CN104926099A - Production method for high-purity glass - Google Patents
Production method for high-purity glass Download PDFInfo
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- CN104926099A CN104926099A CN201510273584.4A CN201510273584A CN104926099A CN 104926099 A CN104926099 A CN 104926099A CN 201510273584 A CN201510273584 A CN 201510273584A CN 104926099 A CN104926099 A CN 104926099A
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Abstract
The invention discloses a production method for high-purity glass. The method includes the following steps: gaseous glass material and fuel gas are jetted from a first type of blowtorch to form glass powder, the glass powder forms a deposited rod on a seed rod under temperature capable of ensuring that the produced powder deposited rod has low specific volume density, a second type of blowtorch is then used for heating the deposited rod to increase the density of the powder deposit, the deposited rod is then sintered, and thereby a transparent preform for optical fibers is obtained. By the method, crackless high-purity glass preforms can be produced under a high deposition rate, the practicability is high, and the application prospect is good.
Description
Technical field
The present invention relates to a kind of production method of highly pure glass, be specifically related to a kind of production method of highly pure glass preform for optical fiber, exactly, the one that the present invention relates to outside vapor deposition (be hereinafter called for short " OVD " method) produces fiber glass prefabricated component is improved one's methods, and belongs to glassmaking art.
Background technology
So-called " OVD " method is produced one of method that gas preform adopts usually (see Japanese Patent (disclosing) publication (examination) No.73522/1973/ and No.18909/1974)." OVD " method is included in oxidizing flame and is oxidized this kind of frit of SiCl4, forms the thin glass powder of such as SiO2; At seed rod (such as one mounted glass plug in advance, an i.e. support stick etc. that can remove before or after gas preform sintering) the upper upper thin glass powder of amount deposition by estimating, form the deposition rod of a glass powder, then under suitable atmosphere, sinter this deposition rod and obtain the transparent melten glass prefabricated component of optical fiber.According to common " OVD " method, generally can produce highly pure glass preform with quite high productive rate, simultaneously because deposition and sintering separately carry out, so the drying of gas preform and/or adding of additive can both carry out effectively.
, there are some shortcomings in " OVD " method usually adopted, Here it is, if when in deposition process, the surface temperature of deposition rod is lower, though can improve the deposition of thin glass powder, deposition rod can be tending towards cracking; If deposition surface temperature is too high, although deposition rod can not ftracture, deposition will reduce.
Therefore, how a kind of production method of new highly pure glass is provided, becomes the technical barrier that industry research staff is urgently to be resolved hurrily.
Summary of the invention
In order to overcome the technological deficiency existed in above-mentioned prior art, the object of the present invention is to provide a kind of method.
In order to realize foregoing invention object, technical scheme of the present invention is as follows:
A kind of production method of highly pure glass, this production method comprises sprays vaporous frit and fuel gas formation glass powder from the first blowtorch, with a kind of can make the dust deposit of generation rod there is the temperature of low specific volume density under on seed rod, form deposition rod, then heating this deposition rod with the second blowtorch makes the volume density of dust deposit increase, then sintered deposit rod and obtain the transparent glass prefabricated component of optical fiber;
Wherein, the method also comprises polishing operation and cleaning process, the unmanned cleaning mechanism of described clean employing.
Preferably, described polishing operation adopts sander.
Preferably, the specific volume density range of dust deposit is 0.03 ~ 0.08 before heating; Be 0.16 ~ 0.45 after heating.
Preferred, the specific volume density range of dust deposit is 0.05 ~ 0.8 before heating; Be 0.25 ~ 0.45 after heating.
More specifically, the specific volume density range of dust deposit is 0.06 before heating; Be 0.3 after heating.
Wherein, the temperature in described production process is 500-800 DEG C.
Produce gas preform according to method of the present invention, working efficiency is high, good product quality, the defect existed in prior art can well be overcome, flawless highly pure glass preform can be produced under high deposition, practical, there is good application prospect.
Embodiment
Below in conjunction with specific embodiment, further detailed description explanation is done to technical scheme of the present invention.
Production method of the present invention is: form thin glass powder by a pair blowtorch ejection frit and fuel gas, is deposited as the low dust deposit rod of volume density around the seed rod rotated, and this kind of blowtorch can be single or more.Then, formed deposition rod heating torch is heated.Moved horizontally by blowtorch, the shaped portion of deposition rod then with blowtorch heating, thus can adjust its volume density.When the movement of these blowtorch is contrary with arrow points, available blowtorch replaces this deposition rod of heating, certainly, also can move horizontally with deposition rod the movement replacing blowtorch.Temperature in described production process is 500-800 DEG C.
Deposition depends on the surface temperature of deposition rod in the size of seed rod outside diameter and deposition process., the absolute value that measure the surface temperature of deposition rod is very difficult.Now, the present inventor have found the corresponding relation between the surface temperature of deposition rod and volume density, and dust deposit is wherein made up of SiO2.So the volume density of this kind of dust deposit just can as the second parameter of this deposition rod surface temperature.
ρ/ρ 0 is the specific volume density (wherein ρ 0 is the volume density of desirable sintered glass, and ρ is the volume density of deposition rod) of the dust deposit obtained with the fuel reactant gas containing hydrogen, oxygen by SiCl4.Deposition increases with specific volume density and reduces.When seed rod deposited the thin glass powder thick-layer being about 0.1 than settled density, deposition rod is just easy to ftracture and the dust deposit rate of high-quality reduces.
The present invention is raw materials used can be any one known frit, such as SiCl4, GeCl4 etc.
