CN104953444A - Gas circulation system for excimer laser - Google Patents
Gas circulation system for excimer laser Download PDFInfo
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- CN104953444A CN104953444A CN201510388921.4A CN201510388921A CN104953444A CN 104953444 A CN104953444 A CN 104953444A CN 201510388921 A CN201510388921 A CN 201510388921A CN 104953444 A CN104953444 A CN 104953444A
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- gas
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- condenser
- excimer laser
- oxygen
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Abstract
The invention discloses a gas circulation system for an excimer laser. The gas circulation system of the excimer laser is used for circulating work gas of the excimer laser. A gas inlet pipeline and a gas outlet pipeline are arranged in a cavity of the excimer laser; the gas circulation system comprises a condenser (1), an oxygen supply device (2), a compressor (3) and a gas storage chamber (4); the gas storage chamber (4) is connected with the gas outlet pipeline, the condenser (1) and the oxygen supply device (2) respectively through valves; the oxygen supply device (2) is used for supplying oxygen to the gas storage chamber (4); the gas storage chamber (4) is used for enabling the oxygen and working gas from the cavity to react sufficiently to produce reaction gas; the condenser (1) refrigerates the reaction gas to remove impurities and outputs uncondensed gas, and the compressor (3) sucks the uncondensed gas from the condenser (4) and conveys the uncondensed gas to the cavity. The gas circulation system can effectively prolong the service life of the work gas, and the situation that output energy is reduced due to the fact that other gas is added in the purification process is avoided.
Description
Technical field
The present invention relates to a kind of gas-circulating system for excimer laser, this system, by supplementing halogen gas and removing impurity and improve excimer laser gas working life, is particularly useful for ArF, KrF excimer laser.
Background technology
Excimer laser can export the laser of ultraviolet band, and has very narrow live width and larger energy, is therefore widely used as the light source of photoetching industry.In photoetching industry, most widely used excimer laser is ArF and KrF excimer laser at present.The working gas of excimer laser be rare gas halide as ArF and KrF, be by halogen gas F
2generate with rare gas argon gas and Krypton reaction.Excimer laser is different from other gas laser, excimer laser needs to change working gas than more frequently, this is because it is exactly decay along with the growth of operating time in life-span of excimer laser working gas that excimer laser is faced with a common problem, this can cause laser to export decay and the discharge instability of energy, so when working gas is consumed, the output energy of laser can only be recovered by ventilation.The working gas of excimer laser is consumed mainly because halogen gas can react with the cavity material of laser inside, some impurity undesirably obtained also are generated while these reactions consume halogen gas, its consequence is that on the one hand excimer laser exports energy because the reduction of halogen gas causes and declines, the generation of impurity can cause producing filamentous electric discharge between excimer laser electrode thus destroy the uniformity of electric discharge on the other hand, and more serious consequence is that laser cannot normally work.Prior efforts personnel are the normal work keeping laser by constantly taking a breath, but this can cause the consumption of a large amount of expensive working gas, causes the job costs of laser very high.Staff adopted the mode of a small amount of supplementary halogen gas to increase the life-span of working gas afterwards, but this method cannot remove the impurity produced in laser works process, fundamentally can not solve the problem of filament electric discharge.Staff removes the impurity in working gas by the mode of cold-trap afterwards again, but in order to effectively remove impurity, condenser temperature will be set to subzero 180 DEG C, so low temperature is infeasible for KrF excimer laser, because the activity that temperature low like this can reduce Kr even causes it to liquefy.Staff with the addition of oxygen in the working gas of excimer laser afterwards again, and oxygen removes these impurity generated by cold-trap again with the gas that impurity reaction solution temperature is high.This scheme can improve the life-span of excimer laser working gas really, however due to oxygen add membership cause laser output energy decline 20% to 30%.
Existing scheme also has employing direct liquefaction impurity CF
4mode, but the condensing temperature of this impurity very low (subzero 128.06 DEG C), the mode of liquefaction is adopted effectively to remove the low temperature environment of subzero 180 DEG C of this impurity needs, such low temperature can cause the activity decrease of rare gas Kr in working gas even to liquefy, so be not suitable for KrF excimer laser.
