CN104910406B - A method of passing through surface-crosslinked raising thin polymer film water vapor rejection performance - Google Patents
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Abstract
Pass through the surface-crosslinked method for improving thin polymer film water vapor rejection performance the invention discloses a kind of, under vacuum conditions, polymer surfaces are bombarded with the hydrogen molecule with energy, cause polymer surfaces cross-linking reaction, obtain the polymer that surface has water vapor rejection performance.The present invention bombards polymer surfaces by the neutral hydrogen molecule of high energy, causes polymer surfaces cross-linking reaction, formed be firmly combined, fine and close surface graft layer, so that polymer is obtained good water vapor rejection ability.Most importantly method reaction condition of the invention is mild, not will cause polymer molecule degradation during cross-linked polymer surface and destroys, can effectively improve the water vapor rejection ability of film, while retaining the original physical property of polymer film.
Description
Technical field
Pass through the surface-crosslinked method for improving thin polymer film water vapor rejection performance the present invention relates to a kind of.
Background technique
The steam in air is obstructed to anti-corrosion of metal, electronic component protection, food fresh keeping and historical relic's protection have emphatically
Want meaning.Polymer barrier protection materials have the characteristics that flexibility is good, at low cost, easy to process, be widely used in every
From moisture.However, polymer barrier material is since it is with low chain bulk density and crystallinity relative to inorganic barrier material
And cause water vapor rejection performance insufficient.
Currently, the methods of vacuum vapor deposition inorganic coating, addition inorganic laminar filler, cross-linking reaction are used to improve poly-
The water vapor rejection performance of object is closed, cardinal principle is building compact texture, hinders steam in the molecular gap of thin polymer film
Diffusion.Wherein, not only raw material are expensive and preparation process is complicated for the inorganic coating (such as silica and aluminium) of deposition compact, relate to
And high temperature, multiple deposition steps, and barrier coat obtained is easily broken layering, leads to barrier layer failure (Journal of
Applied Physics 2009,106,5331-5336).Sheet material (clay and the graphite of low-permeability are dosed in the polymer
Alkene) formed composite material water vapor rejection performance (Carbohydrate Polymers 2011,86,691-699) can be improved,
But since nano-filled object is easy to reunite in the polymer, often lead to practical preparation processing difficulties.Cross-linking reaction can subtract
The free volume of small polymer obstructs steam, it usually needs adds crosslinking agent in the thin polymer film preparation process and causes material
Entirety is crosslinked and realizes barrier, but whole be crosslinked can make material embrittlement, and application system is limited.Therefore, urgent need to post-process, table
The mode of surface treatment is crosslinked to realize, thus the original mechanical property expanded application range of reserved materials.And currently with it is equal from
The post-processing approach such as son, ultraviolet lighting although can trigger it is surface-crosslinked reaction (Journal of food science2012,
77,15-23；Journal of Materials Chemistry 2012,22,4881-4889), but film is destroyed simultaneously, draw
Enter defect, is unable to improve the water vapor rejection performance of film.
Summary of the invention
It is an object of the invention to overcome improve in the prior art thin polymer film barrier property method stability difference or
The problem of bringing new destruction provides a kind of mild surface cross-linking process, improves the barrier property of thin polymer film.
In order to achieve the above-mentioned object of the invention, the present invention provides following technical schemes:
A method of by surface-crosslinked raising thin polymer film water vapor rejection performance, under vacuum conditions, with band energy
The hydrogen molecule of amount bombards polymer surfaces, causes polymer surfaces cross-linking reaction, and obtaining surface has water vapor barrier property
The polymer of energy.
