CN105068167A - Grating preparation method - Google Patents
Grating preparation method Download PDFInfo
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- CN105068167A CN105068167A CN201510493965.3A CN201510493965A CN105068167A CN 105068167 A CN105068167 A CN 105068167A CN 201510493965 A CN201510493965 A CN 201510493965A CN 105068167 A CN105068167 A CN 105068167A
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- grating
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Abstract
The invention discloses a grating preparation method. The preparation method comprises steps of (1) preparing a grating raw sheet; (2) arranging L grooves whose width d is no less than d0 and depth is no less than h0 on the grating raw sheet to form a grating blank; (3) electroforming the grating blank; and (4) polishing the electroformed grating blank after the step (3) to form a grating, wherein the d0 is the groove width of the grating and the h0 is the groove depth of the grating. In this way, limits on minimum processing width of a processing device can be broken and the grating with larger depth and width and a smooth and steep side face can be made.
Description
Technical field
The present invention relates to a kind of preparation method of grating.
Background technology
Combed grating can be used as the rejection filter in the slow-wave structure of vacuum electron device, microwave technology and is widely used.Due to the property spent together of the electromagnetic wavelength and device-structure dimensions that work in basic mode, along with the raising of device operating frequencies, the phase constant of required grating is less, and this just proposes harsh requirement to part processing.Meanwhile, in order to alleviate high frequency skin effect, require that the grating of processing must have good surface smoothness.In order to prepare high-accuracy combed grating, people have to select the lathe that processing yardstick is less, and the price of high precision machining tool is very expensive, virtually adds the cost of grating part processing.And, when utilizing this pure mechanical means processing this minor cycle structure fringe of preparation, also cannot carry out sanding and polishing to the side of grating groove, the problem that surfaceness is large cannot be overcome.But when adopting the ultraviolet photolithographic of based semiconductor technology and reactive ion technology to prepare this kind of combed optical grating construction, except processed complex, outside the deficiency of apparatus expensive, cannot obtain the large linear grating groove of depth-to-width ratio is also a very large problem.
Summary of the invention
The object of this invention is to provide a kind of preparation method of grating, the preparation method of this grating can break through the restriction of the minimum process width of process equipment, processes the grating that depth-to-width ratio is large, smooth-sided compression candles is precipitous.
To achieve these goals, the invention provides a kind of preparation method of grating, this preparation method comprises:
(1) grating raw sheet is prepared;
(2) L groove width d is set on grating raw sheet and is not less than d
0, groove depth h is not less than h
0groove, form grating blank;
(3) grating blank is carried out electroforming;
(4) the grating blank polishing that will process through step (3), obtained grating; Wherein,
D
0for the groove width of grating, h
0for the groove depth of grating.
Preferably, also comprise in step (1): polishing is carried out to grating raw sheet outside surface.
Preferably, in step (2), mode of operation can be one or more in the processing of linear cutter, electrosparking and precision milling machine.
Preferably, the electroforming processing procedure in step (3) can be that electroforming is carried out in the electroforming pond be placed in containing electroforming solution by grating blank.
Preferably, electroforming solution comprises copper sulphate, cupric chloride and sulfuric acid, and relative to the electroforming solution of 1L, the content of copper sulphate is 175-185g, and the content of cupric chloride is 10-14g, and the content of sulfuric acid is 45-50g.
Preferably, electroforming solution also comprises the chloride of scandium and/or the chloride of yttrium, and relative to the electroforming solution of 1L, the chloride of scandium and/or the muriatic content of yttrium are 2-5g.
Preferably, the temperature of electroforming solution is 40-50 DEG C.
Preferably, also comprise the grating blank after to polishing in step (4) to clean.
Preferably, cleaning treatment comprises the grating blank after by electroforming and cleans through deionized water, alcohol, acetone, deionized water successively.
