CN105068382A - Pneumatic door of write-through exposure machine - Google Patents
Pneumatic door of write-through exposure machine Download PDFInfo
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- CN105068382A CN105068382A CN201510457267.8A CN201510457267A CN105068382A CN 105068382 A CN105068382 A CN 105068382A CN 201510457267 A CN201510457267 A CN 201510457267A CN 105068382 A CN105068382 A CN 105068382A
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- door
- cylinder
- closed
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- write
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Abstract
The invention discloses a pneumatic door of a write-through exposure machine. According to the working principle, a left door and a right door move left and right along a linear guide rail under the action of an air cylinder, so that opening and closing of the pneumatic door are realized; when pistons of the air cylinder move to certain positions, a magnetic switch is triggered and sends out a signal, and meanwhile, the pneumatic door touches a buffer block and slows down until stopping moving. When the left door and the right door are in an open state, through electromagnetic valve control, the pistons are pushed to be close to the middle when compressed air enters the air cylinder, so that the left door and the right door are closed. When the left door and the right door are in a closed state, through electromagnetic valve control, the pistons are pushed to move towards the opposite directions at two sides when the compressed air enters the air cylinder, so that the left door and the right door are opened. When only the door at one side needs to be opened and the door at the other side is closed, through electromagnetic valve control, the piston at the left side is pushed to be close to the middle when the compressed air enters the air cylinder, so that the left door is closed, namely opening and closing of the left door and the right door can be simultaneously controlled; and opening and closing of the left door and the right door can also be separately controlled.
Description
Technical field
The present invention relates to a kind of exposure system, specifically the vertical double-sided exposure system of a kind of laser direct-writing, belongs to direct-write type lithography machine rapid scanning exposure technique field.
Background technology
Write-through photoetching technique be development in recent years faster, to substitute the direct transfer techniques of image of the traditional board-like photoetching technique of mask, in semiconductor and PCB production field, have more and more consequence.Utilize this technology can shortened process, and reduce production cost.The direct-write type lithography machine of main flow carries out scan exposure mainly with single work stage mode greatly in the market, after first having been exposed in the A face being exposed workpiece, then carries out reprint, then exposes B face.In single workpiece table system, carry out successively for the upper plate of the substrate that exposes, aligning, exposure, lower plate.According to current structural system, each operating process has all reached the upper limit consuming time, is difficult to the running time shortening certain operation steps again, and namely the direct-write type lithography machine of single work stage is due to the serial nature of each operating process, has been difficult to improve production capacity again.
Summary of the invention
For above-mentioned prior art Problems existing, the invention provides the vertical double-sided exposure system of a kind of laser direct-writing, can production capacity be improved, greatly improve the efficiency of work.
To achieve these goals, the vertical double-sided exposure system of a kind of laser direct-writing that the present invention adopts, described system comprises pedestal and is exposed workpiece, it is characterized in that, describedly be exposed the top that workpiece is vertically positioned over pedestal, described in be exposed workpiece one end be connected with base runner; Be respectively equipped with in the described both sides being exposed workpiece and move left light path and to move right light path, described in move left light path and move right light path respectively with to be exposed workpiece vertical.
The described workpiece that is exposed is when moving along Y-direction, described in move left light path and the light path that moves right moves along Z-direction respectively.
Described exposure system can expose the two sides being exposed workpiece simultaneously.
The described workpiece that is exposed comprises pcb board and silicon chip.
Compared with prior art, vertically be positioned over the top of pedestal by being exposed workpiece and can moving along Y direction in the present invention, now, be arranged on the mobile light path being exposed workpiece both sides to move along Z-direction respectively, the tow sides being exposed workpiece can be exposed so simultaneously, make the improved efficiency one times of work, better improve production capacity, add the efficiency of work.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention.
Wherein: 1, be exposed workpiece, 2, move right light path, 3, pedestal, 4, light path is moved left.
Embodiment
Below in conjunction with accompanying drawing, the invention will be further described.
As shown in Figure 1, the vertical double-sided exposure system of a kind of laser direct-writing, described system comprises pedestal 3 and is exposed workpiece 1, described in be exposed the top that workpiece 1 is vertically positioned over pedestal 3, described in be exposed workpiece 1 one end be flexibly connected with pedestal 3; Be respectively equipped with in the described both sides being exposed workpiece 1 and move left light path 4 and the light path 2 that moves right, described in move left light path 4 and move right light path 2 respectively with to be exposed workpiece vertical.Wherein, described in be exposed workpiece when moving along Y-direction, described in move left light path 4 and the light path 2 that moves right moves along Z-direction respectively.Described exposure system can expose the tow sides being exposed workpiece 1 simultaneously.The described workpiece 1 that is exposed comprises pcb board and silicon chip.
