CN105012160A - Visible light curing nail enamel and preparation method thereof - Google Patents
Visible light curing nail enamel and preparation method thereof Download PDFInfo
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- CN105012160A CN105012160A CN201510470331.6A CN201510470331A CN105012160A CN 105012160 A CN105012160 A CN 105012160A CN 201510470331 A CN201510470331 A CN 201510470331A CN 105012160 A CN105012160 A CN 105012160A
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Abstract
The invention belongs to the technical field of material chemistry, and particularly relates to visible light curing nail enamel and a preparation method thereof. The visible light curing nail enamel comprises the components: 2-98wt% of oligomer, 2-98% of reactive diluent, 0.01-10wt% of visible light initiating agent, 0.01-1wt% of brightening agent and 0-10wt% of pigment. The nail enamel can be cured under the irradiation of visible light with wavelength of 380-780nm, and the harm of ultraviolet light to the skin is avoided; the nail enamel can be rapidly dried in a visible light curing nail printer, and can also be slowly cured under the irradiation of sunlight or other common lighting sources. The visible light curing nail enamel is free of toxic organic solvent or film coalescing aid and safe to use, is guaranteed to be bright lastingly and not easy to drop after being dried, is insoluble in daily oil or water solutions, but can be removed by saline solution or sodium bicarbonate water solution without grinding, so that the harm to the nails is avoided, and the condition that the fine particulate matters are inhaled to affect the lung health is also avoided.
Description
Technical field
The invention belongs to material chemistry technical field, be specifically related to a kind of visible-light curing nial polish and preparation method thereof.
Background technology
Nial polish is also called " nail varuish ", belongs to the one of color make-up, and be coated on fingernail and can form thin film, beautiful in colour be rich in gloss again, can give fingernail aesthetic feeling, therefore extensively like by women.Bright color, multicoloured fingernail are the required together beautiful sceneries of women of liking to be beautiful.
Nial polish in the market mainly can be divided into three kinds: nitro nial polish, water-based nail polish and UV nial polish.
Nitro nial polish, also referred to as chemical nial polish, is mainly this material with nitrocellulose, mixes the chemical solvents such as acetone, ethyl acetate, ethyl lactate, phthalate and a small amount of Camphora, titanium dioxide and oily molten pigment etc. and makes.The multiple organic solvent contained in this kind of nial polish all has toxicity, very large to the harm of health: phthalic acid ester can enter in body by respiratory system and skin, may hinder body hormonal readiness, causes reproduction to damage; In order to quick-drying and the composition such as acetone, ethyl acetate that is that add has penetrating odor, long-term suction may have an impact to nervous system; Benzene in solvent and formaldehyde etc. are also carcinogen.And the compound dissolution contained by nitro nial polish is in oils and fats, if directly clutch food, the toxic component of nial polish may be caused to be dissolved in oils and fats and take in human body with food, therefore must great care.In addition, nitro nial polish will use cleaner when removing.And cleaner can destroy the horn cell of fingernail, make the horny layer of nail surface dry fragile; Toxic chemical substance in cleaner, also can work the mischief to health.
Water-based nail polish take water as the nial polish of solvent, and quality is rarer, and mobility is large; After nial polish is dry, film-like adheres to nail surface.Not containing poisonous organic solvent in water-based nail polish, also easily remove.But adopt acrylic emulsions as emulsifying agent in water-based nail polish, with alcohol ester 12 as coalescents, also contain ethylene glycol, propylene glycol etc. as antifreezing agent, these compositions also can impact health.Wherein, ethylene glycol causes the arch-criminal of fetal anomaly just.In addition, the persistency of current water-based nail polish is poor, easily come off, and color is also not ideal enough.
UV nial polish adopts the mode of ultraviolet light polymerization to accelerate the drying of nial polish, reduces the time waited for, avoids the unexpected moulding caused in dry run to destroy.UV nial polish occupies critical role in manicure field in recent years.But UV nial polish can must solidify under irradiation under ultraviolet ray, therefore must coordinate ultraviolet light polymerization nail beauty machine to use.The curing light source of current nail beauty machine is mainly divided into two kinds: ultraviolet lamp tube and UV LED (UV-LED).Comprise UVA, UVB in the light that the former sends and a small amount of UVC etc. may be there is, and the latter mainly sends UVA light.UVC wave-length coverage is 200 ~ 280 nm, also known as shortwave sterilizing ultraviolet, very large to the damage of skin, and short irradiation just can skin ambustion, and long-term or high strength irradiation also can cause skin carcinoma.UVB wavelength 280 ~ 315 nm, is also called medium wave erythemal effect ultraviolet, has erythema effect to human body, and long-term or excessive exposure can make skin tanning, and causes red and swollen decortication.UVA wavelength 315 ~ 380 nm, is also called long wave black speck effect ultraviolet, has very strong penetration power, the skin corium of the skin that can go directly, and destroys elastic fiber and collagen fabric, causes skin tanning.Therefore, ultra-violet curing nial polish is adopted to there is photochemistry harm.In addition, bonding very firm with fingernail after the drying of UV nial polish, must be removed by the mode of polishing.And in bruting process, true first first face will inevitably be injured, cause fingernail thinning, easy to crack.Meanwhile, also damage can be caused to pulmonary after the fine particle (PM2.5) that polishing produces is inhaled into human body.Therefore, UV nial polish is not suitable for frequent use.
