CN105130500A - Deformation control method in rigid heat-insulating tile coating forming process - Google Patents

Deformation control method in rigid heat-insulating tile coating forming process Download PDF

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CN105130500A
CN105130500A CN201510535953.2A CN201510535953A CN105130500A CN 105130500 A CN105130500 A CN 105130500A CN 201510535953 A CN201510535953 A CN 201510535953A CN 105130500 A CN105130500 A CN 105130500A
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rigid heat
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insulating tile
tile
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杨海龙
周洁洁
胡子君
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China Academy of Launch Vehicle Technology CALT
Aerospace Research Institute of Materials and Processing Technology
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Abstract

The invention relates to a deformation control method in a rigid heat-insulating tile coating forming process, belongs to the technical field of a porous ceramic heat-insulating material, and can be used for preparing a heat shielding material of an aircraft such as a space shuttle and the like. The method comprises: applying coating slurry to the surface of a rigid heat-insulating tile ceramic base body which is initially processed to a certain thickness and shape; after drying, putting the coated base body material at a high temperature to be sintered for thermal treatment; after sintering for thermal treatment, taking out the base body material from the high-temperature environment and cooling the base body material to room temperature; and finally carrying out secondary processing to reduce the base body material to the finally required thickness. Compared to a conventional method which directly processes the base body material to the finally required thickness and then carries out coating forming, deformation of the rigid heat-insulating tile in the coating forming process can be effectively controlled.

Description

一种刚性隔热瓦涂层成型过程中的变形控制方法A deformation control method during the forming process of rigid thermal insulation tile coating

技术领域technical field

本发明涉及一种刚性隔热瓦涂层成型过程中的变形控制方法,属于多孔陶瓷隔热材料技术领域,可用于航天飞机等飞行器热防护材料的制备。The invention relates to a deformation control method during the forming process of a rigid heat-insulating tile coating, belongs to the technical field of porous ceramic heat-insulating materials, and can be used in the preparation of heat-protecting materials for aircraft such as space shuttles.

背景技术Background technique

航天飞行器在穿越大气层或在大气层中飞行时将经受严重的气动加热,其表面温度急剧升高,因此必须依靠热防护材料以阻挡热量向内部传递,从而保证内部人员和设备在安全、合理的温度范围之内。例如,航天飞机的研制成功在很大程度上就得益于碳/碳、刚性隔热瓦以及柔性隔热毡等先进可靠的热防护材料。其中,刚性隔热瓦是应用于航天飞机迎风面等部位的重要热防护材料。就其结构组成上来讲,它主要由高孔隙率的陶瓷基体材料和其表面的高辐射涂层构成。服役时,刚性隔热瓦依靠其表面的高辐射涂层将90%以上的热量辐射出去,同时借助基体材料的优异隔热性能阻止其余热量向内部传递。此外,涂层还兼具防水和抗气流冲刷等其他功能。因此,高辐射涂层对于刚性隔热瓦来讲至关重要。Spacecraft will experience severe aerodynamic heating when passing through the atmosphere or flying in the atmosphere, and its surface temperature will rise sharply. Therefore, it is necessary to rely on thermal protection materials to block the transfer of heat to the interior, so as to ensure that the internal personnel and equipment are at a safe and reasonable temperature. within range. For example, the success of the development of the space shuttle is largely due to advanced and reliable thermal protection materials such as carbon/carbon, rigid insulation tiles, and flexible insulation blankets. Among them, the rigid heat insulation tile is an important thermal protection material applied to the windward side of the space shuttle and other parts. In terms of its structural composition, it is mainly composed of a high-porosity ceramic matrix material and a high-radiation coating on its surface. When in service, the rigid thermal insulation tile relies on the high-radiation coating on its surface to radiate more than 90% of the heat, and at the same time prevents the rest of the heat from being transmitted to the inside by virtue of the excellent thermal insulation performance of the base material. In addition, the coating also has other functions such as waterproof and anti-draft. Therefore, high emissivity coatings are essential for rigid insulation tiles.

