CN103831027A - Method for improving pollution resistance of PVDF (polyvinylidene fluoride) porous membrane based on plasmas technology - Google Patents
Method for improving pollution resistance of PVDF (polyvinylidene fluoride) porous membrane based on plasmas technology Download PDFInfo
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Abstract
The invention provides a method for improving the pollution resistance of a PVDF (polyvinylidene fluoride) porous membrane based on a plasmas technology. The method is characterized by specifically comprising the following steps of 1. cleaning the PVDF porous membrane to remove impurities, carrying out air-drying on the PVDF porous membrane, and arranging the PVDF porous membrane in a low-temperature plasma instrument for pretreatment; 2. impregnating the pretreated PVDF porous membrane in a target polymer solution for adsorption, and carrying out air-drying on the impregnated PVDF porous membrane, wherein a target polymer in the target polymer solution is a hydrophilic polymer, a solvent is water or an acidic aqueous solution, and the mass concentration of the target polymer solution is 1 to 20 percent; 3. arranging the PVDF porous membrane treated in the step 2 in the low-temperature plasma instrument for modification treatment, and cleaning the modified PVDF porous membrane. According to the method, the target polymer is grafted to the surface of the PVDF porous membrane to improve the surface properties of the membrane and improve the pollution resistance of the surface of the membrane; the membrane surface modification method is simple and easy to implement, and applicable to large-scale production, and has energy-saving and environment-friendly effects.
Description
Technical field
The invention belongs to membrane surface modification field, particularly introduce the hydrophilic polymer with good anti-soil effect at PVDF porous film surface, promote the method for its stain resistance.Specifically, by lower temperature plasma technology processing, directly subject polymer is bonded in to film surface, permanent change porous film surface character.
Background technology
Present stage, membrane separation technique became the important means of water treatment, and membrane pollution problem has reduced the service life of film largely, has restricted further applying of membrane technology.Pvdf membrane has good heat endurance, chemical stability and mechanical performance and becomes one of maximum membrane material of use, but due to surface energy and stronger hydrophobicity extremely low after its film forming, the very easily organic pollution such as adhesion protein, in use pollution problem is serious, causes the defect that energy consumption is high, service life is short.A large amount of research work now simultaneously proves, the hydrophilic modifying on film surface is to promote very effective method of diffusion barrier contamination resistance, adopt effective modified method, it is imperative for the widespread adoption of pvdf membrane to improve pvdf membrane hydrophily and suppress the absorption of film surface contaminant.
In the pvdf membrane method of modifying of present stage, chemical method is larger to film infringement itself, and the strong acid and strong base waste liquor contamination of generation is serious.In Physical, Electron Beam Irradiation, because energy is too high, easily causes molecular chain degradation, and ultraviolet rule, because energy is too low, easily forms a large amount of homopolymers.And plasma technique only relates to surperficial hundreds of nanometer to the processing of material, transitory efficient, environment friendly and pollution-free, to processing material without his special requirement.In plasma, comprise ion, electronics, the uncharged particle system of free radical and metastable particle, wherein the energy of various particles is a few to tens of electron volts, in polymer molecule, the bond energy of various chemical bonds is several to tens electron volts, therefore in the time carrying out plasma discharge processing, high energy particle attack polymer molecule, can open the various covalent bonds of polymer molecule, make in polymer chemical bond rupture and reconfigure, impel it to carry out surface etch, introduce polar group, reaction such as surface-crosslinked grade, so do not need the polymerizable functional groups such as two keys in plasma polymerization, just can be directly by mutual bonding between polymer molecule, when material is after polymer monomer atmosphere or adsorpting polymerization thing monomer, can directly form on film surface the thin polymer film of crosslinked shape.In the present invention, will make full use of the bonding function of plasma to organic molecule, realize the surface modification to perforated membrane.
Summary of the invention
The object of this invention is to provide a kind of method of improving polyvinylidene fluoride porous film antifouling property based on plasma technique.
