CN105058213A - Continuous polishing device - Google Patents
Continuous polishing device Download PDFInfo
- Publication number
- CN105058213A CN105058213A CN201510487352.9A CN201510487352A CN105058213A CN 105058213 A CN105058213 A CN 105058213A CN 201510487352 A CN201510487352 A CN 201510487352A CN 105058213 A CN105058213 A CN 105058213A
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- China
- Prior art keywords
- polishing
- rinse bath
- station
- operation control
- air
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Abstract
The invention discloses a continuous polishing device. The continuous polishing device comprises a power supply system, a polishing system, a cleaning system, an air drying recycling system and an operation control system. A polishing station of the polishing system, a cleaning station of the cleaning system and an air drying recycling station of the air drying recycling system are sequentially arranged. The cleaning system is provided with one cleaning station, or at least two cleaning stations which are sequentially arranged in the cleaning system. The power supply system supplies power to the whole device. The operation control system controls the action of the whole device. According to the continuous polishing device, rolled copper foil and other samples can be polished, and the labor cost, the time cost and the material cost are effectively saved.
Description
Technical field
The present invention relates to a kind of continuous polishing equipment.
Background technology
Graphene is that Novoselov and Geim of 2004 Nian Man Chester universities finds, it has the excellent properties of each side such as excellent physics, chemistry, electricity, mechanics, has a wide range of applications at numerous areas such as new forms of energy, new material and electronic devices and components.Graphene is current preparation method mainly contain: microcomputer stripping method, epitaxy, oxidation-reduction method, solvent stripping method and chemical vapour deposition technique (CVD) etc., and CVD is production method main at present, is also the promising method of most.
When the CVD taking copper as substrate prepares Graphene, the carbon molecule that under high temperature, carbon source cracking goes out forming core growing up under the effect of metal surface catalysis, is finally connected to form the graphene-structured of two dimension.Copper foil surface roughness without polishing is larger, annealing rear surface copper crystal grain is significantly less than the crystal grain after polishing copper foil annealing, there is more crystal boundary, the activated carbon hydrogen group of Pintsch process is more prone to, at the crystal boundary of copper and step place absorption nucleation and growth process, easily pile up form more defect at crystal boundary and step place nucleus.Because surface roughness is very large, there is more defect in the Graphene therefore grown, comparatively be difficult to be connected to form the larger domain of area, and the Copper Foil after polishing, surface roughness obviously reduces, decrease the generation of defect, be therefore conducive to the uniform high-quality graphene of growing large-area.
Volume to volume technology is the effective means that large-scale production Graphene reduces costs simultaneously, but polissoir in the market carries out polishing after needing to carry out cutting to samples such as Copper Foils respectively, not only cause the waste of human cost and time cost, and the marginal portion of every a slice polishing sample need be discarded, and causes raw-material waste.Due to the equipment not for the polishing of volume to volume sample, pretreatment can not be carried out to samples such as rolling Copper Foils, cause and use the Graphene of the sample grown such as volume to volume Copper Foil to have more defect, be therefore badly in need of designing a kind of continuous polishing equipment that can carry out polishing to samples such as rolling Copper Foils.
Summary of the invention
The object of this invention is to provide a kind of continuous polishing equipment that can carry out polishing to samples such as rolling Copper Foils, effectively save human cost, time cost and material cost.
The technical scheme realizing the object of the invention is: a kind of continuous polishing equipment, comprises electric power system, polishing system, purging system, air-dry recovery system and operation control system; The air-dry recovery station of the polishing station of described polishing system, the washing station of purging system, air-dry recovery system sets gradually; The washing station of described purging system is provided with one, or sets gradually at least two; Described electric power system is that complete machine is powered; Described operation control system controls the action of complete machine.