由于刚性隔热瓦主要应用于航天等军事领域,因此其技术资料具有一定的保密性。从目前已经公开的资料来看,国外关于刚性隔热瓦涂层的文献资料报导主要集中于美国的公开专利和技术报告中。例如,1976年公开的美国专利US3953646“Two—componentceramiccoatingforsilicainsulation”描述的涂层由阻隔层和辐射层组成。其中,阻隔层在基体材料和辐射层之间,防止基体和辐射层之间发生反应,调节涂层与基体之间的热匹配,控制辐射涂层的用量,它由熔融玻璃在927—1371℃下烧结而成;辐射层兼具辐射和防潮功能,它由辐射剂、高硅玻璃和硼硅玻璃(B2O3·SiO2)同样在927—1371℃下烧结而成。与之类似,在1976年公开的另一专利US3955034“Three—componentceramiccoatingforsilicainsulation”中,涂层由阻隔层、辐射层和釉层构成,所不同的是辐射层中不含硼硅玻璃,而釉层则由高硅玻璃和硼硅玻璃烧结而成。与上述两个专利不同的是,1978年公开的专利US4093771“Reactioncuredglassandglasscoatng”中所描述的涂层仅一层,是由玻璃料、金属间或金属化合物(例如四硼化硅、六硼化硅、硼硅化物、硼)等在1000—1400℃下一次烧结形成的复相玻璃,从而避免了因分层多次烧结对基体材料造成的过多收缩和变形影响,并且涂层的稳定性得到了提高。其中,玻璃料由氧化硼和硅含量较高的硼硅玻璃制备而成,还可通过加入玻璃助熔剂以降低烧结温度或调节膨胀系数。与之相比,1983年公开的专利US4381333“Hightemperatureglassthermalcontrolstructureandcoating”中描述的涂层除了使用上述涂层作为辐射层外,在其表面又增加了一层热膨胀系数较辐射层低的散射层,它由热稳定较高的玻璃料(例如熔融玻璃、硅含量较高的硼硅酸玻璃)制备而成。1992年公开的专利US5079082“Tougheneduni—piecefibrousinsulation”中描述的涂层组分与US4093771基本相同,仅增加了二硅化钼辐射剂,并且涂层浸入了部分基体材料内部,使得与基体之间的结合力增强,其防水和抗热震性等得到了进一步改善。由于上述涂层均是以氧化硅作为主要组分,因此最高使用温度被限制在1482—1538℃之间。为了解决上述问题,2001年、2002年和2004年公开的专利US20010051218A1、US6444271B2和US6749942B1“Durablerefractoryceramiccoating”将硅和熔点1650℃以上的难熔金属(钼、钽、铌、钒、铬、钨)作为主要的涂层组分,在982—1427℃的高温下烧结获得硅化物涂层,并且与US5079082类似,涂层也浸入了部分基体材料内部,涂层的熔点和软化点分别达到了1949℃和1593—1649℃。2010年公开的专利US7767305B1“Highefficiencytantalum—basedceramiccompositestructures”中所描述的涂层组分主要为二硅化钽、硼硅玻璃,也可添加二硅化钼等,烧结温度在1220—1315℃之间,耐高温性能达1650℃。Since rigid insulation tiles are mainly used in aerospace and other military fields, their technical information has a certain degree of confidentiality. Judging from the published data at present, foreign literature reports about the coating of rigid heat-insulating tiles are mainly concentrated in the published patents and technical reports of the United States. For example, the coating described in US Patent No. 3,953,646 "Two—component ceramic coating for silica insulation" published in 1976 consists of a barrier layer and a radiation layer. Among them, the barrier layer is between the base material and the radiation layer, preventing the reaction between the base material and the radiation layer, adjusting the thermal matching between the coating and the base, and controlling the amount of the radiation coating. It is made of molten glass at 927-1371°C The radiation layer has both radiation and moisture-proof functions. It is made of radiation agent, high silica glass and borosilicate glass (B 2 O 3 ·SiO 2 ) and is also sintered at 927-1371°C. Similarly, in another patent US3955034 "Three—componentceramiccoatingforsilicainsulation" published in 1976, the coating is composed of a barrier layer, a radiation layer and a glaze layer. The difference is that the radiation layer does not contain borosilicate glass, while the glaze layer is It is sintered from high silica glass and borosilicate glass. Different from the above two patents, the coating described in the patent US4093771 "Reactioncuredglassandglasscoatng" published in 1978 is only one layer, which is made of glass frit, intermetallic or metal compound (such as silicon tetraboride, silicon hexaboride, boron Silicide, boron) and so on are sintered at 1000-1400°C to form a multi-phase glass, thereby avoiding the excessive shrinkage and deformation of the base material caused by layered and multiple sintering, and the stability of the coating is improved. . Among them, the glass frit is made of borosilicate glass with high boron oxide and silicon content, and glass flux can also be added to reduce the sintering temperature or adjust the expansion coefficient. In contrast, the coating described in the patent US4381333 "Hightemperatureglassthermalcontrolstructureandcoating" published in 1983, in addition to using the above-mentioned coating as the radiation layer, added a scattering layer with a lower thermal expansion coefficient than the radiation layer on its surface. It is prepared from glass frit with high stability (such as molten glass, borosilicate glass with high silicon content). The coating composition described in the patent US5079082 "Tougheneduni-piecefibrousinsulation" published in 1992 is basically the same as that of US4093771, only the molybdenum disilicide radiation agent is added, and the coating is immersed in part of the matrix material, so that the bonding force with the matrix Enhanced, its waterproof and thermal shock resistance have been further improved. Since the above-mentioned coatings all use silicon oxide as the main component, the maximum service temperature is limited between 1482-1538°C. In order to solve the above problems, the patents US20010051218A1, US6444271B2 and US6749942B1 "Durablerefractoryceramiccoating" published in 2001, 2002 and 2004 used silicon and refractory metals (molybdenum, tantalum, niobium, vanadium, chromium, tungsten) with a melting point above 1650°C as the main The coating components are sintered at a high temperature of 982-1427°C to obtain a silicide coating, and similar to US5079082, the coating is also immersed in part of the base material, and the melting point and softening point of the coating reach 1949°C and 1593°C respectively. —1649°C. The coating components described in the patent US7767305B1 "Highefficiencytantalum—based ceramic composite structures" published in 2010 are mainly tantalum disilicide, borosilicate glass, and molybdenum disilicide can also be added. up to 1650°C.

国内关于刚性隔热瓦涂层的文献资料则相对较少,中国专利CN101691138B“航天飞机隔热瓦的制备方法”中仅简单提及到了刚性隔热瓦涂层的组分及成型工艺方法。郭金华在其学位论文《隔热瓦表面高发射涂层的制备与性能优化》中,对隔热瓦涂层进行了有意义的探索研究,但其工作主要集中于涂层组分配比及成型工艺等方面,主要关注涂层的发射率和抗热震性等。武勇斌等发表的科技论文《陶瓷隔热瓦表面SiO2—B2O3—MoSi2—SiB4涂层的制备与性能研究》制备了隔热瓦涂层,并对其进行了基本性能的表征。There are relatively few domestic literatures on the coating of rigid heat-insulating tiles. Chinese patent CN101691138B "Preparation method of heat-insulating tiles for space shuttle" only briefly mentions the components and forming process of the coating of rigid heat-insulating tiles. In his dissertation "Preparation and Performance Optimization of High Emissive Coatings on Thermal Insulation Tile Surfaces", Guo Jinhua conducted meaningful exploration and research on thermal insulation tile coatings, but his work mainly focused on the proportion of coating components and forming In terms of technology and other aspects, the main focus is on the emissivity and thermal shock resistance of the coating. The scientific paper "Preparation and Performance Research of SiO 2 —B 2 O 3 —MoSi 2 —SiB 4 Coating on the Surface of Ceramic Heat Insulation Tile" published by Wu Yongbin et al. characterization.

纵观上述公开资料可以知道,刚性隔热瓦涂层成型工艺类似,具体来讲就是:先制备刚性隔热瓦的陶瓷基体材料,而后在其表面涂敷涂层浆料并干燥,最后将其置于高温炉中经高温烧结热处理获得刚性隔热瓦。值得注意的是,刚性隔热瓦涂层制备过程中的烧结温度一般都在1000℃以上,例如,专利US3953646、US3955034明确涂层烧结温度为927—1371℃,专利US4093771规定烧结温度在1000—1400℃之间,专利US20010051218A1、US6444271B2和US6749942B1涂层的烧结温度为982—1427℃,专利US7767305B1的烧结温度在1220—1315℃之间。Looking at the above public information, it can be seen that the coating forming process of rigid thermal insulation tiles is similar. Placed in a high temperature furnace and subjected to high temperature sintering heat treatment to obtain rigid heat insulating tiles. It is worth noting that the sintering temperature in the preparation process of rigid heat insulation tile coating is generally above 1000°C. For example, patents US3953646 and US3955034 specify that the sintering temperature of the coating is 927-1371°C, and patent US4093771 stipulates that the sintering temperature is 1000-1400°C. ℃, the sintering temperature of the patent US20010051218A1, US6444271B2 and US6749942B1 coatings is 982-1427 ℃, and the sintering temperature of the patent US7767305B1 is between 1220-1315 ℃.

