CN104946871A - Nano-crystallization device for centrifugal accelerating injection bombardment of metal surfaces - Google Patents
Nano-crystallization device for centrifugal accelerating injection bombardment of metal surfaces Download PDFInfo
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- CN104946871A CN104946871A CN201410116811.8A CN201410116811A CN104946871A CN 104946871 A CN104946871 A CN 104946871A CN 201410116811 A CN201410116811 A CN 201410116811A CN 104946871 A CN104946871 A CN 104946871A
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Abstract
The invention discloses a nano-crystallization device for centrifugal accelerating injection bombardment of metal surfaces. A steel ball centrifugal ejector rotates at a high speed, and steel balls enter the ejector from an inlet, are subjected to centrifugal acceleration and then are ejected out at a high speed from a spout; the high-speed steel balls intensively bombard workpieces in an injection chamber to ensure that the surfaces of the workpieces are subjected to acute plastic deformation to form a nano layer; the ejected steel balls are collected by a steel ball collecting device, flow out of an outlet at the bottom of the injection chamber, and then are conveyed into an ejector by virtue of a steel ball circulating device to realize continuous circulation of ejection operation. The nano-crystallization device disclosed by the invention can accelerate the speed of the steel balls to 150m/s relatively easily to realize high-energy bombardment on the metal surfaces; the selection range of the particle sizes of the steel balls is 0.5-20mm; a deformed layer with the thickness of 1-2mm can be obtained on the metal surfaces, the crystalline grains of the deformed layer are in gradient change, and nano-crystals can be formed on a surface layer; and the ejection quantity of the steel balls is adjustable from a few kilograms per minute to more than one hundred kilograms per minute, the surface of a metallic material can be nano-crystallized in a short time, the production efficiency is high, and the device has industrial values.
Description
Technical field
The present invention relates to a kind of CENTRIFUGAL ACCELERATING and spray bombardment metal-surface nano gasifying device, belong to making Nano surface of metal material field.
Background technology
The destruction of major part metallic substance is all by its surface.Research surface, if prepare at metal material surface and there is certain thickness nanocrystalline granulosa, just there are physics, chemistry and the mechanical property that can change metal material surface, delay the destruction of material, improve the mechanical property of material or mechanical component, as fatigue strength, erosion resistance and wear resistance etc., extend the work-ing life of material or mechanical component.
The method obtaining nanostructured layers has sedimentation, surface-coated method and surface self-nanocrystallization method.Without sharp interface between the nanostructured surface laye that metallic surface self nanometer obtains and matrix, materials microstructure through-thickness changes in gradient, and the bonding force between nano surface and matrix is strong, in use delamination can not occur and be separated.Therefore, metal-surface nano has more the potentiality of Application and Development, have also been obtained people and pays close attention to more widely.Below relate to the patent that metal-surface nano method and device have been applied for.
Patent one " method of making nano surface of metallic material using ultrasonic speed micro particle bombardment " (publication number CN 1410560A) provides one to utilize pressurized gas to carry hard particles, by the method for superonic flow nozzzle high-speed motion bombardment metal material surface inducing metal making Nano surface, hard particles causes gross distortion to cause grain refining with very high kinetic energy bombardment metallic surface, and final formation is nanocrystalline.
In patent two " method of metal-surface nano " (publication number CN 101012493A), rigid cylinder is vertically placed on the metal material, and make this rigid cylinder spin friction metal material surface, spin friction makes metal material surface produce viscous deformation, cause grain refining, and finally realize making Nano surface of metal material.
In patent three " device of inducing nanocrystallization of metal surface through shock wave-accelerated nano particles " (publication number CN102212818 A), metal nanoparticle pressurized air is accelerated, under laser radiation effect, the immense pressure utilizing the shockwave of induced with laser to produce constantly advances the nano particle with certain speed again, it is made to impact metal material surface with top speed, and embed metal material surface formation nanometer layer, realize the making Nano surface of metallic substance.
Accelerate Metal Ball by impact in patent four " device of accelerating nanocrystallization of impact surfaces of metal round spheres by beating " (publication number CN102586557 A) and clash into metallic surface, make metallic surface that severe plastic deformation occur, obtain the special microtexture of grain size gradient distribution, achieve material surface nano modification.
There is following defect in above four patents:
Patent one utilizes pressurized gas to carry hard particles high velocity bombardment metal material surface to carry out nanometer, and the major defect of the method is need to carry out surface finish process to the metallic surface of nanometer process.Therefore, the method uses not too convenient in the industrial production, increase the cost because polished finish brings.
