CN104988467B - A kind of ion gun attending device and ion gun maintaining method - Google Patents
A kind of ion gun attending device and ion gun maintaining method Download PDFInfo
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- CN104988467B CN104988467B CN201510408020.7A CN201510408020A CN104988467B CN 104988467 B CN104988467 B CN 104988467B CN 201510408020 A CN201510408020 A CN 201510408020A CN 104988467 B CN104988467 B CN 104988467B
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- ion gun
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- corrugated pipe
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Abstract
The present invention relates to ion beam sputtering deposition technical field, more particularly to a kind of ion gun attending device and ion gun maintaining method, ion gun is safeguarded into chamber separates with vacuum cavity by push-pull valve to set, ion gun is safeguarded vacuum cavity not being exposed under atmospheric environment, avoids the pollution of vacuum cavity；And due to having installed insulation blocking sleeve additional on the outside of ion gun; so that proper motion of the radio-frequency ion source without interference with charged particle in cavity; when carrying out coating process, ion gun can move inside vacuum cavity; adjustable target source distance; change beam spot size and line spatial distribution, and then adjust thin film deposition quality and space distribution situation.
Description
Technical field
The present invention relates to ion beam sputtering deposition technical field, more particularly to a kind of ion gun attending device and ion gun dimension
Maintaining method.
Background technology
At present, the ion gun used in ion beam sputtering deposition equipment is directly connected on vacuum cavity.It is generally used for
The ion gun that plated film uses needs periodic maintenance, is divided into cleaning quartz cavity (radio-frequency ion source) and changes resistance wire (direct-current ion
Source).Current maintaining method is to open whole vacuum cavity, and ion gun is carried out under conditions of whole vacuum chamber is exposed into air
Maintenance.Because ion gun with the connection of vacuum cavity is to be fixedly connected by flange or connected by vacuum corrugated pipe
Connect, open vacuum cavity and ion gun is safeguarded, vacuum cavity, which is exposed in atmospheric environment, can to adhere to very on cavity
The gas molecules such as water, oxygen in more air, next time using prolonged vacuum is needed, not only lose time, while can
Target used in sputtering can be polluted, influence experimental result.
Further, since worrying that radio-frequency ion source can have an impact to the track of the powered line in vacuum cavity, therefore will penetrate
Frequency ion gun is fixedly mounted on outside vacuum cavity, it is impossible to is adjusted its spacing between sputtering target material, is influenceed experiment parameter
The flexibility that regulation and equipment use.
The content of the invention
In view of the above problems, the present invention provides a kind of ion gun attending device and ion gun maintaining method, only by setting
Vertical ion gun safeguards chamber, and ion gun is safeguarded into chamber separates with vacuum cavity using small-sized push-pull valve.Ion gun safeguards chamber
Rear portion uses vacuum corrugated pipe, and front portion is connected using seamless vacuum tube by vacuum flange with vacuum cavity, in bellows interior
Insulation blocking sleeve is provided with, the insulating barrier and screen layer that insulation blocking sleeve is set gradually by ecto-entad form, for preventing from penetrating
Frequency power impacts to the powered beam trace in vacuum cavity.Insulating layer material selects the nonmetallic materials such as polyimides,
Screen layer is using metal materials such as copper mesh.Vacuum corrugated pipe is fixed on one end of seamless vacuum tube using push-pull device at fixed, and controls
Its movement forward, backward.A vacuum interface, the connection for vacuum pump group are left on seamless vacuum tube.
Technical scheme is used by the present invention solves above-mentioned technical problem：
There is provided a kind of ion gun attending device, it is characterised in that the maintenance after coating operation, institute are carried out based on vacuum cavity
Stating ion gun attending device includes：
Seamless vacuum tube, there are two openends, and an openend is penetrated by vacuum flange and the vacuum cavity
Connection；
Vacuum corrugated pipe, telescopically it is plugged in another openend of the seamless vacuum tube；
Ion gun insulation blocking sleeve, ion gun is provided with the ion gun insulation blocking sleeve, and ion gun isolation is protected
Sheath is arranged inside the vacuum corrugated pipe, passes through the flexible drive of the vacuum corrugated pipe ion gun insulation blocking sleeve
And internal ion gun moves to the vacuum cavity to carry out the coating operation, or drive the ion gun insulation blocking sleeve
And internal ion gun removes the vacuum cavity to carry out the attended operation；And
Be provided with push-pull valve on the vacuum flange, in the attended operation by the ion source apparatus with it is described
Vacuum cavity is isolated.