Summary of the invention
(1) technical problem that will solve
To be solved by this invention is that the method in existing raising excimer laser working gas life-span can not reduce costs, and can not remove the impurity in working gas, or restricted application, or causes laser to export the defect of the decline of energy.
(2) technical scheme
For solving the problem, the present invention proposes a kind of gas-circulating system for excimer laser, excimer laser comprises cavity, this cavity has and enters pipeline and outlet pipe, gas-circulating system comprises condenser, oxygen generator, compressor and air storage chamber, and described air storage chamber is connected by valve with described outlet pipe, condenser, oxygen generator respectively; Described oxygen generator is used for providing oxygen to described air storage chamber; Described air storage chamber has certain volume, for holding the oxygen that provided by described oxygen generator and the working gas from described cavity, and this oxygen and this working gas is fully reacted, reaction of formation gas; Described condenser is used for freezing to described reacting gas, exports the gas be not condensed; Described compressor is for extracting the gas that is not condensed in described condenser and being transported in described cavity.
According to the specific embodiment of the present invention, described working gas comprises rare gas, halogen gas and buffer gas.
According to the specific embodiment of the present invention, described rare gas is Kr gas or Ar gas, and described halogen gas is fluorine gas.
According to the specific embodiment of the present invention, the temperature in described condenser is-80 DEG C ~-120 DEG C.
According to the specific embodiment of the present invention, described condenser comprises the insulating barrier of wall and parcel wall periphery, and the structure of described insulating barrier is cavity structure, can be filled with cryogenic media, for keeping the low temperature of described wall in it.
According to the specific embodiment of the present invention, the inside of described wall is filled with copper staple.
According to the specific embodiment of the present invention, also comprise premix gas generator, it is connected to the admission line of described cavity by valve, for providing initial working gas for described cavity.
According to the specific embodiment of the present invention, also comprise halogen gas generator, it is connected to the admission line of described cavity by valve, for supplementing halogen gas for described cavity.
(3) beneficial effect
The present invention can effectively reduce rate of ventilation and improve the service life reduction of the working gas operating cost of laser, laser can't be caused owing to adding other gas, output energy to be declined to a great extent in dedoping step simultaneously.
Accompanying drawing explanation
Fig. 1 is the theory structure schematic diagram of the gas-circulating system for excimer laser of the present invention;
Fig. 2 is the structural representation of an embodiment of the gas-circulating system for excimer laser of the present invention.
Embodiment
The present invention draws a kind of gas-circulating system, improves excimer laser gas working life by supplementary halogen gas and removal impurity.First system of the present invention supplements the halogen gas prolongation laser works time by being interrupted, when being interrupted supplementary halogen gas and efficient recovery laser cannot being had to export energy, adopt and partly extract the gas worked long hours out, by then removing impurity with cold-trap with oxygen reaction outside chamber, finally the gas after purification being filled back in chamber and again utilizing.So both recovered export energy improve the working gas life-span again save cost.By the charge of spectrometer analysis oxygen, while ensureing that impurity is fully reacted, oxygen does not remain, and both effectively eliminates impurity like this, can not decline to a great extent again because of the output energy caused containing excessive oxygen in excimer laser chamber.
For making the object, technical solutions and advantages of the present invention clearly understand, below in conjunction with specific embodiment, and with reference to accompanying drawing, the present invention is described in further detail.
Excimer laser in the course of the work, halogen gas in the impurity that its working gas contains itself and working gas can absorb with the impurity that material reaction in chamber produces the electronics and lasing photon that preionization produces, laser is consequently caused to export the decay of energy, and interelectrode uneven electric discharge.Must working gas be changed to solve the problem in early days, causing laser operating cost very high.In the evolution of excimer laser, staff determines the impurity mainly CF in excimer laser working gas by means such as mass spectrometers
4, this impurity is by the F in working gas
2react with material in chamber and to generate.Therefore, the working life in order to improve excimer laser just needs effective this impurity of removal.
