CN104936920A - Transparent substrate - Google Patents
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- CN104936920A CN104936920A CN201380071015.0A CN201380071015A CN104936920A CN 104936920 A CN104936920 A CN 104936920A CN 201380071015 A CN201380071015 A CN 201380071015A CN 104936920 A CN104936920 A CN 104936920A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0294—Diffusing elements; Afocal elements characterized by the use adapted to provide an additional optical effect, e.g. anti-reflection or filter
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2214/00—Nature of the non-vitreous component
- C03C2214/08—Metals
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Abstract
The purpose of the present invention is to provide a transparent substrate that can suppress reflected glare of light, reduce fingerprint adhesiveness, and further suppress glare. The present invention provides a transparent substrate for which [increment]Gloss / [increment]RMS, which is a variable for gloss (%) over a variable for surface roughness (RMS) ([mu]m), for at least one surface is -800 or less.
Description
Technical field
The present invention relates to transparent substrate.
Background technology
In the past, in the various display unit such as liquid-crystal display, use transparent substrate.
In recent years, in portable equipment, vehicle-mounted equipment, use the display unit such as liquid-crystal display more and more, particularly in the purposes of vehicle-mounted equipment, the light of sunlight, body light etc. causes reflected glare (to reflect
こ body), easily impact is brought on visuality, therefore require the reflected glare suppressing light.In addition, contact panel is used more and more.Particularly the chance of human contact is also many, therefore also requires the tack suppressing fingerprint.
As regulating the degree of gloss to glasswork etc., suppressing the method for the attachment of fingerprint, there will be a known and form fine concavo-convex method on the surface of glass.
Such as in patent documentation 1, disclose the method for surface finish of following glasswork: be impregnated in by glasswork after in the corrosive fluid be made up of the micro mist of hydrogen fluoride, Neutral ammonium fluoride, glass system, wash, impregnated in further in the corrosion glazing liquid be made up of hydrogen fluoride, sulfuric acid, nitric acid, then wash.
Prior art document
Patent documentation
Patent documentation 1: Japanese Laid-Open Patent Publication 61-36140 publication
Summary of the invention
Invent problem to be solved
But, in patent documentation 1, imagination is not used as the transparent substrate of display unit etc., therefore, when the surface configuration of liquid-crystal display etc. implements the glass substrate of this surface working, depend on the relation of the concavo-convex size of glass and the Pixel Dimensions of liquid-crystal display and exist and produce the such problem of scattering of light inequality (hereinafter also referred to glimmering).
In view of the problem that above-mentioned prior art has, the object of the present invention is to provide a kind of transparent substrate, it can suppress the reflected glare of light, reduces fingerprint tack, suppress flicker.
For the means of dealing with problems
In order to solve the problem, the invention provides a kind of transparent substrate, wherein, at least one face, Δ Gloss/ Δ RMS is below-800, and described Δ Gloss/ Δ RMS represents Gloss (%) variable quantity relative to surfaceness RMS (μm) variable quantity.
Invention effect
Transparent substrate of the present invention can suppress the reflected glare of light, reduces fingerprint tack, suppress scattering of light inequality (flicker).
Accompanying drawing explanation
The explanatory view of Gloss change when Fig. 1 is the change surfaceness in embodiments of the present invention.
Fig. 2 is the laser microscope image of the transparent substrate in experimental example 2.
Fig. 3 is the laser microscope image of the transparent substrate in experimental example 8.
Fig. 4 is regression straight line when calculating Δ Gloss/ Δ RMS in experimental example 2,8.
Embodiment
Below, the specific embodiment of the present invention is described with reference to accompanying drawing, but the present invention is not limited to following embodiment, without departing from the scope of the present invention, can in addition various distortion and the replacement of following embodiment.
In the present embodiment, transparent substrate of the present invention is described.