The neutral hydrogen molecule with energy is used in the present invention to bombard polymer surfaces, and then causes polymerization.It is poly-
All part is destroyed by the bombardment of neutral hydrogen molecule and is generated free radicals, free radical is again containing a large amount of neutral keys in adduct molecule
New crosslinking bonding is formed, polymer surfaces is made to be crosslinked the even closer purpose for realizing enhancing barrier steam performance.The vacuum
Condition is the practical attainable vacuum degree of existing science and technology, and refers not to absolute vacuum.It controls vacuum condition and mainly protects hydrogen
Molecule reduces interference during being bombarded, and improves the efficiency that bombardment generates radical crosslinking.Especially with certain energy
Hydrogen molecule carries out bombardment reaction, causes crosslinked action.
Further, the polymer is mainly the polymer containing C-H bond.All containing a large amount of hydrocarbon in polymer molecule
Key destroys part C-H bond by the bombardment of neutral hydrogen molecule and generates free radicals, and free radical forms new crosslinking bonding again, makes
Polymer surfaces are crosslinked the even closer purpose for realizing enhancing barrier steam performance.It is formed by using hydrogen molecule bombardment C-H bond
Cross-bond is mainly carbon-carbon bond, C-H bond, has the good feature similar with main chain structure structure of stability, to the reason of polymer itself
It is small to change property influence.Preferably, the polymer is Parylene C.
Further, the hydrogen molecule with energy is the kinetic energy by colliding with energy protons and hydrogen
Hydrogen molecule.Preferably, the hydrogen molecule energy is 10-30eV.Proton is that hydrogen atom loses the core after electronics, is easy by electric field
Acceleration fill can, collided using high energy proton and hydrogen molecule, hydrogen molecule made to obtain energy, and isolated proton can be
Energy combines two-by-two after reducing and generates neutral hydrogen molecule.It will not be generated when obtaining the hydrogen molecule of kinetic energy other to being crosslinked with
Dysgenic deleterious molecular/atom.
It further, the use of the time span that neutral hydrogen molecule bombards is 30 seconds to 20 minutes.It is bombarded using neutral hydrogen molecule
Process be polymer surfaces C-H bond fracture recombination process, bombard the disconnected of the C-H bond on a period of time post-consumer polymer surface
It splits and crosslinking reaches balance, the intensity of crosslinking can not be enhanced by continuing growing bombardment time, may destroy polymer molecule instead
Middle backbone, so that polymer surfaces brittleness increases.In conjunction with analysis of experiments, less than 30 seconds possibility of neutral hydrogen molecule bombardment time
Crosslinking is insufficient or cannot effectively be crosslinked, and the time is more than to bombard not to be further added by the degree of cross linking after twenty minutes, does not promote the effect of barrier steam
Fruit, the brittleness that in addition can also affect on polymer increase.
Further, polymer is surface-crosslinked with a thickness of 5-60nm.For improving the main of polymer water vapour locking separating performance
It is the crosslinking degree on the surface of polymer, the high energy hydrogen molecule blast technique that the present invention uses is aiming at the hydrocarbon of polymer surfaces
The crosslinking control that chemical bond carries out.The energy of adjustment hydrogen molecule can increase the depth of bombardment, improve deeper crosslinking, but
For the water vapor rejection performance of polymer, internal crosslinking enhancing be more increase the hard brittleness in its surface and for whole
The water vapor rejection performance of body might not have humidification outstanding, comprehensively consider the cost of crosslinking and proposing for water vapor rejection performance
It rises, controls surface-crosslinked with a thickness of 5-60nm.
Further, polymer first passes through cleaning treatment in advance.Cleaning removes the impurity of polymer surfaces adherency, increases hydrogen molecule
Directly efficiency of the bombardment to polymer surfaces.Preferably, polymer is rinsed using organic solvents such as acetone, ethyl alcohol.Make
The surface of polymer, acetone and ethyl alcohol are rinsed with acetone or alcohol etc. has weaker dissolubility to polymer, and flushing can have
The impurity component of the removal molecular weight of effect, and destruction is not generated for the main structure of polymer.It can be in flushing process
It is rinsed using one or more solvents.