Fig. 1 is the schematic diagram of the gas-circulating system that the present invention proposes.As shown in Figure 1, gas-circulating system of the present invention comprises condenser 1, oxygen generator 2, compressor 3 and air storage chamber 4.Air storage chamber 4 is connected by valve with the outlet pipe of cavity of excimer laser, condenser 1, oxygen generator 2 respectively.
At this, the valve between excimer laser and air storage chamber 4 is called the first valve 5, the valve between oxygen generator 2 and air storage chamber 4 is called the second valve 6, the valve between condenser 1 and air storage chamber 4 is called the 3rd valve 7.Again see Fig. 1, condenser 1 is also communicated with compressor 3 by pipeline, and 3, compressor is communicated with the cavity of excimer laser via the 4th valve 8.
The cavity of excimer laser has admission line, outlet pipe, and inside is filled with working gas, and working gas is made up of rare gas, halogen gas and buffer gas.Oxygen generator 2 is for providing oxygen to air storage chamber 4; Air storage chamber 4 has certain volume, for holding the oxygen that provided by oxygen generator 2 and by the working gas from described cavity, and this oxygen and this working gas is fully reacted, reaction of formation gas.Condenser 1, for freezing to reacting gas, exports the gas be not condensed; Compressor 3 is for extracting the gas that is not condensed in condenser 4 and being transported in the cavity of excimer laser;
System energy extraction section working gas of the present invention, and reuse after removing impurity.Referring to Fig. 1, its operation principle is described.
Because laser can produce impurity (such as CF in the long course of work
4), too much impurity can the electronics that produces of a large amount of absorbing laser device preionization and lasing photon, causes on the one hand and exports declining to a great extent of energy, can cause producing filamentous electric discharge between electrode on the other hand, destroy Uniform discharge, even cause laser normally to work.Now, in order to recover the normal output level of laser, need to bleed to excimer laser part.Now, the first valve 5 is opened, and the second valve 6, the 3rd valve 7, the 4th valve 8 are closed, and like this, working gas is entered in air storage chamber 4 by pipeline.
Then, close the first valve 5, open the second valve 6, the oxygen in oxygen generator 2 is filled with in air storage chamber 4 by pipeline, take impurity as CF
4for example, oxygen and impurity (CF
4) at air storage chamber 4 fully reaction generation CO
2, COF
2and F
2, wherein CO
2and COF
2the condensing temperature of gas is apparently higher than CF
4, more easily liquefy.
When after the gas reaction in air storage chamber 4 fully, the first valve 5, second valve 6 is closed, and the 3rd valve 7 is opened, and reacted gas enters condenser 1 by pipeline and carries out removal of impurities, by non-halogen elementary gas (the such as CO in foreign gas
2and COF
2gas) liquefy.Rare gas is just only included (as Kr gas by said process gas out from cold doubtful device, subzero 153.35 DEG C of its condensing temperature, or Ar gas, subzero 185.87 DEG C of its condensing temperature), buffer gas (as Ne gas, subzero 246.06 DEG C of its condensing temperature) and halogen elementary gas be (as F
2), these be purified after gas be all the working gas of laser.
According to the present invention, in order to remove impurity, the temperature in condenser 1 should control at-80 DEG C ~-120 DEG C, is preferably-100 DEG C.
Finally, close the 4th valve 7, open the 4th valve 8, open compressor 3, compressor 3 is filled back the gas after purification in laser 1 by pipeline with recycling.
It should be noted that, gas-circulating system of the present invention can use jointly with the device of existing supplementary working gas, such as can also be connected into premix gas generator and halogen gas generator in the admission line of excimer laser, be respectively used to the working gas and the fluorine gas that provide premix, gas-circulating system, premix gas generator and fluorine gas generator can be controlled by independently valve.
To be described in detail by a specific embodiment referring to Fig. 2.Fig. 2 is the concrete structure schematic diagram of this embodiment.As shown in Figure 2, the gas-circulating system of this embodiment is used for circulating and removal of impurities to the working gas in the cavity of KrF or ArF excimer laser, and working gas comprises Kr gas or Ar gas, Ne gas and F
2gas.Gas-circulating system, except comprising condenser 1, oxygen cylinder 2, compressor 3, air storage chamber 4, also comprises premix gas cylinder 12 and fluorine gas bottle 13, and it is connected to the admission line of the cavity of excimer laser respectively by the 5th valve 14 and the 6th valve 15.