一般来说,刚性隔热瓦在涂层的高温烧结过程中会出现收缩和变形,尤其是对于尺寸较大且厚度较小的陶瓷基体材料来讲,情况更加严重。例如专利US4093771在其背景技术中就提到,此前涂层技术所采用的1260℃以上的高温烧结会使得基体材料产生变形,而在其描述的技术中通过加入玻璃助熔剂将烧结温度降低,并且一次烧结成型,基体的变形和收缩有所改善,但并未给出样件的具体尺寸和变形量等数据。除此之外,在公开的专利和文献中均未专门提及刚性隔热瓦在涂层成型过程中的变形问题,更未提及刚性隔热瓦在涂层成型过程中的变形控制方法。但是,由于变形的刚性隔热瓦在后续的装配等工艺环节以及服役过程中均会产生很大的不利影响,因此必须发展其变形的有效控制方法。Generally speaking, rigid thermal insulation tiles will shrink and deform during the high-temperature sintering process of the coating, especially for ceramic matrix materials with large sizes and small thicknesses. For example, the patent US4093771 mentioned in its background technology that the high temperature sintering above 1260 °C used in the previous coating technology will cause deformation of the base material, but in the technology described by it, the sintering temperature is lowered by adding glass flux, and The deformation and shrinkage of the matrix are improved in one-time sintering molding, but the specific size and deformation of the sample are not given. In addition, in the published patents and documents, there is no specific mention of the deformation of the rigid heat insulating tile during the coating forming process, let alone the deformation control method of the rigid heat insulating tile during the coating forming process. However, since the deformed rigid insulation tile will have a great adverse effect in the subsequent assembly process and service process, it is necessary to develop an effective control method for its deformation.

发明内容Contents of the invention

本发明解决的技术问题是:克服现有技术的不足,提供一种刚性隔热瓦涂层成型过程中的变形控制方法,该方法工艺简单,与直接将基体材料加工至最终所需厚度再进行涂层成型的常规方法相比,采用该方法后,刚性隔热瓦在涂层成型过程中的变形可得到有效控制。The technical problem solved by the present invention is to overcome the deficiencies of the prior art and provide a deformation control method during the forming process of the coating of the rigid heat-insulating tile. Compared with the conventional method of coating forming, after adopting this method, the deformation of the rigid heat insulation tile during the coating forming process can be effectively controlled.

本发明的技术方案是:一种刚性隔热瓦涂层成型过程中的变形控制方法,所述刚性隔热瓦为长方体或者平行六面体,包括如下步骤:The technical solution of the present invention is: a deformation control method during the forming process of a coating of a rigid heat insulating tile, wherein the rigid heat insulating tile is a cuboid or a parallelepiped, comprising the following steps:

(1)对刚性隔热瓦陶瓷基体材料毛坯进行初步加工,使其外型为长方体或者平行六面体,刚性隔热瓦陶瓷基体材料毛坯初步加工完毕后的长度和宽度均在100—500mm之间,厚度不小于20mm,且初步加工完毕后的厚度至少较最终所需厚度大5mm;(1) Preliminarily process the blank of the ceramic base material of the rigid heat insulating tile to make it look like a cuboid or a parallelepiped. The thickness is not less than 20mm, and the thickness after preliminary processing is at least 5mm larger than the final required thickness;

(2)在初步加工后的刚性隔热瓦陶瓷基体材料两个面积最大的表面中选择一个表面涂敷配置好的涂层浆料,并干燥;(2) Select one of the two surfaces with the largest area of the rigid heat-insulating tile ceramic matrix material after preliminary processing to coat the configured coating slurry and dry it;

(3)将经过步骤(2)涂敷涂层的基体材料置于高温下进行烧结热处理,烧结热处理完毕后从高温环境中取出冷却至室温;(3) Place the base material coated with the coating in step (2) at a high temperature for sintering heat treatment, and after the sintering heat treatment is completed, take it out from the high temperature environment and cool it to room temperature;

(4)对刚性隔热瓦陶瓷基体材料两个面积最大的表面中未涂敷涂层浆料的表面进行二次加工,将刚性隔热瓦减薄至最终所需的厚度,实现刚性隔热瓦涂层成型过程中的变形控制。(4) Perform secondary processing on the surface of the two largest surfaces of the ceramic base material of the rigid heat insulation tile that is not coated with coating slurry, and thin the rigid heat insulation tile to the final required thickness to achieve rigid heat insulation Deformation control during tile coating forming.

所述步骤(2)中,若对两个面积最大的表面以外的表面涂敷涂层,则在厚度方向的涂敷尺寸比例为最终所需厚度的0—4/5。In the step (2), if the coating is applied to surfaces other than the two surfaces with the largest areas, the coating size ratio in the thickness direction is 0-4/5 of the final required thickness.

所述刚性隔热瓦陶瓷基体材料是由石英纤维、莫来石纤维、氧化铝纤维、硅硼酸铝纤维、氧化锆纤维中的一种或多种为原材料制备而成,所述刚性隔热瓦陶瓷基体材料的密度在0.15—1.00g/cm3之间。The ceramic base material of the rigid heat-insulating tile is prepared from one or more of quartz fibers, mullite fibers, alumina fibers, aluminum silicate borate fibers, and zirconia fibers. The rigid heat-insulating tile The density of the ceramic matrix material is between 0.15-1.00g/cm 3 .

所述步骤(3)中进行烧结热处理的实现方式为:将涂敷涂层的刚性隔热瓦陶瓷基体材料面积最大的表面在高温炉的炉门口进行单面加热或将涂敷涂层的刚性隔热瓦陶瓷基体材料放入高温炉膛中进行整体加热。The implementation of the sintering heat treatment in the step (3) is: heat the surface of the ceramic base material of the rigid heat-insulating tile coated with the coating with the largest area at the furnace door of the high-temperature furnace or heat the rigidity of the coated coating. The ceramic base material of the heat-insulating tile is placed in a high-temperature furnace for overall heating.

所述步骤(3)中进行烧结热处理的温度在800—1400℃之间,烧结热处理时间不少于5min。The temperature of the sintering heat treatment in the step (3) is between 800-1400° C., and the sintering heat treatment time is not less than 5 minutes.

所述步骤(2)中,涂层浆料的涂敷方式为喷涂或刷涂或旋涂,涂敷完成后的干燥方式为自然干燥或在烘箱中干燥,干燥温度为室温—150℃,干燥后涂层浆料的面密度为0.01—0.25g/cm2In the step (2), the coating slurry is applied by spraying, brushing or spin coating, and the drying method after coating is natural drying or drying in an oven, the drying temperature is room temperature - 150 ° C, and the drying The areal density of the post-coating slurry is 0.01-0.25 g/cm 2 .