Patent dual-purpose rigid cylinder end face rotary squeezing metal material surface makes its nanometer be applicable to big area sheet material or has the Surface Nanocrystalline of large-area planar part, be not suitable for the part nanometer process that size is little or surface is complicated, its industrial application has certain limitation.
Patent three uses induced with laser to impact and accelerates nano particle, and make nano particle embed metallic surface thus realize the making Nano surface of metallic substance, the method process is complicated, and facility investment is high, and suitability for industrialized production is subject to a definite limitation.
Patent four is accelerated Metal Ball (shot) by impact and is clashed into metallic surface, realizes metal-surface nano, and its defect is the speed not easily making shot reach higher by the method acceleration Metal Ball of impact, can not improve the production efficiency of metal-surface nano like this.If impact force too conference reduces the work-ing life of shot, increase use cost.
Summary of the invention
The invention provides a kind of CENTRIFUGAL ACCELERATING and spray bombardment metal-surface nano gasifying device, CENTRIFUGAL ACCELERATING is adopted to spray shot bombardment metallic substance or piece surface, make metallic surface that severe plastic deformation occur, obtain the microtexture of grain size gradient distribution, realize material surface nanometer.
The technical solution realizing the object of the invention is: a kind of CENTRIFUGAL ACCELERATING sprays bombardment metal-surface nano gasifying device, comprises shot centrifugal atomization device, shot circulating transmission device and shot collection device; The shot that shot collection device is collected is sent in shot centrifugal atomization device by described shot circulating transmission device, wherein, described shot centrifugal atomization device comprises centrifugal atomization device body, shield cap, drive unit, verge ring and hopper, described centrifugal atomization device body is disc structure, the center of its first bottom surface is provided with circular groove, the first-class spaced apart circumferential of disk centered by circular groove is provided with multiple groove passed through for shot, described groove one end open flushes with the trough rim of circular groove, and the other end opening flushes with the outward flange of disk; Described groove is divided into groove and outer groove two portions from the inside to the outside by annular recesses along its length, and identical and its degree of depth of the groove depth of described groove, circular groove, annular recesses is not less than the diameter of shot; Second bottom surface of described centrifugal atomization device body arranges drive unit, by drive unit, centrifugal atomization device body is rotated; The outer wall of described drive unit is provided with shield cap, and described centrifugal atomization device body is wrapped in its inner chamber by described shield cap, and described shield cap side arranges through hole; Described verge ring is annular, is arranged on directly over next-door neighbour's annular recesses bottom land, and is connected with described shield cap; Described verge ring is provided with the opening passed through for shot; Described hopper is arranged on shield cap, and the discharge port of hopper is positioned at directly over the circular groove of centrifugal atomization device body.
Described device is also provided with enclosed chamber.
The shot that shot collection device is collected is sent in the hopper of described shot centrifugal atomization device by described shot circulating transmission device.
Described centrifugal atomization device body first bottom surface is also provided with cover plate, and described cover plate is fixedly connected with centrifugal atomization device body.
The diameter D3 of described circular groove is not less than three times of shot diameter, preferred 5-10 shot diameter.
The width d2 of described interior groove and the junction of annular recesses is not less than 1 shot diameter, preferred 1-1.5 shot diameter.
The width d3 of described outer groove and the junction of annular recesses is not less than 1 shot diameter, preferred 2-4 shot diameter.
Described verge ring is set to D1 to the distance of annular recesses inner ring, 1 shot diameter≤D1≤1.5 shot diameter.
Described verge ring is set to D2 to the distance of annular recesses outer shroud, 1 shot diameter≤D2≤1.5 shot diameter.
The preferred 1-1.5 of an openings of sizes d1 shot diameter of described verge ring.
Described shot circulating transmission device comprises motor and transmission mechanism.
Described drive unit comprises bearing, rotating shaft and motor.
Described shot collection device comprises the collecting board be inclined at below shot centrifugal atomization device.
The through hole that described shield cap side is arranged and the opening of groove are positioned in same level.
The present invention compared with prior art, has the following advantages:
1, bombarding energy is large
Adopt CENTRIFUGAL ACCELERATING device relatively easily shot can be accelerated to 150m/s, realize bombarding the high energy of metallic surface.