The feature of the transparent substrate of present embodiment is, for at least one face, Δ Gloss/ Δ RMS is below-800, and described Δ Gloss/ Δ RMS represents Gloss (%) variable quantity relative to surfaceness RMS (μm) variable quantity.
The present inventor is to suppressing the reflected glare of light, reduce fingerprint tack, suppress the transparent substrate of flicker repeatedly to be studied, found that and can to solve by forming suitable concavo-convex microtexture on the surface of this transparent substrate, thus complete the present invention.
First, for transparent substrate, in order to suppress flicker, preferably there is suitable concavo-convex microtexture as mentioned above.
Further, suitable concavo-convex microtexture refers to that concavo-convex shape, concavo-convex distribution of shapes, concavo-convex size, concavo-convex distribution of sizes are in suitable scope.By existing method, they are evaluated one by one, investigate the relation with flicker, but do not obtain clearly relation.
The present inventor finds to be in suitable scope by evaluating them relative to Gloss (%) variable quantity of surfaceness RMS (μm) variable quantity.
At this, Gloss (%) pays close attention to the ratio of specular reflection light, the directional spreding etc. of diffused reflection light, is the index of the degree of the gloss representing body surface one-dimensionally.Gloss (%) can by measuring in the mode of mirror surface luster according to the method for the method of regulation in JIS Z 8741.There is diffuse-reflectance at the plane of incidence, when absorbing specular reflection decline, therefore Gloss is considered to indirectly to reflect the amount of concaveconvex shape and distribution thereof, concavo-convex size and distribution thereof.
On the other hand, surfaceness RMS (μm) refers to the concavo-convex mean depth from reference plane (substrate surface in this case before surface treatment).Surfaceness RMS (μm) can by measuring according to the method for the method of regulation in JIS B 0601 (2001).It should be noted that, surfaceness RMS also represents with r.m.s. roughness Sq sometimes.For mensuration, can utilize the various methods usually used in the mensuration of surfaceness, particularly measure the more broad state that more can reflect the more broad range on the surface of transparent substrate in the visual field, therefore preference is as measured by laser microscope.
Refer to relative to Gloss (%) variable quantity of surfaceness RMS (μm) variable quantity, at least one face (surface) of transparent substrate upper formed fine concavo-convex after, carrying out etch processes makes surfaceness RMS (μm) slightly change, the variable quantity of the Gloss (%) caused thus.
The method of etch processes is now not particularly limited, and such as, when transparent substrate is glass, hydrofluoric acid (aqueous hydrogen fluoride solution) can be utilized to carry out etch processes.In addition, the dry etchings such as reactive ion etching can also be utilized.
At this, the meaning qualitatively of Gloss (%) variable quantity relative to surfaceness RMS (μm) variable quantity is described.The sectional view of the concavo-convex microtexture (below also referred to as " concaveconvex shape ") on the surface of transparent substrate is schematically shown in Fig. 1.In figure, solid line represents the concaveconvex shape of the transparent substrate surface before carrying out etch processes, and dotted line represents the concaveconvex shape after etch processes.Fig. 1 (a) has fine recess, is the example of preferred concaveconvex shape in present embodiment, and Fig. 1 (b) is the example that the size of recess is greater than Fig. 1 (a).
Fig. 1 (a) is with in (b), different from prerequisite using the A-stage lower concave part degree of depth before etch processes.Specifically, for the degree of depth of recess, i.e. radius-of-curvature, (a) with fine recess is less than (b).Then, when the etch processes forming equal small etch quantity is carried out to Fig. 1 (a), (b) two kinds of situations, the change of the degree of depth of recess is same degree in Fig. 1 (a) and (b), and therefore the variable quantity of surfaceness RMS (μm) is identical.
On the other hand, the situation of radius-of-curvature ratio (b) of the recess in Fig. 1 (a) is little, therefore, compared with the protuberance after the etch processes represented with B in Fig. 1 (b), the protuberance being equivalent to the connection section of the recess after etch processes and recess represented with A in Fig. 1 (a) forms milder shape.Namely as the change in shape of protuberance, (a) is comparatively large, and the variable quantity of Gloss (%) is also large.So, recess size is less, then the absolute value of Δ Gloss/ Δ RMS is larger.
