CN105032144A - Double-medium barrier discharge organic waste gas treatment apparatus for embedded ultraviolet modulator tube and method thereof - Google Patents
Double-medium barrier discharge organic waste gas treatment apparatus for embedded ultraviolet modulator tube and method thereof Download PDFInfo
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- CN105032144A CN105032144A CN201510485654.2A CN201510485654A CN105032144A CN 105032144 A CN105032144 A CN 105032144A CN 201510485654 A CN201510485654 A CN 201510485654A CN 105032144 A CN105032144 A CN 105032144A
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Abstract
The invention discloses a double-medium barrier discharge organic waste gas treatment apparatus for an embedded ultraviolet modulator tube and a method thereof. A treatment apparatus barrel is internally divided into an ultraviolet radiation area, a double-medium barrier discharge area and a heating decomposing area. The ultraviolet modulator tube is embedded into the axis-center of the barrel and stretches acrosse the ultraviolet radiation area and the double-medium barrier discharge area. The ultraviolet modulator tube of the double-medium barrier discharge area is wound with a sintered porous metal cellosilk loading nano TiO2 to be used as a discharge electrode and also as an optical catalyst. The heating decomposing area is provided with a catalyst layer, a heating sheet and a thermocouple, and the catalyst layer is filled with an ozone decomposition catalyst. Organic waste gas is first pre-oxidized by means of the ultraviolet radiation area and then is degraded synergistically by plasma and the optical catalyst by means of the double-medium barrier discharge area, and finally residual ozone is decomposed by means of the heating decomposing area. A low-temperature plasma technology and an optical catalytic technology are innovatively coupled, so that not only can the organic waste gas removal rate be increased, but also the secondary pollution is reduced.
Description
Technical field
The invention belongs to exhaust-gas treatment field, be specifically related to a kind of double-dielectric barrier discharge organic waste gas treatment device and method thereof of embedded ultraviolet lamp tube.
Background technology
Lower temperature plasma technology (Non-ThermalPlasma, NTP) volatile organic waste gas (VolatileOrganicCompounds has been widely used in, VOCs) administer, dielectric barrier discharge (DielectricBarrierDischarges, DBD) be one of the main discharge form of lower temperature plasma technology, and become the common technology that industrialization VOCs administers.In recent years, NTP technology and photocatalysis technology are combined the very big concern that the VOCs that degrades causes domestic and international researcher, both synergies not only can reduce the secondary pollution problem being used alone NTP technology and causing greatly, also overcome the shortcoming that single employing photocatalysis technology removal efficiency is not high, both persons are had complementary advantages, further increases the clearance of VOCs.
At present, NTP combine with technique photocatalysis technology degraded VOCs mainly contains two kinds of technology paths: a kind of is one-part form, namely photochemical catalyst is directly placed in discharge of plasma in low temperature space, utilize the ultraviolet light produced in plasma discharge processes, light-catalyzed reaction can be carried out simultaneously, generally photochemical catalyst can be filled in region of discharge or be coated in above discharge electrode, notification number is the reactor that the Chinese patent of CN102179145B discloses that a kind of low temperature plasma catalyzing cooperation administers VOCs, by packed catalyst between discharge air-gap, notification number is that the Chinese patent of CN101342461B discloses a kind of pulsed light catalysis-metal oxide oxidation catalyst plasma reactor, by the alundum tube surface of photocatalyst at intercalation reaction device, another kind is two-part, namely low temperature plasma section and photocatalysis section are simply connected, the process of photocatalysis section is carried out in the process first carrying out low temperature plasma section again, or the process of low temperature plasma section is carried out in the process first carrying out photocatalysis section again, publication number is that the utility model patent of CN200820098255.6 discloses one by dielectric barrier discharge, the industrial waste gas processor of corona discharge and the series connection of photocatalysis room, publication number is that the utility model patent of CN201520071638.4 discloses a kind of two photocatalysis units and two plasma units and to stagger the device of process organic exhaust gas of series connection.
NTP in conjunction with the technology of photocatalytic degradation VOCs, one-part form or two-part all there is certain problem.In the reactor of one-part form, the ultraviolet light competence exertion effect that photochemical catalyst can only use NTP electric discharge to produce, but the amount that NTP electric discharge produces ultraviolet light is relatively less, and very unstable, and this just makes photochemical catalyst be difficult to stable its effect of performance.And in the reactor of two-part, in fact NTP unit and photocatalysis unit remain independent role, synergy is very limited, and the volume of reactor also can increase greatly, and the secondary pollution problem produced is still more outstanding.How to solve the efficient coupling between plasma and photocatalysis, improving synergistic action effect, is the current bottleneck faced.