At the beginning of 2015 5 months, New York Times has published one section of degree of depth investigation report, discloses the present situation (http://cn.nytstyle.com/living/20150508/t08nails/) of U.S.'s manicure industry.Reporter Sarah Maslin Nir and asian ancestry special correspondent team thereof last 1 year and investigate further New York nail salon, disclose the infringement that manicuristisn is subject to toxic chemical substance for a long time in report, become the victim of poisonous manicure cosmetics.Increasing medical research shows, there is very strong relatedness between the chemicals allowing manicure and cosmetics play effectiveness and serious health problem, and various respiratory tract disease and dermatosis are modal problems.In addition, the probability of cancer, fetal development exception, miscarriage and other Reproductive Health etc. rises all to some extent.For this investigation report of New York Times, the government department such as New York, city has also put into effect new policies, rectifies nail salon energetically, formulates the mandatory new regulation of manicure salon, to protect the safety of manicuristisn.But these rules are cured the symptoms, not the disease, the healthy and safe hidden danger that manicure cosmetics in use exist fundamentally can not be solved.
Therefore, be necessary that exploitation one generic operation is simple, environment-protecting asepsis, remove nial polish easily, meeting while women likes to be beautiful and pursue, the healthy and safe of user and manicuristisn be guaranteed.
Summary of the invention
The object of the present invention is to provide a kind of environment-protecting asepsis, remove nial polish and preparation method thereof easily.
Nial polish provided by the invention is a kind of nial polish of visible-light curing, and its component comprises oligomer 2 ~ 98 wt%, reactive diluent 2 ~ 98 wt %, visible light initiator 0.01 ~ 10 wt%, brightener 0.01 ~ 1 wt%, pigment 0 ~ 10 wt%; Its total amount meets 100 wt %; This nial polish environment-protecting asepsis, and solidification can be realized under the radiation of visible light of wavelength 380 ~ 780 nm.
In the present invention, described oligomer is unsaturated polyester (UP), epoxy acrylate, urethane acrylate, polyester acrylate, polyether acrylate, pure acrylic resin, epoxy resin or silicone oligomer.Described oligomer is formed by acrylic acid class monomer polymerization, band carboxylic group or hydrophilic group.
In the present invention, described reactive diluent is the diluent with reactive group, is selected from the styrene (St) of simple function group, vinyl pyrrolidone (NVP), vinylacetate (VA), butyl acrylate (BA), Isooctyl acrylate monomer (EHA), (methyl) crylic acid hydroxy ester (HEA, HEMA, HPA); Or be selected from 1, the 6-hexanediyl ester (HDDA), tripropylene glycol diacrylate (TPGDA), neopentylglycol diacrylate (NPGDA) etc. of difunctional; Or be selected from multi-functional trimethylolpropane triacrylate (TMPTA).
In the present invention, the response wave length of described visible light initiator, within the scope of 380 ~ 780 nm, can impel photocuring reaction to occur.Described visible light initiator is selected from camphorquinone (CQ), titanium is luxuriant, sulfo-stings pyridine ketone/iodine salt system, organic peroxide systems, borate/dye system, hexa-aryl bi-imidazole/dye system, coumarin ketone/dye system light trigger.
In the present invention, described brightener is selected from the brightener of organosilicon or non-silicon class.
In the present invention, described pigment is organic pigment or the inorganic pigment of environment-protecting asepsis.
Nial polish of the present invention can realize quick-drying in visible-light curing nail beauty machine, also can realize solidification more lentamente under the irradiation of sunlight or other normal illumination sources.
Nial polish usable concentration of the present invention is greater than saline solution or the removal of sodium bicarbonate water of 20 wt%, and without the need to polishing, use safety, can not damage fingernail.
Above-mentioned visible-light curing nial polish, its preparation process comprises the following steps:
(1) in formulation weight ratio, by various mixing of materials such as oligomer, reactive diluent, visible light initiator, face, brighteners;
(2) at normal temperatures and pressures, by material stirring or grinding, make it reach decentralized photo, the fineness of requirement is 3 ~ 10 μm, and blender rotating speed is 800 ~ 1500 rpm.