Described polishing system comprises polishing trough, liquid storage tank, mechanical pump and removal waste fluid pipe; Described polishing trough is the polishing station of polishing system; The feed tube of described polishing trough is communicated with liquid storage tank by mechanical pump, and the discharging tube of polishing trough is communicated with liquid storage tank, and the discharging tube of liquid storage tank is communicated with removal waste fluid pipe; Many are provided with for driving the roller bearing of sample motion in described polishing trough; In described polishing trough, below liquid level, two roller bearings are metal roller bearing, and other roller bearings are insulation roller bearing; The below of described two metal roller bearings is provided with plate electrode; Described two metal roller bearings and plate electrode are all electrically connected with electric power system; The feed tube of described polishing trough and discharging tube are equipped with magnetic valve; The keying of the start and stop of described roller bearing, the rotating speed of roller bearing and magnetic valve controls by operation control system.
Plate electrode in the polishing trough of described polishing system and two metal roller bearing place planes be arranged in parallel.
Two metal roller bearings in the polishing trough of described polishing system and the distance between plate electrode adjustable, this distance is controlled by operation control system.
Containing phosphoric acid and polyethylene glycol in polishing fluid in the polishing trough of described polishing system.
Described purging system comprises water inlet manifold and main sewer, and at least one rinse bath; Described rinse bath is the washing station of purging system; The water inlet pipe of described rinse bath is communicated with water inlet manifold, the drainpipe communicated drainage house steward of rinse bath; The water inlet pipe of described rinse bath and drainpipe are equipped with magnetic valve; Many are provided with for driving the roller bearing of sample motion in described rinse bath; The keying of the start and stop of described roller bearing, the rotating speed of roller bearing and magnetic valve controls by operation control system.
The rinse bath of described purging system comprises the first rinse bath and the second rinse bath; The inner bottom part of described first rinse bath and/or the second rinse bath is provided with the bubbling device or Vltrasonic device that are controlled by operation control system; The switch of described bubbling device is controlled by operation control system.
The cleaning fluid of described first rinse bath and the second rinse bath is deionized water.
Described air-dry recovery system comprises air-dry groove and is arranged on the wind in air-dry groove, multiple air pressure gun and many for driving the roller bearing of sample motion; Described air-dry groove is the air-dry recovery station of air-dry recovery system, and sample passes through between multiple air pressure gun; The switch of described air pressure gun is controlled by operation control system.
In described adjacent two stations, the station being positioned at upper track is provided with the air pressure gun that the liquid that sample upper and lower surface remains can be blown back the station being positioned at upper track with the connectivity part of the station being positioned at lower road; The switch of described air pressure gun is controlled by operation control system.
Have employed technique scheme, the present invention has following beneficial effect: (1) the present invention can realize carrying out polishing to samples such as rolling Copper Foils, has effectively saved human cost, time cost and material cost.
(2) two metal roller bearings in the polishing trough of polishing system of the present invention and plate electrode are all electrically connected with electric power system, thus output current between the sample that can control on two metal roller bearings and plate electrode and voltage swing.
(3) plate electrode in the polishing trough of polishing system of the present invention and two metal roller bearing place planes be arranged in parallel, and distance is therebetween adjustable, thus realize the uniform polish to sample by the movement velocity of adjustable range and sample.
(4) inner bottom part of the first rinse bath of the present invention and/or the second rinse bath is provided with bubbling device or Vltrasonic device, can promote cleaning efficiency and cleaning validity.
(5) in adjacent two stations of the present invention, the station being positioned at upper track is provided with the air pressure gun that the liquid that sample upper and lower surface remains can be blown back the station being positioned at upper track with the connectivity part of the station being positioned at lower road, the liquid that can reduce upper track station, to the pollution of the liquid of lower road station, effectively improves the quality of the sample after polishing.
Accompanying drawing explanation
In order to make content of the present invention more easily be clearly understood, below according to specific embodiment also by reference to the accompanying drawings, the present invention is further detailed explanation, wherein
Fig. 1 is structural representation of the present invention.