Summary of the invention
The object of the invention is to solve the deficiencies in the prior art, and provide a kind of double-dielectric barrier discharge organic waste gas treatment device and method thereof of embedded ultraviolet lamp tube, concrete technical scheme is as follows:
A kind of double-dielectric barrier discharge organic waste gas treatment device of embedded ultraviolet lamp tube, the shell of device is cylindrical shell, and inner barrel is divided into three chambers by the first dividing plate and second partition, and centre is double-dielectric barrier discharge district, left side is ultraviolet irradiation district, and right side is heat resolve district; Ultraviolet irradiation district left end and heat resolve district right-hand member are respectively with front end face and rear end face sealing; First dividing plate is provided with the first pore, and second partition is provided with the second pore; Ultraviolet irradiation district outer wall is provided with air inlet, and heat resolve district outer wall is provided with gas outlet; Ultraviolet lamp tube is provided with in ultraviolet irradiation district and double-dielectric barrier discharge district; Ultraviolet lamp tube is connected with uviol lamp power supply, powers; The cylinder inboard wall at place, double-dielectric barrier discharge district is surrounded with ground floor dielectric barrier; The cylinder body outer wall at place, double-dielectric barrier discharge district is surrounded with metal conducting layer; Metal conducting layer is connected with earth connection ground connection; Ultraviolet lamp tube in double-dielectric barrier discharge district is as second layer dielectric barrier, and ultraviolet lamp tube outer wall is wound with sintered porous metal filament, and above sintered porous metal filament, load has TiO
2photochemical catalyst, and as the discharge electrode of dielectric barrier discharge, sintered porous metal filament one end is connected with plasma high voltage source; All inwalls of pyrolysis zone are covered with catalyst layer, for catalytic decomposition O
3; Catalyst layer is provided with heating plate; Heat resolve district is also connected to a thermocouple, and heating plate is all connected with the temperature controller outside cylindrical shell with described thermocouple.
Described cylindrical shell is cylindrical; Described ultraviolet lamp tube is arranged on the axle center in ultraviolet irradiation district and double-dielectric barrier discharge district, and ultraviolet lamp tube is through the first dividing plate, and two ends are separately fixed on front end face and rear end face.
The first described pore is arranged at the first dividing plate top, and the second described pore is arranged at second partition bottom, and described air inlet is arranged at ultraviolet irradiation district lower left quarter, and described gas outlet is arranged at heat resolve district upper right quarter.
The material of described ground floor dielectric barrier is pottery or quartz glass.
The material of described metal conducting layer is sheet metal or wire netting.
Described catalyst layer surface is provided with bracing frame, is filled with ozone decomposition catalyst in bracing frame.
Described ozone decomposition catalyst is MnO
2, NiO, Fe
2o
3or CeO
2in one.
The wave-length coverage of described ultraviolet lamp tube is 185 ~ 400nm.
The filametntary material of described sintered porous metal is the one in stainless steel, FeCrAl, FeCrNi or NiCr alloy.
Use a double-dielectric barrier discharge organic waste gas treatment method for described device, comprise the steps:
1) organic exhaust gas enters ultraviolet irradiation district from air inlet, opens uviol lamp power supply, opens ultraviolet lamp tube, the O that gas produces under ultraviolet effect
3, pre-oxidation is carried out to organic exhaust gas;
2) through step 1) process after VOCs gas enter double-dielectric barrier discharge district by the first pore on the first dividing plate; On the cylinder inboard wall at place, double-dielectric barrier discharge district around pottery or quartz glass as ground floor dielectric barrier, using the ultraviolet lamp tube in double-dielectric barrier discharge district as second layer dielectric barrier; Open plasma high voltage source, discharge voltage controls at 20 ~ 50kV; VOCs gas produces active particle under double-dielectric barrier discharge; Meanwhile, the TiO of load on sintered porous metal filament is utilized
2photochemical catalyst carries out light-catalyzed reaction to VOCs gas under the irradiation of ultraviolet light; By under double-dielectric barrier discharge and light-catalysed synergy, oxidation Decomposition is carried out to VOCs molecule;
3) through step 2) process after gas enter heat resolve district by the second pore on second partition, by the gas temperature in thermocouple measurement heat resolve district, and control heating plate by temperature controller, the gas temperature in heat resolve district is controlled at 50 ~ 80 DEG C; Simultaneously using catalyst layer as heat-insulation layer, to heat resolve, district is incubated, and carries out catalytic reaction by the ozone decomposition catalyst of filling in catalyst layer, O residual in decomposition gas
3, the gas after process discharges eventually through gas outlet.