Further, the polymer is thin polymer film.The film refers to the polymer that the form of film is made, and is not specific to
The polymer film of a certain specific thickness.Various preservation and antisepsis etc. ought be used for for thin polymer film and need the case where obstructing steam,
Using surface cross-linking process of the invention thin polymer film can be greatly promoted in the case where not changing the thickness of film
Water vapor rejection performance.
Further, polymer is bombarded using the hydrogen molecule that superthermal hydrogen system generates kinetic energy, realizes polymer table
The crosslinking Treatment in face.
Compared with prior art, beneficial effects of the present invention:
1. the hydrogen molecule of kinetic energy of the invention collides polymer surfaces, the C-H bond of polymer surfaces molecule may be implemented
Selectivity fracture forms carbon radicals, while carbon radicals further couple crosslinking, and formation is firmly combined, fine and close surface is handed over
Join layer, and the surface graft layer opposing body formed has higher water vapor rejection ability.And in the inorganic of polymer surfaces deposition
Coating is usually because the problem of binding force difference can remove failure.
2. C-H bond is broken using the controllable neutral hydrogen collision polymer surfaces property of can choose of kinetic energy, without will cause it
He is broken (such as carbon-carbon bond) by key, and this method reaction condition is mild, not will cause polymer during cross-linked polymer surface
Molecular degradation destroys, and can be effectively retained the original physical property of polymer film (such as mechanical strength, light transmittance).
Detailed description of the invention:
Fig. 1 is that the present invention generates a kind of schematic device with the hydrogen molecule of kinetic energy.
Marked in the figure: 1- hydrogen plasma, the first electric field of 2-, 3- collision cell, the second electric field of 4-, 5- sample.
Specific embodiment
Implement the method for the present invention concrete scheme:
A method of by surface-crosslinked raising thin polymer film water vapor rejection performance, feature the following steps are included:
(1) polymeric film surface is rinsed with acetone, ethyl alcohol；(2) thin polymer film after flushing is put into plasma chamber, taken out true
It is empty；(3) be passed through hydrogen in cavity, hydrogen plasma inspired by microwave device, under the action of electric field plasma with
Hydrogen in cavity is collided, and is generated the neutral hydrogen molecule with certain kinetic energy and is bombarded polymer surfaces, causes polymer surfaces
Cross-linking reaction obtains the thin polymer film with certain water vapor rejection performance.
By electric field acceleration, the hydrogen in plasma and cavity with kinetic energy is touched proton in hydrogen plasma
It hits, generates high energy neutrality hydrogen molecule to bombard polymer surfaces, cause polymer surfaces cross-linking reaction, formation is firmly combined, causes
Close surface graft layer, the surface graft layer opposing body newly formed have higher water vapor rejection ability.This method reaction condition
Mildly, it not will cause polymer molecule degradation during cross-linked polymer surface to destroy, the water of film can be effectively improved
Vapour obstructing capacity, while retaining the original physical property of polymer film (such as mechanical strength, light transmittance).
Further, polymer is dried up with inert gas after step (1) is rinsed.Such as use nitrogen by polymer table
Ground drying.
Further, it is 0~10Pa that step (2), which vacuumizes air pressure in post plasma cavity, and vacuumizing quickly to be discharged
Air bombards subsequent neutral hydrogen molecule and provides good environmental condition.Since absolute vacuum is unable to reach, those skilled in the art
Member is it is understood that vacuumizing the intracorporal air pressure of back cavity above cannot be zero, but can infinitely connect in the case where technology allows
Nearly absolute vacuum 0Pa.Preferably 1 × 10-4~2 × 10-1It is corresponding true to limit the preferably above air pressure according to prior art by Pa
Reciprocal of duty cycle realizes good balance between processing cost and processing quality.