所述涂层浆料包括固体组分和稀释剂,固体组分和稀释剂的质量比为1:8—8:1;其中固体组分包括硼硅玻璃粉、辐射剂、烧结助剂和稳定剂,稀释剂为去离子水或无水乙醇或去离子水和无水乙醇的混合物。The coating slurry includes a solid component and a diluent, and the mass ratio of the solid component to the diluent is 1:8-8:1; wherein the solid component includes borosilicate glass powder, radiation agent, sintering aid and stabilizer The diluent is deionized water or absolute ethanol or a mixture of deionized water and absolute ethanol.

所述固体组分中硼硅玻璃粉、辐射剂、烧结助剂和稳定剂的质量份数为:硼硅玻璃粉:10—90;辐射剂:0.5—20;烧结助剂:0—50;稳定剂:0—10,且硼硅玻璃粉、辐射剂、烧结助剂和稳定剂的粒度均不小于400目。The mass parts of borosilicate glass powder, radiation agent, sintering aid and stabilizer in the solid component are: borosilicate glass powder: 10-90; radiation agent: 0.5-20; sintering aid: 0-50; Stabilizer: 0-10, and the particle size of borosilicate glass powder, radiation agent, sintering aid and stabilizer is not less than 400 mesh.

与现有技术相比,本发明具有如下有益效果:Compared with the prior art, the present invention has the following beneficial effects:

(1)本发明先采用厚度较大的刚性隔热瓦陶瓷基体材料进行涂层成型,随后再进行二次加工减薄至最终所需的厚度,由于厚度较大的样件对于高温烧结热处理过程中的热应力抵抗较强,因此可将样件的变形初步控制在较小的程度,二次加工后样件的变形也由此得到控制。与直接将陶瓷基体材料加工至最终所需厚度进行涂层成型的常规方法相比,涂层成型过程中的变形可得到有效控制。(1) In the present invention, the ceramic base material of the rigid heat insulating tile with a larger thickness is used for coating molding, and then the secondary processing is performed to reduce the thickness to the final required thickness. The thermal stress resistance in the sample is strong, so the deformation of the sample can be initially controlled to a small degree, and the deformation of the sample after the secondary processing is also controlled. Compared with the conventional method of directly processing the ceramic matrix material to the final desired thickness for coating forming, the deformation during coating forming can be effectively controlled.

(2)本发明将涂敷涂层的刚性隔热瓦陶瓷基体材料面积最大的一面在高温炉的炉门口进行单面加热,使得刚性隔热瓦陶瓷基体材料在涂层烧结过程中的热应力降低,从而相比于整体烧结热处理能够进一步减少变形。(2) In the present invention, the side with the largest area of the coated rigid heat-insulating tile ceramic base material is heated on one side at the furnace door of the high-temperature furnace, so that the thermal stress of the rigid heat-insulating tile ceramic base material in the coating sintering process Reduced, so that the deformation can be further reduced compared with the overall sintering heat treatment.

(3)本发明将刚性隔热瓦陶瓷基体材料毛坯初步加工完毕后的长度和宽度控制在100—500mm之间,既能够将其变形量控制在较小的程度满足装配等使用要求,又能够满足一般情况下对于刚性隔热瓦的使用尺寸要求。(3) The present invention controls the length and width of the blank of the ceramic base material of the rigid heat-insulating tile between 100-500mm after preliminary processing, which can control its deformation to a small degree to meet the requirements for assembly and the like, and can It meets the size requirements for rigid insulation tiles in general.

(4)本发明若对刚性隔热瓦陶瓷基体材料两个面积最大的表面以外的表面涂敷涂层,将其在厚度方向的涂敷尺寸比例限制为最终所需厚度的0—4/5,能够有效避免二次加工对已成型涂层的损伤和破坏,在控制刚性隔热瓦变形量的同时保证了刚性隔热瓦成型后的质量。(4) If the present invention applies a coating to surfaces other than the two surfaces with the largest areas of the rigid heat-insulating tile ceramic base material, its coating size ratio in the thickness direction is limited to 0-4/5 of the final required thickness , can effectively avoid the damage and destruction of the formed coating by secondary processing, and ensure the quality of the rigid heat insulating tile after forming while controlling the deformation of the rigid heat insulating tile.

(5)本发明刚性隔热瓦陶瓷基体材料的密度在0.15—1.00g/cm3之间,变形控制效果明显,同时又不至于造成涂层开裂,在控制刚性隔热瓦变形量的同时保证了刚性隔热瓦成型后的质量。(5) The density of the ceramic base material of the rigid heat-insulating tile of the present invention is between 0.15-1.00g/cm 3 , the effect of deformation control is obvious, and at the same time, the coating will not be cracked, and the deformation of the rigid heat-insulating tile is controlled while ensuring Improve the quality of the rigid insulation tile after molding.

(6)本发明通过控制涂层浆料的组分以及涂敷次数使得干燥后涂层浆料的面密度为0.01—0.25g/cm2,这样的面密度有利于将刚性隔热瓦的变形控制在合理的程度,同时又不至于涂层厚度过小难以满足性能要求或厚度过大导致涂层开裂等。(6) In the present invention, the surface density of the coating slurry after drying is 0.01-0.25g/cm 2 by controlling the composition of the coating slurry and the number of times of coating, which is beneficial to the deformation of the rigid heat insulation tile Control it to a reasonable level, and at the same time, it will not cause the coating thickness to be too small to meet the performance requirements or the coating thickness to be too large to cause cracking.

附图说明Description of drawings

图1为本发明方法流程图;Fig. 1 is a flow chart of the method of the present invention;

图2为刚性隔热瓦涂敷涂层后的示意图,其中,1为上表面涂层,2为侧面涂层;Fig. 2 is a schematic diagram of a rigid thermal insulation tile after being coated with a coating, wherein, 1 is the upper surface coating, and 2 is the side coating;

图3为刚性隔热瓦单面加热烧结过程中的示意图,其中,3为高温炉,4为刚性隔热瓦;Fig. 3 is a schematic diagram of the single-sided heating and sintering process of the rigid heat-insulating tile, wherein, 3 is a high-temperature furnace, and 4 is a rigid heat-insulating tile;

图4为刚性隔热瓦整体加热烧结过程中的示意图,其中,3为高温炉,4为刚性隔热瓦;Fig. 4 is a schematic diagram of the overall heating and sintering process of the rigid heat insulating tile, wherein, 3 is a high temperature furnace, and 4 is a rigid heat insulating tile;

图5为刚性隔热瓦的变形示意图;Fig. 5 is the deformation schematic diagram of rigid heat insulation tile;

图6为刚性隔热瓦变形量测量示意图。Figure 6 is a schematic diagram of the measurement of the deformation of the rigid insulation tile.