The beneficial effect that the present invention compared with prior art has is:
(1) ultraviolet lamp tube is directly embedded in dielectric barrier discharge region, not only define double-dielectric barrier discharge, also achieve real one-part form plasma body cooperative photocatalytic system, the micro-ultraviolet light that light-catalyzed reaction no longer only relies on plasma discharge to produce, additional ultraviolet light can strengthen the effect of light-catalyzed reaction greatly, thus improves the effect of plasma body cooperative photocatalytic system degraded VOCs;
(2) discharge electrode of double-dielectric barrier discharge adopts sintered porous metal filament, makes full use of sintered porous metal filametntary porous character load TiO
2photochemical catalyst, and be wrapped in above ultraviolet lamp tube, TiO
2photochemical catalyst, near ultraviolet source, is conducive to improving photocatalysis effect;
(3) end for the treatment of apparatus is provided with heat resolve district, and by temperature controller, the gas temperature in heat resolve district is controlled in certain limit, by the catalytic reaction in catalyst layer, a small amount of O that can will not decompose completely after the process of plasma photocatalysis system
3thorough decomposition, has stopped secondary pollution.
Accompanying drawing explanation
The double-dielectric barrier discharge organic waste gas treatment device schematic diagram of the embedded ultraviolet lamp tube of Fig. 1;
Fig. 2 loaded with nano TiO of the present invention
2the filametntary SEM scanning electron microscope (SEM) photograph of sintered porous metal (left 20 μm of yardsticks, right 2 μm of yardsticks);
In figure: ultraviolet irradiation district 1, double-dielectric barrier discharge district 2, heat resolve district 3, cylindrical shell 11, front end face 12, first dividing plate 13, ultraviolet lamp tube 14, air inlet 15, first pore 16, uviol lamp power supply 17, sintered porous metal filament 21, plasma high voltage source 22, ground floor dielectric barrier 23, metal conducting layer 24, second partition 25, earth connection 26, second pore 27, catalyst layer 31, heating plate 32, thermocouple 33, temperature controller 34, rear end face 35, gas outlet 36.
Detailed description of the invention
Below in conjunction with accompanying drawing, the present invention is described in further details.
As shown in Figure 1, a kind of double-dielectric barrier discharge organic waste gas treatment device of embedded ultraviolet lamp tube, the shell of device is cylindrical shell 11, cylindrical shell 11 inside is divided into three chambers by the first dividing plate 13 and second partition 25, centre is double-dielectric barrier discharge district 2, left side is ultraviolet irradiation district 1, and right side is heat resolve district 3.Ultraviolet irradiation district 1 left end and heat resolve district 3 right-hand member seal with front end face 12 and rear end face 35 respectively.First dividing plate 13 is provided with the first pore 16, and second partition 25 is provided with the second pore 27.Ultraviolet irradiation district 1 outer wall is provided with air inlet 15, and heat resolve district 3 outer wall is provided with gas outlet 36.Ultraviolet lamp tube 14 is provided with in ultraviolet irradiation district 1 and double-dielectric barrier discharge district 2.Ultraviolet lamp tube 14 is connected with uviol lamp power supply 17, powers.Cylindrical shell 11 inwall at place, double-dielectric barrier discharge district 2 is surrounded with ground floor dielectric barrier 23.Cylindrical shell 11 outer wall at place, double-dielectric barrier discharge district 2 is surrounded with a circle metal conducting layer 24.Metal conducting layer 24 is connected with earth connection 26 ground connection.Ultraviolet lamp tube 14 in double-dielectric barrier discharge district 2 is as second layer dielectric barrier, and ultraviolet lamp tube 14 outer wall is wound with sintered porous metal filament 21, and sintered porous metal filament 21 load above has TiO
2photochemical catalyst.Sintered porous metal filament 21 both as the sparking electrode of dielectric barrier discharge, again as photochemical catalyst.Sintered porous metal filament 21 one end passes cylindrical shell from the first dividing plate 13 inside and is connected with plasma high voltage source 22, and the other end is fixed on second partition 25.All inwalls of pyrolysis zone 3 are covered with one deck catalyst layer 31, for catalytic decomposition O
3.Catalyst layer 31 is provided with heating plate 32.Heat resolve district 3 is also connected to a thermocouple 33, and heating plate 32 is all connected with the temperature controller 34 outside cylindrical shell 11 with described thermocouple 33.