In order to achieve the above object, the invention provides a kind of method of improving polyvinylidene fluoride porous film antifouling property based on plasma technique, it is characterized in that, concrete steps comprise:
The first step: PVDF perforated membrane is cleaned to removal of impurities and dries, be placed in plasma instrument and carry out pretreatment;
Second step: pretreated PVDF perforated membrane is soaked in subject polymer solution and is adsorbed, dry; In described subject polymer solution, subject polymer is hydrophilic polymer, and solvent is water or acidic aqueous solution, and the mass concentration of subject polymer solution is 1%～20%;
The 3rd step: PVDF perforated membrane after treatment second step is placed in to plasma instrument and carries out modification, and the PVDF perforated membrane after modification is cleaned.
Preferably, the pretreated treatment conditions in the described first step are: between film and electrode, distance is 1～10 centimetre, and the discharge gas passing in chamber is air or argon gas, and discharge power is 50～500 watts, and the processing time is 30～300 seconds.
Preferably, the treatment conditions of the modification in described the 3rd step are: between film and electrode, distance is 1～10 centimetre, and the discharge gas passing in chamber is air or argon gas, and discharge power is 50～500 watts, and the processing time is 30～300 seconds.
Preferably, the hydrophilic polymer in described second step is at least one in polyethylene glycol, polyacrylic acid, kayexalate and shitosan.
Preferably, the PVDF perforated membrane in the described first step is Flat Membrane or hollow-fibre membrane, ultrafiltration and microfiltration membranes all can, but be not limited to this.
Preferably, the adsorption time in described second step is 12 hours.
Preferably, in described the 3rd step, the cleaning of the PVDF perforated membrane after modification is adopted to first ultrasonic cleaning, the mode of rear stirring and washing, cleaning solvent is the aqueous solution or the acidic aqueous solution of very easily solubilized target polymer.
Compared with prior art, the invention has the beneficial effects as follows:
The present invention is at PVDF porous film surface grafting subject polymer, to improve film surface nature, realizes and promotes film surface anti-pollution ability, is a kind of simple, energy-conserving and environment-protective, the membrane surface modification method that is applicable to carry out large-scale production.
The specific embodiment
Below in conjunction with specific embodiment, describe the present invention in detail, should be appreciated that, these embodiment can be used to illustrate the present invention but are not limited to scope of the present invention.
Embodiment 1
The PVDF hollow-fibre membrane of certain length is placed in to straight alcohol solution fully to be cleaned, the impurity such as the glycerine in removing fenestra, dry in the electric discharge chamber that is placed on low temperature plasma instrument and carry out pretreatment, pretreatment condition is: between film and electrode, distance is 10 centimetres, the discharge gas passing in chamber is argon gas, discharge power is 50 watts, and the processing time is 60 seconds, gas pressure 20 handkerchiefs.After film is soaked in rapidly to mass fraction is 10%, in polyethylene glycol (PEG) solution (solvent is water) that molecular weight is 10,000, be placed in the fully absorption 12 hours of water-bath oscillator, taking-up is dried.The electric discharge chamber that PVDF hollow-fibre membrane is placed in to low temperature plasma instrument again carries out modification, treatment conditions are: between film and electrode, distance is 5 centimetres, the discharge gas passing in chamber is argon gas, discharge power is 100 watts, and the processing time is 300 seconds, gas pressure 30 handkerchiefs, after finishing dealing with, film is placed in to distilled water, first ultrasonic cleaning, rear stirring and washing, dries for subsequent use.Obtain the PVDF hollow-fibre membrane of surface bond grafting PEG.
