the control output end of Temperature Treatment control module.
The described temperature control system for direct-write type lithography machine exposure light source, described temperature control status display module comprises state of temperature LED display module and temperature anomaly buzzing alarm module.
The described temperature control system for direct-write type lithography machine exposure light source, described temperature control and management module comprises communication module and host computer;
Described communication module, for the exposure light source internal operating temperature data of Temperature Treatment control module Real-time Feedback are sent to host computer, the target fiducials value adjustment signal also for the exposure light source internal operating temperature generated by host computer is sent to Temperature Treatment control module;
Described host computer, for adding up exposure light source internal operating temperature data, forming daily record of work and storing; Also for cannot meet when the normal but exposure light source of exposure light source internal operating temperature exposure require time, sent the target fiducials value adjustment signal of exposure light source internal operating temperature to Temperature Treatment control module by communication module.
As shown from the above technical solution, the present invention can carry out the automatic control of direct-write type lithography machine exposure light source internal operating temperature accurately and rapidly, and cost is low, be convenient to safeguard.
Accompanying drawing explanation
Fig. 1 is the structural schematic block diagram of the specific embodiment of the invention;
Fig. 2 is that the temperature of the specific embodiment of the invention controls execution module actual installation layout;
Fig. 3 is the temperature scaling factor process flow diagram of the specific embodiment of the invention;
Fig. 4 is the temperature control and management process flow diagram of the specific embodiment of the invention.
Embodiment
The present invention is further illustrated below in conjunction with the drawings and specific embodiments.
As shown in Figure 1, a kind of temperature control system for direct-write type lithography machine exposure light source, comprises temperature monitoring module 1, Temperature Treatment control module 2, temperature control execution module 3, temperature control status display module 4 and temperature control and management module 5.
Temperature monitoring module 1 is formed primarily of temperature sensor, and it is inner that temperature sensor is integrated in exposure light source 0, can reduce the impact by external environmental factor, thus true reflection exposure light source 0 internal operating temperature.Temperature Treatment control module 2 comprises A/D converter, data processing unit and temperature and controls to perform driving port.
Temperature controls execution module 3 and comprises the first heat radiator 31, first heat-conducting silicone grease 32, Peltier effect element 33, second heat-conducting silicone grease 34 and the second heat radiator 35, it is inner that first heat radiator 31, first heat-conducting silicone grease 32 and Peltier effect element 33 are integrated in exposure light source 0, and it is outside that the second heat-conducting silicone grease 34 and the second heat radiator 35 are arranged on exposure light source 0.
Temperature control status display module 4 comprises state of temperature LED display module and temperature anomaly buzzing alarm module, state of temperature LED display module can provide different feedback instruction for different temperature condition, therefore shows the inner current state of temperature of condition adjudgement exposure light source by LED; Temperature anomaly buzzing alarm module can carry out buzzing warning for temperature anomaly situation, carries out maintenance process accordingly by buzzing warning reminding operating personnel.Temperature control and management module 5 comprises communication module and host computer.
The output terminal of temperature sensor connects the input end of A/D converter, the input end of the output terminal connection data processing unit of A/D converter, the output terminal of data processing unit controls by temperature to perform the current controling end driving port to connect Peltier effect element 33; The refrigeration end of Peltier effect element 33 connects the first heat radiator 31 by the first heat-conducting silicone grease 32, and the radiating end of Peltier effect element 33 connects the second heat radiator 35 by the second heat-conducting silicone grease 34.The connection state of temperature LED display module of the output terminal of data processing unit and the input end of temperature anomaly buzzing alarm module.Data processing unit is connected with host computer interactive mode by communication module.
Principle of work of the present invention:
Exposure light source 0 will produce amount of heat in operational process, and its job stability will depend on whether temperature control meets the demands.It is inner that temperature monitoring module 1 is placed in exposure light source 0, and primarily of temperature sensor composition, Real-time Collection exposure light source 0 internal operating temperature data, send temperature data to Temperature Treatment control module 2 simultaneously.Data processing unit is delivered to after the temperature data received is carried out A/D conversion by the A/D converter of Temperature Treatment control module 2, data processing unit with the targeted operating temperature preset for data processing is carried out in reference frame, judge the whether content with funtion requirement of exposure light source 0 internal operating temperature, when controlling to perform drive end cause for gossip by temperature according to judged result, control temperature controls execution module 3 action simultaneously, ensures that exposure light source 0 internal operating temperature is near target fiducials value.