As shown in Figure 2, it comprises the insulating barrier 10 of wall 9, parcel wall 9 periphery to the condenser 1 of this embodiment, for keeping the low temperature of wall 9.In this embodiment, the structure of insulating barrier 10 is cavity structure, can be filled with cryogenic media, as liquid nitrogen or liquid helium in it.Further, the inside of wall 9 is also filled with copper staple 11.Like this, after gas enters condenser 1, foreign gas can liquefy due to higher condensing temperature, and the gas of going out from condenser 1 outlet pipe so is just only left the working gas after purifying.The copper staple 11 of filling in condenser 1 can allow foreign gas liquefy more fully.
Described in the same, in this embodiment, the admission line of cavity of excimer laser is also connected to premix gas cylinder 12 and fluorine gas bottle 13 respectively by the 5th valve 14 and the 6th valve 15.Premix gas cylinder 12 is for providing initial working gas for cavity of excimer laser, and fluorine gas bottle 13 is for supplementing fluorine gas for excimer laser.In this embodiment, the first to the 6th valve all adopts electromagnetically operated valve.
When bringing into use excimer laser, first be mixed into premix gas according to specific component and be placed in gas cylinder 20, when inflating to laser, the 5th valve 14 is opened, first valve 5, the 4th valve 8 and the 6th valve 15 are closed, and premix gas just can be filled with in laser cavity by pipeline.Excimer laser in the course of the work, exports energy and slowly decays along with the consumption of halogen gas (fluorine gas).
The rate of decay of energy is exported in order to reduce laser, the mode of being interrupted and supplementing halogen gas is adopted in this embodiment, namely in fluorine gas bottle 13, halogen gas is filled with, when laser exports energy appearance decay, 6th valve open, the first valve 5, the 4th valve 8 and the 5th valve 14 are closed, like this, fluorine gas will add in laser cavity by pipeline, and the output energy of laser will return to normal output level.Be interrupted the scheme of supplementing fluorine gas to continue along with the operation of laser, until supplement fluorine gas cannot recover the normal output level of laser always.
Now, in order to recover the normal output level of laser, need to bleed to excimer laser part.Namely open the first valve 5, close the second valve 6, the 3rd valve 7, the 4th valve 8, working gas is entered in air storage chamber 4 by outlet pipe.Then, close the first valve 5, open the second valve 6, the oxygen in oxygen cylinder 2 by being filled with in air storage chamber 4, oxygen and impurity (CF
4) at air storage chamber 4 fully reaction generation CO
2, COF
2and F
2.When after the gas reaction in air storage chamber 4 fully, the first valve 5, second valve 6 is closed, and the 3rd valve 7 is opened, and reacted gas enters condenser 1, CO by pipeline
2and COF
2gas is liquefied.By said process, from cold doubtful device 1, gas out just only includes Kr gas or Ar gas, Ne gas and fluorine gas, these be purified after gas be all the working gas of laser.Finally, close the 4th valve 7, open the 4th valve 8, open compressor 3, compressor 3 is filled back the gas after purification in laser 1 by pipeline with recycling.
Compared to prior art, the present invention is without the need to the environment of special low temperature, and the foreign gas only needing the low temperature of subzero 100 DEG C to generate with regard to the abundant liquefaction reaction of energy, is therefore applicable to KrF and ArF excimer laser.React in air storage chamber 4 simultaneously and also can generate F
2, this gas liquefaction temperature is subzero 188.2 DEG C, so can not be liquefied, can effectively reduce F in working gas
2consumption.By the present invention, gas out just just rare gas Kr gas (subzero 153.35 DEG C of condensing temperature) or Ar gas (subzero 185.87 DEG C of condensing temperature), buffer gas Ne gas (subzero 246.06 DEG C of condensing temperature) and halogen gas F from pipeline 11
2gas, these be purified after gas be all that the working gas of laser is filled back in laser by pipeline and reuses.