Embodiment 2
The PVDF Flat Membrane of 10 × 10 centimetres is placed in to straight alcohol solution fully cleans, the impurity such as the glycerine in removing fenestra, dry in the electric discharge chamber that is placed on low temperature plasma instrument and carry out pretreatment, pretreatment condition is: between film and electrode, distance is 10 centimetres, the discharge gas passing in chamber is argon gas, discharge power is 50 watts, and the processing time is 100 seconds, gas pressure 20 handkerchiefs.After film is soaked in rapidly to mass fraction is 10%, in polyethylene glycol (PEG) solution (solvent is water) that molecular weight is 10,000, be placed in the fully absorption 12 hours of water-bath oscillator, taking-up is dried.The electric discharge chamber that PVDF hollow-fibre membrane is placed in to low temperature plasma instrument again carries out modification, treatment conditions are: between film and electrode, distance is 5 centimetres, the discharge gas passing in chamber is argon gas, discharge power is 100 watts, and the processing time is 300 seconds, gas pressure 30 handkerchiefs, after finishing dealing with, film is placed in to distilled water, first ultrasonic cleaning, rear stirring and washing, dries for subsequent use.Obtain the PVDF Flat Membrane of surface bond grafting PEG.
Embodiment 3
The PVDF hollow-fibre membrane of certain length is placed in to straight alcohol solution fully to be cleaned, the impurity such as the glycerine in removing fenestra, dry in the electric discharge chamber that is placed on low temperature plasma instrument and carry out pretreatment, pretreatment condition is: between film and electrode, distance is 10 centimetres, the discharge gas passing in chamber is argon gas, discharge power is 50 watts, and the processing time is 300 seconds, gas pressure 20 handkerchiefs.After film is soaked in rapidly to mass fraction is 20%, in polyacrylic acid (PAA) solution (solvent is water) that molecular weight is 3000, be placed in the fully absorption 12 hours of water-bath oscillator, taking-up is dried.The electric discharge chamber that PVDF hollow-fibre membrane is placed in to low temperature plasma instrument again carries out modification, treatment conditions are: between film and electrode, distance is 5 centimetres, the discharge gas passing in chamber is argon gas, discharge power is 100 watts, and the processing time is 300 seconds, gas pressure 30 handkerchiefs, after finishing dealing with, film is placed in to distilled water, first ultrasonic cleaning, rear stirring and washing, dries for subsequent use.Obtain the PVDF hollow-fibre membrane of surface bond grafting PAA.
Embodiment 4
The PVDF hollow-fibre membrane of certain length is placed in to straight alcohol solution fully to be cleaned, the impurity such as the glycerine in removing fenestra, dry in the electric discharge chamber that is placed on low temperature plasma instrument and carry out pretreatment, pretreatment condition is: between film and electrode, distance is 10 centimetres, the discharge gas passing in chamber is argon gas, discharge power is 200 watts, and the processing time is 60 seconds, gas pressure 20 handkerchiefs.After film is soaked in rapidly to mass fraction is 10%, in kayexalate (PSS) solution (solvent is water) that molecular weight is 70,000, be placed in the fully absorption 12 hours of water-bath oscillator, taking-up is dried.The electric discharge chamber that PVDF hollow-fibre membrane is placed in to low temperature plasma instrument again carries out modification, treatment conditions are: between film and electrode, distance is 5 centimetres, the discharge gas passing in chamber is argon gas, discharge power is 100 watts, and the processing time is 300 seconds, gas pressure 30 handkerchiefs, after finishing dealing with, film is placed in to distilled water, first ultrasonic cleaning, rear stirring and washing, dries for subsequent use.Obtain the PVDF hollow-fibre membrane of surface bond grafting PSS.
Embodiment 5
The PVDF hollow-fibre membrane of certain length is placed in to straight alcohol solution fully to be cleaned, the impurity such as the glycerine in removing fenestra, dry in the electric discharge chamber that is placed on Low Temperature Plasma Treating instrument and carry out pretreatment, pretreatment condition is: between film and electrode, distance is 10 centimetres, the discharge gas passing in chamber is argon gas, discharge power is 150 watts, and the processing time is 60 seconds, gas pressure 20 handkerchiefs.After film is soaked in rapidly to mass fraction is in 2% shitosan acidic aqueous solution, be placed in the fully absorption 12 hours of water-bath oscillator, taking-up is dried.The electric discharge chamber that PVDF hollow-fibre membrane is placed in to low temperature plasma instrument again carries out modification, treatment conditions are: between film and electrode, distance is 5 centimetres, and the discharge gas passing in chamber is argon gas, and discharge power is 150 watts, processing time is 100 seconds, gas pressure 30 handkerchiefs.After finishing dealing with, film is placed in to distilled water, first ultrasonic cleaning, rear stirring and washing, dries for subsequent use.Obtain the PVDF hollow-fibre membrane of surface bond grafted chitosan.