According to technique scheme, the present invention offers L groove on the grating raw sheet prepared, and forms grating blank; Again grating blank is put into electroforming pond to carry out electroforming process and make the groove width of grating blank meet the grating parameter of final preparation; Finally upper surface polishing is carried out to grating, make its roughness and groove depth meet final preparation raster size parameter; Adopt machining and electroforming process to combine and prepare the method for high precision grating, the restricted width breaching linear grating groove is in the past in the restriction of the minimum working width of process equipment.This processing technology is easy, can be modified, can improve the surface smoothness making grating by electroforming to the grating outside surface of machining.
Other features and advantages of the present invention are described in detail in embodiment part subsequently.
Accompanying drawing explanation
Accompanying drawing is used to provide a further understanding of the present invention, and forms a part for instructions, is used from explanation the present invention, but is not construed as limiting the invention with embodiment one below.In the accompanying drawings:
Fig. 1 is the process flow diagram of the preparation method according to the grating in the preferred embodiment of the present invention.
Embodiment
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail.Should be understood that, embodiment described herein, only for instruction and explanation of the present invention, is not limited to the present invention.
See Fig. 1, the invention provides a kind of preparation method of grating, this preparation method comprises:
(1) grating raw sheet is prepared;
(2) L groove width d is set on grating raw sheet and is not less than d
0, groove depth h is not less than h
0groove, form grating blank;
(3) grating blank is carried out electroforming;
(4) the grating blank polishing that will process through step (3), obtained grating; Wherein,
D
0for the groove width of grating, h
0for the groove depth of grating.
By technique scheme, the grating raw sheet prepared is offered L groove, form grating blank; Again grating blank is put into electroforming pond to carry out electroforming process and make the groove width of grating blank meet the grating parameter of final preparation; Finally upper surface polishing is carried out to grating, make its roughness and groove depth meet final preparation raster size parameter; Adopt machining and electroforming process to combine and prepare the method for high precision grating, the restricted width breaching linear grating groove is in the past in the restriction of the minimum working width of process equipment.This processing technology is easy, can be modified, can improve the surface smoothness making grating by electroforming to the grating outside surface of machining.
In present embodiment, in order to make the surfaceness of grating raw sheet be less than the surfaceness finally made required by grating, preferably, step also comprises in (1): carry out polishing to grating raw sheet outside surface.
Be machined to by grating raw sheet in the process of grating blank, machining mode can be any one cutting processing mode common in this area, can be linear cutter, also can be electrosparking, can also be precision milling machine processing; In order to optimize machine work effect further, the size making grating blank is more accurate, and in step (2), mode of operation can be multiple during linear cutter, electrosparking and precision milling machine are processed equally.
For accurately controlling the size of the grating made, make its accurate difference, be convenient to control the electroforming processing procedure to grating blank, preferably, the electroforming processing procedure in step (3) can be that electroforming is carried out in the electroforming pond be placed in containing electroforming solution by grating blank simultaneously.
Above-mentioned electroplating process is to grow one deck oxygenless copper material at the outside surface of grating blank, for optimizing electroplating effect, grating blank outside surface is made to meet design objective, preferably, electroforming solution comprises copper sulphate, cupric chloride and sulfuric acid, and relative to the electroforming solution of 1L, the content of copper sulphate is 175-185g, the content of cupric chloride is 10-14g, and the content of sulfuric acid is 45-50g.
In addition, in order to improve the microstructure tissue of cast layer, obtain finer and close crystal grain and uniform cast layer, preferred electroforming solution also comprises the chloride of scandium and/or the chloride of yttrium, and relative to the electroforming solution of 1L, the chloride of scandium and/or the muriatic content of yttrium are 2-5g.
In whole electroforming process, in order to make the electroforming solution even concentration in electroforming pond, prevent the change difference of temperature from causing electroformed layer formation speed to be difficult to control, the temperature of preferred electroforming solution is 40-50 DEG C.
Owing to having strict requirement to the surface smoothness making grating, after making its surperficial electroforming, still keep smooth clean, preferably, also comprise the grating blank after to polishing in step (4) and clean.