In addition, conveniently monitor exposure light source 0 internal operating temperature intuitively and control situation, the present invention is provided with temperature control status display module 4, its function is feedback exposure light source 0 internal operating temperature state and carries out temperature anomaly warning, can intuitive judgment feedback exposure light source 0 internal operating temperature whether normal, and give buzzer warning when occurring abnormal.
The present invention also possesses temperature control and management module 5, and wherein, the exposure light source 0 internal operating temperature data that host computer is fed back by communication module Real-time Obtaining Temperature Treatment control module 2 also carry out statistical study, form daily record of work, as follow-up Modulated Reference; Can be used as the instrument of adjusting simultaneously, in initial debugging and follow-up maintenance debug process, whether meet exposure with the running status of exposure light source 0 and require as foundation, the target fiducials value of exposure light source 0 internal operating temperature is finely tuned.
Temperature controls the concrete enforcement layout of execution module 3 as shown in Figure 2, the heat that exposure light source 0 produces is exported by the first heat radiator 31, first heat radiator 31 is connected with the first heat-conducting silicone grease 32, first heat-conducting silicone grease 32 is connected with the refrigeration end of Peltier effect element 33 again, the radiating end of Peltier effect element 33 is connected with the second heat-conducting silicone grease 34, second heat-conducting silicone grease 34 is connected with the second heat radiator 35 again, exposure light source 0 internal heat to be distributed by dispelling the heat layer by layer.Peltier effect element 33 controls to perform with the temperature of Temperature Treatment control module 2 by wire and drives port to be connected, and temperature controls to perform and drives port to realize temperature control effect by the working current controlling Peltier effect element 33.First heat-conducting silicone grease 32 and the second heat-conducting silicone grease 34 are a kind of high heat conductive insulating organic materials, there is good thermal conductivity, and can the stability of long term shape retention in wider temperature range (-50 DEG C to 230 DEG C), meet the heat conduction requirement of exposure light source 0 inside completely.
As shown in Figure 3, temperature scaling factor flow process of the present invention is:
After photo-etching machine exposal starts, temperature monitoring module 1 measures the inner current operating temperature of exposure light source 0, and Temperature Treatment control module 2 receives current temperature data and after process, judges whether Current Temperatures goes beyond the scope.When exposure light source 0 works, can set target fiducials value and the permissible error scope thereof of working temperature in advance, as 20 ± 5 DEG C, namely the target fiducials value of working temperature is 20 DEG C, and the target of working temperature allows maximal value to be 25 DEG C, and target allows minimum value to be 15 DEG C.
If do not gone beyond the scope, namely current operating temperature drops within the scope of 15 to 25 DEG C, then temperature control execution module 3 quits work, judge whether further to be greater than target fiducials value simultaneously, if be not greater than target fiducials value, now the green LED pilot lamp of temperature control status display module 4 is lighted, and the scope of the inner current operating temperature of instruction exposure light source 0 is between 15 to 20 DEG C; If be greater than target fiducials value, now the yellow led pilot lamp of temperature control status display module 4 is lighted, and the scope of the inner current operating temperature of instruction exposure light source 0 is between 20 to 25 DEG C.
If gone beyond the scope, then determine whether high temperature further, namely higher than 25 DEG C, if not high temperature, then be judged as low temperature (lower than 15 DEG C), now the blue led pilot lamp of temperature control status display module 4 is lighted, and indicate current exposure light source 0 inside for low-temperature condition, simultaneous temperature controls execution module 3 and quits work; If be high temperature, then the buzzing of temperature control status display module 4 is reported to the police, red LED pilot lamp is lighted, indicate current exposure light source 0 inside to be the condition of high temperature, need carry out radiating treatment, now temperature control execution module 3 is started working, exposure light source 0 is lowered the temperature, meanwhile, its actual work temperature moment is monitored by temperature monitoring module 1, forms exposure light source 0 internal operating temperature closed-loop control system.
As shown in Figure 4, temperature control and management flow process of the present invention is:
Litho machine starts exposure, and temperature monitoring module 1 measures the inner current operating temperature of exposure light source 0, and Temperature Treatment control module 2 is by operating temperature data Real-time Feedback to temperature control and management module 5, and temperature control and management module 5 completes data and stores and process.
Temperature control and management module 5 not only completes storage and the process of data, also complete adjusting of exposure light source 0 internal operating temperature, namely, outside temperature scaling factor, temperature control and management module 5 adjusts exposure light source 0 internal operating temperature by actual exposure situation.