Described cylindrical shell 11 is cylindrical, and material is lucite; Described ultraviolet lamp tube 14 is arranged on the axle center in ultraviolet irradiation district 1 and double-dielectric barrier discharge district 2, and ultraviolet lamp tube can each position in uniform irradiation device.Same ultraviolet lamp tube 14 is through the first dividing plate 13, and perforation place is airtight, and two ends are separately fixed on front end face 12 and rear end face 35, for irradiating organic exhaust gas, and the O of generation
3, pre-oxidation is carried out to organic exhaust gas.
The first described pore 16 is arranged at the first dividing plate 13 top, the second described pore 27 is arranged at second partition 25 bottom, described air inlet 15 is arranged at ultraviolet irradiation district 1 lower left quarter, described gas outlet 36 is arranged at heat resolve district 3 upper right quarter, the time of staying of waste gas in device is increased, to improve clearance.
The material of described ground floor dielectric barrier 23 is pottery or quartz glass.The material of described metal conducting layer 24 is sheet metal or wire netting.Described catalyst layer 31 surface is provided with bracing frame, and bracing frame is ventilating structure with holes, is filled with ozone decomposition catalyst in bracing frame.Described ozone decomposition catalyst is MnO
2, NiO, Fe
2o
3or CeO
2in one.The wave-length coverage of described ultraviolet lamp tube 14 is 185 ~ 400nm.The material of described sintered porous metal filament 21 is the one in stainless steel, FeCrAl, FeCrNi or NiCr alloy.
Use a double-dielectric barrier discharge organic waste gas treatment method for described device, comprise the steps:
1) organic exhaust gas enters ultraviolet irradiation district 1 from air inlet 15, opens uviol lamp power supply 17, opens ultraviolet lamp tube 14, the O that gas produces under ultraviolet effect
3, pre-oxidation is carried out to organic exhaust gas;
2) through step 1) process after VOCs gas enter double-dielectric barrier discharge district 2 by the first pore 16 on the first dividing plate 13; On cylindrical shell 11 inwall at place, double-dielectric barrier discharge district 2 around pottery or quartz glass as ground floor dielectric barrier 23, using the ultraviolet lamp tube 14 in double-dielectric barrier discharge district 2 as second layer dielectric barrier, form double-dielectric barrier discharge system; Open plasma high voltage source 22, discharge voltage controls at 20 ~ 50kV; VOCs gas produces high energy electron, O under double-dielectric barrier discharge
3, O, OH and HO
2isoreactivity particle; Meanwhile, the TiO of load on sintered porous metal filament 21 discharge electrode is utilized
2photochemical catalyst carries out light-catalyzed reaction to VOCs gas under the irradiation of ultraviolet light; By under double-dielectric barrier discharge and light-catalysed synergy, oxidation Decomposition is carried out to VOCs molecule;
3) through step 2) process after gas enter heat resolve district 3 by the second pore 27 on second partition 25, the gas temperature in heat resolve district 3 is measured by thermocouple 33, and control heating plate 32 by temperature controller 34, the gas temperature in heat resolve district 3 is controlled at 50 ~ 80 DEG C; Simultaneously using catalyst layer 31 as heat-insulation layer, heat resolve district 3 is incubated, and carries out catalytic reaction by the ozone decomposition catalyst of filling in catalyst layer 31, a small amount of O residual in decomposition gas
3, the gas after process discharges eventually through gas outlet 36.