So, by evaluating Gloss (%) variable quantity relative to surfaceness RMS (μm) variable quantity, can evaluate and whether there is concavo-convex microtexture suitable as above.
And, in Fig. 1, be illustrated in the uniform situation of respective concaveconvex shape, but such as when the part that the shape being mixed into recess is larger, shape uneven when, then become the part that the radius-of-curvature that comprises recess as Fig. 1 (b) is large, in the same manner as the situation of Fig. 1 (b), reduce relative to Gloss (%) variable quantity of surfaceness RMS (μm) variable quantity.Therefore, by evaluating Gloss (%) variable quantity relative to surfaceness RMS (μm) variable quantity, can evaluate and whether there is concavo-convex microtexture suitable as above.
As mentioned above, Δ Gloss/ Δ RMS is below-800, is more preferably below-1000, is particularly preferably below-1200.
For at least one face of transparent substrate, Δ Gloss/ Δ RMS meets above-mentioned condition.In addition, also suitable concavo-convex microtexture can be had for two-sided.That is, also can for transparent substrate two-sided for Δ Gloss/ Δ RMS meet above-mentioned condition.
Further, form suitable concavo-convex microtexture by the surface at transparent substrate described above, the reflected glare of light can also be suppressed, reduce fingerprint tack.About the suppression of the reflected glare of light, thising is presumably because by there is concavo-convex microtexture on the surface of transparent substrate, compared with the transparent substrate that not there is concavo-convex microtexture with surface, the specular reflection at substrate surface place can be suppressed suitably.In addition, about the reduction of fingerprint tack, also think that hand stain, sweat etc. not easily enter the part of depression due to fine concavo-convex by being formed on the surface of transparent substrate.
In addition, the transparent substrate of present embodiment expects that the distinctiveness of reflected image is low, and therefore preferably the Gloss (%) at least one face is less than 95%, is more preferably less than 90%.
Gloss (%) is reflected in the inhibition that transparent substrate surface forms the specular reflection of the light that concavo-convex microtexture brings, above-mentioned scope is in by making Gloss (%), demonstrate the specular reflection of the light that can suppress transparent substrate surface place, for the visuality of display can be improved when various indicating meter, contact panel etc., be therefore preferred.It should be noted that, Gloss (%) herein preferably meets above-mentioned condition when the two-sided formation concaveconvex shape of transparent substrate at least one face.In addition, also can meet for two-sided.
When measuring Gloss (%) variable quantity relative to surfaceness RMS (μm) variable quantity, for the transparent substrate as determination object, can at least carry out an etch processes to its surface, the mensuration of surfaceness RMS (μm), Gloss (%) can be carried out thus.From the view point of improving estimating precision further, under the condition identical with first time, preferably carry out the etch processes of total more than twice, carry out the mensuration of Gloss (%) and surfaceness RMS (μm) after carrying out etch processes at every turn, carry out straight line to obtained multiple measurement results to be similar to, calculate Δ Gloss/ Δ RMS by its slope meter.
As the manufacture method of the transparent substrate of present embodiment, be not particularly limited, can by arbitrary method, formed on the surface at least one face of transparent substrate fine concavo-convex, manufacture thus.Such as, preferably can utilize the surface of transparent substrate is carried out to frosting processing, carries out digging by sand-blast, grinding etc. to the surface of transparent substrate and formed the method for fine concaveconvex structure.In addition, etch processes can be combined further in these methods.