Preferably, above-mentioned ion gun attending device, wherein, the ion gun in the ion gun insulation blocking sleeve is radio frequency
Ion gun or direct-current ion source.
Preferably, above-mentioned ion gun attending device, wherein, the ion gun insulation blocking sleeve includes：
Screen layer, the outer surface of the ion gun is wrapped in, to shield galvanomagnetic-effect caused by the ion gun；
Insulating barrier, the outer surface of the screen layer is wrapped in, the screen layer is isolated with the vacuum corrugated pipe.
Preferably, above-mentioned ion gun attending device also includes：
Push-pull device at fixed, be fixedly installed on outside the vacuum corrugated pipe and with another opening of the seamless vacuum tube
End connection, control the dilatability of the vacuum corrugated pipe by adjusting the push-pull device at fixed, so as to drive the ion gun every
Ion gun from protective case and inside is moved in the vacuum cavity or removed from the vacuum cavity.
Preferably, above-mentioned ion gun attending device, wherein, the push-pull device at fixed is that can fix support and can push-and-pull
Lead screw, resilientiy stretchable structure or memorial alloy, to support the vacuum corrugated pipe and control stretching for the vacuum corrugated pipe
Contracting degree, and
Scale is provided with the push-pull device at fixed, to mark the telescopic level of the vacuum corrugated pipe.
Preferably, above-mentioned ion gun attending device, wherein, a vacuum interface is provided with the seamless vacuum tube, with
For vacuumizing or filling protective gas.
The present invention also provides a kind of ion gun maintaining method, it is characterised in that based on above-mentioned ion gun attending device, institute
The method of stating includes：
The ion gun insulation blocking sleeve and the ion gun of inside are removed institute by flexible by the vacuum corrugated pipe
After stating vacuum cavity, the push-pull valve, the ion gun and the vacuum ripple of the ion gun insulation blocking sleeve and inside are closed
The ion gun that line pipe and the seamless vacuum tube form the airtight vacuum isolated with the vacuum cavity safeguards chamber；
After protective gas to atmospheric pressure is filled during the ion gun safeguards chamber, it is described to open to dismantle the vacuum flange
Ion gun safeguards chamber, and attended operation is carried out to the ion gun in the ion gun insulation blocking sleeve；And
The protective gas is continually fed into during the attended operation, the ion gun is safeguarded that chamber is in protective gas
Under atmosphere.
Preferably, above-mentioned ion gun maintaining method, wherein, the protective gas is that nitrogen, argon gas or other inertia are protected
Protect gas.
Preferably, above-mentioned ion gun maintaining method, wherein, the attended operation includes cleaning the ion gun, replacing
Ion source component changes the ion gun.
Preferably, above-mentioned ion gun maintaining method also includes：
After the completion of the attended operation, stop filling protective gas, the vacuum flange is installed；
Safeguard that chamber is vacuumized so that the ion gun safeguards the vacuum of chamber and the vacuum chamber to the ion gun
When the vacuum of body is suitable, the push-pull valve is opened, the ion gun is connected with the vacuum cavity.
Above-mentioned technical proposal has the following advantages that or beneficial effect：Ion gun attending device and the ion gun dimension of the present invention
Maintaining method, ion gun is safeguarded into chamber and vacuum cavity point by setting independent ion gun to safeguard chamber, and using small-sized push-pull valve
Every, not by vacuum cavity be exposed to atmospheric environment under ion gun is being safeguarded, avoid the pollution of vacuum cavity；And by
Insulation blocking sleeve has been installed additional on the outside of ion gun so that ion gun normally moves without interference with charged particle in cavity, and
Ion gun can move inside vacuum cavity, adjustable target source distance, change beam spot size and line spatial distribution, and then
Adjust thin film deposition quality and space distribution situation.
Brief description of the drawings
By reading the detailed description made with reference to the following drawings to non-limiting example, the present invention and its feature, outside
Shape and advantage will become more apparent.The identical mark instruction identical part in whole accompanying drawings.Not can according to than
Example draws accompanying drawing, it is preferred that emphasis is shows the purport of the present invention.
Fig. 1 is the schematic diagram of the ion gun attending device of the present invention；
Fig. 2 is the vacuum corrugated pipe and its internal structure schematic diagram of the ion gun attending device of the present invention.
Embodiment
Reference picture 1, ion gun attending device of the invention, applied on the vacuum cavity 7 of ion beam sputtering deposition technique,
An opening 71 is provided with vacuum cavity 7, ion gun attending device of the invention is connected by the opening 71 and the insertion of vacuum cavity 7
Connect.