Embodiment 6
The PVDF Flat Membrane of 10 × 10 centimetres is placed in to straight alcohol solution fully cleans, the impurity such as the glycerine in removing fenestra, dry in the electric discharge chamber that is placed on atmospheric dielectric barrier discharge plasma instrument and carry out pretreatment, pretreatment condition is that between film and electrode, distance is 1 centimetre, the discharge gas passing in chamber is atmospheric air, discharge power is 500 watts, and the processing time is 60 seconds.After film is soaked in rapidly to mass fraction is 10%, in polyethylene glycol (PEG) solution (solvent is water) that molecular weight is 10,000, be placed in the fully absorption 12 hours of water-bath oscillator, taking-up is dried.The electric discharge chamber that PVDF hollow-fibre membrane is placed in to low temperature plasma instrument again carries out modification, treatment conditions are: between film and electrode, distance is 1 centimetre, the discharge gas passing in chamber is atmospheric air, and discharge power is 150 watts, and the processing time is 100 seconds.After finishing dealing with, film is placed in to distilled water, first ultrasonic cleaning, rear stirring and washing, dries for subsequent use.Obtain the PVDF Flat Membrane of surface bond grafting PEG.
Embodiment 7
The PVDF hollow-fibre membrane of certain length is placed in to straight alcohol solution fully to be cleaned, the impurity such as the glycerine in removing fenestra, dry in the electric discharge chamber that is placed on atmospheric dielectric barrier discharge plasma processing instrument and carry out pretreatment, pretreatment condition is: between film and electrode, distance is 1 centimetre, the discharge gas passing in chamber is atmospheric air, discharge power is 150 watts, and the processing time is 60 seconds.After film is soaked in rapidly to mass fraction is in 10% polyacrylic acid solution (solvent is water), be placed in the fully absorption 12 hours of water-bath oscillator, taking-up is dried.The electric discharge chamber that PVDF hollow-fibre membrane is placed in to low temperature plasma instrument again carries out modification, treatment conditions are: between film and electrode, distance is 1 centimetre, the discharge gas passing in chamber is atmospheric air, and discharge power is 150 watts, and the processing time is 100 seconds.After finishing dealing with, film is placed in to distilled water, first ultrasonic cleaning, rear stirring and washing, dries for subsequent use.Obtain the PVDF hollow-fibre membrane of surface bond grafting PAA.
Embodiment 8
The PVDF hollow-fibre membrane of certain length is placed in to straight alcohol solution fully to be cleaned, the impurity such as the glycerine in removing fenestra, dry in the electric discharge chamber that is placed on atmospheric dielectric barrier discharge plasma processing instrument and carry out pretreatment, pretreatment condition is: between film and electrode, distance is 1 centimetre, the discharge gas passing in chamber is air, discharge power is 500 watts, and the processing time is 60 seconds, gas pressure 20 handkerchiefs.After film is soaked in rapidly to mass fraction is 10%, in kayexalate (PSS) solution (solvent is water) that molecular weight is 70,000, be placed in the fully absorption 12 hours of water-bath oscillator, taking-up is dried.The electric discharge chamber that PVDF hollow-fibre membrane is placed in to low temperature plasma instrument again carries out modification, treatment conditions are: between film and electrode, distance is 1 centimetre, the discharge gas passing in chamber is atmospheric air, and discharge power is 150 watts, and the processing time is 100 seconds.After finishing dealing with, film is placed in to distilled water, first ultrasonic cleaning, rear stirring and washing, dries for subsequent use.Obtain the PVDF hollow-fibre membrane of surface bond grafting PSS.