Wherein, preferably by frosting processing, transparent substrate is implemented to surface treatment, namely formed concavo-convex microtexture on the surface of transparent substrate.Its reason can list, and utilizes frosting to process, the scope can processed by single job is wide, the activity duration be the short period of time can, further easy formed on surface fine concavo-convex.In addition, by frosting processing when the surface of transparent substrate define fine concavo-convex, by regulating shape, the size of degree and the concaveconvex shape processed, the selectable range of Gloss (%) and mist degree (%) is wider than other working method.Therefore, by selecting the condition of frosting processing, can supply there is expectation Gloss (%), mist degree (%) transparent substrate, because of but preferably.
Material as the transparent substrate of present embodiment is not particularly limited, as long as be transparent solid material.As the material of the transparent substrate of present embodiment, various material such as such as plastics, glass etc. can be enumerated.Wherein, from viewpoints such as the transparency, intensity, transparent substrate is preferably glass.
In this case, the kind of glass is not particularly limited, and can utilize the various glass such as non-alkali glass, soda-lime glass, alumina silicate glass.
Shape about transparent substrate is also not particularly limited, and without the need to for plane and tabular, no matter comprises the transparent substrate of curved surface or erose transparent substrate.
When the transparent substrate of present embodiment is soda-lime glass, alumina silicate glass etc., chemical intensification treatment can also be implemented to the transparent substrate of present embodiment further by known method.
Chemical intensification treatment refers to that the basic ion (such as, sodium ion) by little for the ionic radius on the surface of glass is replaced as the process of the large basic ion of ionic radius (such as, potassium ion).Such as, the melting salt containing potassium ion can be utilized to process the glass containing sodium ion carry out thus.The composition of compressive stress layers formed at glass surface by carrying out such ion exchange treatment is slightly different from the composition before ion exchange treatment, but the composition of deep layer portion enough dark from glass baseplate surface (tension stress layer of broad sense) is roughly the same with the composition before ion exchange treatment.
As chemical enhanced condition, be not particularly limited, can according to being supplied in the kind of chemical enhanced glass, required chemical enhanced degree etc. selects.
As the melting salt for carrying out chemical intensification treatment, can according to being supplied in chemical enhanced glass baseplate to select.Such as, basic sulfatase and the alkaline chlorates etc. such as saltpetre, sodium sulfate, potassium sulfate, salt of wormwood, sodium-chlor and Repone K can be enumerated.These melting salts may be used alone, can also be used in combination two or more.
The Heating temperature of melting salt is preferably more than 350 DEG C, is more preferably more than 380 DEG C.In addition, be preferably less than 500 DEG C, be more preferably less than 480 DEG C.
By making the Heating temperature of melting salt be more than 350 DEG C, can prevent the reduction because of ion-exchange speed from causing being difficult to imposing chemical enhanced.In addition, by being less than 500 DEG C, the decomposition of melting salt, deterioration can be suppressed.
In addition, in order to give sufficient stress under compression, the time that glass is contacted with mixed melting salt be preferably more than 1 hour, be more preferably more than 2 hours.In addition, in long ion-exchange, productivity declines, and simultaneously compression stress value reduces because of mitigation, be therefore preferably less than 24 hours, be more preferably less than 20 hours.
Above, the transparent substrate of present embodiment is illustrated, but for the transparent substrate of present embodiment, as mentioned above, for at least one face, Δ Gloss/ Δ RMS is below-800, and described Δ Gloss/ Δ RMS represents Gloss (%) variable quantity relative to surfaceness RMS (μm) variable quantity.When meeting this condition, the concavo-convex microtexture formed on the surface of transparent substrate demonstrates has suitable shape, size, can suppress the reflected glare of light, reduces fingerprint tack, suppress scattering of light inequality (flicker).
The transparent substrate of present embodiment can use in a variety of applications where, such as, can be preferred in the purposes of the indicating meter of liquid-crystal display or organic EL etc., contact panel.Wherein especially can more preferably in the indicating meter of portable equipment or vehicle-mounted equipment, contact panel.