Therefore, system of the present invention supplements the mode of halogen gas bound fraction ventilation removal of impurities recycling by being interrupted, both effectively improve the life-span of laser works gas, greatly reduce again the operating cost of laser.And, what the present invention adopted is that oxygen reacts with impurity in air storage chamber 4, instead of by the mode of removal of impurities in direct for oxygen injection laser in prior art, therefore can not cause exporting declining to a great extent of energy because the existence of excessive oxygen causes in laser works gas.
Above-described specific embodiment; object of the present invention, technical scheme and beneficial effect are further described; be understood that; the foregoing is only specific embodiments of the invention; be not limited to the present invention; within the spirit and principles in the present invention all, any amendment made, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (8)
1. a gas-circulating system, for the working gas of the excimer laser that circulates, described excimer laser comprises cavity, and this cavity has and enters pipeline and outlet pipe, it is characterized in that:
Described gas-circulating system comprises condenser (1), oxygen generator (2), compressor (3) and air storage chamber (4), and described air storage chamber (4) is connected by valve with described outlet pipe, condenser (1), oxygen generator (2) respectively;
Described oxygen generator (2) is for providing oxygen to described air storage chamber (4);
Described air storage chamber (4) has certain volume, the oxygen provided by described oxygen generator (2) for accommodation and the working gas from described cavity, and this oxygen and this working gas are fully reacted, reaction of formation gas;
Described condenser (1), for freezing to described reacting gas, exports the gas be not condensed;
Described compressor (3) is for extracting the gas that is not condensed in described condenser (4) and being transported in described cavity.
2. gas-circulating system as claimed in claim 1, it is characterized in that, described working gas comprises rare gas, halogen gas and buffer gas.
3. gas-circulating system as claimed in claim 2, it is characterized in that, described rare gas is Kr gas or Ar gas, and described halogen gas is fluorine gas.
4. the gas-circulating system according to any one of claim 1-3, is characterized in that, the temperature in described condenser is-80 DEG C ~-120 DEG C.
5. gas-circulating system as claimed in claim 4, it is characterized in that, described condenser comprises the insulating barrier (10) of wall (9) and parcel wall (9) periphery, the structure of described insulating barrier (10) is cavity structure, cryogenic media can be filled with, for keeping the low temperature of described wall (9) in it.
6. gas-circulating system as claimed in claim 5, it is characterized in that, the inside of described wall (9) is filled with copper staple (11).
7. gas-circulating system as claimed in claim 4, it is characterized in that, also comprise premix gas generator (12), it is connected to the admission line of described cavity by valve, for providing initial working gas for described cavity.
8. gas-circulating system as claimed in claim 4, it is characterized in that, also comprise halogen gas generator (13), it is connected to the admission line of described cavity by valve, for supplementing halogen gas for described cavity.
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| CN201510388921.4A CN104953444B (en) | 2015-07-03 | 2015-07-03 | A kind of gas-circulating system for excimer laser |
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| CN104953444B CN104953444B (en) | 2018-05-01 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108367923A (en) * | 2015-10-30 | 2018-08-03 | 乔治洛德方法研究和开发液化空气有限公司 | Neon recycling/purification system and neon recycling/purification method |
| CN109217080A (en) * | 2018-10-17 | 2019-01-15 | 广州市激光技术应用研究所有限公司 | A kind of excimer laser gas control method and device |
| CN111934167A (en) * | 2020-08-19 | 2020-11-13 | 京东方科技集团股份有限公司 | Excimer laser annealing system |
| CN114520456A (en) * | 2020-11-19 | 2022-05-20 | 中国科学院微电子研究所 | Cooling system, excimer laser, and exposure apparatus |
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| CN108367923A (en) * | 2015-10-30 | 2018-08-03 | 乔治洛德方法研究和开发液化空气有限公司 | Neon recycling/purification system and neon recycling/purification method |
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| CN111934167A (en) * | 2020-08-19 | 2020-11-13 | 京东方科技集团股份有限公司 | Excimer laser annealing system |
| CN114520456A (en) * | 2020-11-19 | 2022-05-20 | 中国科学院微电子研究所 | Cooling system, excimer laser, and exposure apparatus |
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|---|---|
| CN104953444B (en) | 2018-05-01 |
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