Embodiment 9
The PVDF hollow-fibre membrane of certain length is placed in to straight alcohol solution fully to be cleaned, the impurity such as the glycerine in removing fenestra, dry in the electric discharge chamber that is placed on atmospheric dielectric barrier discharge plasma processing instrument and carry out pretreatment, pretreatment condition is: between film and electrode, distance is 1 centimetre, the discharge gas passing in chamber is air, discharge power is 400 watts, and the processing time is 60 seconds, gas pressure 20 handkerchiefs.After film is soaked in rapidly to mass fraction is in 2% shitosan acidic aqueous solution, be placed in the fully absorption 12 hours of water-bath oscillator, taking-up is dried.The electric discharge chamber that PVDF hollow-fibre membrane is placed in to low temperature plasma instrument again carries out modification, treatment conditions are: between film and electrode, distance is 1 centimetre, the discharge gas passing in chamber is atmospheric air, and discharge power is 500 watts, and the processing time is 30 seconds.After finishing dealing with, film is placed in to distilled water, first ultrasonic cleaning, rear stirring and washing, dries for subsequent use.Obtain the PVDF hollow-fibre membrane of surface bond grafted chitosan.
Embodiment 10
The PVDF hollow-fibre membrane of certain length is placed in to straight alcohol solution fully to be cleaned, the impurity such as the glycerine in removing fenestra, dry in the electric discharge chamber that is placed on atmospheric dielectric barrier discharge plasma processing instrument and carry out pretreatment, pretreatment condition is: between film and electrode, distance is 10 centimetres, the discharge gas passing in chamber is argon gas, discharge power is 150 watts, and the processing time is 60 seconds, gas pressure 20 handkerchiefs.After film is soaked in rapidly to mass fraction is 10%, in polyethylene glycol (PEG) solution (solvent is water) that molecular weight is 4000, be placed in the fully absorption 12 hours of water-bath oscillator, taking-up is dried.The electric discharge chamber that PVDF hollow-fibre membrane is placed in to low temperature plasma instrument again carries out modification, treatment conditions are: between film and electrode, distance is 1 centimetre, the discharge gas passing in chamber is atmospheric air, and discharge power is 400 watts, and the processing time is 100 seconds.After finishing dealing with, film is placed in to distilled water, first ultrasonic cleaning, rear stirring and washing, dries for subsequent use.Obtain the PVDF hollow-fibre membrane of surface bond grafting PEG.
Embodiment 11
The PVDF hollow-fibre membrane of certain length is placed in to straight alcohol solution fully to be cleaned, the impurity such as the glycerine in removing fenestra, dry in the electric discharge chamber that is placed on atmospheric dielectric barrier discharge plasma processing instrument and carry out pretreatment, pretreatment condition is: between film and electrode, distance is 1 centimetre, the discharge gas passing in chamber is atmospheric air, discharge power is 150 watts, and the processing time is 60 seconds.After film is soaked in rapidly to mass fraction is 10%, in kayexalate (PSS) solution (solvent is water) that molecular weight is 70,000, be placed in the fully absorption 12 hours of water-bath oscillator, taking-up is dried.The electric discharge chamber that PVDF hollow-fibre membrane is placed in to low temperature plasma instrument again carries out modification, treatment conditions are: between film and electrode, distance is 5 centimetres, and the discharge gas passing in chamber is argon gas, and discharge power is 150 watts, processing time is 150 seconds, gas pressure 30 handkerchiefs.After finishing dealing with, film is placed in to distilled water, first ultrasonic cleaning, rear stirring and washing, dries for subsequent use.Obtain the PVDF hollow-fibre membrane of surface bond grafting PSS.