Embodiment
Below enumerate specific embodiment to be described, but the present invention is not defined in these embodiments.It should be noted that, in following experimental example, experimental example 1 ~ experimental example 6 is embodiment, and experimental example 7 ~ experimental example 10 is comparative example.
(1) evaluation method
Below the evaluating characteristics of the transparent substrate obtained in following experimental example is described.
＜Gloss(％)＞
Measure according to the method specified in JIS Z 8741:1997.
Specifically, use determinator (Japanese electricity Se Inc., trade(brand)name: PG-IIM), surface-treated face is implemented to workpiece (transparent substrate), measures the specular reflectance beam of the light (light source: tungsten lamp) from the angle incidence of 60 °.
Further, be 100% to the reflection light quantity of light when forming fine concavo-convex front transparent substrate (untreated transparent substrate) similarly to measure, represent the specular reflectance beam to Specimen Determination.
＜RMS(μm)＞
Measure according to the method specified in JIS B 0601:2001.
Specifically, for the mensuration face of sample, determine a place measurement range P, for the field range of 300 μm × 200 μm, use laser microscope (Keyemce (Keyence) Inc., trade(brand)name: VK-9700) to measure.Cutoff is now λ c=0.08mm.
＜ΔGloss(％)/ΔRMS(μm)＞
For obtained transparent substrate, by aforesaid method, measure Gloss (%), surfaceness RMS (μm) in advance.
Then, after this sample is flooded 3 minutes in the hydrofluoric acid relative to total amount being 5 % by weight concentration, take out and utilize distilled water to clean, again measure Gloss (%), surfaceness RMS (μm) by said determination method.Repeat twice following operation afterwards: clean after similarly this sample being flooded 3 minutes in hydrofluoric acid, measure Gloss (%), surfaceness RMS (μm).It should be noted that, when measuring RMS, be all measure identical measurement range P during each mensuration.
Four measurement results for this sample utilize method of least squares to obtain the regression straight line of Gloss (%), surfaceness RMS (μm), calculate Δ Gloss/ Δ RMS by its slope meter.
It should be noted that, evaluate for following mist degree, micro concavo-convex diameter, flicker, before carry out this mensuration, (before carrying out utilizing the etch processes again of hydrofluoric acid) measures in advance.
< mist degree >
Mist degree (HAZE) is measured according to the method for regulation in JIS K 7136.
Specifically, haze meter (Suga trier Inc., trade(brand)name: HZ-2) is used to measure.
< micro concavo-convex diameter >
For the mensuration face of sample, in the field range P of 300 μm × 200 μm, the altitude distribution of laser microscope to the face of mensuration is used to measure.Then, in order to remove the interference that form variations causes, deducting 1 μm of value obtained as threshold value using for obtained surface from highly the highest point, carrying out binaryzation.Each concavo-convex for the image obtained by binaryzation, is carried out positive round and is similar to, calculate circular diameter.Using the intermediate value footpath of obtained diameter as micro concavo-convex diameter.
> is evaluated in < flicker
The liquid crystal panel obtained transparent substrate being configured at iPhone4S (Apple's system) sets out the square measurement range of 50mm × 50mm, then, (A) carry out visual inspection after substrate being fixed on liquid crystal panel, (B) make substrate move while carry out visual inspection second relative to liquid crystal panel with 1mm/, carried out the evaluation of scattering of light inequality by above-mentioned two kinds of inspections.Consider from the characteristic of human eye, move by enabling substrate and carry out range estimation and body more closely measure.In evaluation, the quantity of the point of the flicker produced is counted, then carries out as follows.
This evaluate root descends standard to evaluate with 1 ~ 5 point according to this.Mark is lower, and mean that scattering of light inequality (flicker) is more suppressed, it is qualified to be set as less than 3 points.