Visible-light curing nial polish of the present invention, has merged the advantage of water-based nail polish and UV nial polish, solves again the defect of both simultaneously, is the ideal scheme eliminating nail-care products health hazard.Its advantage is as follows:
Nial polish safety non-toxic, harmless healthy.Nial polish adopts the acrylic resin of aqueous and initiator to synthesize, and not containing poisonous organic solvent, not containing the carcinogen such as benzene, formaldehyde, not containing the chemicals such as coalescents and antifreezing agent, has no irritating odor.Raw material safety non-toxic, direct cutaneous can contact, can not cause Health cost to human body.
Simple to operate, quick-drying light, Diamond Search.After being painted with nial polish, only need be placed on irradiation in nail beauty machine two, three minutes can be dry, obtains in riotous profusion beautiful color and manicure effect.If do not use nail beauty machine, leave standstill a period of time in the sun or under conventional light, also can natural drying, reach same and dress up effect.Nial polish, in dry run, also can not discharge gas with foreign flavor, Diamond Search, environment-protecting asepsis.
Without the need to ultraviolet radiation, avoid skin damage, tanned.Adopt visible-light curing, without the need to accepting ultraviolet lighting.Not containing UV source in nail beauty machine, avoid injury and the damage of ultraviolet light.Need not worry that frequent manicure can cause that hand skin is injured, coarse, the problem of blackening again.
Without the need to thermal source, burn is avoided to hinder.Can be dry under illumination, do not need thermal source to heat nial polish yet, need not worry that operate miss causes the problems such as scald.
It is convenient to remove, and nor-hydromining food grade materials, use is felt at ease.Water-fast after nial polish drying, oil resistant, difficult drop-off.But minimizing technology is simple, only need to remove with the nor-water of special alkalescence and erasable.Without the need to polishing, avoid fine particle and suck the pulmonary lesion caused.Nor-hydromining food stage raw material is made, and main component is saline solution or the sodium bicarbonate water of high concentration, safe without toxic side effect.Life-time service also can not cause that fingernail is dim, the problem such as tarnish.Also can add a small amount of nutritional labeling in nor-water, while nial polish can being removed again, play the effect of nourishing fingernail.
Detailed description of the invention
Below in conjunction with example, the present invention will be further described.Described embodiment is only section Example of the present invention.Do not make other all embodiments of creative achievement based on the embodiment in the present invention, all belong to protection scope of the present invention.
Embodiment 1: visible-light curing nial polish of the present invention, its component adopts acrylate system, and camphorquinone is as visible light initiator, and organosilicon is as brightener.By the TMPTA mixed material feeding of the camphorquinone of the pure acrylate resin of 95.5 wt%, 2 wt%, the organosilicon of 0.5 wt% and 2 wt %, under normal temperature and pressure conditions, stirring with the speed of 1000 rpm in blender makes it reach decentralized photo, fineness reaches 5 μm, just can produce transparent light nial polish.
Embodiment 2: adopt that the titanium of the urethane acrylate of 88 wt%, 1 wt% is luxuriant, the organosilicon of 1 wt%, the HDDA of 5 wt % and the permanent bordeaux mixed material feeding of 5 wt%, under normal temperature and pressure conditions, grinding makes its fineness reach 3 μm, just can produce red visible-light curing nial polish.
Embodiment 3: adopt the epoxy resin of wt %, the organic peroxide of 10 wt%, brightener OD279, the EHA of 10 wt % of 0.1 wt% and the phthalocyanine blue of 10 wt%, under normal temperature and pressure conditions, stir with the speed of 800 rpm after mixing, its fineness reaches 10 μm, just can produce blue visible-light curing nial polish.
Nial polish raw material environment-protecting asepsis of the present invention, has no irritating odor, and can realize rapid draing in visible-light curing nail beauty machine, also can under the irradiation of sunlight natural drying.Which avoid the ultraviolet light harms that existing manicure technology adopts ultra-violet curing to cause, also do not worry that suction or contact skin cause various health problem to harmful substance.
The beautiful gloss of dried nial polish, and fit firmly with fingernail, difficult drop-off, can not be dissolved in oils and fats or beverage.Therefore go after finger scribbles visible-light curing nial polish of the present invention to capture food, also do not worry to take in harmful substance because of nial polish.
Visible-light curing nial polish of the present invention is removed convenient, as long as be greater than the saline solution of 20 wt% by concentration or sodium bicarbonate water just can be wiped, do not need to polish, use safety, can not damage fingernail, also can not cause the suction of fine particle.
Claims (7)
1. a nial polish for visible-light curing, is characterized in that concrete component is: oligomer 2 ~ 98 wt%, reactive diluent 2 ~ 98 wt %, visible light initiator 0.01 ~ 10 wt%, brightener 0.01 ~ 1 wt%, pigment 0 ~ 10 wt%; Its total amount meets 100 wt %; This nial polish realizes solidification under the radiation of visible light of wavelength 380 ~ 780 nm.