Embodiment 12
The PVDF hollow-fibre membrane of certain length is placed in to straight alcohol solution fully to be cleaned, the impurity such as the glycerine in removing fenestra, dry in the electric discharge chamber that is placed on atmospheric dielectric barrier discharge plasma processing instrument and carry out pretreatment, pretreatment condition is: between film and electrode, distance is 1 centimetre, the discharge gas passing in chamber is atmospheric air, discharge power is 150 watts, and the processing time is 60 seconds.After film is soaked in rapidly to mass fraction is in 10% polyacrylic acid solution (solvent is water), be placed in the fully absorption 12 hours of water-bath oscillator, taking-up is dried.The electric discharge chamber that PVDF hollow-fibre membrane is placed in to low temperature plasma instrument again carries out modification, treatment conditions are: between film and electrode, distance is 5 centimetres, and the discharge gas passing in chamber is argon gas, and discharge power is 300 watts, processing time is 30 seconds, gas pressure 30 handkerchiefs.After finishing dealing with, film is placed in to distilled water, first ultrasonic cleaning, rear stirring and washing, dries for subsequent use.Obtain the PVDF hollow-fibre membrane of surface bond grafting PAA.
Embodiment 13
The PVDF hollow-fibre membrane of certain length is placed in to straight alcohol solution fully to be cleaned, the impurity such as the glycerine in removing fenestra, dry in the electric discharge chamber that is placed on atmospheric dielectric barrier discharge plasma processing instrument and carry out pretreatment, pretreatment condition is: between film and electrode, distance is 1 centimetre, the discharge gas passing in chamber is normal pressure, discharge power is 150 watts, and the processing time is 60 seconds.After film is soaked in rapidly to mass fraction is in 2% chitosan solution (solvent is water), be placed in the fully absorption 12 hours of water-bath oscillator, taking-up is dried.The electric discharge chamber that PVDF hollow-fibre membrane is placed in to low temperature plasma instrument again carries out modification, treatment conditions are: between film and electrode, distance is 5 centimetres, and the discharge gas passing in chamber is argon gas, and discharge power is 150 watts, processing time is 100 seconds, gas pressure 30 handkerchiefs.After finishing dealing with, film is placed in to distilled water, first ultrasonic cleaning, rear stirring and washing, dries for subsequent use.Obtain the PVDF hollow-fibre membrane of surface bond grafted chitosan.
Performance test
For the various films of preparing after embodiment of the present invention 1-13 modification, in accordance with the following methods its performance is characterized, concrete method of testing and the performance test results are as follows:
Static hydrolysis feeler: hydrolysis feeler adopts the method for the dripping test of lying, uses OCA40Micro contact angle measurement on a membrane sample, to measure method that 10 points average to characterize the water contact angle on film surface before and after modification.
Water flux: the water flux test of hollow-fibre membrane and Flat Membrane is all used homemade mould to carry out, and test pressure is 0.1 MPa.
Flux recovery rate: adopt successively the loop test aqueous solution, bovine serum albumin (BSA) solution of 1g/L, the method for the aqueous solution, the ratio of water flux before and after utilizing, characterization of membrane is for the contamination resistance of protein B SA, and ratio is larger, and antipollution effect is better.