具体实施方式Detailed ways

本发明提出了一种刚性隔热瓦涂层成型过程中的变形控制方法,如图1所示,具体步骤如下:The present invention proposes a deformation control method during the forming process of the rigid heat-insulating tile coating, as shown in Figure 1, the specific steps are as follows:

1.刚性隔热瓦陶瓷基体材料毛坯加工1. Rough processing of ceramic base materials for rigid insulation tiles

采用铣床或磨床将刚性隔热瓦陶瓷基体材料毛坯初步加工成为规则的长方体或平行六面体,长度和宽度均在100—500mm之间,厚度不小于20mm。刚性隔热瓦陶瓷基体材料毛坯初步加工完毕后的厚度至少较最终所需厚度大5mm。刚性隔热瓦基体材料是由石英纤维、莫来石纤维、氧化铝纤维、硅硼酸铝纤维、氧化锆纤维中的一种或多种纤维为主要原材料制备而成的刚性隔热材料。刚性隔热瓦陶瓷基体材料的密度在0.15—1.00g/cm3之间。这种密度使得变形控制效果明显,同时又不至于造成涂层开裂。Use a milling machine or a grinding machine to preliminarily process the blank of the ceramic base material of the rigid insulation tile into a regular cuboid or parallelepiped, with a length and width between 100-500mm and a thickness of not less than 20mm. The thickness of the ceramic matrix material blank of the rigid heat-insulating tile after preliminary processing is at least 5mm larger than the final required thickness. Rigid heat insulation tile matrix material is a rigid heat insulation material prepared from one or more fibers of quartz fiber, mullite fiber, alumina fiber, aluminum silicate borate fiber, and zirconia fiber as the main raw material. The density of the ceramic base material of the rigid thermal insulation tile is between 0.15-1.00g/cm 3 . This density allows significant deformation control without cracking the coating.

2.涂层浆料涂敷及干燥2. Coating slurry coating and drying

采用喷涂、刷涂或旋涂等方式将配置好的涂层浆料涂敷于刚性隔热瓦陶瓷基体表面,随后进行自然干燥或放入烘箱干燥。涂敷次数为1次或1次以上。其中涂层浆料包括固体组分和稀释剂,固体组分和稀释剂的质量比为1:8—8:1,固体组分包括硼硅玻璃粉、辐射剂、烧结助剂和稳定剂,稀释剂为去离子水或无水乙醇或去离子水和无水乙醇的混合物。Apply the prepared coating slurry on the surface of the ceramic substrate of the rigid thermal insulation tile by spraying, brushing or spin coating, and then dry naturally or in an oven. The number of times of application is 1 time or more. The coating slurry includes a solid component and a diluent, the mass ratio of the solid component to the diluent is 1:8-8:1, and the solid component includes borosilicate glass powder, radiation agent, sintering aid and stabilizer, The diluent is deionized water or absolute ethanol or a mixture of deionized water and absolute ethanol.

涂层浆料配置方法为:利用机械搅拌或球磨,将硼硅玻璃粉、辐射剂、烧结助剂、稳定剂以及稀释剂混匀,混匀时间不少于30min。其中硼硅玻璃粉、辐射剂、烧结助剂和稳定剂的质量份数为:硼硅玻璃粉:10—90;辐射剂:0.5—20;烧结助剂:0—50;稳定剂:0—10。且硼硅玻璃粉、辐射剂、烧结助剂和稳定剂的粒度均不小于400目。硼硅玻璃粉由氧化硅、氧化硼、氧化铝和杂质组成,质量百分比为:氧化硅65—97%,氧化硼2—30%,氧化铝1—5%,其余为杂质。辐射剂为二硅化钼,碳化硅,氧化铬,氧化镍,氧化钴,镍铬尖晶石,氮化硅,四硼化硅,六硼化硅,二硅化钽、硼化锆,铁、铬、钴的烧结物中的一种或几种的混合物。烧结助剂为碳化硼、氮化硼、氧化硼、四硼化硅、六硼化硅中的一种或几种的混合物。稳定剂为粘土或甲基纤维素或两者的混合物。The coating slurry configuration method is: use mechanical stirring or ball milling to mix borosilicate glass powder, radiation agent, sintering aid, stabilizer and thinner, and the mixing time is not less than 30 minutes. The mass parts of borosilicate glass powder, radiation agent, sintering aid and stabilizer are: borosilicate glass powder: 10-90; radiation agent: 0.5-20; sintering aid: 0-50; stabilizer: 0-50 10. And the particle size of borosilicate glass powder, radiation agent, sintering aid and stabilizer is not less than 400 mesh. Borosilicate glass powder is composed of silicon oxide, boron oxide, aluminum oxide and impurities. The mass percentage is: silicon oxide 65-97%, boron oxide 2-30%, aluminum oxide 1-5%, and the rest are impurities. The radiation agent is molybdenum disilicide, silicon carbide, chromium oxide, nickel oxide, cobalt oxide, nickel-chromium spinel, silicon nitride, silicon tetraboride, silicon hexaboride, tantalum disilicide, zirconium boride, iron, chromium , Cobalt sinter or a mixture of several. The sintering aid is one or a mixture of boron carbide, boron nitride, boron oxide, silicon tetraboride, and silicon hexaboride. The stabilizer is clay or methyl cellulose or a mixture of both.

刚性隔热瓦陶瓷基体材料涂敷涂层的表面在1—5个之间。设刚性隔热瓦陶瓷基体材料的上下表面为面积最大的面,侧面为面积相对较小的面。如图2所示,刚性隔热瓦陶瓷基体材料涂敷涂层的表面至少有1个面为面积最大的面(如上表面),其余为侧面。当在刚性隔热瓦陶瓷基体材料的侧面涂敷涂层时,在厚度方向的涂敷尺寸比例为最终所需厚度的0—4/5之间。其中图2中1为上表面涂层,2为侧面涂层。The surface of the rigid heat-insulating tile ceramic base material coated with the coating is between 1 and 5. It is assumed that the upper and lower surfaces of the ceramic base material of the rigid heat-insulating tile are the surfaces with the largest area, and the side surfaces are the surfaces with relatively small areas. As shown in Figure 2, at least one surface of the surface coated with the ceramic matrix material of the rigid heat insulation tile is the surface with the largest area (such as the upper surface), and the rest are the sides. When the coating is applied on the side of the ceramic base material of the rigid thermal insulation tile, the coating size ratio in the thickness direction is between 0-4/5 of the final required thickness. Among them, 1 in Fig. 2 is the upper surface coating, and 2 is the side coating.