Idiographic flow is as follows: by Temperature Treatment control module 2, temperature control and management module 5 judges that whether exposure light source 0 internal operating temperature is normal, if working temperature abnormity, then continues to perform said temperature closed-loop control flow process, carries out from Row sum-equal matrix; If working temperature is normal, then whether exposure requirement is met to exposure light source under current operating temperature condition 0 and judge, if meet exposure requirement, then continue to be controlled by said temperature closed-loop control flow process;
If do not meet exposure requirement, then according to current operating temperature situation, after comprehensive descision, determine whether the target fiducials value adjusting exposure light source 0 internal operating temperature, if without the need to adjustment, then continue to perform said temperature closed-loop control flow process;
If desired adjust, then send adjustment order to Temperature Treatment control module 2, the target fiducials value of adjustment exposure light source 0 internal operating temperature, simultaneously, temperature monitoring module 1 continues to measure the inner current operating temperature of exposure light source 0, circulation performs temperature and to adjust flow process, until the target fiducials value of exposure light source 0 internal operating temperature meets the exposure requirement of exposure light source 0, so far completes the work of adjusting of exposure light source 0 internal operating temperature.
To sum up, temperature monitoring module 1 of the present invention, Temperature Treatment control module 2, temperature control execution module 3, temperature control status display module 4 and temperature control and management module 5, define Cryocooler Temperature Closed Loop Control System and temperature Control management system, wherein Cryocooler Temperature Closed Loop Control System is responsible for the measurement of exposure light source 0 temperature, calculation process, temperature control and state of temperature feedback operation in real time, automatically can complete exposure light source 0 internal operating temperature and control and the feedback of temperature control system operation conditions; Temperature Control management system can gather and store real time temperature exact value, forms exposure light source 0 internal operating temperature record, is responsible for the work of adjusting that exposure light source 0 internal operating temperature is initially debugged and follow-up maintenance is debugged simultaneously.
The above embodiment is only be described the preferred embodiment of the present invention; not scope of the present invention is limited; under not departing from the present invention and designing the prerequisite of spirit; the various distortion that those of ordinary skill in the art make technical scheme of the present invention and improvement, all should fall in protection domain that claims of the present invention determine.
Claims (8)
1. for a temperature control system for direct-write type lithography machine exposure light source, it is characterized in that: this system comprises temperature monitoring module, Temperature Treatment control module and temperature and controls execution module;
Described temperature monitoring module, for Real-time Collection exposure light source internal operating temperature, and exports the measured value of described exposure light source internal operating temperature to Temperature Treatment control module;
Described Temperature Treatment control module, for according to the target fiducials value of exposure light source internal operating temperature preset and permissible error scope thereof, the measured value of described exposure light source internal operating temperature is processed, and outputs control signals to temperature control execution module according to result;
Described temperature controls execution module, controls exposure light source internal operating temperature for the control signal sent according to described Temperature Treatment control module.
2. the temperature control system for direct-write type lithography machine exposure light source according to claim 1, is characterized in that: this system also comprises temperature control status display module; Described temperature control status display module, for according to the result of Temperature Treatment control module to exposure light source internal operating temperature measured value, shows the real-time status of exposure light source internal operating temperature.
3. the temperature control system for direct-write type lithography machine exposure light source according to claim 1, is characterized in that: this system also comprises temperature control and management module; Described temperature control and management module is used for carrying out Storage and Processing to the exposure light source internal operating temperature data of Temperature Treatment control module Real-time Feedback, and when exposure light source cannot meet exposure require time, adjusted by the target fiducials value of Temperature Treatment control module to exposure light source internal operating temperature.
4. the temperature control system for direct-write type lithography machine exposure light source according to claim 1, it is characterized in that: described temperature monitoring module is formed primarily of temperature sensor, described temperature sensor is integrated in exposure light source inside.
5. the temperature control system for direct-write type lithography machine exposure light source according to claim 1, it is characterized in that: described Temperature Treatment control module comprises A/D converter, data processing unit and temperature and controls to perform driving port, the input end of described A/D converter connects the output terminal of temperature monitoring module, the input end of the output terminal connection data processing unit of described A/D converter, the output terminal of described data processing unit controls to perform the input end driving port to connect temperature control execution module by temperature;
Described data processing unit, whether the measured value for real-time judge exposure light source internal operating temperature exceeds the permissible error scope of target fiducials value, if do not go beyond the scope, then controlling to perform by temperature drives port control temperature control execution module to quit work, if go beyond the scope and lower than target permission minimum value, then controlling to perform by temperature drives port control temperature control execution module to quit work, if go beyond the scope and higher than target permission maximal value, then control to perform driving port control temperature control execution module by temperature and start working.