During work, will workpiece 1 will be exposed vertically be positioned over the top of pedestal 3, and be exposed workpiece 1 and move along Y direction, and move left the pros and cons that light path 4 and the light path 2 that moves right move being exposed workpiece 1 along Z-direction respectively and scan.
Last it is noted that the foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, although with reference to previous embodiment to invention has been detailed description, for a person skilled in the art, it still can be modified to technical scheme described in previous embodiment, or carries out equivalent replacement.In all spirit in invention and principle, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (2)
1. the pneumatic door of a write-through exposure machine, comprise doorframe, left-hand door, You Men, line slideway, cylinder, cylinder connection piece, buffer stopper, it is characterized in that, doorframe is equipped with line slideway, optoelectronic switch and buffer stopper, left-hand door, right door are fixed by cylinder connection piece and cylinder, cylinder is screwed on doorframe, is connected to the control system of cylinder assembly; The pneumatic door of write-through exposure machine mainly relies on cylinder moving; When left-hand door, You Men are in door opening state, by solenoid control, promote piston draw close to centre when pressurized air enters in cylinder, left-hand door, right door are closed; When left-hand door, You Men are in closed condition, by solenoid control, promote piston to the motion of both sides reverse direction when pressurized air enters in cylinder, left-hand door, right door are opened; When only opening a side door, another side door is when closing, and by solenoid control, promotes left hand piston and draws close to centre, offside door is closed when pressurized air enters in cylinder.
2. the pneumatic door of a kind of write-through exposure machine according to claim 1, it is characterized in that: control system comprises singlechip controller, this singlechip controller is connected to sensing device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201510457267.8A CN105068382A (en) | 2015-07-30 | 2015-07-30 | Pneumatic door of write-through exposure machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510457267.8A CN105068382A (en) | 2015-07-30 | 2015-07-30 | Pneumatic door of write-through exposure machine |
Publications (1)
Publication Number | Publication Date |
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CN105068382A true CN105068382A (en) | 2015-11-18 |
Family
ID=54497781
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201510457267.8A Pending CN105068382A (en) | 2015-07-30 | 2015-07-30 | Pneumatic door of write-through exposure machine |
Country Status (1)
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CN (1) | CN105068382A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109358474A (en) * | 2018-11-26 | 2019-02-19 | 合肥芯碁微电子装备有限公司 | A kind of control device and control method for laser direct-writing exposure machine pneumatic door |
CN111308863A (en) * | 2020-02-06 | 2020-06-19 | 合肥芯碁微电子装备股份有限公司 | Double-table exposure machine and method for controlling opening and closing of door of double-table exposure machine |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101256363A (en) * | 2007-12-28 | 2008-09-03 | 上海微电子装备有限公司 | Pneumatic vacuum control system for silicon slice bench |
CN103092007A (en) * | 2013-02-06 | 2013-05-08 | 京东方科技集团股份有限公司 | Mask plate installing device of exposure machine |
CN203822036U (en) * | 2014-04-25 | 2014-09-10 | 上海真正数控机床有限公司 | Pneumatic door |
-
2015
- 2015-07-30 CN CN201510457267.8A patent/CN105068382A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101256363A (en) * | 2007-12-28 | 2008-09-03 | 上海微电子装备有限公司 | Pneumatic vacuum control system for silicon slice bench |
CN103092007A (en) * | 2013-02-06 | 2013-05-08 | 京东方科技集团股份有限公司 | Mask plate installing device of exposure machine |
CN203822036U (en) * | 2014-04-25 | 2014-09-10 | 上海真正数控机床有限公司 | Pneumatic door |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109358474A (en) * | 2018-11-26 | 2019-02-19 | 合肥芯碁微电子装备有限公司 | A kind of control device and control method for laser direct-writing exposure machine pneumatic door |
CN111308863A (en) * | 2020-02-06 | 2020-06-19 | 合肥芯碁微电子装备股份有限公司 | Double-table exposure machine and method for controlling opening and closing of door of double-table exposure machine |
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Application publication date: 20151118 |
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RJ01 | Rejection of invention patent application after publication |