1 point: even if also do not confirm flicker by when substrate movement
2 points: when making substrate movement, confirm less than 3 fine flickers
3 points: the flicker confirmed when substrate is fixed is less than 2, but make to confirm when substrate movement more than 4 fine flickers
4 points: even if also confirm more than 3 flickers when being fixed by substrate
5 points: even if also confirm flicker in whole face when being fixed by substrate
(2) experimental sequence
[experimental example 1]
By following order, form fine concaveconvex shape on the surface of the glass substrate as transparent substrate.
(1) be that the square aluminosilicate glass substrates of 1.3mm, 5cm floods 30 seconds in the hydrofluoric acid of 2.5 % by weight by thickness, carry out prewashing.
(2) by the Potassium monofluoride of 150g, 50 % by weight aqueous hydrogen fluoride solution 300ml be dissolved in the mixed solution of 350ml pure water and 350ml glacial acetic acid and prepare frosting treatment solution.
(3) glass substrate is flooded 30 seconds in above-mentioned frosting solution, thus carry out pre-etched process.
(4) aluminosilicate glass substrates is taken out from above-mentioned frosting solution, after utilizing flowing water to clean 10 minutes, flood 6 minutes in the aqueous hydrogen fluoride solution of 5 % by weight, carry out etch processes thus, define fine concaveconvex shape on the aluminosilicate glass substrates surface as transparent substrate.
For obtained sample, by above-mentioned evaluation method, respectively Gloss, surfaceness RMS, Δ Gloss/ Δ RMS, mist degree, micro concavo-convex diameter, flicker evaluation are evaluated.
[experimental example 2]
Make frosting treatment solution become by the Potassium monofluoride of 150g, 50 % by weight aqueous hydrogen fluoride solution 300ml be dissolved in solution in pure water 700ml, define fine concaveconvex shape on the surface of transparent substrate in addition in the same manner as experimental example 1.
For obtained sample, evaluate in the same manner as experimental example 1.
For this experimental example, by laser microscope (Keyemce Inc., trade(brand)name: VK-9700), surface observation is carried out to a face of transparent substrate.By shown in Figure 2 for laser microscope image.
In addition, regression straight line when calculating Δ Gloss/ Δ RMS is represented with straight line (a) in Fig. 4.
[experimental example 3]
Make frosting treatment solution become by the Potassium monofluoride of 100g, 50 % by weight aqueous hydrogen fluoride solution 200ml be dissolved in solution in the mixed solution of 400ml pure water and 400ml glacial acetic acid, define fine concaveconvex shape on the surface of transparent substrate in addition in the same manner as experimental example 1.
For obtained sample, evaluate in the same manner as experimental example 1.
[experimental example 4]
Make frosting treatment solution become by the Potassium monofluoride of 100g, 50 % by weight aqueous hydrogen fluoride solution 200ml be dissolved in solution in the pure water of 800ml, define fine concaveconvex shape on the surface of transparent substrate in addition in the same manner as experimental example 1.
For obtained sample, evaluate in the same manner as experimental example 1.
[experimental example 5]
Make frosting treatment solution become by the Potassium monofluoride of 30g, 50 % by weight aqueous hydrogen fluoride solution 60ml be dissolved in solution in the mixed solution of 470ml pure water and 470ml glacial acetic acid, define fine concaveconvex shape on the surface of transparent substrate in addition in the same manner as experimental example 1.
For obtained sample, evaluate in the same manner as experimental example 1.
[experimental example 6]
Make frosting treatment solution become by the Potassium monofluoride of 30g, 50 % by weight aqueous hydrogen fluoride solution 60ml be dissolved in solution in the pure water of 940ml, define fine concaveconvex shape on the surface of transparent substrate in addition in the same manner as experimental example 1.
For obtained sample, evaluate in the same manner as experimental example 1.
[experimental example 7]
By following order, form fine concaveconvex shape on the surface of the glass substrate as transparent substrate.
(1) in the aqueous hydrogen fluoride solution 1000ml of 50 % by weight, add the Neutral ammonium fluoride of 1500g and median size is that the glass microballon 120g of 4 μm stirs, and prepares frosting treatment solution.