Label in accompanying drawing is:
Distribution box 1, polishing trough 2, first rinse bath 3, second rinse bath 4, air-dry groove 5, operation control system 6, liquid storage tank 7, mechanical pump 8, water inlet manifold 9, main sewer 10, removal waste fluid pipe 11, frame 12, roller bearing 13, metal roller bearing 13-1, insulation roller bearing 13-2, plate electrode 14, magnetic valve 15, air pressure gun 16, bubbling device 17, Copper Foil 18.
Detailed description of the invention
(embodiment 1)
See Fig. 1, the continuous polishing equipment of the present embodiment, continuous polishing equipment, comprise electric power system 1, polishing system, purging system, air-dry recovery system and operation control system 6.
The air-dry recovery station of the polishing station of polishing system, the washing station of purging system, air-dry recovery system sets gradually.The washing station of purging system is provided with one, or sets gradually at least two.Electric power system 1 is powered for complete machine.Operation control system 6 controls the action of complete machine.In adjacent two stations, the station being positioned at upper track is provided with the air pressure gun 16 that the liquid that sample 18 upper and lower surface remains can be blown back the station being positioned at upper track with the connectivity part of the station being positioned at lower road.The switch of air pressure gun 16 is controlled by operation control system 6.
Polishing system comprises polishing trough 2, liquid storage tank 7, mechanical pump 8 and removal waste fluid pipe 11.Polishing trough 2 is the polishing station of polishing system.The feed tube of polishing trough 2 is communicated with liquid storage tank 7 by mechanical pump 8, and the discharging tube of polishing trough 2 is communicated with liquid storage tank 7, and the discharging tube of liquid storage tank 7 is communicated with removal waste fluid pipe 11.The many roller bearings 13 for driving sample 18 to move are provided with in polishing trough 2.In polishing trough 2, below liquid level, two roller bearings 13 are metal roller bearing 13-1, and as stainless steel, copper etc., the surface of metal roller bearing 13-1 can be coated with the good gold and silver etc. of electric conductivity; Other roller bearings 13 are insulation roller bearing 13-2, as rubber, polytetrafluoroethylene (PTFE) etc.The below of two metal roller bearing 13-1 is provided with plate electrode 14.Two metal roller bearing 13-1 and plate electrode 14 are all electrically connected with electric power system 1.The feed tube of polishing trough 2 and discharging tube are equipped with magnetic valve 15.The keying of the start and stop of roller bearing 13, the rotating speed of roller bearing 13 and magnetic valve 15 controls by operation control system 6.Plate electrode 14 in the polishing trough 2 of polishing system and two metal roller bearing 13-1 place planes be arranged in parallel.Two metal roller bearing 13-1 in the polishing trough 2 of polishing system and the distance between plate electrode 14 adjustable, this distance is controlled by operation control system 6.Containing phosphoric acid and polyethylene glycol in polishing fluid in the polishing trough 2 of polishing system.
Purging system comprises water inlet manifold 9 and main sewer 10, and at least one rinse bath.Rinse bath is the washing station of purging system.The water inlet pipe of rinse bath is communicated with water inlet manifold 9, the drainpipe communicated drainage house steward 10 of rinse bath.The water inlet pipe of rinse bath and drainpipe are equipped with magnetic valve 15.The many roller bearings 13 for driving sample 18 to move are provided with in rinse bath.The keying of the start and stop of roller bearing 13, the rotating speed of roller bearing 13 and magnetic valve 15 controls by operation control system 6.The rinse bath of purging system comprises the first rinse bath 3 and the second rinse bath 4.The inner bottom part of the first rinse bath 3 and/or the second rinse bath 4 is provided with the bubbling device 17 or Vltrasonic device that are controlled by operation control system 6.The switch of bubbling device 17 is controlled by operation control system 6.The cleaning fluid of the first rinse bath 3 and the second rinse bath 4 is deionized water.
Air-dry recovery system comprises air-dry groove 5 and is arranged on wind, multiple air pressure gun 16 and the many roller bearings 13 for driving sample 18 to move in air-dry groove 5.Air-dry groove 5 is the air-dry recovery station of air-dry recovery system, and sample 18 passes through between multiple air pressure gun 16.The switch of air pressure gun 16 is controlled by operation control system 6.