2, the deformation layer of crystal grain graded can be obtained
Wide 0.5mm ~ the 20mm of range of choice of shot particle diameter.The shot of different-grain diameter is selected to bombard, the deformation layer degree of depth of metallic surface is different with degree of grain refinement, therefore selects the shot of different-grain diameter to metallic surface combination bombardment, can obtain the thick deformation layer of 1 ~ 2mm in metallic surface, its crystal grain changes in gradient, and top layer can be formed nanocrystalline.By force, the nanometer crystal microstructure on surface imparts material and parts and has special performance for the deformation layer of this crystal grain graded and material matrix bonding force.
3, energy density is large, and production efficiency is high
CENTRIFUGAL ACCELERATING sprays shot, and shot emitted dose is adjustable, more than 100 kilogram from per minute several kilograms to per minute.Therefore, the energy density of injection is large, and can make making Nano surface of metal material at short notice, production efficiency is high, has industrialization value.
4, equipment is simple, is convenient to suitability for industrialized production
CENTRIFUGAL ACCELERATING sprays shot, and equipment is simple, and primarily of part compositions such as shot centrifugal atomization device, jet chamber, shot retrieving arrangements, device structure is simple, and before spraying, workpiece surface is without the need to process, is convenient to realize suitability for industrialized production.
Accompanying drawing explanation
Fig. 1 is that CENTRIFUGAL ACCELERATING of the present invention sprays bombardment metal-surface nano gasifying device principle schematic.
Fig. 2 is that CENTRIFUGAL ACCELERATING of the present invention sprays bombardment metal-surface nano gasifying device principle schematic.
Fig. 3 is that CENTRIFUGAL ACCELERATING of the present invention sprays bombardment metal-surface nano gasifying device principle schematic.
Fig. 4 is that CENTRIFUGAL ACCELERATING of the present invention sprays bombardment metal-surface nano gasifying device structural representation.
Fig. 5 is the structural representation of centrifugal atomization device body of the present invention.
Embodiment
Below in conjunction with accompanying drawing, embodiments of the present invention are illustrated, but be not used for limiting the present invention.
Fig. 1-3 sprays shot bombardment metallic substance or piece surface for adopting CENTRIFUGAL ACCELERATING, realizes the Basic principles and devices of making Nano surface.It consists of: shot centrifugal atomization device 1 is driven by drive unit 9, and shot collection device 2 comprises the collecting board be inclined at below shot centrifugal atomization device 1; Shot circulation device 3 comprises motor and transmission mechanism, is sent to by the shot that shot collection device 2 is collected in shot centrifugal atomization device 1; Workpiece 15 is processed metallic substance or part.
In Fig. 2-3, also include jet chamber 14, jet chamber 14 is a space closed, and has shot to export bottom jet chamber 14.
Principle of work: shot centrifugal atomization device 1 high speed rotating, shot enters in shot centrifugal atomization device 1 by entrance, from spout ejection at a high speed after CENTRIFUGAL ACCELERATING; Workpiece 15 in the intensive bombardment jet chamber 14 of high speed shot, makes its surperficial severe plastic deformation, forms nanometer layer; For making workpiece surface obtain uniform nanometer layer, in bombardment process, workpiece 15 constantly rotates or moves; The shot sprayed flows out from the outlet bottom jet chamber 14 after shot collection device 2 is collected, and is delivered in shot centrifugal atomization device 1 again, realizes the continuous circulation of spraying operation through shot circulation device 3.