刚性隔热瓦涂敷涂层浆料的干燥温度为室温—150℃。干燥时间不少于30min。刚性隔热瓦涂层浆料干燥后面密度为0.01—0.25g/cm2The drying temperature of the coating slurry for rigid heat insulation tiles is room temperature - 150°C. The drying time is not less than 30min. The density of the rigid thermal insulation tile coating slurry after drying is 0.01-0.25g/cm 2 .

3.涂层烧结热处理3. Coating sintering heat treatment

将干燥完毕的涂敷涂层的刚性隔热瓦上表面面对高温烧结炉的炉门口(如图3所示)或整体放入高温炉膛中(如图4所示)进行一定时间的高温烧结热处理,随后取出自然冷却至室温。高温烧结热处理的温度在800—1400℃之间。高温烧结热处理时间不少于5min。Place the upper surface of the dried coated rigid insulation tile facing the furnace door of the high-temperature sintering furnace (as shown in Figure 3) or put it into the high-temperature furnace as a whole (as shown in Figure 4) for high-temperature sintering for a certain period of time Heat treatment, then take out and cool to room temperature naturally. The temperature of high temperature sintering heat treatment is between 800-1400°C. The high temperature sintering heat treatment time is not less than 5min.

4.已成型涂层的刚性隔热瓦加工4. Rigid insulation tile processing with formed coating

采用铣床或磨床对已成型涂层的刚性隔热瓦未涂敷涂层的面积最大的表面(如果在上表面涂敷涂层,则在下表面)进行二次加工减薄至最终所需厚度。The uncoated surface of the formed coated rigid thermal insulation tile with the largest area (or the lower surface if the coating is applied on the upper surface) is thinned to the final required thickness by milling or grinding.

本发明还提出一种刚性隔热瓦的变形量测量方法,如图5和图6所示,利用游标卡尺1和2分别测试EG(长宽方向1)、FH(长宽方向2)、AC(对角线方向1)和BD(对角线方向2)方向的变形量(见图5)。其中,E、F、G、H分别为AB、BC、CD和DA四条楞的中心点,O为刚性隔热瓦涂层面的中心点。以EG方向变形测量为例(见图6),将游标卡尺1置于刚性隔热瓦涂层面,采用游标卡尺2分别测量E、O和G三处距离游标卡尺1上端的距离hEE’,hOO’和hGG’,则长宽方向1的最大变形量(以下简称“变形量”)为hOO’-(hEE’+hGG’)/2。FH方向、AC方向、BD方向与EG方向测量方法相同,分别得到长宽方向2、对角线方向1、对角线方向2的最大变形量。长宽方向和对角线方向的平均最大变形量(以下简称“平均变形量”)均为其方向1和2的变形量平均值。其中游标卡尺1和2的测量精度均为0.02mm。The present invention also proposes a method for measuring the deformation of rigid heat-insulating tiles. As shown in Figure 5 and Figure 6, the vernier calipers 1 and 2 are used to test EG (length and width direction 1), FH (length and width direction 2), AC ( The amount of deformation in the diagonal direction 1) and the BD (diagonal direction 2) direction (see Figure 5). Among them, E, F, G, H are the center points of AB, BC, CD and DA respectively, and O is the center point of the coating surface of the rigid heat insulation tile. Taking the deformation measurement in the EG direction as an example (see Figure 6), place the vernier caliper 1 on the coating surface of the rigid heat-insulating tile, and use the vernier caliper 2 to measure the distances h EE ', h OO from the upper end of the vernier caliper 1 at E, O and G respectively ' and h GG ', then the maximum deformation in the length and width direction 1 (hereinafter referred to as "deformation") is h OO '-(h EE '+h GG ')/2. The FH direction, AC direction, and BD direction are measured in the same way as the EG direction, and the maximum deformation in the length and width direction 2, the diagonal direction 1, and the diagonal direction 2 are respectively obtained. The average maximum deformation in the length-width direction and diagonal direction (hereinafter referred to as "average deformation") is the average value of the deformation in directions 1 and 2. The measurement accuracy of vernier calipers 1 and 2 are both 0.02mm.

本发明的测量方法定量地表征了产品的变形量。The measurement method of the present invention quantitatively characterizes the deformation of the product.

实施例1:Example 1:

样件的厚度要求为10mm,高温烧结热处理采用整体烧结热处理方式。The thickness of the sample is required to be 10mm, and the high-temperature sintering heat treatment adopts the overall sintering heat treatment method.

刚性隔热瓦陶瓷基体材料采用80%的氧化纤维和20%的莫来石纤维的混合纤维制备而成,密度为0.33g/cm3,初步加工成为200×200×20mm的样件,涂层浆料中各组分的质量比为:硼硅玻璃粉:氧化硼:二硅化钽:粘土:水=60:30:8:2:500,采用球磨机混合3h,经涂层涂敷在基体材料的上表面(上下表面面积最大)和侧面,且侧面涂敷6mm,喷涂并干燥后获得的涂层面密度为0.025g/cm2,在高温炉膛中1150℃进行整体烧结热处理15min,冷却至室温后,采用铣床将已成型涂层的刚性隔热瓦加工至厚度10mm。按照上述方法制成六件产品,利用本发明的变形量测量方法,取六件产品进行变形量测定,并计算六件产品长宽方向和对角线方向的平均变形量的平均值,分别为188μm和343μm。与之相比,直接将基体材料加工至最终所需厚度再进行涂层成型,六件产品长宽方向和对角线方向的平均变形量的平均值分别为360μm和623μm。The ceramic base material of the rigid thermal insulation tile is prepared from a mixed fiber of 80% oxidized fiber and 20% mullite fiber, with a density of 0.33g/cm 3 , and it is preliminarily processed into a sample of 200×200×20mm, coated The mass ratio of each component in the slurry is: borosilicate glass powder: boron oxide: tantalum disilicide: clay: water = 60:30:8:2:500, mixed with a ball mill for 3 hours, and coated on the base material after coating The upper surface (the upper and lower surface area is the largest) and the side, and the side is coated with 6mm, the surface density of the coating obtained after spraying and drying is 0.025g/cm 2 , and the overall sintering heat treatment is carried out in a high-temperature furnace at 1150°C for 15min, and cooled to room temperature Finally, use a milling machine to process the formed coated rigid insulation tile to a thickness of 10mm. Make six products according to the above-mentioned method, utilize deformation measurement method of the present invention, get six products and carry out deformation measurement, and calculate the average value of the average deformation of six product length and width directions and diagonal direction, respectively 188 μm and 343 μm. In contrast, when the base material is directly processed to the final required thickness and then coated, the average deformation of the six products in the length and width direction and the diagonal direction is 360 μm and 623 μm, respectively.

实施例2:Example 2:

样件的厚度要求为15mm,高温烧结热处理采用整体烧结热处理方式。The thickness of the sample is required to be 15mm, and the high-temperature sintering heat treatment adopts the overall sintering heat treatment method.