Specifically, the ion gun attending device of the present invention mainly includes：Seamless vacuum tube 1, one end are passed through by vacuum flange 4
Lead to and be connected on vacuum cavity 7, the other end is connected with vacuum corrugated pipe 3, and the other end of vacuum corrugated pipe 3 is connected with ion gun end
End-stopping plate 8, plays a part of sealing.The optional equipments such as cable are also associated with the other end of ion gun end stop 8.In vacuum
On flange 4, push-pull valve 2 is provided with, opens the push-pull valve 2, seamless vacuum tube 1 and vacuum corrugated pipe 3 penetrate with vacuum cavity 7
Connection (when actually carrying out attended operation, seamless vacuum tube 1 and vacuum corrugated pipe 3 form closed ion gun and safeguard chamber),
Namely whole ion gun safeguards that chamber and vacuum cavity 7 form a confined space；The push-pull valve 2 is closed, then ion gun is safeguarded
Chamber separates with vacuum cavity 7, and ion gun safeguards that chamber independently forms two confined spaces with vacuum cavity 7, now in ion gun
The maintenance that ion gun is carried out in chamber is safeguarded, any influence will not be produced on vacuum cavity 7.It is additionally provided with seamless vacuum tube 1 true
Null interface 5, the protective gas such as chamber filling nitrogen are vacuumized and ion gun are safeguarded for connecting vacuum pump group.
The internal structure of vacuum corrugated pipe 3 is as shown in Fig. 2 it is internally provided with ion gun insulation blocking sleeve, in ion gun
Ion gun 31 is provided with insulation blocking sleeve, and (including quartz cavity or resistance wire and other auxiliary equipments, quartz cavity are used to provide
Radio-frequency ion source, resistance wire is used to provide direct-current ion source, specifically from quartz cavity or resistance wire according to coating process needs
Depending on the difference in radio-frequency ion source or direct-current ion source).The ion gun insulation blocking sleeve is by the screen layer that sets from inside to outside
32 and insulating barrier 33 form, screen layer 32 is wrapped in outside ion gun 31, and insulating barrier 33 is wrapped in outside screen layer 32, is used for
When ion gun 31 is pushed into progress ion beam sputtering deposition operation in vacuum cavity 7, prevent radio-frequency power supply in vacuum cavity
Powered line proper motion impact.Screen layer 32 is using metal materials such as copper mesh, and insulating barrier 33 is from polyimides etc.
Non-metal insulating material.It is vacuum corrugated pipe 3 in the outside of insulating barrier 33.
As a preferred embodiment, the vacuum corrugated pipe 3 is telescopic mounting, by adjusting vacuum corrugated pipe 3
Dilatability drives the ion gun 31 being provided at its inner portion and the screen layer 32 and insulating barrier 33 to move to or remove vacuum cavity 7.
The vacuum corrugated pipe 3 is fixed on one end of seamless vacuum tube 1 using four lead screw 6, and the lead screw 6 can adjust push-and-pull,
To control vacuum corrugated pipe 3 to forward and backward dilatability, and the scale set in lead screw 6 can mark stretching for vacuum corrugated pipe 3
Contracting degree.When carrying out ion beam sputtering deposition technique, set screw bar 6, compress vacuum corrugated pipe 3, to drive ion gun
31 promote inside vacuum cavity 7 together with its outside screen layer 32 and insulating barrier 33；And when ion gun 31 (including radio frequency from
Component or direct-current ion source) need to safeguard, that is, when carrying out ion gun attended operation, by set screw bar 6, make vacuum ripple
Pipe 3 stretches, and to drive ion gun 31 to remove vacuum cavity 7 together with screen layer 32 and insulating barrier 33, and closes push-pull valve
2, with cause ion gun 31 together with screen layer 32 and insulating barrier 33, vacuum corrugated pipe 3 and seamless vacuum tube 1 formed it is closed from
Component safeguards chamber.
It should be noted that the hardness of lead screw 6 is larger, play a part of fixed support；Meanwhile the work of push-and-pull is played again
With.Therefore, the lead screw 6 can be replaced other push-pull device at fixed, as long as it can fix support and can push-and-pull.