Concrete, as in Fig. 4-5, bombardment metal-surface nano gasifying device of the present invention comprises shot centrifugal atomization device 1, shot circulating transmission device 3 and shot collection device 2 and jet chamber 14; Shot circulating transmission device 3 is made up of motor and belt transmission.The collecting board of shot collection device 2 by being inclined in jet chamber 14, below shot centrifugal atomization device 1 and workpiece 15 forms.Wherein, shot centrifugal atomization device 1 is made up of centrifugal atomization device body 7, shield cap 8, drive unit 9, verge ring 10 and hopper 11.The shot that shot collection device 2 is collected is sent in the hopper 11 of described shot centrifugal atomization device 1 by shot circulating transmission device 3.Centrifugal atomization device body 7 is disc structure, the center of its first bottom surface is provided with circular groove 4, if the diameter of shot is d, preferred 5d ~ the 10d of diameter D3 of circular groove 4, in this enforcement, the diameter d value of shot is 8mm, now the diameter D3 value of circular groove 4 is 50mm, if the diameter D3 of circular groove 4 is too small, then the flow of shot reduces, and the shot emitted dose in shot centrifugal atomization device 1 unit time will reduce, if D3 is excessive, the diameter of centrifugal atomization device body 7 can be made to increase, will the volume and weight of shot centrifugal atomization device 1 be increased.On disk centered by circular groove 4, circumference is provided with 12 grooves 5 passed through for shot at equal intervals, groove 5 one end open flushes with the trough rim of circular groove 4, the other end opening flushes with the outward flange of disk, the groove 5 of centrifugal atomization device body 7 can be arc line type, also can be linear.The groove of arc line type can improve the velocity of discharge of shot, no matter but the rotation direction of groove 5 is left-handed or dextrorotation, its rotation direction must be consistent with turning direction.Groove 5 is divided into groove and outer groove two portions from the inside to the outside by annular recesses 6 along its length, preferred d ~ the 1.5d of width d2 of the junction of interior groove and annular recesses 6, the present embodiment d2 value is 10mm, d2 can not be less than the diameter of shot, otherwise shot not by, shot centrifugal atomization device 1 can not work; D2 crosses senior general makes groove 5 width increase, and during injection shot, the angle of divergence becomes large.Preferred 2d ~ the 4d of width d3 of the junction of outer groove and annular recesses 6, in the present embodiment, d3 value is 20mm.Identical and its degree of depth of the groove depth of groove 5, circular groove 4, annular recesses 6 is not less than the diameter d of shot, and in the present embodiment, groove depth is 20mm.Occur to prevent shot axially to launch, bottom surface is also provided with cover plate 13 to centrifugal atomization device body 7 first, and cover plate 13 is fixedly connected with centrifugal atomization device body 7 by screw.Second bottom surface of centrifugal atomization device body 7 arranges drive unit 9, and by drive unit 9, centrifugal atomization device body 7 is rotated, drive unit 9 is made up of bearing, rotating shaft and motor.The outer wall of drive unit 9 is provided with shield cap 8, centrifugal atomization device body 7 is wrapped in its inner chamber by shield cap 8, conveniently shot sprays from centrifugal atomization device body 7 and impacts workpiece 15, side arranges through hole 12 with shield cap 8, opening and the through hole 12 of groove 6 are positioned in same level, and the side that jet chamber 14 and shield cap 8 are positioned at through hole 12 is fixed.Verge ring 10 is annular, is arranged on directly over next-door neighbour's annular recesses 6 bottom land, and is connected with shield cap 8; Verge ring 10 is provided with the opening passed through for shot, the preferred d ~ 1.5d of openings of sizes d1, in the present embodiment, this openings of sizes d1 value is 10mm.Verge ring 10 is set to D1 to the distance of annular recesses 6 inner ring, the preferred d ~ 1.5d of D1, and in the present embodiment, D1 value is 10mm; Verge ring 10 is set to D2 to the distance of annular recesses 6 outer shroud, the preferred d ~ 1.5d of D2, and in the present embodiment, D2 value is 10mm.Hopper 11 is arranged on shield cap 8, and the discharge port of hopper 11 is positioned at directly over circular groove 4.
The working process of shot centrifugal atomization device 1 of the present invention is: during work, centrifugal atomization device body 7 high speed rotating, and shot enters in centrifugal atomization device body 7 circular groove 4 by hopper 11, under centrifugal action, and shot radial motion.Owing to being subject to the stop of verge ring 10, shot can not fly away from centrifugal atomization device body 7 at a high speed along any direction from groove 5, and at this moment, shot nestles up verge ring 10 inwall, moves in a circle in annular recesses 6.When shot moves to verge ring 10 upper shed, under centrifugal action, shot flies out from groove 5 orientation.Due to centrifugal atomization device body 7 high speed rotating, be constantly accelerated when shot moves in centrifugal atomization device body 7, penetrate with very high speed.Change the speed of rotation of centrifugal atomization device body 7, the jet velocity of shot can be changed.