Further, negative electrode is placed at 5~10cm of plasma discharge region, the effect of electrode is to accelerate plasma
Certain kinetic energy is made it have, polymer surfaces can be bombarded and generate new free radical, electrode, which can also be referred to as, accelerates electrode,
Corresponding pressurization is known as acceleration voltage, and the voltage range of electrode is 80~250V.Preferred voltage is 100-250V.
Further, processed polymer thin membrane sample is 40-70cm, film sample top with a distance from plasma discharge
Positive and negative two electrode plates are placed at 10~20cm respectively.
The schematic illustration of super hot stressing sample as shown in Figure 1, the plasma 1 of microwave device excitation in the first electric field
A large amount of kinetic energy are obtained under 2 acceleration, subsequently into collision cell 3 and neutral hydrogen molecular collision therein, there is hydrogen molecule
A large amount of kinetic energy.Then pole is gone by the second electric field 4 from the plasma that collision cell 3 comes out, only retains neutral hydrogen molecule from gap
Pass through.After hydrogen molecule with kinetic energy passes through the second electric field 4, bombards on sample 5, make carbon-carbon bond, the C-H bond of sample surfaces
Etc. breaking to form free radical, and then realize the cross-linking reaction of polymer surfaces.
Below with reference to test example and specific embodiment, the present invention is described in further detail.But this should not be understood
It is all that this is belonged to based on the technology that the content of present invention is realized for the scope of the above subject matter of the present invention is limited to the following embodiments
The range of invention.
Embodiment 1
Poly monochloro-para-xylylene (100 μm of thickness) is fixed on to the sample of superthermal hydrogen system (102414359 A of CN)
On platform, processed polymer thin membrane sample is 50cm with a distance from plasma discharge, is distinguished at 10-20cm above film sample
It is placed with positive and negative two repulsions electrode plate.It opens vacuum pump to vacuumize, then passes to 14SCCM (standard milliliters/minute) hydrogen, and
Microwave plasma is opened, accelerating power source is opened and repels power supply, acceleration voltage 100V is with the hydrogen bombardment film sample time
1min obtains the modified thin polymer film for improving surface water vapor rejection performance.
Embodiment 2
Identical poly monochloro-para-xylylene is fixed on the sample stage of superthermal hydrogen system in practical and embodiment 1, quilt
The polymer thin membrane sample of processing is 60cm with a distance from plasma discharge, is placed with respectively just at 10-20cm above film sample
Minus two repulsions electrode plate.Vacuum pump is opened, vacuum degree in cavity is made to reach 6 × 10-4When Pa, it is successively passed through 14SCCM hydrogen,
And open microwave plasma, open accelerating power source and repel power supply, wherein microwave power is 300W, acceleration voltage 100V, is used
Hydrogen bombards the film sample time for 1min, obtains the film of surface water vapor rejection performance enhancing.
Embodiment 3
Poly monochloro-para-xylylene (100 μm of thickness) is put into the container containing acetone and is cleaned by ultrasonic 15min, uses nitrogen
Air-blowing is dry.Film is fixed on the sample stage of superthermal hydrogen system, processed polymer thin membrane sample is from plasma discharge
Distance is 45cm, is placed with positive and negative two repulsions electrode plate respectively at 10-20cm above film sample.Vacuum pump is opened, cavity is made
Interior vacuum degree reaches 6 × 10-4When Pa, it is successively passed through 14SCCM hydrogen, and open microwave plasma, opens accelerating power source and repulsion
Power supply, wherein microwave power is 300W, acceleration voltage 100V, is 1min with the hydrogen bombardment film sample time, obtains surface
The film of water vapor rejection performance enhancing.
Embodiment 4
Poly monochloro-para-xylylene (100 μm of thickness) is sequentially placed into the container containing ethyl alcohol and is cleaned by ultrasonic 15min,
With being dried with nitrogen.Film is fixed on the sample stage of superthermal hydrogen system, processed polymer thin membrane sample is put from plasma
Electric offset is placed with positive and negative two repulsions electrode plate at 10-20cm above film sample from for 60cm respectively.Vacuum pump is opened, is made
Vacuum degree reaches 6 × 10 in cavity-4When Pa, be successively passed through 14SCCM hydrogen, and open microwave plasma, open accelerating power source and
Repel power supply, wherein microwave power be 300W, acceleration voltage 100V, with hydrogen bombardment the film sample time be 1min, obtain
The film of surface water vapor rejection performance enhancing.