When ion gun 31 (including quartz cavity or resistance wire) needs to safeguard, set screw bar 6, vacuum corrugated pipe is controlled
3 stretching, to cause ion gun 31 to remove vacuum cavity 7 together with screen layer 32 and insulating barrier 33, now ion gun 31 connects
Ion gun, which is formed, with screen layer 32 and insulating barrier 33, vacuum corrugated pipe 3 and seamless vacuum tube 1 safeguards chamber；It is then switched off plate
Valve 2, ion gun is safeguarded that chamber separates with vacuum cavity 7, formed two independent airtight chamber, now ion gun safeguard chamber with
Vacuum cavity 7 is completely independent.
Afterwards, vacuum interface 5 is opened, by protective gas (preferably inert gas, such as drying nitrogen etc.) injection ion
Source is safeguarded in chamber until under atmospheric pressure, backs out the screw of vacuum flange 4, is opened ion gun and is safeguarded chamber, is continually fed into drying nitrogen,
So that follow-up attended operation is constantly in drying nitrogen environment；Attended operation can be carried out.
Further, the degree safeguarded as needed, insulating barrier 33 and screen layer 32 are dismantled, change resistance wire (direct current from
Component) or cleaning quartz cavity (radio-frequency ion source), to carry out a series of attended operation to radio-frequency ion source or direct-current ion source.
After maintenance, screen layer 32 and insulating barrier 33 are installed, and vacuum flange 4 is installed, simultaneously closes off nitrogen injection and connects
Mouthful, vacuum interface 5 is connected to vacuum pump group, safeguards that chamber carries out vacuum pumping to ion gun；When ion gun is safeguarded in chamber
When vacuum is suitable with vacuum cavity 7, push-pull valve 2 is opened, connection ion gun is safeguarded chamber and vacuum cavity 7, then entirely safeguarded
Journey terminates.
Finally, ion gun 31 (including quartz cavity or resistance wire) is pushed into together with screen layer 32 and insulating barrier 33
In vacuum cavity 7, ion beam sputtering deposition technique is carried out to facilitate.
In summary, will by push-pull valve the invention discloses a kind of ion gun attending device and ion gun maintaining method
Ion gun is safeguarded that chamber separates with vacuum cavity and set, and ion gun is tieed up vacuum cavity not being exposed under atmospheric environment
Shield, avoids the pollution of vacuum cavity；And due to having installed insulation blocking sleeve additional on the outside of ion gun so that ion gun without interference with
Charged particle normally moves in cavity, and ion gun can move inside vacuum cavity in coating operation, adjustable
Target source distance is saved, changes beam spot size and line spatial distribution, and then adjust thin film deposition quality and space distribution situation.
It should be appreciated by those skilled in the art that those skilled in the art combine prior art and above-described embodiment can be with
The change case is realized, will not be described here.Such change case has no effect on the substantive content of the present invention, not superfluous herein
State.
Presently preferred embodiments of the present invention is described above.It is to be appreciated that the invention is not limited in above-mentioned
Particular implementation, wherein the equipment and structure be not described in detail to the greatest extent are construed as giving reality with the common mode in this area
Apply；Any those skilled in the art, without departing from the scope of the technical proposal of the invention, all using the disclosure above
Methods and technical content many possible changes and modifications are made to technical solution of the present invention, or be revised as equivalent variations etc.
Embodiment is imitated, this has no effect on the substantive content of the present invention.Therefore, every content without departing from technical solution of the present invention, foundation
The technical spirit of the present invention still falls within the present invention to any simple modifications, equivalents, and modifications made for any of the above embodiments
In the range of technical scheme protection.
Claims (10)
1. a kind of ion gun attending device, it is characterised in that the maintenance after coating operation, the ion are carried out based on vacuum cavity
Source attending device includes：
Seamless vacuum tube, there are two openends, and an openend passes through vacuum flange and the vacuum cavity through connection；
Vacuum corrugated pipe, telescopically it is plugged in another openend of the seamless vacuum tube；
Ion gun insulation blocking sleeve, ion gun, and the ion gun insulation blocking sleeve are provided with the ion gun insulation blocking sleeve
Be arranged inside the vacuum corrugated pipe, by the flexible drive of the vacuum corrugated pipe ion gun insulation blocking sleeve and
Internal ion gun moves to the vacuum cavity to carry out the coating operation, or drive the ion gun insulation blocking sleeve and
Internal ion gun removes the vacuum cavity to carry out the attended operation；And
Be provided with push-pull valve on the vacuum flange, in the attended operation by the ion gun insulation blocking sleeve and institute
State vacuum cavity isolation.
2. ion gun attending device as claimed in claim 1, it is characterised in that the ion in the ion gun insulation blocking sleeve
Source is radio-frequency ion source or direct-current ion source.