In the present invention in preferred embodiment, be first formed a kind of specific volume density low to 0.03 ~ 0.08 deposition rod, and then volume density is increased to 0.15 ~ 0.45.In order to increase deposition, best specific volume density is 0.1 or lower than 0.1.But when specific volume density diminish to 0.02 time, then improve in specific volume density process in heating subsequently, volume density can be made uneven or cause deposition rod to be tending towards cracking; When improving volume density, if specific volume density is greater than 0.5, this deposition rod will be difficult to again dehydration or easily make gas preform contain bubble in sintering process.And when specific volume density lower than 0.15 time, deposition rod be tending towards in sintering cracking or thermal effect reduce.
With the deposition rod that usual way sintering is produced by this method, so that they are transformed into transparent gas preform for optical fibre.
Below, the present invention is explained in detail with some examples.
Embodiment 1
The frit of carrier gas carrier band and the fuel gas containing hydrogen, oxygen, nitrogen is made by nitrogen, from with nozzle corresponding the combination blowtorch of four arranged in co-axial alignment cylindrical spout, be sprayed onto around seed rod that an external diameter is 10 millimeters of pure SiO2, in such a situa-tion, can production specific volume density be 0.1 thin glass powder deposition rod.In order to adjust the volume density of this deposition rod, a blowtorch can be respectively set on the both sides of combination blowtorch, be burnt by the blowtorch on both sides, heat established deposition rod and make its volume density be increased to 0.2.The average deposition rate of thin glass powder deposition rod is 60%.The deposition rod purity produced is high, and does not ftracture.
Comparative example 1
Produce deposition rod by the mode identical with embodiment 1, but gas injection speed sprays frit and fuel gas, not the blowtorch of Use Adjustment deposition volume density.When specific volume density is about 0.2, average deposition rate is only about 45%.
Comparative example 2
Produce deposition rod by the mode identical with embodiment 1, but the blowtorch of volume density of not Use Adjustment deposition, when the external diameter of dust deposit rod reaches 70 millimeters, stop supplying raw material, oxygen and hydrogen, deposition rod ftractures.
Though the present invention embodiment contrasted believed as the richest practicality is described, but it should be understood that under the premise of without departing from the spirit of the present invention, the present invention can also adopt some other specific form to embody.Thus; in any case more above-mentioned embodiments only should be regarded as indicative; and should not be considered as limitting by wherein disclosed details, but these embodiments are consistent with whole protection domains of applied for claim, thus just can summarize any type of and all methods of equal value with it.
Claims (6)
1. the production method of a highly pure glass, it is characterized in that, this production method comprises sprays vaporous frit and fuel gas formation glass powder from the first blowtorch, with a kind of can make the dust deposit of generation rod there is the temperature of low specific volume density under on seed rod, form deposition rod, then heating this deposition rod with the second blowtorch makes the volume density of dust deposit increase, then sintered deposit rod and obtain the transparent glass prefabricated component of optical fiber;
Wherein, the method also comprises polishing operation and cleaning process, the unmanned cleaning mechanism of described clean employing.
2. the production method of a kind of highly pure glass according to claim 1, is characterized in that, described polishing operation adopts sander.
3. the production method of a kind of highly pure glass according to claim 1 and 2, is characterized in that, the specific volume density range of dust deposit, is 0.03 ~ 0.08 before heating; Be 0.16 ~ 0.45 after heating.
4. the production method of a kind of highly pure glass according to claim 3, is characterized in that, the specific volume density range of dust deposit, is 0.05 ~ 0.8 before heating; Be 0.25 ~ 0.45 after heating.
5. the production method of a kind of highly pure glass according to claim 4, is characterized in that, the specific volume density range of dust deposit, is 0.06 before heating; Be 0.3 after heating.
6. the production method of a kind of highly pure glass according to claim 1, is characterized in that, the temperature in described production process is 500-800 DEG C.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510273584.4A CN104926099A (en) | 2015-05-26 | 2015-05-26 | Production method for high-purity glass |
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| CN201510273584.4A CN104926099A (en) | 2015-05-26 | 2015-05-26 | Production method for high-purity glass |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN85101855A (en) * | 1984-03-07 | 1987-01-17 | 住友电气工业株式会社 | The production method of highly pure glass preform for optical fiber |
| CN1421409A (en) * | 2001-11-30 | 2003-06-04 | 株式会社藤仓 | Process for producing light fiber mother material |
| CN102741183A (en) * | 2010-03-03 | 2012-10-17 | 株式会社藤仓 | Method of manufacture for porous quartz material, method of manufacture for optical fibre pre-form, porous quartz material and optical fibre pre-form |
| CN103842306A (en) * | 2011-08-09 | 2014-06-04 | 古河电气工业株式会社 | Optical fiber base material and method for manufacturing optical fiber |
| JP2015071517A (en) * | 2013-10-04 | 2015-04-16 | 住友電気工業株式会社 | Manufacturing method for glass base material for optical fiber |
-
2015
- 2015-05-26 CN CN201510273584.4A patent/CN104926099A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN85101855A (en) * | 1984-03-07 | 1987-01-17 | 住友电气工业株式会社 | The production method of highly pure glass preform for optical fiber |
| CN1421409A (en) * | 2001-11-30 | 2003-06-04 | 株式会社藤仓 | Process for producing light fiber mother material |
| CN102741183A (en) * | 2010-03-03 | 2012-10-17 | 株式会社藤仓 | Method of manufacture for porous quartz material, method of manufacture for optical fibre pre-form, porous quartz material and optical fibre pre-form |
| CN103842306A (en) * | 2011-08-09 | 2014-06-04 | 古河电气工业株式会社 | Optical fiber base material and method for manufacturing optical fiber |
| JP2015071517A (en) * | 2013-10-04 | 2015-04-16 | 住友電気工業株式会社 | Manufacturing method for glass base material for optical fiber |
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