Embodiment 5
By poly monochloro-para-xylylene (100 μm of thickness) be sequentially placed into containing acetone, ethyl alcohol container in be cleaned by ultrasonic
15min, with being dried with nitrogen.Film is fixed on the sample stage of superthermal hydrogen system, processed polymer thin membrane sample from etc.
Ionic discharge offset is placed with positive and negative two repulsions electrode plate at 10-20cm above film sample from for 60cm respectively.Open vacuum
Pumping vacuum then passes to 14SCCM hydrogen, and opens microwave plasma, opens accelerating power source and repels power supply, acceleration voltage
It is 1min with the hydrogen bombardment film sample time for 100V, obtains the modified thin polymer film for improving surface water vapor rejection performance.
Embodiment 6
Identical poly monochloro-para-xylylene is fixed on the sample stage of superthermal hydrogen system in practical and embodiment 1, quilt
The polymer thin membrane sample of processing is 60cm with a distance from plasma discharge, is placed with respectively just at 10-20cm above film sample
Minus two repulsions electrode plate.Vacuum pump is opened, vacuum degree in cavity is made to reach 6 × 10-4When Pa, it is successively passed through 14SCCM hydrogen,
And open microwave plasma, open accelerating power source and repel power supply, wherein microwave power is 300W, acceleration voltage 100V, is used
Hydrogen bombards the film sample time for 3min, obtains the film of surface water vapor rejection performance enhancing.
Embodiment 7
By poly monochloro-para-xylylene (100 μm of thickness) be put into containing acetone, ethyl alcohol container in be cleaned by ultrasonic
15min, with being dried with nitrogen.Film is fixed on the sample stage of superthermal hydrogen system, processed polymer thin membrane sample from etc.
Ionic discharge offset is placed with positive and negative two repulsions electrode plate at 10-20cm above film sample from for 60cm respectively.Open vacuum
Pump, makes vacuum degree in cavity reach 6 × 10-4When Pa, it is successively passed through 14SCCM hydrogen, and open microwave plasma, opens and accelerate
Power supply and repulsion power supply, wherein microwave power is 300W, acceleration voltage 100V, is with the hydrogen bombardment film sample time
5min obtains the film of surface water vapor rejection performance enhancing.
Embodiment 8
By poly monochloro-para-xylylene (100 μm of thickness) be sequentially placed into containing acetone, ethyl alcohol container in be cleaned by ultrasonic
15min, with being dried with nitrogen.Film is fixed on the sample stage of superthermal hydrogen system, processed polymer thin membrane sample from etc.
Ionic discharge offset is placed with positive and negative two repulsions electrode plate at 10-20cm above film sample from for 60cm respectively.Open vacuum
Pump, makes vacuum degree in cavity reach 6 × 10-4When Pa, it is successively passed through 14SCCM hydrogen, and open microwave plasma, opens and accelerate
Power supply and repulsion power supply, wherein microwave power is 300W, acceleration voltage 100V, is with the hydrogen bombardment film sample time
10min obtains the film of surface water vapor rejection performance enhancing.
Embodiment 9
By poly monochloro-para-xylylene (100 μm of thickness) be sequentially placed into containing acetone, ethyl alcohol container in be cleaned by ultrasonic
15min, with being dried with nitrogen.Film is fixed on the sample stage of superthermal hydrogen system, processed polymer thin membrane sample from etc.