刚性隔热瓦陶瓷基体材料采用80%的氧化纤维和20%的莫来石纤维的混合纤维制备而成,密度为0.33g/cm3,加工成为200×200×20mm的样件,涂层浆料中的各组分的质量比为:硼硅玻璃粉:氧化硼:二硅化钽:粘土:水=60:30:8:2:500,采用球磨机混合3h,经涂层涂敷在基体材料的上表面(上下表面面积最大)和侧面,且侧面涂敷10mm,喷涂并干燥后获得的涂层面密度为0.025g/cm2,在高温炉膛中1150℃进行整体烧结热处理15min,冷却至室温后,采用铣床最终加工至厚度15mm。按照上述方法制成六件产品,利用本发明的变形量测量方法,取六件产品进行变形量测定,并计算六件产品长宽方向和对角线方向的平均变形量的平均值,分别为178μm和256μm。与之相比,直接将基体材料加工至最终所需厚度再进行涂层成型,六件产品长宽方向和对角线方向的平均变形量的平均值分别为197μm和338μm。The ceramic base material of the rigid thermal insulation tile is prepared from a mixed fiber of 80% oxidized fiber and 20% mullite fiber, with a density of 0.33g/cm 3 , processed into a sample of 200×200×20mm, coated with slurry The mass ratio of each component in the material is: borosilicate glass powder: boron oxide: tantalum disilicide: clay: water = 60:30:8:2:500, mixed with a ball mill for 3 hours, and coated on the base material The upper surface (the upper and lower surface area is the largest) and the side, and the side is coated with 10mm, the surface density of the coating obtained after spraying and drying is 0.025g/cm 2 , and the overall sintering heat treatment is carried out in a high-temperature furnace at 1150°C for 15min, and cooled to room temperature Finally, it is finally machined to a thickness of 15mm using a milling machine. Make six products according to the above-mentioned method, utilize deformation measurement method of the present invention, get six products and carry out deformation measurement, and calculate the average value of the average deformation of six product length and width directions and diagonal direction, respectively 178 μm and 256 μm. In contrast, when the base material is directly processed to the final required thickness and then coated, the average deformation of the six products in the length and width direction and the diagonal direction is 197 μm and 338 μm, respectively.

实施例3:Example 3:

样件的厚度要求为10mm,高温烧结热处理采用单面加热处理方式。The thickness of the sample is required to be 10mm, and the high-temperature sintering heat treatment adopts a single-side heat treatment method.

刚性隔热瓦陶瓷基体材料采用80%的氧化纤维和20%的莫来石纤维的混合纤维制备而成,密度为0.33g/cm3,加工成为200×200×20mm的样件,涂层浆料中的各组分的质量比为:硼硅玻璃粉:氧化硼:二硅化钽:粘土:水=60:30:8:2:500,采用球磨机混合3h,经涂层涂敷在基体材料的上表面(上下表面面积最大)和侧面,且侧面涂敷6mm,喷涂并干燥后获得的涂层面密度为0.025g/cm2,将上表面在高温炉门口1150℃烧结热处理15min,冷却至室温后,采用铣床最终加工至厚度10mm。按照上述方法制成六件产品,利用本发明的变形量测量方法,取六件产品进行变形量测定,并计算六件产品长宽方向和对角线方向的平均变形量的平均值,分别为157μm和303μm。与之相比,直接将基体材料加工至最终所需厚度再进行整体烧结热处理成型涂层,六件产品长宽方向和对角线方向的平均变形量的平均值分别为360μm和623μm。The ceramic base material of the rigid thermal insulation tile is prepared from a mixed fiber of 80% oxidized fiber and 20% mullite fiber, with a density of 0.33g/cm 3 , processed into a sample of 200×200×20mm, coated with slurry The mass ratio of each component in the material is: borosilicate glass powder: boron oxide: tantalum disilicide: clay: water = 60:30:8:2:500, mixed with a ball mill for 3 hours, and coated on the base material The upper surface (the upper and lower surface area is the largest) and the side, and the side is coated with 6mm. After spraying and drying, the surface density of the coating obtained is 0.025g/cm 2 . After room temperature, use a milling machine for final processing to a thickness of 10mm. Make six products according to the above-mentioned method, utilize deformation measurement method of the present invention, get six products and carry out deformation measurement, and calculate the average value of the average deformation of six product length and width directions and diagonal direction, respectively 157 μm and 303 μm. In contrast, the base material is directly processed to the final required thickness and then integrally sintered and heat-treated to form the coating. The average deformations of the six products in the length, width and diagonal directions are 360 μm and 623 μm, respectively.

从上述实施例可以看出,采用本发明的方法,与直接将陶瓷基体材料加工至最终所需厚度进行涂层成型的常规方法相比,涂层成型过程中的变形可得到有效控制。且通过实施例1和3的对比可以看出,单面加热相比于整体烧结热处理能够进一步减少变形。It can be seen from the above examples that, with the method of the present invention, compared with the conventional method of directly processing the ceramic base material to the final desired thickness for coating forming, the deformation during coating forming can be effectively controlled. And it can be seen from the comparison of Examples 1 and 3 that the single-side heating can further reduce the deformation compared with the overall sintering heat treatment.

本发明未详细说明部分属本领域技术人员公知常识。Parts not described in detail in the present invention belong to the common knowledge of those skilled in the art.

Claims (8)