Cell body and the shell of polishing trough 2, first rinse bath 3, second rinse bath 4, air-dry groove 5 and liquid storage tank 7 all adopt corrosion resistant insulating materials, as acrylic board, pvc plate etc.
Above-described specific embodiment; object of the present invention, technical scheme and beneficial effect are further described; be understood that; the foregoing is only specific embodiments of the invention; be not limited to the present invention; within the spirit and principles in the present invention all, any amendment made, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (10)
1. a continuous polishing equipment, is characterized in that: comprise electric power system (1), polishing system, purging system, air-dry recovery system and operation control system (6); The air-dry recovery station of the polishing station of described polishing system, the washing station of purging system, air-dry recovery system sets gradually; The washing station of described purging system is provided with one, or sets gradually at least two; Described electric power system (1) is powered for complete machine; Described operation control system (6) controls the action of complete machine.
2. a kind of continuous polishing equipment according to claim 1, is characterized in that: described polishing system comprises polishing trough (2), liquid storage tank (7), mechanical pump (8) and removal waste fluid pipe (11); The polishing station that described polishing trough (2) is polishing system; The feed tube of described polishing trough (2) is communicated with liquid storage tank (7) by mechanical pump (8), the discharging tube of polishing trough (2) is communicated with liquid storage tank (7), and the discharging tube of liquid storage tank (7) is communicated with removal waste fluid pipe (11); The many roller bearings (13) for driving sample (18) to move are provided with in described polishing trough (2); Below described polishing trough (2) interior liquid level, two roller bearings (13) are metal roller bearing (13-1), and other roller bearings (13) are insulation roller bearing (13-2); The below of described two metal roller bearings (13-1) is provided with plate electrode (14); Described two metal roller bearings (13-1) and plate electrode (14) are all electrically connected with electric power system (1); The feed tube of described polishing trough (2) and discharging tube are equipped with magnetic valve (15); The keying of the start and stop of described roller bearing (13), the rotating speed of roller bearing (13) and magnetic valve (15) controls by operation control system (6).
3. a kind of continuous polishing equipment according to claim 2, is characterized in that: the plate electrode (14) in the polishing trough (2) of described polishing system and two metal roller bearing (13-1) place planes be arranged in parallel.
4. a kind of continuous polishing equipment according to claim 2, it is characterized in that: two metal roller bearings (13-1) in the polishing trough (2) of described polishing system and the distance between plate electrode (14) adjustable, this distance is controlled by operation control system (6).
5. a kind of continuous polishing equipment according to claim 2, is characterized in that: containing phosphoric acid and polyethylene glycol in the polishing fluid in the polishing trough (2) of described polishing system.
6. a kind of continuous polishing equipment according to claim 1, is characterized in that: described purging system comprises water inlet manifold (9) and main sewer (10), and at least one rinse bath; Described rinse bath is the washing station of purging system; The water inlet pipe of described rinse bath is communicated with water inlet manifold (9), the drainpipe communicated drainage house steward (10) of rinse bath; The water inlet pipe of described rinse bath and drainpipe are equipped with magnetic valve (15); The many roller bearings (13) for driving sample (18) to move are provided with in described rinse bath; The keying of the start and stop of described roller bearing (13), the rotating speed of roller bearing (13) and magnetic valve (15) controls by operation control system (6).
7. a kind of continuous polishing equipment according to claim 6, is characterized in that: the rinse bath of described purging system comprises the first rinse bath (3) and the second rinse bath (4); The inner bottom part of described first rinse bath (3) and/or the second rinse bath (4) is provided with the bubbling device (17) or Vltrasonic device that are controlled by operation control system (6); The switch of described bubbling device (17) is controlled by operation control system (6).
8. a kind of continuous polishing equipment according to claim 6, is characterized in that: the cleaning fluid of described first rinse bath (3) and the second rinse bath (4) is deionized water.