Ionic discharge offset is placed with positive and negative two repulsions electrode plate at 10-20cm above film sample from for 60cm respectively.Open vacuum
Pump, makes vacuum degree in cavity reach 6 × 10-4When Pa, it is successively passed through 14SCCM hydrogen, and open microwave plasma, opens and accelerate
Power supply and repulsion power supply, wherein microwave power is 300W, acceleration voltage 100V, is with the hydrogen bombardment film sample time
15min obtains the film of surface water vapor rejection performance enhancing.
Embodiment 10
By poly monochloro-para-xylylene (100 μm of thickness) be sequentially placed into containing acetone, ethyl alcohol container in be cleaned by ultrasonic
15min, with being dried with nitrogen.Film is fixed on the sample stage of superthermal hydrogen system, processed polymer thin membrane sample from etc.
Ionic discharge offset is placed with positive and negative two repulsions electrode plate at 10-20cm above film sample from for 60cm respectively.Open vacuum
Pump, makes vacuum degree in cavity reach 6 × 10-4When Pa, it is successively passed through 14SCCM hydrogen, and open microwave plasma, opens and accelerate
Power supply and repulsion power supply, wherein microwave power is 300W, acceleration voltage 100V, is with the hydrogen bombardment film sample time
20min obtains the film of surface water vapor rejection performance enhancing.
Embodiment 11
By poly monochloro-para-xylylene (100 μm of thickness) be sequentially placed into containing acetone, ethyl alcohol container in be cleaned by ultrasonic
15min, with being dried with nitrogen.Film is fixed on the sample stage of superthermal hydrogen system, processed polymer thin membrane sample from etc.
Ionic discharge offset is placed with positive and negative two repulsions electrode plate at 10-20cm above film sample from for 60cm respectively.Open vacuum
Pump, makes vacuum degree in cavity reach 6 × 10-4When Pa, it is successively passed through 14SCCM hydrogen, and open microwave plasma, opens and accelerate
Power supply and repulsion power supply, wherein microwave power is 300W, acceleration voltage 100V, is with the hydrogen bombardment film sample time
25min obtains the film of surface water vapor rejection performance enhancing.
Embodiment 12
By poly monochloro-para-xylylene (100 μm of thickness) be sequentially placed into containing acetone, ethyl alcohol container in be cleaned by ultrasonic
15min, with being dried with nitrogen.Film is fixed on the sample stage of superthermal hydrogen system, processed polymer thin membrane sample from etc.
Ionic discharge offset is placed with positive and negative two repulsions electrode plate at 10-20cm above film sample from for 60cm respectively.Open vacuum
Pump, makes vacuum degree in cavity reach 6 × 10-4When Pa, it is successively passed through 14SCCM hydrogen, and open microwave plasma, opens and accelerate
Power supply and repulsion power supply, wherein microwave power is 300W, acceleration voltage 150V, is with the hydrogen bombardment film sample time
1min obtains the film of surface water vapor rejection performance enhancing.
Embodiment 13
By poly monochloro-para-xylylene (100 μm of thickness) be sequentially placed into containing acetone, ethyl alcohol container in be cleaned by ultrasonic
15min, with being dried with nitrogen.Film is fixed on the sample stage of superthermal hydrogen system, processed polymer thin membrane sample from etc.
Ionic discharge offset is placed with positive and negative two repulsions electrode plate at 10-20cm above film sample from for 60cm respectively.Open vacuum
Pump, makes vacuum degree in cavity reach 6 × 10-4When Pa, it is successively passed through 14SCCM hydrogen, and open microwave plasma, opens and accelerate
Power supply and repulsion power supply, wherein microwave power is 300W, acceleration voltage 150V, is with the hydrogen bombardment film sample time
20min obtains the film of surface water vapor rejection performance enhancing.
Embodiment 14
By poly monochloro-para-xylylene (100 μm of thickness) be sequentially placed into containing acetone, ethyl alcohol container in be cleaned by ultrasonic
15min, with being dried with nitrogen.Film is fixed on the sample stage of superthermal hydrogen system, processed polymer thin membrane sample from etc.