1.一种刚性隔热瓦涂层成型过程中的变形控制方法,所述刚性隔热瓦为长方体或者平行六面体,其特征在于包括如下步骤:1. A deformation control method in the coating forming process of a rigid heat-insulating tile, wherein the rigid heat-insulating tile is a cuboid or a parallelepiped, and is characterized in that it comprises the steps: (1)对刚性隔热瓦陶瓷基体材料毛坯进行初步加工,使其外型为长方体或者平行六面体,刚性隔热瓦陶瓷基体材料毛坯初步加工完毕后的长度和宽度均在100—500mm之间,厚度不小于20mm,且初步加工完毕后的厚度至少较最终所需厚度大5mm;(1) Preliminarily process the blank of the ceramic base material of the rigid heat insulating tile to make it look like a cuboid or a parallelepiped. The thickness is not less than 20mm, and the thickness after preliminary processing is at least 5mm larger than the final required thickness; (2)在初步加工后的刚性隔热瓦陶瓷基体材料两个面积最大的表面中选择一个表面涂敷配置好的涂层浆料,并干燥;(2) Select one of the two surfaces with the largest area of the rigid heat-insulating tile ceramic matrix material after preliminary processing to coat the configured coating slurry and dry it; (3)将经过步骤(2)涂敷涂层的基体材料置于高温下进行烧结热处理,烧结热处理完毕后从高温环境中取出冷却至室温;(3) Place the base material coated with the coating in step (2) at a high temperature for sintering heat treatment, and after the sintering heat treatment is completed, take it out from the high temperature environment and cool it to room temperature; (4)对刚性隔热瓦陶瓷基体材料两个面积最大的表面中未涂敷涂层浆料的表面进行二次加工,将刚性隔热瓦减薄至最终所需的厚度,实现刚性隔热瓦涂层成型过程中的变形控制。(4) Perform secondary processing on the surface of the two largest surfaces of the ceramic base material of the rigid heat insulation tile that is not coated with coating slurry, and thin the rigid heat insulation tile to the final required thickness to achieve rigid heat insulation Deformation control during tile coating forming. 2.根据权利要求1所述的一种刚性隔热瓦涂层成型过程中的变形控制方法,其特征在于:所述步骤(2)中,若对两个面积最大的表面以外的表面涂敷涂层,则在厚度方向的涂敷尺寸比例为最终所需厚度的0—4/5。2. A deformation control method during the forming process of a rigid heat-insulating tile coating according to claim 1, characterized in that: in the step (2), if the surface other than the two surfaces with the largest area is coated with coating, the coating size ratio in the thickness direction is 0-4/5 of the final required thickness. 3.根据权利要求1所述的一种刚性隔热瓦涂层成型过程中的变形控制方法,其特征在于:所述刚性隔热瓦陶瓷基体材料是由石英纤维、莫来石纤维、氧化铝纤维、硅硼酸铝纤维、氧化锆纤维中的一种或多种为原材料制备而成,所述刚性隔热瓦陶瓷基体材料的密度在0.15—1.00g/cm3之间。3. The deformation control method during the forming process of a rigid heat-insulating tile coating according to claim 1, characterized in that: said rigid heat-insulating tile ceramic base material is made of quartz fiber, mullite fiber, alumina One or more of fibers, aluminum borate fibers, and zirconia fibers are prepared as raw materials, and the density of the rigid heat-insulating tile ceramic matrix material is between 0.15 and 1.00 g/cm 3 . 4.根据权利要求1所述的一种刚性隔热瓦涂层成型过程中的变形控制方法,其特征在于:所述步骤(3)中进行烧结热处理的实现方式为:将涂敷涂层的刚性隔热瓦陶瓷基体材料面积最大的表面在高温炉的炉门口进行单面加热或将涂敷涂层的刚性隔热瓦陶瓷基体材料放入高温炉膛中进行整体加热。4. A deformation control method during the forming process of a rigid heat-insulating tile coating according to claim 1, characterized in that: the implementation of sintering heat treatment in the step (3) is: apply the coating The surface of the rigid heat insulating tile ceramic base material with the largest area is heated on one side at the furnace door of the high temperature furnace or the coated rigid heat insulating tile ceramic base material is placed in the high temperature furnace for overall heating. 5.根据权利要求1所述的一种刚性隔热瓦涂层成型过程中的变形控制方法,其特征在于:所述步骤(3)中进行烧结热处理的温度在800—1400℃之间,烧结热处理时间不少于5min。5. A deformation control method during the forming process of a rigid heat-insulating tile coating according to claim 1, characterized in that: the temperature of the sintering heat treatment in the step (3) is between 800-1400°C, and the sintering The heat treatment time is not less than 5min. 6.根据权利要求1所述的一种刚性隔热瓦涂层成型过程中的变形控制方法,其特征在于:所述步骤(2)中,涂层浆料的涂敷方式为喷涂或刷涂或旋涂,涂敷完成后的干燥方式为自然干燥或在烘箱中干燥,干燥温度为室温—150℃,干燥后涂层浆料的面密度为0.01—0.25g/cm26. A deformation control method during the coating forming process of rigid heat-insulating tiles according to claim 1, characterized in that: in the step (2), the coating slurry is applied by spraying or brushing Or spin coating, the drying method after coating is natural drying or drying in an oven, the drying temperature is room temperature-150°C, and the surface density of the coating slurry after drying is 0.01-0.25g/cm 2 . 7.根据权利要求6所述的一种刚性隔热瓦涂层成型过程中的变形控制方法,其特征在于:所述涂层浆料包括固体组分和稀释剂,固体组分和稀释剂的质量比为1:8—8:1;其中固体组分包括硼硅玻璃粉、辐射剂、烧结助剂和稳定剂,稀释剂为去离子水或无水乙醇或去离子水和无水乙醇的混合物。7. The deformation control method during the forming process of a rigid heat-insulating tile coating according to claim 6, characterized in that: the coating slurry comprises solid components and diluents, and the mixture of solid components and diluents The mass ratio is 1:8—8:1; the solid components include borosilicate glass powder, radiation agent, sintering aid and stabilizer, and the diluent is deionized water or absolute ethanol or deionized water and absolute ethanol mixture. 8.根据权利要求7所述的一种刚性隔热瓦涂层成型过程中的变形控制方法,其特征在于:所述固体组分中硼硅玻璃粉、辐射剂、烧结助剂和稳定剂的质量份数为:硼硅玻璃粉:10—90;辐射剂:0.5—20;烧结助剂:0—50;稳定剂:0—10,且硼硅玻璃粉、辐射剂、烧结助剂和稳定剂的粒度均不小于400目。8. The deformation control method during the forming process of a rigid heat-insulating tile coating according to claim 7, characterized in that: the proportion of borosilicate glass powder, radiation agent, sintering aid and stabilizer in the solid component The mass parts are: borosilicate glass powder: 10-90; radiation agent: 0.5-20; sintering aid: 0-50; stabilizer: 0-10, and borosilicate glass powder, radiation agent, sintering aid and stabilizer The particle size of the agent is not less than 400 mesh.
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CN107266086A (en) * 2017-06-13 2017-10-20 长兴华悦耐火材料厂 A kind of steel fiber refractories
CN107500789A (en) * 2017-08-24 2017-12-22 浙江科屹耐火材料有限公司 A kind of mullite pouring material and preparation method thereof
CN107603286A (en) * 2017-09-11 2018-01-19 山东工业陶瓷研究设计院有限公司 Rigid thermal insulation tile coating of unburned 1500 DEG C of heatproof and preparation method thereof
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CN114517022A (en) * 2022-01-27 2022-05-20 上海联净电子科技有限公司 Wear-resistant anti-adhesion coating and preparation method and application thereof
CN116444297A (en) * 2023-06-12 2023-07-18 烟台奥森制动材料有限公司 Refining process of silicon-carbon composite brake disc
CN116444297B (en) * 2023-06-12 2023-08-25 烟台奥森制动材料有限公司 Refining Process of Silicon-Carbon Composite Brake Disc

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