6. the temperature control system for direct-write type lithography machine exposure light source according to claim 1, it is characterized in that: described temperature controls execution module and comprises the first heat radiator, the first heat-conducting silicone grease, Peltier effect element, the second heat-conducting silicone grease and the second heat radiator, described first heat radiator, the first heat-conducting silicone grease and Peltier effect sets of elements are formed in exposure light source inside, and described second heat-conducting silicone grease and the second heat radiator are arranged on exposure light source outside; Described first heat radiator connects the refrigeration end of Peltier effect element by the first heat-conducting silicone grease, the radiating end of described Peltier effect element connects the second heat radiator by the second heat-conducting silicone grease, and the current controling end of described Peltier effect element connects the control output end of Temperature Treatment control module.
7. the temperature control system for direct-write type lithography machine exposure light source according to claim 2, is characterized in that: described temperature control status display module comprises state of temperature LED display module and temperature anomaly buzzing alarm module.
8. the temperature control system for direct-write type lithography machine exposure light source according to claim 3, is characterized in that: described temperature control and management module comprises communication module and host computer;
Described communication module, for the exposure light source internal operating temperature data of Temperature Treatment control module Real-time Feedback are sent to host computer, the target fiducials value adjustment signal also for the exposure light source internal operating temperature generated by host computer is sent to Temperature Treatment control module;
Described host computer, for adding up exposure light source internal operating temperature data, forming daily record of work and storing; Also for cannot meet when the normal but exposure light source of exposure light source internal operating temperature exposure require time, sent the target fiducials value adjustment signal of exposure light source internal operating temperature to Temperature Treatment control module by communication module.
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| CN201510634896.3A CN105159036B (en) | 2015-09-30 | 2015-09-30 | Temperature control system used for exposure light source of direct-write photoetching machine |
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| CN201510634896.3A CN105159036B (en) | 2015-09-30 | 2015-09-30 | Temperature control system used for exposure light source of direct-write photoetching machine |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109143790A (en) * | 2018-08-09 | 2019-01-04 | 合肥芯碁微电子装备有限公司 | A kind of control circuit for maskless photoetching machine two waveband UV light source |
| CN111947888A (en) * | 2020-08-24 | 2020-11-17 | 南阳南方智能光电有限公司 | Automatic temperature control tool for optical machine detection and use method |
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| US20100328638A1 (en) * | 2009-06-30 | 2010-12-30 | Hitachi High-Technologies Corporation | Led light source, its manufacturing method, and led-based photolithography apparatus and method |
| CN102203674A (en) * | 2008-09-22 | 2011-09-28 | Asml荷兰有限公司 | Lithographic apparatus, programmable patterning device and lithographic method |
| CN203786463U (en) * | 2014-03-12 | 2014-08-20 | 旺昌机械工业(昆山)有限公司 | Screen exposure machine table |
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| EP1505444A1 (en) * | 2003-07-23 | 2005-02-09 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN102203674A (en) * | 2008-09-22 | 2011-09-28 | Asml荷兰有限公司 | Lithographic apparatus, programmable patterning device and lithographic method |
| US20100328638A1 (en) * | 2009-06-30 | 2010-12-30 | Hitachi High-Technologies Corporation | Led light source, its manufacturing method, and led-based photolithography apparatus and method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109143790A (en) * | 2018-08-09 | 2019-01-04 | 合肥芯碁微电子装备有限公司 | A kind of control circuit for maskless photoetching machine two waveband UV light source |
| CN111947888A (en) * | 2020-08-24 | 2020-11-17 | 南阳南方智能光电有限公司 | Automatic temperature control tool for optical machine detection and use method |
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Address after: 230088 the 11 level of F3 two, two innovation industrial park, No. 2800, innovation Avenue, Hi-tech Zone, Hefei, Anhui. Patentee after: Hefei Xinqi microelectronics equipment Co., Ltd Address before: 230088, Hefei province high tech Zone, 2800 innovation Avenue, 533 innovation industry park, H2 building, room two, Anhui Patentee before: HEFEI XINQI MICROELECTRONIC EQUIPMENT CO., LTD. |