3. ion gun attending device as claimed in claim 1, it is characterised in that the ion gun insulation blocking sleeve includes：
Screen layer, the outer surface of the ion gun is wrapped in, to shield galvanomagnetic-effect caused by the ion gun；
Insulating barrier, the outer surface of the screen layer is wrapped in, the screen layer is isolated with the vacuum corrugated pipe.
4. ion gun attending device as claimed in claim 1, it is characterised in that the ion gun attending device also includes：
Push-pull device at fixed, it is fixedly installed on outside the vacuum corrugated pipe and connects with another openend of the seamless vacuum tube
Connect, the dilatability of the vacuum corrugated pipe is controlled by adjusting the push-pull device at fixed, so as to drive the ion gun isolation to protect
Sheath and the ion gun of inside are moved in the vacuum cavity or removed from the vacuum cavity.
5. ion gun attending device as claimed in claim 4, it is characterised in that the push-pull device at fixed supports again for that can fix
Lead screw, resilientiy stretchable structure or the memorial alloy of energy push-and-pull, to support the vacuum corrugated pipe and control the vacuum ripple
The telescopic level of line pipe, and
Scale is provided with the push-pull device at fixed, to mark the telescopic level of the vacuum corrugated pipe.
6. ion gun attending device as claimed in claim 1, it is characterised in that be provided with a vacuum on the seamless vacuum tube
Interface, for vacuumizing or filling protective gas.
7. a kind of ion gun maintaining method, it is characterised in that based on the ion gun described in any one in the claims 1-6
Attending device, methods described include：
Pass through the flexible that the ion gun insulation blocking sleeve and the removal of the ion gun of inside is described true of the vacuum corrugated pipe
After cavity body, the push-pull valve, the ion gun and the vacuum corrugated pipe of the ion gun insulation blocking sleeve and inside are closed
And the ion gun that the seamless vacuum tube forms the airtight vacuum isolated with the vacuum cavity safeguards chamber；
After protective gas to atmospheric pressure is filled during the ion gun safeguards chamber, the vacuum flange is dismantled to open the ion
Chamber is safeguarded in source, and attended operation is carried out to the ion gun in the ion gun insulation blocking sleeve；And
The protective gas is continually fed into during the attended operation, the ion gun is safeguarded that chamber is in protective gas atmosphere
Under.
8. ion gun maintaining method as claimed in claim 7, it is characterised in that the protective gas be nitrogen, argon gas or its
His inert protective gas.
9. ion gun maintaining method as claimed in claim 7, it is characterised in that the attended operation includes cleaning the ion
Source, change ion source component or change the ion gun.
10. ion gun maintaining method as claimed in claim 7, it is characterised in that also include：
After the completion of the attended operation, stop filling protective gas, the vacuum flange is installed；
Safeguard that chamber is vacuumized so that the ion gun safeguards the vacuum of chamber and the vacuum cavity to the ion gun
When vacuum is suitable, the push-pull valve is opened, the ion gun is connected with the vacuum cavity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510408020.7A CN104988467B (en) | 2015-07-10 | 2015-07-10 | A kind of ion gun attending device and ion gun maintaining method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510408020.7A CN104988467B (en) | 2015-07-10 | 2015-07-10 | A kind of ion gun attending device and ion gun maintaining method |
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| Publication Number | Publication Date |
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| CN104988467A CN104988467A (en) | 2015-10-21 |
| CN104988467B true CN104988467B (en) | 2017-12-12 |
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| CN108456862B (en) * | 2018-03-13 | 2019-12-24 | 西华大学 | Metal ion source and using method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004139770A (en) * | 2002-10-16 | 2004-05-13 | Nec Kansai Ltd | Ion implanter |
| JP2005078912A (en) * | 2003-08-29 | 2005-03-24 | Ishikawajima Harima Heavy Ind Co Ltd | Ion mass separation apparatus, ion implanter, and ion mass separation method |
| CN204898057U (en) * | 2015-07-10 | 2015-12-23 | 宁波英飞迈材料科技有限公司 | Device is maintained to ion source |
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Address after: 315000 Ningbo High-tech Zone Ningbo New Material Innovation Center East District No. 1 10-4-1, Zhejiang Province Patentee after: Ningbo Xinghe Material Technology Co., Ltd. Address before: 315040 No. 1299 Juxian Road, Ningbo High-tech Zone, Zhejiang Province Patentee before: INFINITE MATERIALS TECHNOLOGY CO., LTD. |
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