(2) be that the square aluminosilicate glass substrates of 1.3mm, 5cm floods 8 minutes in above-mentioned frosting solution by thickness, carry out pre-etched process.
(3) aluminosilicate glass substrates is taken out from above-mentioned frosting solution, after utilizing flowing water to clean 10 minutes, flood 16 minutes in the aqueous hydrogen fluoride solution of 20 % by weight, carry out etch processes thus, thus formed fine concavo-convex on the aluminosilicate glass substrates surface as transparent substrate.
For obtained sample, by above-mentioned evaluation method, respectively Gloss, surfaceness RMS, Δ Gloss/ Δ RMS, mist degree, micro concavo-convex diameter, flicker evaluation are evaluated.
[experimental example 8]
The glass microballon 120g that to make frosting treatment solution become the Neutral ammonium fluoride of 500g and median size be 4 μm is added on the solution in the aqueous hydrogen fluoride solution 1000ml of 50 % by weight, is formed fine concavo-convex in addition in the same manner as experimental example 7 on the surface of transparent substrate.
For obtained sample, evaluate in the same manner as experimental example 7.
In the same manner as experimental example 2, surface observation is carried out to a face of obtained transparent substrate.By shown in Figure 3 for laser microscope image.
In addition, regression straight line when calculating Δ Gloss/ Δ RMS is represented with straight line (b) in Fig. 4.
[experimental example 9]
Frosting treatment solution is become to be added on by the Neutral ammonium fluoride of 500g the solution in the aqueous hydrogen fluoride solution 1000ml of 50 % by weight, formed on the surface of transparent substrate fine concavo-convex in addition in the same manner as experimental example 7.
For obtained sample, evaluate in the same manner as experimental example 7.
[experimental example 10]
The glass microballon 120g that to make frosting treatment solution become the Neutral ammonium fluoride of 1500g and median size be 4 μm be added on 65 % by weight aqueous hydrogen fluoride solution 770ml and glacial acetic acid 230ml mixed solution in solution, formed fine concavo-convex in addition in the same manner as experimental example 7 on the surface of transparent substrate.
For obtained sample, evaluate in the same manner as experimental example 7.
The result of experimental example 1 ~ experimental example 10 is shown in Table 1.
[table 1]
According to these results: the experimental example 1 ~ 6 Δ Gloss/ Δ RMS being met to the regulation of the present application, flicker be evaluated as less than 3 points, obtain the transparent substrate that inhibit flicker.
Further, for the transparent substrate obtained in experimental example 1 ~ 6, owing to defining suitable concavo-convex microtexture, compared with therefore fine with formation concavo-convex front transparent substrate, the reflected glare of light can be suppressed, reduce fingerprint tack.
In addition, comparing carrying out observable Fig. 2, Fig. 3 to the concaveconvex shape of experimental example 2, experimental example 8, for the transparent substrate of experimental example 2, can confirm compared with experimental example 8 and defining very fine recess.By having such structure, can confirm and suppress flicker.In addition, the situation of stating can be said also reflected by Δ Gloss/ Δ RMS when experimental example 2, experimental example 8 are compared.
Above, by embodiment and embodiment etc., transparent substrate is illustrated, but the present invention is not defined in above-mentioned embodiment and embodiment etc.In the scope of the purport of the present invention of claims record, various distortion, change can be carried out.
The application advocates the right of priority of No. 2013-008275, the Japanese Patent Application proposed to Japan Office based on January 21st, 2013, quotes the full content of No. 2013-008275, Japanese Patent Application into this international application.
Claims (4)
1. a transparent substrate, wherein, at least one face, Δ Gloss/ Δ RMS is below-800, and described Δ Gloss/ Δ RMS represents Gloss (%) variable quantity relative to surfaceness RMS (μm) variable quantity.
2. transparent substrate as claimed in claim 1, wherein, described transparent substrate is glass.