In above-mentioned cleaning process, in order to optimize cleaning performance further, remove the pollutant of grating surface attachment, make it meet final technical indicator, preferred cleaning treatment comprises the grating blank after by electroforming and cleans through deionized water, alcohol, acetone, deionized water successively.
Below the preferred embodiment of the present invention is described in detail by reference to the accompanying drawings; but; the present invention is not limited to the detail in above-mentioned embodiment; within the scope of technical conceive of the present invention; can carry out multiple simple variant to technical scheme of the present invention, these simple variant all belong to protection scope of the present invention.
It should be noted that in addition, each concrete technical characteristic described in above-mentioned embodiment, in reconcilable situation, can be combined by any suitable mode, in order to avoid unnecessary repetition, the present invention illustrates no longer separately to various possible array mode.
In addition, also can carry out combination in any between various different embodiment of the present invention, as long as it is without prejudice to thought of the present invention, it should be considered as content disclosed in this invention equally.
Claims (9)
1. a preparation method for grating, is characterized in that, described preparation method comprises:
(1) grating raw sheet is prepared;
(2) L groove width d is set on described grating raw sheet and is not less than d
0, groove depth h is not less than h
0groove, form grating blank;
(3) described grating blank is carried out electroforming;
(4) the described grating blank polishing that will process through step (3), obtained grating; Wherein,
Described d
0for the groove width of grating, described h
0for the groove depth of grating.
2. preparation method according to claim 1, is characterized in that, step also comprises in (1): carry out polishing to grating raw sheet outside surface.
3. preparation method according to claim 1, is characterized in that, in step (2), mode of operation can be one or more in the processing of linear cutter, electrosparking and precision milling machine.
4. preparation method according to claim 1, is characterized in that, the electroforming processing procedure in step (3) can be that electroforming is carried out in the electroforming pond be placed in containing electroforming solution by grating blank.
5. preparation method according to claim 4, is characterized in that, described electroforming solution comprises copper sulphate, cupric chloride and sulfuric acid, and relative to the described electroforming solution of 1L, the content of described copper sulphate is 175-185g, and the content of described cupric chloride is 10-14g, and the content of described sulfuric acid is 45-50g.
6. preparation method according to claim 5, is characterized in that, described electroforming solution also comprises the chloride of scandium and/or the chloride of yttrium, and relative to the described electroforming solution of 1L, the chloride of described scandium and/or the muriatic content of described yttrium are 2-5g.
7. preparation method according to claim 4, is characterized in that, the temperature of described electroforming solution is 40-50 DEG C.
8. preparation method according to claim 1, is characterized in that, also comprises the grating blank after to polishing and clean in step (4).
9. preparation method according to claim 8, is characterized in that, described cleaning treatment comprises the described grating blank after by electroforming and cleans through deionized water, alcohol, acetone, deionized water successively.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510493965.3A CN105068167A (en) | 2015-08-12 | 2015-08-12 | Grating preparation method |
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|---|---|---|---|
| CN201510493965.3A CN105068167A (en) | 2015-08-12 | 2015-08-12 | Grating preparation method |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120021555A1 (en) * | 2010-07-23 | 2012-01-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photovoltaic cell texturization |
| CN103762136A (en) * | 2014-01-21 | 2014-04-30 | 安徽华东光电技术研究所 | Method for manufacturing parallel grating |
| CN104459857A (en) * | 2014-11-25 | 2015-03-25 | 安徽华东光电技术研究所 | Comb-shaped grating manufacturing method |
-
2015
- 2015-08-12 CN CN201510493965.3A patent/CN105068167A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120021555A1 (en) * | 2010-07-23 | 2012-01-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photovoltaic cell texturization |
| CN103762136A (en) * | 2014-01-21 | 2014-04-30 | 安徽华东光电技术研究所 | Method for manufacturing parallel grating |
| CN104459857A (en) * | 2014-11-25 | 2015-03-25 | 安徽华东光电技术研究所 | Comb-shaped grating manufacturing method |
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Application publication date: 20151118 |