9. a kind of continuous polishing equipment according to claim 1, is characterized in that: described air-dry recovery system comprises air-dry groove (5) and is arranged on the wind in air-dry groove (5), multiple air pressure gun (16) and the many roller bearings (13) for driving sample (18) to move; The air-dry recovery station that described air-dry groove (5) is air-dry recovery system, sample (18) passes through between multiple air pressure gun (16); The switch of described air pressure gun (16) is controlled by operation control system (6).
10. a kind of continuous polishing equipment according to claim 1, it is characterized in that: in described adjacent two stations, the station being positioned at upper track is provided with the air pressure gun (16) that the liquid that sample (18) upper and lower surface remains can be blown back the station being positioned at upper track with the connectivity part of the station being positioned at lower road; The switch of described air pressure gun (16) is controlled by operation control system (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510487352.9A CN105058213A (en) | 2015-08-10 | 2015-08-10 | Continuous polishing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510487352.9A CN105058213A (en) | 2015-08-10 | 2015-08-10 | Continuous polishing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105058213A true CN105058213A (en) | 2015-11-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510487352.9A Pending CN105058213A (en) | 2015-08-10 | 2015-08-10 | Continuous polishing device |
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| CN (1) | CN105058213A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107971917A (en) * | 2017-11-29 | 2018-05-01 | 北京鼎臣世纪超导科技有限公司 | A kind of band polissoir |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5792333A (en) * | 1994-10-06 | 1998-08-11 | Circuit Foil Japan Co., Ltd. | Method of surface-roughening treatment of copper foil |
| CN1600499A (en) * | 2004-10-01 | 2005-03-30 | 梅县金象铜箔有限公司 | Method for dull polishing and milling polishing cathode roll of electrolytic copper toil |
| CN1761537A (en) * | 2003-04-07 | 2006-04-19 | 材料制造有限公司 | Method of removing scale and inhibiting oxidation in processed sheet metal |
| CN2776991Y (en) * | 2005-03-09 | 2006-05-03 | 广东超华科技股份有限公司 | Semidipping type electrolytic copper foil surface treatment machine |
| CN103228822A (en) * | 2010-11-30 | 2013-07-31 | Otec精密研磨有限责任公司 | Method for the electrochemical polishing of metallic objects and electrolyte solution suitable therefor |
| EP2762446A1 (en) * | 2011-11-04 | 2014-08-06 | JX Nippon Mining & Metals Corporation | Copper foil for graphene production and production method therefor, and graphene production method |
-
2015
- 2015-08-10 CN CN201510487352.9A patent/CN105058213A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5792333A (en) * | 1994-10-06 | 1998-08-11 | Circuit Foil Japan Co., Ltd. | Method of surface-roughening treatment of copper foil |
| CN1761537A (en) * | 2003-04-07 | 2006-04-19 | 材料制造有限公司 | Method of removing scale and inhibiting oxidation in processed sheet metal |
| CN1600499A (en) * | 2004-10-01 | 2005-03-30 | 梅县金象铜箔有限公司 | Method for dull polishing and milling polishing cathode roll of electrolytic copper toil |
| CN2776991Y (en) * | 2005-03-09 | 2006-05-03 | 广东超华科技股份有限公司 | Semidipping type electrolytic copper foil surface treatment machine |
| CN103228822A (en) * | 2010-11-30 | 2013-07-31 | Otec精密研磨有限责任公司 | Method for the electrochemical polishing of metallic objects and electrolyte solution suitable therefor |
| EP2762446A1 (en) * | 2011-11-04 | 2014-08-06 | JX Nippon Mining & Metals Corporation | Copper foil for graphene production and production method therefor, and graphene production method |
| CN104024156A (en) * | 2011-11-04 | 2014-09-03 | Jx日矿日石金属株式会社 | Copper foil for graphene production and production method therefor, and graphene production method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107971917A (en) * | 2017-11-29 | 2018-05-01 | 北京鼎臣世纪超导科技有限公司 | A kind of band polissoir |
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| PB01 | Publication | ||
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Application publication date: 20151118 |