3. transparent substrate as claimed in claim 1 or 2, wherein, the Gloss (%) at least one face is less than 95%.
4. as claimed any one in claims 1 to 3 transparent substrate, wherein, the surface treatment by frosting processing and implementation.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013-008275 | 2013-01-21 | ||
| JP2013008275 | 2013-01-21 | ||
| PCT/JP2013/084508 WO2014112297A1 (en) | 2013-01-21 | 2013-12-24 | Transparent substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104936920A true CN104936920A (en) | 2015-09-23 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380071015.0A Pending CN104936920A (en) | 2013-01-21 | 2013-12-24 | Transparent substrate |
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| Country | Link |
|---|---|
| JP (1) | JPWO2014112297A1 (en) |
| KR (1) | KR20150109358A (en) |
| CN (1) | CN104936920A (en) |
| DE (1) | DE112013006464T5 (en) |
| TW (1) | TW201431811A (en) |
| WO (1) | WO2014112297A1 (en) |
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| JP6583372B2 (en) * | 2016-09-27 | 2019-10-02 | Ａｇｃ株式会社 | Glass article |
| JP2018197183A (en) * | 2017-05-23 | 2018-12-13 | Ａｇｃ株式会社 | Glass article, and display unit |
| EP3822234A4 (en) * | 2018-07-09 | 2022-04-27 | Nippon Sheet Glass Company, Limited | Glass plate suitable for image display device |
| JP7435612B2 (en) | 2019-08-26 | 2024-02-21 | Ａｇｃ株式会社 | cover member |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4017273B2 (en) * | 1998-12-25 | 2007-12-05 | 株式会社巴川製紙所 | Antiglare material and polarizing film using the same |
| JP5297321B2 (en) * | 2008-10-07 | 2013-09-25 | Ｈｏｙａ株式会社 | Manufacturing method of glass substrate for magnetic disk |
| US8598771B2 (en) * | 2009-09-15 | 2013-12-03 | Corning Incorporated | Glass and display having anti-glare properties |
| JP5998030B2 (en) * | 2011-12-07 | 2016-09-28 | 日本板硝子株式会社 | Glass for solar cell or display and method for producing the same |
| JP2013216542A (en) * | 2012-04-09 | 2013-10-24 | Mitsubishi Gas Chemical Co Inc | Glass etchant and method for manufacturing textured glass substrate |
-
2013
- 2013-12-24 JP JP2014557373A patent/JPWO2014112297A1/en active Pending
- 2013-12-24 KR KR1020157018861A patent/KR20150109358A/en not_active Application Discontinuation
- 2013-12-24 DE DE112013006464.2T patent/DE112013006464T5/en not_active Withdrawn
- 2013-12-24 CN CN201380071015.0A patent/CN104936920A/en active Pending
- 2013-12-24 WO PCT/JP2013/084508 patent/WO2014112297A1/en active Application Filing
- 2013-12-31 TW TW102149268A patent/TW201431811A/en unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107817616A (en) * | 2017-09-14 | 2018-03-20 | 合肥惠科金扬科技有限公司 | A kind of preparation method of TFT LCD displays glass |
| CN107995329A (en) * | 2017-11-17 | 2018-05-04 | 珠海市魅族科技有限公司 | Glass cover-plate and preparation method thereof and mobile phone |
| CN109903691A (en) * | 2019-03-22 | 2019-06-18 | 深圳立泰触控显示科技有限公司 | A kind of electronic display billboard of anti-dazzle |
Also Published As
| Publication number | Publication date |
|---|---|
| DE112013006464T5 (en) | 2015-10-08 |
| JPWO2014112297A1 (en) | 2017-01-19 |
| TW201431811A (en) | 2014-08-16 |
| KR20150109358A (en) | 2015-10-01 |
| WO2014112297A1 (en) | 2014-07-24 |
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Application publication date: 20150923 |