2. the nial polish of visible-light curing according to claim 1, is characterized in that described oligomer is unsaturated polyester (UP), epoxy acrylate, urethane acrylate, polyester acrylate, polyether acrylate, pure acrylic resin, epoxy resin or silicone oligomer.
3. the nial polish of visible-light curing according to claim 1 and 2, is characterized in that described reactive diluent is selected from styrene, vinyl pyrrolidone, vinylacetate, butyl acrylate, Isooctyl acrylate monomer, (methyl) crylic acid hydroxy ester of simple function group; Or be selected from 1,6-hexanediyl ester, tripropylene glycol diacrylate, the neopentylglycol diacrylate of difunctional; Or be selected from multi-functional trimethylolpropane triacrylate.
4. the nial polish of visible-light curing according to claim 1 and 2, it is characterized in that the response wave length of described visible light initiator is within the scope of 380 ~ 780 nm, photocuring reaction can be impelled to occur, be specifically selected from camphorquinone, titanium is luxuriant, sulfo-stings pyridine ketone/iodine salt system, organic peroxide systems, borate/dye system, hexa-aryl bi-imidazole/dye system, coumarin ketone/dye system light trigger.
5. the nial polish of visible-light curing according to claim 1 and 2, is characterized in that described brightener is selected from the brightener of organosilicon or non-silicon class.
6. the nial polish of visible-light curing according to claim 1 and 2, is characterized in that described pigment is selected from organic pigment or the inorganic pigment of environment-protecting asepsis.
7. a preparation method for the visible-light curing nial polish as described in one of claim 1-6, is characterized in that concrete steps are:
(1) in formulation weight ratio, by oligomer, reactive diluent, visible light initiator, pigment, the various mixing of materials of brightener;
(2) at normal temperatures and pressures, by material stirring or grinding, make it reach decentralized photo, fineness is 3 ~ 10 μm, and blender rotating speed is 800 ~ 1500 rpm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510470331.6A CN105012160A (en) | 2015-08-05 | 2015-08-05 | Visible light curing nail enamel and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510470331.6A CN105012160A (en) | 2015-08-05 | 2015-08-05 | Visible light curing nail enamel and preparation method thereof |
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| CN105012160A true CN105012160A (en) | 2015-11-04 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201510470331.6A Pending CN105012160A (en) | 2015-08-05 | 2015-08-05 | Visible light curing nail enamel and preparation method thereof |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI568452B (en) * | 2015-11-23 | 2017-02-01 | Light curing nail polish | |
| CN107502040A (en) * | 2016-06-14 | 2017-12-22 | 中国科学院化学研究所 | A kind of visible-light curing solvent-free type environment-friendly ink composite |
| CN110693938A (en) * | 2019-10-23 | 2020-01-17 | 云南省农业科学院药用植物研究所 | Method for processing gentiana rigescens |
| CN111875755A (en) * | 2020-07-21 | 2020-11-03 | 珠海展辰新材料股份有限公司 | Primer resin, preparation method thereof and nail polish primer |
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| CN102423287A (en) * | 2011-11-24 | 2012-04-25 | 天津美嘉美涂料有限公司 | Ultraviolet light cured nail polish and production method thereof |
| CN102766399A (en) * | 2012-07-31 | 2012-11-07 | 上海零玖科技有限公司 | Gel polish, LED gel polish and LED nail polish |
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2015
- 2015-08-05 CN CN201510470331.6A patent/CN105012160A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102423287A (en) * | 2011-11-24 | 2012-04-25 | 天津美嘉美涂料有限公司 | Ultraviolet light cured nail polish and production method thereof |
| CN102766399A (en) * | 2012-07-31 | 2012-11-07 | 上海零玖科技有限公司 | Gel polish, LED gel polish and LED nail polish |
Non-Patent Citations (2)
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| 肖辉主编: "《电气照明技术》", 31 July 2015, 机械工业出版社 * |
| 金养智编: "《光固化材料性能及应用手册》", 31 July 2010, 化学工业出版社 * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI568452B (en) * | 2015-11-23 | 2017-02-01 | Light curing nail polish | |
| CN107502040A (en) * | 2016-06-14 | 2017-12-22 | 中国科学院化学研究所 | A kind of visible-light curing solvent-free type environment-friendly ink composite |
| CN110693938A (en) * | 2019-10-23 | 2020-01-17 | 云南省农业科学院药用植物研究所 | Method for processing gentiana rigescens |
| CN111875755A (en) * | 2020-07-21 | 2020-11-03 | 珠海展辰新材料股份有限公司 | Primer resin, preparation method thereof and nail polish primer |
| CN111875755B (en) * | 2020-07-21 | 2023-03-31 | 珠海展辰新材料股份有限公司 | Primer resin, preparation method thereof and nail polish primer |
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Application publication date: 20151104 |
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