Embodiment 1:
Utilize the double-dielectric barrier discharge organic waste gas treatment device of embedded ultraviolet lamp tube of the present invention, to common VOCs dimethylbenzene (C
8h
10, lacquer spraying waste gas typical pollutant) process, the flow of waste gas is 1000mL/min, ultraviolet lamp tube wavelength 254nm, and discharge electrode adopts FeCrAl sintered porous metal filament, and the photochemical catalyst of load is nanoscale TiO
2, particle diameter is 10nm, and its microstructure as shown in Figure 2.Ground floor dielectric barrier adopts ceramic material, and metal conducting layer adopts metallic aluminium net, and heat resolve district temperature controls at 70 DEG C, and that fill in catalyst layer is MnO
2catalyst.Under independent photocatalytic system, separately plasma based unify the different treatment conditions of plasma body cooperative photocatalytic system three kinds, the degradation rate of dimethylbenzene is as shown in table 1, in independent photocatalytic system and independent plasma system, the degradation rate of dimethylbenzene only has 56.8% and 43.5% respectively, and under plasma body cooperative photocatalytic system, dimethylbenzene degradation rate has brought up to 88.3%, and synergistic action effect is obvious.Under plasma body cooperative photocatalytic system, do not open heat resolve district and open heat resolve district, O
3exit concentration as shown in table 2, when not opening heat resolve district, outlet O
3concentration is higher, after opening heat resolve district, and outlet O
3concentration declines obviously, significantly reduces O
3the secondary pollution problem produced.
Under the treatment system that three kinds, table 1 is different, the degradation rate of dimethylbenzene compares
The exit concentration that table 2 processes the lower ozone of dimethylbenzene heat resolve district opening and closing compares
Embodiment 2:
In the present embodiment, organic waste gas treatment device is identical with embodiment 1.The pollutant of process is butyl acetate (CH
3cOO (CH
2)
3cH
3, lacquer spraying waste gas typical pollutant), the flow of waste gas is 1000mL/min.Under independent photocatalytic system, separately plasma based unify the different treatment conditions of plasma body cooperative photocatalytic system three kinds, the degradation rate of butyl acetate is as shown in table 3, in independent photocatalytic system and independent plasma system, the degradation rate of butyl acetate only has 28.8% and 43.1% respectively, and under plasma body cooperative photocatalytic system, butyl acetate degradation rate reaches 90.3%, improves obviously.Under plasma body cooperative photocatalytic system, do not open heat resolve district and open heat resolve district, O
3exit concentration as shown in table 4, when not opening heat resolve district, outlet O
3concentration is higher, after opening heat resolve district, and outlet O
3concentration declines obviously, significantly reduces O
3the secondary pollution problem produced.
Under the treatment system that three kinds, table 3 is different, the degradation rate of butyl acetate compares
The exit concentration that table 4 processes the lower ozone of butyl acetate heat resolve district opening and closing compares
Claims (10)
1. the double-dielectric barrier discharge organic waste gas treatment device of an embedded ultraviolet lamp tube, it is characterized in that, the shell of device is cylindrical shell (11), cylindrical shell (11) inside is divided into three chambers by the first dividing plate (13) and second partition (25), centre is double-dielectric barrier discharge district (2), left side is ultraviolet irradiation district (1), and right side is heat resolve district (3); Ultraviolet irradiation district (1) left end and heat resolve district (3) right-hand member are respectively with front end face (12) and rear end face (35) sealing; First dividing plate (13) is provided with the first pore (16), and second partition (25) is provided with the second pore (27); Ultraviolet irradiation district (1) outer wall is provided with air inlet (15), and heat resolve district (3) outer wall is provided with gas outlet (36); Ultraviolet lamp tube (14) is provided with in ultraviolet irradiation district (1) and double-dielectric barrier discharge district (2); Ultraviolet lamp tube (14) is connected with uviol lamp power supply (17), powers; Cylindrical shell (11) inwall at double-dielectric barrier discharge district (2) place is surrounded with ground floor dielectric barrier (23); Cylindrical shell (11) outer wall at double-dielectric barrier discharge district (2) place is surrounded with metal conducting layer (24); Metal conducting layer (24) is connected with earth connection (26) ground connection; Ultraviolet lamp tube (14) in double-dielectric barrier discharge district (2) is as second layer dielectric barrier, and ultraviolet lamp tube (14) outer wall is wound with sintered porous metal filament (21), and sintered porous metal filament (21) load above has TiO
2photochemical catalyst, and as the discharge electrode of dielectric barrier discharge, sintered porous metal filament (21) one end is connected with plasma high voltage source (22); All inwalls of pyrolysis zone (3) are covered with catalyst layer (31), for catalytic decomposition O
3; Catalyst layer (31) is provided with heating plate (32); Heat resolve district (3) is also connected to a thermocouple (33), and heating plate (32) and described thermocouple (33) are all connected with the temperature controller (34) of cylindrical shell (11) outside.