Claims (10)
1. CENTRIFUGAL ACCELERATING sprays a bombardment metal-surface nano gasifying device, it is characterized in that, comprises shot centrifugal atomization device (1), shot circulating transmission device (3) and shot collection device (2), the shot that shot collection device (2) is collected is sent in shot centrifugal atomization device (1) by described shot circulating transmission device (3), wherein, described shot centrifugal atomization device (1) comprises centrifugal atomization device body (7), shield cap (8), drive unit (9), verge ring (10) and hopper (11), described centrifugal atomization device body (7) is disc structure, the center of its first bottom surface is provided with circular groove (4), the first-class spaced apart circumferential of disk centered by circular groove (4) is provided with the multiple grooves (5) passed through for shot, described groove (5) one end open flushes with the trough rim of circular groove (4), the other end opening flushes with the outward flange of disk, described groove (5) is divided into interior groove from the inside to the outside and outer groove two portions by annular recesses (6) along its length, second bottom surface of described centrifugal atomization device body (7) arranges drive unit (9), by drive unit (9), centrifugal atomization device body (7) is rotated, the outer wall of described drive unit (9) is provided with shield cap (8), described centrifugal atomization device body (7) is wrapped in its inner chamber by described shield cap (8), and described shield cap (8) side arranges through hole (12), described verge ring (10) is annular, is arranged on directly over next-door neighbour's annular recesses (6) bottom land, and is connected with described shield cap (8), described verge ring (10) is provided with the opening passed through for shot, described hopper (11) is arranged on shield cap (8), and the discharge port of hopper (11) is positioned at directly over the circular groove (4) of centrifugal atomization device body (7).
2. CENTRIFUGAL ACCELERATING according to claim 1 sprays bombardment metal-surface nano gasifying device, and it is characterized in that, described nanocrystallization device is also provided with enclosed chamber (14).
3. CENTRIFUGAL ACCELERATING according to claim 1 sprays bombardment metal-surface nano gasifying device, it is characterized in that, described centrifugal atomization device body (7) first bottom surface is also provided with cover plate (13), and described cover plate (13) is fixedly connected with centrifugal atomization device body (7).
4. CENTRIFUGAL ACCELERATING according to claim 1 sprays bombardment metal-surface nano gasifying device, it is characterized in that, the groove depth of described groove (5), circular groove (4), annular recesses (6) is identical and its degree of depth is not less than 1 shot diameter; The diameter D3 of described circular groove (4) is not less than 3 shot diameters.
5. CENTRIFUGAL ACCELERATING according to claim 1 sprays bombardment metal-surface nano gasifying device, and it is characterized in that, the width d2 of the interior groove of described groove (5) and the junction of annular recesses (6) is 1 ~ 1.5 shot diameter; The width d3 of the outer groove of described groove (5) and the junction of annular recesses (6) is 2 ~ 4 shot diameters.
6. CENTRIFUGAL ACCELERATING according to claim 1 sprays bombardment metal-surface nano gasifying device, it is characterized in that, described verge ring (10) is set to D1 to the distance of annular recesses (6) inner ring, 1 shot diameter≤D1≤1.5 shot diameter; Described verge ring (10) is set to D2 to the distance of annular recesses (6) outer shroud, 1 shot diameter≤D2≤1.5 shot diameter.
7. CENTRIFUGAL ACCELERATING according to claim 1 sprays bombardment metal-surface nano gasifying device, and it is characterized in that, the openings of sizes d1 of described verge ring (10) is 1 ~ 1.5 shot diameter.
8. CENTRIFUGAL ACCELERATING according to claim 1 sprays bombardment metal-surface nano gasifying device, it is characterized in that, the shot that shot collection device (2) is collected is sent in the hopper (11) of described shot centrifugal atomization device (1) by described shot circulating transmission device (3).
9. CENTRIFUGAL ACCELERATING according to claim 1 sprays bombardment metal-surface nano gasifying device, and it is characterized in that, described shot circulating transmission device (3) comprises motor and transmission mechanism; Described drive unit (9) comprises bearing, rotating shaft and motor; Described shot collection device (2) comprises the collecting board being inclined at shot centrifugal atomization device (1) below.
10. CENTRIFUGAL ACCELERATING according to claim 1 sprays bombardment metal-surface nano gasifying device, it is characterized in that, the through hole (12) that described shield cap (9) side is arranged is positioned in same level with the opening of groove (6).
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| CN201410116811.8A CN104946871A (en) | 2014-03-26 | 2014-03-26 | Nano-crystallization device for centrifugal accelerating injection bombardment of metal surfaces |
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| CN107234402A (en) * | 2016-03-28 | 2017-10-10 | 南京理工大学 | A kind of method for reducing gradient-structure metal sheet surface roughness |
| CN107299302A (en) * | 2016-04-15 | 2017-10-27 | 南京理工大学 | A kind of method for improving metal gradient structural strength and plasticity matching degree |
| CN108161768A (en) * | 2018-01-17 | 2018-06-15 | 济南大学 | Wet method impeller head |
| CN108818321A (en) * | 2018-07-03 | 2018-11-16 | 中国人民解放军国防科技大学 | Self-cleaning type nano colloid jet polishing device |
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Application publication date: 20150930 |