Concrete test result is:
| Embodiment numbering | Contact angle (°) | Water flux (L/m 2h) | Flux recovery rate (%) |
| Former PVDF hollow-fibre membrane | 95 | 48 | 58 |
| Former PVDF Flat Membrane | 101 | 85 | 60 |
| Embodiment 1 | 66 | 58 | 91 |
| Embodiment 2 | 70 | 95 | 80 |
| Embodiment 3 | 50 | 55 | 90 |
| Embodiment 4 | 68 | 57 | 83 |
| Embodiment 5 | 63 | 62 | 90 |
| Embodiment 6 | 61 | 101 | 80 |
| Embodiment 7 | 55 | 56 | 93 |
| Embodiment 8 | 70 | 55 | 85 |
| Embodiment 9 | 71 | 60 | 88 |
| Embodiment 10 | 65 | 63 | 80 |
| Embodiment 11 | 55 | 61 | 92 |
| Embodiment 12 | 61 | 58 | 85 |
| Embodiment 13 | 75 | 52 | 81 |
Claims (7)
1. a method of improving polyvinylidene fluoride porous film antifouling property based on plasma technique, is characterized in that, concrete steps comprise:
The first step: PVDF perforated membrane is cleaned to removal of impurities and dries, be placed in plasma instrument and carry out pretreatment;
Second step: pretreated PVDF perforated membrane is soaked in subject polymer solution and is adsorbed, dry; In described subject polymer solution, subject polymer is hydrophilic polymer, and solvent is water or acidic aqueous solution, and the mass concentration of subject polymer solution is 1%～20%;
The 3rd step: PVDF perforated membrane after treatment second step is placed in to plasma instrument and carries out modification, and the PVDF perforated membrane after modification is cleaned.
2. the method for improving polyvinylidene fluoride porous film antifouling property based on plasma technique as claimed in claim 1, it is characterized in that, pretreated treatment conditions in the described first step are: between film and electrode, distance is 1～10 centimetre, the discharge gas passing in chamber is air or argon gas, discharge power is 50～500 watts, and the processing time is 30～300 seconds.
3. the method for improving polyvinylidene fluoride porous film antifouling property based on plasma technique as claimed in claim 1, it is characterized in that, the treatment conditions of the modification in described the 3rd step are: between film and electrode, distance is 1～10 centimetre, the discharge gas passing in chamber is air or argon gas, discharge power is 50～500 watts, and the processing time is 30～300 seconds.
4. the method for improving polyvinylidene fluoride porous film antifouling property based on plasma technique as claimed in claim 1, it is characterized in that, the hydrophilic polymer in described second step is at least one in polyethylene glycol, polyacrylic acid, kayexalate and shitosan.
5. the method for improving polyvinylidene fluoride porous film antifouling property based on plasma technique as claimed in claim 1, is characterized in that, the PVDF perforated membrane in the described first step is Flat Membrane or hollow-fibre membrane.
6. the method for improving polyvinylidene fluoride porous film antifouling property based on plasma technique as claimed in claim 1, is characterized in that, the adsorption time in described second step is 12 hours.
7. the method for improving polyvinylidene fluoride porous film antifouling property based on plasma technique as claimed in claim 1, it is characterized in that, in described the 3rd step, the cleaning of the PVDF perforated membrane after modification is adopted to first ultrasonic cleaning, the mode of rear stirring and washing, cleaning solvent is the aqueous solution or the acidic aqueous solution of very easily solubilized target polymer.
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| CN105688693A (en) * | 2016-01-22 | 2016-06-22 | 天津工业大学 | Preparation method of chitosan graft modification polyvinylidene fluoride (PVDF) separation membrane |
| CN105688685A (en) * | 2016-01-18 | 2016-06-22 | 大连理工大学 | Method for preparing composite membrane through barometric pressure air plasma technology |
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| CN104056556A (en) * | 2014-06-27 | 2014-09-24 | 南京大学 | Modification method for etching surface of membrane-type artificial lung and bonding beta-cyclodextrin by using low-temperature plasma |
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| CN105688693A (en) * | 2016-01-22 | 2016-06-22 | 天津工业大学 | Preparation method of chitosan graft modification polyvinylidene fluoride (PVDF) separation membrane |
| CN108854573A (en) * | 2018-07-18 | 2018-11-23 | 威海清尔特环境科技有限公司 | A kind of hydrophilic modification method of seperation film |
| CN108854573B (en) * | 2018-07-18 | 2021-06-01 | 威海清尔特环境科技有限公司 | Hydrophilic modification method of separation membrane |
| CN109248569A (en) * | 2018-10-19 | 2019-01-22 | 上海恩捷新材料科技有限公司 | A kind of seperation film and preparation method thereof |
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