Ionic discharge offset is placed with positive and negative two repulsions electrode plate at 10-20cm above film sample from for 60cm respectively.Open vacuum
Pump, makes vacuum degree in cavity reach 6 × 10-4When Pa, it is successively passed through 14SCCM hydrogen, and open microwave plasma, opens and accelerate
Power supply and repulsion power supply, wherein microwave power is 300W, acceleration voltage 150V, is with the hydrogen bombardment film sample time
25min obtains the film of surface water vapor rejection performance enhancing.
Comparative example 1
Difference with embodiment 14 is that acceleration voltage is 200V, is 1min with the hydrogen bombardment film sample time, remaining reality
It is consistent to test condition.
Comparative example 2
Difference with embodiment 14 is that acceleration voltage is 200V, is 20min with the hydrogen bombardment film sample time, remaining
Experiment condition is consistent.
Comparative example 3
Difference with embodiment 14 is that acceleration voltage is 200V, is 25min with the hydrogen bombardment film sample time, remaining
Experiment condition is consistent.
Comparative example 4
Difference with embodiment 14 is that acceleration voltage is 250V, is 1min with the hydrogen bombardment film sample time, remaining reality
It is consistent to test condition.
Comparative example 5
Difference with embodiment 14 is that acceleration voltage is 250V, is 20min with the hydrogen bombardment film sample time, remaining
Experiment condition is consistent.
Comparative example 6
Difference with embodiment 14 is that acceleration voltage is 250V, is 25min with the hydrogen bombardment film sample time, remaining
Experiment condition is consistent.
Performance evaluation
For the water vapor rejection performance of test sample, all original poly monochloro-para-xylylene (100 μm of thickness) samples
It is tested with by embodiment 1-14 crosslinking Treatment rear film water vapour permeability, light transmittance and tensile strength, the tool of properties of sample
Test result is as follows for body shown in table.
Test result after 1 film crosslinking Treatment of table
By upper table embodiment 1-5 as it can be seen that when whether polymeric film surface cleans modified for surface and does not have absolute
Influence.Though the length of time of high energy hydrogen molecule bombardment has a very big impact the characteristic of polymer surfaces, no matter
Be bombardment time it is too short or it is too long all can to the surface property of thin polymer film generate large effect.When high energy hydrogen molecule bombards
When time is too short, the molecule of polymer surfaces is not cross-linked to form compact texture effectively, can not effectively enhance water vapor barrier property
Energy；When bombardment time is too long, crosslinking humidification is lower than bombardment destruction, and as a result polymer surfaces are instead by a large amount of
It destroys, so that surface water vapor rejection performance declines.Influence further with regards to acceleration voltage is also similar to that bombardment time, if voltage
Too low, bombardment is difficult to effectively destroy C-H bond, can not form free radical, also can not just generate new crosslinking bonding action.
Claims (2)
1. a kind of method by surface-crosslinked raising thin polymer film water vapor rejection performance,
Under vacuum conditions, bombardment 3-20 minutes is carried out to polymeric film surface with the hydrogen molecule with energy, causes polymer
Film surface cross-linking reaction obtains the thin polymer film that surface has water vapor rejection performance；
The polymer is Parylene C；
The thin polymer film it is surface-crosslinked with a thickness of 5-60 nm；
The hydrogen molecule with energy is the hydrogen molecule of the kinetic energy by colliding with energy protons and hydrogen；
The hydrogen molecule energy be 10-30eV, it is described with energy protons be by electric field acceleration obtain kinetic energy proton, accelerate electricity
Pressure is 100-250V.
2. method according to claim 1, which is characterized in that the polymer first passes through cleaning treatment in advance.
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| CN107880305B (en) * | 2017-12-19 | 2020-10-30 | 中物院成都科学技术发展中心 | Polymer composite material with high gas and liquid barrier properties and preparation method thereof |
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