2. the double-dielectric barrier discharge organic waste gas treatment device of embedded ultraviolet lamp tube as claimed in claim 1, is characterized in that, described cylindrical shell (11) is cylindrical; Described ultraviolet lamp tube (14) is arranged on the axle center of ultraviolet irradiation district (1) and double-dielectric barrier discharge district (2), and ultraviolet lamp tube (14) is through the first dividing plate (13), and two ends are separately fixed on front end face (12) and rear end face (35).
3. the double-dielectric barrier discharge organic waste gas treatment device of embedded ultraviolet lamp tube as claimed in claim 1, it is characterized in that, described the first pore (16) is arranged at the first dividing plate (13) top, described the second pore (27) is arranged at second partition (25) bottom, described air inlet (15) is arranged at ultraviolet irradiation district (1) lower left quarter, and described gas outlet (36) is arranged at heat resolve district (3) upper right quarter.
4. the double-dielectric barrier discharge organic waste gas treatment device of embedded ultraviolet lamp tube as claimed in claim 1, is characterized in that, the material of described ground floor dielectric barrier (23) is pottery or quartz glass.
5. the double-dielectric barrier discharge organic waste gas treatment device of embedded ultraviolet lamp tube as claimed in claim 1, is characterized in that, the material of described metal conducting layer (24) is sheet metal or wire netting.
6. the double-dielectric barrier discharge organic waste gas treatment device of embedded ultraviolet lamp tube as claimed in claim 1, is characterized in that, described catalyst layer (31) surface is provided with bracing frame, is filled with ozone decomposition catalyst in bracing frame.
7. the double-dielectric barrier discharge organic waste gas treatment device of embedded ultraviolet lamp tube as claimed in claim 6, is characterized in that, described ozone decomposition catalyst is MnO
2, NiO, Fe
2o
3or CeO
2in one.
8. the double-dielectric barrier discharge organic waste gas treatment device of embedded ultraviolet lamp tube as claimed in claim 1, is characterized in that, the wave-length coverage of described ultraviolet lamp tube (14) is 185 ~ 400nm.
9. the double-dielectric barrier discharge organic waste gas treatment device of embedded ultraviolet lamp tube as claimed in claim 1, is characterized in that, the material of described sintered porous metal filament (21) is the one in stainless steel, FeCrAl, FeCrNi or NiCr alloy.
10. use a double-dielectric barrier discharge organic waste gas treatment method for device described in claim 1, it is characterized in that, comprise the steps:
1) organic exhaust gas enters ultraviolet irradiation district (1) from air inlet (15), opens uviol lamp power supply (17), opens ultraviolet lamp tube (14), the O that gas produces under ultraviolet effect
3, pre-oxidation is carried out to organic exhaust gas;
2) through step 1) VOCs gas after process enters double-dielectric barrier discharge district (2) by the first pore (16) on the first dividing plate (13); On cylindrical shell (11) inwall at double-dielectric barrier discharge district (2) place around pottery or quartz glass as ground floor dielectric barrier (23), using the ultraviolet lamp tube (14) in double-dielectric barrier discharge district (2) as second layer dielectric barrier; Open plasma high voltage source (22), discharge voltage controls at 20 ~ 50kV; VOCs gas produces active particle under double-dielectric barrier discharge; Meanwhile, the TiO of load on sintered porous metal filament (21) is utilized
2photochemical catalyst carries out light-catalyzed reaction to VOCs gas under the irradiation of ultraviolet light; By under double-dielectric barrier discharge and light-catalysed synergy, oxidation Decomposition is carried out to VOCs molecule;
3) through step 2) gas after process enters heat resolve district (3) by the second pore (27) on second partition (25), the gas temperature in heat resolve district (3) is measured by thermocouple (33), and control heating plate (32) by temperature controller (34), the gas temperature of heat resolve district (3) is controlled at 50 ~ 80 DEG C; Simultaneously using catalyst layer (31) as heat-insulation layer, heat resolve district (3) are incubated, and carry out catalytic reaction by the ozone decomposition catalyst of filling in catalyst layer (31), O residual in decomposition gas
3, the gas after process discharges eventually through gas outlet (36).
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